JPH02308246A - Silver halide photographic sensitive material - Google Patents
Silver halide photographic sensitive materialInfo
- Publication number
- JPH02308246A JPH02308246A JP12887789A JP12887789A JPH02308246A JP H02308246 A JPH02308246 A JP H02308246A JP 12887789 A JP12887789 A JP 12887789A JP 12887789 A JP12887789 A JP 12887789A JP H02308246 A JPH02308246 A JP H02308246A
- Authority
- JP
- Japan
- Prior art keywords
- group
- layer
- photographic
- silver halide
- sensitive material
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- -1 Silver halide Chemical class 0.000 title claims abstract description 76
- 239000000463 material Substances 0.000 title claims abstract description 66
- 229910052709 silver Inorganic materials 0.000 title claims abstract description 32
- 239000004332 silver Substances 0.000 title claims abstract description 32
- 239000000839 emulsion Substances 0.000 claims abstract description 51
- 229920001940 conductive polymer Polymers 0.000 claims abstract description 14
- 229920000642 polymer Polymers 0.000 claims abstract description 14
- 125000000217 alkyl group Chemical group 0.000 claims abstract description 12
- 239000000470 constituent Substances 0.000 claims abstract description 8
- 125000002252 acyl group Chemical group 0.000 claims abstract description 4
- 125000003342 alkenyl group Chemical group 0.000 claims abstract description 4
- 125000000304 alkynyl group Chemical group 0.000 claims abstract description 4
- 125000003118 aryl group Chemical group 0.000 claims abstract description 4
- 125000003917 carbamoyl group Chemical group [H]N([H])C(*)=O 0.000 claims abstract description 4
- 125000000472 sulfonyl group Chemical group *S(*)(=O)=O 0.000 claims abstract description 4
- 150000001875 compounds Chemical class 0.000 claims description 52
- 238000006116 polymerization reaction Methods 0.000 claims description 36
- 230000001590 oxidative effect Effects 0.000 claims description 25
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 9
- 125000005647 linker group Chemical group 0.000 claims description 3
- 125000005156 substituted alkylene group Chemical group 0.000 claims description 3
- 238000011161 development Methods 0.000 abstract description 25
- 239000000428 dust Substances 0.000 abstract description 20
- 125000002947 alkylene group Chemical group 0.000 abstract description 5
- 230000003647 oxidation Effects 0.000 abstract description 3
- 238000007254 oxidation reaction Methods 0.000 abstract description 3
- 229910052740 iodine Inorganic materials 0.000 abstract description 2
- 230000002401 inhibitory effect Effects 0.000 abstract 1
- 239000010410 layer Substances 0.000 description 79
- 238000000034 method Methods 0.000 description 69
- 239000000203 mixture Substances 0.000 description 36
- 239000002245 particle Substances 0.000 description 35
- 230000008569 process Effects 0.000 description 34
- 239000000975 dye Substances 0.000 description 30
- 239000000243 solution Substances 0.000 description 29
- 239000011248 coating agent Substances 0.000 description 28
- 238000000576 coating method Methods 0.000 description 28
- 239000008273 gelatin Substances 0.000 description 27
- 229920000159 gelatin Polymers 0.000 description 27
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 27
- 108010010803 Gelatin Proteins 0.000 description 26
- 235000019322 gelatine Nutrition 0.000 description 26
- 235000011852 gelatine desserts Nutrition 0.000 description 26
- 238000012545 processing Methods 0.000 description 22
- 230000003068 static effect Effects 0.000 description 21
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 18
- 230000015572 biosynthetic process Effects 0.000 description 18
- 238000003786 synthesis reaction Methods 0.000 description 17
- IOLCXVTUBQKXJR-UHFFFAOYSA-M potassium bromide Chemical compound [K+].[Br-] IOLCXVTUBQKXJR-UHFFFAOYSA-M 0.000 description 16
- 150000003839 salts Chemical class 0.000 description 16
- 239000006185 dispersion Substances 0.000 description 15
- 239000011241 protective layer Substances 0.000 description 15
- 239000000126 substance Substances 0.000 description 14
- SQGYOTSLMSWVJD-UHFFFAOYSA-N silver(1+) nitrate Chemical compound [Ag+].[O-]N(=O)=O SQGYOTSLMSWVJD-UHFFFAOYSA-N 0.000 description 12
- 239000004094 surface-active agent Substances 0.000 description 11
- 239000003795 chemical substances by application Substances 0.000 description 10
- 239000000523 sample Substances 0.000 description 10
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 9
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 9
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 9
- 239000007864 aqueous solution Substances 0.000 description 9
- 239000002202 Polyethylene glycol Substances 0.000 description 8
- 239000002253 acid Substances 0.000 description 8
- 230000001070 adhesive effect Effects 0.000 description 8
- 239000003054 catalyst Substances 0.000 description 8
- 230000000052 comparative effect Effects 0.000 description 8
- 229940125904 compound 1 Drugs 0.000 description 8
- 229920001577 copolymer Polymers 0.000 description 8
- 239000004816 latex Substances 0.000 description 8
- 229920000126 latex Polymers 0.000 description 8
- 229920000139 polyethylene terephthalate Polymers 0.000 description 8
- 239000005020 polyethylene terephthalate Substances 0.000 description 8
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 description 7
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 7
- 239000002216 antistatic agent Substances 0.000 description 7
- 208000028659 discharge Diseases 0.000 description 7
- 239000007788 liquid Substances 0.000 description 7
- 229920001223 polyethylene glycol Polymers 0.000 description 7
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 description 6
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 6
- JIGUQPWFLRLWPJ-UHFFFAOYSA-N Ethyl acrylate Chemical compound CCOC(=O)C=C JIGUQPWFLRLWPJ-UHFFFAOYSA-N 0.000 description 6
- ROOXNKNUYICQNP-UHFFFAOYSA-N ammonium persulfate Chemical compound [NH4+].[NH4+].[O-]S(=O)(=O)OOS([O-])(=O)=O ROOXNKNUYICQNP-UHFFFAOYSA-N 0.000 description 6
- 239000000084 colloidal system Substances 0.000 description 6
- 239000013068 control sample Substances 0.000 description 6
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 6
- 239000010419 fine particle Substances 0.000 description 6
- PNJWIWWMYCMZRO-UHFFFAOYSA-N pent‐4‐en‐2‐one Natural products CC(=O)CC=C PNJWIWWMYCMZRO-UHFFFAOYSA-N 0.000 description 6
- NLKNQRATVPKPDG-UHFFFAOYSA-M potassium iodide Chemical compound [K+].[I-] NLKNQRATVPKPDG-UHFFFAOYSA-M 0.000 description 6
- 229910001961 silver nitrate Inorganic materials 0.000 description 6
- 159000000000 sodium salts Chemical class 0.000 description 6
- OEPOKWHJYJXUGD-UHFFFAOYSA-N 2-(3-phenylmethoxyphenyl)-1,3-thiazole-4-carbaldehyde Chemical compound O=CC1=CSC(C=2C=C(OCC=3C=CC=CC=3)C=CC=2)=N1 OEPOKWHJYJXUGD-UHFFFAOYSA-N 0.000 description 5
- HAEQAUJYNHQVHV-UHFFFAOYSA-N 3-[4-(aminomethyl)-6-(trifluoromethyl)pyridin-2-yl]oxy-N-phenylbenzamide Chemical compound NCC1=CC(=NC(=C1)C(F)(F)F)OC=1C=C(C(=O)NC2=CC=CC=C2)C=CC=1 HAEQAUJYNHQVHV-UHFFFAOYSA-N 0.000 description 5
- 206010070834 Sensitisation Diseases 0.000 description 5
- 125000004432 carbon atom Chemical group C* 0.000 description 5
- 230000006866 deterioration Effects 0.000 description 5
- 238000009826 distribution Methods 0.000 description 5
- DZVCFNFOPIZQKX-LTHRDKTGSA-M merocyanine Chemical compound [Na+].O=C1N(CCCC)C(=O)N(CCCC)C(=O)C1=C\C=C\C=C/1N(CCCS([O-])(=O)=O)C2=CC=CC=C2O\1 DZVCFNFOPIZQKX-LTHRDKTGSA-M 0.000 description 5
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 5
- 230000008313 sensitization Effects 0.000 description 5
- 238000003756 stirring Methods 0.000 description 5
- 238000012360 testing method Methods 0.000 description 5
- QGKMIGUHVLGJBR-UHFFFAOYSA-M (4z)-1-(3-methylbutyl)-4-[[1-(3-methylbutyl)quinolin-1-ium-4-yl]methylidene]quinoline;iodide Chemical compound [I-].C12=CC=CC=C2N(CCC(C)C)C=CC1=CC1=CC=[N+](CCC(C)C)C2=CC=CC=C12 QGKMIGUHVLGJBR-UHFFFAOYSA-M 0.000 description 4
- PAYRUJLWNCNPSJ-UHFFFAOYSA-N Aniline Chemical compound NC1=CC=CC=C1 PAYRUJLWNCNPSJ-UHFFFAOYSA-N 0.000 description 4
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 4
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 4
- CSNNHWWHGAXBCP-UHFFFAOYSA-L Magnesium sulfate Chemical compound [Mg+2].[O-][S+2]([O-])([O-])[O-] CSNNHWWHGAXBCP-UHFFFAOYSA-L 0.000 description 4
- 229910019142 PO4 Inorganic materials 0.000 description 4
- 229920003171 Poly (ethylene oxide) Polymers 0.000 description 4
- 239000004793 Polystyrene Substances 0.000 description 4
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 4
- 102000001708 Protein Isoforms Human genes 0.000 description 4
- 108010029485 Protein Isoforms Proteins 0.000 description 4
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 4
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 4
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 4
- 239000000853 adhesive Substances 0.000 description 4
- 125000003710 aryl alkyl group Chemical group 0.000 description 4
- IOJUPLGTWVMSFF-UHFFFAOYSA-N benzothiazole Chemical group C1=CC=C2SC=NC2=C1 IOJUPLGTWVMSFF-UHFFFAOYSA-N 0.000 description 4
- 238000004061 bleaching Methods 0.000 description 4
- 238000011156 evaluation Methods 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 4
- 239000000178 monomer Substances 0.000 description 4
- 239000003960 organic solvent Substances 0.000 description 4
- 235000021317 phosphate Nutrition 0.000 description 4
- 229920002223 polystyrene Polymers 0.000 description 4
- BWHMMNNQKKPAPP-UHFFFAOYSA-L potassium carbonate Chemical compound [K+].[K+].[O-]C([O-])=O BWHMMNNQKKPAPP-UHFFFAOYSA-L 0.000 description 4
- 230000035945 sensitivity Effects 0.000 description 4
- 229910052708 sodium Inorganic materials 0.000 description 4
- 239000011734 sodium Substances 0.000 description 4
- GEHJYWRUCIMESM-UHFFFAOYSA-L sodium sulfite Chemical compound [Na+].[Na+].[O-]S([O-])=O GEHJYWRUCIMESM-UHFFFAOYSA-L 0.000 description 4
- HFQQZARZPUDIFP-UHFFFAOYSA-M sodium;2-dodecylbenzenesulfonate Chemical compound [Na+].CCCCCCCCCCCCC1=CC=CC=C1S([O-])(=O)=O HFQQZARZPUDIFP-UHFFFAOYSA-M 0.000 description 4
- 239000003381 stabilizer Substances 0.000 description 4
- 229910052717 sulfur Inorganic materials 0.000 description 4
- 238000005406 washing Methods 0.000 description 4
- 229920002307 Dextran Polymers 0.000 description 3
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 3
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 3
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 description 3
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 3
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- 239000004372 Polyvinyl alcohol Substances 0.000 description 3
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 3
- ZJCCRDAZUWHFQH-UHFFFAOYSA-N Trimethylolpropane Chemical compound CCC(CO)(CO)CO ZJCCRDAZUWHFQH-UHFFFAOYSA-N 0.000 description 3
- SJOOOZPMQAWAOP-UHFFFAOYSA-N [Ag].BrCl Chemical compound [Ag].BrCl SJOOOZPMQAWAOP-UHFFFAOYSA-N 0.000 description 3
- 239000012190 activator Substances 0.000 description 3
- 230000002411 adverse Effects 0.000 description 3
- 125000003545 alkoxy group Chemical group 0.000 description 3
- 229910001870 ammonium persulfate Inorganic materials 0.000 description 3
- 239000002585 base Substances 0.000 description 3
- 229910052799 carbon Inorganic materials 0.000 description 3
- 150000001768 cations Chemical class 0.000 description 3
- 239000001913 cellulose Substances 0.000 description 3
- 229920002678 cellulose Polymers 0.000 description 3
- 235000010980 cellulose Nutrition 0.000 description 3
- 238000006243 chemical reaction Methods 0.000 description 3
- 239000012141 concentrate Substances 0.000 description 3
- 239000006258 conductive agent Substances 0.000 description 3
- 238000007334 copolymerization reaction Methods 0.000 description 3
- 239000013078 crystal Substances 0.000 description 3
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 3
- 229910052737 gold Inorganic materials 0.000 description 3
- 239000010931 gold Substances 0.000 description 3
- 229910052736 halogen Inorganic materials 0.000 description 3
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 3
- 239000012046 mixed solvent Substances 0.000 description 3
- 229910052757 nitrogen Inorganic materials 0.000 description 3
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 3
- 229920001495 poly(sodium acrylate) polymer Polymers 0.000 description 3
- 229920000172 poly(styrenesulfonic acid) Polymers 0.000 description 3
- 229920002401 polyacrylamide Polymers 0.000 description 3
- 239000004848 polyfunctional curative Substances 0.000 description 3
- 239000004926 polymethyl methacrylate Substances 0.000 description 3
- 229940005642 polystyrene sulfonic acid Drugs 0.000 description 3
- 229920002451 polyvinyl alcohol Polymers 0.000 description 3
- USHAGKDGDHPEEY-UHFFFAOYSA-L potassium persulfate Chemical compound [K+].[K+].[O-]S(=O)(=O)OOS([O-])(=O)=O USHAGKDGDHPEEY-UHFFFAOYSA-L 0.000 description 3
- VNAUDIIOSMNXBA-UHFFFAOYSA-N pyrazolo[4,3-c]pyrazole Chemical group N1=NC=C2N=NC=C21 VNAUDIIOSMNXBA-UHFFFAOYSA-N 0.000 description 3
- 238000011160 research Methods 0.000 description 3
- NNMHYFLPFNGQFZ-UHFFFAOYSA-M sodium polyacrylate Chemical compound [Na+].[O-]C(=O)C=C NNMHYFLPFNGQFZ-UHFFFAOYSA-M 0.000 description 3
- 230000000087 stabilizing effect Effects 0.000 description 3
- 238000003860 storage Methods 0.000 description 3
- 125000001424 substituent group Chemical group 0.000 description 3
- 239000011593 sulfur Substances 0.000 description 3
- 150000003467 sulfuric acid derivatives Chemical class 0.000 description 3
- SYSZENVIJHPFNL-UHFFFAOYSA-N (alpha-D-mannosyl)7-beta-D-mannosyl-diacetylchitobiosyl-L-asparagine, isoform B (protein) Chemical compound COC1=CC=C(I)C=C1 SYSZENVIJHPFNL-UHFFFAOYSA-N 0.000 description 2
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 2
- JAHNSTQSQJOJLO-UHFFFAOYSA-N 2-(3-fluorophenyl)-1h-imidazole Chemical compound FC1=CC=CC(C=2NC=CN=2)=C1 JAHNSTQSQJOJLO-UHFFFAOYSA-N 0.000 description 2
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 2
- RYYXDZDBXNUPOG-UHFFFAOYSA-N 4,5,6,7-tetrahydro-1,3-benzothiazole-2,6-diamine;dihydrochloride Chemical compound Cl.Cl.C1C(N)CCC2=C1SC(N)=N2 RYYXDZDBXNUPOG-UHFFFAOYSA-N 0.000 description 2
- KDCGOANMDULRCW-UHFFFAOYSA-N 7H-purine Chemical compound N1=CNC2=NC=NC2=C1 KDCGOANMDULRCW-UHFFFAOYSA-N 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 2
- ZHNUHDYFZUAESO-UHFFFAOYSA-N Formamide Chemical compound NC=O ZHNUHDYFZUAESO-UHFFFAOYSA-N 0.000 description 2
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 2
- BAPJBEWLBFYGME-UHFFFAOYSA-N Methyl acrylate Chemical compound COC(=O)C=C BAPJBEWLBFYGME-UHFFFAOYSA-N 0.000 description 2
- VVQNEPGJFQJSBK-UHFFFAOYSA-N Methyl methacrylate Chemical compound COC(=O)C(C)=C VVQNEPGJFQJSBK-UHFFFAOYSA-N 0.000 description 2
- ZCQWOFVYLHDMMC-UHFFFAOYSA-N Oxazole Chemical compound C1=COC=N1 ZCQWOFVYLHDMMC-UHFFFAOYSA-N 0.000 description 2
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium on carbon Substances [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 2
- SMWDFEZZVXVKRB-UHFFFAOYSA-N Quinoline Chemical compound N1=CC=CC2=CC=CC=C21 SMWDFEZZVXVKRB-UHFFFAOYSA-N 0.000 description 2
- 229920002125 Sokalan® Polymers 0.000 description 2
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 2
- FZWLAAWBMGSTSO-UHFFFAOYSA-N Thiazole Chemical compound C1=CSC=N1 FZWLAAWBMGSTSO-UHFFFAOYSA-N 0.000 description 2
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 2
- 239000000654 additive Substances 0.000 description 2
- 125000001931 aliphatic group Chemical group 0.000 description 2
- 229910052783 alkali metal Inorganic materials 0.000 description 2
- 150000005215 alkyl ethers Chemical class 0.000 description 2
- 150000001412 amines Chemical class 0.000 description 2
- 150000001491 aromatic compounds Chemical class 0.000 description 2
- 125000000732 arylene group Chemical group 0.000 description 2
- 239000012298 atmosphere Substances 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- 239000011324 bead Substances 0.000 description 2
- CJPQIRJHIZUAQP-MRXNPFEDSA-N benalaxyl-M Chemical compound CC=1C=CC=C(C)C=1N([C@H](C)C(=O)OC)C(=O)CC1=CC=CC=C1 CJPQIRJHIZUAQP-MRXNPFEDSA-N 0.000 description 2
- JEHKKBHWRAXMCH-UHFFFAOYSA-N benzenesulfinic acid Chemical compound O[S@@](=O)C1=CC=CC=C1 JEHKKBHWRAXMCH-UHFFFAOYSA-N 0.000 description 2
- 239000011230 binding agent Substances 0.000 description 2
- 239000007844 bleaching agent Substances 0.000 description 2
- 229920006317 cationic polymer Polymers 0.000 description 2
- 150000001805 chlorine compounds Chemical class 0.000 description 2
- 239000008119 colloidal silica Substances 0.000 description 2
- 239000002131 composite material Substances 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 2
- ORTQZVOHEJQUHG-UHFFFAOYSA-L copper(II) chloride Chemical compound Cl[Cu]Cl ORTQZVOHEJQUHG-UHFFFAOYSA-L 0.000 description 2
- 238000003851 corona treatment Methods 0.000 description 2
- 125000004093 cyano group Chemical group *C#N 0.000 description 2
- 239000003599 detergent Substances 0.000 description 2
- YADSGOSSYOOKMP-UHFFFAOYSA-N dioxolead Chemical compound O=[Pb]=O YADSGOSSYOOKMP-UHFFFAOYSA-N 0.000 description 2
- 238000007598 dipping method Methods 0.000 description 2
- 239000012153 distilled water Substances 0.000 description 2
- GVGUFUZHNYFZLC-UHFFFAOYSA-N dodecyl benzenesulfonate;sodium Chemical compound [Na].CCCCCCCCCCCCOS(=O)(=O)C1=CC=CC=C1 GVGUFUZHNYFZLC-UHFFFAOYSA-N 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- 230000005611 electricity Effects 0.000 description 2
- 150000002148 esters Chemical class 0.000 description 2
- 150000002170 ethers Chemical class 0.000 description 2
- 238000005189 flocculation Methods 0.000 description 2
- 230000016615 flocculation Effects 0.000 description 2
- 229910052731 fluorine Inorganic materials 0.000 description 2
- 125000005843 halogen group Chemical group 0.000 description 2
- 150000002367 halogens Chemical class 0.000 description 2
- 125000005842 heteroatom Chemical group 0.000 description 2
- 150000002391 heterocyclic compounds Chemical class 0.000 description 2
- 230000006872 improvement Effects 0.000 description 2
- 239000003112 inhibitor Substances 0.000 description 2
- AWJUIBRHMBBTKR-UHFFFAOYSA-N isoquinoline Chemical compound C1=NC=CC2=CC=CC=C21 AWJUIBRHMBBTKR-UHFFFAOYSA-N 0.000 description 2
- 210000003127 knee Anatomy 0.000 description 2
- 229910052744 lithium Inorganic materials 0.000 description 2
- 229910052943 magnesium sulfate Inorganic materials 0.000 description 2
- 235000019341 magnesium sulphate Nutrition 0.000 description 2
- 230000014759 maintenance of location Effects 0.000 description 2
- NUJOXMJBOLGQSY-UHFFFAOYSA-N manganese dioxide Chemical compound O=[Mn]=O NUJOXMJBOLGQSY-UHFFFAOYSA-N 0.000 description 2
- 229910044991 metal oxide Inorganic materials 0.000 description 2
- 150000004706 metal oxides Chemical class 0.000 description 2
- BDAGIHXWWSANSR-UHFFFAOYSA-N methanoic acid Natural products OC=O BDAGIHXWWSANSR-UHFFFAOYSA-N 0.000 description 2
- 229920000609 methyl cellulose Polymers 0.000 description 2
