JPH02270415A - Piezoelectric vibrator and frequency adjustment method - Google Patents
Piezoelectric vibrator and frequency adjustment methodInfo
- Publication number
- JPH02270415A JPH02270415A JP1092299A JP9229989A JPH02270415A JP H02270415 A JPH02270415 A JP H02270415A JP 1092299 A JP1092299 A JP 1092299A JP 9229989 A JP9229989 A JP 9229989A JP H02270415 A JPH02270415 A JP H02270415A
- Authority
- JP
- Japan
- Prior art keywords
- polymer film
- organic polymer
- high polymer
- organic high
- resonance frequency
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- Piezo-Electric Or Mechanical Vibrators, Or Delay Or Filter Circuits (AREA)
Abstract
Description
【発明の詳細な説明】
〈産業上の利用分野〉
本発明は、圧電振動子及び周波数調整方法に関し、振動
部に共振周波数調整用有機高分子膜を被着させることに
より、有機高分子膜の質量負荷作用を利用して、高精度
、高再現性を保ちながら、連続的に、高能率で、共振周
波数を調整し得るようにすると共に、リップルを減少さ
せ、伝送波形の乱れを小さくできるようにしたものであ
る。本発明の適用される圧電振動子には、セラミックま
たは圧電単結晶による圧電フィルタ、表面波フィルタ、
発振子または共振子等が含まれる。Detailed Description of the Invention <Industrial Application Field> The present invention relates to a piezoelectric vibrator and a frequency adjustment method, and the present invention relates to a piezoelectric vibrator and a frequency adjustment method. By utilizing the mass loading effect, it is possible to continuously and efficiently adjust the resonant frequency while maintaining high precision and high reproducibility, as well as reduce ripples and reduce disturbances in the transmitted waveform. This is what I did. Piezoelectric vibrators to which the present invention is applied include piezoelectric filters made of ceramic or piezoelectric single crystals, surface wave filters,
Includes an oscillator or resonator, etc.
〈従来の技術〉
この種の圧電振動子において、共振周波数を調整しよう
とする場合、圧電素体の実効的な厚みを調整する方法が
最も一般的である。<Prior Art> In this type of piezoelectric vibrator, when trying to adjust the resonance frequency, the most common method is to adjust the effective thickness of the piezoelectric element.
〈発明が解決しようとする課題〉
しかしながら、圧電素体の実効的な厚み制御によって共
振周波数を調整することは、圧電素体に対する機械加工
工程が必要となるため、容易なことではない。また、機
械加工によって、スプリアス増大、特性悪化等の問題も
生じる。<Problems to be Solved by the Invention> However, it is not easy to adjust the resonance frequency by effectively controlling the thickness of the piezoelectric element because it requires a machining process for the piezoelectric element. Furthermore, machining also causes problems such as an increase in spurious signals and deterioration of characteristics.
そこで、本発明の課題は、上述する従来の問題点を解決
し、高精度、高再現性を保ちながら、連続的に、高能率
で、共振周波数を調整し得るようにすると共に、リップ
ルを減少させ、伝送波形の乱れを小さくした圧電振動子
及び周波数調整方法を提供することである。Therefore, it is an object of the present invention to solve the above-mentioned conventional problems, to make it possible to continuously and efficiently adjust the resonance frequency while maintaining high precision and high reproducibility, and to reduce ripples. It is an object of the present invention to provide a piezoelectric vibrator and a frequency adjustment method in which disturbances in transmission waveforms are reduced.
〈課題を解決するための手段〉
上述する課題を解決するため、本発明に係る圧電振動子
は、圧電基板上に振動部を有する圧電振動子であって、
前記振動部に共振周波数調整用有機高分子膜が被着され
ていること
を特徴とする。 ゛
また、本発明に係る圧電振動子の共振周波数調整方法は
、振動部に被着される有機高分子膜の厚み制御により、
共振周波数を調整することを特徴とする。<Means for Solving the Problems> In order to solve the above-mentioned problems, a piezoelectric vibrator according to the present invention is a piezoelectric vibrator having a vibrating part on a piezoelectric substrate, and the vibrating part has an organic material for adjusting a resonance frequency. It is characterized by being coated with a polymer film.゛Furthermore, the method for adjusting the resonance frequency of a piezoelectric vibrator according to the present invention includes controlling the thickness of an organic polymer film applied to a vibrating part.
