JPH02260596A - Method of mounting integrated circuit chip - Google Patents
Method of mounting integrated circuit chipInfo
- Publication number
- JPH02260596A JPH02260596A JP1081705A JP8170589A JPH02260596A JP H02260596 A JPH02260596 A JP H02260596A JP 1081705 A JP1081705 A JP 1081705A JP 8170589 A JP8170589 A JP 8170589A JP H02260596 A JPH02260596 A JP H02260596A
- Authority
- JP
- Japan
- Prior art keywords
- solder
- integrated circuit
- film
- wiring pattern
- circuit element
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/30—Assembling printed circuits with electric components, e.g. with resistors
- H05K3/32—Assembling printed circuits with electric components, e.g. with resistors electrically connecting electric components or wires to printed circuits
- H05K3/34—Assembling printed circuits with electric components, e.g. with resistors electrically connecting electric components or wires to printed circuits by soldering
- H05K3/341—Surface mounted components
- H05K3/3421—Leaded components
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/30—Assembling printed circuits with electric components, e.g. with resistors
- H05K3/32—Assembling printed circuits with electric components, e.g. with resistors electrically connecting electric components or wires to printed circuits
- H05K3/34—Assembling printed circuits with electric components, e.g. with resistors electrically connecting electric components or wires to printed circuits by soldering
- H05K3/3452—Solder masks
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/30—Assembling printed circuits with electric components, e.g. with resistors
- H05K3/32—Assembling printed circuits with electric components, e.g. with resistors electrically connecting electric components or wires to printed circuits
- H05K3/34—Assembling printed circuits with electric components, e.g. with resistors electrically connecting electric components or wires to printed circuits by soldering
- H05K3/3465—Application of solder
Landscapes
- Electric Connection Of Electric Components To Printed Circuits (AREA)
Abstract
(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は、リード線の配線ピッチが狭いLSI等の集積
回路素子において、このリード線と印刷配線基板の配線
パターンとを半田によって接続する高密度の実装方法に
関するものである。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to an integrated circuit device such as an LSI in which the wiring pitch of the lead wires is narrow, in which the lead wires are connected to the wiring pattern of the printed wiring board by soldering. It concerns how density is implemented.
LSI等の集積回路素子には、多数のリード線を具備す
るために、このリード線の配線ピッチが掻めて狭い(例
えば0.3aua以下)ものがある。Some integrated circuit devices such as LSIs are equipped with a large number of lead wires, so that the wiring pitch of the lead wires is extremely narrow (for example, 0.3 aua or less).
このような集積回路素子をPWB (印刷配線基板)に
実装する場合の従来の実装方法を第5図及び第6図に基
づいて説明する。A conventional mounting method for mounting such an integrated circuit element on a PWB (printed wiring board) will be described with reference to FIGS. 5 and 6.
PWBII上には、配線パターン12が形成されている
。そして、第5図に示すように1.この配線パターン1
2における接続部12a・・・は、集積回路素子13に
おけるリード線13a・・・の配線ピッチに合わせて所
定の位置に並んで配置されている。A wiring pattern 12 is formed on PWBII. Then, as shown in FIG. 5, 1. This wiring pattern 1
2 are arranged in line at predetermined positions in accordance with the wiring pitch of the lead wires 13a in the integrated circuit element 13.
上記配線パターン12における各接続部12a上には、
まずクリーム半田による半田膜14(第5図では図示せ
ず)がそれぞれこの接続部12aのパターンに合わせて
印刷又は塗布される。次に、集積回路素子13をPWB
ll上にvJ、iff!し、各リード線13aをこの各
半田膜14上にそれぞれ位置合わせする。On each connection portion 12a in the wiring pattern 12,
First, a solder film 14 (not shown in FIG. 5) made of cream solder is printed or applied in accordance with the pattern of each connection portion 12a. Next, the integrated circuit element 13 is
vJ on ll, if! Then, each lead wire 13a is positioned on each solder film 14, respectively.
