JPH04149433A - Silver halide photosensitive material - Google Patents
Silver halide photosensitive materialInfo
- Publication number
- JPH04149433A JPH04149433A JP27357090A JP27357090A JPH04149433A JP H04149433 A JPH04149433 A JP H04149433A JP 27357090 A JP27357090 A JP 27357090A JP 27357090 A JP27357090 A JP 27357090A JP H04149433 A JPH04149433 A JP H04149433A
- Authority
- JP
- Japan
- Prior art keywords
- group
- layer
- silver halide
- solution
- coating
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000463 material Substances 0.000 title claims abstract description 71
- -1 Silver halide Chemical class 0.000 title claims abstract description 70
- 229910052709 silver Inorganic materials 0.000 title claims abstract description 37
- 239000004332 silver Substances 0.000 title claims abstract description 37
- 239000000839 emulsion Substances 0.000 claims abstract description 41
- 125000000217 alkyl group Chemical group 0.000 claims abstract description 10
- 125000003342 alkenyl group Chemical group 0.000 claims abstract description 3
- 150000003839 salts Chemical class 0.000 claims description 20
- 229910021645 metal ion Inorganic materials 0.000 claims description 8
- 125000004432 carbon atom Chemical group C* 0.000 claims description 7
- 239000000126 substance Substances 0.000 claims description 7
- 239000000470 constituent Substances 0.000 claims description 6
- 125000003118 aryl group Chemical group 0.000 claims description 3
- 125000001424 substituent group Chemical group 0.000 claims description 3
- 125000000304 alkynyl group Chemical group 0.000 claims description 2
- 230000000737 periodic effect Effects 0.000 claims description 2
- 238000012545 processing Methods 0.000 abstract description 34
- 238000011109 contamination Methods 0.000 abstract description 11
- 238000011282 treatment Methods 0.000 abstract description 9
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 abstract description 6
- 229910052799 carbon Inorganic materials 0.000 abstract 2
- 239000000243 solution Substances 0.000 description 52
- 238000000034 method Methods 0.000 description 51
- 239000011248 coating agent Substances 0.000 description 46
- 238000000576 coating method Methods 0.000 description 44
- 239000010410 layer Substances 0.000 description 43
- 150000001875 compounds Chemical class 0.000 description 38
- 239000000975 dye Substances 0.000 description 30
- 238000011161 development Methods 0.000 description 28
- 108010010803 Gelatin Proteins 0.000 description 25
- 239000008273 gelatin Substances 0.000 description 25
- 229920000159 gelatin Polymers 0.000 description 25
- 235000019322 gelatine Nutrition 0.000 description 25
- 235000011852 gelatine desserts Nutrition 0.000 description 25
- 239000002245 particle Substances 0.000 description 17
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 16
- 239000007864 aqueous solution Substances 0.000 description 15
- 230000003068 static effect Effects 0.000 description 15
- 239000011241 protective layer Substances 0.000 description 14
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 12
- 239000002216 antistatic agent Substances 0.000 description 12
- 239000000203 mixture Substances 0.000 description 12
- IOLCXVTUBQKXJR-UHFFFAOYSA-M potassium bromide Chemical compound [K+].[Br-] IOLCXVTUBQKXJR-UHFFFAOYSA-M 0.000 description 12
- 239000003795 chemical substances by application Substances 0.000 description 11
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 9
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 9
- 239000002253 acid Substances 0.000 description 8
- 239000000084 colloidal system Substances 0.000 description 8
- 238000010186 staining Methods 0.000 description 8
- 206010070834 Sensitisation Diseases 0.000 description 7
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 7
- 230000015572 biosynthetic process Effects 0.000 description 7
- 238000006243 chemical reaction Methods 0.000 description 7
- 239000007788 liquid Substances 0.000 description 7
- 238000002360 preparation method Methods 0.000 description 7
- 230000002829 reductive effect Effects 0.000 description 7
- 230000008313 sensitization Effects 0.000 description 7
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 6
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 6
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 description 6
- 239000002202 Polyethylene glycol Substances 0.000 description 6
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 6
- 239000002736 nonionic surfactant Substances 0.000 description 6
- 229920001223 polyethylene glycol Polymers 0.000 description 6
- 229920000642 polymer Polymers 0.000 description 6
- NLKNQRATVPKPDG-UHFFFAOYSA-M potassium iodide Chemical compound [K+].[I-] NLKNQRATVPKPDG-UHFFFAOYSA-M 0.000 description 6
- 239000011734 sodium Substances 0.000 description 6
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 6
- 238000005406 washing Methods 0.000 description 6
- 229910019142 PO4 Inorganic materials 0.000 description 5
- 230000000052 comparative effect Effects 0.000 description 5
- 238000011156 evaluation Methods 0.000 description 5
- DZVCFNFOPIZQKX-LTHRDKTGSA-M merocyanine Chemical compound [Na+].O=C1N(CCCC)C(=O)N(CCCC)C(=O)C1=C\C=C\C=C/1N(CCCS([O-])(=O)=O)C2=CC=CC=C2O\1 DZVCFNFOPIZQKX-LTHRDKTGSA-M 0.000 description 5
- 235000021317 phosphate Nutrition 0.000 description 5
- 229920002401 polyacrylamide Polymers 0.000 description 5
- 239000004848 polyfunctional curative Substances 0.000 description 5
- 239000002904 solvent Substances 0.000 description 5
- 229910052717 sulfur Inorganic materials 0.000 description 5
- 239000004094 surface-active agent Substances 0.000 description 5
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 4
- 229920002307 Dextran Polymers 0.000 description 4
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 4
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 4
- 229920003171 Poly (ethylene oxide) Polymers 0.000 description 4
- 230000002411 adverse Effects 0.000 description 4
- 238000004061 bleaching Methods 0.000 description 4
- 229920001577 copolymer Polymers 0.000 description 4
- 238000009826 distribution Methods 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 4
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 4
- 239000004926 polymethyl methacrylate Substances 0.000 description 4
- BWHMMNNQKKPAPP-UHFFFAOYSA-L potassium carbonate Chemical compound [K+].[K+].[O-]C([O-])=O BWHMMNNQKKPAPP-UHFFFAOYSA-L 0.000 description 4
- 239000002244 precipitate Substances 0.000 description 4
- 238000010992 reflux Methods 0.000 description 4
- 238000011160 research Methods 0.000 description 4
- 230000035945 sensitivity Effects 0.000 description 4
- 230000001235 sensitizing effect Effects 0.000 description 4
- SQGYOTSLMSWVJD-UHFFFAOYSA-N silver(1+) nitrate Chemical compound [Ag+].[O-]N(=O)=O SQGYOTSLMSWVJD-UHFFFAOYSA-N 0.000 description 4
- 229910052708 sodium Inorganic materials 0.000 description 4
- GEHJYWRUCIMESM-UHFFFAOYSA-L sodium sulfite Chemical compound [Na+].[Na+].[O-]S([O-])=O GEHJYWRUCIMESM-UHFFFAOYSA-L 0.000 description 4
- 238000003756 stirring Methods 0.000 description 4
- 238000003786 synthesis reaction Methods 0.000 description 4
- 239000002562 thickening agent Substances 0.000 description 4
- ANRHNWWPFJCPAZ-UHFFFAOYSA-M thionine Chemical compound [Cl-].C1=CC(N)=CC2=[S+]C3=CC(N)=CC=C3N=C21 ANRHNWWPFJCPAZ-UHFFFAOYSA-M 0.000 description 4
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- QWZOJDWOQYTACD-UHFFFAOYSA-N 2-ethenylsulfonyl-n-[2-[(2-ethenylsulfonylacetyl)amino]ethyl]acetamide Chemical compound C=CS(=O)(=O)CC(=O)NCCNC(=O)CS(=O)(=O)C=C QWZOJDWOQYTACD-UHFFFAOYSA-N 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 3
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 3
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 3
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 3
- 239000012190 activator Substances 0.000 description 3
- 239000000654 additive Substances 0.000 description 3
- 238000007765 extrusion coating Methods 0.000 description 3
- 239000012456 homogeneous solution Substances 0.000 description 3
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 3
- 229920001467 poly(styrenesulfonates) Polymers 0.000 description 3
- 230000002265 prevention Effects 0.000 description 3
- 239000003381 stabilizer Substances 0.000 description 3
- 238000001308 synthesis method Methods 0.000 description 3
- IAYPIBMASNFSPL-UHFFFAOYSA-N Ethylene oxide Chemical compound C1CO1 IAYPIBMASNFSPL-UHFFFAOYSA-N 0.000 description 2
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 2
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 2
- 239000004677 Nylon Substances 0.000 description 2
- 239000004372 Polyvinyl alcohol Substances 0.000 description 2
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 2
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 2
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 2
- 150000007513 acids Chemical class 0.000 description 2
- 125000001931 aliphatic group Chemical group 0.000 description 2
- 229910052783 alkali metal Inorganic materials 0.000 description 2
