JPH02277005A - Production of color filter - Google Patents

Abstract

PURPOSE:To easily produce the color filter having stable patterns without having defects and voids by forming three-color picture elements on a substrate, then applying a black colored resist thereon and exposing the rear surface. CONSTITUTION:The colored photoresist of the 1st color R is applied on the glass substrate 1 and is baked. The picture elements thereof are selectively irradiated through a mask 3 with light in an atmosphere where oxygen is shut off; thereafter, the resist is subjected to a heating to accelerate polymn., developing, rinsing, and post baking to form the picture elements 4. The picture elements 6, 8 of the 2nd and 3rd colors are thereafter formed by repeating the similar stages (C) to (F), following which the black colored resist 9 is applied on the picture elements 6, 8 from above and is baked; thereafter, the rear surface is exposed from a substrate 1 side in the atmosphere where the oxygen is shut off. The developing, rinsing and post baking are then executed to form a black matrix 10. Since the picture elements themselves serve as a mask, the voids and overlap by misalignment are not generated.

Description

DETAILED DESCRIPTION OF THE INVENTION Field of Industrial Application The present invention relates to a method for manufacturing color filters used in liquid crystal color televisions and the like.

BACKGROUND ART In general, a method for forming a pattern such as a color filter using a colored resist is as shown in FIG. In the case of a colored resist that undergoes photopolymerization, an oxygen barrier film 23 is applied and a mask 2 is applied.
After exposure through step 4, unnecessary portions are removed by development and rinsing, and finally post-beta processing is performed. In particular, in the case of color filters, a colored resist in which carbon is dispersed is used to form the black matrix, and a colored resist in which red, green, and blue pigments are dispersed is used for the pixel portions.

Problems to be Solved by the Invention However, colored resists absorb light due to pigments, etc.
Since the resist is large, there is a light intensity distribution in the film thickness direction, and polymerization is insufficient in the lower part of the resist, resulting in side etching 27 during development, which causes pattern defects. In order to ensure sufficient exposure to sufficiently polymerize the lower part of the colored resist and provide development resistance, a very large exposure is required at the surface.

However, in this case, the pattern becomes thicker due to diffraction.

Furthermore, when a colored resist is used for the black matrix, the portion where the black matrix and the pixels overlap tend to swell, causing gap unevenness and opposing short circuits. For this reason, if the pixel size is set so as not to exceed the black matrix, white spots 26 are likely to occur due to alignment errors, etc., as shown in FIG. 2(B).

In view of this, an object of the present invention is to provide a method for easily manufacturing a color filter having a stable pattern without defects or white spots.

Means for Solving the Problems The present invention provides red (R), green (G), and blue (B) colors on a transparent substrate.
After forming a pixel pattern, a negative black (K) with pigment or carbon mixed and dispersed on the transparent substrate.
After applying a colored photoresist and performing baking, backside exposure is performed from the transparent substrate side in an oxygen-blocking atmosphere,
Finally, by forming a black matrix, it is possible to manufacture color filters without white spots or overlaps.

Function: In the present invention, after R, G, and B pixels are formed on a substrate, a black colored resist is applied and backside exposure is performed, so that each of the R, G, and B pixels becomes a mask, and the areas other than the black matrix are In order to block light, only the black matrix portion is polymerized and patterned. Furthermore, at this time, since the pixels themselves serve as a mask, no white spots or overlaps due to misalignment occur.

Examples Examples of the present invention will be described below with reference to the drawings.

FIG. 1 is a process explanatory diagram of an embodiment of the present invention.