そして、遠赤外線ヒータによって加熱されたりフロー炉
内にこの集積回路素子13を載置したPWBIIを通す
ことにより、半田膜14・・・を熔融させる。すると、
第6図に示すように、各リード線13aと配線パターン
12における各接続部12aとがそれぞれ接続され、集
積回路素子13の実装が完了する。Then, the solder films 14 are melted by being heated by a far-infrared heater or passing through a PWBII in which the integrated circuit element 13 is placed in a flow furnace. Then,
As shown in FIG. 6, each lead wire 13a is connected to each connection portion 12a in the wiring pattern 12, and the mounting of the integrated circuit element 13 is completed.
また、上記集積回路素子13を載置したPWBllにお
ける各リード線13a上を所定の温度に加熱されたヒー
タチップで押圧する方法によっても半田膜14・・・を
熔融させることができる。しかも、この熱圧着による方
法では、溶融した半田膜14がリード線13a上にも回
り込むので、接続強度を増すと共に接続の目視確認が容
易になるという利点がある。The solder films 14 can also be melted by pressing a heater chip heated to a predetermined temperature on each lead wire 13a of the PWBll on which the integrated circuit element 13 is mounted. In addition, this thermocompression bonding method has the advantage that the melted solder film 14 also wraps around the lead wire 13a, which increases the connection strength and facilitates visual confirmation of the connection.
ところが、これら半田膜14・・・は、溶融の際に周囲
に拡散するので、形成領域がある程度法がることになる
。そこで、上記のようにリード線13a・・・の配線ピ
ッチが狭い集積回路素子13を実装する場合には、第5
図でも示したように、従来の実装方法においても、配線
パターン12における各接続部12aの幅をリード線1
3aと同じか、又はそれより狭い幅となるように形成し
、この半田膜14の拡散範囲ができるだけ小さくなるよ
うな工夫がなされていた。However, since these solder films 14... diffuse into the surrounding area when melted, the formation area becomes warped to some extent. Therefore, when mounting the integrated circuit element 13 in which the wiring pitch of the lead wires 13a is narrow as described above, the fifth
As shown in the figure, even in the conventional mounting method, the width of each connection portion 12a in the wiring pattern 12 is
The solder film 14 is formed to have a width equal to or narrower than that of the solder film 3a, so that the diffusion range of the solder film 14 is made as small as possible.
しかしながら、リード線13a・・・の配線ピッチが例
えば0.3na以下となるような集積回路素子13を実
装する場合には、このように各接続部12aの幅を狭く
するにも限度が生じる。However, when mounting an integrated circuit element 13 in which the wiring pitch of the lead wires 13a is, for example, 0.3 na or less, there is a limit to how narrow the width of each connection portion 12a can be.
従って、従来の集積回路素子の実装方法では、リード線
13a・・・の配線ピッチが極めて狭い集積回路素子1
3を実装する場合に、第7図に示すように、隣接する半
田膜14・14同士が接触し端子間が短絡するのを完全
に防止することができないという問題点を生じていた。Therefore, in the conventional integrated circuit device mounting method, the wiring pitch of the lead wires 13a is extremely narrow in the integrated circuit device 1.
3, a problem arises in that it is not possible to completely prevent adjacent solder films 14 from coming into contact with each other and causing a short circuit between the terminals, as shown in FIG.
また、リフロー炉を用いて半田膜14を溶融させた場合
にこのような隣接する半田膜14・14の接触が生じる
と、一方の半田膜14がクリーム半田を他方側に吸い取
られ、その部分のリード線13aが接続部12aより浮
き上がってオーブンになるという問題点も生じていた。Further, when the solder films 14 are melted using a reflow oven and such contact occurs between adjacent solder films 14, the cream solder of one solder film 14 is absorbed by the other side, and the part of the solder film 14 is melted. Another problem occurred in that the lead wire 13a rose above the connecting portion 12a and became an oven.