- 150000001340 alkali metals Chemical class 0.000 description 2
- 125000002947 alkylene group Chemical group 0.000 description 2
- 150000001412 amines Chemical class 0.000 description 2
- 229910021529 ammonia Inorganic materials 0.000 description 2
- 125000000129 anionic group Chemical group 0.000 description 2
- 239000003945 anionic surfactant Substances 0.000 description 2
- 125000004104 aryloxy group Chemical group 0.000 description 2
- JEHKKBHWRAXMCH-UHFFFAOYSA-N benzenesulfinic acid Chemical compound O[S@@](=O)C1=CC=CC=C1 JEHKKBHWRAXMCH-UHFFFAOYSA-N 0.000 description 2
- 239000011230 binding agent Substances 0.000 description 2
- 239000007844 bleaching agent Substances 0.000 description 2
- 239000003093 cationic surfactant Substances 0.000 description 2
- 150000001768 cations Chemical class 0.000 description 2
- 239000001913 cellulose Substances 0.000 description 2
- 229920002678 cellulose Polymers 0.000 description 2
- 235000010980 cellulose Nutrition 0.000 description 2
- 239000002131 composite material Substances 0.000 description 2
- 239000013078 crystal Substances 0.000 description 2
- 239000003599 detergent Substances 0.000 description 2
- 238000003618 dip coating Methods 0.000 description 2
- 239000000428 dust Substances 0.000 description 2
- 230000005611 electricity Effects 0.000 description 2
- 239000003995 emulsifying agent Substances 0.000 description 2
- 238000002474 experimental method Methods 0.000 description 2
- 239000000706 filtrate Substances 0.000 description 2
- 238000007667 floating Methods 0.000 description 2
- 229910052731 fluorine Inorganic materials 0.000 description 2
- 125000001153 fluoro group Chemical group F* 0.000 description 2
- KWIUHFFTVRNATP-UHFFFAOYSA-N glycine betaine Chemical compound C[N+](C)(C)CC([O-])=O KWIUHFFTVRNATP-UHFFFAOYSA-N 0.000 description 2
- LEQAOMBKQFMDFZ-UHFFFAOYSA-N glyoxal Chemical compound O=CC=O LEQAOMBKQFMDFZ-UHFFFAOYSA-N 0.000 description 2
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 2
- 229910052737 gold Inorganic materials 0.000 description 2
- 239000010931 gold Substances 0.000 description 2
- 125000000623 heterocyclic group Chemical group 0.000 description 2
- 239000003112 inhibitor Substances 0.000 description 2
- 239000004816 latex Substances 0.000 description 2
- 229920000126 latex Polymers 0.000 description 2
- 239000006224 matting agent Substances 0.000 description 2
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 2
- 239000011259 mixed solution Substances 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- 229920001778 nylon Polymers 0.000 description 2
- 239000003960 organic solvent Substances 0.000 description 2
- 150000003013 phosphoric acid derivatives Chemical class 0.000 description 2
- 239000004014 plasticizer Substances 0.000 description 2
- 229920000139 polyethylene terephthalate Polymers 0.000 description 2
- 239000005020 polyethylene terephthalate Substances 0.000 description 2
- 229960002796 polystyrene sulfonate Drugs 0.000 description 2
- 239000011970 polystyrene sulfonate Substances 0.000 description 2
- 229920002451 polyvinyl alcohol Polymers 0.000 description 2
- 229910000027 potassium carbonate Inorganic materials 0.000 description 2
- 239000002243 precursor Substances 0.000 description 2
- 229910001961 silver nitrate Inorganic materials 0.000 description 2
- 235000010265 sodium sulphite Nutrition 0.000 description 2
- 238000005507 spraying Methods 0.000 description 2
- 230000000087 stabilizing effect Effects 0.000 description 2
- 238000003860 storage Methods 0.000 description 2
- 125000005504 styryl group Chemical group 0.000 description 2
- 235000000346 sugar Nutrition 0.000 description 2
- 125000000020 sulfo group Chemical group O=S(=O)([*])O[H] 0.000 description 2
- 239000011593 sulfur Substances 0.000 description 2
- 150000003467 sulfuric acid derivatives Chemical class 0.000 description 2
- 239000002344 surface layer Substances 0.000 description 2
- 150000003568 thioethers Chemical class 0.000 description 2
- JNYAEWCLZODPBN-JGWLITMVSA-N (2r,3r,4s)-2-[(1r)-1,2-dihydroxyethyl]oxolane-3,4-diol Chemical class OC[C@@H](O)[C@H]1OC[C@H](O)[C@H]1O JNYAEWCLZODPBN-JGWLITMVSA-N 0.000 description 1
- LUMLZKVIXLWTCI-NSCUHMNNSA-N (e)-2,3-dichloro-4-oxobut-2-enoic acid Chemical compound OC(=O)C(\Cl)=C(/Cl)C=O LUMLZKVIXLWTCI-NSCUHMNNSA-N 0.000 description 1
- FYADHXFMURLYQI-UHFFFAOYSA-N 1,2,4-triazine Chemical compound C1=CN=NC=N1 FYADHXFMURLYQI-UHFFFAOYSA-N 0.000 description 1
- YXIWHUQXZSMYRE-UHFFFAOYSA-N 1,3-benzothiazole-2-thiol Chemical class C1=CC=C2SC(S)=NC2=C1 YXIWHUQXZSMYRE-UHFFFAOYSA-N 0.000 description 1
- YHMYGUUIMTVXNW-UHFFFAOYSA-N 1,3-dihydrobenzimidazole-2-thione Chemical class C1=CC=C2NC(S)=NC2=C1 YHMYGUUIMTVXNW-UHFFFAOYSA-N 0.000 description 1
- GGZHVNZHFYCSEV-UHFFFAOYSA-N 1-Phenyl-5-mercaptotetrazole Chemical compound SC1=NN=NN1C1=CC=CC=C1 GGZHVNZHFYCSEV-UHFFFAOYSA-N 0.000 description 1
- IXPNQXFRVYWDDI-UHFFFAOYSA-N 1-methyl-2,4-dioxo-1,3-diazinane-5-carboximidamide Chemical compound CN1CC(C(N)=N)C(=O)NC1=O IXPNQXFRVYWDDI-UHFFFAOYSA-N 0.000 description 1
- 238000005160 1H NMR spectroscopy Methods 0.000 description 1
- JAAIPIWKKXCNOC-UHFFFAOYSA-N 1h-tetrazol-1-ium-5-thiolate Chemical compound SC1=NN=NN1 JAAIPIWKKXCNOC-UHFFFAOYSA-N 0.000 description 1
- HAZJTCQWIDBCCE-UHFFFAOYSA-N 1h-triazine-6-thione Chemical class SC1=CC=NN=N1 HAZJTCQWIDBCCE-UHFFFAOYSA-N 0.000 description 1
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 1
- OEPOKWHJYJXUGD-UHFFFAOYSA-N 2-(3-phenylmethoxyphenyl)-1,3-thiazole-4-carbaldehyde Chemical compound O=CC1=CSC(C=2C=C(OCC=3C=CC=CC=3)C=CC=2)=N1 OEPOKWHJYJXUGD-UHFFFAOYSA-N 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- FXKZPKBFTQUJBA-UHFFFAOYSA-N 2-[2-[bis(carboxymethyl)amino]ethyl-(carboxymethyl)amino]acetic acid;sodium;dihydrate Chemical compound O.O.[Na].[Na].OC(=O)CN(CC(O)=O)CCN(CC(O)=O)CC(O)=O FXKZPKBFTQUJBA-UHFFFAOYSA-N 0.000 description 1
- JKFYKCYQEWQPTM-UHFFFAOYSA-N 2-azaniumyl-2-(4-fluorophenyl)acetate Chemical compound OC(=O)C(N)C1=CC=C(F)C=C1 JKFYKCYQEWQPTM-UHFFFAOYSA-N 0.000 description 1
- PHPYXVIHDRDPDI-UHFFFAOYSA-N 2-bromo-1h-benzimidazole Chemical class C1=CC=C2NC(Br)=NC2=C1 PHPYXVIHDRDPDI-UHFFFAOYSA-N 0.000 description 1
- AYPSHJCKSDNETA-UHFFFAOYSA-N 2-chloro-1h-benzimidazole Chemical class C1=CC=C2NC(Cl)=NC2=C1 AYPSHJCKSDNETA-UHFFFAOYSA-N 0.000 description 1
- LDZYRENCLPUXAX-UHFFFAOYSA-N 2-methyl-1h-benzimidazole Chemical compound C1=CC=C2NC(C)=NC2=C1 LDZYRENCLPUXAX-UHFFFAOYSA-N 0.000 description 1
- DXYYSGDWQCSKKO-UHFFFAOYSA-N 2-methylbenzothiazole Chemical compound C1=CC=C2SC(C)=NC2=C1 DXYYSGDWQCSKKO-UHFFFAOYSA-N 0.000 description 1
- KRTDQDCPEZRVGC-UHFFFAOYSA-N 2-nitro-1h-benzimidazole Chemical class C1=CC=C2NC([N+](=O)[O-])=NC2=C1 KRTDQDCPEZRVGC-UHFFFAOYSA-N 0.000 description 1
- JSIAIROWMJGMQZ-UHFFFAOYSA-N 2h-triazol-4-amine Chemical class NC1=CNN=N1 JSIAIROWMJGMQZ-UHFFFAOYSA-N 0.000 description 1
- CBHTTYDJRXOHHL-UHFFFAOYSA-N 2h-triazolo[4,5-c]pyridazine Chemical compound N1=NC=CC2=C1N=NN2 CBHTTYDJRXOHHL-UHFFFAOYSA-N 0.000 description 1
- OCVLSHAVSIYKLI-UHFFFAOYSA-N 3h-1,3-thiazole-2-thione Chemical class SC1=NC=CS1 OCVLSHAVSIYKLI-UHFFFAOYSA-N 0.000 description 1
- CSDQQAQKBAQLLE-UHFFFAOYSA-N 4-(4-chlorophenyl)-4,5,6,7-tetrahydrothieno[3,2-c]pyridine Chemical compound C1=CC(Cl)=CC=C1C1C(C=CS2)=C2CCN1 CSDQQAQKBAQLLE-UHFFFAOYSA-N 0.000 description 1
- ZVNPWFOVUDMGRP-UHFFFAOYSA-N 4-methylaminophenol sulfate Chemical compound OS(O)(=O)=O.CNC1=CC=C(O)C=C1.CNC1=CC=C(O)C=C1 ZVNPWFOVUDMGRP-UHFFFAOYSA-N 0.000 description 1
- UTMDJGPRCLQPBT-UHFFFAOYSA-N 4-nitro-1h-1,2,3-benzotriazole Chemical class [O-][N+](=O)C1=CC=CC2=NNN=C12 UTMDJGPRCLQPBT-UHFFFAOYSA-N 0.000 description 1
- 102000009027 Albumins Human genes 0.000 description 1
- 108010088751 Albumins Proteins 0.000 description 1
- QGZKDVFQNNGYKY-UHFFFAOYSA-O Ammonium Chemical compound [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 description 1
- KHBQMWCZKVMBLN-UHFFFAOYSA-N Benzenesulfonamide Chemical compound NS(=O)(=O)C1=CC=CC=C1 KHBQMWCZKVMBLN-UHFFFAOYSA-N 0.000 description 1
- NLZUEZXRPGMBCV-UHFFFAOYSA-N Butylhydroxytoluene Chemical compound CC1=CC(C(C)(C)C)=C(O)C(C(C)(C)C)=C1 NLZUEZXRPGMBCV-UHFFFAOYSA-N 0.000 description 1
- 229920002134 Carboxymethyl cellulose Polymers 0.000 description 1
- 235000008733 Citrus aurantifolia Nutrition 0.000 description 1
- FBPFZTCFMRRESA-FSIIMWSLSA-N D-Glucitol Natural products OC[C@H](O)[C@H](O)[C@@H](O)[C@H](O)CO FBPFZTCFMRRESA-FSIIMWSLSA-N 0.000 description 1
- FBPFZTCFMRRESA-JGWLITMVSA-N D-glucitol Chemical compound OC[C@H](O)[C@@H](O)[C@H](O)[C@H](O)CO FBPFZTCFMRRESA-JGWLITMVSA-N 0.000 description 1
- RWSOTUBLDIXVET-UHFFFAOYSA-N Dihydrogen sulfide Chemical class S RWSOTUBLDIXVET-UHFFFAOYSA-N 0.000 description 1
- QXNVGIXVLWOKEQ-UHFFFAOYSA-N Disodium Chemical class [Na][Na] QXNVGIXVLWOKEQ-UHFFFAOYSA-N 0.000 description 1
- 102000004190 Enzymes Human genes 0.000 description 1
- 108090000790 Enzymes Proteins 0.000 description 1
- JIGUQPWFLRLWPJ-UHFFFAOYSA-N Ethyl acrylate Chemical compound CCOC(=O)C=C JIGUQPWFLRLWPJ-UHFFFAOYSA-N 0.000 description 1
