JPH02270974A - Surface coloring method - Google Patents
Surface coloring methodInfo
- Publication number
- JPH02270974A JPH02270974A JP8969989A JP8969989A JPH02270974A JP H02270974 A JPH02270974 A JP H02270974A JP 8969989 A JP8969989 A JP 8969989A JP 8969989 A JP8969989 A JP 8969989A JP H02270974 A JPH02270974 A JP H02270974A
- Authority
- JP
- Japan
- Prior art keywords
- film
- base material
- ions
- gaseous
- vacuum chamber
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Solid-Phase Diffusion Into Metallic Material Surfaces (AREA)
- Physical Vapour Deposition (AREA)
- ing And Chemical Polishing (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は、装身具、建材等の製品の装飾作業等に適用さ
れる金属表面の着色方法に関する。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a method for coloring metal surfaces, which is applied to decorative work of products such as accessories and building materials.
従来、ステンレス鋼等の着色方法としては、Ｔｉｃ 、
ＴｉＮ等のセラミックス皮膜の蒸着方法か、チタン又
はステンレス本体に直接化学エツチングする方法があっ
た。Conventionally, methods for coloring stainless steel etc. include Tic,
There was a method of vapor deposition of a ceramic film such as TiN, or a method of chemically etching directly onto the titanium or stainless steel body.
従来方法のＴｉＮ、Ｔｉｃ皮膜を蒸着させる着色方法で
は、ＴｉＮは黄金色ＴｉＣは黒色の着色のみしかできな
い。またチタン及びステンレス鋼本体に直接化学エツチ
ングする方法では任意の色彩を得ることができるが、表
面の凹凸により金属光沢のような輝きにかける。In the conventional coloring method of depositing a TiN or Tic film, TiN can only be colored golden and TiC can only be colored black. Furthermore, by directly chemically etching the titanium or stainless steel body, it is possible to obtain any desired color, but the unevenness of the surface gives it a shine similar to that of a metallic luster.
本発明は、従来着色方法の上記問題点を解決しようとす
るものである。The present invention aims to solve the above-mentioned problems of conventional coloring methods.
本発明の表面着色方法は、基材表面にチタニウムを真空
蒸着させて皮膜を形成し友上、同皮膜表面を酸素又はア
セチレンガス雰囲気中でイオンボンバード処理すること
を特徴とする。The surface coloring method of the present invention is characterized by vacuum-depositing titanium on the surface of a substrate to form a film, and then subjecting the surface of the film to ion bombardment treatment in an oxygen or acetylene gas atmosphere.
本発明では、基材表面にチタニウム（以下Ｔｉと記す）
を真空蒸発させてＴｉ皮膜を形成する。In the present invention, titanium (hereinafter referred to as Ti) is used on the surface of the base material.
is evaporated in vacuum to form a Ti film.
この皮膜に酸素又はアセチレン雰囲気中でイオンボンバ
ード処理することによって、着色ガスイオンがＴｉ皮膜
に打込まれる。このガスイオンの打込む深さとガスイオ
ンとＴｉとの結合状態とを制御することＫよって、種々
の色彩の皮膜が基板の表面に形成される。By subjecting this film to ion bombardment in an oxygen or acetylene atmosphere, colored gas ions are implanted into the Ti film. By controlling the implantation depth of the gas ions and the bonding state between the gas ions and Ti, films of various colors are formed on the surface of the substrate.
まえ、本発明において、皮膜表面には凹凸がなく、金属
光沢をもった着色表面が得られる。First, in the present invention, the coating surface has no irregularities and a colored surface with metallic luster can be obtained.
本発明の実施例における工程を第１図によって説明する
。The steps in an embodiment of the present invention will be explained with reference to FIG.
まず基材３を真空槽１内の所定の位置にセットする。つ
ぎに図示を省略した排気系１４４ｃよって真空槽１内を
排気し、真空度５ Ｘ １０−５ Ｔｏｒｒ程度の真空
状態とする。真空度が所定の値になったところで、ヒー
タ４により基板３を３５０℃〜５００℃に加熱する。First, the base material 3 is set at a predetermined position within the vacuum chamber 1. Next, the inside of the vacuum chamber 1 is evacuated by an exhaust system 144c (not shown) to a vacuum state of approximately 5×10 −5 Torr. When the degree of vacuum reaches a predetermined value, the substrate 3 is heated to 350°C to 500°C by the heater 4.