さらに、リフロー炉を用いて半田膜14を溶融させた場
合、通常は、この溶融した半田膜14の硬化の際に、リ
ード線13a・・・と接続部12a・・・とのずれをセ
ルフアライメント効果によって修正する働きがある。し
かし、上記のように隣接する半田膜14・14が溶融し
て接触すると、硬化の際にリード線13a・・・を正し
い位置に引き戻そうとするセルフアライメントの効果が
薄れ、リード線13a・・・の位置ずれが多くなるとい
う問題点も生じていた。Furthermore, when the solder film 14 is melted using a reflow oven, when the melted solder film 14 is cured, the misalignment between the lead wires 13a... and the connecting portions 12a... is normally corrected by self-alignment. It works to correct depending on the effect. However, when the adjacent solder films 14 melt and come into contact with each other as described above, the self-alignment effect that attempts to pull the lead wires 13a back to the correct position during curing is weakened, and the lead wires 13a... Another problem has arisen in that the positional shift of the
本発明に係る集積回路素子の実装方法は、上記課題を解
決するために、印刷配線基板の配線パターンにおける各
接続部上にそれぞれ半田膜を形成し、これらの半田膜上
に集積回路素子の各リード線を重ね合わせた状態で半田
膜を溶融させることにより各リード線と配線パターンと
の接続を行う集積回路素子の実装方法において、半田膜
形成前の印刷配線基板における配線パターンの少な(と
も接続部上を耐熱絶縁膜で被うと共に、配線パターンの
各接続部上において、互いに隣接するもの同士がリード
線の長手方向に互い違いにずれた位置に開口する開口部
をこの耐熱絶縁膜にそれぞれ形成し、この耐熱絶縁膜の
各開口部上に前記半田膜を形成することを特徴としてい
る。In order to solve the above-mentioned problem, a method for mounting an integrated circuit element according to the present invention forms a solder film on each connection part in a wiring pattern of a printed wiring board, and each of the integrated circuit elements is mounted on the solder film. In an integrated circuit device mounting method in which each lead wire is connected to a wiring pattern by melting a solder film while the lead wires are stacked one on top of the other, the wiring pattern on the printed wiring board before the solder film is formed is A heat-resistant insulating film is formed over each connection part of the wiring pattern, and openings are formed in the heat-resistant insulating film so that adjacent leads are staggered in the longitudinal direction of the lead wire. The present invention is characterized in that the solder film is formed on each opening of the heat-resistant insulating film.
印刷配線基板上には、実装する集積回路素子におけるリ
ード線の配線ピッチに合わせて、配線パターンの接続部
がそれぞれ配置されている。Connection portions of wiring patterns are arranged on the printed wiring board in accordance with the wiring pitch of the lead wires in the integrated circuit element to be mounted.
この印刷配線基板に集積回路素子を実装するには、まず
配線パターンの少なくとも接続部上を耐熱絶縁膜で被う
、また、この耐熱絶縁膜には、配線パターンの各接続部
上において、互いに隣接するもの同士がリード線の長手
方向に互い違いにずれた位置に開口する開口部がそれぞ
れ形成される。In order to mount an integrated circuit element on this printed wiring board, first, at least the connecting portions of the wiring pattern are covered with a heat-resistant insulating film. Openings are formed at positions staggered in the longitudinal direction of the lead wire.
次に、この耐熱絶縁膜の各開口部上に半田膜をそれぞれ
形成する。ただし、耐熱絶縁膜の開口部は、上記のよう
に隣接するもの同士が互い違いとなるように千鳥状に形
成されている。このため、半田膜も、隣接するもの同士
が互い違いとなるように千鳥状に形成されることになる
。これらの半田膜は、例えばクリーム半田を所定のパタ
ーンで印刷又は塗布することにより形成される。このよ
うにして半田膜が形成されると、印刷配線基板上の所定
位置に集積回路素子を載置し、各リード線をこれらの半
田膜上にそれぞれ位置合わせする。Next, a solder film is formed on each opening of this heat-resistant insulating film. However, the openings in the heat-resistant insulating film are formed in a staggered manner so that adjacent openings are staggered as described above. Therefore, the solder films are also formed in a staggered manner so that adjacent ones are staggered. These solder films are formed, for example, by printing or applying cream solder in a predetermined pattern. After the solder film is formed in this manner, the integrated circuit element is placed at a predetermined position on the printed wiring board, and each lead wire is aligned on the solder film.