- JOYRKODLDBILNP-UHFFFAOYSA-N Ethyl urethane Chemical compound CCOC(N)=O JOYRKODLDBILNP-UHFFFAOYSA-N 0.000 description 1
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 1
- 241000287828 Gallus gallus Species 0.000 description 1
- SXRSQZLOMIGNAQ-UHFFFAOYSA-N Glutaraldehyde Chemical compound O=CCCCC=O SXRSQZLOMIGNAQ-UHFFFAOYSA-N 0.000 description 1
- CTKINSOISVBQLD-UHFFFAOYSA-N Glycidol Chemical class OCC1CO1 CTKINSOISVBQLD-UHFFFAOYSA-N 0.000 description 1
- 235000008612 Gnetum gnemon Nutrition 0.000 description 1
- 240000000018 Gnetum gnemon Species 0.000 description 1
- 239000004354 Hydroxyethyl cellulose Substances 0.000 description 1
- 229920000663 Hydroxyethyl cellulose Polymers 0.000 description 1
- 229910020261 KBF4 Inorganic materials 0.000 description 1
- 229910015044 LiB Inorganic materials 0.000 description 1
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 description 1
- 229920000881 Modified starch Polymers 0.000 description 1
- QPCDCPDFJACHGM-UHFFFAOYSA-N N,N-bis{2-[bis(carboxymethyl)amino]ethyl}glycine Chemical compound OC(=O)CN(CC(O)=O)CCN(CC(=O)O)CCN(CC(O)=O)CC(O)=O QPCDCPDFJACHGM-UHFFFAOYSA-N 0.000 description 1
- 229920002845 Poly(methacrylic acid) Polymers 0.000 description 1
- GOOHAUXETOMSMM-UHFFFAOYSA-N Propylene oxide Chemical compound CC1CO1 GOOHAUXETOMSMM-UHFFFAOYSA-N 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 229910021612 Silver iodide Inorganic materials 0.000 description 1
- PMZURENOXWZQFD-UHFFFAOYSA-L Sodium Sulfate Chemical compound [Na+].[Na+].[O-]S([O-])(=O)=O PMZURENOXWZQFD-UHFFFAOYSA-L 0.000 description 1
- 229920002125 Sokalan® Polymers 0.000 description 1
- ULUAUXLGCMPNKK-UHFFFAOYSA-N Sulfobutanedioic acid Chemical class OC(=O)CC(C(O)=O)S(O)(=O)=O ULUAUXLGCMPNKK-UHFFFAOYSA-N 0.000 description 1
- 235000011941 Tilia x europaea Nutrition 0.000 description 1
- ZJCCRDAZUWHFQH-UHFFFAOYSA-N Trimethylolpropane Chemical compound CCC(CO)(CO)CO ZJCCRDAZUWHFQH-UHFFFAOYSA-N 0.000 description 1
- 229920006311 Urethane elastomer Polymers 0.000 description 1
- 239000006096 absorbing agent Substances 0.000 description 1
- 230000001133 acceleration Effects 0.000 description 1
- 238000009825 accumulation Methods 0.000 description 1
- DHKHKXVYLBGOIT-UHFFFAOYSA-N acetaldehyde Diethyl Acetal Natural products CCOC(C)OCC DHKHKXVYLBGOIT-UHFFFAOYSA-N 0.000 description 1
- 150000001241 acetals Chemical class 0.000 description 1
- 150000001242 acetic acid derivatives Chemical class 0.000 description 1
- 230000002378 acidificating effect Effects 0.000 description 1
- 125000004442 acylamino group Chemical group 0.000 description 1
- 125000004423 acyloxy group Chemical group 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 238000004378 air conditioning Methods 0.000 description 1
- 238000007754 air knife coating Methods 0.000 description 1
- 150000001299 aldehydes Chemical class 0.000 description 1
- 229910052784 alkaline earth metal Inorganic materials 0.000 description 1
- 239000012670 alkaline solution Substances 0.000 description 1
- 125000003545 alkoxy group Chemical group 0.000 description 1
- 125000004453 alkoxycarbonyl group Chemical group 0.000 description 1
- 125000004466 alkoxycarbonylamino group Chemical group 0.000 description 1
- 125000005138 alkoxysulfonyl group Chemical group 0.000 description 1
- 150000003973 alkyl amines Chemical class 0.000 description 1
- 150000001346 alkyl aryl ethers Chemical class 0.000 description 1
- 125000005599 alkyl carboxylate group Chemical group 0.000 description 1
- 125000005907 alkyl ester group Chemical group 0.000 description 1
- 150000005215 alkyl ethers Chemical class 0.000 description 1
- 150000008051 alkyl sulfates Chemical class 0.000 description 1
- 229940045714 alkyl sulfonate alkylating agent Drugs 0.000 description 1
- 150000008052 alkyl sulfonates Chemical class 0.000 description 1
- 125000004390 alkyl sulfonyl group Chemical group 0.000 description 1
- 125000004414 alkyl thio group Chemical group 0.000 description 1
- HSFWRNGVRCDJHI-UHFFFAOYSA-N alpha-acetylene Natural products C#C HSFWRNGVRCDJHI-UHFFFAOYSA-N 0.000 description 1
- 229940103272 aluminum potassium sulfate Drugs 0.000 description 1
- 150000001408 amides Chemical class 0.000 description 1
- 125000003277 amino group Chemical group 0.000 description 1
- 125000004397 aminosulfonyl group Chemical group NS(=O)(=O)* 0.000 description 1
- XYXNTHIYBIDHGM-UHFFFAOYSA-N ammonium thiosulfate Chemical compound [NH4+].[NH4+].[O-]S([O-])(=O)=S XYXNTHIYBIDHGM-UHFFFAOYSA-N 0.000 description 1
- 239000001000 anthraquinone dye Substances 0.000 description 1
- 229910052787 antimony Inorganic materials 0.000 description 1
- WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical compound [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 description 1
- 125000003710 aryl alkyl group Chemical group 0.000 description 1
- 125000005162 aryl oxy carbonyl amino group Chemical group 0.000 description 1
- 125000005161 aryl oxy carbonyl group Chemical group 0.000 description 1
- 125000004391 aryl sulfonyl group Chemical group 0.000 description 1
- 125000005110 aryl thio group Chemical group 0.000 description 1
- 239000012298 atmosphere Substances 0.000 description 1
- 239000000987 azo dye Substances 0.000 description 1
- 150000003851 azoles Chemical class 0.000 description 1
- CJPQIRJHIZUAQP-MRXNPFEDSA-N benalaxyl-M Chemical compound CC=1C=CC=C(C)C=1N([C@H](C)C(=O)OC)C(=O)CC1=CC=CC=C1 CJPQIRJHIZUAQP-MRXNPFEDSA-N 0.000 description 1
- IOJUPLGTWVMSFF-UHFFFAOYSA-N benzothiazole Chemical class C1=CC=C2SC=NC2=C1 IOJUPLGTWVMSFF-UHFFFAOYSA-N 0.000 description 1
- 150000001565 benzotriazoles Chemical class 0.000 description 1
- 229960003237 betaine Drugs 0.000 description 1
- KGBXLFKZBHKPEV-UHFFFAOYSA-N boric acid Chemical compound OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 description 1
- 239000004327 boric acid Substances 0.000 description 1
- CDQSJQSWAWPGKG-UHFFFAOYSA-N butane-1,1-diol Chemical compound CCCC(O)O CDQSJQSWAWPGKG-UHFFFAOYSA-N 0.000 description 1
- 150000001661 cadmium Chemical class 0.000 description 1
- 239000011575 calcium Substances 0.000 description 1
- 229910001640 calcium iodide Inorganic materials 0.000 description 1
- 125000003917 carbamoyl group Chemical group [H]N([H])C(*)=O 0.000 description 1
- 125000001951 carbamoylamino group Chemical group C(N)(=O)N* 0.000 description 1
- 239000006229 carbon black Substances 0.000 description 1
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 1
- 239000001768 carboxy methyl cellulose Substances 0.000 description 1
- 235000010948 carboxy methyl cellulose Nutrition 0.000 description 1
- 239000008112 carboxymethyl-cellulose Substances 0.000 description 1
- 239000005018 casein Substances 0.000 description 1
- BECPQYXYKAMYBN-UHFFFAOYSA-N casein, tech. Chemical compound NCCCCC(C(O)=O)N=C(O)C(CC(O)=O)N=C(O)C(CCC(O)=N)N=C(O)C(CC(C)C)N=C(O)C(CCC(O)=O)N=C(O)C(CC(O)=O)N=C(O)C(CCC(O)=O)N=C(O)C(C(C)O)N=C(O)C(CCC(O)=N)N=C(O)C(CCC(O)=N)N=C(O)C(CCC(O)=N)N=C(O)C(CCC(O)=O)N=C(O)C(CCC(O)=O)N=C(O)C(COP(O)(O)=O)N=C(O)C(CCC(O)=N)N=C(O)C(N)CC1=CC=CC=C1 BECPQYXYKAMYBN-UHFFFAOYSA-N 0.000 description 1
- 235000021240 caseins Nutrition 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 125000002091 cationic group Chemical group 0.000 description 1
- 229920006317 cationic polymer Polymers 0.000 description 1
- 239000008119 colloidal silica Substances 0.000 description 1
- 230000003750 conditioning effect Effects 0.000 description 1
- 229920001940 conductive polymer Polymers 0.000 description 1
- 229920000547 conjugated polymer Polymers 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 238000007766 curtain coating Methods 0.000 description 1
- 125000004093 cyano group Chemical group *C#N 0.000 description 1
- 125000004122 cyclic group Chemical group 0.000 description 1
- 238000011033 desalting Methods 0.000 description 1
- 235000014113 dietary fatty acids Nutrition 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- YRIUSKIDOIARQF-UHFFFAOYSA-N dodecyl benzenesulfonate Chemical compound CCCCCCCCCCCCOS(=O)(=O)C1=CC=CC=C1 YRIUSKIDOIARQF-UHFFFAOYSA-N 0.000 description 1
- 229940071161 dodecylbenzenesulfonate Drugs 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 229920001971 elastomer Polymers 0.000 description 1
- 238000000921 elemental analysis Methods 0.000 description 1
- 238000004945 emulsification Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- 150000002170 ethers Chemical class 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 238000001125 extrusion Methods 0.000 description 1
- 239000000194 fatty acid Substances 0.000 description 1
- 229930195729 fatty acid Natural products 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 235000011187 glycerol Nutrition 0.000 description 1
- 150000002334 glycols Chemical class 0.000 description 1
- 229940015043 glyoxal Drugs 0.000 description 1
- 229920000578 graft copolymer Polymers 0.000 description 1
- 230000005484 gravity Effects 0.000 description 1