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 2
- 239000001923 methylcellulose Substances 0.000 description 2
- 235000010981 methylcellulose Nutrition 0.000 description 2
- LVHBHZANLOWSRM-UHFFFAOYSA-N methylenebutanedioic acid Natural products OC(=O)CC(=C)C(O)=O LVHBHZANLOWSRM-UHFFFAOYSA-N 0.000 description 2
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 description 2
- LQNUZADURLCDLV-UHFFFAOYSA-N nitrobenzene Chemical compound [O-][N+](=O)C1=CC=CC=C1 LQNUZADURLCDLV-UHFFFAOYSA-N 0.000 description 2
- 239000002736 nonionic surfactant Substances 0.000 description 2
- 125000006353 oxyethylene group Chemical group 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- 239000010452 phosphate Substances 0.000 description 2
- 239000004014 plasticizer Substances 0.000 description 2
- 239000004584 polyacrylic acid Substances 0.000 description 2
- 229910000027 potassium carbonate Inorganic materials 0.000 description 2
- FGIUAXJPYTZDNR-UHFFFAOYSA-N potassium nitrate Chemical compound [K+].[O-][N+]([O-])=O FGIUAXJPYTZDNR-UHFFFAOYSA-N 0.000 description 2
- 239000002243 precursor Substances 0.000 description 2
- NDGRWYRVNANFNB-UHFFFAOYSA-N pyrazolidin-3-one Chemical class O=C1CCNN1 NDGRWYRVNANFNB-UHFFFAOYSA-N 0.000 description 2
- AOJFQRQNPXYVLM-UHFFFAOYSA-N pyridin-1-ium;chloride Chemical compound [Cl-].C1=CC=[NH+]C=C1 AOJFQRQNPXYVLM-UHFFFAOYSA-N 0.000 description 2
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 2
- GZTPJDLYPMPRDF-UHFFFAOYSA-N pyrrolo[3,2-c]pyrazole Chemical group N1=NC2=CC=NC2=C1 GZTPJDLYPMPRDF-UHFFFAOYSA-N 0.000 description 2
- MABBLQAEAFNAFU-UHFFFAOYSA-N pyrrolo[3,2-e]indazole Chemical group C1=CC2=NC=CC2=C2C=NN=C21 MABBLQAEAFNAFU-UHFFFAOYSA-N 0.000 description 2
- SONJTKJMTWTJCT-UHFFFAOYSA-K rhodium(iii) chloride Chemical compound [Cl-].[Cl-].[Cl-].[Rh+3] SONJTKJMTWTJCT-UHFFFAOYSA-K 0.000 description 2
- 238000004062 sedimentation Methods 0.000 description 2
- 239000011780 sodium chloride Substances 0.000 description 2
- 235000010265 sodium sulphite Nutrition 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- 125000005504 styryl group Chemical group 0.000 description 2
- 125000000547 substituted alkyl group Chemical group 0.000 description 2
- 235000000346 sugar Nutrition 0.000 description 2
- BDHFUVZGWQCTTF-UHFFFAOYSA-M sulfonate Chemical compound [O-]S(=O)=O BDHFUVZGWQCTTF-UHFFFAOYSA-M 0.000 description 2
- 239000002344 surface layer Substances 0.000 description 2
- 238000010998 test method Methods 0.000 description 2
- LUMLZKVIXLWTCI-NSCUHMNNSA-N (e)-2,3-dichloro-4-oxobut-2-enoic acid Chemical compound OC(=O)C(\Cl)=C(/Cl)C=O LUMLZKVIXLWTCI-NSCUHMNNSA-N 0.000 description 1
- YXIWHUQXZSMYRE-UHFFFAOYSA-N 1,3-benzothiazole-2-thiol Chemical class C1=CC=C2SC(S)=NC2=C1 YXIWHUQXZSMYRE-UHFFFAOYSA-N 0.000 description 1
- BCMCBBGGLRIHSE-UHFFFAOYSA-N 1,3-benzoxazole Chemical compound C1=CC=C2OC=NC2=C1 BCMCBBGGLRIHSE-UHFFFAOYSA-N 0.000 description 1
- 125000000355 1,3-benzoxazolyl group Chemical group O1C(=NC2=C1C=CC=C2)* 0.000 description 1
- SOBDFTUDYRPGJY-UHFFFAOYSA-N 1,3-bis(ethenylsulfonyl)propan-2-ol Chemical compound C=CS(=O)(=O)CC(O)CS(=O)(=O)C=C SOBDFTUDYRPGJY-UHFFFAOYSA-N 0.000 description 1
- YHMYGUUIMTVXNW-UHFFFAOYSA-N 1,3-dihydrobenzimidazole-2-thione Chemical class C1=CC=C2NC(S)=NC2=C1 YHMYGUUIMTVXNW-UHFFFAOYSA-N 0.000 description 1
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 1
- AZQWKYJCGOJGHM-UHFFFAOYSA-N 1,4-benzoquinone Chemical compound O=C1C=CC(=O)C=C1 AZQWKYJCGOJGHM-UHFFFAOYSA-N 0.000 description 1
- KAMCBFNNGGVPPW-UHFFFAOYSA-N 1-(ethenylsulfonylmethoxymethylsulfonyl)ethene Chemical compound C=CS(=O)(=O)COCS(=O)(=O)C=C KAMCBFNNGGVPPW-UHFFFAOYSA-N 0.000 description 1
- GGZHVNZHFYCSEV-UHFFFAOYSA-N 1-Phenyl-5-mercaptotetrazole Chemical compound SC1=NN=NN1C1=CC=CC=C1 GGZHVNZHFYCSEV-UHFFFAOYSA-N 0.000 description 1
- BFCFYVKQTRLZHA-UHFFFAOYSA-N 1-chloro-2-nitrobenzene Chemical compound [O-][N+](=O)C1=CC=CC=C1Cl BFCFYVKQTRLZHA-UHFFFAOYSA-N 0.000 description 1
- CMCBDXRRFKYBDG-UHFFFAOYSA-N 1-dodecoxydodecane Chemical compound CCCCCCCCCCCCOCCCCCCCCCCCC CMCBDXRRFKYBDG-UHFFFAOYSA-N 0.000 description 1
- IXPNQXFRVYWDDI-UHFFFAOYSA-N 1-methyl-2,4-dioxo-1,3-diazinane-5-carboximidamide Chemical compound CN1CC(C(N)=N)C(=O)NC1=O IXPNQXFRVYWDDI-UHFFFAOYSA-N 0.000 description 1
- TZMSYXZUNZXBOL-UHFFFAOYSA-N 10H-phenoxazine Chemical compound C1=CC=C2NC3=CC=CC=C3OC2=C1 TZMSYXZUNZXBOL-UHFFFAOYSA-N 0.000 description 1
- JAAIPIWKKXCNOC-UHFFFAOYSA-N 1h-tetrazol-1-ium-5-thiolate Chemical class SC1=NN=NN1 JAAIPIWKKXCNOC-UHFFFAOYSA-N 0.000 description 1
- HAZJTCQWIDBCCE-UHFFFAOYSA-N 1h-triazine-6-thione Chemical class SC1=CC=NN=N1 HAZJTCQWIDBCCE-UHFFFAOYSA-N 0.000 description 1
- VEPOHXYIFQMVHW-XOZOLZJESA-N 2,3-dihydroxybutanedioic acid (2S,3S)-3,4-dimethyl-2-phenylmorpholine Chemical compound OC(C(O)C(O)=O)C(O)=O.C[C@H]1[C@@H](OCCN1C)c1ccccc1 VEPOHXYIFQMVHW-XOZOLZJESA-N 0.000 description 1
- VZSRBBMJRBPUNF-UHFFFAOYSA-N 2-(2,3-dihydro-1H-inden-2-ylamino)-N-[3-oxo-3-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)propyl]pyrimidine-5-carboxamide Chemical compound C1C(CC2=CC=CC=C12)NC1=NC=C(C=N1)C(=O)NCCC(N1CC2=C(CC1)NN=N2)=O VZSRBBMJRBPUNF-UHFFFAOYSA-N 0.000 description 1
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 1
- LBLYYCQCTBFVLH-UHFFFAOYSA-N 2-Methylbenzenesulfonic acid Chemical compound CC1=CC=CC=C1S(O)(=O)=O LBLYYCQCTBFVLH-UHFFFAOYSA-N 0.000 description 1
- PHPYXVIHDRDPDI-UHFFFAOYSA-N 2-bromo-1h-benzimidazole Chemical class C1=CC=C2NC(Br)=NC2=C1 PHPYXVIHDRDPDI-UHFFFAOYSA-N 0.000 description 1
- AYPSHJCKSDNETA-UHFFFAOYSA-N 2-chloro-1h-benzimidazole Chemical class C1=CC=C2NC(Cl)=NC2=C1 AYPSHJCKSDNETA-UHFFFAOYSA-N 0.000 description 1
- LDZYRENCLPUXAX-UHFFFAOYSA-N 2-methyl-1h-benzimidazole Chemical compound C1=CC=C2NC(C)=NC2=C1 LDZYRENCLPUXAX-UHFFFAOYSA-N 0.000 description 1
- DXYYSGDWQCSKKO-UHFFFAOYSA-N 2-methylbenzothiazole Chemical compound C1=CC=C2SC(C)=NC2=C1 DXYYSGDWQCSKKO-UHFFFAOYSA-N 0.000 description 1
- KRTDQDCPEZRVGC-UHFFFAOYSA-N 2-nitro-1h-benzimidazole Chemical class C1=CC=C2NC([N+](=O)[O-])=NC2=C1 KRTDQDCPEZRVGC-UHFFFAOYSA-N 0.000 description 1
- JSIAIROWMJGMQZ-UHFFFAOYSA-N 2h-triazol-4-amine Chemical class NC1=CNN=N1 JSIAIROWMJGMQZ-UHFFFAOYSA-N 0.000 description 1
- CBHTTYDJRXOHHL-UHFFFAOYSA-N 2h-triazolo[4,5-c]pyridazine Chemical compound N1=NC=CC2=C1N=NN2 CBHTTYDJRXOHHL-UHFFFAOYSA-N 0.000 description 1
- FZDQYXPAPYCFGP-UHFFFAOYSA-N 3-(4-octylphenoxy)propane-1,2-diol Chemical compound CCCCCCCCC1=CC=C(OCC(O)CO)C=C1 FZDQYXPAPYCFGP-UHFFFAOYSA-N 0.000 description 1
- OCVLSHAVSIYKLI-UHFFFAOYSA-N 3h-1,3-thiazole-2-thione Chemical class SC1=NC=CS1 OCVLSHAVSIYKLI-UHFFFAOYSA-N 0.000 description 1
- OSWFIVFLDKOXQC-UHFFFAOYSA-N 4-(3-methoxyphenyl)aniline Chemical compound COC1=CC=CC(C=2C=CC(N)=CC=2)=C1 OSWFIVFLDKOXQC-UHFFFAOYSA-N 0.000 description 1
- DSVIHYOAKPVFEH-UHFFFAOYSA-N 4-(hydroxymethyl)-4-methyl-1-phenylpyrazolidin-3-one Chemical compound N1C(=O)C(C)(CO)CN1C1=CC=CC=C1 DSVIHYOAKPVFEH-UHFFFAOYSA-N 0.000 description 1
- MAGFQRLKWCCTQJ-UHFFFAOYSA-N 4-ethenylbenzenesulfonic acid Chemical compound OS(=O)(=O)C1=CC=C(C=C)C=C1 MAGFQRLKWCCTQJ-UHFFFAOYSA-N 0.000 description 1
- ZVNPWFOVUDMGRP-UHFFFAOYSA-N 4-methylaminophenol sulfate Chemical compound OS(O)(=O)=O.CNC1=CC=C(O)C=C1.CNC1=CC=C(O)C=C1 ZVNPWFOVUDMGRP-UHFFFAOYSA-N 0.000 description 1
- UTMDJGPRCLQPBT-UHFFFAOYSA-N 4-nitro-1h-1,2,3-benzotriazole Chemical class [O-][N+](=O)C1=CC=CC2=NNN=C12 UTMDJGPRCLQPBT-UHFFFAOYSA-N 0.000 description 1
- RJFZHPDNWXGSMU-UHFFFAOYSA-N 5,6-dichloro-1h-triazin-4-one Chemical compound OC1=NN=NC(Cl)=C1Cl RJFZHPDNWXGSMU-UHFFFAOYSA-N 0.000 description 1
- WSGURAYTCUVDQL-UHFFFAOYSA-N 5-nitro-1h-indazole Chemical compound [O-][N+](=O)C1=CC=C2NN=CC2=C1 WSGURAYTCUVDQL-UHFFFAOYSA-N 0.000 description 1
- GIQKIFWTIQDQMM-UHFFFAOYSA-N 5h-1,3-oxazole-2-thione Chemical compound S=C1OCC=N1 GIQKIFWTIQDQMM-UHFFFAOYSA-N 0.000 description 1
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical compound [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 1
- NLHHRLWOUZZQLW-UHFFFAOYSA-N Acrylonitrile Chemical compound C=CC#N NLHHRLWOUZZQLW-UHFFFAOYSA-N 0.000 description 1
- 102000009027 Albumins Human genes 0.000 description 1
- 108010088751 Albumins Proteins 0.000 description 1
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 1
- QGZKDVFQNNGYKY-UHFFFAOYSA-O Ammonium Chemical compound [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 description 1
- KHBQMWCZKVMBLN-UHFFFAOYSA-N Benzenesulfonamide Chemical compound NS(=O)(=O)C1=CC=CC=C1 KHBQMWCZKVMBLN-UHFFFAOYSA-N 0.000 description 1
- LSNNMFCWUKXFEE-UHFFFAOYSA-M Bisulfite Chemical compound OS([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-M 0.000 description 1
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 1
- DGXHSCAFHDGUNZ-UHFFFAOYSA-M C(CCCCCCC)C1=CC=C(C=C1)CCOCCOC(C)S(=O)(=O)[O-].[Na+] Chemical compound C(CCCCCCC)C1=CC=C(C=C1)CCOCCOC(C)S(=O)(=O)[O-].[Na+] DGXHSCAFHDGUNZ-UHFFFAOYSA-M 0.000 description 1
- 229920002134 Carboxymethyl cellulose Polymers 0.000 description 1
- 229920002284 Cellulose triacetate Polymers 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 1
- 235000008733 Citrus aurantifolia Nutrition 0.000 description 1
- FBPFZTCFMRRESA-FSIIMWSLSA-N D-Glucitol Natural products OC[C@H](O)[C@H](O)[C@@H](O)[C@H](O)CO FBPFZTCFMRRESA-FSIIMWSLSA-N 0.000 description 1
- FBPFZTCFMRRESA-JGWLITMVSA-N D-glucitol Chemical compound OC[C@H](O)[C@@H](O)[C@H](O)[C@H](O)CO FBPFZTCFMRRESA-JGWLITMVSA-N 0.000 description 1
- RWSOTUBLDIXVET-UHFFFAOYSA-N Dihydrogen sulfide Chemical class S RWSOTUBLDIXVET-UHFFFAOYSA-N 0.000 description 1
- XTHFKEDIFFGKHM-UHFFFAOYSA-N Dimethoxyethane Chemical compound COCCOC XTHFKEDIFFGKHM-UHFFFAOYSA-N 0.000 description 1
- BVTJGGGYKAMDBN-UHFFFAOYSA-N Dioxetane Chemical compound C1COO1 BVTJGGGYKAMDBN-UHFFFAOYSA-N 0.000 description 1
- 102000004190 Enzymes Human genes 0.000 description 1
- 108090000790 Enzymes Proteins 0.000 description 1
- OTMSDBZUPAUEDD-UHFFFAOYSA-N Ethane Chemical compound CC OTMSDBZUPAUEDD-UHFFFAOYSA-N 0.000 description 1
- JOYRKODLDBILNP-UHFFFAOYSA-N Ethyl urethane Chemical compound CCOC(N)=O JOYRKODLDBILNP-UHFFFAOYSA-N 0.000 description 1
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 1
- CTKINSOISVBQLD-UHFFFAOYSA-N Glycidol Chemical class OCC1CO1 CTKINSOISVBQLD-UHFFFAOYSA-N 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- 229920000663 Hydroxyethyl cellulose Polymers 0.000 description 1
- 239000004354 Hydroxyethyl cellulose Substances 0.000 description 1
- RAXXELZNTBOGNW-UHFFFAOYSA-O Imidazolium Chemical compound C1=C[NH+]=CN1 RAXXELZNTBOGNW-UHFFFAOYSA-O 0.000 description 1
- 229910021578 Iron(III) chloride Inorganic materials 0.000 description 1
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 description 1
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 1
- 229920000881 Modified starch Polymers 0.000 description 1
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 1
- QPCDCPDFJACHGM-UHFFFAOYSA-N N,N-bis{2-[bis(carboxymethyl)amino]ethyl}glycine Chemical compound OC(=O)CN(CC(O)=O)CCN(CC(=O)O)CCN(CC(O)=O)CC(O)=O QPCDCPDFJACHGM-UHFFFAOYSA-N 0.000 description 1
- XRGDSIZUVYSMTI-UHFFFAOYSA-N O.O.O.[Na].[Na].C(CN(CC(=O)O)CC(=O)O)N(CC(=O)O)CC(=O)O Chemical compound O.O.O.[Na].[Na].C(CN(CC(=O)O)CC(=O)O)N(CC(=O)O)CC(=O)O XRGDSIZUVYSMTI-UHFFFAOYSA-N 0.000 description 1
- PCNDJXKNXGMECE-UHFFFAOYSA-N Phenazine Natural products C1=CC=CC2=NC3=CC=CC=C3N=C21 PCNDJXKNXGMECE-UHFFFAOYSA-N 0.000 description 1
- 229920002845 Poly(methacrylic acid) Polymers 0.000 description 1
- 229920000388 Polyphosphate Polymers 0.000 description 1
- 229920001328 Polyvinylidene chloride Polymers 0.000 description 1
- 241000381592 Senegalia polyacantha Species 0.000 description 1
- 229910021607 Silver chloride Inorganic materials 0.000 description 1
- VMHLLURERBWHNL-UHFFFAOYSA-M Sodium acetate Chemical compound [Na+].CC([O-])=O VMHLLURERBWHNL-UHFFFAOYSA-M 0.000 description 1
- 241000862632 Soja Species 0.000 description 1
- ULUAUXLGCMPNKK-UHFFFAOYSA-N Sulfobutanedioic acid Chemical compound OC(=O)CC(C(O)=O)S(O)(=O)=O ULUAUXLGCMPNKK-UHFFFAOYSA-N 0.000 description 1
- XOAAWQZATWQOTB-UHFFFAOYSA-N Taurine Natural products NCCS(O)(=O)=O XOAAWQZATWQOTB-UHFFFAOYSA-N 0.000 description 1
- 235000011941 Tilia x europaea Nutrition 0.000 description 1
- GSEJCLTVZPLZKY-UHFFFAOYSA-N Triethanolamine Chemical compound OCCN(CCO)CCO GSEJCLTVZPLZKY-UHFFFAOYSA-N 0.000 description 1
- 235000010724 Wisteria floribunda Nutrition 0.000 description 1
- NNLVGZFZQQXQNW-ADJNRHBOSA-N [(2r,3r,4s,5r,6s)-4,5-diacetyloxy-3-[(2s,3r,4s,5r,6r)-3,4,5-triacetyloxy-6-(acetyloxymethyl)oxan-2-yl]oxy-6-[(2r,3r,4s,5r,6s)-4,5,6-triacetyloxy-2-(acetyloxymethyl)oxan-3-yl]oxyoxan-2-yl]methyl acetate Chemical compound O([C@@H]1O[C@@H]([C@H]([C@H](OC(C)=O)[C@H]1OC(C)=O)O[C@H]1[C@@H]([C@@H](OC(C)=O)[C@H](OC(C)=O)[C@@H](COC(C)=O)O1)OC(C)=O)COC(=O)C)[C@@H]1[C@@H](COC(C)=O)O[C@@H](OC(C)=O)[C@H](OC(C)=O)[C@H]1OC(C)=O NNLVGZFZQQXQNW-ADJNRHBOSA-N 0.000 description 1
- 239000006096 absorbing agent Substances 0.000 description 1
- 230000001133 acceleration Effects 0.000 description 1
- DHKHKXVYLBGOIT-UHFFFAOYSA-N acetaldehyde Diethyl Acetal Natural products CCOC(C)OCC DHKHKXVYLBGOIT-UHFFFAOYSA-N 0.000 description 1
- 150000001241 acetals Chemical class 0.000 description 1
- 150000001242 acetic acid derivatives Chemical class 0.000 description 1
- 230000002378 acidificating effect Effects 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- 239000002390 adhesive tape Substances 0.000 description 1
- 238000004220 aggregation Methods 0.000 description 1
- 230000002776 aggregation Effects 0.000 description 1
- 238000004378 air conditioning Methods 0.000 description 1
- 238000007754 air knife coating Methods 0.000 description 1
- 150000001340 alkali metals Chemical class 0.000 description 1
- 229910052784 alkaline earth metal Inorganic materials 0.000 description 1
- 239000012670 alkaline solution Substances 0.000 description 1
- 125000005250 alkyl acrylate group Chemical group 0.000 description 1
- 150000003973 alkyl amines Chemical class 0.000 description 1
- 150000001346 alkyl aryl ethers Chemical class 0.000 description 1
- 125000005599 alkyl carboxylate group Chemical group 0.000 description 1
- 125000005907 alkyl ester group Chemical group 0.000 description 1
- 125000005037 alkyl phenyl group Chemical group 0.000 description 1
- 150000008051 alkyl sulfates Chemical class 0.000 description 1
- 150000001408 amides Chemical class 0.000 description 1
- 150000001413 amino acids Chemical class 0.000 description 1
- 125000003277 amino group Chemical group 0.000 description 1
- XYXNTHIYBIDHGM-UHFFFAOYSA-N ammonium thiosulfate Chemical compound [NH4+].[NH4+].[O-]S([O-])(=O)=S XYXNTHIYBIDHGM-UHFFFAOYSA-N 0.000 description 1
- 125000002490 anilino group Chemical group [H]N(*)C1=C([H])C([H])=C([H])C([H])=C1[H] 0.000 description 1
- 125000000129 anionic group Chemical group 0.000 description 1
- 239000003945 anionic surfactant Substances 0.000 description 1
- 239000001000 anthraquinone dye Substances 0.000 description 1
- 229910052787 antimony Inorganic materials 0.000 description 1
- WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical compound [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 description 1
- 239000000987 azo dye Substances 0.000 description 1
- 150000003851 azoles Chemical class 0.000 description 1
- 150000001565 benzotriazoles Chemical class 0.000 description 1
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 description 1
- 229910052794 bromium Inorganic materials 0.000 description 1
- CDQSJQSWAWPGKG-UHFFFAOYSA-N butane-1,1-diol Chemical compound CCCC(O)O CDQSJQSWAWPGKG-UHFFFAOYSA-N 0.000 description 1
- 150000001661 cadmium Chemical class 0.000 description 1
- 239000006229 carbon black Substances 0.000 description 1
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 1
- 239000001768 carboxy methyl cellulose Substances 0.000 description 1
- 235000010948 carboxy methyl cellulose Nutrition 0.000 description 1
- 150000001735 carboxylic acids Chemical class 0.000 description 1
- 239000008112 carboxymethyl-cellulose Substances 0.000 description 1
- 239000005018 casein Substances 0.000 description 1
- BECPQYXYKAMYBN-UHFFFAOYSA-N casein, tech. Chemical compound NCCCCC(C(O)=O)N=C(O)C(CC(O)=O)N=C(O)C(CCC(O)=N)N=C(O)C(CC(C)C)N=C(O)C(CCC(O)=O)N=C(O)C(CC(O)=O)N=C(O)C(CCC(O)=O)N=C(O)C(C(C)O)N=C(O)C(CCC(O)=N)N=C(O)C(CCC(O)=N)N=C(O)C(CCC(O)=N)N=C(O)C(CCC(O)=O)N=C(O)C(CCC(O)=O)N=C(O)C(COP(O)(O)=O)N=C(O)C(CCC(O)=N)N=C(O)C(N)CC1=CC=CC=C1 BECPQYXYKAMYBN-UHFFFAOYSA-N 0.000 description 1
- 235000021240 caseins Nutrition 0.000 description 1
- 238000010531 catalytic reduction reaction Methods 0.000 description 1
- 125000002091 cationic group Chemical group 0.000 description 1
- 239000003093 cationic surfactant Substances 0.000 description 1
- 235000019504 cigarettes Nutrition 0.000 description 1
- WCZVZNOTHYJIEI-UHFFFAOYSA-N cinnoline Chemical group N1=NC=CC2=CC=CC=C21 WCZVZNOTHYJIEI-UHFFFAOYSA-N 0.000 description 1
- 230000003750 conditioning effect Effects 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- ARUVKPQLZAKDPS-UHFFFAOYSA-L copper(II) sulfate Chemical compound [Cu+2].[O-][S+2]([O-])([O-])[O-] ARUVKPQLZAKDPS-UHFFFAOYSA-L 0.000 description 1
- 229910000366 copper(II) sulfate Inorganic materials 0.000 description 1
- 229960003280 cupric chloride Drugs 0.000 description 1
- 229920005994 diacetyl cellulose Polymers 0.000 description 1
- 238000000502 dialysis Methods 0.000 description 1
- 235000014113 dietary fatty acids Nutrition 0.000 description 1
- VAYGXNSJCAHWJZ-UHFFFAOYSA-N dimethyl sulfate Chemical compound COS(=O)(=O)OC VAYGXNSJCAHWJZ-UHFFFAOYSA-N 0.000 description 1
- 238000003618 dip coating Methods 0.000 description 1
- JMGZBMRVDHKMKB-UHFFFAOYSA-L disodium;2-sulfobutanedioate Chemical compound [Na+].[Na+].OS(=O)(=O)C(C([O-])=O)CC([O-])=O JMGZBMRVDHKMKB-UHFFFAOYSA-L 0.000 description 1
- 239000002270 dispersing agent Substances 0.000 description 1
- WHLHMYQCPHAFGR-UHFFFAOYSA-N dodecyl nitrate;sodium Chemical compound [Na].CCCCCCCCCCCCO[N+]([O-])=O WHLHMYQCPHAFGR-UHFFFAOYSA-N 0.000 description 1
- 238000004043 dyeing Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 229920001971 elastomer Polymers 0.000 description 1
- 239000007772 electrode material Substances 0.000 description 1
- 238000000921 elemental analysis Methods 0.000 description 1
- 238000004945 emulsification Methods 0.000 description 1
- 239000003995 emulsifying agent Substances 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- RTZKZFJDLAIYFH-UHFFFAOYSA-N ether Substances CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 238000001125 extrusion Methods 0.000 description 1
- 238000007765 extrusion coating Methods 0.000 description 1
- 239000000194 fatty acid Substances 0.000 description 1
- 229930195729 fatty acid Natural products 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 125000001153 fluoro group Chemical group F* 0.000 description 1
- 239000006260 foam Substances 0.000 description 1
- 235000019253 formic acid Nutrition 0.000 description 1
- 238000009472 formulation Methods 0.000 description 1
- 230000006870 function Effects 0.000 description 1
