JPH02302446A - Prepreg and wiring board using the same prepreg - Google Patents
Prepreg and wiring board using the same prepregInfo
- Publication number
- JPH02302446A JPH02302446A JP12520289A JP12520289A JPH02302446A JP H02302446 A JPH02302446 A JP H02302446A JP 12520289 A JP12520289 A JP 12520289A JP 12520289 A JP12520289 A JP 12520289A JP H02302446 A JPH02302446 A JP H02302446A
- Authority
- JP
- Japan
- Prior art keywords
- prepreg
- polyaromatic
- wiring board
- phenol
- polyaromatic cyanate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Reinforced Plastic Materials (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は電子機器、電気機器、コンピューター、通信機
器等に用いられる高周波用配線基板およびそれに用りる
プリプレグlこ関するものである。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to high frequency wiring boards used in electronic equipment, electrical equipment, computers, communication equipment, etc., and prepregs used therein.
近年、電子工業や通信、コンピュータなどの分野にお−
で使用される周波数がMHzやGHzのように高周波の
領域にシフトして論る。そしてこのような高周波領域で
用いられるプリント配線板の絶縁層にお−では、信号の
伝播遅延を短くするうえで誘電率がよりφさ員ことが、
また電力ロスを小さくするうえで誘電正接がより小さい
ことがそれぞれ望まれる。In recent years, it has been used in fields such as the electronic industry, communications, and computers.
We will discuss this by shifting the frequencies used in the high-frequency range, such as MHz and GHz. In order to shorten the signal propagation delay, the dielectric constant of the insulating layer of printed wiring boards used in such high frequency ranges must be increased.
Further, in order to reduce power loss, it is desired that the dielectric loss tangent be smaller.
このために誘電率や誘電正接が小さい四フフ化エチレン
樹脂(テフロン)やポリフェニレンオキサイド(PPO
)などの樹脂を用いて絶縁層全形成することが試みられ
るに至っている。For this reason, polytetrafluoroethylene resin (Teflon) and polyphenylene oxide (PPO), which have a small dielectric constant and dielectric loss tangent, are used.
Attempts have been made to form the entire insulating layer using resins such as ).
しかしこれらの樹脂を用いて絶縁層を形成する場合、ガ
ラス転移温度(Tg)が180〜2oo℃程度と低く耐
熱性が不充分で、スルホール加工時のスミアの発生など
スルーホールの信頼性を高く得られないために多層のプ
リント配線板に形成することができなりなどの問題があ
った。However, when forming an insulating layer using these resins, the glass transition temperature (Tg) is low at about 180 to 200°C, and the heat resistance is insufficient, and the reliability of through holes is not high due to the occurrence of smear during through hole processing. Since this is not possible, there have been problems such as the inability to form multilayer printed wiring boards.
又、ポリ芳香族シアネート樹脂を単独で硬化させた場合
、シアネートがトリアジン環を形成して耐熱性を向上さ
せるが、架橋密度が非常に高論ため耐衝撃性が低下し、
プリント配線板加工時のドリル加工において内壁にクラ
ックを発生しやすく、スルホール鍍金信頼性の点で問題
があった。Furthermore, when a polyaromatic cyanate resin is cured alone, the cyanate forms a triazine ring and improves heat resistance, but the crosslinking density is extremely high, resulting in a decrease in impact resistance.
Cracks tend to occur on the inner wall during drilling during printed wiring board processing, which poses a problem in terms of through-hole plating reliability.
本発明はポリ芳香族シアネート、多価フェノール、ポリ
芳香族シアネートフェノール、触媒、必要に応じて添加
される難燃剤からなる樹脂ワニスを基材に含浸、乾燥し
てなるプリプレグおよび該プリプレグを所要枚数重ね、
必要に応じて該プリプレグ間の所要位置に内層回路材を
介在せしめてから、最外層に外層回路材を配設した積層
体を積層一体化してなることを特徴とする配線基板のた
め、上記目的を達成することができたもので、以下本発
明の詳細な説明する。The present invention relates to a prepreg obtained by impregnating a base material with a resin varnish consisting of a polyaromatic cyanate, a polyhydric phenol, a polyaromatic cyanate phenol, a catalyst, and a flame retardant added as necessary and drying it, and a required number of sheets of the prepreg. Overlapping,
The above-mentioned purpose is achieved by a wiring board characterized in that it is formed by laminating and integrating a laminate in which an inner layer circuit material is interposed at a predetermined position between the prepregs as necessary, and then an outer layer circuit material is disposed on the outermost layer. The present invention will now be described in detail.