- 238000007756 gravure coating Methods 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 150000002366 halogen compounds Chemical class 0.000 description 1
- 125000005843 halogen group Chemical group 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- UBIJTWDKTYCPMQ-UHFFFAOYSA-N hexachlorophosphazene Chemical compound ClP1(Cl)=NP(Cl)(Cl)=NP(Cl)(Cl)=N1 UBIJTWDKTYCPMQ-UHFFFAOYSA-N 0.000 description 1
- 229920001519 homopolymer Polymers 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- XMBWDFGMSWQBCA-UHFFFAOYSA-N hydrogen iodide Chemical compound I XMBWDFGMSWQBCA-UHFFFAOYSA-N 0.000 description 1
- 150000002433 hydrophilic molecules Chemical class 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- AKCUHGBLDXXTOM-UHFFFAOYSA-N hydroxy-oxo-phenyl-sulfanylidene-$l^{6}-sulfane Chemical compound SS(=O)(=O)C1=CC=CC=C1 AKCUHGBLDXXTOM-UHFFFAOYSA-N 0.000 description 1
- 235000019447 hydroxyethyl cellulose Nutrition 0.000 description 1
- 150000002460 imidazoles Chemical class 0.000 description 1
- 229940079865 intestinal antiinfectives imidazole derivative Drugs 0.000 description 1
- 239000002563 ionic surfactant Substances 0.000 description 1
- 150000002503 iridium Chemical class 0.000 description 1
- 229910052741 iridium Inorganic materials 0.000 description 1
- GKOZUEZYRPOHIO-UHFFFAOYSA-N iridium atom Chemical compound [Ir] GKOZUEZYRPOHIO-UHFFFAOYSA-N 0.000 description 1
- 159000000014 iron salts Chemical class 0.000 description 1
- 210000003127 knee Anatomy 0.000 description 1
- 239000004571 lime Substances 0.000 description 1
- 229910052744 lithium Inorganic materials 0.000 description 1
- 239000000314 lubricant Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 229940117841 methacrylic acid copolymer Drugs 0.000 description 1
- 229920003145 methacrylic acid copolymer Polymers 0.000 description 1
- WSFSSNUMVMOOMR-NJFSPNSNSA-N methanone Chemical compound O=[14CH2] WSFSSNUMVMOOMR-NJFSPNSNSA-N 0.000 description 1
- 125000001434 methanylylidene group Chemical group [H]C#[*] 0.000 description 1
- IWVKTOUOPHGZRX-UHFFFAOYSA-N methyl 2-methylprop-2-enoate;2-methylprop-2-enoic acid Chemical compound CC(=C)C(O)=O.COC(=O)C(C)=C IWVKTOUOPHGZRX-UHFFFAOYSA-N 0.000 description 1
- 235000013336 milk Nutrition 0.000 description 1
- 239000008267 milk Substances 0.000 description 1
- 210000004080 milk Anatomy 0.000 description 1
- 235000019426 modified starch Nutrition 0.000 description 1
- 239000002808 molecular sieve Substances 0.000 description 1
- ZAKLKBFCSHJIRI-UHFFFAOYSA-N mucochloric acid Natural products OC1OC(=O)C(Cl)=C1Cl ZAKLKBFCSHJIRI-UHFFFAOYSA-N 0.000 description 1
- 238000006386 neutralization reaction Methods 0.000 description 1
- 230000003472 neutralizing effect Effects 0.000 description 1
- 150000002823 nitrates Chemical class 0.000 description 1
- 150000004957 nitroimidazoles Chemical class 0.000 description 1
- 238000010534 nucleophilic substitution reaction Methods 0.000 description 1
- 230000036961 partial effect Effects 0.000 description 1
- 229960003330 pentetic acid Drugs 0.000 description 1
- PNJWIWWMYCMZRO-UHFFFAOYSA-N pent‐4‐en‐2‐one Natural products CC(=O)CC=C PNJWIWWMYCMZRO-UHFFFAOYSA-N 0.000 description 1
- VLTRZXGMWDSKGL-UHFFFAOYSA-N perchloric acid Chemical class OCl(=O)(=O)=O VLTRZXGMWDSKGL-UHFFFAOYSA-N 0.000 description 1
- 239000010452 phosphate Substances 0.000 description 1
- XYFCBTPGUUZFHI-UHFFFAOYSA-O phosphonium Chemical compound [PH4+] XYFCBTPGUUZFHI-UHFFFAOYSA-O 0.000 description 1
- 229920000191 poly(N-vinyl pyrrolidone) Polymers 0.000 description 1
- 229920002006 poly(N-vinylimidazole) polymer Polymers 0.000 description 1
- 229920000233 poly(alkylene oxides) Polymers 0.000 description 1
- 229920002627 poly(phosphazenes) Polymers 0.000 description 1
- 229920001197 polyacetylene Polymers 0.000 description 1
- 239000004584 polyacrylic acid Substances 0.000 description 1
- 229920001515 polyalkylene glycol Polymers 0.000 description 1
- 229920005862 polyol Polymers 0.000 description 1
- 150000003077 polyols Chemical class 0.000 description 1
- 229920000137 polyphosphoric acid Polymers 0.000 description 1
- 229920001451 polypropylene glycol Polymers 0.000 description 1
- 229920000128 polypyrrole Polymers 0.000 description 1
- 229920001296 polysiloxane Polymers 0.000 description 1
- GRLPQNLYRHEGIJ-UHFFFAOYSA-J potassium aluminium sulfate Chemical compound [Al+3].[K+].[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O GRLPQNLYRHEGIJ-UHFFFAOYSA-J 0.000 description 1
- 239000003755 preservative agent Substances 0.000 description 1
- 238000007639 printing Methods 0.000 description 1
- 238000003672 processing method Methods 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- 230000001737 promoting effect Effects 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 235000018102 proteins Nutrition 0.000 description 1
- 108090000623 proteins and genes Proteins 0.000 description 1
- 102000004169 proteins and genes Human genes 0.000 description 1
- JUJWROOIHBZHMG-UHFFFAOYSA-O pyridinium Chemical compound C1=CC=[NH+]C=C1 JUJWROOIHBZHMG-UHFFFAOYSA-O 0.000 description 1
- HBCQSNAFLVXVAY-UHFFFAOYSA-N pyrimidine-2-thiol Chemical class SC1=NC=CC=N1 HBCQSNAFLVXVAY-UHFFFAOYSA-N 0.000 description 1
- 125000001453 quaternary ammonium group Chemical group 0.000 description 1
- 150000003242 quaternary ammonium salts Chemical class 0.000 description 1
- 150000003283 rhodium Chemical class 0.000 description 1
- 229930182490 saponin Natural products 0.000 description 1
- 150000007949 saponins Chemical class 0.000 description 1
- 235000017709 saponins Nutrition 0.000 description 1
- 238000004062 sedimentation Methods 0.000 description 1
- ADZWSOLPGZMUMY-UHFFFAOYSA-M silver bromide Chemical compound [Ag]Br ADZWSOLPGZMUMY-UHFFFAOYSA-M 0.000 description 1
- 229940045105 silver iodide Drugs 0.000 description 1
- 239000000661 sodium alginate Substances 0.000 description 1
- 235000010413 sodium alginate Nutrition 0.000 description 1
- 229940005550 sodium alginate Drugs 0.000 description 1
- URGAHOPLAPQHLN-UHFFFAOYSA-N sodium aluminosilicate Chemical compound [Na+].[Al+3].[O-][Si]([O-])=O.[O-][Si]([O-])=O URGAHOPLAPQHLN-UHFFFAOYSA-N 0.000 description 1
- 229910000029 sodium carbonate Inorganic materials 0.000 description 1
- 229940006186 sodium polystyrene sulfonate Drugs 0.000 description 1
- 229910001495 sodium tetrafluoroborate Inorganic materials 0.000 description 1
- AKHNMLFCWUSKQB-UHFFFAOYSA-L sodium thiosulfate Chemical compound [Na+].[Na+].[O-]S([O-])(=O)=S AKHNMLFCWUSKQB-UHFFFAOYSA-L 0.000 description 1
- 235000019345 sodium thiosulphate Nutrition 0.000 description 1
- VKHAIOGHRKEQPO-UHFFFAOYSA-M sodium;4-(4-nonylphenoxy)butane-1-sulfonate Chemical compound [Na+].CCCCCCCCCC1=CC=C(OCCCCS([O-])(=O)=O)C=C1 VKHAIOGHRKEQPO-UHFFFAOYSA-M 0.000 description 1
- OQPCBDNVGMUUJL-UHFFFAOYSA-M sodium;methyl 2-methylprop-2-enoate;2-phenylethenesulfonate Chemical compound [Na+].COC(=O)C(C)=C.[O-]S(=O)(=O)C=CC1=CC=CC=C1 OQPCBDNVGMUUJL-UHFFFAOYSA-M 0.000 description 1
- 239000000600 sorbitol Substances 0.000 description 1
- 230000003595 spectral effect Effects 0.000 description 1
- 150000003431 steroids Chemical class 0.000 description 1
- HMNUYYJYMOXWTN-UHFFFAOYSA-J strontium;barium(2+);disulfate Chemical compound [Sr+2].[Ba+2].[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O HMNUYYJYMOXWTN-UHFFFAOYSA-J 0.000 description 1
- 150000005846 sugar alcohols Polymers 0.000 description 1
- 150000008163 sugars Chemical class 0.000 description 1
- LSNNMFCWUKXFEE-UHFFFAOYSA-L sulfite Chemical class [O-]S([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-L 0.000 description 1
- 125000000565 sulfonamide group Chemical group 0.000 description 1
- 150000003871 sulfonates Chemical class 0.000 description 1
- 125000000472 sulfonyl group Chemical group *S(*)(=O)=O 0.000 description 1
- 238000010345 tape casting Methods 0.000 description 1
- 150000003475 thallium Chemical class 0.000 description 1
- JJJPTTANZGDADF-UHFFFAOYSA-N thiadiazole-4-thiol Chemical class SC1=CSN=N1 JJJPTTANZGDADF-UHFFFAOYSA-N 0.000 description 1
- 150000003567 thiocyanates Chemical class 0.000 description 1
- 125000005323 thioketone group Chemical group 0.000 description 1
- 150000004886 thiomorpholines Chemical class 0.000 description 1
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 1
- 229910001887 tin oxide Inorganic materials 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- 150000003672 ureas Chemical class 0.000 description 1
- 150000003673 urethanes Chemical class 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 150000003751 zinc Chemical class 0.000 description 1
- 239000011787 zinc oxide Substances 0.000 description 1
Abstract
Description
【発明の詳細な説明】
(産業上の利用分野)
本発明は良好な帯電防止性を有するハロゲン化銀写真感
光材料に関し、特に塗布性に悪影響を与えることなく、
しかも自動現像機で、処理した際現像処理液を汚染する
ことなくまた画像ムラを生ずることのないハロゲン化銀
写真感光材料[以下写真感光材料と記す」に関するもの
である。Detailed Description of the Invention (Field of Industrial Application) The present invention relates to a silver halide photographic light-sensitive material having good antistatic properties, and particularly to a silver halide photographic material having good antistatic properties.