A colored photoresist of the first color (R) is applied on the glass substrate 1, baked, and the first colored photoresist is applied through the mask 3.
After selectively irradiating the pixel portion of the color in an oxygen-blocking atmosphere (see (A) in the same figure), the pixel 4 of the first color is formed on the substrate by performing polymerization-promoting heating, development, rinsing, and post-baking. 1 (see figure (B)). After this,
After forming the second color pixel 6 and the third color pixel 8 by repeating the above steps as shown in FIG. 1(C) to (F), as shown in FIG. Pixel 4.6
．． After a black colored resist 9 is applied from above 8, baking is performed and backside exposure is performed from the glass substrate l side in an oxygen-blocking atmosphere. Thereafter, by performing development, rinsing, and post-baking, a black matrix 10 is formed as shown in FIG.

In addition, the extinction coefficient and film thickness at the photosensitive wavelength of the black matrix and each pixel at this time are: K's extinction coefficient tx: K's film thickness +
+: Extinction coefficient of R tR: Film thickness of R ka:
G extinction coefficient to: G film thickness ke: B
The absorption coefficient te: When the film thickness is B, and the exposure m required for the black (K)'M color resist 9 to polymerize and obtain sufficient development resistance is E, the film thickness of the black matrix is t. The exposure amount E in , must be equal to or greater than Et. However, on each pixel, the exposure must be less than the EI because it must be removed during development. Therefore, the relationship between the extinction coefficient and film thickness of the black matrix for each pixel is kg tK< kRtR, ka ja+ ket.

It must be. Furthermore, such a relationship can be realized by mixing into the R, G, and B colored resists a substance such as a pigment that has high transmittance in the visible range but absorbs light in the sensitive wavelength range.

By manufacturing a color filter by such a method, the following effects can be obtained.

First, no white spots or overlaps occur between pixels and the black matrix.

Second, since no side etching occurs, defects due to line breakage or chipping do not occur.

Coloring and photoresist materials include, for example, a pigment-filled resist made by Fuji Hunt Electronics Technology Co., Ltd., which is made of an acrylic photosensitive resin, that is, a blue resist (trade name: Color Mosaic B1, abbreviated as CB);
Green resist (trade name Color Mosaic G1 abbreviation C
G), red resist (trade name Color Mosaic R1 abbreviation C)
R), black resist (trade name: Color Mosaic 1, abbreviation: GK) was used.

A 1% by weight aqueous sodium carbonate solution was used as the developer.

Effects of the Invention According to the present invention, it is possible to manufacture a stable color filter without side etching, chipping, protrusions, or white spots using a colored photoresist in which pigments, carbon, etc. are dispersed.

[Brief explanation of drawings]

FIG. 1 is a process explanatory diagram of an embodiment of the present invention, and FIG. 2 is a process explanatory diagram of a conventional example. 1...Glass substrate, 2...First color colored resist,
3... Photomask, 4... First color pixel, 5...
... second color colored resist, 6... second color pixels,
7...Third color colored resist, 8...Third color pixels, 9...Black colored resist, 10...Black matrix. Agent's name: Patent attorney Shigetaka Kurino Hikari 1 person f Hikari/--1 cufflinks - m-1st f! ! j1 colored cyst 5-V42nd color colored list 4-1112e i! hRinichi-- 3-°- 4・- 7-・- 8-・- is Fusubara temporary mask pigeon 11! ! Ijil fox 2f with eyes! ! Eye pixel 3rd @ eye 11 @ register 3rd color jliI exposure

Claims (2)

[Claims] (1) After forming red (R), green (G), and blue (B) pixel patterns on a transparent substrate, a negative black color (K) is obtained by mixing and dispersing pigment or carbon on the transparent substrate. A method for manufacturing a color filter, which comprises applying a colored photoresist and baking it, then exposing the backside from the transparent substrate side in an oxygen-blocking atmosphere, and finally forming a black matrix. (2) R in the sensitive wavelength range of black colored photoresist
, G, B pixels and the black matrix are k_R, k_G, k_B, k_K, and the set film thicknesses of each R, G, B pixel and black matrix are t_R, t_
When G, t_B, t_K, k_Kt_K <k_R
The color filter manufacturing method according to claim 1, characterized in that t_R, k_Gt_G, and k_Bt_B.