- 235000011187 glycerol Nutrition 0.000 description 1
- 150000002334 glycols Chemical class 0.000 description 1
- 229920000578 graft copolymer Polymers 0.000 description 1
- 238000007756 gravure coating Methods 0.000 description 1
- 150000004820 halides Chemical class 0.000 description 1
- 150000002366 halogen compounds Chemical class 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 125000000623 heterocyclic group Chemical group 0.000 description 1
- 229920001519 homopolymer Polymers 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 230000007062 hydrolysis Effects 0.000 description 1
- 238000006460 hydrolysis reaction Methods 0.000 description 1
- AKCUHGBLDXXTOM-UHFFFAOYSA-N hydroxy-oxo-phenyl-sulfanylidene-$l^{6}-sulfane Chemical compound SS(=O)(=O)C1=CC=CC=C1 AKCUHGBLDXXTOM-UHFFFAOYSA-N 0.000 description 1
- 235000019447 hydroxyethyl cellulose Nutrition 0.000 description 1
- 150000002460 imidazoles Chemical class 0.000 description 1
- 229940079865 intestinal antiinfectives imidazole derivative Drugs 0.000 description 1
- 150000004694 iodide salts Chemical class 0.000 description 1
- 239000011630 iodine Substances 0.000 description 1
- 239000002563 ionic surfactant Substances 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 150000002503 iridium Chemical class 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 159000000014 iron salts Chemical class 0.000 description 1
- RBTARNINKXHZNM-UHFFFAOYSA-K iron trichloride Chemical compound Cl[Fe](Cl)Cl RBTARNINKXHZNM-UHFFFAOYSA-K 0.000 description 1
- RUTXIHLAWFEWGM-UHFFFAOYSA-H iron(3+) sulfate Chemical compound [Fe+3].[Fe+3].[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O RUTXIHLAWFEWGM-UHFFFAOYSA-H 0.000 description 1
- 229910000360 iron(III) sulfate Inorganic materials 0.000 description 1
- 125000002183 isoquinolinyl group Chemical group C1(=NC=CC2=CC=CC=C12)* 0.000 description 1
- 239000004571 lime Substances 0.000 description 1
- 229940057995 liquid paraffin Drugs 0.000 description 1
- 239000000314 lubricant Substances 0.000 description 1
- 239000006224 matting agent Substances 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 229910021645 metal ion Inorganic materials 0.000 description 1
- 229940117841 methacrylic acid copolymer Drugs 0.000 description 1
- 229920003145 methacrylic acid copolymer Polymers 0.000 description 1
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 1
- 125000001434 methanylylidene group Chemical group [H]C#[*] 0.000 description 1
- IWVKTOUOPHGZRX-UHFFFAOYSA-N methyl 2-methylprop-2-enoate;2-methylprop-2-enoic acid Chemical compound CC(=C)C(O)=O.COC(=O)C(C)=C IWVKTOUOPHGZRX-UHFFFAOYSA-N 0.000 description 1
- 150000007522 mineralic acids Chemical class 0.000 description 1
- 239000011259 mixed solution Substances 0.000 description 1
- 235000019426 modified starch Nutrition 0.000 description 1
- ZAKLKBFCSHJIRI-UHFFFAOYSA-N mucochloric acid Natural products OC1OC(=O)C(Cl)=C1Cl ZAKLKBFCSHJIRI-UHFFFAOYSA-N 0.000 description 1
- 238000006386 neutralization reaction Methods 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 150000002823 nitrates Chemical class 0.000 description 1
- 239000012299 nitrogen atmosphere Substances 0.000 description 1
- LYGJENNIWJXYER-UHFFFAOYSA-N nitromethane Chemical compound C[N+]([O-])=O LYGJENNIWJXYER-UHFFFAOYSA-N 0.000 description 1
- QIQXTHQIDYTFRH-UHFFFAOYSA-N octadecanoic acid Chemical compound CCCCCCCCCCCCCCCCCC(O)=O QIQXTHQIDYTFRH-UHFFFAOYSA-N 0.000 description 1
- 150000007524 organic acids Chemical class 0.000 description 1
- 235000005985 organic acids Nutrition 0.000 description 1
- 150000007530 organic bases Chemical class 0.000 description 1
- 239000007800 oxidant agent Substances 0.000 description 1
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 description 1
- 125000000913 palmityl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 239000012188 paraffin wax Substances 0.000 description 1
- 229960003330 pentetic acid Drugs 0.000 description 1
- VLTRZXGMWDSKGL-UHFFFAOYSA-N perchloric acid Chemical class OCl(=O)(=O)=O VLTRZXGMWDSKGL-UHFFFAOYSA-N 0.000 description 1
- 150000002978 peroxides Chemical class 0.000 description 1
- 125000001791 phenazinyl group Chemical group C1(=CC=CC2=NC3=CC=CC=C3N=C12)* 0.000 description 1
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N phenol group Chemical group C1(=CC=CC=C1)O ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 1
- 125000001644 phenoxazinyl group Chemical group C1(=CC=CC=2OC3=CC=CC=C3NC12)* 0.000 description 1
- XYFCBTPGUUZFHI-UHFFFAOYSA-O phosphonium Chemical compound [PH4+] XYFCBTPGUUZFHI-UHFFFAOYSA-O 0.000 description 1
- 150000003013 phosphoric acid derivatives Chemical class 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 229920000191 poly(N-vinyl pyrrolidone) Polymers 0.000 description 1
- 229920002006 poly(N-vinylimidazole) polymer Polymers 0.000 description 1
- 229920000233 poly(alkylene oxides) Polymers 0.000 description 1
- 229920002627 poly(phosphazenes) Polymers 0.000 description 1
- 229920001467 poly(styrenesulfonates) Polymers 0.000 description 1
- 229920001515 polyalkylene glycol Polymers 0.000 description 1
- 229920000767 polyaniline Polymers 0.000 description 1
- 229920000120 polyethyl acrylate Polymers 0.000 description 1
- 229920005862 polyol Polymers 0.000 description 1
- 150000003077 polyols Chemical class 0.000 description 1
- 239000001205 polyphosphate Substances 0.000 description 1
- 235000011176 polyphosphates Nutrition 0.000 description 1
- 229920001451 polypropylene glycol Polymers 0.000 description 1
- 229920001296 polysiloxane Polymers 0.000 description 1
- 229960002796 polystyrene sulfonate Drugs 0.000 description 1
- 239000011970 polystyrene sulfonate Substances 0.000 description 1
- 229920000131 polyvinylidene Polymers 0.000 description 1
- 239000005033 polyvinylidene chloride Substances 0.000 description 1
- 229920000036 polyvinylpyrrolidone Polymers 0.000 description 1
- 239000001267 polyvinylpyrrolidone Substances 0.000 description 1
- 235000013855 polyvinylpyrrolidone Nutrition 0.000 description 1
- 239000004323 potassium nitrate Substances 0.000 description 1
- 235000010333 potassium nitrate Nutrition 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 239000003755 preservative agent Substances 0.000 description 1
- 230000002265 prevention Effects 0.000 description 1
- 238000007639 printing Methods 0.000 description 1
- 230000001737 promoting effect Effects 0.000 description 1
- RUOJZAUFBMNUDX-UHFFFAOYSA-N propylene carbonate Chemical compound CC1COC(=O)O1 RUOJZAUFBMNUDX-UHFFFAOYSA-N 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 235000018102 proteins Nutrition 0.000 description 1
- 108090000623 proteins and genes Proteins 0.000 description 1
- 102000004169 proteins and genes Human genes 0.000 description 1
- 238000010298 pulverizing process Methods 0.000 description 1
- 238000000746 purification Methods 0.000 description 1
- 125000000561 purinyl group Chemical group N1=C(N=C2N=CNC2=C1)* 0.000 description 1
- MCSKRVKAXABJLX-UHFFFAOYSA-N pyrazolo[3,4-d]triazole Chemical compound N1=NN=C2N=NC=C21 MCSKRVKAXABJLX-UHFFFAOYSA-N 0.000 description 1
- JUJWROOIHBZHMG-UHFFFAOYSA-O pyridinium Chemical compound C1=CC=[NH+]C=C1 JUJWROOIHBZHMG-UHFFFAOYSA-O 0.000 description 1
- HBCQSNAFLVXVAY-UHFFFAOYSA-N pyrimidine-2-thiol Chemical class SC1=NC=CC=N1 HBCQSNAFLVXVAY-UHFFFAOYSA-N 0.000 description 1
- 125000001453 quaternary ammonium group Chemical group 0.000 description 1
- 125000002943 quinolinyl group Chemical group N1=C(C=CC2=CC=CC=C12)* 0.000 description 1
- 150000004053 quinones Chemical class 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 238000006722 reduction reaction Methods 0.000 description 1
- 238000010992 reflux Methods 0.000 description 1
- 150000003283 rhodium Chemical class 0.000 description 1
- 229930182490 saponin Natural products 0.000 description 1
- 150000007949 saponins Chemical class 0.000 description 1
- 235000017709 saponins Nutrition 0.000 description 1
- 230000001235 sensitizing effect Effects 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 239000000741 silica gel Substances 0.000 description 1
- 229910002027 silica gel Inorganic materials 0.000 description 1
- HKZLPVFGJNLROG-UHFFFAOYSA-M silver monochloride Chemical compound [Cl-].[Ag+] HKZLPVFGJNLROG-UHFFFAOYSA-M 0.000 description 1
- 239000001632 sodium acetate Substances 0.000 description 1
- 235000017281 sodium acetate Nutrition 0.000 description 1
- 235000010413 sodium alginate Nutrition 0.000 description 1
- 239000000661 sodium alginate Substances 0.000 description 1
- 229940005550 sodium alginate Drugs 0.000 description 1
- 229910000029 sodium carbonate Inorganic materials 0.000 description 1
- 229940080264 sodium dodecylbenzenesulfonate Drugs 0.000 description 1
- ZDQYSKICYIVCPN-UHFFFAOYSA-L sodium succinate (anhydrous) Chemical compound [Na+].[Na+].[O-]C(=O)CCC([O-])=O ZDQYSKICYIVCPN-UHFFFAOYSA-L 0.000 description 1
- WVFDILODTFJAPA-UHFFFAOYSA-M sodium;1,4-dihexoxy-1,4-dioxobutane-2-sulfonate Chemical compound [Na+].CCCCCCOC(=O)CC(S([O-])(=O)=O)C(=O)OCCCCCC WVFDILODTFJAPA-UHFFFAOYSA-M 0.000 description 1
- FCZYGJBVLGLYQU-UHFFFAOYSA-M sodium;2-[2-[2-[4-(2,4,4-trimethylpentan-2-yl)phenoxy]ethoxy]ethoxy]ethanesulfonate Chemical compound [Na+].CC(C)(C)CC(C)(C)C1=CC=C(OCCOCCOCCS([O-])(=O)=O)C=C1 FCZYGJBVLGLYQU-UHFFFAOYSA-M 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000000600 sorbitol Substances 0.000 description 1
- 230000003595 spectral effect Effects 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 239000007858 starting material Substances 0.000 description 1
- HMNUYYJYMOXWTN-UHFFFAOYSA-J strontium;barium(2+);disulfate Chemical compound [Sr+2].[Ba+2].[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O HMNUYYJYMOXWTN-UHFFFAOYSA-J 0.000 description 1
- 125000005649 substituted arylene group Chemical group 0.000 description 1
- 150000005846 sugar alcohols Polymers 0.000 description 1
- 150000008163 sugars Chemical class 0.000 description 1
- SEEPANYCNGTZFQ-UHFFFAOYSA-N sulfadiazine Chemical compound C1=CC(N)=CC=C1S(=O)(=O)NC1=NC=CC=N1 SEEPANYCNGTZFQ-UHFFFAOYSA-N 0.000 description 1
- LSNNMFCWUKXFEE-UHFFFAOYSA-L sulfite Chemical class [O-]S([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-L 0.000 description 1
- 125000000020 sulfo group Chemical group O=S(=O)([*])O[H] 0.000 description 1
- 125000004964 sulfoalkyl group Chemical group 0.000 description 1
- 150000003460 sulfonic acids Chemical class 0.000 description 1
- 229960003080 taurine Drugs 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- 150000003475 thallium Chemical class 0.000 description 1
- JJJPTTANZGDADF-UHFFFAOYSA-N thiadiazole-4-thiol Chemical class SC1=CSN=N1 JJJPTTANZGDADF-UHFFFAOYSA-N 0.000 description 1
- 239000002562 thickening agent Substances 0.000 description 1
- 150000003567 thiocyanates Chemical class 0.000 description 1
- 150000003568 thioethers Chemical class 0.000 description 1
- 125000005323 thioketone group Chemical group 0.000 description 1
- 150000004886 thiomorpholines Chemical class 0.000 description 1
- 229910052718 tin Inorganic materials 0.000 description 1
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 1
- 229910001887 tin oxide Inorganic materials 0.000 description 1
- 150000003852 triazoles Chemical group 0.000 description 1
- ITMCEJHCFYSIIV-UHFFFAOYSA-N triflic acid Chemical compound OS(=O)(=O)C(F)(F)F ITMCEJHCFYSIIV-UHFFFAOYSA-N 0.000 description 1
- 150000003672 ureas Chemical class 0.000 description 1
- 150000003673 urethanes Chemical class 0.000 description 1
- 239000002023 wood Substances 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
- 150000003751 zinc Chemical class 0.000 description 1
- 239000011787 zinc oxide Substances 0.000 description 1
- 229910001928 zirconium oxide Inorganic materials 0.000 description 1
Abstract
Description
【発明の詳細な説明】
(産業上の利用分野)
本発明は良好な帯電防止性を有するハロゲン化銀写真感
光材料に関し、特に、塗布性を…うことなくしかも処理
後のゴミ付きの改良されたハロゲン化銀写真感光材料(
以下「写真感光材料」と記す)に関するものである。Detailed Description of the Invention (Field of Industrial Application) The present invention relates to a silver halide photographic light-sensitive material having good antistatic properties, and in particular, to a silver halide photographic material having good antistatic properties, and in particular, to a silver halide photographic light-sensitive material that has improved dust retention after processing without impairing coating properties. Silver halide photographic material (
(hereinafter referred to as "photosensitive material").
(従来の技術)
写真感光材料は一般に電気絶縁性を有する支持体および
写真層から成っているので写真感光材料の製造工程中な
らびに使用時に同種または異種物質の表面との間の接触
摩擦または剥離をうけることによって静電電荷が蓄積さ
れることが多い、この蓄積された静電電荷は多くの障害
を引起すが、最も重大な障害は現像処理前に蓄積された
静電電荷が放電することによって感光性乳剤層が感光し
、写真フィルムを現像処理した際に点状スポット又は樹
枝状や羽毛状の線環を生ずることである。これがいわゆ
るスタチックマークと呼ばれているもので写真フィルム
の商品価値を著しく損ね、場合によっては全く商品価値
を失なわせしめる。(Prior Art) Photographic materials generally consist of an electrically insulating support and a photographic layer, so contact friction or peeling between surfaces of the same or different materials is avoided during the manufacturing process and during use of the photographic materials. This accumulated electrostatic charge can cause a number of problems, the most serious of which is due to the discharge of the accumulated electrostatic charge before the development process. When the photosensitive emulsion layer is exposed to light and the photographic film is developed, dot-like spots or dendritic or feather-like wire rings are produced. This is what is called a static mark, and it significantly reduces the commercial value of photographic film, and in some cases causes the film to lose its commercial value altogether.
またこれらの蓄積された静電電荷はフィルム表面へ塵埃
が付着したり、塗布が均一に行なえないなどの第2次的
な故障を誘起せしめる原因にもなる。Furthermore, these accumulated electrostatic charges may cause secondary failures such as dust adhesion to the film surface or inability to apply uniformly.
かかる静電電荷は前述したように写真感光材料の製造時
でのまたは各種の自動1最影機中での機械部分との間の
接触分離等が原因となって発生する。As described above, such electrostatic charges are generated due to contact and separation between mechanical parts during the production of photographic light-sensitive materials or in various types of automatic image forming machines.
特に最近においは、写真感光材料の高感度化および高速
塗布、高速撮影、高速自動現像処理化等の苛酷な取り扱
いを受ける機会が多くなったことによって一層スタチッ
クマークの発生が出易くなっている。更に又、処理され
た後のフィルムを種々取り扱う段階でゴミ付きを生じた
りするという問題を生じている。In particular, static marks are more likely to occur in recent years due to the increased sensitivity of photographic materials and the increased exposure to harsh handling such as high-speed coating, high-speed photography, and high-speed automatic processing. . Furthermore, there is a problem in that dust may accumulate during various handling stages of the processed film.
これらの静電気による障害をなくすためには写真感光材
料に帯電防止剤を添加することが好ましい。しかしなが
ら、写真感光材料に利用できる帯電防止剤は、他の分野
で一層に用いられている帯電防止剤がそのまま使用でき
る訳ではなく、写真感光材料に特有の種々の制約を受け
る。即ち写真感光材料に利用し得る帯電防止剤には帯電
防止性能が優れていることの他に、例えば写真感光材料
の感度、カブリ、粒状性、シャープネス等の写真特性に
悪影響を及ぼさないこと、写真感光材料の膜強度に悪影
響を与えないこと、耐接着性に悪影響を及ぼさないこと
、写真感光材料の処理液の疲労を早めないこと、搬送ロ
ーラーを汚染しないこと、写真感光材料の各構成層間の
接着強度を低下させないこと等々の性能が要求され、写
真感光材料へ帯電防止剤を適用することは非常に多(の
制約を受ける。In order to eliminate these problems caused by static electricity, it is preferable to add an antistatic agent to the photographic material. However, the antistatic agents that can be used in photographic light-sensitive materials cannot be used as they are, and are subject to various restrictions specific to photographic light-sensitive materials. That is, in addition to having excellent antistatic properties, antistatic agents that can be used in photographic light-sensitive materials must not have any adverse effect on photographic properties such as sensitivity, fog, graininess, sharpness, etc. of photographic light-sensitive materials; Does not adversely affect the film strength of the photosensitive material, does not adversely affect the adhesion resistance, does not accelerate the fatigue of the processing solution for the photographic material, does not contaminate the conveyance roller, and does not cause any damage between the constituent layers of the photographic material. Performance such as not reducing adhesive strength is required, and the application of antistatic agents to photographic materials is subject to numerous restrictions.
これらの静電気による障害をなくすための一つの方法は
、写真感光材料表面の電子伝導性を上げて、蓄積電荷が
放電する前に静電電荷を短時間に逸散せしめるようにす
ることである。この方法は特に処理後のゴミ付きに対し
ては有効な手段である。One way to eliminate these problems caused by static electricity is to increase the electronic conductivity of the surface of the photographic material so that the static charges can be dissipated in a short period of time before the accumulated charges are discharged. This method is particularly effective for removing dust after treatment.
したがって、従来から写真感光材料の支持体や各種塗布
表面層の導電性を向上させる方法が考えられ種々の吸湿
性物質や水溶性無機塩、ある種の界面活性剤、ポリマー
等の利用が試みられてきた。Therefore, methods have been considered to improve the conductivity of supports and various coated surface layers of photographic materials, and attempts have been made to use various hygroscopic substances, water-soluble inorganic salts, certain surfactants, polymers, etc. It's here.
(発明が解決しようとする課題)
しかしながらこれらの物質は、フィルム支持体の種類や
写真組成物の違いによって特異性を示したり、処理後に
導電性を失ってゴミ付きを生じたり、湿度依存性を有し
て低湿でスタチックを発生したり、又写真性能、塗布性
や透明性の悪化を伴ったり、又接着性の劣化を生じたり
して、これらの物質を写真感光材料に適用することは極
めて困難であった。(Problems to be Solved by the Invention) However, these substances exhibit specificity depending on the type of film support and photographic composition, lose conductivity after processing and cause dust, and exhibit humidity dependence. It is extremely difficult to apply these substances to photographic materials because they cause static at low humidity, deterioration of photographic performance, coating properties, and transparency, and deterioration of adhesive properties. It was difficult.
更に又、特開昭64−68751号に記載のポリホスフ
ァゼン、米国特許第4.237,194号に記載のポリ
アニリンについても前述の問題を解決するまでには至ら
なかった。Furthermore, the above-mentioned problems have not been solved with the polyphosphazene described in JP-A-64-68751 and the polyaniline described in US Pat. No. 4,237,194.
(発明の目的)
本発明の目的の第1は、接触する相手が種々異なっても
良好に帯電防止された写真感光材料を提供することにあ
る。(Objective of the Invention) The first object of the present invention is to provide a photographic light-sensitive material that is well prevented from being charged even when it comes into contact with various objects.
第2に現像処理後でも優れた帯電防止を有しゴミ付きの
改良された写真感光材料を提供することにある。A second object is to provide a photographic material that has excellent antistatic properties even after development and is free from dust.
第3に接着性が悪化しない帯電防止された写真感光材料
を提供することである。The third object is to provide a photographic material that is antistatic and does not deteriorate in adhesive properties.
(課題を解決するための手段)
本発明のこれらの目的は、支持体上に少なくとも一層の
感光性ハロゲン化銀乳剤層を有する写真感光材料に於い
て、該感光材料の構成層の少な(とも一層に下記一般式
〔1]で表わされる化合物の少なくと□も一種を酸化重
合させてなる導電性高分子を含有させることにより達成
された。(Means for Solving the Problems) These objects of the present invention are to provide a photographic light-sensitive material having at least one light-sensitive silver halide emulsion layer on a support. This was further achieved by containing a conductive polymer obtained by oxidative polymerization of at least one of the compounds represented by the following general formula [1].