Moreover, the present invention relates to a silver halide photographic material (hereinafter referred to as photographic material) which does not contaminate a developing solution and does not cause image unevenness when processed in an automatic processor.
(従来の技術)
写真感光材料は一般に電気絶縁性を有する支持体および
写真層から成っているので写真感光材料の製造工程中な
らびに使用時に同種または異種物質の表面との間の接触
摩擦または剥離をうけることによって静電電荷が蓄積さ
れることが多い。この蓄積された静電電荷は多くの障害
を引起すが、最も重大な障害は現像処理前に蓄積された
静電電荷が放電することによって感光性乳剤層が感光し
写真フィルムを現像処理した際に点状スポット又は樹枝
状な羽毛状の線速を生ずることである。これがいわゆる
スタチックマークと呼ばれているもので写真フィルムの
商品価値を著しく損ね、場合によっては全く商品価値を
失なわせしめる。この減少は現像してみて初めて明らか
になるもので非常に厄介な問題の一つである。またこれ
らの蓄積された静電電荷は処理前や処理後のフィルム表
面へ塵埃が付着したり、塗布が均一に行なえないなどの
第2次的な故障を誘起せしめる原因にもなる。(Prior Art) Photographic materials generally consist of an electrically insulating support and a photographic layer, so contact friction or peeling between surfaces of the same or different materials is avoided during the manufacturing process and during use of the photographic materials. Electrostatic charges often accumulate due to exposure to This accumulated electrostatic charge causes many problems, but the most serious one is that the photosensitive emulsion layer is exposed to light due to the discharge of the accumulated electrostatic charge before processing, and when the photographic film is processed. This is to produce point-like spots or dendritic feather-like line speeds. This is what is called a static mark, and it significantly reduces the commercial value of photographic film, and in some cases causes the film to lose its commercial value altogether. This reduction becomes apparent only after development, and is one of the most troublesome problems. Furthermore, these accumulated electrostatic charges may cause secondary failures such as dust adhering to the surface of the film before or after processing or the inability to apply uniformly.
かかる静電電荷の蓄積によって誘起される写真感光材料
のスタチックマークは写真感光材料の感度の上昇および
処理速度の増加によってU著となる。特に最近において
は、写真感光材料の高感度化および高速塗布、高速撮影
、高速自動現像処理化等の苛酷な取り扱いを受ける機会
が多くなったことによって一層スタツックマークの発生
が出易くなっている。更に又、処理済み写真感光材料を
取り扱う機会が近年多くなりその際のゴミ付きは重大な
問題となっている。Static marks on photographic materials induced by such accumulation of electrostatic charges become more serious as the sensitivity of photographic materials increases and the processing speed increases. Particularly in recent years, the occurrence of stack marks has become even more likely due to the increased sensitivity of photographic materials and the increased exposure to harsh handling such as high-speed coating, high-speed photography, and high-speed automatic processing. . Furthermore, opportunities to handle processed photographic materials have increased in recent years, and dust has become a serious problem.
これらの静電気による障害をなくすためには写真感光材
料に帯電防止剤を添加することが好ましい。しかしなが
ら、写真感光材料に利用できる帯電防止剤は、他の分野
で一般に用いられている帯電防止剤がそのまま使用でき
る訳ではなく、写真感光材料に特有の種々の制約を受け
る。即ち写真感光材料に利用し得る帯電防止剤には帯電
防止性能が優れていることの他に、例えば写真感光材料
の感度、カプリ、粒状性、シャープネス等の写真特性に
悪影響を及ぼさないこと、写真感光材料の膜強度に悪影
響を与えないこと、耐接着性に悪影響を及ぼさないこと
、写真感光材料の処理液の疲労を早めないこと、搬送ロ
ーラーを汚染しないこと、写真感光材料の各構成層間の
接着強度を低下させないこと等々の性能が要求され、写
真感光材料へ帯電防止剤を適用することは非常に多くの
制約を受ける。In order to eliminate these problems caused by static electricity, it is preferable to add an antistatic agent to the photographic material. However, the antistatic agents that can be used in photographic light-sensitive materials cannot be the same as those commonly used in other fields, and are subject to various restrictions specific to photographic light-sensitive materials. That is, in addition to having excellent antistatic properties, antistatic agents that can be used in photographic light-sensitive materials must not have any adverse effect on the photographic properties of the photographic light-sensitive materials, such as sensitivity, capri, graininess, sharpness, etc. Does not adversely affect the film strength of the photosensitive material, does not adversely affect the adhesion resistance, does not accelerate the fatigue of the processing solution for the photographic material, does not contaminate the conveyance roller, and does not cause any damage between the constituent layers of the photographic material. Application of antistatic agents to photographic materials is subject to numerous restrictions, as performance such as not reducing adhesive strength is required.
これらの静電気による障害をなくすだめの一つの方法は
、写真感光材料表面の電気伝導性を上げて、蓄積電荷が
放電する前に静電電荷を短時間に散逸せしめるようにす
ることである。One way to eliminate these problems caused by static electricity is to increase the electrical conductivity of the surface of the photographic material so that the static charges can be dissipated in a short period of time before the accumulated charges are discharged.
したがって、従来から写真感光材料の支持体や各種塗布
表面層の導電性を向上させる方法が考えられ種々の吸湿
性物質や水溶性無機塩、ある種の界面活性剤、ポリマー
等の利用が試みられてきた。Therefore, methods have been considered to improve the conductivity of supports and various coated surface layers of photographic materials, and attempts have been made to use various hygroscopic substances, water-soluble inorganic salts, certain surfactants, polymers, etc. It's here.
この中で帯電防止能の上で界面活性剤は重要であり例エ
バ、米国特許’83.0B2.123号、同3,201
,251号、同3,519,561号、同3,625,
895号、酉ドイツ特許第1゜552.408号、同1
,597,472号、特開昭49−85826号、同5
3−129823号、同54−1592234、同4B
−19213号、特公昭46−39312号、同49−
11567号、同51−46755号、同55−144
17号等に記載されているアニオン、ベタイン及びカチ
オン界面活性剤、あるいは、特公昭4817882号、
特開昭52−80023−1+、西ドイツ特許第1.4
22.809号、同1,422.818号、オーストラ
リア特許第54.44】号/1959等に記載のノニオ
ン界面活性剤が知られている。Among these, surfactants are important in terms of antistatic ability.
, No. 251, No. 3,519,561, No. 3,625,
No. 895, Rooster German Patent No. 1゜552.408, No. 1
, No. 597,472, JP-A-49-85826, No. 5
No. 3-129823, No. 54-1592234, No. 4B
-19213, Special Publication No. 46-39312, 49-
No. 11567, No. 51-46755, No. 55-144
Anionic, betaine and cationic surfactants described in No. 17, etc., or Japanese Patent Publication No. 4817882,
JP-A-52-80023-1+, West German Patent No. 1.4
Nonionic surfactants are known, such as those described in Australian Patent No. 22.809, Australian Patent No. 1,422.818, and Australian Patent No. 54.44/1959.
しかしながらこれらの物質は、フィルム支持体の種類や
写真組成物の違いによって特異性を示し、前記性能を十
分満足するものではなく、写真感光材料に適用すること
は極めて困難であった。However, these substances exhibit specificity depending on the type of film support and the photographic composition, and do not fully satisfy the above-mentioned performance, making it extremely difficult to apply them to photographic light-sensitive materials.