It is characterized by adjusting the resonance frequency.
く作用〉
圧電振動子の共振周波数は、振動部に被着された有機高
分子膜の有する質量負荷作用に応じて調整される０例え
ば、有機高分子膜の質量を増大させた場合には、質量負
荷作用が高くなり、共振周波数は低くなる方向に調整さ
れ、質量を減少させた場合は、反対に共振周波数が高く
なる方向に調整される。Effect> The resonant frequency of the piezoelectric vibrator is adjusted according to the mass loading effect of the organic polymer film attached to the vibrating part. For example, when the mass of the organic polymer film is increased, When the mass loading effect increases, the resonant frequency is adjusted to be lower, and when the mass is decreased, the resonant frequency is adjusted to be higher.
また、振動部周辺における有機高分子膜の存在により、
波生波が吸収されるので、リップルが減少し、伝送特性
が向上する。In addition, due to the presence of an organic polymer film around the vibrating part,
Since the raw waves are absorbed, ripples are reduced and transmission characteristics are improved.
本発明における周波数調整の基本原則は、振動部に付与
される有機高分子膜の質量負荷作用を利用することにあ
る０本発明においては、振動部に被着させる有機高分子
膜の厚み制御により、有機高分子膜の質量負荷作用を調
整し、それによって共振周波数を制御する。有機高分子
膜の厚み制御は、スピンコート法を用いて、高精度、高
再現性を保ちながら、連続的に高能率で行なうことがで
きる。また、圧電素体に対する機械加工が不要であるの
で、スプリアスが増大することもない。The basic principle of frequency adjustment in the present invention is to utilize the mass loading effect of the organic polymer film applied to the vibrating part. , to adjust the mass loading effect of the organic polymer film and thereby control the resonant frequency. The thickness of an organic polymer film can be controlled continuously and efficiently using a spin coating method while maintaining high precision and high reproducibility. Furthermore, since machining of the piezoelectric element is not required, spurious noise does not increase.
〈実施例〉
第１図は本発明に係る圧電振動子の平面図、第２図はＭ
１図Ａ、−Ａ、線上における断面図、第３図は同じく底
面図である。この実施例は、ＦＭｆｆＪｌｏ、７ＭＨｚ
フィルタとして使用されるエネルギー閉じ込め型の圧電
振動子を示している。<Example> FIG. 1 is a plan view of a piezoelectric vibrator according to the present invention, and FIG.
1A and -A are cross-sectional views along the line, and FIG. 3 is a bottom view. This example uses FMffJlo, 7MHz
It shows an energy-trapping piezoelectric vibrator used as a filter.
図において、１は圧電基板、２〜５は振動電極を構成す
る分割電極、６はコンデンサ電極、７は共通電極、８．
９は有機高分子膜である。In the figure, 1 is a piezoelectric substrate, 2 to 5 are divided electrodes constituting a vibrating electrode, 6 is a capacitor electrode, 7 is a common electrode, and 8.
9 is an organic polymer film.
圧電基板１はセラミックであっても、圧電単結晶であっ
てもよい。分割電極２〜５のうち、分割電極２と分割電
極３とは、圧電基板１の同一面上で間隔ｄ１を隔てて対
向し、第１の振動部（イ）を構成している。また、分割
電極４と分割電極５とは、分割電極２．３と同一の面上
において、間隔ｄ、を隔てて対向し、第２の振動部（ロ
）を構成している。分割電極２は、リード電極２１を通
して端子電極２２に導通し、分割電極５はリード電極５
１を通して端子電極５２に導通させである。The piezoelectric substrate 1 may be made of ceramic or a piezoelectric single crystal. Among the divided electrodes 2 to 5, the divided electrode 2 and the divided electrode 3 face each other on the same surface of the piezoelectric substrate 1 with a distance d1 between them, and constitute a first vibrating section (a). Further, the divided electrode 4 and the divided electrode 5 face each other with an interval d on the same surface as the divided electrode 2.3, and constitute a second vibrating section (b). The divided electrode 2 is electrically connected to the terminal electrode 22 through the lead electrode 21, and the divided electrode 5 is connected to the terminal electrode 22 through the lead electrode 21.
