JPH02289932A - Optical information recording medium - Google Patents
Optical information recording mediumInfo
- Publication number
- JPH02289932A JPH02289932A JP1111316A JP11131689A JPH02289932A JP H02289932 A JPH02289932 A JP H02289932A JP 1111316 A JP1111316 A JP 1111316A JP 11131689 A JP11131689 A JP 11131689A JP H02289932 A JPH02289932 A JP H02289932A
- Authority
- JP
- Japan
- Prior art keywords
- recording
- film
- sputtering method
- recording medium
- recording layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000003287 optical effect Effects 0.000 title claims abstract description 15
- 238000004544 sputter deposition Methods 0.000 claims abstract description 24
- 229910052714 tellurium Inorganic materials 0.000 claims description 5
- 229910052787 antimony Inorganic materials 0.000 claims description 4
- 229910052738 indium Inorganic materials 0.000 claims description 3
- 229910052745 lead Inorganic materials 0.000 claims description 3
- 239000000470 constituent Substances 0.000 claims description 2
- 229910052802 copper Inorganic materials 0.000 claims description 2
- 229910052733 gallium Inorganic materials 0.000 claims description 2
- 229910052732 germanium Inorganic materials 0.000 claims description 2
- 229910052709 silver Inorganic materials 0.000 claims description 2
- 229910052782 aluminium Inorganic materials 0.000 claims 1
- 229910052804 chromium Inorganic materials 0.000 claims 1
- 229910052717 sulfur Inorganic materials 0.000 claims 1
- 229910052719 titanium Inorganic materials 0.000 claims 1
- 230000035945 sensitivity Effects 0.000 abstract description 13
- 239000000758 substrate Substances 0.000 abstract description 12
- 238000000034 method Methods 0.000 abstract description 5
- 230000002708 enhancing effect Effects 0.000 abstract 1
- 239000010410 layer Substances 0.000 description 25
- 239000010408 film Substances 0.000 description 20
- 239000000463 material Substances 0.000 description 8
- 229910045601 alloy Inorganic materials 0.000 description 5
- 239000000956 alloy Substances 0.000 description 5
- 239000010409 thin film Substances 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 2
- 229910052797 bismuth Inorganic materials 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 239000006185 dispersion Substances 0.000 description 2
- 238000002844 melting Methods 0.000 description 2
- 230000008018 melting Effects 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 229910005939 Ge—Sn Inorganic materials 0.000 description 1
- 229910001370 Se alloy Inorganic materials 0.000 description 1
- 229910008355 Si-Sn Inorganic materials 0.000 description 1
- 229910006453 Si—Sn Inorganic materials 0.000 description 1
- -1 Te and Bi Chemical class 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 229910052785 arsenic Inorganic materials 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 229920005668 polycarbonate resin Polymers 0.000 description 1
- 239000004431 polycarbonate resin Substances 0.000 description 1
- 239000004926 polymethyl methacrylate Substances 0.000 description 1
- 229920000098 polyolefin Polymers 0.000 description 1
- 230000001737 promoting effect Effects 0.000 description 1
- 238000004080 punching Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
Landscapes
- Thermal Transfer Or Thermal Recording In General (AREA)
- Optical Record Carriers And Manufacture Thereof (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明はレーザー光によって情報を記録再生することが
できる光情報記録媒体に関するものである。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to an optical information recording medium on which information can be recorded and reproduced using laser light.
従来、レーザー光の照射による非可逆的な特性あるいは
形状変化を利用して情報を記録する、いわゆる追記型光
ディスクの記録媒体の記録層として、Te,Bi等の低
融点金属、及びその合金化合物あるいはその分散物が用
いられてきた。Conventionally, low melting point metals such as Te and Bi, and their alloy compounds or Dispersions thereof have been used.
なかでもTe−Se合金は、レーザー光の照射によるピ
ット形成で記録を行ういわゆる穴開け型記録方式の記録
媒体に用いられる代表的なものであり、高記録感度で、
かつ耐酸化性に優れ、長期保存可能な実用価値の高い記
録材料として知られてきた。Among these, Te-Se alloy is a typical material used in recording media of the so-called punching type recording method, in which recording is performed by forming pits by laser beam irradiation, and has high recording sensitivity.
It has also been known as a recording material with excellent oxidation resistance, long-term storage, and high practical value.
しかし、コンピューターのデータベース等、記録媒体へ
の高速書込みが要求される用途では従来の媒体では記録
感度の点で要求される性能に達しておらず、媒体の高惑
度化の様々な試みが成されてきた。However, in applications such as computer databases that require high-speed writing to recording media, conventional media do not reach the required performance in terms of recording sensitivity, and various attempts have been made to improve the recording sensitivity of the media. It has been.