また、特公昭51−96104に示されているフェノー
ル−ホルマリン縮合物の酸化エチレン付加重合体は種々
の塗布剤と併用してもその帯電防止性能に優れている事
が記載されている。しかしながらこの方法では、現像処
理過程での汚染によるトラブルは解決されなかった。Further, it is described in Japanese Patent Publication No. 51-96104 that the ethylene oxide addition polymer of phenol-formalin condensate has excellent antistatic properties even when used in combination with various coating agents. However, this method did not solve problems caused by contamination during the development process.
又、特開昭5:3−29715号には、特定のアニオン
界面活性剤とポリオキシエチレン系ノニオン界面活性剤
を含有する写真感光材料が記載されているが、現像処理
液汚染や搬送ローラー汚染によるフィルム故障の起こる
ことがあった。Furthermore, JP-A No. 5:3-29715 describes a photographic material containing a specific anionic surfactant and a polyoxyethylene nonionic surfactant, but it does not cause contamination of the developing processing solution or contamination of the transport roller. Film failures may occur due to this.
更に、W090108978号において、環状フォスフ
アゼン化合物を帯電防止組成物とする方法が提案されて
いる。この技術は、帯電防止性能には優れているが、一
方で現像処理過程での汚染発生や画像ムラの発生が著し
く、写真感光材料として満足できるものではなかった。Furthermore, W090108978 proposes a method of using a cyclic phosphazene compound as an antistatic composition. Although this technology has excellent antistatic properties, it also causes significant staining and unevenness of images during the development process, making it unsatisfactory as a photographic light-sensitive material.
返本、環境保全上又は水資源上、コスト上又は処理機器
の簡易コンパクト化の点から処理時の水洗水量を低減す
る方法、またコストの点から補充処理液量を減らす方法
、更には、処理時間の短縮化のために、処理液の濃厚化
が試みられているが、このような処理方法の発展に伴な
い、ますます上記の処理液汚染、搬送ローラーへの水不
溶物の付着が多くなり深刻な問題となってきている。Methods for reducing the amount of washing water during processing from the viewpoint of environmental conservation, water resources, cost, and simplifying and compacting the processing equipment; methods for reducing the amount of replenishing processing liquid from the viewpoint of cost; and furthermore, processing time. Attempts have been made to thicken the processing solution in order to shorten the processing time, but with the development of such processing methods, the above-mentioned processing solution contamination and adhesion of water-insoluble matter to the conveyor rollers are becoming more common. This is becoming a serious problem.
(発明が解決しようとする課題)
本発明の目的の第1は、現像処理液の汚染を起さない帯
電防止された写真感光材料を提供することにある。(Problems to be Solved by the Invention) A first object of the present invention is to provide a photographic material which is prevented from being charged and which does not cause contamination of a processing solution.
第2に現像処理時に画像ムラを起さないような帯電防止
された写真感光材料を提供することにある。The second object is to provide a photosensitive material which is prevented from being charged and which does not cause image unevenness during development processing.
第3に、塗布性に悪影響を与えることなく帯電防止され
た写真感光材料を提供することにある。The third object is to provide a photographic material that is antistatic without adversely affecting coating properties.
(課題を解決するための手段)
本発明のこれらの目的は、支持体上に、少なくとも一層
の感光性ハロゲン化銀乳剤層を有する写真感光材料に於
いて、該感光材料の構成層の少なくとも一層に上記一般
式(1)で表される環状フォスフアゼン化合物を含有す
ることにより達成される。(Means for Solving the Problems) These objects of the present invention are to provide a photographic light-sensitive material having at least one light-sensitive silver halide emulsion layer on a support. This is achieved by containing a cyclic phosphazene compound represented by the above general formula (1).
本発明の化合物は少なくとも1本の側鎖に分岐のアルキ
レンオキシドからなる繰り返し単位、及びエチレンオキ
シドからなる繰り返し単位をこの1頓に有する環状フォ
スフアゼン化合物であり、驚くべきことにこの化合物構
造において、現像処理液の汚染防止、画像ムラ防止、塗
布性すへてか同時に満足されることが判明した。The compound of the present invention is a cyclic phosphazene compound having a repeating unit consisting of a branched alkylene oxide and a repeating unit consisting of ethylene oxide in at least one side chain. It has been found that prevention of liquid contamination, prevention of image unevenness, and excellent coating properties are all satisfied at the same time.
本発明の一般式CI)で表される環状フォスフアゼン化
合物について詳細に説明する。The cyclic phosphazene compound represented by the general formula CI) of the present invention will be explained in detail.
一般式CI)
ゝ−−−−−−−′
式中R1およびR4は同じであっても異なっていてもよ
く炭素数2〜20の置換もしくは無置換のアルキル基、
アルケニル基、アルキニル基、アリール基を表わす。置
換基の例としてはハロゲン原子、シアノ基、スルホ基、
ヒドロキシ基、カルボキシル基、アルキル基、アリール
基、アラルキル基、アシルオキシ基、アシルアミノ基、
アミノ基、スルホンアミド基、アルコキシ基、アリーロ
キシ基、アルキルチオ基、アリールチオ基、カルバモイ
ル基、スルファモイル基、アルコキシカルボニル基、ア
リーロキシカルボニル基、アルキルスルホニル基、アリ
ールスルホニル基、アルコキシスル示ニル基、アリーロ
キシスルホニル基、カルバモイルアミノ基、スルファモ
イルアミノ基、カルバモイルオキシ基、アルコキシカル
ボニルアミノ基、アリーロキシカルボニルアミノ基など
を挙げることができる。General formula CI) ゝ---------' In the formula, R1 and R4 may be the same or different and are substituted or unsubstituted alkyl groups having 2 to 20 carbon atoms,
Represents an alkenyl group, an alkynyl group, or an aryl group. Examples of substituents include halogen atoms, cyano groups, sulfo groups,
Hydroxy group, carboxyl group, alkyl group, aryl group, aralkyl group, acyloxy group, acylamino group,
Amino group, sulfonamide group, alkoxy group, aryloxy group, alkylthio group, arylthio group, carbamoyl group, sulfamoyl group, alkoxycarbonyl group, aryloxycarbonyl group, alkylsulfonyl group, arylsulfonyl group, alkoxysulfonyl group, aryloxy Examples include a sulfonyl group, a carbamoylamino group, a sulfamoylamino group, a carbamoyloxy group, an alkoxycarbonylamino group, and an aryloxycarbonylamino group.
R■およびR4としては、炭素数1ないし14のアルキ
ル基、フッ素原子で1換された炭素数1ないし10のア
ルキル基、炭素数6ないし14の置換または無置換の了
り−ル基が好ましい。R and R4 are preferably an alkyl group having 1 to 14 carbon atoms, an alkyl group having 1 to 10 carbon atoms substituted with a fluorine atom, or a substituted or unsubstituted oryl group having 6 to 14 carbon atoms. .
R2およびR3は同しであっても異なっていてもよい炭
素数1〜4のアルキル基を表わし、好ましくはメチル基
、エチル基であり、特にメチル基が好ましい、pおよび
Sは0ないし50の整数を表わし、互いに同じであって
も異なっていてもよい。但し、pおよびSが同時に0と
なることはない。pおよびSの値は好ましくは1ないし
25であり、特に好ましくは1ないし15である。R2 and R3 represent an alkyl group having 1 to 4 carbon atoms, which may be the same or different, and are preferably a methyl group or an ethyl group, with a methyl group being particularly preferred; p and S are 0 to 50; Represents an integer and may be the same or different. However, p and S do not become 0 at the same time. The values of p and S are preferably from 1 to 25, particularly preferably from 1 to 15.
qおよびrは同時に0となることはない。0〜5の整数
を表し、好ましくは1ないし3であり特に好ましくは2
ないし3である。Xは3もしくは4である。q and r never become 0 at the same time. represents an integer of 0 to 5, preferably 1 to 3, particularly preferably 2
to 3. X is 3 or 4.
以下に本発明の好ましい具体的な化合物を例示するが、
本発明はこれら化合物例に限られるものではない。Preferred specific compounds of the present invention are illustrated below,
The present invention is not limited to these compound examples.
化合物例
(一般式Ex−1)(一般式Ex−2)上記一般弐Ex
−1においてR2
〜R16
上記一般式Ex−1においてR,、−R□CH。Compound Examples (General Formula Ex-1) (General Formula Ex-2) Above General 2 Ex
In -1, R2 to R16 In the above general formula Ex-1, R,, -R□CH.
=0−(−CHCH,OhイCH,CH,0hCH。=0-(-CHCH, OhiCH, CH, 0hCH.
である化合物
上記一般式Ex
1においてR21〜R7゜
上記一般式Ex−1においてR21〜Ros上記一般式
Ex
1においてRx +〜R51
CH。In the above general formula Ex 1, R21 to R7° In the above general formula Ex-1, R21 to Ros In the above general formula Ex 1, Rx + to R51 CH.
ツ
0イCHCHsOMCHaC1(*0hCHsR2g
”
CH。Tsu0i CHCHsOMCHaC1 (*0hCHsR2g
”CH.
0(C)IC)[2針妊CHzCHzOhCsFiであ
る化合物
上記一般式Ex−2においてRs+−Ri+CI(。0(C)IC) [Rs+-Ri+CI( in the above general formula Ex-2).
= O(CHCHhOhKCHaCHzO)rCHsで
ある化合物
上記一般式Ex−2においてR’s l−Rs tであ
る化合物
上記一般式Ex−2においてRx+−RssCH。= O(CHCHhOhKCHaCHzO)rCHs Compound in the above general formula Ex-2, R's l-Rs t In the above general formula Ex-2, Rx+-RssCH.
=0イCHCHIO″h(CH*CHzOhCJ−であ
る化合物
本発明の化合物は環状ホスファゼンハロゲン化物と、ア
ルカリ金属アルコラードとの反応により容易に合成する
ことができる。この求核置換反応は置換ホスファゼンあ
るいは置換環状ホスファゼンの一般的な合成方法として
良く知られた方法であり、例えば、シュライバーらによ
りジャーナル・オブ・アメリカン・ケミカル・ソサエテ
ィ、106巻、6854頁(1984年) (D、F
、5hriveret al、 J、Am、Chem、
Soc、上08.8854 (1984))に開示され
ている。The compound of the present invention can be easily synthesized by the reaction of a cyclic phosphazene halide with an alkali metal alcoholade.This nucleophilic substitution reaction This is a well-known general synthesis method for cyclic phosphazenes, for example, as described by Schreiber et al. in Journal of the American Chemical Society, Vol. 106, p. 6854 (1984) (D, F
,5hriveret al., J.Am.,Chem.