1 to the terminal electrode 52.
コンデンサ電極６は、分割電極３に対してリード電極３
１を通して導通し、分割電極４に対してリード電極４１
を通して導通している。The capacitor electrode 6 has a lead electrode 3 with respect to the split electrode 3.
1 and lead electrode 41 to divided electrode 4.
It conducts through.
共通電極７は、分割電極２．３と共通に対向する電極部
７１、分割ｔｉ４．５と共通に対向する電極部７２及び
コンデンサ電極６と対向する電極部７３を有している。The common electrode 7 has an electrode part 71 that commonly faces the divided electrode 2.3, an electrode part 72 that commonly faces the divided electrode ti4.5, and an electrode part 73 that faces the capacitor electrode 6.
電極部７１．７２及び電極部７３は電気的に互いに導通
している。The electrode portions 71 and 72 and the electrode portion 73 are electrically connected to each other.
有機高分子膜８は、分割電極２．３による第１の振動部
（イ）を覆うように、圧電基板からの厚みｔｌをもって
被着されており、有機高分子膜９は分割電極４．５によ
る第２の振動部（ロ）を覆うように、厚みｔｌをもって
被着されている。The organic polymer film 8 is deposited with a thickness tl from the piezoelectric substrate so as to cover the first vibrating part (a) formed by the divided electrodes 2.3, and the organic polymer film 9 is applied to the divided electrodes 4.5. The second vibrating part (b) is covered with a thickness tl.
第１の振動部（イ）及び第２の振動部（ロ）における固
有共振周波数は、この有機高分子膜８．９の質量負荷作
用に応じて変化する。有機高分子膜８．９の質量は、有
機高分子の密度及び体積によりて定まる。従って、有機
高分子の密度、厚み及び平面積を選定することにより、
第１の振動部（イ）及び第２の振動部（ロ）に対する有
機高分子膜８．９の質量負荷作用を調整し、共振周波数
を調整できる。The natural resonance frequencies of the first vibrating section (a) and the second vibrating section (b) change according to the mass loading effect of the organic polymer film 8.9. The mass of the organic polymer film 8.9 is determined by the density and volume of the organic polymer. Therefore, by selecting the density, thickness and planar area of the organic polymer,
The resonance frequency can be adjusted by adjusting the mass loading effect of the organic polymer film 8.9 on the first vibrating section (a) and the second vibrating section (b).
第４図は第１図〜第３図に示した圧電振動子の電気的シ
ンボル図であり、Ｃ３はコンデンサ電極６と共通電８ｉ
７の電極部７３との間に形成されたコンデンサである。FIG. 4 is an electrical symbol diagram of the piezoelectric vibrator shown in FIGS.
This is a capacitor formed between the electrode portion 73 of No. 7 and the electrode portion 73 of No. 7.
次に、本発明に係る周波数調整方法について、第５図〜
第１１図を参照して説明する。共振周波数の調整は、基
本的には、振動部に対する有機高分子膜の質量負荷作用
によることは前述した通りである。有機高分子膜の質量
負荷作用の調整手段として、本発明においては、有機高
分子膜の厚み制御を行なう。これにより、共振周波数を
容易に調整することができ払。Next, regarding the frequency adjustment method according to the present invention, FIGS.
This will be explained with reference to FIG. As mentioned above, the resonance frequency is basically adjusted by the mass loading effect of the organic polymer film on the vibrating section. In the present invention, as a means for adjusting the mass load effect of the organic polymer film, the thickness of the organic polymer film is controlled. This allows the resonant frequency to be easily adjusted.