次に真空槽１内に配置されたルツボ２内にセットされた
金属Ｔｉ５を、ホロカン−ドアとルツボ２の間に電圧を
印加することＫよって蒸発させ同時にこのＴｉ蒸気をイ
オン化し、基材表面に真空蒸着を行なって皮膜を形成す
る。Next, the metal Ti 5 set in the crucible 2 placed in the vacuum chamber 1 is evaporated by applying a voltage between the holocan door and the crucible 2, and at the same time this Ti vapor is ionized, and the surface of the base material is A film is formed by vacuum evaporation.
以上の真空蒸着によってＴｉの蒸着が行なわれ九後、真
空槽内の圧力を５ Ｘ １０−５’ｌ’ｏｒｒ以下にす
る。真空槽ＩＫは、ニードル弁１０をもつ酸素ガスボン
ベ１１及びニードル弁１２をもってアセリレンガスボン
ベ１３がニードル弁８を介して接続されており、着色ガ
スとしての酸素ガス又はアセチレンガスな、前記５ Ｘ
１０ ＝Ｔｏｒｒ以下の真空槽１内に供給し、真空槽
】内の圧力を１．５Ｔｏｒｒとする。この状態で基材３
に５００Ｖの電圧を印加してグロー放電を発生させる。After Ti is deposited by the above vacuum deposition, the pressure in the vacuum chamber is reduced to 5.times.10@-5'l'orr or less. The vacuum chamber IK is connected to an oxygen gas cylinder 11 having a needle valve 10 and an acetylene gas cylinder 13 having a needle valve 12 via a needle valve 8, and the above-mentioned 5
10 = Torr or less into the vacuum chamber 1, and the pressure inside the vacuum chamber is set to 1.5 Torr. In this state, base material 3
A voltage of 500 V is applied to generate glow discharge.
これＫよって、基材３上に形成されたＴｉ皮膜に着色ガ
スイオンとしての酸素イオン、炭素イオン等−が打込ま
れ、ガスイオン量によりＴｉ皮膜の深さ方向に着色ガス
イオンとＴｉとの結合が起り、その結合状態と深さとに
よって糧々の色彩の着色表面が得られる。As a result, oxygen ions, carbon ions, etc. as colored gas ions are implanted into the Ti film formed on the base material 3, and depending on the amount of gas ions, the colored gas ions and Ti are mixed in the depth direction of the Ti film. Bonding occurs, and depending on the bonding state and depth, a colored surface with a variety of colors is obtained.
上記工程による本発明の実施例について以下説明する。Examples of the present invention based on the above steps will be described below.
（実施例１）
鋼の基材上にＴｉを１μｍ蒸着した後に１着色ガスとし
て酸素を使用してイオンボンバード処理をし、その処理
深さを１００〜２００又とした。(Example 1) After 1 μm of Ti was vapor-deposited on a steel base material, ion bombardment treatment was performed using oxygen as a coloring gas, and the treatment depth was set to 100 to 200 layers.
この結果、金色に着色された表面が得られた。This resulted in a golden colored surface.
（実施例２）
鋼の基材上にＴｉ １に１μｍ蒸着した後に、着色ガス
として酸素を使用してイオンボンバード処理金し、その
処理深場を４００〜５００Ｘとした。この結果、青色に
着色された表面が得られた。(Example 2) After evaporating Ti 1 to a thickness of 1 μm on a steel base material, ion bombardment was performed using oxygen as a coloring gas, and the processing depth was set at 400 to 500X. As a result, a blue colored surface was obtained.
（実施例３）
鋼の基材上にＴｉを１μｍ蒸着した後に、着色ガスとし
て酸素を使用してイオンボンバード処理をし、その処理
深さを７００〜５ｓｏＸとした。この結果、黄色に°着
色された表面が得られた。(Example 3) After 1 μm of Ti was vapor-deposited on a steel base material, ion bombardment treatment was performed using oxygen as a coloring gas, and the treatment depth was set to 700 to 5soX. This resulted in a yellow colored surface.
（実施例４）
鋼の基材上に、Ｔｉを５ｏｏｏＸ蒸着した後に、着色ガ
スとしてアセチレンを使用してイオンボンバード処理を
し、その処理深さを５ｏｏｏＸとした。この結果、Ｔｉ
が炭素イオンと結合したことにより、黒っぽい銀色に着
色された表面が得られた。(Example 4) After 5oooX of Ti was vapor-deposited on a steel base material, ion bombardment treatment was performed using acetylene as a coloring gas, and the processing depth was set to 5oooX. As a result, Ti
By combining with carbon ions, a dark silver colored surface was obtained.