Soc, supra. 08.8854 (1984)).
合成例1 例示化合物P−1の合成
乾燥し、還流管を取り付けた1000−三゛ツロフラス
コに金属ナトリウム18.1g(0,7モル)とテトラ
ヒドロフラン350−を入れ氷冷上で攪拌しながらジエ
チレングリコール千ツメチルエーテル79.3g (0
,66モル)をゆっくりと滴下し、滴下完了後30分間
室温で攪拌し完全に均一な溶液になることを確認した。Synthesis Example 1 Synthesis of Exemplified Compound P-1 18.1 g (0.7 mol) of metallic sodium and 350 g of tetrahydrofuran were placed in a dry 1000-3-meter flask equipped with a reflux tube, and diethylene glycol 1. 79.3g (0
, 66 mol) was slowly added dropwise, and after the addition was completed, the mixture was stirred at room temperature for 30 minutes to confirm that a completely homogeneous solution had been obtained.
再び、氷冷し、プロピレンオキサイド78.4g(1,
32モル)を30分間かけて滴下し、室温に戻して】時
間、85℃で遺留しながら5時間反応させて、透明、均
一な溶液を得た。これにヘキサクロロシクロトリホスフ
ァゼン34.8g (0,1モル)をテトラヒドロフラ
ン350−に溶解した溶液を室温で1時間かけて滴下し
た。白色の沈澱が生成している事を確認して、反応溶液
を4時間加熱還流した後、室温に戻し、10時間攪拌を
続けて、反応を完結させた。反応液を濾過して生成した
白色沈澱(食塩)を除き、濾液を0. 1モル/iの塩
酸で中和して、pH=8.8に調製した後、溶媒を減圧
下で留去、更に高真空、40℃の条件下で乾燥して、油
状化合物を得た。これにあらかじめモレキュラーシーブ
で乾燥しておいた酢酸エチル5001s1を加え、充分
に攪拌し、残留していた若干の塩を濾過して除去した後
、減圧下で溶媒を留去して、赤かっ色の油状化合物とし
て、目的の化合物P−1142,6gを得た。収率92
゜2%
得られた化合物は、元素分析、 ’H−NMR,IRに
より構造を確認した。Cool again on ice and add 78.4 g (1,
32 mol) was added dropwise over 30 minutes, the mixture was returned to room temperature, and reacted for 5 hours while remaining at 85° C. to obtain a transparent, homogeneous solution. A solution of 34.8 g (0.1 mol) of hexachlorocyclotriphosphazene dissolved in 350 g of tetrahydrofuran was added dropwise to the solution over a period of 1 hour at room temperature. After confirming that a white precipitate had formed, the reaction solution was heated under reflux for 4 hours, then returned to room temperature, and stirring was continued for 10 hours to complete the reaction. The reaction solution was filtered to remove the white precipitate (salt), and the filtrate was reduced to 0. After neutralizing with 1 mol/i hydrochloric acid to adjust the pH to 8.8, the solvent was distilled off under reduced pressure and further dried under high vacuum at 40°C to obtain an oily compound. Ethyl acetate 5001s1, which had been previously dried with a molecular sieve, was added to this, stirred thoroughly, and some residual salt was filtered off.The solvent was distilled off under reduced pressure, and a reddish-brown color was obtained. 6 g of the target compound P-1142 was obtained as an oily compound. Yield 92
゜2% The structure of the obtained compound was confirmed by elemental analysis, 'H-NMR, and IR.
合成例2 例示化合物P−7の合成
オクチルフェノキシトリエトキシエタノール(TORI
TON X−35の商品名で、ローム & ハウス社よ
り市販のもの)168.3g (0,44モル)をテト
ラヒドロフラン360WJに溶解させ、水素化カルシウ
ム5.0gを加えて、4日間乾燥させた後、濾過して、
水素化カルシウムを除去、乾燥オクチルフェノキシトリ
エトキシエタノール溶液を得た。一方で、乾燥し、還流
管を取り付けた11三ツロフラスコに金属ナトリウム1
1.5g(0,5モル)、テトラヒドロフラン150y
dを入れ、水冷上で攪拌しながら、上記で得られた乾燥
オクチルフェノキシトリエトキシエタノール溶液を30
分かけてゆっくりと滴下して加え、室温で1時間攪拌し
、完全に透明な溶液になることを確認した。このフラス
コを再び氷冷し、プロピレンオキサイド51.2g (
0,88モル)を30分開かけて滴下して加え、室温に
戻して1時間、80℃で8時間還流させて、透明、均一
な溶液を得た。この溶液に、オクタクロロテトラホスフ
ァゼン17.4g (0,05モル)をテトラヒドロフ
ラン100Idに溶解した溶液を室温で1時間かけて滴
下した。白色の微粒沈澱の生成を確認し、3時間加熱、
還流した後、再び室温に戻し20時間撹拌を続けて反応
を完結させた。反応液を濾過して、生成した白色沈澱を
除去し、濾液を1%塩酸で中和して、p)(=Ei、
5とした後、活性炭2゜Ogを加え、15分間40°
Cで攪拌し、室温まで冷却、更に、濾過により活性炭を
除いて、透明溶液を得た。この溶液から減圧下で溶媒を
留去した後、新たにテトラヒドロフラン50IIII!
を加え、再び溶解し、これにテトラヒドロフラン100
afとヘキサン900111の混合液を加えて分液漏斗
中で洗浄した。下層を取り出し、減圧下で溶媒を除去し
、得られた粘調な液体に酢酸エチル600mを加え、再
び熔解し、無水硫酸ナトリウム20gを加えて乾燥した
後、これを濾過して除き、減圧下で溶媒を除去して、黄
かっ色消状化合物として、目的の化合物P−7を172
.5g得た。収率82.9%。Synthesis Example 2 Synthesis of Exemplified Compound P-7 Octylphenoxytriethoxyethanol (TORI
168.3 g (0.44 mol) of TON , filter,
Calcium hydride was removed to obtain a dry octylphenoxytriethoxyethanol solution. On the other hand, add 1 part of metallic sodium to a 11-three-meter flask that has been dried and equipped with a reflux tube.
1.5g (0.5 mol), 150y of tetrahydrofuran
d, and while stirring on water cooling, 30% of the dried octylphenoxytriethoxyethanol solution obtained above was added.
It was added dropwise slowly over several minutes and stirred at room temperature for 1 hour, and it was confirmed that the solution was completely transparent. This flask was cooled on ice again, and 51.2 g of propylene oxide (
0.88 mol) was added dropwise over 30 minutes, the mixture was returned to room temperature for 1 hour, and then refluxed at 80° C. for 8 hours to obtain a clear, homogeneous solution. A solution of 17.4 g (0.05 mol) of octachlorotetraphosphazene dissolved in 100 Id of tetrahydrofuran was added dropwise to this solution over 1 hour at room temperature. Confirm the formation of white fine precipitate, heat for 3 hours,
After refluxing, the temperature was returned to room temperature and stirring was continued for 20 hours to complete the reaction. The reaction solution was filtered to remove the generated white precipitate, and the filtrate was neutralized with 1% hydrochloric acid to give p)(=Ei,
5, add 2°Og of activated carbon and heat at 40° for 15 minutes.
The mixture was stirred at C, cooled to room temperature, and the activated carbon was removed by filtration to obtain a transparent solution. After distilling off the solvent from this solution under reduced pressure, fresh tetrahydrofuran 50III!
Add and dissolve again, add 100% of tetrahydrofuran to this
A mixture of af and hexane 900111 was added and washed in a separatory funnel. The lower layer was taken out, the solvent was removed under reduced pressure, 600 ml of ethyl acetate was added to the resulting viscous liquid, it was melted again, 20 g of anhydrous sodium sulfate was added and dried, this was filtered off, and the solution was removed under reduced pressure. The solvent was removed to obtain the desired compound P-7 as a yellowish-brown compound at
.. I got 5g. Yield 82.9%.
本発明のその他の好ましい化合物も、上記合成方法ある
いは上記合成方法と同等の方法により、合成することが
できる。Other preferred compounds of the present invention can also be synthesized by the above synthesis method or a method equivalent to the above synthesis method.
一般式CI)又は一般式CI[]で表される環状フォス
フアゼン化合物は、周期律表Ia又はIIa族に属する
金属イオンの塩と併用することが帯電防止性能を向上す
る上で好ましい。以下に金属イオンの塩の好ましい例を
あげるが、もちろんこれらに限定されるものではない。The cyclic phosphazene compound represented by the general formula CI) or the general formula CI[ ] is preferably used in combination with a salt of a metal ion belonging to group Ia or IIa of the periodic table in order to improve antistatic performance. Preferred examples of metal ion salts are listed below, but of course the salts are not limited to these.
KCFaSOs 、 NaCF*SO* 、 LiCF
sSOs 、 Ca(CFtSOs)aMg(CFIS
OI)! 、 KBF4 、 NaBF4 、 LiB
F4 、 KCPICOINaCPsCO* 、 Lt
CPsCO* 、 KC*F7CO* 、 NaC*P
tC0zLjC*F7COi 、 KC*P7SOs
、 NaC5FtSOs 、 KC4FsSOsKPF
、 。また、これらの塩は2種以上混合して用いても
よい。KCFaSOs, NaCF*SO*, LiCF
sSOs, Ca(CFtSOs)aMg(CFIS
OI)! , KBF4, NaBF4, LiB
F4, KCPICOINaCPsCO*, Lt
CPsCO*, KC*F7CO*, NaC*P
tC0zLjC*F7COi, KC*P7SOs
, NaC5FtSOs, KC4FsSOsKPF
, . Furthermore, two or more of these salts may be used in combination.
本発明の環状フォスフアゼン化合物は親水性有機コロイ
ド、又は支持体バック層の有機溶剤系塗布液中に添加し
帯電防止剤として用いることもできる。The cyclic phosphazene compound of the present invention can also be used as an antistatic agent by adding it to a hydrophilic organic colloid or an organic solvent-based coating solution for a support back layer.