そして、上記半田膜を加熱して溶融させると、各リード
線と配線パターンの各接続部とがこの半田膜を介して接
続される。この際、各半田膜は、溶融によって周囲に拡
散する。しかし、上記のように、隣接する半田膜が互い
違いに形成されているので、この拡散によって広がった
領域同士が重なり合い接触する可能性は極めて少なくな
る。なお、この半田膜の加熱は、遠赤外線ヒータによっ
て加熱されたりフロー炉内に印刷配線基板を通すことに
よって行うことができる。また、各リード線上を所定の
温度に加熱されたヒータチップで押圧すれば、熱圧着を
行うことができる。Then, when the solder film is heated and melted, each lead wire and each connection portion of the wiring pattern are connected via this solder film. At this time, each solder film is melted and diffused into the surrounding area. However, as described above, since adjacent solder films are formed alternately, the possibility that the regions expanded by this diffusion overlap and come into contact with each other is extremely reduced. The solder film can be heated by a far-infrared heater or by passing the printed wiring board through a flow furnace. Further, thermocompression bonding can be performed by pressing each lead wire with a heater chip heated to a predetermined temperature.
以上のようにして各リード線と配線パターンにおける各
接続部とか半田膜を介して接続されると、集積回路素子
の実装が完了する。そして、この際に、隣接する半田膜
同士が接触するということも、はとんどなくなる。When each lead wire and each connection part in the wiring pattern are connected via the solder film in the above manner, the mounting of the integrated circuit element is completed. At this time, it is almost impossible for adjacent solder films to come into contact with each other.
本発明の一実施例を第1図乃至第3図に基づいて説明す
れば、以下の通りである。An embodiment of the present invention will be described below based on FIGS. 1 to 3.
本実施例は、リード線の配線ピッチが0.3a*以下の
集積回路素子をPWB (印刷配線基板)に実装する場
合について示す。This embodiment shows a case where an integrated circuit element with a wiring pitch of lead wires of 0.3a* or less is mounted on a PWB (printed wiring board).
第1図に示すように、PWBl上には、配線パターン2
が形成されている。そして、この配線パターン2におけ
る接続部2a・・・は、第2図(a)(b)に示す集積
回路素子3におけるリード線3a・・・の配線ピッチに
合わせて、図示右側より左側の所定の位置まで平行に並
んで引き出されている。As shown in FIG. 1, there is a wiring pattern 2 on PWBl.
is formed. The connecting portions 2a... in this wiring pattern 2 are arranged at predetermined positions from the right side to the left side in the figure, in accordance with the wiring pitch of the lead wires 3a... in the integrated circuit element 3 shown in FIGS. 2(a) and 2(b). They are drawn out in parallel to the position.
上記PWBIに集積回路素子3を実装するには、まずこ
のPWB l上における配線パターン2の接続部2a・
・・全体を被う位置に、レジスト膜5を形成する。この
レジスト膜5は、半田の溶融温度に対して耐熱性を有し
、かつ、電気的絶縁性を有するものを使用する。また、
このレジスト膜5に゛は、配線パターン2の各接続部2
a上の一部をそれぞれこの接続部2aに沿って矩形に開
口した開口部5a・・・が形成されている。これらの開
口部5a・・・は、互いに隣接するもの同士が図示左右
方向に間隙dを開けて互い違いにずれた位置に配置され
ている。In order to mount the integrated circuit element 3 on the above PWBI, first, the connection portion 2a of the wiring pattern 2 on this PWB I.
...A resist film 5 is formed at a position covering the entire surface. This resist film 5 is heat resistant to the melting temperature of the solder and has electrical insulation properties. Also,
This resist film 5 is coated with each connection portion 2 of the wiring pattern 2.
Rectangular openings 5a are formed along the connecting portions 2a at a portion of the connecting portions 2a. These openings 5a are arranged in staggered positions with gaps d between adjacent openings 5a in the left-right direction in the drawing.
次に、これらのレジスト膜5・・・における各開口部5
a・・・上に、半田膜4・・・(第1図では図示せず)
をそれぞれ形成する。ただし、この各開口部5a・・・
は、上記のように、IiJ接するもの同士が互い違いと
なるように千鳥状に形成されている。このため、半田膜
4・・・も、隣接するもの同士が互い違いとなるように
千鳥状に形成されることになる。Next, each opening 5 in these resist films 5...
a... On top, solder film 4... (not shown in FIG. 1)
form each. However, each opening 5a...
As described above, these are formed in a staggered manner so that the ones in contact with IiJ are staggered. Therefore, the solder films 4 are also formed in a staggered manner so that adjacent ones are staggered.