まず、第５図に示すように、１枚の圧電基板１の上に、
多数の圧電振動子Ｑ、〜Ｑｎを格子状に配列したウェハ
ーを用意する。圧電振動子Ｑ１〜Ｑｎのそれぞれは、第
６図及び第７図に拡大して示すような電極構造を有する
。この電極構造は、有機高分子膜がない点を除けば、第
１図〜第３図に示したものと実質的に同一の構造である
ので、その詳説は省略する。First, as shown in FIG. 5, on one piezoelectric substrate 1,
A wafer in which a large number of piezoelectric vibrators Q, to Qn are arranged in a grid is prepared. Each of the piezoelectric vibrators Q1 to Qn has an electrode structure as shown enlarged in FIGS. 6 and 7. This electrode structure is substantially the same as that shown in FIGS. 1 to 3, except for the absence of an organic polymer film, so a detailed explanation thereof will be omitted.
次に、ウェハー上で、圧電振動子Ｑ１〜Ｑｒ１の幾つか
について、共振周波数を測定する。ここで得られた測定
値は、次のスピンコート工程における回転数制御信号と
して利用する。Next, the resonance frequencies of some of the piezoelectric vibrators Q1 to Qr1 are measured on the wafer. The measured value obtained here is used as a rotation speed control signal in the next spin coating process.
次に、第８図に示すように、モータ等の回転駆動源によ
って、ウェハーの面に垂直な軸線０．を回転中心にして
、ウェハーを矢印ａで示す方向に回転させながら、有機
高分子液を滴下してスピンコートを行なう、これにより
、第９図に示すように、ウェハーの全面に有機高分子膜
１２が塗布される。Next, as shown in FIG. 8, a rotary drive source such as a motor is used to move the wafer along the axis 0, which is perpendicular to the surface of the wafer. While rotating the wafer in the direction shown by arrow a with the wafer as the center of rotation, the organic polymer liquid is dripped and spin-coated. As a result, as shown in Figure 9, an organic polymer film is formed on the entire surface of the wafer. 12 is applied.
スピンコートの利点は、まず、回転数制御により、有機
高分子膜１２の膜厚を連続的に制御できることである。The advantage of spin coating is that the thickness of the organic polymer film 12 can be continuously controlled by controlling the rotation speed.
更に、有機高分子膜１２を高速度で塗布でき、作業性が
良好であること、厚みｔｌが均一でバラツキのない高精
度の有機高分子膜１２を形成できること、再現性がよい
こと等の利点も得られる。Furthermore, the organic polymer film 12 can be coated at high speed, has good workability, can form a highly accurate organic polymer film 12 with a uniform thickness tl without variation, and has good reproducibility. You can also get
使用する有機高分子としては、感光性レジストが適して
いる。感光性レジストを使用すると、フォトリソグラフ
ィによる高精度パターン形成が可能である。感光性レジ
ストはポジ、ネガの何れでもよい。A photosensitive resist is suitable as the organic polymer to be used. When a photosensitive resist is used, high-precision pattern formation by photolithography is possible. The photosensitive resist may be either positive or negative.
有機高分子膜１２の厚みｔｌは、粘度を選択すると、回
転数の制御によって容易に制御できる。The thickness tl of the organic polymer film 12 can be easily controlled by controlling the rotation speed by selecting the viscosity.
従って、レジスト粘度の選択及び回転数の制御により、
有機高分子膜１２の厚みｔｌを制御し、共振周波数を容
易に調整することができる。第１２図は有機高分子粘度
をパラメータとして、回転数を変化させた場合の共振周
波数変化特性を示す実測データである。図において、横
軸に回転数（ｒｐｍ）をとり、縦軸に周波数変化量△ｆ
０（ｋＨｚ）をとっである。有機高分子粘度は特性り３
、Ｌ２、Ｌ。Therefore, by selecting the resist viscosity and controlling the rotation speed,
By controlling the thickness tl of the organic polymer film 12, the resonance frequency can be easily adjusted. FIG. 12 shows measured data showing the resonance frequency change characteristics when the rotational speed is changed using the organic polymer viscosity as a parameter. In the figure, the horizontal axis represents the rotation speed (rpm), and the vertical axis represents the amount of frequency change △f
0 (kHz) is taken. Organic polymer viscosity is characteristic 3
,L2,L.