例えば、穴開け型の記録媒体では、記録膜に照射した光
エネルギーによって分解するような物質を基板と記録膜
の間に更に1層設け、記録膜における分解物の開孔の促
進を図るという提案が特開昭58−166548号公報
等に成されている。For example, in the case of perforated recording media, a proposal is to provide an additional layer of material between the substrate and the recording film that is decomposed by the light energy applied to the recording film, thereby promoting the formation of holes in the recording film. is disclosed in Japanese Patent Application Laid-Open No. 58-166548.
しかしながら、これら公知例では再生時に照射する光エ
ネルギーによって基板が変形し、繰り返し再生を行うと
記録された信号のC/N比が徐々に低下してくるという
問題があった。更に基板と記録膜との間の層は記録膜と
異なる物質で形成された層であり、記録膜形成が真空チ
ャンバーでおこなわれる場合、下地層を形成するのに別
の工程装置、例えばスピンナー塗布装置が必要であった
り、あるいは下地層がスパツタ法で設りられる場合には
下地層成分のターゲ・ノトが必要であるという問題もあ
った。However, these known examples have a problem in that the substrate is deformed by the light energy irradiated during reproduction, and the C/N ratio of the recorded signal gradually decreases when repeated reproduction is performed. Furthermore, the layer between the substrate and the recording film is a layer formed of a material different from that of the recording film, and when the recording film is formed in a vacuum chamber, another process device, such as a spinner coating, is required to form the underlayer. There are also problems in that a device is required or, if the underlayer is formed by a sputtering method, a target layer for the underlayer components is required.
本発明者らの研究によると、基板上に記録膜を形成する
場合に、高周波スパッタリング法によるスバッタを行っ
て設けられた記録膜は、直流スパッタリング法によって
形成された記録膜よりも記録感度がよいことが確かめら
れているが、高周波スパッタリング法は直流スバツタリ
ング法に比べて成膜速度が遅い、膜厚のコントロールが
難しい等の問題点を有している。According to research conducted by the present inventors, when forming a recording film on a substrate, a recording film formed by sputtering using a high frequency sputtering method has better recording sensitivity than a recording film formed by a direct current sputtering method. However, the high frequency sputtering method has problems such as a slower film formation rate and difficulty in controlling the film thickness than the direct current sputtering method.
本発明者らは感度の高い光情報記録媒体にって、再生時
の光エネルギーによるC/N比の低下がなく、しかもで
きうる限り簡便に記録媒体を作成する方法を種々検討し
た結果、基板上に高周波スバックリング法によって記録
層を設け、更にその上に直流スパッタリング法によって
記録層を設けることによって前記の目的を達成できるこ
とを見出し、本発明を完成するに至った。The present inventors have studied various ways to create a highly sensitive optical information recording medium that does not reduce the C/N ratio due to optical energy during reproduction and that is as simple as possible. The present inventors have discovered that the above object can be achieved by providing a recording layer thereon by a high frequency sputtering method, and further providing a recording layer thereon by a DC sputtering method, and have completed the present invention.
すなわち本発明は、基板上に高周波スパッタリング法に
よって記録層(以下この記録膜を第1記録層と称す)を
形成し、更にその上に直流スパッタリング法によって記
録層(以下この記録膜を第2記録層と称す)を形成して
なる2層の記録膜から構成されることを特徴とする光情
報記録媒体を提供するものである。That is, in the present invention, a recording layer (hereinafter this recording layer will be referred to as a first recording layer) is formed on a substrate by a high frequency sputtering method, and a recording layer (hereinafter this recording layer will be referred to as a second recording layer) is formed on the substrate by a DC sputtering method. The present invention provides an optical information recording medium characterized in that it is constituted by a two-layer recording film.
高感度化媒体は、基板一記録膜界面での状態変化をもた
らしたものが主流を占め、本発明もこの方式を採用する
部類のものに属する。すなわち本発明によれば、基板一
記録膜界面で高感度化に有利な高周波スパッタリング法
で記録膜を付着させた後、成膜速度や膜の均一性に有利
な直流スバックリング法によって成膜することによって
生産性及び特性の高い記録媒体を得ることができる。The mainstream of high-sensitivity media is one that causes a state change at the substrate-recording film interface, and the present invention also belongs to the category that adopts this method. That is, according to the present invention, the recording film is deposited at the substrate-recording film interface by high-frequency sputtering, which is advantageous for increasing sensitivity, and then by the DC sputtering method, which is advantageous for film-forming speed and film uniformity. By this, a recording medium with high productivity and characteristics can be obtained.