なお、このように半田膜4・・・を千鳥状に形成すると
、隣接するもの同士の間隔に余裕が生じるので、この半
田@4・・・のパターン形成が容易となる。It should be noted that when the solder films 4 are formed in a staggered manner as described above, there is a margin in the interval between adjacent ones, so that pattern formation of the solder films 4 is facilitated.
これらの半田膜4・・・は、半田クリームを上記各開口
部5a・・・のパターンに合わせて印刷又は塗布するこ
とによって形成される。このようにして半田膜4・・・
が形成されると、PWB l上の所定位置に集積回路素
子3を載置し、各リード線3aをこれらの半田114・
・・上にそれぞれ位置合わせする。These solder films 4 are formed by printing or applying solder cream in accordance with the pattern of each of the openings 5a. In this way, the solder film 4...
Once formed, the integrated circuit element 3 is placed at a predetermined position on the PWB l, and each lead wire 3a is connected to the solder 114.
...Align each on top.
そして、遠赤外線ヒータによって加熱されたりフロー炉
内にこの集積回路素子3を載置したPWBlを通すと、
半田膜4・・・が熔融する。すると、第2図に示すよう
に、リード線3a・・・と配線パターン2における接続
部2a・・・とがそれぞれ接続される。即ち、図示右側
寄りにレジスト膜5の開口部5aが形成された接続部2
aでは、第2図(a)に示すように、リード線3aの先
端側が半田膜4を介して接続される。また、図示左側寄
りにレジスト膜5の開口部5aが形成された接続部2a
では、第2図(b)に示すように、リード線3aの基部
側が半田膜4を介して接続される。Then, when the PWBl with this integrated circuit element 3 mounted thereon is heated by a far-infrared heater or passed through a flow furnace,
Solder film 4... is melted. Then, as shown in FIG. 2, the lead wires 3a... and the connecting portions 2a... in the wiring pattern 2 are connected, respectively. That is, the connection part 2 has the opening 5a of the resist film 5 formed on the right side in the figure.
In a, as shown in FIG. 2(a), the leading ends of the lead wires 3a are connected via the solder film 4. Also, a connecting portion 2a in which an opening 5a of the resist film 5 is formed on the left side in the figure.
Now, as shown in FIG. 2(b), the base side of the lead wire 3a is connected via the solder film 4.
上記集積回路素子3を載置したPWB 1は、各リード
線3a上を所定の温度に加熱されたヒータチップで押圧
する方法によって半田膜4・・・を熔融させ、これらリ
ード線3a・・・と接続部2a・・・との接続を行うこ
ともできる。The PWB 1 on which the integrated circuit element 3 is mounted melts the solder film 4 by pressing a heater chip heated to a predetermined temperature on each lead wire 3a, and melts the solder film 4 on each lead wire 3a. It is also possible to make a connection between the connecting portion 2a and the connecting portion 2a.
ここで、上記のように半田膜4・・・を加熱して溶融さ
せると、これらの半田膜4・・・は、印刷又は塗布によ
って形成されたパターンよりも周囲側に拡散する。しか
し、これら半田膜4・・・のパターンはもともと千鳥状
に形成されているので、第3図に示すように、溶融によ
って領域が広がったとしても、互いに隣接するもの同士
の間には十分な隙間ができることになり、溶融後の半田
1114・・・同士が重なり合って接触する可能性が極
めて少なくなる。Here, when the solder films 4 are heated and melted as described above, these solder films 4 are diffused toward the periphery of the pattern formed by printing or coating. However, since the patterns of these solder films 4 are originally formed in a staggered manner, even if the area expands due to melting, as shown in Fig. 3, there is sufficient space between adjacent ones. A gap is created, and the possibility that the melted solder 1114 overlaps and contacts each other is extremely reduced.
以上のようにして各リード線3a・・・と配線パターン
2における各接続部2a・・・とが半田膜4・・・を介
して接続されると、集積回路素子3の実装が完了する。When each lead wire 3a... and each connection part 2a... in the wiring pattern 2 are connected via the solder film 4... as described above, the mounting of the integrated circuit element 3 is completed.
そして、この際に、隣接する半田膜4・4同士が接触す
るということもほとんどなくなる。At this time, there is almost no chance that the adjacent solder films 4 come into contact with each other.