本発明に用するポリ芳香族シアネートとしては好ましく
は下記一般式〔1〕で示されるものであることが高周波
性向上のために望ましいことである。The polyaromatic cyanate used in the present invention is preferably one represented by the following general formula [1] in order to improve high frequency properties.
・・・式〔1〕
但しArは芳香族
BはC?〜鵞・の多環式脂肪族基
りは各々独立に活性水素を含まなVa換基q*rsll
は夫々独立に0.1,2.又は3の整数
tは夫々独立に0〜4の整数
Xは0〜5の数
本発明におりで用いる式〔1〕のポリ芳香族シアネート
におりて、芳香族基Arは芳香族基を含む総ての基を意
味するものであり、例えばベンゼン、ナフタリン、フェ
ナントラセン、アントラセン。...Formula [1] However, Ar is aromatic and B is C? ~ The polycyclic aliphatic groups of 螞・ are each independently a Va substituent q*rsll that does not contain active hydrogen.
are independently 0.1, 2. or the integer t of 3 is each independently an integer of 0 to 4, and the integer It means all groups, such as benzene, naphthalene, phenanthracene, and anthracene.
またはビ芳香族基、アルキレン部分によって架橋された
2個以上の芳香族基である。好適にはベンゼン、ナフタ
リン、ビフェニル、ビナフチル、ジフェニルアルキレン
基でアリ、特にベンゼン基であることが望まし込。Cγ
〜鵞・ の多環式脂肪族基Bとは、2個以上の環を含む
脂肪族基を意味するものであり、多環式脂肪族基には1
つ以上の二重結合または三重結合が含まれて−てもより
0好適な多環式脂肪族基を列挙すれば次のものがある。or a biaromatic group, two or more aromatic groups bridged by alkylene moieties. Preferred examples include benzene, naphthalene, biphenyl, binaphthyl, and diphenylalkylene groups, particularly benzene groups. Cγ
The polycyclic aliphatic group B in 〜鵞・ means an aliphatic group containing two or more rings, and the polycyclic aliphatic group includes one
Preferred polycyclic aliphatic groups containing 3 or more double bonds or triple bonds include the following.
Dlはアルキル基
式〔1〕中のDは有機炭化水素基上に置換され得る総て
の置換基を意味するものであるが、活性水素原子を含む
置換基は除外される。活性水素原子とは酸素、硫黄、窒
素原子に結合した水素原子を意味する。式〔1〕中の各
りはそれぞれ独立して規定されるものであり、例えば、
アルキル、アルケニル、アルキニル、アリール、アルカ
リール、アルアルキル、ハロ、アルコキシ、ニトロ、カ
ルボキシレート、スルホン、スルフィド、カーボネート
などであり、好適にはC1〜1・のアルキルmc1〜1
oのアルケニル、ニトロ、ハロでアリ、01〜3のアル
キル、C1〜3のアルキニル、フロモ、クロロが最も好
ましい。Dl is an alkyl group In the formula [1], D means all substituents that can be substituted on the organic hydrocarbon group, but substituents containing active hydrogen atoms are excluded. Active hydrogen atom means a hydrogen atom bonded to an oxygen, sulfur, or nitrogen atom. Each element in formula [1] is defined independently, for example,
Alkyl, alkenyl, alkynyl, aryl, alkaryl, aralkyl, halo, alkoxy, nitro, carboxylate, sulfone, sulfide, carbonate, etc., and preferably C1-1 alkyl mc1-1
Most preferred are alkenyl of o, nitro, halo, alkyl of 01-3, alkynyl of C1-3, furomo, and chloro.
式〔1〕のポリ芳香族シアネートはXが0〜5までの化
合物類の混合物として見出されるものであり、Xはこの
混合物の平均の数として規定されるものである。The polyaromatic cyanate of formula [1] is found as a mixture of compounds in which X is from 0 to 5, and X is defined as the average number of this mixture.
式〔1]のポリ芳香族シアネートの好ましい実施態様は
次の式で表される。A preferred embodiment of the polyaromatic cyanate of formula [1] is represented by the following formula.