一般式(1)
(式中、Yは酸化重合により高分子を形成しうる基を表
わし、Xは連結基を表わし、R3は置換されてもよいア
ルキレン基を表わし、R2は水素原子又はそれぞれ置換
されてもよいアルキル基、アルケニル基、アルキニル基
、アリール基、アシル基、カルバモイル基もしくはスル
ホニル基を表わず。General formula (1) (wherein, Y represents a group capable of forming a polymer through oxidative polymerization, X represents a linking group, R3 represents an optionally substituted alkylene group, and R2 represents a hydrogen atom or each substituted does not represent an alkyl group, alkenyl group, alkynyl group, aryl group, acyl group, carbamoyl group or sulfonyl group that may be substituted.
aはO又は1を表わし、bは1から4の整数を表わし、
mは1から3の整数を表わし、nは2から30の整数を
表わす。a represents O or 1, b represents an integer from 1 to 4,
m represents an integer from 1 to 3, and n represents an integer from 2 to 30.
ただし、b>1のときは、−(X)−+(R1−Oi1
h+。However, when b>1, -(X)-+(R1-Oi1
h+.
は同しでも異なっていても良い。また、m>1のときは
、(Rl−0)yRzは同じでも異なっていても良い。may be the same or different. Further, when m>1, (Rl-0)yRz may be the same or different.
またn≧3のときは、n個のR1は同じでも異なってい
ても良い、)
一般式(1)について更に詳しく説明する。Further, when n≧3, n R1s may be the same or different.) General formula (1) will be explained in more detail.
Yば酸化重合(化学的酸化重合あるいは電解酸化重合)
により高分子を形成しうる基を表わし、具体的には芳香
族化合物又はヘテロ原子として酸素、窒素、イオウ等を
含有するヘテロ環化合物等の残基である。Yの好ましい
例としては、それぞれ置換されてもよい、アミノ芳香族
化合物残基、ヒドロキシ芳香族化合物残基(多ヒドロキ
シ体を一ル残基、トリアゾール残基、オキサゾール(イ
ソ体を含む)残基、チアゾール(イソ体を含む)ンゾト
リアゾール残基、ベンゾオキサゾール残基、ベンゾチア
ゾール残基、プリン残基、キノリン残基、イソキノリン
残基、ベンゾジアジン残基、フ基、フェナジン残基、フ
ェノキサジン残基、ピラゾロジアゾ−ル残基、ピラゾロ
ジアゾール残基、ピラゾロアゾール残基、ベンゾピラゾ
ロアゾール残基等があげられる。Zlは、0、S又はN
A (Aは水素原子又は置換もしくは無置換のアルキル
基を表わす)。Yは、特に好ましくは、アニリン残基、
フェノール残基、ジヒドロキンベンゼン残基、残基であ
る。Yba oxidative polymerization (chemical oxidative polymerization or electrolytic oxidative polymerization)
represents a group capable of forming a polymer, specifically the residue of an aromatic compound or a heterocyclic compound containing oxygen, nitrogen, sulfur, etc. as a heteroatom. Preferred examples of Y include amino aromatic compound residues, hydroxy aromatic compound residues (including polyhydroxy forms, monoyl residues, triazole residues, oxazole (including iso forms) residues), which may be substituted, respectively. , thiazole (including isoforms), zotriazole residue, benzoxazole residue, benzothiazole residue, purine residue, quinoline residue, isoquinoline residue, benzodiazine residue, f group, phenazine residue, phenoxazine residue group, pyrazolodiazole residue, pyrazolodiazole residue, pyrazoloazole residue, benzopyrazoloazole residue, etc. Zl is 0, S or N
A (A represents a hydrogen atom or a substituted or unsubstituted alkyl group). Y is particularly preferably an aniline residue,
They are phenol residue, dihydroquine benzene residue, and residue.
Xは連結基を表わすが、具体的には、
+L(J+−)h)Fh−χ* 甲J s片鈷で表わさ
れる。ここで、Jl、J2、J3は同しでも異なってい
てもよく、−o−、−s−、−co−1−so、−、−
oco−、−coo−1一0CON−等を挙げることが
できる。R3は、水素原子、それぞれ置換されてもよい
アルキル基、フェニル基、アラルキル基を表わす R’
は、炭素数1〜4のアルキレン基を表わす。R5は、水
素原子、置換されてもよい炭素数1〜6のアルキル基を
表わす。X represents a linking group, and specifically, it is represented by +L(J+-)h)Fh-χ*KJs. Here, Jl, J2, and J3 may be the same or different, -o-, -s-, -co-1-so, -, -
Examples include oco-, -coo-1-0CON-, and the like. R3 represents a hydrogen atom, an optionally substituted alkyl group, a phenyl group, or an aralkyl group; R'
represents an alkylene group having 1 to 4 carbon atoms. R5 represents a hydrogen atom or an optionally substituted alkyl group having 1 to 6 carbon atoms.
J8、J2、J、は好ましくは、−CO−1−5O1−
、−CONB−1−8O□N11−、−Nll−CO−
、−NH−50!−1−0−、−11HCO1iH−1
−S−、−CO□−5−0CO−、−Noco、−及び
−0CONII−である。J8, J2, J are preferably -CO-1-5O1-
, -CONB-1-8O□N11-, -Nll-CO-
, -NH-50! -1-0-, -11HCO1iH-1
-S-, -CO□-5-0CO-, -Noco, - and -0CONII-.
X2、X、およびX、は同じでも異なっていてもよく、
それぞれ置換されてもよいアルキレン基、アリーレン基
、アラルキレン基を表わす。好ましくは、炭素数1〜4
のアルキレン基、炭素数6〜9のアリーレン基、置換ア
リーレン基である。X2, X, and X may be the same or different,
Each represents an optionally substituted alkylene group, arylene group, or aralkylene group. Preferably carbon number 1-4
alkylene group, arylene group having 6 to 9 carbon atoms, and substituted arylene group.
p、9、rおよびSはOまたは1を表わす。p, 9, r and S represent O or 1.
R3は置換されてもよいアルキレン基を表わすが、−C
IlICICII!を表わし、特に好ましくは−CHl
Cl+、−1−C]1□CHCIh−を表わす。R3 represents an alkylene group which may be substituted, but -C
IlICICII! , particularly preferably -CHl
Cl+, -1-C]1□CHCIh-.
盲
H
Rzは水素原子又はそれぞれ置換されてもよいアルキル
基、アルケニル基、アルキニル基、アリール基、アシル
基、カルバモイル基もしくはスルホニル基を表わすが、
好ましくは水素原子又は炭素数1〜6のアルキル基であ
り、更に好ましくは水素原子、メチル基又はエチル基で
、特に好ましくはメチル基である。Blind H Rz represents a hydrogen atom or an alkyl group, alkenyl group, alkynyl group, aryl group, acyl group, carbamoyl group or sulfonyl group, which may each be substituted,
Preferably it is a hydrogen atom or an alkyl group having 1 to 6 carbon atoms, more preferably a hydrogen atom, methyl group or ethyl group, particularly preferably a methyl group.
aは0又は1を表わす、bは1から4の整数を表わすが
、好ましくはl又は2、特に好ましくはlである0mは
1から3の整数を表わすが、好ましくはl又は2、特に
好ましくは1である。nは2から30の整数を表わすが
、好ましくは3から25、特に好ましくは4から20の
整数である。a represents 0 or 1, b represents an integer from 1 to 4, preferably l or 2, particularly preferably l; 0m represents an integer from 1 to 3, preferably l or 2, particularly preferably is 1. n represents an integer from 2 to 30, preferably from 3 to 25, particularly preferably from 4 to 20.
ただし、b>1のときは、b個の
電に片(−rR,−0¥R2−は同しでも異なっていて
も良い。また、malのときは、−(R+−0)yRt
は同じでも異なっていても良い。またn≧3のときは、
n個のR1は同じでも異なっていても良い。However, when b > 1, b electric currents (-rR, -0\R2- may be the same or different. Also, when mal, -(R+-0)yRt
may be the same or different. Also, when n≧3,
The n R1s may be the same or different.
上記Y、X、A及びR1の置換されていてもよい置換基
の例としては、ハロゲン原子、ニトロ基、シアノ基、ア
ルキル基、アルコキシ基、411COl?6 。Examples of the optionally substituted substituents for Y, X, A, and R1 are a halogen atom, a nitro group, a cyano group, an alkyl group, an alkoxy group, and 411Col? 6.
れていてもよい)、水酸基や加水分解して水酸基を形成
する基が挙げられる。R6は、アルキル基、フェニル基
、又はアラルキル基を表わす R7及びR8は同じでも
異なっていてもよく、水素原子、アルキル基、フェニル
基、又はアラルキル基を表わす。), a hydroxyl group, and a group that forms a hydroxyl group by hydrolysis. R6 represents an alkyl group, a phenyl group, or an aralkyl group. R7 and R8 may be the same or different and represent a hydrogen atom, an alkyl group, a phenyl group, or an aralkyl group.
さらに上記の例示した置換基中のアルキル基、アルコキ
シ基、フェニル基、アラルキル基は、さらに置換されて
もよく、置換基の例としては、水酸基、ニトロ基、炭素
数1〜4のアルコキシ基、−CQR’ 、−5O!l?
’、ハロゲン原子、シアノ基、アミノ基(アルキル基で
更に置換されていてもよい)等が挙げられる。R9はR
hと同義である。1710及び1711 は同じであっ
ても異なっていてもよく、R7と同義である。Furthermore, the alkyl group, alkoxy group, phenyl group, and aralkyl group in the above-exemplified substituents may be further substituted, and examples of the substituent include a hydroxyl group, a nitro group, an alkoxy group having 1 to 4 carbon atoms, -CQR', -5O! l?
', a halogen atom, a cyano group, an amino group (which may be further substituted with an alkyl group), and the like. R9 is R
It is synonymous with h. 1710 and 1711 may be the same or different and have the same meaning as R7.
次に一般式〔1〕で表わされる化合物の具体例を示すが
、本発明の化合物はこれに限定されるものではない。Next, specific examples of the compound represented by the general formula [1] will be shown, but the compounds of the present invention are not limited thereto.
1−2 1−1に示す化合物で平均n数n’;12の
混合物
1−3 1−1に示す化合物で平均n数nζ15の混
合物
1−4 1−1に示す化合物で平均n数nζ7の混合
物
1−5 1−1に示す化合物で平均n数n !==
5の混合物
1−6 1−1に示す化合物で平均n数nζ20の混
合物
1−8 1−7に示す化合物で平均n数n″、12の
混合物
!−9r−7に示す化合物で平均n数nζI5の混合物
+−to r−7に示す化合物で平均n数nζ5の
混合物
(平均n @ n ’−,7の混合物)(平均n数nζ
12の混合物)
(平均n数nζ7の混合物)
(平均n数nζ9の混合物)
(平均n数n!=i15の混合物)
(平均n数nζ7の混合物)
!−211−20に示す化合物においてZ、=S[−2
21−20に示す化合物においてハ=N11(平均n数
nζ9の混合物)
(平均n@nζ11の混合物)
(平均n数n ”r 7の混合物)
(平均n数n!=、7の混合物ン
(平均n数n!=i7の混合物)
!
(C11□C1I□O)−CI+ 。1-2 Mixture of the compound shown in 1-1 with an average n number n'; 12 1-3 Mixture 1-4 of the compound shown in 1-1 with an average n number nζ15 Mixture 1-4 of the compound shown in 1-1 with an average n number nζ7 Mixture 1-5 The average number of compounds shown in 1-1 is n! ==
5 mixture 1-6 A mixture of the compound shown in 1-1 with an average n number nζ20 1-8 A mixture of the compound shown in 1-7 with an average n number n'' and a mixture of 12!-9r-7 with an average n number Mixture of nζI5 + - to r-7 Compounds with average n number nζ5 (average n @ n'-, mixture of 7) (average n number nζ
12) (Mixture with average n number nζ7) (Mixture with average n number nζ9) (Mixture with average n number n!=i15) (Mixture with average n number nζ7)! In the compound shown in -211-20, Z, =S[-2
In the compound shown in 21-20, Ha=N11 (mixture with average n number nζ9) (mixture with average n@nζ11) (mixture with average n number n ''r 7) (average n number n!=, mixture of 7 ( mixture with average n number n!=i7)!(C11□C1I□O)-CI+.
(平均n数nζ7の混合物)
以下に化合物1−7の合成例を示す。他の化合物もこれ
に準じて合成することができる。(Mixture with average n number nζ7) A synthesis example of compound 1-7 is shown below. Other compounds can also be synthesized in accordance with this method.
〔合成例1;化合物1−7の合成〕
ポリエチレングリコールメチルエーテル(nζ7、^I
drjch社、以下P E O(?)と略す) 1.0
0 dを氷冷下fj14’しながら、15°C以下でN
aH(パラフィン分散物、純度60%)12.0g (
0,30モル)を徐々に添加した。添加後、水冷下30
分攪拌した後、20“C以下でオルトクロロニトロベン
ゼン31.5g(0,20モル)を徐々に加えた。45
’C530分置拌した後、少量の塩酸を加え中和し、ク
ロロホルム100 d及び硫酸マグネシウム30gをm
えた。硫酸マグネシウムを除去後、クロロホルムを展開
溶媒、シリカゲルを担体とし、カラム精製し0−ニトロ
P E O(7)ベンゼン33.1gを得た。[Synthesis Example 1; Synthesis of compound 1-7] Polyethylene glycol methyl ether (nζ7, ^I
drjch, hereinafter abbreviated as PEO (?)) 1.0
0 d under ice cooling fj14', N at 15°C or less
aH (paraffin dispersion, purity 60%) 12.0g (
0.30 mol) was added gradually. After addition, cool with water for 30 minutes.
After stirring for minutes, 31.5 g (0.20 mol) of orthochloronitrobenzene was gradually added at below 20°C.
After stirring for 30 minutes, add a small amount of hydrochloric acid to neutralize, add 100 d of chloroform and 30 g of magnesium sulfate.
I got it. After removing magnesium sulfate, column purification was performed using chloroform as a developing solvent and silica gel as a carrier to obtain 33.1 g of 0-nitroP E O (7) benzene.
上記0−二トロP E O(7)ベンゼン20g、メタ
ノール100d、Pd−C触媒0.5g及び水素ガスに
て高圧下(20a Lm)接触還元を行ない、Pd−C
触媒を除去した後、メタノールをi4縮し、化合物1〜
7を16a得た。The above 0-nitroP E O (7) was subjected to catalytic reduction under high pressure (20a Lm) using 20g of benzene, 100d of methanol, 0.5g of Pd-C catalyst and hydrogen gas, and Pd-C
After removing the catalyst, methanol was condensed with i4 to form compounds 1-
I got 16a of 7.
元素分析値(%): C−且一 N−計算値(n=
7とする) 58.5 8.58 3.25測定
! 59.1 8.29 3.36本
発明の導電性化合物は、一般式〔I〕で表わされる化合
物を1種又は2種以上用いて酸化重合することで得るこ
とができるが、酸化重合の際、−C式〔I〕で表わされ
る化合物以外のモノマーを1種又は2種以上用いても良
い、また重合初期に一般式〔I〕で表わされる化合物を
重合し、その後、−11式〔I〕で表わされる別の化合
物又は−1式〔I〕で表わされる化合物以外のモノマー
を用いても良いし、また重合初期に一般式(+)で表わ
される化合物以外の七ツマ−を用い、その後、一般式〔
I〕で表わされる化合物を用いても良い、さらには一般
式(1)と他の化合物を任意の重合時期に共重合しても
良い。Elemental analysis value (%): C-1 N-calculated value (n=
7) 58.5 8.58 3.25 measurement! 59.1 8.29 3.36 The conductive compound of the present invention can be obtained by oxidative polymerization using one or more compounds represented by general formula [I], but during oxidative polymerization, , -C One or more monomers other than the compound represented by the formula [I] may be used.Also, the compound represented by the general formula [I] is polymerized at the initial stage of polymerization, and then the compound represented by the -11 formula [I] may be used. ] or a monomer other than the compound represented by the formula [I], or a monomer other than the compound represented by the general formula (+) may be used at the initial stage of polymerization, and then , general formula [
A compound represented by formula (1) may be used, and furthermore, general formula (1) and another compound may be copolymerized at any polymerization time.
本発明の導電性化合物は、一般式〔I〕で表わされる化
合物を少なくとも1モル%以上、好ましくは10〜10
0モル%、用いて酸化重合することにより得ることがで
きる。The conductive compound of the present invention contains at least 1 mol% of the compound represented by the general formula [I], preferably 10 to 10% by mole.
It can be obtained by oxidative polymerization using 0 mol%.
共重合してもよい化合物としては、芳香族化合物又はへ
テロ原子として酸素、窒素、イオウ等を含有するヘテロ
環化合物等があげられ、具体的には、フェノールアミノ
芳香族化合物(例えば、アニリン)、ヒドロキシ芳香族
化合物(多ヒドロキシ体(例えばジヒドロキシベンゼン
)を含む)、ル、オキサゾール(イソ体を含む)、チア
ゾール(イソ体を含む)、ピリジン、ジアジン、ヅトリ
アゾール、ベンゾオキサゾール、ベンゾチアゾール、プ
リン、キノリン、イソキノリン、ベリジン、フェナジン
、フェノキサジン、ピラゾロトリアゾール、ピラゾロジ
アゾール、ピラゾロアゾール、ベンゾピラゾロアゾール
があげられる。Compounds that may be copolymerized include aromatic compounds or heterocyclic compounds containing oxygen, nitrogen, sulfur, etc. as heteroatoms, and specifically, phenolic amino aromatic compounds (e.g., aniline). , hydroxyaromatic compounds (including polyhydroxy forms (e.g. dihydroxybenzene)), oxazole (including iso form), thiazole (including iso form), pyridine, diazine, dutriazole, benzoxazole, benzothiazole, purine , quinoline, isoquinoline, veridine, phenazine, phenoxazine, pyrazolotriazole, pyrazolodiazole, pyrazoloazole, and benzopyrazoloazole.
Z2は前記のZlと同義である。Z2 has the same meaning as Zl above.
本発明で行うことのできる酸化重合法は、一般に用いら
れている公知の化学的酸化重合法あるいは電解酸化重合
法を用いることができる。As the oxidative polymerization method that can be carried out in the present invention, commonly used chemical oxidative polymerization methods or electrolytic oxidative polymerization methods can be used.
化学的酸化重合法による高分子は、水又は任意の有機溶
媒中(含水しても良い)、一般式(Nで表わされる化合
物を溶解または分散し、60’C〜−20°C(好まし
くは20″C〜0°C)で触媒(酸化剤)l8液を徐々
に滴下することで得ることができる。Polymers produced by chemical oxidative polymerization are prepared by dissolving or dispersing a compound represented by the general formula (N) in water or any organic solvent (which may contain water), and heating the mixture at 60'C to -20°C (preferably It can be obtained by gradually dropping catalyst (oxidizing agent) 18 liquid at 20''C to 0°C).
この場合、適当な分散剤(例えば、ポリビニルアルコー
ル、ゼラチン、界面活性剤、セルロース類、ポリビニル
ピロリドン、カチオン性高分子)を用いることでポリマ
ーの水分散液を得ることもできる。In this case, an aqueous dispersion of the polymer can also be obtained by using a suitable dispersant (eg, polyvinyl alcohol, gelatin, surfactant, cellulose, polyvinylpyrrolidone, cationic polymer).
電解酸化重合法による高分子は、水又は導電性の塩を溶
解できる有機溶媒中、一般式〔I〕で表わされる化合物
と導電性塩を溶解又は分散し、正極及び頁捲を浸漬して
80“C〜−20°C(好ましくは30°C〜0°C)
で定電圧法、定電位法又は定電流法にて得ることができ
る。好ましくは定電圧法である。Polymers produced by electrolytic oxidation polymerization are produced by dissolving or dispersing the compound represented by general formula [I] and a conductive salt in water or an organic solvent that can dissolve the conductive salt, and dipping the positive electrode and page turner for 80 minutes. “C~-20°C (preferably 30°C~0°C)
It can be obtained by a constant voltage method, a constant potential method, or a constant current method. Preferably, a constant voltage method is used.
化学的酸化重合法で用いることのできる触媒としては例
えば、塩化第二鉄、塩化第二銅などの塩化物、硫酸第二
鉄、硫酸第二銅などの硫酸塩、二酸化鉛、二酸化マンガ
ンなどの金属酸化物、過硫酸カリウム、過硫酸アンモニ
ウム、過酸化水素などの過酸化物、ベンゾキノンなどの
キノン類、沃素、臭素などのハロゲン、フェリシアン化
カリウムなどが挙げられる。これらの具体例は、特開昭
63−213518号、同63−193926号、同6
2−116665号、同62−104832号、同63
−215717号、同63−69823号、同63−1
01415号、同60−58430号等に記載されてい
る。Examples of catalysts that can be used in the chemical oxidative polymerization method include chlorides such as ferric chloride and cupric chloride, sulfates such as ferric sulfate and cupric sulfate, lead dioxide, and manganese dioxide. Examples include metal oxides, peroxides such as potassium persulfate, ammonium persulfate, and hydrogen peroxide, quinones such as benzoquinone, halogens such as iodine and bromine, and potassium ferricyanide. Specific examples of these are disclosed in JP-A-63-213518, JP-A-63-193926, and JP-A-63-193926.
No. 2-116665, No. 62-104832, No. 63
-215717, 63-69823, 63-1
No. 01415, No. 60-58430, etc.
触媒の量は、本発明の化合物の特性と使用される触媒に
より変化するが、触媒/本発明の化合物のモル比率で0
.01からlOの範囲で使用することができる。The amount of catalyst varies depending on the properties of the compound of the invention and the catalyst used, but the molar ratio of catalyst/compound of the invention is 0.
.. A range of 0.01 to 1O can be used.
電解酸化重合法で用いることのできる電極材料としては
、金iii極(例えば、^u、 Pt、 Ni、 Cu
、Sn、 Zn) 、炭素電極(例えば、フランシーカ
ーボン)、金afII化電極(例えば、5n(it、1
nJz)等があげられる。また、別に参照電極を用いる
と好ましい。Electrode materials that can be used in the electrolytic oxidative polymerization method include gold III electrodes (e.g., Pt, Ni, Cu
, Sn, Zn), carbon electrodes (e.g. Francie carbon), gold afII electrodes (e.g. 5n(it, 1
nJz) etc. Further, it is preferable to use a separate reference electrode.
電解酸化重合法で用いることのできる導電性の塩として
は、アルカリ金属カチオン(Li・、Na・、KΦ等)
、No” 、 No!・カチオン、オニウムカチオン
(Et4N・、BuJ・、[1u3P働等)と負イオン
(BF4e、AsF、θ、^sF6θ、SbF&’、5
bcz、e、、pphe、’ czo4θ、AZF、”
、、AZF、θ、NiF4ze、ZrPhg8、Tr
Pbffi8、B1゜Ct、。′θ、H5Oa6、S0
4′θ、C1θ、8「8、po)からなる塩、スルホン
酸7 二t 7 (CIIzCallaSOse、ca
usso、e、 CF、Sotθ、ポリスチレンスルホ
ン酸等)を含む塩、HCOOL+、ポリアクリル酸ソー
ダのようなカルボン酸アニオンを含む塩、FeC1,の
ような塩化物、ピリジン塩酸塩のような有機アミン塩等
を挙げることができる。Conductive salts that can be used in the electrolytic oxidative polymerization method include alkali metal cations (Li, Na, KΦ, etc.)