の順序で大きい。Larger in the order of.
第１２図のデータから明らかなように、回転数の制御に
より、共振周波数を連続的に制御できる。従って、共振
周波数を高精度で調整することが可能である。再現性に
関しては、１０回の繰返し測定における周波数バラツキ
σが、粘度曲線及び回転数が同じ場合は３％以内、ウェ
ハー面内では５％以内に収まった。As is clear from the data in FIG. 12, the resonance frequency can be continuously controlled by controlling the rotation speed. Therefore, it is possible to adjust the resonant frequency with high precision. Regarding reproducibility, the frequency variation σ in 10 repeated measurements was within 3% when the viscosity curve and rotation speed were the same, and within 5% within the wafer surface.
回転数制御は、第１２図のデータをテーブルにし、スピ
ンコート工程の前に得られたウェハー内の圧電振動子Ｑ
Ｉ−Ｑｎの共振周波数測定値に基づいて行なう。共振周
波数測定及びそれに基づく回転数制御は、コンピュータ
制御システムを用いて、自動的に行なうことができる。The rotation speed is controlled using the data shown in Figure 12 as a table, and the piezoelectric vibrator Q inside the wafer obtained before the spin coating process.
This is done based on the measured value of the I-Qn resonance frequency. Resonant frequency measurement and rotational speed control based thereon can be performed automatically using a computer control system.
次に、ブリベーク工程おいて有機高分子膜１２をブリベ
ータ化した後、第１０図に示すように、フォトマスク１
３を当て露光する。フォトマスク１３は、振動部（イ）
、（ロ）に有機高分子膜を残すパターンを有している。Next, after the organic polymer film 12 is blivatized in a bribake process, a photomask 1 is formed as shown in FIG.
3 and expose. The photomask 13 is a vibrating part (a)
, (b) has a pattern that leaves an organic polymer film.
露光は有機高分子膜１２に応じた波長の光を用いる。For exposure, light having a wavelength depending on the organic polymer film 12 is used.
次に、現像することにより、第１１図に示すように、振
動部（イ）、（ロ）を覆う有機高分子膜８．９のパター
ンが得られる。この後、有機高分子膜８．９を硬化させ
て完成する。Next, by developing, as shown in FIG. 11, a pattern of an organic polymer film 8.9 covering the vibrating parts (a) and (b) is obtained. Thereafter, the organic polymer film 8.9 is cured and completed.
上述の、ウェハー上の圧電振動子ＱＩ−Ｑｎの共振周波
数測定、スピンコート、プリベータ、露光、現像及び硬
化の各工程は、一連に配置されたライン上で連続的に行
なうのがよい。The above-mentioned steps of measuring the resonance frequency of the piezoelectric vibrators QI-Qn on the wafer, spin coating, prebeta, exposure, development, and curing are preferably performed continuously on a series of lines.
実施例では、エネルギー閉じ込め型の２素子タイプの圧
電振動子を例にとフて説明したが、付加される有機高分
子膜の質量負荷作用によって、共振周波数が調整できる
ものであれば、他のタイプの圧電フィルタ、表面波フィ
ルタ、発掘子または共振子等であっても、適用が可能で
ある。また、材料面からはセラミックまたは圧電単結晶
の何れの圧電基板でもよく、振動モードからは厚み縦振
動、表面波モードなどにも適用が可能である。In the example, explanation was given using an energy trap type two-element type piezoelectric vibrator as an example, but other types can be used as long as the resonant frequency can be adjusted by the mass loading effect of the added organic polymer film. Other types of piezoelectric filters, surface wave filters, excavators or resonators are also applicable. Further, from the material point of view, either a ceramic or a piezoelectric single crystal piezoelectric substrate may be used, and from the vibration mode, it is also applicable to thickness longitudinal vibration, surface wave mode, etc.