しかして、式〔1〕 のポリ芳香族シアネートから得
られる芳香族ポリトリアジン(ポリ芳香族シアネート樹
脂)は、低い誘電率(g2.78前後χ但い誘電正接(
tanδ0゜003前後)及び高め耐熱性(ガラス転移
温度’pg 250以上、オープン耐熱性300℃程度
)を有するプリント配線基板を構成する樹脂として優れ
た特性を有する。そこで本発明ではさらに式〔2〕で表
される。Therefore, the aromatic polytriazine (polyaromatic cyanate resin) obtained from the polyaromatic cyanate of formula [1] has a low dielectric constant (g around 2.78
It has excellent properties as a resin constituting a printed wiring board, having a tan δ of about 0°003) and high heat resistance (glass transition temperature 'pg of 250 or more, open heat resistance of about 300°C). Therefore, in the present invention, it is further expressed by formula [2].
・・・式〔2〕
但し記号Ar 6 B @ D 6 q * r @
8 * t −Xは式%式%
多価フェノールを加えることにより硬化時の架橋密度を
下げ可塑化することによって耐衝撃性を向上させると共
に式〔1〕のイソシアネート基が硬化後の未反広として
残存しないように反応性を高めるものである。更に式〔
3〕で示されるポリ芳香族シアネートフェノールを添加
することによってガラス布等の基材に対する漏れ性、密
看性を向上させるものである。...Formula [2] However, the symbol Ar 6 B @ D 6 q * r @
8 * t -X is the formula % Formula % By adding polyhydric phenol, the crosslinking density during curing is lowered and the impact resistance is improved by plasticizing, and the isocyanate group of formula [1] is It increases the reactivity so that it does not remain as a chemical. Furthermore, the formula [
By adding the polyaromatic cyanate phenol shown in 3), the leakage and tightness of the base material such as glass cloth are improved.
・・・式〔3〕
但し、記号Arm B、Da qa re 8* t、
Xは式〔1〕と同じである。...Formula [3] However, the symbols Arm B, Da qa re 8 * t,
X is the same as in formula [1].
融媒トしては、イミダゾール順、第三級7 ミyす7テ
ン酸コバルトやオクチル酸コバルトナト有機コバルト塩
類等の有機金現塩類を用いることができるものであり、
特に有機コバルト塩類が好ましA0触媒の配合量は特に
限定されないが、例えば有機コバルト塩類を反応触派と
し゛て用層る場合には、ワニスの所望するゲルタイムに
応じて、式C1〕のポリ芳香族シアネートのv、瀘に対
するコバルトイオンの重量比でlO〜7ooppma度
の範囲で配合される。必要に応じて添加される難燃剤と
しては、通常用いられる難燃剤全、[−用りることがで
きる。更に全体粘度を調整するため必要に応じてアルコ
ール、ケトン、トルエン、ジメチルホルムアミF、メチ
ルセロソルブ等の単独、混合物で希釈することもできる
。基材としてはガラス、アスベスト等の無機繊維やポリ
エステル、ポリアクリル、ポリビニルアルコール、ポリ
アクリル、ポリアラミド等の有機合成繊維や木綿等の天
然#維からなる織布、不織布、マット或は紙又はこれら
の組合せ基材である。必要に応じて用いる内層回路材と
しては両面又は片面金属張積層板の金属面に電気回路を
形成したもので必要に応じプリプレグ間に所要枚数挿入
し多層配線基板とするものである。外層回路材としては
片面金属張積層板や銅、アルミニウム、ニリケル、亜鉛
等の単独、合金、複合から′なる金属箔が用いられるが
好ましくは厚さ18〜105ミクロンの両面粗化、鉋箔
、更に好ましくはアルミキャリア付銅箔であることが望
ましいことである。かくして上記樹脂ワニスを基材に含
浸、乾燥してなるプリプレグを所要枚数重ね、必要に応
じて該プリプレグ間の所要位置に内層回路材−を゛介在
せしめてから、奇外層に外課回路材を配設した積層体を
多段プレス法、ダブルベルト法、マルチロール法、ドラ
ム法等で170〜230℃で積層一体化するが必要に応
じて積層一体化後、更に60〜120分間アフターキュ
アーすることもできる。As the melting medium, organic gold salts such as imidazole, tertiary cobalt 7-mys-7-tenoate and organic cobalt salts of cobalt octylate can be used.