本発明の光情報記録媒体の記録膜の構成元素は、レーザ
ー光の吸収が良く、かつ低融点の金属系元素が用いられ
、これらの元素は追記型または書き換え可能型のいずれ
の記録膜にも適用できる。また、第1記録層及び第2記
録層を構成する元素が同じであっても、異なっていても
よい。The constituent elements of the recording film of the optical information recording medium of the present invention are metal-based elements that have good absorption of laser light and have a low melting point. Applicable. Further, the elements constituting the first recording layer and the second recording layer may be the same or different.
追記型光情報記録媒体の記録材料としては、Te系の合
金、例えば、Te−Se,Te−^s,Te−Sb,T
e−1r++ Te−Sr++ Te−Pb, Te−
Bit Te−Se−TiTe−Se−Pb Te−
Se−Sb, Te−Se−In, Te−Se−Bi
, Te−Se−Ti−Agや、Te分散物、例えば、
TeC+ Te−CSz, TeaX等を挙げることが
できる。As the recording material of the write-once optical information recording medium, Te-based alloys such as Te-Se, Te-^s, Te-Sb, T
e-1r++ Te-Sr++ Te-Pb, Te-
Bit Te-Se-TiTe-Se-Pb Te-
Se-Sb, Te-Se-In, Te-Se-Bi
, Te-Se-Ti-Ag and Te dispersion, e.g.
TeC+Te-CSz, TeaX, etc. can be mentioned.
書き換え可能型光情報記録媒体の記録材料としては、T
e系の合金、例えば、Te − 0−Sn−GeSn−
Te−Se, In−Sb−Te, Ga −Te−S
e, Ge−Te等や、その他の相転移合金、例えば、
In−Sb,In−Sb−Se, Si −Sn,
Ge−Sn, Cu−AI+ 八g−Zn等を挙
げることができる。The recording material for the rewritable optical information recording medium is T.
e-based alloys, such as Te-0-Sn-GeSn-
Te-Se, In-Sb-Te, Ga-Te-S
e, Ge-Te, etc., and other phase change alloys, e.g.
In-Sb, In-Sb-Se, Si-Sn,
Examples include Ge-Sn, Cu-AI+, and 8g-Zn.
上記記録材料のうち、Te系の合金のTeを含む薄膜が
好ましく、特にTe及びSeを主成分とし、Ti+八g
+cr+八],Sb,Pb,As,In,Ga,Ge及
びCuからなる群より選ばれた元素の内、少なくとも1
種以上を含む薄膜が好ましい。Among the above-mentioned recording materials, a thin film containing Te of a Te-based alloy is preferable, and in particular, a thin film containing Te and Se as main components, Ti + 8g
+cr+8], at least one element selected from the group consisting of Sb, Pb, As, In, Ga, Ge, and Cu.
Thin films containing more than one species are preferred.
本発明の記録媒体の第1記録層及び第2記録層の厚みは
用途によって異なるが、良好なCZN比が得られ、かつ
実用的な記録惑度を付与ずるためには、各々の厚みが1
0人〜1000人の範囲にあることが好ましく、特に第
1記録層と第2記録層の膜厚の合計が100人〜100
0人の範囲にあり、かつそのうちの第1記録層の膜厚が
10人〜200人の範囲にあるものが好ましい。The thickness of the first recording layer and the second recording layer of the recording medium of the present invention varies depending on the use, but in order to obtain a good CZN ratio and provide a practical recording discrepancy, the thickness of each layer should be 1.
It is preferable that the total thickness of the first recording layer and the second recording layer is in the range of 0 to 1000.
The thickness of the first recording layer is preferably in the range of 10 to 200 people.
本発明に用いられる基板材料としては、ガラスあるいは
ポリカーボ不一ト、ポリメチルメタクリレート、アモル
ファスポリオレフィン等のプラスチックが使用できる。As the substrate material used in the present invention, glass or plastics such as polycarbonate, polymethyl methacrylate, and amorphous polyolefin can be used.
(実施例〕
以下本発明を実施例により更に詳細に説明するが、本発
明はこれらの実施例に限定されるものではない。(Examples) The present invention will be explained in more detail below with reference to Examples, but the present invention is not limited to these Examples.
実施例1
直径1.30 armのポリカーボネート樹脂製スパイ
ラル溝付ディスク基板にTe−Se−Ti−Agからな
るターゲソトを高周波スパッタリング法(Ar圧力〜0
.5Pa,高周波電力200W)で厚さ150人の第1
記録層を成膜し、その上に同一ターゲン1・を用いて直
流スパッタリング法(Ar圧力〜0,5Pa直流電力7
0麿)で厚さ150人の第2記録層の成膜を行い、記録
媒体を得た。Example 1 A target made of Te-Se-Ti-Ag was deposited on a polycarbonate resin spiral grooved disk substrate with a diameter of 1.30 arms by high-frequency sputtering method (Ar pressure ~ 0).