〈発明の効果〉
以上述べたように、本発明によれば、次のような効果が
得られる。<Effects of the Invention> As described above, according to the present invention, the following effects can be obtained.
（ａ）！動部に共振周波数調整用の有機高分子膜が被着
されているので、有機高分子膜の有する質量負荷作用に
応じて、共振周波数を調整し得る圧電振動子を提供でき
る。(a)! Since the organic polymer film for adjusting the resonant frequency is attached to the moving part, it is possible to provide a piezoelectric vibrator whose resonant frequency can be adjusted according to the mass load effect of the organic polymer film.
（ｂ）振動部周辺における有機高分子膜の存在により、
リップルを減少させ、伝送特性を向上させた圧電振動子
を提供できる。(b) Due to the presence of an organic polymer film around the vibrating part,
A piezoelectric vibrator with reduced ripple and improved transmission characteristics can be provided.
（Ｃ）振動部に被着される有機高分子膜の厚み制御によ
り、共振周波数を調整する方法であるから、スピンコー
ト法を用い、高精度、高再現性を保ちながら、連続的に
、高能率で共振周波数を調整し得る周波数調整方法を提
供できる。(C) Since this method adjusts the resonance frequency by controlling the thickness of the organic polymer film applied to the vibrating part, it uses a spin coating method to continuously achieve high A frequency adjustment method that can efficiently adjust the resonant frequency can be provided.
（ｄ）圧電素体に対する機械加工を伴わないので、スプ
リアスレベルの低い圧電振動子を提供できる。(d) Since machining of the piezoelectric element is not required, a piezoelectric vibrator with a low spurious level can be provided.
第１図は本発明に係る圧電振動子の平面図、第２図は第
１図ＡＩ Ａｔ線上における断面図、゛第３図は同じく
底面図、第４図は第１図〜第３図に示した圧電振動子の
電気的シンボル図、第５図は多数の圧電振動子Ｑ＋〜Ｑ
、を格子状に配列したウェハーの斜視図、第６図は′ｓ
５図に示したウェハー上の圧電振動子Ｑ１〜Ｑ０の構造
を拡大して示す平面図、Ｎ７図は第６図Ａｓ−Ａ３線上
における断面図、第８図は有機高分子のスピンコート方
法を示す図、第９図〜第１１図は周波数調整の各工程に
おける要部の拡大断面図、第１２図は有機高分子粘度を
パラメータとして、回転数を変化させた場合の共振周波
数変化特性を示す実測データである。
１・・・圧電基板
２〜５・・・分割電極
６・・・コンデンサ電極
７・・・共通電極
８．９・・・有機高分子膜
第３図
第４図
を
第５図
第６図
第７図
第８図
第９図
第１０図
第１１図
第１２図
補正の内容
手続補正書
平成 ２年 ４月２４日
平成 １年 特許願 第９２２９９号
圧電振動子及び周波数調整方法
代表者 佐 藤 博 ′
５、補正命令の日付 自発補正
６、補正の対象 （１）明細書の発明の詳細な説
明の欄（２）図面の第１２図
に「次に、・・・・・を行なう。」とあるのを、「次に
、有機高分子液を滴下した後、第８図に示すように、モ
ータ等の回転駆動源によって、ウェハーの面に垂直な軸
線０１を回転中心にして、ウニパーな矢印ａで示す方向
に回転させスピンコートを行なう。」と補正する。
（２）明細書第９頁第２行に「有機高分子」とあるのを
、「有機高分子材」と補正する。
（３）明細書第１０頁第１２行に「プリベーク化」とあ
るのを、「プリベーク」と補正する。
（４）図面の第１２図を別紙の通り補正する。
第１２図
回転蚊（ｒｐｍ ）□1 is a plan view of a piezoelectric vibrator according to the present invention, FIG. 2 is a sectional view taken along the line AI At in FIG. 1, FIG. 3 is a bottom view, and FIG. The electrical symbol diagram of the piezoelectric vibrator shown in Fig. 5 is a large number of piezoelectric vibrators Q+ to Q.