, No", No!・Cation, onium cation (Et4N・, BuJ・, [1u3P function, etc.) and negative ion (BF4e, AsF, θ, ^sF6θ, SbF&', 5
bcz,e,,pphe,'czo4θ,AZF,”
,,AZF,θ,NiF4ze,ZrPhg8,Tr
Pbffi8, B1°Ct,. 'θ, H5Oa6, S0
Salt consisting of 4'θ, C1θ, 8'8, po), sulfonic acid 72t7 (CIIzCallaSOse, ca
usso, e, CF, Sotθ, polystyrene sulfonic acid, etc.), salts containing carboxylic acid anions such as HCOOL+ and sodium polyacrylate, chlorides such as FeCl, and organic amine salts such as pyridine hydrochloride. etc. can be mentioned.
化学的酸化重合法及び電解酸化重合法で使用することの
できる溶媒としては、有機溶媒(例えばアセトニトリル
、ジメチル硫酸、N、N−ジメチルアセトアミド、N、
N−ジメチルホルムアミド、ジメチルスルホキサイド、
スルフオラン、ホルムアミド、ジメトキシエタン、プロ
ピレンカーボネート、γ−ブチルラクトン、ジオキサン
、メタノール、エタノール、ニトロベンゼン、テトラヒ
ドロフラン、ニトロメタン等が挙げられる)、水あるい
は両者の混合物を用いることができる。Examples of solvents that can be used in the chemical oxidative polymerization method and the electrolytic oxidative polymerization method include organic solvents (e.g., acetonitrile, dimethyl sulfuric acid, N,N-dimethylacetamide, N,
N-dimethylformamide, dimethyl sulfoxide,
Examples include sulfuran, formamide, dimethoxyethane, propylene carbonate, γ-butyl lactone, dioxane, methanol, ethanol, nitrobenzene, tetrahydrofuran, nitromethane, etc.), water, or a mixture of both.
また、化学的酸化重合や電解酸化重合の際に、導電性化
合物を加えて重合してもよい。導電性化合物としては、
無機酸(例えば、11C!、HzSOs、II C/
O,、BF4) 、有機酸(例えば、トルエンスルホン
酸、トリフルオロメチルスルホン酸、ポリスチレンスル
ホン酸のようなスルホン酸、ギ酸、酢酸、ポリアクリル
酸のようなカルボン酸)、有機塩基(例えば、ピリジン
、トリエタノールアミン)があげられる。化学的酸化重
合の時、前記の導電性の塩を加えて重合してもよい。Furthermore, a conductive compound may be added during chemical oxidative polymerization or electrolytic oxidative polymerization. As a conductive compound,
Inorganic acids (e.g. 11C!, HzSOs, II C/
O,,BF4), organic acids (e.g. sulfonic acids such as toluenesulfonic acid, trifluoromethylsulfonic acid, polystyrene sulfonic acid, carboxylic acids such as formic acid, acetic acid, polyacrylic acid), organic bases (e.g. pyridine , triethanolamine). At the time of chemical oxidative polymerization, the above-mentioned conductive salt may be added.
以下に本発明の具体例及び合成例を示す。Specific examples and synthesis examples of the present invention are shown below.
〔合成例2;本発明の化合物1の化学的酸化重合による
合成〕
化合物I〜7を2.16 g 、水を1O−1Li(J
Onを20g及び塩酸を0.15d攪拌しなからlO’
c以下で過硫酸アンモニウム水溶液(過硫酸アンモニウ
ム/水=1.14 g /10m)を1時間で滴下した
。滴下後3時間攪拌した後ろ過、水洗し、80°Cで真
空乾燥して本発明の化合物Iを1.85g得た。[Synthesis Example 2; Synthesis of Compound 1 of the Invention by Chemical Oxidative Polymerization] 2.16 g of Compounds I to 7, 1O-1Li (J
Stir 20 g of On and 0.15 d of hydrochloric acid and add lO'
An aqueous ammonium persulfate solution (ammonium persulfate/water = 1.14 g/10 m) was added dropwise over 1 hour. After the dropwise addition, the mixture was stirred for 3 hours, filtered, washed with water, and dried under vacuum at 80°C to obtain 1.85 g of Compound I of the present invention.
〔合成例3;木発明の化合物1の化学的酸化重合法によ
る水分散物の合成〕
300 dの3ツロフラスコにデキストラン5g、化合
物1−7を10g及び蒸留水120dをとり、窒素雰囲
気下で攪拌しながら、室温でこの溶液に、蒸留水48I
dに溶解した40.3gのFeC1s ・611zOを
30分にわたって滴下した。[Synthesis Example 3: Synthesis of an aqueous dispersion of Compound 1 of the Wood Invention by chemical oxidative polymerization method] In a 300 d 3 flask, 5 g of dextran, 10 g of compound 1-7, and 120 d of distilled water were placed and stirred under a nitrogen atmosphere. Add 48I of distilled water to this solution at room temperature while
40.3 g of FeCls 611zO dissolved in d was added dropwise over 30 minutes.
滴下とともに発熱し、反応液は黒色に変化した。As the mixture was added, heat was generated and the reaction solution turned black.
さらに、2時間攪拌した後、透析を2日間行い(VIS
KAS[! 5ALIES CO[lP CEL
LULO5E TLIBING C−65三光純薬
味製を使用)、本発明の化合物1の水分散液を得た。Furthermore, after stirring for 2 hours, dialysis was performed for 2 days (VIS
KAS [! 5ALIES CO[lP CEL
LULO5E TLIBING C-65 (manufactured by Sanko Junyami Co., Ltd.) was used to obtain an aqueous dispersion of Compound 1 of the present invention.
得られた水分散液粒子の平均粒径は1105nであった
(COIILTEII−N4型サブミクロン粒子分析装
置(コールタ−エレクトロニクス■製)で測定)。The average particle size of the resulting aqueous dispersion particles was 1105 nm (measured with a COIILTE II-N4 type submicron particle analyzer (manufactured by Coulter Electronics)).
また、この水分散液は、保存を20°Cおよび5“Cの
どちらの温度で行っても安定であり、どちらの温度で保
存しても3か月経過後の粒子の沈降や凝集はなかった。Additionally, this aqueous dispersion is stable when stored at either 20°C or 5"C, and there is no sedimentation or aggregation of particles after 3 months of storage at either temperature. Ta.
さらに、腐敗も見られなかった。Furthermore, there was no evidence of corruption.
C合成例4;本発明の化合物1の電解酸化重合法による
合成〕
化合物1−7を6.5g、 LiCZO4を7.5C及
びアセトニトリルを500成撹拌しながら、正極及び負
極ともptlを用い定電圧法(3V、2帛八/Cシ)に
て30分電解重合を行ない、負極上に23−の本発明の
化合物lのフィルムを得た。負極より化合物lを引きは
がし粉砕し、本発明の化合物】のお)体を0,42g得
た。C Synthesis Example 4: Synthesis of Compound 1 of the Present Invention by Electrolytic Oxidative Polymerization Method] 6.5 g of Compound 1-7, 7.5 C of LiCZO4, and 500 ml of acetonitrile were mixed while stirring, and a constant voltage was applied to both the positive and negative electrodes using PTL. Electrolytic polymerization was carried out for 30 minutes using the method (3V, 2/C) to obtain a film of compound 1 of the present invention (23-) on the negative electrode. Compound 1 was peeled off from the negative electrode and pulverized to obtain 0.42 g of the compound of the present invention.
〔合成例5)
以下合成例2〜4に準じて本発明の化合物2〜21を合
成した。[Synthesis Example 5] Compounds 2 to 21 of the present invention were synthesized according to Synthesis Examples 2 to 4 below.
〔合成例6〕
く比較化合物1の合成〉
合成例3において、化合物1−7にかえ、アニリン]O
gを用い比較化合物1を得た。平均粒径100n−であ
った。[Synthesis Example 6] Synthesis of Comparative Compound 1> In Synthesis Example 3, instead of compound 1-7, aniline]O
Comparative compound 1 was obtained using g. The average particle size was 100 n-.
〔合成例7〕 合成例2.4に準じ比較化合物2〜4を合成した。[Synthesis example 7] Comparative compounds 2 to 4 were synthesized according to Synthesis Example 2.4.
本発明の導電性高分子は写真感光材料の構成層の少なく
とも一層に添加されればよく、例えば、写真感光材料の
ハロゲン北限乳剤層又はその他の構成層の少なくとも1
層である。その他の構成層としては、例えば、表面保護
層、バック層、中間層、下塗層などを挙げることができ
る。特に好ましいのは表面保護層、バック層、下塗り層
である。The conductive polymer of the present invention may be added to at least one of the constituent layers of the photographic light-sensitive material, for example, at least one of the halogen northern limit emulsion layer or other constituent layers of the photographic light-sensitive material.
It is a layer. Other constituent layers include, for example, a surface protective layer, a back layer, an intermediate layer, and an undercoat layer. Particularly preferred are a surface protective layer, a back layer, and an undercoat layer.
表面保護層、バック層又は下塗り層が2層から成る場合
は、そのいずれの層でもよく、又、表面保護層の上に、
さらにオーバーコートして用いることも出来る。When the surface protective layer, back layer or undercoat layer consists of two layers, any of these layers may be used, and on top of the surface protective layer,
Furthermore, it can also be used as an overcoat.
本発明の導電性高分子を写真感光材料に添加するには、
粉末状の化合物を水あるいはメタノール、イソプロパツ
ール、アセトン等の有機溶媒又はそれらの混合溶媒に溶
解又は懸濁後、表面保護層又はバック層等の塗布液に添
加してもよいし、前述の水分散物のまま塗布液に添加し
てもよく、ディップコート、エアーナイフコート、噴霧
、浸漬法あるいは米国特許2.681 、294号に記
載のホッパーを使用するエクストルージョンコート法、
グラビアコート法、バーコード法、スピンコード法等の
方法により塗布することができる。To add the conductive polymer of the present invention to a photographic material,
The powdered compound may be dissolved or suspended in water or an organic solvent such as methanol, isopropanol, acetone, etc., or a mixed solvent thereof, and then added to the coating solution for the surface protective layer or back layer, or the above-mentioned The aqueous dispersion may be added to the coating solution as it is, including dip coating, air knife coating, spraying, dipping, or extrusion coating using a hopper as described in U.S. Pat. No. 2,681,294.
Coating can be performed by a method such as a gravure coating method, a bar code method, or a spin code method.
又、本発明の導電性化合物が粉体あるいは塊状の場合は
、機械的粉細法(例えば、ボールミル、ジエントミル、
サンドミル、ダイノミル)によって微細な粒子(好まし
くはその平均粒径が0.5ta以下、特に好ましくは0
.31!m以下)として、塗布液中に含有させ塗布する
ことができる。この場合に粒子を塗布液中で安定化する
ために種々の界面活性剤や高分子化合物あるいは無機安
定剤を加えても良い。In addition, when the conductive compound of the present invention is in the form of powder or lumps, mechanical pulverization methods (e.g., ball mill, dient mill,
fine particles (preferably, the average particle size is 0.5 ta or less, particularly preferably 0.0
.. 31! m or less), it can be applied by being included in the coating liquid. In this case, various surfactants, polymer compounds, or inorganic stabilizers may be added to stabilize the particles in the coating solution.
又、所望により、保護層の上に更に本発明の化合物を含
む帯電防止液(溶液のみ又はバインダーを含む)を塗設
してもよい。Further, if desired, an antistatic liquid (solution alone or containing a binder) containing the compound of the present invention may be further coated on the protective layer.
本発明の導電性高分子の使用量は写真窓光材料−平方メ
ートルあたり0.0001〜2.0g存在せしめるのが
よく、好ましくは0.0005〜0.7gであり、特に
0.001〜0.3gが好ましい。The amount of the conductive polymer used in the present invention is preferably 0.0001 to 2.0 g, preferably 0.0005 to 0.7 g, particularly 0.001 to 0.0 g per square meter of the photographic window light material. 3g is preferred.
本発明の導電性高分子は、2種以上を混合して用いても
良い。The conductive polymers of the present invention may be used in combination of two or more.
本発明に係る写真感光材料としては、通常の白黒ハロゲ
ン化銀写真感光材料(例えば、撮影用白黒感光材料、X
−ray用白黒感光材料、印刷用白黒感光材料など)、
通常の多層カラー感光材料(例えば、カラーネガティブ
フィルム、カラーリバーサルフィルム、カラーポジティ
ブフィルム、映画用カラーネガティブフィルムなど)、
レーザースキャナー用赤外光用感光材料、X−レイ用カ
ラー感光材料などを挙げることができる。The photographic material according to the present invention may be a conventional black-and-white silver halide photographic material (for example, black-and-white photographic material,
- black-and-white photosensitive materials for ray, black-and-white photosensitive materials for printing, etc.),
Ordinary multilayer color photosensitive materials (e.g. color negative film, color reversal film, color positive film, color negative film for movies, etc.)
Examples include infrared photosensitive materials for laser scanners and color photosensitive materials for X-ray.
本発明の写真感光材料のハロゲン化銀乳剤層、表面保護
層などに用いられるハロゲン化銀の種類、製法、化学増
感法、カブリ防止剤、安定剤、硬膜剤、帯電防止剤、カ
プラー、可塑剤、潤滑剤、塗布助剤、マット剤、増白剤
、分光増感剤、染料、紫外線吸収剤等については特に制
限はなく、例えばプロダクトライセンシング誌(Pro
duct Licens−1ng)、 92巻、 10
7〜110頁(1971年12月)及びリサーチ・ディ
スクロージャー誌(Research Disclos
u−rt3>、 176巻、22〜31頁(1978年
12月)、同、238巻。Types of silver halide used in the silver halide emulsion layer, surface protective layer, etc. of the photographic light-sensitive material of the present invention, manufacturing method, chemical sensitization method, antifoggants, stabilizers, hardeners, antistatic agents, couplers, There are no particular restrictions on plasticizers, lubricants, coating aids, matting agents, brighteners, spectral sensitizers, dyes, ultraviolet absorbers, etc.
duct Licenses-1ng), Volume 92, 10
pp. 7-110 (December 1971) and Research Disclosure magazine.
urt3>, vol. 176, pp. 22-31 (December 1978), vol. 238.
44〜46頁(1984年)の記載を参考にすることが
出来る。The description on pages 44-46 (1984) can be referred to.
本発明を用いて作られる写真感光材料の写真乳剤層また
は他の親水性コロイド層には塗布助剤、帯電防止、スベ
リ性改良、乳化分散、接着防止及び写真特性改良(例え
ば、現像促進、硬調化、増感)等積々の目的で、種々の
界面活性剤を含んでもよい。The photographic emulsion layer or other hydrophilic colloid layer of the photographic light-sensitive material produced using the present invention contains coating aids, antistatic properties, smoothness improvement, emulsification dispersion, adhesion prevention, and improvement of photographic properties (e.g., development acceleration, high contrast). Various surfactants may be included for various purposes such as oxidation, sensitization, etc.
例えばサポニン、アルキレンオキサイド誘導体(例えば
ポリエチレングリコール、ポリエチレングリコール/ポ
リプロピレングリコール縮合物、ポリエチレングリコー
ルアルキルエーテル類又はポリエチレングリコールアル
キルアリールエーテル類、ポリエチレングリコールエス
テル頻、ポリエチレングリコールアルキルエーテル類、
ポリアルキレングリコールアルキルアミン又はアミド類
、シリコーンのポリエチレンオキサイド付加物類)、グ
リシドール誘導体(例えばアルケニルコハク酸ポリグリ
セリド、アルキルフェノールポリグリセリド)、多価ア
ルコールの脂肪酸エステル類、糖のアルキルエステル類
などの非イオン性界面活性剤;アルキルカルボン酸塩、
アル牛ルスルフォン酸塩、アルキルベンゼンスルフォン
酸塩、アルキルナフタレンスルフォン酸塩、アルキル硫
酸エステル類、アルキルリン酸エステル類、N−アシル
−N−アルキルタウリン類、スルホコハク酸エステル類
、スルホアルキルポリオキシエチレンアルキルフェニル
エーテル類、ポリオキシエチレンアルキルリン酸エステ
ル類などのような、カルボキシ基、スルホ基、ホスホ基
、硫酸エステル基、リン酸エステル基等の酸性基を含む
アニオン界面活性剤;アミノ酸類、アミノアルキルスル
ホンMM、アミノアルキル硫酸又はリン酸エステル類、
アルキルベタイン類、アミンオキシド類などの両性界面
活性剤;アルキルアミン塩類、脂肪族あるいは芳香族第
4級アンモニウム塩類、ピリジニウム、イミダゾリウム
などの複素環第4級アンモニウム塩類、及び脂肪族又は
複素環を管むホスホニウム又はスルホニウム塩類などの
カチオン界面活性剤を用いることができる。For example, saponins, alkylene oxide derivatives (e.g. polyethylene glycol, polyethylene glycol/polypropylene glycol condensates, polyethylene glycol alkyl ethers or polyethylene glycol alkyl aryl ethers, polyethylene glycol esters, polyethylene glycol alkyl ethers,
Non-ionic materials such as polyalkylene glycol alkylamines or amides, polyethylene oxide adducts of silicones), glycidol derivatives (e.g. alkenylsuccinic acid polyglycerides, alkylphenol polyglycerides), fatty acid esters of polyhydric alcohols, alkyl esters of sugars, etc. surfactant; alkyl carboxylate,
Al-cow sulfonate, alkylbenzene sulfonate, alkylnaphthalene sulfonate, alkyl sulfate, alkyl phosphate, N-acyl-N-alkyl taurine, sulfosuccinate, sulfoalkyl polyoxyethylene alkylphenyl Anionic surfactants containing acidic groups such as carboxy groups, sulfo groups, phospho groups, sulfate ester groups, phosphate ester groups, such as ethers and polyoxyethylene alkyl phosphates; amino acids, aminoalkyl sulfones MM, aminoalkyl sulfates or phosphoric esters,
Ampholytic surfactants such as alkyl betaines and amine oxides; alkyl amine salts, aliphatic or aromatic quaternary ammonium salts, heterocyclic quaternary ammonium salts such as pyridinium and imidazolium, and aliphatic or heterocyclic Cationic surfactants such as phosphonium or sulfonium salts can be used.
これらは小田良平他著「界面活性剤とその応用」(横書
店、1964年)、堀口博著「新界面活性剤」(三共出
版■、1975年)あるいは「マツクカチオンズ ディ
タージェント アンド エマルジファイアーズ」 (マ
ンフカチオン ディビイジョンズ、エムシー パブリッ
シング カンパニー、1985)(rMc Cutch
eon’s Detergents & Emulsi
目ersl(Mc CuLcheon Divisio
ns、 MCPublis++ing Co、+198
5))、特開昭60−76741号、同62−1723
.13号、同62−173459号、同62−2152
72号、などに記載されている。These include Ryohei Oda et al.'s "Surfactants and Their Applications" (Yokoshoten, 1964), Hiroshi Horiguchi's "New Surfactants" (Sankyo Publishing ■, 1975), and "Matsuku Cations Detergent and Emulsifier". (Manufcation Divisions, MC Publishing Company, 1985) (rMc Cutch
eon's Detergents & Emulsi
Mc CuLcheon Divisio
ns, MC Publicis++ing Co, +198
5)), JP-A-60-76741, JP-A No. 62-1723
.. No. 13, No. 62-173459, No. 62-2152
No. 72, etc.
又本発明においでは他の帯電防止剤を併用してもよく、
例えば特に特開昭62−215272号に記載の含フツ
素界面活性剤あるいは重合体、特開昭60−76742
号、同60−80846号、同60−80848号、同
60−80839号、同60−76741号、同58−
208743号などに記載されているノニオン系界面活
性剤、あるいは又、特開昭57−204540号、同6
2−215272号に記載されている導電性ポリマー又
はラテックス(ノニオン性、アニオン性、カチオン性、
両性)を用いうる。In addition, in the present invention, other antistatic agents may be used in combination,
For example, in particular, the fluorine-containing surfactants or polymers described in JP-A-62-215272, JP-A-60-76742
No. 60-80846, No. 60-80848, No. 60-80839, No. 60-76741, No. 58-
Nonionic surfactants described in JP-A No. 208743, etc., or JP-A-57-204540 and JP-A No. 6
Conductive polymer or latex (nonionic, anionic, cationic,
(both sexes) can be used.
又、無機系帯電防止剤としてはアンモニウム、アルカリ
金属、アルカリ土類金属のハロゲン塩、硝酸塩、過塩素
酸塩、硫酸塩、酢酸塩、リン酸塩、チオシアン酸塩など
が、又、特開昭57−118242号などに記載の導電
性酸化スズ、酸化亜鉛又はこれらの金属酸化物にアンチ
モン等をドープした複合酸化物を用いることができる。Inorganic antistatic agents include ammonium, alkali metal, alkaline earth metal halogen salts, nitrates, perchlorates, sulfates, acetates, phosphates, thiocyanates, etc. Conductive tin oxide, zinc oxide, or a composite oxide obtained by doping antimony or the like with these metal oxides described in No. 57-118242 and the like can be used.
本発明の写真感光材料の乳剤層や中間層に用いることの
できる結合剤または保護コロイドとしては、ゼラチンを
もちいるのが有利であるが、それ以外の親水性コロイド
も用いることができる。As the binder or protective colloid that can be used in the emulsion layer or intermediate layer of the photographic light-sensitive material of the present invention, it is advantageous to use gelatin, but other hydrophilic colloids can also be used.
例えばゼラチン誘導体、ゼラチンと他の高分子とのグラ
フトポリマー、アルブミン、カゼイン等の蛋白質;ヒド
ロキシエチルセルロース、カルボキシメチルセルロース
、セルロース硫酸エステル類等の如きセルロース誘導体
、アルギン酸ソーダ、デキストラン、澱粉誘導体などの
糖誘導体;ポリビニルアルコール、ポリビニルアルコー
ル部分アセタール、ポリ−N−ビニルピロリドン、ポリ
アクリル酸、ポリメタクリル酸、ポリアクリルアミド、
ポリビニルイミダゾール、ポリビニルピラゾール等の単
一あるいは共重合体の如き多種の合成親水性高分子物質
を用いることができる。For example, gelatin derivatives, graft polymers of gelatin and other polymers, proteins such as albumin and casein; cellulose derivatives such as hydroxyethyl cellulose, carboxymethyl cellulose, and cellulose sulfates; sugar derivatives such as sodium alginate, dextran, and starch derivatives; Polyvinyl alcohol, polyvinyl alcohol partial acetal, poly-N-vinylpyrrolidone, polyacrylic acid, polymethacrylic acid, polyacrylamide,
A wide variety of synthetic hydrophilic polymeric materials can be used, such as single or copolymers of polyvinylimidazole, polyvinylpyrazole, and the like.
ゼラチンとしては石灰処理ゼラチンのほか、酸処理ゼラ
チンや酵素処理ゼラチンを用いてもよく、また、ゼラチ
ンの加水分解物や酵素分解物も用いることができる。As the gelatin, in addition to lime-treated gelatin, acid-treated gelatin or enzyme-treated gelatin may be used, and gelatin hydrolysates or enzymatically decomposed products may also be used.
これらの中でもゼラチンとともにデキストラン及びポリ
アクリルアミドを併用することが好ましい。Among these, it is preferable to use dextran and polyacrylamide together with gelatin.
本発明の写真感光材料の親水性コロイド層には、トリメ
チロールプロパン、ベンタンジオール、ブタンジオール
、エチレングリコール、グリセリン、ソルビトール等の
ポリオール類を可塑剤として用いることができる。Polyols such as trimethylolpropane, bentanediol, butanediol, ethylene glycol, glycerin, and sorbitol can be used as plasticizers in the hydrophilic colloid layer of the photographic material of the present invention.