.. 5Pa, high frequency power 200W) with a thickness of 150 people.
A recording layer was formed, and a DC sputtering method (Ar pressure ~ 0.5 Pa, DC power 7) was applied using the same targen 1.
A second recording layer was formed to a thickness of 150 layers at a temperature of 0.0 mm) to obtain a recording medium.
この記録媒体を830nmの半導体レーザーを用いて周
波数5.8MIIz. duty30%の反復信号を1
80Orpmの条件で、lZl120mmの位置にレー
ザー出力を変化させながら書き込み、1m一で読み出し
て記録感度及びC/N比を測定した。This recording medium was heated to a frequency of 5.8 MIIz. using an 830 nm semiconductor laser. 1 repetition signal with duty 30%
Under the condition of 80 rpm, writing was performed at a position of 120 mm of lZl while changing the laser output, and reading was performed at a distance of 1 m to measure the recording sensitivity and C/N ratio.
記録感度は、C/N比が45dBに達した時の記録レー
ザー出力をみて、評価した。The recording sensitivity was evaluated by observing the recording laser output when the C/N ratio reached 45 dB.
その結果を表−1に示した。The results are shown in Table-1.
比較例1
実施例1と同様のディスク基板に同様のタゲットを用い
、直流スパッタリング法(Ar圧力〜0.5Pa,直流
電力70w)のみで厚さ300人の記録膜の成膜を行い
、記録媒体を得た。Comparative Example 1 Using the same target on the same disk substrate as in Example 1, a recording film with a thickness of 300 mm was formed using only the DC sputtering method (Ar pressure ~0.5 Pa, DC power 70 W), and a recording film was formed on the recording medium. I got it.
この記録媒体の記録感度及びC/N比を実施例1と同様
に測定した。The recording sensitivity and C/N ratio of this recording medium were measured in the same manner as in Example 1.
その結果を表−1に示した。The results are shown in Table-1.
結二,尼
実施例Iの高周波スパッタリング法及び直流スパッタリ
ング法で形成された2層構造の記録膜を有する光情報記
録媒体は、比較例1で用いた従来の単層構造の光情報記
録媒体に仕べて記録感度が上昇していることがわかる。Keiji, Ama The optical information recording medium having a two-layer structure recording film formed by high-frequency sputtering method and DC sputtering method in Example I is different from the conventional single-layer structure optical information recording medium used in Comparative Example 1. It can be seen that the recording sensitivity has increased.
本発明によれば、簡便な方法で記録感度が良好な光情報
記録媒体を得ることができる。According to the present invention, an optical information recording medium with good recording sensitivity can be obtained by a simple method.
Claims (1)
以下この記録層を第1記録層と称す)を形成し、更にそ
の上に直流スパッタリング法によって記録層(以下この
記録層を第2記録層と称す)を形成してなる2層の記録
膜から構成されることを特徴とする光情報記録媒体。 2、第1または第2記録層の構成元素がTe及びSeを
主成分とし、Ti、Ag、Cr、Al、Sb、Pb、A
s、In、Ga、Ge及びCuからなる群より選ばれた
元素の内、少なくとも1種以上を含むことを特徴とする
請求項1記載の光情報記録媒体。[Claims] 1. A recording layer (
A two-layer recording film is formed by forming a recording layer (hereinafter referred to as the first recording layer) and further forming a recording layer (hereinafter this recording layer will be referred to as the second recording layer) by direct current sputtering. An optical information recording medium comprising: 2. The constituent elements of the first or second recording layer are mainly composed of Te and Se, and include Ti, Ag, Cr, Al, Sb, Pb, and A.
2. The optical information recording medium according to claim 1, wherein the optical information recording medium contains at least one element selected from the group consisting of S, In, Ga, Ge, and Cu.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1111316A JPH02289932A (en) | 1989-04-28 | 1989-04-28 | Optical information recording medium |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1111316A JPH02289932A (en) | 1989-04-28 | 1989-04-28 | Optical information recording medium |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH02289932A true JPH02289932A (en) | 1990-11-29 |
Family
ID=14558131
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1111316A Pending JPH02289932A (en) | 1989-04-28 | 1989-04-28 | Optical information recording medium |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH02289932A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6634653B2 (en) * | 2001-07-17 | 2003-10-21 | Probir Chatterjea & Associates, Inc. | Ride control system for construction equipment |
-
1989
- 1989-04-28 JP JP1111316A patent/JPH02289932A/en active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6634653B2 (en) * | 2001-07-17 | 2003-10-21 | Probir Chatterjea & Associates, Inc. | Ride control system for construction equipment |
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