Particularly preferred are organic cobalt salts, and the amount of the A0 catalyst blended is not particularly limited. For example, when organic cobalt salts are used as a reaction catalyst, the polyaromatic of formula C1] may be used depending on the desired gel time of the varnish. The weight ratio of cobalt ions to v and filtration of group cyanates is blended in a range of lO to 7 oppma degrees. As the flame retardant added as necessary, all commonly used flame retardants can be used. Furthermore, in order to adjust the overall viscosity, it may be diluted with alcohol, ketone, toluene, dimethylformamide F, methyl cellosolve, etc. alone or in mixtures, if necessary. The base material may be woven fabric, non-woven fabric, mat, or paper made of inorganic fibers such as glass and asbestos, organic synthetic fibers such as polyester, polyacrylic, polyvinyl alcohol, polyacrylic, and polyaramid, and natural fibers such as cotton. It is a combination base material. The inner layer circuit material to be used as required is one in which an electric circuit is formed on the metal surface of a double-sided or single-sided metal-clad laminate, and a required number of inner layer circuit materials are inserted between prepregs as necessary to form a multilayer wiring board. As the outer layer circuit material, single-sided metal-clad laminates or metal foils made of copper, aluminum, nickel, zinc, etc. alone, alloys, or composites are used. Preferably, double-sided roughened or planed foils with a thickness of 18 to 105 microns are used. More preferably, it is a copper foil with an aluminum carrier. In this way, the required number of prepregs obtained by impregnating and drying the above-mentioned resin varnish into the base material are piled up, inner layer circuit material is interposed between the prepregs at required positions as necessary, and then outer circuit material is placed on the outer layer. The arranged laminates are laminated and integrated at 170 to 230°C using a multi-stage press method, double belt method, multi-roll method, drum method, etc., and if necessary, after curing is performed for an additional 60 to 120 minutes. You can also do it.
以下本発明を実施例にもとづ込て説明する。The present invention will be explained below based on examples.
実施例
ポリ芳香族シアネート60重量部(以下−に部と記す)
に対し、ポリ芳香族シアネートのシアネート化反応前の
多価フェノール20部、ポリ芳香族シアネートフェノー
ル20部、オクチル酸コバルト25ppm を加え混
合後、これにテトラプロビスフェノールA8部を加え固
形分70重に%C以下単に優と記す)になるようにメチ
ルエチルケトンで希釈して樹脂ワニスを得、該樹脂ワニ
スに厚さ0.15flのガラスを乾燥後樹脂歯が501
になるように含浸、乾燥してプリプレグを得た0次に該
プリプレグ8枚を重ねた上下面に厚さ35ミクロンの銅
箔を夫々配設した積層体を成形圧力50KQ/C1l、
170℃で90分間加熱加圧成形後、更に220℃で
60分間無圧下アフターキュアーして厚さ1.6flの
両面鋼張積層板を得、次に該積層板の両面に電気回路を
形成して内層回路材とし、この内層回路材の上下面に上
記プリプレグを夫々2枚づつ介し最外層に厚さ35ミク
ロンの銅箔を配設した積層体を成形圧力40KQ/d
、 170℃で60分間積層成形して4層回路配線基
板を得た。Example 60 parts by weight of polyaromatic cyanate (hereinafter referred to as - parts)
To this, 20 parts of polyhydric phenol before the cyanation reaction of polyaromatic cyanate, 20 parts of polyaromatic cyanate phenol, and 25 ppm of cobalt octylate were added and mixed, and then 8 parts of tetraprobisphenol A was added to this to make the solid content 70 parts. A resin varnish was obtained by diluting it with methyl ethyl ketone so that the ratio of %C or less was simply expressed as "excellent", and after drying a glass with a thickness of 0.15 fl to the resin varnish, the resin teeth became 501.
The prepreg was obtained by impregnating and drying the prepreg so that 8 sheets of the prepreg were stacked and a 35 micron thick copper foil was placed on each of the upper and lower surfaces, respectively, and a laminate was formed using a molding pressure of 50KQ/C1l.
After heating and pressure forming at 170°C for 90 minutes, the product was further cured at 220°C for 60 minutes under no pressure to obtain a double-sided steel clad laminate with a thickness of 1.6fl, and then electrical circuits were formed on both sides of the laminate. A laminate with two sheets of the above prepreg interposed on the upper and lower surfaces of the inner layer circuit material and a 35 micron thick copper foil placed on the outermost layer was formed under a molding pressure of 40 KQ/d.
, Lamination molding was carried out at 170° C. for 60 minutes to obtain a four-layer circuit wiring board.