第4図に本発明の他の実施例を示す。この実施例は、レ
ジスト膜5上の開口部5a・・・を接続部2a・・・に
沿って長円状に開口したものである。レジスト膜5の開
口部5aをこのような形状に開口すると、次工程で形成
する半田膜4(第4図では図示せず)の半田回りが良く
なり、また、レジストWA5をこの開口部5aから剥が
れ難くすることができる。ただし、開口部5aの形状は
、上記矩形又は長円状に限定されるものではない。FIG. 4 shows another embodiment of the invention. In this embodiment, the openings 5a on the resist film 5 are opened in an oval shape along the connecting portions 2a. When the opening 5a of the resist film 5 is opened in such a shape, the solder film 4 (not shown in FIG. 4) to be formed in the next step can be soldered easily, and the resist WA5 can be opened through the opening 5a. It can be made difficult to peel off. However, the shape of the opening 5a is not limited to the above rectangular or oval shape.
本発明に係る集積回路素子の実装方法は、以上のように
、印刷配線基板の配線パターンにおける各接続部上にそ
れぞれ半田膜を形成し、これらの半田膜上に集積回路素
子の各リード線を重ね合わせた状態で半田膜を溶融させ
ることにより各リード線と配線パターンとの接続を行う
集積回路素子の実装方法において、半田膜形成前の印刷
配線基板における配線パターンの少な(とも接続部上を
耐熱絶縁膜で被うと共に、配線パターンの各接続部上に
おいて、互いに隣接するもの同士がリード線の長手方向
に互い違いにずれた位置に開口する開口部をこの耐熱絶
縁膜にそれぞれ形成し、この耐熱絶縁膜の各開口部上に
前記半田膜を形成する構成をなしている。As described above, the integrated circuit element mounting method according to the present invention forms a solder film on each connection part in the wiring pattern of a printed wiring board, and connects each lead wire of the integrated circuit element on these solder films. In an integrated circuit mounting method in which each lead wire is connected to a wiring pattern by melting the solder film in an overlapping state, the wiring pattern on the printed wiring board before the solder film is formed is The heat-resistant insulating film is covered with a heat-resistant insulating film, and openings are formed in the heat-resistant insulating film so that adjacent leads are staggered in the longitudinal direction on each connection part of the wiring pattern. The solder film is formed on each opening of the heat-resistant insulating film.
これにより、半田膜が千鳥状に形成されるので、加熱溶
融によって周囲に拡散した際にも、隣接する半田膜同士
が接触するということがほとんどなくなる。As a result, the solder films are formed in a staggered pattern, so that even when the solder films are heated and melted and diffused into the surroundings, adjacent solder films hardly come into contact with each other.
従って、本発明の実装方法によれば、集積回路素子を印
刷配線基板上に高密度実装する際に端子間の短絡やリー
ド線のオーブン及びリード線と配線パターンとのずれを
防止することができるという効果を奏する。Therefore, according to the mounting method of the present invention, it is possible to prevent short circuits between terminals, oven of lead wires, and misalignment of lead wires and wiring patterns when high-density mounting of integrated circuit elements on a printed wiring board is performed. This effect is achieved.
第1図乃至第3図は本発明の一実施例を示すものであっ
て、第1図はPWB上の配線パターンの一部を示す部分
平面図、第2図(a)(b)はそれぞれ集積回路素子を
実装したPWBの部分縦断面図、第3図は半田膜溶融後
における集積回路素子を省略したPWBの部分平面図で
ある。第4図は本発明の他の実施例を示すものであって
、PWB上の配線パターンの一部を示す部分平面図であ
る。第5図乃至第7図は従来例を示すものであって、第
5図はPWB上の配線パターンの一部を示す部分平面図
、第6図は集積回路素子を実装したPWBの部分縦断面
図、第7図は半田膜溶融後におけるPWBの部分平面図
である。
1はPWB (印刷配線基板)、2は配線パターン、2
aは接続部、3は集積回路素子、4は半田膜、5はレジ
スト膜(耐熱絶縁膜)、5aは開口部である。
特許出願人 シャープ 株式会社冨
図
冨
図
冨
図1 to 3 show an embodiment of the present invention, in which FIG. 1 is a partial plan view showing a part of the wiring pattern on the PWB, and FIGS. 2(a) and 3(b) are respectively FIG. 3 is a partial vertical cross-sectional view of a PWB on which an integrated circuit element is mounted, and FIG. 3 is a partial plan view of the PWB with the integrated circuit element omitted after the solder film is melted. FIG. 4 shows another embodiment of the present invention, and is a partial plan view showing a part of the wiring pattern on the PWB. 5 to 7 show conventional examples, in which FIG. 5 is a partial plan view showing a part of the wiring pattern on the PWB, and FIG. 6 is a partial longitudinal section of the PWB on which integrated circuit elements are mounted. 7 are partial plan views of the PWB after the solder film is melted. 1 is PWB (printed wiring board), 2 is wiring pattern, 2
3 is a connection portion, 3 is an integrated circuit element, 4 is a solder film, 5 is a resist film (heat-resistant insulating film), and 5a is an opening. Patent applicant Sharp Tomizu Tomizu Co., Ltd.