本発明の写真感光材料に用いられる写真乳剤中のハロゲ
ン化銀粒子は、立方体、八面体のような規則的(reg
ular)な結晶体を有するものでもよく、また球状、
板状などのような結晶形をもつもの、あるいはこれらの
結晶形の複合形をもつものでもよい、更にはりサーチ・
ディスクロージャー225巻、 N[122534,2
0〜58頁、特開昭58−127921号、同58−1
13926号に記載された平板粒子であってもよい、ま
た、種々の結晶形の粒子の混合から成っていてもよい。The silver halide grains in the photographic emulsion used in the photographic light-sensitive material of the present invention are regular (regular) grains such as cubes and octahedrons.
It may have a spherical, spherical,
It may have a crystal shape such as a plate shape, or a composite shape of these crystal shapes.
Disclosure Volume 225, N[122534,2
0-58 pages, JP-A-58-127921, JP-A No. 58-1
They may be tabular grains as described in No. 13926, or may be composed of a mixture of grains of various crystal forms.
ハロゲン化銀粒子は、粒子を形成する過程及び/又は成
長させる過程で、カドミウム塩、亜鉛塩、鉛塩、タリウ
ム塩、イリジウム塩(錯塩を含む)、ロジウム塩(錯塩
を含む)及び鉄塩(錯塩を含む)から選ばれる少なくと
も1種を用いて金属イオンを添加し、粒子内部に及び/
又は粒子表面にこれらの金属元素を含有させることがで
き、また適当な還元的雰囲気におくことにより、粒子内
部及び/又は粒子表面に還元増感績を付与できる。During the process of grain formation and/or growth, silver halide grains are produced using cadmium salts, zinc salts, lead salts, thallium salts, iridium salts (including complex salts), rhodium salts (including complex salts), and iron salts ( (including complex salts) to add metal ions to the inside of the particles and/or
Alternatively, these metal elements can be contained on the particle surface, and reduction sensitization can be imparted to the inside of the particle and/or the particle surface by placing the particle in an appropriate reducing atmosphere.
ハロゲン化銀乳剤は、ハロゲン化銀粒子の成長の終了後
に不要な可溶性塩類を除去してもよいし、あるいは含有
させたままでもよい、該塩類を除去する場合には、リサ
ーチ・ディスクロージャーNa17643、■項に記載
の方法に基づいて行うことができる。The silver halide emulsion may be freed of unnecessary soluble salts after the growth of silver halide grains has finished, or may be allowed to remain in the silver halide emulsion. It can be carried out based on the method described in Section.
ハロゲン化銀粒子は、粒子内において均一なハロゲン化
si&II成分布を有するものでも、粒子の内部と表面
層とでハロゲン化銀組成が異なるコア/シェル粒子であ
ってもよい。The silver halide grains may have a uniform Si&II halide composition distribution within the grain, or may be core/shell grains in which the silver halide composition differs between the inside and the surface layer of the grain.
ハロゲン化銀乳剤は、いかなる粒子サイズ分布を持つも
のを用いても構わない0粒子サイズ分布の広い乳剤(多
分散乳剤と称する)を用いてもよいし、粒子サイズ分布
の狭い乳剤(単分散乳剤と称する。ここでいう単分散乳
剤とは、粒径の分布の標準偏差を平均粒径で割ったとき
に、その値が0.20以下のものをいう、ここで粒径は
球状のハロゲン化銀の場合はその直径を、球状以外の形
状の粒子の場合は、その投影像を同面積の円像に換算し
たときの直径を示す、)を単独又は数種混合してもよい
、又、多分散乳剤と単分散乳剤を混合して用いてもよい
。Silver halide emulsions may have any grain size distribution. Emulsions with a wide grain size distribution (referred to as polydisperse emulsions) may be used, or emulsions with a narrow grain size distribution (monodisperse emulsions) may be used. The monodisperse emulsion referred to here refers to one in which the standard deviation of the grain size distribution divided by the average grain size is 0.20 or less, where the grain size is spherical halogenated emulsion. In the case of silver, the diameter is shown; in the case of particles with a shape other than spherical, the diameter is shown when the projected image is converted to a circular image of the same area.) may be used alone or in combination of several types. A polydisperse emulsion and a monodisperse emulsion may be mixed and used.
また、本発明に用いられる乳剤は米国特許2,996.
382号、同3,397,987号、同3,705,8
58号に記載の如く、感光性ハロゲン化銀乳剤と内部の
かぶったハロゲン化銀乳剤の混合乳剤もしくは別層に併
用したものであってもよい。ここで、特開昭61−48
832号に記載されたメルカプト化合物を更に併用する
とカプリの抑制、経時保存性の改良などの点で好ましい
。Further, the emulsion used in the present invention is disclosed in US Pat. No. 2,996.
No. 382, No. 3,397,987, No. 3,705,8
As described in No. 58, a mixed emulsion of a light-sensitive silver halide emulsion and an internally overlapped silver halide emulsion or an emulsion used in combination in a separate layer may be used. Here, JP-A-61-48
It is preferable to further use the mercapto compound described in No. 832 in combination to suppress capri and improve storage stability over time.
本発明に用いられる写真乳剤には、感光材料の製造工程
、保存中あるいは写真処理中のカプリを防止し、あるい
は写真性能を安定化させる目的で、種々の化合物を含有
させることができる。すなわちアゾール類、例えばベン
ゾチアゾリウム塩、ニトロイミダ、ゾール類、ニトロベ
ンズイミダゾール類、クロロベンズイミダゾール類、ブ
ロモベンズイミダゾール類、メルカプトチアゾール類、
メルカプトベンゾチアゾール類、メルカプトベンズイミ
ダゾール類、メルカプトチアジアゾール類、アミノトリ
アゾール類、ベンゾトリアゾール類、ニトロベンゾトリ
アゾール類、メルカプトテトラゾール類(特に1−フェ
ニル−5〜メルカプトテトラゾール)など:メルカプト
ピリミジン類;メルカプトトリアジン類、たとえばオキ
サゾリンチオンのようなチオケト化合物ニアザインデン
類、たとえばトリアザインデン類、テトラアザインデン
11!(特に4−ヒドロキシ置換(1,3,3a、7)
テトラアザインデン1り、ペンタアザインデン類など;
ベンゼンチオスルフォン酸、ベンゼンスルフィン酸、ベ
ンゼンスルフオン酸アミド等のようなカプリ防止剤また
は安定剤として知られた多くの化合物を加えることがで
きる。The photographic emulsion used in the present invention can contain various compounds for the purpose of preventing capri during the manufacturing process, storage, or photographic processing of the light-sensitive material, or for stabilizing photographic performance. That is, azoles such as benzothiazolium salts, nitroimidas, soles, nitrobenzimidazoles, chlorobenzimidazoles, bromobenzimidazoles, mercaptothiazoles,
Mercaptobenzothiazoles, mercaptobenzimidazoles, mercaptothiadiazoles, aminotriazoles, benzotriazoles, nitrobenzotriazoles, mercaptotetrazoles (especially 1-phenyl-5-mercaptotetrazole), etc.: mercaptopyrimidines; mercaptotriazines , thioketo compounds such as oxazolinthione, niazaindenes, eg triazaindenes, tetraazaindenes 11! (especially 4-hydroxy substituted (1,3,3a,7)
Tetraazaindene, pentaazaindene, etc.;
Many compounds known as anti-capri agents or stabilizers can be added, such as benzenethiosulfonic acid, benzenesulfinic acid, benzenesulfonic acid amide, etc.
本発明の写真感光材料の親水性コロイド層にはアルキル
アクリレート又はポリスチレンなどのホモポリマー又は
コポリマー、塩化ビニリデンのコポリマーの如く当業界
でよく知られたポリマーラテックスを含有せしめること
が出来る。ポリマーラテックスは特開昭61−2301
36号に記載のごとくノニオン界面活性剤で予め安定化
されていてもよい。The hydrophilic colloid layer of the photographic material of the present invention can contain polymer latexes well known in the art, such as homopolymers or copolymers of alkyl acrylate or polystyrene, and copolymers of vinylidene chloride. Polymer latex is disclosed in Japanese Patent Application Laid-Open No. 61-2301.
It may be stabilized in advance with a nonionic surfactant as described in No. 36.
本発明の写真感光材料の写真乳剤層には感度上昇、コン
トラスト上昇、または現像促進の目的でたとえばポリア
ルキレンオキシドまたはそのエーテル、エステル、アミ
ンなどの誘導体、チオエーテル化合物、チオモルフォリ
ン類、四級アンモニウム塩化合物、ウレタン誘導体、尿
素誘導体、イミダゾール誘導体、3−ピラゾリドン類等
を含んでもよい。The photographic emulsion layer of the photographic light-sensitive material of the present invention contains, for example, polyalkylene oxide or its derivatives such as ethers, esters, and amines, thioether compounds, thiomorpholines, and quaternary ammonium for the purpose of increasing sensitivity, increasing contrast, or promoting development. It may also contain salt compounds, urethane derivatives, urea derivatives, imidazole derivatives, 3-pyrazolidones, and the like.
本発明に用いられる写真乳剤は、メチン色素類その他に
よって分光増感されてもよい。用いられる色素には、シ
アニン色素、メロシアニン色素、複合シアニン色素、複
合メロシアニン色素、ホロポーラ−シアニン色素、ヘミ
シアニン色素、スチリル色素およびヘミオキソノール色
素が包含される。特に有用な色素は、シアニン色素、メ
ロシアニン色素、および複合メロシアニン色素に属する
色素である。The photographic emulsions used in the present invention may be spectrally sensitized with methine dyes and others. The dyes used include cyanine dyes, merocyanine dyes, complex cyanine dyes, complex merocyanine dyes, holopolar cyanine dyes, hemicyanine dyes, styryl dyes and hemioxonol dyes. Particularly useful dyes are those belonging to the cyanine dyes, merocyanine dyes, and complex merocyanine dyes.
本発明に用いる支持体には、アンチハレーション層を設
けることもできる。この目的のためにはカーボンブラッ
クあるいは各種の染料、例えば、オキソノール染料、ア
ゾ染料、アゾメチン染料、スチリル染料、アントラキノ
ン染料、メロシアニン染料及びトリ(又はジ)アリルメ
タン染料等があげられる。その場合に染料がアンチハレ
ーション層から拡散しないようにカチオン性ポリマー又
はラテックスを使用してもよい。The support used in the present invention can also be provided with an antihalation layer. For this purpose, carbon black or various dyes such as oxonol dyes, azo dyes, azomethine dyes, styryl dyes, anthraquinone dyes, merocyanine dyes and tri(or di)allylmethane dyes may be used. Cationic polymers or latexes may then be used to prevent the dye from diffusing out of the antihalation layer.
これらはリサーチ・ディスクロージャー1761゜NQ
17643,4項に記載されている。また、現像銀の
色調を改良するために特開昭61−285445号に記
載された如きのマゼンタ染料を用いてもよい。These are Research Disclosure 1761°NQ
17643, Section 4. Furthermore, a magenta dye as described in JP-A-61-285445 may be used to improve the color tone of developed silver.
本発明に用いられる親水性コロイド層にはコロイダルシ
リカや硫酸バリウムストロンチウム、ポリメタクリル酸
メチル、メタクリル酸メチル−メタクリル酸共重合体、
ポリスチレン類、特開昭63−216046号に記載の
メタクリル酸メチル−スチレンスルホン酸共重合体、特
開昭61−230136号に記載のフッ素基を含有した
粒子等からなるいわゆるマント剤を用いることができる
。The hydrophilic colloid layer used in the present invention includes colloidal silica, barium strontium sulfate, polymethyl methacrylate, methyl methacrylate-methacrylic acid copolymer,
It is possible to use so-called mantle agents made of polystyrenes, methyl methacrylate-styrene sulfonic acid copolymer described in JP-A-63-216046, particles containing fluorine groups as described in JP-A-61-230136, etc. can.
本発明の写真感光材料には、写真乳剤層その他の構成層
に無機または有機の硬膜剤を含有してよい0例えばアル
デヒド類(ホルムアルデヒド、グリオキザール、ゲルタ
ールアルデヒドなど)、活性ビニル化合物(1,3,5
−トリアクリロイル−へキサヒドロ−8−トリアジン、
l、3−ビニルスルホニル−2−プロパツールなど)、
活性ハロゲン化合物(2,4−ジクロル−6−ヒドロキ
シ−5−)リアジンなど)、ムコハロゲン酸類(ムコク
ロル酸、ムコフェノキシクロル酸など)、などを単独ま
たは組合わせて用いることができる。The photographic light-sensitive material of the present invention may contain an inorganic or organic hardening agent in the photographic emulsion layer and other constituent layers. 3,5
-triacryloyl-hexahydro-8-triazine,
l, 3-vinylsulfonyl-2-propatol, etc.),
Active halogen compounds (2,4-dichloro-6-hydroxy-5-)riazine, etc.), mucohalogen acids (mucochloric acid, mucophenoxychloroic acid, etc.), and the like can be used alone or in combination.
好ましく用いられる硬膜剤は下記一般式で表わされるビ
ニルスルホン系化合物である。The hardening agent preferably used is a vinyl sulfone compound represented by the following general formula.
(CHtICH−5ow−CHth−8式中、Bは2価
基を表わすがなくても良い。(In the formula CHtICH-5ow-CHth-8, B represents a divalent group, but may be omitted.
本発明の写真感光材料は現像主薬を含存しうる。The photographic material of the present invention may contain a developing agent.
現像主薬として、リサーチ・ディスクロージャー。Research Disclosure as a developing agent.
第176巻、29頁のr Developping a
gents Jの項に記載されているものが用いられる
。Volume 176, page 29 Developing a
The one described in the section of gents J is used.
特にハイドロキノン、ピラゾリドン類は好ましく用いら
れる。Hydroquinone and pyrazolidones are particularly preferably used.
本発明においては、イエロー、シアン、マゼンタに発色
するカプラーを用いてもよく、例えば特開昭62−21
5272号に詳細に記載しである。In the present invention, a coupler that develops yellow, cyan, or magenta may be used, for example, in JP-A No. 62-21
It is described in detail in No. 5272.
本発明の写真感光材料の現像処理には銀画像を形成する
処理(黒白現像処理)、あるいは色画像を形成する現像
処理のいずれであっても良い、もし反転法で作画する場
合にはまず黒白ネガ現像工程を行ない、次いで白色露光
を与えるか、あるいはカブリ剤を含有する浴で処理しカ
ラー現像処理を行なう、(又感光材料中に色素を含有さ
せておき、露光後黒白現像処理工程を施し銀画像を作り
、これを漂白触媒として色素を漂白する銀色素漂白を用
いてもよい、)
黒白現像処理としては、現像処理工程、定着処理工程、
水洗処理工程がなされる。現像処理工程後、停止処理工
程を行ったり定着処理工程後、安定化処理工程を施す場
合は、水洗処理工程が省略される場合がある。また現像
主薬またはそのプレカーサーを感光材料中に内蔵し、現
像処理工程をアルカリ液のみで行っても良い、現像液と
してリス現像液を用いた現像処理工程を行ってもよい。The developing process for the photographic light-sensitive material of the present invention may be either a process that forms a silver image (black and white development process) or a process that forms a color image.If an image is created by the reversal method, first black and white development process is performed. A negative development process is performed, followed by white exposure or color development by treatment with a bath containing a fogging agent. (Silver dye bleaching may be used, in which a silver image is created and this is used as a bleaching catalyst to bleach the dye.) The black and white development process includes a development process, a fixing process,
A water washing process is performed. When a stopping process is performed after the development process or a stabilizing process is performed after the fixing process, the washing process may be omitted. Further, a developing agent or its precursor may be incorporated into the photosensitive material, and the developing process may be performed using only an alkaline solution, or the developing process may be performed using a lithium developer as the developing solution.
カラー現像処理は、発色現像処理工程、漂白処理工程、
定着処理工程、水洗処理工程及び所望により安定化処理
工程を行うが、漂白液を用いた処理工程と定着液を用い
た処理工程の代わりに、l浴漂白定着液を用いて、漂白
定着処理工程を行うこともできるし、発色現像、漂白、
定着を1浴中で行うことができるl浴現像漂白定着処理
液を用いたモノバス処理工程を行うこともできる。Color development processing includes a color development processing process, a bleaching processing process,
A fixing process, a water washing process and, if desired, a stabilizing process are carried out, but instead of the process using a bleach solution and the process using a fixer, a l-bath bleach-fix solution is used to perform the bleach-fixing process. You can also do color development, bleaching,
It is also possible to carry out a monobath processing step using a one-bath development, bleach-fix processing solution in which fixing can be carried out in one bath.
これらの処理工程に組み合わせて前硬膜処理工程、その
中和工程、停止定着処理工程、後硬膜処理工程等を行っ
てもよい、これら処理において発色現像処理工程の代わ
りに発色現像主薬、またはそのプレカーサーを感光材料
中に含有させておき現像処理をアクチベータ液で行うア
クチベータ処理工程を行ってもよいし、そのモノバス処
理にアクチベーター処理を適用することができる。In combination with these processing steps, a pre-hardening process, its neutralization process, a stop-fixing process, a post-hardening process, etc. may be performed.In these processes, a color developing agent, or An activator treatment step may be carried out in which the precursor is contained in the photosensitive material and the developing treatment is carried out using an activator solution, or the activator treatment can be applied to the monobath treatment.
処理温度は通常、10℃〜65°Cの範囲に選ばれるが
、65°C@趙える温度としてもよい、好ましくは25
°C〜45°Cで処理される。The treatment temperature is usually selected in the range of 10°C to 65°C, but it may also be 65°C, preferably 25°C.
Processed between °C and 45 °C.
黒白現像処理に用いられる黒白現像液は通常知られてい
る黒白写真感光材料の処理に用いられるものであり、一
般に黒白現像液に添加される各種の添加剤を含有せしめ
ることができる。The black-and-white developer used in the black-and-white development process is commonly used in processing known black-and-white photographic materials, and can contain various additives that are generally added to black-and-white developers.
代表的な添加剤としてはl−フェニル−3−ピラゾリド
ン、メトール及びハイドロキノンのような現像主薬、亜
硫酸塩のような保恒剤、水酸化ナトリウム、炭酸ナトリ
ウム、炭酸カリウム等のアルカリからなる促進剤、臭化
カリウムや2−メチルベンツイミダゾール、メチルベン
ツチアゾール等の無機性、もしくは有機性の抑制剤、ポ
リリン酸塩のような硬水軟化剤、微量の沃化物やメルカ
プト化合物からなる表面過現像防止剤等を挙げることが
できる。Typical additives include l-phenyl-3-pyrazolidone, developing agents such as metol and hydroquinone, preservatives such as sulfites, accelerators consisting of alkalis such as sodium hydroxide, sodium carbonate, potassium carbonate, etc. Inorganic or organic inhibitors such as potassium bromide, 2-methylbenzimidazole, methylbenzthiazole, water softeners such as polyphosphates, surface overdevelopment inhibitors consisting of trace amounts of iodides and mercapto compounds, etc. can be mentioned.
又、X−レイ感光材料に於いては従来現像処理時間の短
縮化が活発である。更には又処理の簡易化手段も開発さ
れて来ており、本発明の導電性化合物はこれらの最近の
処理技術に対して極めて優れた写真感光材料を提供する
ことができる。Furthermore, in the case of X-ray photosensitive materials, efforts have been made to shorten the development processing time. Furthermore, means for simplifying processing have also been developed, and the conductive compound of the present invention can provide extremely excellent photographic materials for these recent processing techniques.
以下に実施例を挙げて本発明を例証するが本発明はこれ
に限定されるものではない。The present invention will be illustrated below with reference to Examples, but the present invention is not limited thereto.
実施例1
−1 ベースの 1
ポリエチレンテレフタレート(PET)フィルムの両面
にポリ塩化ビニリデン/イタコン酸(共重合モル比97
:3)を塗布後、220℃で二輪延伸したポリエチレン
テレフタレート支持体(PET厚175IJs、塩化ビ
ニリデン層厚0.74)を作成した。Example 1-1 Polyvinylidene chloride/itaconic acid (copolymerization molar ratio 97
A polyethylene terephthalate support (PET thickness: 175 IJs, vinylidene chloride layer thickness: 0.74) was prepared by applying: 3) and stretching on two wheels at 220°C.
この支持体の一方の面上にコロナ放電処理後、ポリ(塩
化ビニリデン/イタコン酸/エチルアクリレート)(共
重合モル比92:3:5、水分散物として添加>(0,
05g/rd) 、ゼラチン水溶液(0,05g/ホ)
、ジクロロ−ヒドロキシトリアジンソーダ(0,01g
/n() 、p−オクチルフェノキシポリ(重合度10
)オキシエチレンエーテル(0,005g/ボ)、及び
表1の本発明の導電性高分子又は比較化合物よりなる組
成物を塗布し、140℃で乾燥して下塗導電層を塗設し
た。更にコロナ放電処理してその上にゼラチン(0,2
R/m) 、α−スルホジへキシルサクシナートナトリ
ウム塩(0,002g/ n() 、ポリ(スチレン/
ジビニルベンゼン)(共重合比98;2、平均粒径2.
Og) (0,02g /イ)、1.3−ジビニルスル
ホニル−2−プロパツール(0,005g/ボ)を塗布
し、下塗保護層を塗設した。After corona discharge treatment on one side of this support, poly(vinylidene chloride/itaconic acid/ethyl acrylate) (copolymerization molar ratio 92:3:5, added as an aqueous dispersion>(0,
05g/rd), gelatin aqueous solution (0.05g/rd)
, dichloro-hydroxytriazine soda (0,01g
/n(), p-octylphenoxy poly(polymerization degree 10
) A composition consisting of oxyethylene ether (0,005 g/bo) and the conductive polymer of the present invention or comparative compound shown in Table 1 was coated and dried at 140° C. to form an undercoat conductive layer. Furthermore, gelatin (0,2
R/m), α-sulfodihexyl succinate sodium salt (0,002 g/n(), poly(styrene/
divinylbenzene) (copolymerization ratio 98:2, average particle size 2.
Og) (0.02 g/I) and 1,3-divinylsulfonyl-2-propanol (0.005 g/I) were applied to form an undercoat protective layer.
又、支持体のもう一方の側には下塗保護層のみを塗設し
た。Further, only the undercoat protective layer was coated on the other side of the support.
−の
j w s の 1 ゛下記の染
料を下記方法によってボールミル処理した。水(21,
7d)及び6,7%のTriton X−200?界面
活性剤水溶液(2,65g)(Rohm & llaa
s社製)とを、60m1ネジ蓋瓶に入れた。下記染料の
1.00gをこの溶液に添加した。酸化ジルコニウム(
ZrO)のビーズ(40d) (2am径)を添加し、
蓋をしっかりし、容器をミル内に置き、内容物を4日間
粉砕した。容器を取り出し、内容物を12.5%ゼラチ
ン水溶液(8,h)に添加した。新しい混合物をロール
ミルに10分間置いて泡を減少させ、次いで得られた混
合物を濾過してZrOビーズを除去した。- j ws of 1 ゛The following dyes were ball milled by the following method. Water (21,
7d) and 6,7% Triton X-200? Surfactant aqueous solution (2,65g) (Rohm & llaa
(manufactured by S company) was placed in a 60ml screw cap bottle. 1.00 g of the dye below was added to this solution. Zirconium oxide (
Add ZrO) beads (40d) (2am diameter),
The lid was secured, the container was placed in the mill, and the contents were ground for 4 days. The container was removed and the contents were added to a 12.5% aqueous gelatin solution (8, h). The new mixture was placed on a roll mill for 10 minutes to reduce foam, and the resulting mixture was then filtered to remove the ZrO beads.