なお、基材として、ステンレス鋼板及び一般鋼板を用い
たところ、共に同様な色彩を得ることができた。Note that when a stainless steel plate and a general steel plate were used as the base materials, similar colors could be obtained in both cases.
上記実施例は、−の基材を用いているが、本発明は真空
装着によってＴｉ皮膜が形成される他の金属、非金属の
基材に適用することができる。Although the above embodiment uses a negative base material, the present invention can be applied to other metal and non-metal base materials on which a Ti film is formed by vacuum mounting.
以上の説明したように、本発明は、真空蒸着によって、
基材表面にＴｉ皮膜を形成した上、着色ガス雰囲気中で
同皮膜にイオンボンバードを行なうことによって、皮膜
に打込まれる着色ガスイオン量によりＴｉ皮膜の深さ方
向に着色ガスイオンがＴｉと給合し、その結合状態と深
さを制御することＫより各種の任意な色彩のＴｉ皮膜を
基材の表面に形成することができる５As explained above, the present invention uses vacuum evaporation to
By forming a Ti film on the surface of the base material and then ion bombarding the film in a colored gas atmosphere, colored gas ions are supplied with Ti in the depth direction of the Ti film depending on the amount of colored gas ions injected into the film. By combining and controlling the bonding state and depth, Ti films of various arbitrary colors can be formed on the surface of the base material5.
【図面の簡単な説明】
第１図は、本発明の実施例に用いられる装置の概略の構
成を示す説明図である。
１・・・真空槽、 ２・・・ルツボ、 ３・・・基材
、４・・・ヒータ、 ５・・・金属チタニウム。
７・・・ホロカソード、 ８・・・ニードル弁、１０
・・・ニードル弁、
１１・・・酸素ガスボンベ。
１２・・・ニードル弁。
１３・・・アセチレンガスボンベ。
代理人 弁理士 坂 間 暁 外２毛屑１スBRIEF DESCRIPTION OF THE DRAWINGS FIG. 1 is an explanatory diagram showing a schematic configuration of an apparatus used in an embodiment of the present invention. DESCRIPTION OF SYMBOLS 1... Vacuum chamber, 2... Crucible, 3... Base material, 4... Heater, 5... Metal titanium. 7... Holo cathode, 8... Needle valve, 10
...Needle valve, 11...Oxygen gas cylinder. 12... Needle valve. 13...Acetylene gas cylinder. Agent Patent Attorney Akatsuki Sakama
Claims (1)
上、同皮膜表面を酸素又はアセチレンガス雰囲気中でイ
オンボンバード処理することを特徴とする表面着色方法
。A surface coloring method characterized by forming a film by vacuum-depositing titanium on the surface of a substrate, and then subjecting the surface of the film to ion bombardment treatment in an oxygen or acetylene gas atmosphere.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8969989A JPH02270974A (en) | 1989-04-11 | 1989-04-11 | Surface coloring method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8969989A JPH02270974A (en) | 1989-04-11 | 1989-04-11 | Surface coloring method |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH02270974A true JPH02270974A (en) | 1990-11-06 |
Family
ID=13978019
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP8969989A Pending JPH02270974A (en) | 1989-04-11 | 1989-04-11 | Surface coloring method |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH02270974A (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8269931B2 (en) | 2009-09-14 | 2012-09-18 | The Aerospace Corporation | Systems and methods for preparing films using sequential ion implantation, and films formed using same |
| US8946864B2 (en) | 2011-03-16 | 2015-02-03 | The Aerospace Corporation | Systems and methods for preparing films comprising metal using sequential ion implantation, and films formed using same |
| US9324579B2 (en) | 2013-03-14 | 2016-04-26 | The Aerospace Corporation | Metal structures and methods of using same for transporting or gettering materials disposed within semiconductor substrates |
-
1989
- 1989-04-11 JP JP8969989A patent/JPH02270974A/en active Pending
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8269931B2 (en) | 2009-09-14 | 2012-09-18 | The Aerospace Corporation | Systems and methods for preparing films using sequential ion implantation, and films formed using same |
| US9048179B2 (en) | 2009-09-14 | 2015-06-02 | The Aerospace Corporation | Systems and methods for preparing films using sequential ion implantation, and films formed using same |
| US8946864B2 (en) | 2011-03-16 | 2015-02-03 | The Aerospace Corporation | Systems and methods for preparing films comprising metal using sequential ion implantation, and films formed using same |
| US9324579B2 (en) | 2013-03-14 | 2016-04-26 | The Aerospace Corporation | Metal structures and methods of using same for transporting or gettering materials disposed within semiconductor substrates |
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