, is a perspective view of a wafer arranged in a grid pattern.
Figure 5 is a plan view showing an enlarged structure of the piezoelectric vibrators Q1 to Q0 on the wafer shown in Figure 5, Figure N7 is a cross-sectional view taken along line As-A3 in Figure 6, and Figure 8 shows the spin coating method for organic polymers. Figures 9 to 11 are enlarged sectional views of the main parts in each step of frequency adjustment, and Figure 12 shows the resonance frequency change characteristics when the rotation speed is changed using the organic polymer viscosity as a parameter. This is actually measured data. 1...Piezoelectric substrate 2-5...Divided electrode 6...Capacitor electrode 7...Common electrode 8.9...Organic polymer film Figure 3 Figure 4 Figure 5 Figure 6 Figure 7 Figure 8 Figure 9 Figure 10 Figure 11 Figure 12 Contents of amendment Procedure Amendment document April 24, 1990 1999 Patent application No. 92299 Piezoelectric vibrator and frequency adjustment method Representative Hiroshi Sato ' 5. Date of amendment order Voluntary amendment 6. Subject of amendment (1) Detailed description of the invention in the specification (2) Figure 12 of the drawings: "Next,..." ``Next, after dropping the organic polymer liquid, as shown in Figure 8, a rotational driving source such as a motor is used to rotate the wafer with an axis 01 perpendicular to the surface of the wafer, as shown in Figure 8. Rotate in the direction indicated by a to perform spin coating.'' (2) In the second line of page 9 of the specification, the phrase "organic polymer" is corrected to read "organic polymer material." (3) The phrase "prebaking" on page 10, line 12 of the specification is corrected to "prebaking." (4) Correct Figure 12 of the drawings as shown in the attached sheet. Figure 12 Rotating mosquito (rpm) □
Claims (3)
、 前記振動部に共振周波数調整用の有機高分子膜が被着さ
れていること を特徴とする圧電振動子。(1) A piezoelectric vibrator having a vibrating section on a piezoelectric substrate, the vibrating section being coated with an organic polymer film for adjusting a resonance frequency.
波数を調整する方法であって、 前記振動部に被着される有機高分子膜の厚み制御により
、共振周波数を調整すること を特徴とする圧電振動子の周波数調整方法。(2) A method for adjusting the resonant frequency of a piezoelectric vibrator having a vibrating part on a piezoelectric substrate, characterized in that the resonant frequency is adjusted by controlling the thickness of an organic polymer film applied to the vibrating part. A method for adjusting the frequency of a piezoelectric vibrator.