染料
界面活性剤(p−オクチルフェニルエトキシエトキシエ
タンスルホン酸ソーダ)及び硬膜剤(ビス(ビニル−ス
ルフォニルメチル)エーテル)を、上記染料−ゼラチン
分散物に添加した。このようにして製造した分散物を、
次いで1−1)で得たベース上に、染料塗布量0.08
g/rrf、ゼラチン塗布110.4g/rrf、界面
活性剤0.026g/rrf及び硬膜剤0.016 g
/rTIとなるように両面に塗布した。A dye surfactant (sodium p-octylphenylethoxyethoxyethanesulfonate) and a hardener (bis(vinyl-sulfonylmethyl)ether) were added to the dye-gelatin dispersion. The dispersion produced in this way is
Next, apply a dye coating amount of 0.08 on the base obtained in 1-1).
g/rrf, gelatin coating 110.4 g/rrf, surfactant 0.026 g/rrf and hardener 0.016 g
/rTI was applied to both sides.
1−3の
水12中にゼラチン30g、臭化カリ5g、沃化カリ0
.05gを加えて75゛Cに保った容器中に撹拌しなが
ら硝酸銀水溶液(硝酸銀として5g)と沃化力’J0.
73gを含む臭化カリ水溶液を1分間かけてダブルジェ
ット法で添加した。さらに硝酸銀水溶液(硝酸銀きして
145g)と臭化カリ水溶液をダブルジェット法で添加
した。この時の添加流速は、添加終了時の流速が、添加
開始時の8倍となるよう流量加速をおこなった。このあ
と、沃化カリ水溶液を0.37g添加した。30 g of gelatin, 5 g of potassium bromide, 0 potassium iodide in 12 of water in 1-3
.. Add 05 g of silver nitrate solution (5 g as silver nitrate) and iodizing power 'J0.
An aqueous solution of potassium bromide containing 73 g was added over 1 minute using a double jet method. Furthermore, a silver nitrate aqueous solution (145 g after removing silver nitrate) and a potassium bromide aqueous solution were added by a double jet method. The addition flow rate at this time was accelerated so that the flow rate at the end of addition was eight times that at the start of addition. After this, 0.37 g of potassium iodide aqueous solution was added.
添加終了後、沈降法により35°Cにて可溶性塩類を除
去したのち40℃に昇温しでゼラチン60gを連添し、
pllを6.5に調整した。、56°Cに再び昇温して
、増感色素アンヒドロ−5,5°−ジクロロ−9−エチ
ル−3,3′−ジ(3−スルフォプロピル)オキサカル
ボシアニンハイドロオキサイドナトリウム塩650a+
gを添加したのち金、イオウ増感を併用した化学増感を
ほどこした。得られた乳剤は六角平板状で投影面積直径
が0.854、平均の厚みが0.158−であった。After the addition was completed, soluble salts were removed at 35°C by the sedimentation method, the temperature was raised to 40°C, and 60 g of gelatin was continuously added.
pll was adjusted to 6.5. , the temperature was raised again to 56°C, and the sensitizing dye anhydro-5,5°-dichloro-9-ethyl-3,3'-di(3-sulfopropyl)oxacarbocyanine hydroxide sodium salt 650a+
After adding g, chemical sensitization using gold and sulfur sensitization was performed. The obtained emulsion had a hexagonal plate shape, a projected area diameter of 0.854, and an average thickness of 0.158.
この乳剤に安定剤として4−ヒドロキシ−6−メチル−
1,3,3a、?−テトラザインデンと2.6−ビス(
ヒドロキシアミノ)−4−ジエチルアミノ−1,3,5
−)リアジン、トリメチロールプロパンを添加した。This emulsion was added with 4-hydroxy-6-methyl- as a stabilizer.
1, 3, 3a,? -tetrazaindene and 2,6-bis(
hydroxyamino)-4-diethylamino-1,3,5
-) Added riazine and trimethylolpropane.
更に下記化合物も添加した<350rsg/ rtf
)さらに塗布助剤としてp−オクチルフェノキシジェト
キシエタンスルホン酸ソーダ0.01g/rd、ドデシ
ルベンゼンスルホン酸ソーダ0.005g/rd、増粘
剤としてポリボタシウムーp−ビニルベンゼンスルホネ
ート0.03g/fff、ポリマーラテックス(ポリ
〔エチルアクリレート/メタクリル酸=97/3〕粒子
にポリ〔重合度10〕オキシエチレンポリ〔重合度3〕
オキシグリセリルドデシルエーテル〔粒子の3重量%〕
を吸着させたもの、平均粒子径= O,l*) 0.
4g/rrf、ポリアクリル酸ナトリウム(分子量20
万) 0.1g/ポ、1.2−ビス(ビニルスルホニ
ルアセトアミド)エタン0.04g/rrf、トリメチ
ロールプロパン0.05g/nfを添加した。Furthermore, the following compounds were added <350rsg/rtf
) Furthermore, p-octylphenoxyjethoxyethoxyethanesulfonate sodium 0.01g/rd as a coating aid, dodecylbenzenesulfonate sodium 0.005g/rd, polybotacium p-vinylbenzenesulfonate 0.03g/fff as a thickener, and a polymer. latex (poly)
[Ethyl acrylate/methacrylic acid = 97/3] Particles containing poly[degree of polymerization 10] oxyethylene poly[degree of polymerization 3]
Oxyglyceryl dodecyl ether [3% by weight of particles]
adsorbed, average particle size = O, l*) 0.
4g/rrf, sodium polyacrylate (molecular weight 20
0.1 g/nf, 0.04 g/rrf of 1.2-bis(vinylsulfonylacetamido)ethane, and 0.05 g/nf of trimethylolpropane were added.
l−1の
ゼラチン 1.2g/rrlポ
リアクリルアミド(分子量4.5万)0.2g/ボ
デキストラン(分子量3.8万) 0.2g/n
fポリアクリル酸ナトリウム 0.02g/r
rfポリスチレンスルホン酸ソーダ 0.01g/r
rfコロイダルシリカ(粒径0.02−) 0.0
1g/ポボリ(重合度10)オキシエチレン
セチルエーテル 0.02g/ポボリ(
重合度10)オキシエチレン
ポリ(重合度3)グリセリル−
p−オクチルフェニルエーテル 0.02g/rrlC
、11。l-1 gelatin 1.2g/rrl polyacrylamide (molecular weight 45,000) 0.2g/bodextran (molecular weight 38,000) 0.2g/n
f Sodium polyacrylate 0.02g/r
rf polystyrene sulfonate soda 0.01g/r
RF colloidal silica (particle size 0.02-) 0.0
1g/Povoli (degree of polymerization 10) oxyethylene cetyl ether 0.02g/Povoli (
Polymerization degree 10) Oxyethylene poly(polymerization degree 3) Glyceryl p-octylphenyl ether 0.02g/rrlC
, 11.
CaF+vSOJ(CHzCIlzO)r(Cllgh
SOJa 0.0018/ITrO,0005g/r
+(
C11゜
・I
CvFltcONll(CIIthN−CIl□COO
θ 0.001g/ボ■
C1l。CaF+vSOJ(CHzCIlzO)r(Cllgh
SOJa 0.0018/ITrO, 0005g/r
+( C11゜・I CvFltcONll(CIIthN-CIl□COO
θ 0.001g/Bo ■ C1l.
C,H。C, H.
C,F、SO,N(C8IC11ZO斤−CIItCI
ICIl□0)−、H舊
0)1 0.005g/rrf
OH0,01g/ポ
硝酸カリウム 0.05g/rr
fp−t−オクチルフェノキシエト
キシエトキシエタンスルホン酸
ナトリウム塩 0.01 g/rr
f4−ヒドロキシ−6−メチル−1゜
3.3a、?−テトラザインデン 0.04 g/rr
fバルミチン酸セチル(ドデシルベ
ンゼンスルホン酸ソーダで分散
した0粒径0.114) 0.005g
/rrfジメチルシロキサン(ジオクチル
一α−スルホコハク酸ソーダで
分散した。粒径0.12u) 0.005g
/ボ流動パラフィン(ジオクチル−α
一スルホコハク酸ソーダで分散
した。粒径0.11μ) 0.005g
#+rポリメチルメタクリレート微粒子
(平均粒径3.8−54.8〜2.8 I!mの存在量
80重量%以上) 0.04g/ポー5
−と 蒼 の
上記乳剤層、保護層についてそれぞれゼラチン濃度が4
wt%になるように溶液を調製し、各々の層の基本処方
とした。C,F,SO,N(C8IC11ZOD-CIItCI
ICIl□0)-, H舊0)1 0.005g/rrf OH0.01g/Potassium nitrate 0.05g/rr
fp-t-octylphenoxyethoxyethoxyethoxyethanesulfonic acid sodium salt 0.01 g/rr
f4-hydroxy-6-methyl-1°3.3a,? -Tetrazaindene 0.04 g/rr
f Cetyl balmitate (0 particle size 0.114 dispersed with sodium dodecylbenzenesulfonate) 0.005g
/rrf dimethylsiloxane (dispersed with dioctyl-α-sodium sulfosuccinate. Particle size 0.12u) 0.005g
/ 0.005 g of liquid paraffin (dioctyl-α dispersed with sodium monosulfosuccinate. Particle size: 0.11μ)
#+r Polymethyl methacrylate fine particles (average particle size 3.8-54.8-2.8 I!m abundance 80% by weight or more) 0.04g/po5
The gelatin concentration is 4 for the above emulsion layer and protective layer for - and blue, respectively.
A solution was prepared so as to have a wt% concentration and was used as a basic formulation for each layer.
そして!−1)で作成し、1−2)で染色層を塗設した
ベースに塗布銀量が片面1.9g/nfとし両面に塗布
した。また、各層の配列は、支持体に近いほうから染色
層、乳剤層、保護層となるように塗布を行なった。and! The base prepared in step-1) and coated with the dyed layer in step 1-2) was coated on both sides with a coating silver amount of 1.9 g/nf on one side. The layers were arranged in such a way that the dyeing layer, emulsion layer, and protective layer were arranged in order from the side closest to the support.
表1に示したごとく作成した試料について、下記の評価
を行なった。The samples prepared as shown in Table 1 were evaluated as follows.
尚、現像液、定着液、および現像処理工程は以下の通り
に行なった。Note that the developer, fixer, and development process were performed as follows.
〈現像液濃縮液〉
水酸化カリウム 56.6g亜硫
酸ナトリウム 200gジエチレント
リアミン五酢酸 6.7g炭酸カリウム
16゜7gホウM10g
ハイドロキノン 83.3gジエ
チレングリコール 40g4−ヒドロキ
シメチル−4−メチ
ル−1−フェニル−3−ピラゾ
リドン 11.0g5−
メチルベンゾトリアゾール 2g水で11とする
(pH10,60に調整する)。<Developer concentrate> Potassium hydroxide 56.6g Sodium sulfite 200g Diethylenetriaminepentaacetic acid 6.7g Potassium carbonate
16゜7g Hou M10g Hydroquinone 83.3g Diethylene glycol 40g 4-Hydroxymethyl-4-methyl-1-phenyl-3-pyrazolidone 11.0g5-
Methylbenzotriazole 2g Adjust to 11 with water (adjust to pH 10.60).
く定着液濃縮液〉
チオ硫酸アンモニウム 560g亜硫酸ナ
トリウム 60gエチレンジアミン
四酢酸・ニナト
リウム・三水塩 0.10g水酸化
ナトリウム 248水でINとする
(酢酸でpH5,10に調整する)。Fixer Concentrate> Ammonium thiosulfate 560g Sodium sulfite 60g Ethylenediaminetetraacetic acid disodium trihydrate 0.10g Sodium hydroxide 248 Make IN with water (adjust to pH 5.10 with acetic acid).
〈現像処理工程〉
工Jl11上ユ容1”’X” 片■
現像タンク 6.!M 35℃xlO,5
秒定着タンク 6.54! 35°CX9
秒水洗タンク 6.!M! 20’C
X 7.5秒乾 燥
50°CDry to Dry処理時間0 45
秒(傘乾燥も含めた全処理時間)
現像処理をスタートするときには各タンクに以下の如き
処理液を満たした。<Development processing process> Developing tank 6. ! M 35℃xlO,5
Second fixing tank 6.54! 35°CX9
Second flush tank 6. ! M! 20'C
X 7.5 seconds dry
50°CDry to Dry processing time 0 45
seconds (total processing time including umbrella drying) When starting the development process, each tank was filled with the following processing solution.
現像タンク:上記現像液濃縮液333d、水667m及
び臭化カリウム2gと酢酸1.8gとを含むスターター
10dを加えてpHを10、15とした。Developing tank: 333 d of the above developer concentrate, 667 ml of water, and 10 d of starter containing 2 g of potassium bromide and 1.8 g of acetic acid were added to adjust the pH to 10.15.
定着タンク二上記定着液fil液250Ii及び水75
〇(1)スタチックマークテスト
未露光の試料を25°C,lO%IFで2時間調湿した
後、同一空調条件の暗室中において、試料を各種素材に
対してそのスタチックマークがどのようになるかを調べ
るべくゴムローラー及びウレタンローラーで摩擦した後
、前述の現像液で現像し、定着、水洗を行なってスタチ
・ンクマークの発生度を調べた。Fixing tank 2: fixer fil liquid 250Ii and water 75
〇(1) Static mark test After conditioning the unexposed sample at 25°C and 10% IF for 2 hours, we tested the static mark on the sample against various materials in a dark room under the same air conditioning conditions. After rubbing the film with a rubber roller and a urethane roller to see if it would cause stains, it was developed with the developer described above, fixed, and washed with water, and the degree of occurrence of static marks was investigated.
表1中、スタチックマーク発生度の評価は以下の4段階
に分けて行った。In Table 1, the degree of static mark occurrence was evaluated in the following four stages.
A;スタチックマークの発生が全く認められない。
・
B:スタチックマークの発生が少し認められる。A: No static marks were observed at all.
- B: Some static marks are observed.
C:スタチックマークの発生がかなり認められる。C: Significant occurrence of static marks is observed.
D:スタチックマークの発生がほぼ面に認められる。D: Static marks are observed almost on the entire surface.
(2)ゴミ付きテスト
温湿度25℃、10%R11条件下で試料(20cm
X 20CIl)をガーゼでよくこすり、タバコの灰の
付着性を調べた。評価は以下の4段階で行なった。(2) Test with dust The sample (20 cm
X 20CIl) was thoroughly rubbed with gauze, and the adhesion of cigarette ash was examined. Evaluation was performed in the following four stages.
A:ゴミ付きは全く見られなかった。A: No dust was observed at all.
B:ゴミ付きが少し認められた。B: A little dust was observed.
C:ゴミ付きが相当認められた。C: Considerable dust was observed.
D=ゴミ付きが激しく認められた。D= Severe dust adhesion was observed.
上記ゴミ付きテストは、現像処理前の試料および現像処
理後の試料の両方についておこなった。The dust stain test was conducted on both samples before and after development.
(3)接着性テスト
試料を25°C150%R1+の雰囲気下で2週間放置
した後、下記の方法で接着性の試験を行なった。ここで
試験した面はベースの下塗導電層を設けた面である。(3) Adhesion Test After the sample was left in an atmosphere of 150% R1+ at 25° C. for two weeks, an adhesion test was conducted in the following manner. The surface tested here was the surface provided with the base coat conductive layer.
(イ)乾燥フィルムの接着性試験法
試験すべき面に、たてよこ5III1間隔に7本ずつ切
り目を入れて36ケのます目を作り、この上に粘着テー
プ(例えば日東電気工業■製、ニット−テープ)をはり
つけ、180°方向に素早く引き剥す。(a) Adhesion test method for dry film On the surface to be tested, make 36 squares by making 7 cuts at 1 interval vertically and horizontally, and then apply adhesive tape (for example, Nitto Electric Industry Co., Ltd.) Attach knit tape) and quickly peel it off in a 180° direction.
この方法において未剥離部分が90%以上の場合をA級
、60%以上の場合をB級、60%未満を0級とする。In this method, if the unpeeled portion is 90% or more, it is graded A, if it is 60% or more, it is graded B, and if it is less than 60%, it is graded 0.
写真材料として十分実用に耐える接着強度とは上記3段
階評価のうちA級に分類されるものである。Adhesive strength sufficient for practical use as a photographic material is one that is classified as grade A of the above three-level evaluation.
(Iff)湿潤フィルムの接着性試験法現像定着、水洗
の各階段において処理液中でフィルムに鉄筆を用いて引
掻傷をX印につけ、これを指頭で強く5回こすり×の線
にそって剥がれた最大の剥離中により接着力を評価した
。(Iff) Wet film adhesion test method At each stage of development, fixation, and water washing, scratch the film in the processing solution at the X mark using an iron pen, and then rub it strongly with your fingertip 5 times along the X line. Adhesion strength was evaluated during maximum peeling.
構成層が傷取上に剥離しない場合をA級、最大剥離中が
5−鶏以内のときをB級、他を0級とする。A case where the constituent layer does not peel off after the scratch is removed is graded A, a case where the maximum peeling is less than 5 minutes is graded B, and other cases are grade 0.
写真材料として十分実用に耐える接着強度とは上記3段
階評価のうち8以上、好ましくはA級に分類されるもの
である。Adhesive strength sufficient for practical use as a photographic material is one that is rated at 8 or higher out of the above three grades, preferably classified as A grade.
(4)塗布性
前記1−5)で乳剤層と保護層を塗布した時の塗布性を
目視判定した。(4) Coating properties The coating properties of the emulsion layer and protective layer were visually evaluated in 1-5 above.
結果を表1に示した
第1表かられかるように本発明の導電性高分子を含有し
ないコントロール試料l−1はスタチックマーク発生度
とゴミ付きの点で著しく劣るものである。The results are shown in Table 1. As can be seen from Table 1, the control sample 1-1, which does not contain the conductive polymer of the present invention, is significantly inferior in terms of static mark generation and dust adhesion.
一方、本発明の導電性高分子を使用した試料1−2〜l
−4は、すべての評価に優れたものであるが、本発明以
外の導電剤粒子を使用した試料1−5〜1−7は接着性
の悪化を伴い、また導電性ポリマーを用いた試料1−8
はスタチックマーク、処理後のゴミ付きの悪化と接着性
の悪化を伴うことがわかる。On the other hand, samples 1-2 to 1 using the conductive polymer of the present invention
-4 was excellent in all evaluations, but samples 1-5 to 1-7 using conductive agent particles other than the present invention were accompanied by deterioration in adhesion, and sample 1 using conductive polymer -8
It can be seen that this is accompanied by static marks, deterioration of dust adhesion after processing, and deterioration of adhesion.
以上から本発明が従来の技術に比べ著しく優れているこ
とが明白である。From the above, it is clear that the present invention is significantly superior to conventional techniques.
なお、コントロール試料と本発明の試料は共に優れた画
像が得られた。Note that excellent images were obtained for both the control sample and the sample of the present invention.
実施例2
L二1Lへ免乞乙俗肚」肘1処方
50°Cに保ったゼラチン水溶液中に銀1モルあたり2
XlO−’モルの塩化ロジウムの存在下で硝酸銀水溶液
と塩化ナトリウムおよび臭化カリウムの混合水溶液を同
時に一定の速度で30分間添加して平均粒子サイズ0.
2−の塩臭化銀単分散乳剤を調製した。(塩化1195
モル%)
この乳剤をフロキュレーション法により脱塩を行ない、
m1モルあたりlagのチオ尿素ジオキサイドおよび0
.6figの塩化金酸を加え、65℃で最高性能が得ら
れるまで熟成した。Example 2 L 2 1L to 100g of silver per mol of silver in an aqueous gelatin solution kept at 50°C.
In the presence of XlO-' moles of rhodium chloride, an aqueous silver nitrate solution and a mixed aqueous solution of sodium chloride and potassium bromide were simultaneously added at a constant rate for 30 minutes to obtain an average particle size of 0.
A silver chlorobromide monodispersed emulsion of 2- was prepared. (chloride 1195
(mol%) This emulsion was desalted by the flocculation method,
lag of thiourea dioxide per m mole and 0
.. 6 figs of chloroauric acid was added and aged at 65°C until maximum performance was obtained.
こうして得られた乳剤に更に下記化合物を添加した。The following compounds were further added to the emulsion thus obtained.
4X10−’モル/Agモル
KB r 20 mg
/rrrポリスレチンスルフォン酸ナトリ
ラム塩 40 mg/ポ2
.6−ジクロロ−6−ヒドロキ
シ−!、3.5−)リアジンナ
トリウム塩 30 tsg/イ
この塗布液を塗布SR璽3 、5g/イとなる様塗布し
た。4X10-' mol/Ag mol KB r 20 mg
/rrrPolysretin sulfonic acid sodium salt 40 mg/Po2
.. 6-dichloro-6-hydroxy-! , 3.5-) Sodium riazine salt 30 tsg/I This coating solution was coated at a coating rate of 3.5 g/I.
2−2 ラ几
実施例1の保3I層に更に下記の化合物を添加した。な
おゼラチンは1.5g/rrfとした。2-2 The following compounds were further added to the 3I layer of Example 1. Note that the gelatin content was 1.5 g/rrf.
ドデシルベンゼンスルホン酸ナト
リウム塩 0.05g/nf
酢酸ソーダ 0.03g/イ5
−ニトロインダヅール 0.015g/rd
1.3−ジビニルスルホニル−2
一プロパロノール 0.05g/n1
N−パーフルオロオクタンスルホ
ニル−N−プロピルグリシノボ
タジウム塩 2 +ig/イエ
チルアクリレートラテックス
(平均粒径0.14) 0.2 g/
ポゼラチン 0.01g/ポポ
リエチルアクリレートラテック
ス(粒径0.06m ) 0.01g
/ rrlCo C0
NHC(CIIJzCIlzSOJa 0C11zC
)1tOcOc11zcIIzs(ltclI=cII
zO,003g/ポ
導電剤 (表2参照)−バ・・
几
ゼラチン 2.5 g/ポC
11i−CC−CII CC−Cll51.3−ジ
ビニルスルホニルーン
2−プロパツール 150 yag/ポ
エチルアクリレートラテソクス
(平均粒径0.14) 900 mg/
n(ジヘキシルーα−スルホサクシ
ナートナトリウム塩 35 tag/r
rrドデシルベンゼンスルホン酸ナ
トリウム塩 35 mg/n1
−5 バ・ i 几
実施例1の下塗保護層と同様に作成した。なおゼラチン
は1.0 g/ポとした。Dodecylbenzenesulfonic acid sodium salt 0.05g/nf
Sodium acetate 0.03g/i5
-Nitroduran 0.015g/rd
1.3-divinylsulfonyl-2-proparonol 0.05g/n1
N-perfluorooctanesulfonyl-N-propylglycinobotadium salt 2 +ig/ethyl acrylate latex (average particle size 0.14) 0.2 g/
Pogelatin 0.01g/Polyethyl acrylate latex (particle size 0.06m) 0.01g
/ rrlCo C0 NHC (CIIJzCIlzSOJa 0C11zC
)1tOcOc11zcIIzs(ltclI=cII
zO,003g/Po conductive agent (see Table 2) -Ba...