比較例
ポリアミノビスマレイミド樹脂を固形分が60係になる
ようにNメチル2ピロリドンに溶解シタ樹脂ワニスを用
いた以外は実施例と同様に処理してプリプレグ、両面鋼
張積層板、4層回路配線基板を得た。Comparative Example A prepreg, a double-sided steel clad laminate, and a 4-layer circuit wiring were prepared in the same manner as in the example except that polyamino bismaleimide resin was dissolved in N-methyl 2-pyrrolidone so that the solid content was 60% and a resin varnish was used. I got the board.
比較例2
ポリ芳香族シアネートを固形分が60係になるようにメ
チルエチルケトンに溶解した樹脂ワニスを用−た以外は
実施例と同様に処理してプリプレグ、両面鋼張積層板、
4層回路配線基板を得た。Comparative Example 2 A prepreg, double-sided steel clad laminate,
A four-layer circuit wiring board was obtained.
実施例及び比較例1と2の配線基板の性能は第1表のよ
うである。The performance of the wiring boards of Examples and Comparative Examples 1 and 2 is shown in Table 1.
注 *150℃の温水中に48時間浸漬処理後。note *After immersion treatment in 150°C warm water for 48 hours.
※2 スルホール壁面からの鍍金液のしみこみ性。*2 Possibility of plating liquid seeping through the through-hole wall.
本発明は上述した如く構成されている。特許請求の範囲
に記載した構成を有するプリプレグおよびそれを用いた
配線基板にお−ては誘電塞、誘電正接、耐熱性、スルホ
ール信頼性が向上する効果がある。The present invention is constructed as described above. The prepreg having the structure described in the claims and the wiring board using the same have the effect of improving dielectric blockage, dielectric loss tangent, heat resistance, and through-hole reliability.
Claims (3)
香族シアネートフエノール、触媒、必要に応じて添加さ
れる難燃剤からなる樹脂ワニスを基材に含浸、乾燥して
なることを特徴とするプリプレグ。(1) A prepreg characterized by impregnating a base material with a resin varnish consisting of polyaromatic cyanate, polyhydric phenol, polyaromatic cyanate phenol, a catalyst, and a flame retardant added as necessary, and drying.
香族シアネートフエノールからなる樹脂ワニスを基材に
含浸、乾燥してなるプリプレグを所要枚数重ね、必要に
応じて該プリプレグ間の所要位置に内層回路材を介在せ
しめてから、最外層に外層回路材を配設した積層体を積
層一体化してなることを特徴とする配線基板。(2) Layer the required number of prepregs made by impregnating a base material with a resin varnish consisting of polyaromatic cyanate, polyhydric phenol, and polyaromatic cyanate phenol and drying, and place inner layer circuits at required positions between the prepregs as necessary. A wiring board characterized in that it is formed by laminating and integrating a laminate in which an outer layer circuit material is disposed on the outermost layer after interposing a material therebetween.
請求の範囲第2項記載の配線基板。(3) The wiring board according to claim 2, wherein the outer layer circuit material is a metal foil.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12520289A JPH02302446A (en) | 1989-05-18 | 1989-05-18 | Prepreg and wiring board using the same prepreg |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12520289A JPH02302446A (en) | 1989-05-18 | 1989-05-18 | Prepreg and wiring board using the same prepreg |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH02302446A true JPH02302446A (en) | 1990-12-14 |
Family
ID=14904437
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP12520289A Pending JPH02302446A (en) | 1989-05-18 | 1989-05-18 | Prepreg and wiring board using the same prepreg |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH02302446A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2002063814A (en) * | 2000-08-15 | 2002-02-28 | Nippon Shokubai Co Ltd | Printed circuit board for high-frequency |
| EP1854828A2 (en) | 2006-05-12 | 2007-11-14 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Flame-retardant prepreg resins based on cyanate and hardening at low temperatures for honeycomb sandwich components |
-
1989
- 1989-05-18 JP JP12520289A patent/JPH02302446A/en active Pending
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2002063814A (en) * | 2000-08-15 | 2002-02-28 | Nippon Shokubai Co Ltd | Printed circuit board for high-frequency |
| EP1854828A2 (en) | 2006-05-12 | 2007-11-14 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Flame-retardant prepreg resins based on cyanate and hardening at low temperatures for honeycomb sandwich components |
| US8242035B2 (en) | 2006-05-12 | 2012-08-14 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Flame-resistant, low-temperature curing cyanate-based prepreg resins for honeycomb sandwich components with excellent surfaces |
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