分子材をスピンコートする工程を含み、前記スピンコー
トにおける回転数制御により、前記振動部に塗布される
有機高分子膜の厚み制御を行なうことを特徴とする特許
請求の範囲第２項に記載の圧電振動子の周波数調整方法
。(3) A step of spin-coating an organic polymer material on the surface of the piezoelectric substrate having the vibrating part, and controlling the thickness of the organic polymer film applied to the vibrating part by controlling the rotation speed in the spin coating. A method for adjusting the frequency of a piezoelectric vibrator according to claim 2, wherein the method comprises: performing the following steps.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9229989A JP2954233B2 (en) | 1989-04-12 | 1989-04-12 | Adjustment method of resonance frequency of piezoelectric vibrator |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9229989A JP2954233B2 (en) | 1989-04-12 | 1989-04-12 | Adjustment method of resonance frequency of piezoelectric vibrator |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH02270415A true JPH02270415A (en) | 1990-11-05 |
| JP2954233B2 JP2954233B2 (en) | 1999-09-27 |
Family
ID=14050532
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP9229989A Expired - Lifetime JP2954233B2 (en) | 1989-04-12 | 1989-04-12 | Adjustment method of resonance frequency of piezoelectric vibrator |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2954233B2 (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH04131026U (en) * | 1991-05-20 | 1992-12-01 | 株式会社村田製作所 | Piezoelectric vibrating parts |
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|---|---|---|---|---|
| JPS50150394A (en) * | 1974-05-21 | 1975-12-02 | ||
| JPS5518190A (en) * | 1978-07-27 | 1980-02-08 | Nec Corp | Frequency adjustment method for high-coupled piezoelectric oscillator |
| JPS566518A (en) * | 1979-06-28 | 1981-01-23 | Noto Denshi Kogyo Kk | Piezoelectric parts and its manufacture |
| JPS56149109A (en) * | 1980-04-19 | 1981-11-18 | Fujitsu Ltd | Elastic surface wave device |
| JPS56154813A (en) * | 1980-04-30 | 1981-11-30 | Murata Mfg Co Ltd | Fine adjusting method for resonance frequency of energy shut-in type piezoelectric oscillator and its products |
| JPS5933915A (en) * | 1982-08-19 | 1984-02-24 | Murata Mfg Co Ltd | Frequency adjusting method of piezoelectric resonator |
| JPS6074624A (en) * | 1983-09-30 | 1985-04-26 | Fujitsu Ltd | Formation of resist film |
| JPS61246990A (en) * | 1985-04-24 | 1986-11-04 | Fujitsu Ltd | Method and device for spin coating |
| JPS61288506A (en) * | 1985-06-14 | 1986-12-18 | Murata Mfg Co Ltd | Piezoelectric parts element and manufacture of piezoelectric parts using it |
| JPS63178615A (en) * | 1987-01-20 | 1988-07-22 | Sony Corp | Manufacture of surface acoustic wave element |
| JPS6449411A (en) * | 1987-08-20 | 1989-02-23 | Tdk Corp | Manufacture of energy confinement type piezoelectric vibrator |
-
1989
- 1989-04-12 JP JP9229989A patent/JP2954233B2/en not_active Expired - Lifetime
Patent Citations (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS50150394A (en) * | 1974-05-21 | 1975-12-02 | ||
| JPS5518190A (en) * | 1978-07-27 | 1980-02-08 | Nec Corp | Frequency adjustment method for high-coupled piezoelectric oscillator |
| JPS566518A (en) * | 1979-06-28 | 1981-01-23 | Noto Denshi Kogyo Kk | Piezoelectric parts and its manufacture |
| JPS56149109A (en) * | 1980-04-19 | 1981-11-18 | Fujitsu Ltd | Elastic surface wave device |
| JPS56154813A (en) * | 1980-04-30 | 1981-11-30 | Murata Mfg Co Ltd | Fine adjusting method for resonance frequency of energy shut-in type piezoelectric oscillator and its products |
| JPS5933915A (en) * | 1982-08-19 | 1984-02-24 | Murata Mfg Co Ltd | Frequency adjusting method of piezoelectric resonator |
| JPS6074624A (en) * | 1983-09-30 | 1985-04-26 | Fujitsu Ltd | Formation of resist film |
| JPS61246990A (en) * | 1985-04-24 | 1986-11-04 | Fujitsu Ltd | Method and device for spin coating |
| JPS61288506A (en) * | 1985-06-14 | 1986-12-18 | Murata Mfg Co Ltd | Piezoelectric parts element and manufacture of piezoelectric parts using it |
| JPS63178615A (en) * | 1987-01-20 | 1988-07-22 | Sony Corp | Manufacture of surface acoustic wave element |
| JPS6449411A (en) * | 1987-08-20 | 1989-02-23 | Tdk Corp | Manufacture of energy confinement type piezoelectric vibrator |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH04131026U (en) * | 1991-05-20 | 1992-12-01 | 株式会社村田製作所 | Piezoelectric vibrating parts |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2954233B2 (en) | 1999-09-27 |
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