Gelatin 2.5 g/PoC
11i-CC-CII CC-Cll51.3-divinylsulfonyl rune 2-propatool 150 yag/poethyl acrylate latex (average particle size 0.14) 900 mg/
n(dihexyl-α-sulfosuccinate sodium salt 35 tag/r
rr Dodecylbenzenesulfonic acid sodium salt 35 mg/n1
-5 BA・i 几Produced in the same manner as the undercoat protective layer of Example 1. Note that the gelatin content was 1.0 g/pot.
塗布試料は、実施例1の塩化ビニリデン下塗り層のみを
両面に付与したPETベースを作成(下塗導電層なし)
の片面にバック下層、バンク層そしてバック保護層の順
に同時に塗布し、もう一方の側に乳剤層、乳剤保護層を
塗布して作成した。The coating sample was a PET base with only the vinylidene chloride undercoat layer of Example 1 applied to both sides (no conductive undercoat layer).
A back lower layer, a bank layer and a back protective layer were simultaneously coated in this order on one side, and an emulsion layer and an emulsion protective layer were coated on the other side.
表2に得られた試料の評価結果を示す。Table 2 shows the evaluation results of the obtained samples.
本発明の導電性高分子を用いて作成した試料2−2〜2
−4は表2かられかるようにスタチックマーク発生度、
ゴミ付き、及び接着性すべてに優れたものである。Samples 2-2 to 2 created using the conductive polymer of the present invention
-4 is the static mark occurrence rate as seen from Table 2.
It has excellent dust retention and adhesive properties.
一方、コントロール試料2−1及び比較化合物を用いた
試料2−6〜2−8はスタチックマーク、ゴミ付き、塗
布性及び接着性のすべてを満足させることはできない。On the other hand, control sample 2-1 and samples 2-6 to 2-8 using comparative compounds cannot satisfy all of the static marks, dust, coating properties, and adhesive properties.
以上から本発明が従来の技術に比べ著しく優れたもので
あることは明白である。From the above, it is clear that the present invention is significantly superior to conventional techniques.
又得られた画像は、現像時のムラや感度の低下もなく優
れたものであった。Furthermore, the obtained images were excellent, with no unevenness during development and no decrease in sensitivity.
実施例3
実施例2において、塩臭化銀単分散乳剤を有する乳剤層
を特開昭63−264740号の実施例3の試料202
の感光層の組成第1層から第14層に変更する以外は実
施例2と全く同様にしてカラー写真用ネガフィルム試料
3−1〜3−8を作成した。(処理は特開昭63−26
4740号の実施例3に従った)。Example 3 In Example 2, the emulsion layer having a silver chlorobromide monodispersed emulsion was prepared as sample 202 of Example 3 of JP-A No. 63-264740.
Color photographic negative film samples 3-1 to 3-8 were prepared in exactly the same manner as in Example 2, except that the composition of the photosensitive layer was changed from the first layer to the 14th layer. (Processing was done in JP-A-63-26
4740, Example 3).
本発明の試料3−2〜3−4はスタチックマーり、ゴミ
付き、接着性、塗布性をすべて満足するものであった。Samples 3-2 to 3-4 of the present invention satisfied all of the characteristics of static adhesive, dust adhesion, adhesion, and coatability.
一方比較試料3−5〜3−8及びコントロール試料3−
1は上記性能をすべて満足させることはできなかった。On the other hand, comparative samples 3-5 to 3-8 and control sample 3-
No. 1 could not satisfy all of the above performance requirements.
実施例4
三酢酢酸セルロース支持体の一方の側に特開昭63−2
64740号の実施例2の試料104の感光N組成を塗
布した。そして他の側のバック層は以下の組成の内容物
を塗布した。Example 4 JP-A-63-2 on one side of cellulose triacetate support
The photosensitive N composition of Sample 104 of Example 2 of No. 64740 was applied. The back layer on the other side was coated with the following composition.
1バヱ文第土IL
導電剤 (表3参照)ジエチ
レングリコール 10 tag/イ(アセ
トン/メタノール/水の混合溶媒を使用して塗布した)
1バヱ111履L
ジアセチルセルロース 200 mg/イ
ステアリンIII 10 tx
g/ポセチルステアレート 20 mg
/rrfシリカ粒子(粒径0.34) 30
mg/rd(アセトン/メタノール/水の混合溶媒を
使用して塗布した)
処理は特開昭63−264740号の実施例2に従った
。Conductive agent (see Table 3) Diethylene glycol 10 tag/I (applied using a mixed solvent of acetone/methanol/water) 1 Bag 111 L Diacetyl cellulose 200 mg/Istearin III 10 tx
g/pocetyl stearate 20 mg
/rrf Silica particles (particle size 0.34) 30
mg/rd (coated using a mixed solvent of acetone/methanol/water) The treatment was in accordance with Example 2 of JP-A-63-264740.
得られた試料4−1〜4−8をそれぞれ実施例1と同様
にして評価した。The obtained samples 4-1 to 4-8 were evaluated in the same manner as in Example 1, respectively.
本発明の試料4−2〜4−4はスタチックマーク、ゴミ
付き、接着性及び塗布性をすべて満足するものであり優
れた画像が得られた。Samples 4-2 to 4-4 of the present invention satisfied all of the static marks, dust, adhesion, and coating properties, and excellent images were obtained.
一方コントロール試料4−1や比較試料4−4〜4−8
はこれらのすべてを満足させることはできなかった。On the other hand, control sample 4-1 and comparative samples 4-4 to 4-8
could not satisfy all of these.
実施例5
撹拌装置と還流管を取り付けた12三ツロフラスコに硝
酸ドデシルナトリウム1.5gをはかりとり、水300
ccに熔解させる0次いで、反応容器を寒気流下75°
Cまで昇温し、200rp階で撹拌する。ここに、3%
過硫酸カリウム水溶液40gを加え、次いでメタクリル
酸メチル150g、アクリル酸エチル87.5g、アク
リル酸12.5gの混合溶液を、3時間かけ滴下した。Example 5 Weighed 1.5 g of sodium dodecyl nitrate into a 12-3 flask equipped with a stirring device and a reflux tube, and added 300 g of water.
The reaction vessel was then heated at 75° under a stream of cold air.
The temperature is raised to C and stirred at 200 rpm. Here, 3%
40 g of potassium persulfate aqueous solution was added, and then a mixed solution of 150 g of methyl methacrylate, 87.5 g of ethyl acrylate, and 12.5 g of acrylic acid was added dropwise over 3 hours.
滴下開始後30分毎に、計6回3%過硫酸カリウムLo
gを加えた。単量体混合物の滴下終了後さらに2時間反
応容器を75℃に保ち、平均分子量250000の共重
合体の水性分散物を得た。この水性分散物を10%水酸
化カリウム水溶液で中和し、pH7,5に調製した。3% potassium persulfate Lo 6 times in total every 30 minutes after the start of dripping
g was added. After the completion of dropping the monomer mixture, the reaction vessel was kept at 75° C. for another 2 hours to obtain an aqueous dispersion of a copolymer with an average molecular weight of 250,000. This aqueous dispersion was neutralized with a 10% aqueous potassium hydroxide solution to adjust the pH to 7.5.
口 II K のイ
)で得られた共重合体の水性分散液中に、2゜4−ジク
ロロ−6−ヒドロキシ−1,3,5−)リアジンナトリ
ウム塩を共重合体の4重量%添加し、さらに平均粒径2
−のポリスチレン微粒子が1.0mg/rrf塗布され
るようにポリスチレン微粒子を添加した液を下塗第1層
用塗布液とした。2゜4-dichloro-6-hydroxy-1,3,5-) riazine sodium salt was added in an amount of 4% by weight of the copolymer into the aqueous dispersion of the copolymer obtained in step II K. Furthermore, the average particle size 2
A liquid to which polystyrene fine particles were added such that 1.0 mg/rrf of polystyrene fine particles of - was added was used as a coating liquid for the first undercoat layer.
厚さ100−1中30c鳳の2軸延伸ポリエチレンテレ
フタレートフイルムを、下記の条件でコロナ放電処理を
した。フィルム搬送速度は30m/分、コロナ放電電極
とポリエチレンテレフタレートフィルムとの間隙は1.
8mm、電力は200ワ・ントであった。コロナ放電処
理されたポリエチレンテレフタレートの上に、上記の下
塗第1層用塗布液を両面に0.1−の乾燥膜厚になるよ
うにバーコータ法で塗布し、185°Cで乾燥した。こ
の層を下塗第1層と呼ぶ。A biaxially stretched polyethylene terephthalate film with a thickness of 100-1/30 cm was subjected to corona discharge treatment under the following conditions. The film transport speed was 30 m/min, and the gap between the corona discharge electrode and the polyethylene terephthalate film was 1.
8 mm, and the power was 200 watts. The above coating solution for the first undercoat layer was coated on both sides of the polyethylene terephthalate treated with corona discharge using a bar coater method to a dry film thickness of 0.1 -, and dried at 185°C. This layer is called the first undercoat layer.
ハ上ILJJUU纏m旧1α1戊
口)で作成した乳剤層側下塗1層の上に、フィルム搬送
速度30m/分、コロナ放電電極とフィルムとの間隔を
1.8mmg、電力を120ワツトでコロナ放電処理し
、その上に塩化ビニリデン/メチルメタアクリレート/
メチルアクリレート/アクリロニトリル/アクリル酸(
90/4.5/ 4 / l 10.5重量%)共重合
体の水性分散液を0.4trmの乾燥膜厚になるように
グラビアコーターで塗布し、120°Cで塗燥した。こ
の層を下塗第2層と呼ぶ。Corona discharge was performed on the undercoat layer on the emulsion layer side prepared using the above-mentioned ILJJUU method, with a film transport speed of 30 m/min, a distance between the corona discharge electrode and the film of 1.8 mm, and a power of 120 watts. Vinylidene chloride/methyl methacrylate/
Methyl acrylate/acrylonitrile/acrylic acid (
An aqueous dispersion of a copolymer (90/4.5/4/l 10.5% by weight) was applied using a gravure coater to a dry film thickness of 0.4 trm, and the coating was carried out at 120°C. This layer is called the second undercoat layer.
二 〇 ・ 3 のハ)で作成し
た下塗第2Nの上に、フィルム搬送速度30m/分、コ
ロナ放電電極とポリエチレンテレフタレートフィルムと
の間隙を1.8mm、 N力を250ワツトで処理し、
その上に下塗第3層として下記処方ニー(a)の下塗液
を20d/n(になるように押し出し法で塗布し、17
0’Cで乾燥して乳剤層側下塗第3層を作成した。On top of the 2N undercoat prepared in 20.3.c), a treatment was applied at a film transport speed of 30 m/min, a gap between the corona discharge electrode and the polyethylene terephthalate film of 1.8 mm, and an N force of 250 watts.
On top of that, as the third layer of undercoat, apply the undercoat liquid of the following prescription knee (a) by extrusion method to 20 d/n (17 d/n).
It was dried at 0'C to form a third undercoat layer on the side of the emulsion layer.
ニーa + −3+’ ルゼラチン
1.0 重量%メチルセルロース
0.05重量%C1□lhs(ClbCIl
gO)n+lI 0.03重量%水を加えて
100 重量%以上のごとくに
して、乳剤層側下塗りを付与した。knee a + -3+' lugelatin
1.0% by weight methyl cellulose
0.05% by weight C1□lhs (ClbCIl
gO)n+lI 0.03% by weight water was added to make the emulsion layer side undercoat to 100% by weight or more.
−バ・・り の
5−1)で作成した乳剤層側下塗り済みのポリエチレン
テレフタレートフィルムの反対側に、乳剤層側下塗第1
層と全く同様にして、バ・ツク層側下塗り第1層を付与
した。- On the opposite side of the polyethylene terephthalate film with the emulsion layer side undercoat prepared in step 5-1), apply the first emulsion layer side undercoat.
A first layer of undercoat on the back layer side was applied in exactly the same manner as the layer.
ロ バー の
前項イ)で得られたバック層側下塗り第1Nの上に、乳
剤層側下塗り第2層と全く同様にしてバック層側下塗り
第2層を作成した。A second back layer side undercoat layer was prepared on top of the back layer side undercoat 1N obtained in the previous section (a) of Robar in exactly the same manner as the second emulsion layer side undercoat layer.
ハ バ・・ 、 3 の
前記のバック層側下塗り第2層の上にフィルム搬送速度
30m/分、コロナ放電電極とフィルムとの間隙を1.
8mm、電力を250ワツトで処理し、その上に下記処
方バー(a)の塗布液を20d/n(となるように塗布
してバック層側下塗り第3層を作成した。The film was conveyed at a speed of 30 m/min, and the gap between the corona discharge electrode and the film was set at 1.
8 mm and a power of 250 watts, and a coating solution of the following prescription bar (a) was applied thereon at a rate of 20 d/n to form a third undercoat layer on the back layer side.
バーa ツマ・ 1′ 几ゼラチ
ン 1.0 重量%メチルセルロ
ース 0.05重量%C+ x II t
5o(CHtcIl to)−roll
0.03重量%水を加えて 100
重量%−5−3ハロノ′ン ル
50“Cに保ったゼラチン水溶液中に銀1モルあたり2
X10−’モルの塩化ロジウムの存在下で硝酸銀水溶液
と塩化ナトリウムおよび臭化カリウムの混合水溶液を同
時に一定の速度で30分間添加して平均粒子サイズ0.
2岬の塩臭化銀単分散乳剤を調製した。(塩化銀95モ
ル%)
この乳剤をフロキュレーション法により脱塩を行ない、
t! 1モルあたりlagのチオ尿素ジオキサイドおよ
び0.6mgの塩化金酸を加え、65゛Cで最高性能が
得られるまで熟成した。Bar a Tsuma 1' Gelatin 1.0% by weight Methyl cellulose 0.05% by weight C+ x II t
5o(CHtcIl to)-roll
Add 0.03% water by weight 100
wt% -5-3 halonone per mole of silver in an aqueous gelatin solution maintained at 50"C.
In the presence of X10-' moles of rhodium chloride, an aqueous silver nitrate solution and a mixed aqueous solution of sodium chloride and potassium bromide were simultaneously added at a constant rate for 30 minutes to obtain an average particle size of 0.
A silver chlorobromide monodisperse emulsion of 2 Misaki was prepared. (Silver chloride 95 mol%) This emulsion was desalted by the flocculation method,
T! lag of thiourea dioxide and 0.6 mg of chloroauric acid per mole were added and aged at 65°C until maximum performance was obtained.
こうして得られた乳剤に更に下記化合物を添加した。The following compounds were further added to the emulsion thus obtained.
2X10−”モル/Agモル
4X10−’モル/Agモル
KBr 20
mg/rdポリスチレンスルフォン酸ナトリ
ラム塩 40mg/イ2.
6−ジクロロ−6−ヒドロキ
シ−1,3,5−トリアジンナ
トリウム塩 30 mg/mこの
塗布液を塗布銀量3.5g/ポとなる禄塗布した。2X10-''mol/Agmol 4X10-''mol/Agmol KBr 20
mg/rd polystyrene sulfonic acid sodium salt 40mg/a2.
6-Dichloro-6-hydroxy-1,3,5-triazine sodium salt 30 mg/m This coating solution was coated at a coating amount of 3.5 g/m.
5二」」」L肘保m方
ゼラチン 1.5 g/rr
fSing微粒子(平均粒径44) 50
B/イドデシルベンゼンスルホン酸ナト
リウム塩 50 mg/■f
H
5−ニトロインダゾール 1.5 mg7M
1.3−ジビニルスルホニル−2
一プロバロノール 50 wrg#r
rN−パーフルオロオクタンスルホ
ニル−N−プロピルグリシノボ
タジウム塩 2 erg/Mエ
チルアクリレートラテックス
(平均粒径0.14) 300 mg
/ボゼラチン 2.5 g/
イC1b−CC=CII CC−CHll、3−ジ
ビニルスルホニル−
2−プロパツール 150 鏑g/イエチ
ルアクリレートラテンクス
(平均粒径0.1−) 900 mg
/ポジヘキシル−α−スルホサクシ
ナートナトリウム塩 35 mg7Mド
デシルベンゼンスルホン酸ナ
トリウム塩 35 B/ボー6
バ i 几
ゼラチン 0.8 g/ポポ
リメチルメタクリレート微粒子
(平均粒径34) 20 mg/c
dジヘキシルーα−スルホサクシ
ナートナトリウム塩 10 mg/rd
ドデシルベンゼンスルホン酸ナ
トリウム塩 1.0 mg/ポ
酢酸ナトリウム 40 11g/ポ
現像処理は、富士写真フィルム社製のFG−660自動
現像機を、現像液・定着液は同社製GRD−1、GRF
−1を用いて、38°C20秒の処理条件でおこなった
。そのときの乾燥温度は45°Cであった。52'' L elbow gelatin 1.5 g/rr
fSing fine particles (average particle size 44) 50
B/Idodecylbenzenesulfonic acid sodium salt 50 mg/■f
H 5-nitroindazole 1.5 mg 7M
1.3-Divinylsulfonyl-2-provalonol 50 wrg#r
rN-perfluorooctanesulfonyl-N-propylglycinobotadium salt 2 erg/M ethyl acrylate latex (average particle size 0.14) 300 mg
/bogelatin 2.5 g/
A C1b-CC=CII CC-CHll, 3-divinylsulfonyl-2-propatol 150 g/ethyl acrylate latex (average particle size 0.1-) 900 mg
/ posihexyl-α-sulfosuccinate sodium salt 35 mg 7M dodecylbenzenesulfonic acid sodium salt 35 B/bo 6
Ba i Solid gelatin 0.8 g/polymethyl methacrylate fine particles (average particle size 34) 20 mg/c
d-dihexyl-α-sulfosuccinate sodium salt 10 mg/rd
Dodecylbenzenesulfonic acid sodium salt 1.0 mg/sodium polyacetate 40 11 g/po The development process was carried out using the FG-660 automatic processor manufactured by Fuji Photo Film Co., Ltd., and the developing solution and fixing solution were GRD-1 and GRF manufactured by the same company.
-1 under the treatment conditions of 38°C and 20 seconds. The drying temperature at that time was 45°C.
得られた試料5−1〜5−8をそれぞれ実施例1と同様
にして評価した。The obtained samples 5-1 to 5-8 were evaluated in the same manner as in Example 1, respectively.
本発明の試料5−2〜5−4はスタチックマーク、ゴミ
付き、接着性及び塗布性をすべて満足するものであり又
画像も優れたものであった。Samples 5-2 to 5-4 of the present invention satisfied all of the static marks, dust, adhesion, and coating properties, and also had excellent images.
一方、コントロール試料5−1や比較試料5〜5〜5−
8はこれらのすべてを満足させることはできず、本発明
が従来の技術に比、べて優れていることは明白である。On the other hand, control sample 5-1 and comparative sample 5-5-5-
No. 8 cannot satisfy all of these requirements, and it is clear that the present invention is superior to the conventional technology.
Claims (1)
を有する写真感光材料に於いて、該感光材料の構成層の
少なくとも一層に、下記一般式〔 I 〕で表わされる化
合物の少なくとも一種を酸化重合させてなる導電性高分
子を含有することを特徴とするハロゲン化銀写真感光材
料。 一般式〔 I 〕 Y−[−(X)−_a−{−(R_1−O)−_nR_
2}_m]_b(式中、Yは酸化重合により高分子を形
成しうる基を表わし、Xは連結基を表わし、R_1は置
換されてもよいアルキレン基を表わし、R_2は水素原
子又はそれぞれ置換されてもよいアルキル基、アルケニ
ル基、アルキニル基、アリール基、アシル基、カルバモ
イル基もしくはスルホニル基を表わす。 aは0又は1を表わし、bは1から4の整数を表わし、
mは1から3の整数を表わし、nは2から30の整数を
表わす。 ただし、b>1のときは、−(X)−_a−{−(R_
1−O)−_nR_2}_mは同じでも異なっていても
良い。また、m>1のときは、−(R_1−O)−_n
R_2は同じでも異なっていても良い。またn≧3のと
きは、n個のR_1は同じでも異なっていても良い。)[Scope of Claims] In a photographic light-sensitive material having at least one light-sensitive silver halide emulsion layer on a support, at least one of the constituent layers of the light-sensitive material contains a compound represented by the following general formula [I]. 1. A silver halide photographic material comprising a conductive polymer obtained by oxidative polymerization of at least one of the following. General formula [I] Y-[-(X)-_a-{-(R_1-O)-_nR_
2}_m]_b (where Y represents a group capable of forming a polymer through oxidative polymerization, X represents a linking group, R_1 represents an optionally substituted alkylene group, and R_2 represents a hydrogen atom or each substituted represents an alkyl group, an alkenyl group, an alkynyl group, an aryl group, an acyl group, a carbamoyl group, or a sulfonyl group, which may be substituted. a represents 0 or 1, b represents an integer from 1 to 4,
m represents an integer from 1 to 3, and n represents an integer from 2 to 30. However, when b>1, -(X)-_a-{-(R_
1-O)-_nR_2}_m may be the same or different. Also, when m>1, -(R_1-O)-_n
R_2 may be the same or different. Further, when n≧3, the n R_1s may be the same or different. )
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12887789A JPH02308246A (en) | 1989-05-24 | 1989-05-24 | Silver halide photographic sensitive material |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12887789A JPH02308246A (en) | 1989-05-24 | 1989-05-24 | Silver halide photographic sensitive material |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH02308246A true JPH02308246A (en) | 1990-12-21 |
Family
ID=14995567
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP12887789A Pending JPH02308246A (en) | 1989-05-24 | 1989-05-24 | Silver halide photographic sensitive material |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH02308246A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2007328889A (en) * | 2006-06-09 | 2007-12-20 | Fujifilm Corp | Magnetic recording medium |
-
1989
- 1989-05-24 JP JP12887789A patent/JPH02308246A/en active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2007328889A (en) * | 2006-06-09 | 2007-12-20 | Fujifilm Corp | Magnetic recording medium |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US4917993A (en) | Silver halide photographic materials | |
| US4943520A (en) | Silver halide photographic material containing antistatic agents | |
| JPH02308246A (en) | Silver halide photographic sensitive material | |
| US5153115A (en) | Silver halide photographic materials and method for manufacture thereof | |
| JPH02282245A (en) | Silver halide photographic sensitive material | |
| US5250409A (en) | Silver halide photographic material | |
| JPH02311842A (en) | Silver halide photographic sensitive material | |
| JPH01260437A (en) | Silver halide photographic sensitive material | |
| JP2588749B2 (en) | Silver halide photographic material | |
| JPH02282248A (en) | Silver halide photographic sensitive material | |
| US5108885A (en) | Silver halide photographic material containing crosslinked polymer | |
| JPH02308245A (en) | Silver halide photographic sensitive material | |
| JPS62109045A (en) | Silver halide photographic sensitive material | |
| JPH02293844A (en) | Silver halide photographic sensitive material | |
| JPH02293741A (en) | Silver halide photographic sensitive material | |
| JPH032750A (en) | Silver halide photographic sensitive material | |
| JPH02308160A (en) | Silver halide photographic sensitive material | |
| JPH0338637A (en) | Silver halide photographic sensitive material and production thereof | |
| JPH0296743A (en) | Silver halide photoraphic sensitive material | |
| JPH02301749A (en) | Silver halide photographic sensitive material | |
| JPH04149433A (en) | Silver halide photosensitive material | |
| EP0452102A1 (en) | Packaged silver halide photographic materials and process for their production | |
| JPH035749A (en) | Silver halide photographic sensitive material and production thereof | |
| JPH02308159A (en) | Silver halide photographic sensitive material | |
| JPH02282246A (en) | Silver halide photographic sensitive material |