Claims (1)
それぞれ半田膜を形成し、これらの半田膜上に集積回路
素子の各リード線を重ね合わせた状態で半田膜を溶融さ
せることにより各リード線と配線パターンとの接続を行
う集積回路素子の実装方法において、 半田膜形成前の印刷配線基板における配線パターンの少
なくとも接続部上を耐熱絶縁膜で被うと共に、配線パタ
ーンの各接続部上において、互いに隣接するもの同士が
リード線の長手方向に互い違いにずれた位置に開口する
開口部をこの耐熱絶縁膜にそれぞれ形成し、この耐熱絶
縁膜の各開口部上に前記半田膜を形成することを特徴と
する集積回路素子の実装方法。1. A solder film is formed on each connection part in the wiring pattern of the printed wiring board, and each lead wire of the integrated circuit element is overlaid on these solder films and the solder film is melted to separate each lead wire and wiring. In a method for mounting an integrated circuit element that connects to a pattern, at least the connecting portion of the wiring pattern on the printed wiring board before the solder film is formed is covered with a heat-resistant insulating film, and each connecting portion of the wiring pattern is covered with a heat-resistant insulating film, and each connecting portion of the wiring pattern is openings are formed in the heat-resistant insulating film at positions staggered in the longitudinal direction of the lead wire, and the solder film is formed on each opening of the heat-resistant insulating film. A method for mounting integrated circuit elements.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1081705A JPH02260596A (en) | 1989-03-31 | 1989-03-31 | Method of mounting integrated circuit chip |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1081705A JPH02260596A (en) | 1989-03-31 | 1989-03-31 | Method of mounting integrated circuit chip |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH02260596A true JPH02260596A (en) | 1990-10-23 |
Family
ID=13753799
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1081705A Pending JPH02260596A (en) | 1989-03-31 | 1989-03-31 | Method of mounting integrated circuit chip |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH02260596A (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP1545173A1 (en) * | 2003-12-16 | 2005-06-22 | Nitto Denko Corporation | Wiring circuit board |
| JP2014123592A (en) * | 2012-12-20 | 2014-07-03 | Ibiden Co Ltd | Process of manufacturing printed wiring board and printed wiring board |
| US12114434B2 (en) | 2020-01-08 | 2024-10-08 | Canon Kabushiki Kaisha | Method of mounting electronic component, substrate and an optical scanning apparatus |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6112267B2 (en) * | 1976-08-23 | 1986-04-07 | Hooru Matsuguruu Suchiibun |
-
1989
- 1989-03-31 JP JP1081705A patent/JPH02260596A/en active Pending
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6112267B2 (en) * | 1976-08-23 | 1986-04-07 | Hooru Matsuguruu Suchiibun |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP1545173A1 (en) * | 2003-12-16 | 2005-06-22 | Nitto Denko Corporation | Wiring circuit board |
| US7075017B2 (en) | 2003-12-16 | 2006-07-11 | Nitto Denko Corporation | Wiring circuit board |
| JP2014123592A (en) * | 2012-12-20 | 2014-07-03 | Ibiden Co Ltd | Process of manufacturing printed wiring board and printed wiring board |
| US12114434B2 (en) | 2020-01-08 | 2024-10-08 | Canon Kabushiki Kaisha | Method of mounting electronic component, substrate and an optical scanning apparatus |
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