本発明の化合物の添加場所は写真感光材料のハロゲン化
銀乳剤層又はその他の構成層の少なくとも1層であり、
下塗り層であってもよい。その他の構成層としては好ま
しくは親水性コロイド層であり、例えば表面保護層、バ
ック層、中間層、下塗層などを挙げることができる。添
加場所として特に好ましいのは表面保護層、バック層又
は下塗層である。The compound of the present invention is added to at least one of the silver halide emulsion layers or other constituent layers of the photographic light-sensitive material,
It may also be an undercoat layer. Other constituent layers are preferably hydrophilic colloid layers, such as a surface protective layer, a back layer, an intermediate layer, and an undercoat layer. Particularly preferred locations for addition are the surface protective layer, back layer or undercoat layer.
表面保護層、バック層又は下塗り層が2層から成る場合
は、そのいずれの層でもよく、又、表面保護層の上に、
さらにオーバーコートして用いることも出来る。When the surface protective layer, back layer or undercoat layer consists of two layers, any of these layers may be used, and on top of the surface protective layer,
Furthermore, it can also be used as an overcoat.
本発明の化合物を写真感光材料に適用するに当っては水
あるいはメタノール、エタノール、イソプロパツール、
メチルエチルケトン、アセトン等の有機溶媒又はそれら
の混合溶液に溶解後、表面保護層又はバック層等の塗布
液に添加しデイツプコート、エアーナイフコート、噴霧
、あるいは米国特許2,681.294号に記載のホッ
パーを使用するエクスルージョンコートの方法により塗
布するが、米国特許3,508,947号、同2941
.898号、同3,526,528号などに記載の方法
により2種又はそれ以上の層を同時に塗布するか、ある
いは帯電防止液中に浸漬してもよい。又、必要に応じて
保護層の上に更に本発明の化合物を含む帯電防止液(溶
液のみ又はバインダーを含む)を塗設してもよい。When applying the compound of the present invention to photographic materials, water, methanol, ethanol, isopropanol,
After dissolving in an organic solvent such as methyl ethyl ketone or acetone, or a mixed solution thereof, it is added to a coating solution for a surface protective layer or back layer, and coated by dip coating, air knife coating, spraying, or using a hopper as described in U.S. Pat. No. 2,681.294. It is coated by an extrusion coating method using U.S. Pat.
.. Two or more layers may be applied simultaneously by methods such as those described in U.S. Pat. No. 898 and U.S. Pat. Further, if necessary, an antistatic liquid (solution alone or containing a binder) containing the compound of the present invention may be further coated on the protective layer.
本発明の化合物の使用量は各々写真感光材料の一平方メ
ートルあたり、0.0001〜2.0g存在せしめるの
がよ(特に0.0005〜0.3gが望ましい。The amount of each of the compounds of the present invention to be used is preferably 0.0001 to 2.0 g (particularly preferably 0.0005 to 0.3 g) per square meter of the photographic light-sensitive material.
本発明の化合物は、各々2種以上混合しても良い。Two or more types of each of the compounds of the present invention may be mixed.
本発明に係る写真感光材料としては、通常の白黒ハロゲ
ン化銀写真感光材料(例えば、撮影用白黒感材、X−r
ay用白黒感材、印刷用白黒感材など)、通常の多層カ
ラー感光材料(例えば、カラーネガティブフィルム、カ
ラーリバーサルフィルム、カラーポジティブフィルム、
映画用カラーネガティブフィルムなど)、レーザースキ
ャナー用赤外光用感材などを挙げることができる。The photographic material according to the present invention may be a conventional black-and-white silver halide photographic material (for example, black-and-white photographic material, X-r
black-and-white photosensitive materials for AY, black-and-white photosensitive materials for printing, etc.), ordinary multilayer color photosensitive materials (e.g., color negative films, color reversal films, color positive films,
(color negative films for movies, etc.), infrared light sensitive materials for laser scanners, etc.
本発明の写真感光材料のハロゲン化銀乳剤層、表面保護
層などに用いられるハロゲン化銀の種類、製法、化学増
感法、カブリ防止剤、安定剤、硬膜剤、帯電防止剤、カ
プラー、可塑剤、潤滑剤、塗布助剤、マット剤、増白剤
、分光増感剤、染料、紫外線吸収剤等については特に制
限はなく、例えばプロダクトライセンシング誌(Pro
ductLicensing) 92巻】07〜110
頁C1971年12月)及びリサーチ・ディスクロージ
ャー誌(Research Djsclosure)
176巻22〜31頁(1978年12月)、同238
巻44〜46頁(1984年)の記載を参考にすること
が出来る。Types of silver halide used in the silver halide emulsion layer, surface protective layer, etc. of the photographic light-sensitive material of the present invention, manufacturing method, chemical sensitization method, antifoggants, stabilizers, hardeners, antistatic agents, couplers, There are no particular restrictions on plasticizers, lubricants, coating aids, matting agents, brighteners, spectral sensitizers, dyes, ultraviolet absorbers, etc.
ductLicensing) Volume 92] 07-110
Page C December 1971) and Research Disclosure magazine.
Volume 176, pages 22-31 (December 1978), 238
The description in Vol. 44-46 (1984) can be referred to.
本発明を用いて作られる写真感光材料の写真乳剤層また
は他の親水性コロイド層には塗布助剤、帯電防止、スベ
リ性改良、乳化分散、接着防止及び写真特性改良(例え
ば、現像促進、硬謂化、増感)等、種々の目的で種々の
界面活性剤を含んでもよい。The photographic emulsion layer or other hydrophilic colloid layer of the photographic light-sensitive material prepared using the present invention may contain coating aids, antistatic properties, smoothness improvement, emulsification dispersion, adhesion prevention, and improvement of photographic properties (e.g., development acceleration, hardening, etc.). Various surfactants may be included for various purposes such as sensitization, sensitization, etc.
例えばサポニン(ステロイド系)、アルキレンオキサイ
ド誘導体(例えばポリエチレングリコール、ポリエチレ
ングリコール/ポリプロピレングリコール縮合物、ポリ
エチレングリコールアルキルエーテル類又はポリエチレ
ングリコールアルキルアリールエーテル類、ポリエチレ
ングリコールエステル類、ポリエチレングリコールソル
ビタンエステル類、ポリアルキレングリコールアルキル
アミン又はアミド類、シリコーンのポリエチレンオキサ
イド付加物類)、グリシドール誘導体(例えばアルケニ
ルコハク酸ポリグリセリド、アルキルフェノールポリグ
リセリド)、多価アルコールの脂肪酸エステル漿、糖の
アルキルエステル類などの非イオン性界面活性剤:アル
キルカルボン酸塩、アルキルスルフォン酸塩、アルキル
ベンゼンスルフォン酸塩、アルキルナフタレンスルフォ
ン酸塩、アルキル硫酸エステル類、アルキルリン酸エス
テル類、N−アシル−N−アルキルタウリン類、スルホ
コハク酸エステル類、スルホアルキルポリオキシエチレ
ンアルキルフェニルエーテル類、ポリオキシエチレンア
ルキルリン酸エステル類などのような、カルボキシ基、
スルホ基、ホスホ基、硫酸エステル基、リン酸エステル
基等の酸性基を含むアニオン界面活性剤ニアミノ酸類、
アミノアルキルスルホン酸類、アミノアルキル硫酸又は
リン酸エステル類、アルキルベタイン類、アミンオキシ
ド類などの両性界面活性刑;アルキルアミン塩類、脂肪
族あるいは芳香族第4級アンモニウム塩類、ピリジニウ
ム、イミダブリラムなどの複素環第4級アンモニウム塩
類、及び脂肪族又は複素環を含むホスホニウム又はスル
ホニウム塩類などのカチオン界面活性剤を用いることが
できる。For example, saponins (steroids), alkylene oxide derivatives (e.g. polyethylene glycol, polyethylene glycol/polypropylene glycol condensates, polyethylene glycol alkyl ethers or polyethylene glycol alkyl aryl ethers, polyethylene glycol esters, polyethylene glycol sorbitan esters, polyalkylene glycols Nonionic surfactants such as alkylamines or amides, polyethylene oxide adducts of silicone), glycidol derivatives (e.g. alkenylsuccinic acid polyglycerides, alkylphenol polyglycerides), fatty acid esters of polyhydric alcohols, alkyl esters of sugars, etc. Agents: Alkyl carboxylates, alkyl sulfonates, alkylbenzene sulfonates, alkylnaphthalene sulfonates, alkyl sulfates, alkyl phosphates, N-acyl-N-alkyl taurines, sulfosuccinates, sulfonate Carboxy groups, such as alkyl polyoxyethylene alkylphenyl ethers, polyoxyethylene alkyl phosphates, etc.
Anionic surfactant diamino acids containing acidic groups such as sulfo groups, phospho groups, sulfate ester groups, phosphate ester groups,
Ampholytic surfactants such as aminoalkyl sulfonic acids, aminoalkyl sulfates or phosphates, alkyl betaines, and amine oxides; heterocycles such as alkyl amine salts, aliphatic or aromatic quaternary ammonium salts, pyridinium, and imidabrilam. Cationic surfactants such as quaternary ammonium salts and phosphonium or sulfonium salts containing aliphatic or heterocycles can be used.
これらは小田良平他著「界面活性剤とその応用」(横書
店、1964年)、堀口博著「新界面活性剤」 (三共
出版■、1975年)あるいは「マツクカチオンズ デ
ィタージェント アンド エマルジファイアーズ」 (
マツフカチオン ディビイジョンズ、エムシー パブリ
ッシング カンパニ1985) (rMc Cutc
heon’s Detergents& Emulsi
fiers J (Me Cutcheon Div
jsions、 MCPubljshing Co、
1985) ) 、特開昭60−76741号、同6
2−172343号、同62173459号、同62−
215272号、などに記載されている。These include Ryohei Oda et al.'s ``Surfactants and Their Applications'' (Yokoshoten, 1964), Hiroshi Horiguchi's ``New Surfactants'' (Sankyo Publishing ■, 1975), and ``Matsuku Cations Detergent and Emulsifier.''' (
Matsuf Cation Divisions, MC Publishing Company 1985) (rMc Cutc
heon's Detergents & Emulsi
fiers J (Me Cutcheon Div.
jsions, MCPubljshing Co,
1985) ), JP-A No. 60-76741, 6
No. 2-172343, No. 62173459, No. 62-
No. 215272, etc.
本発明の化合物は帯電防止剤としての効果を有するが、
本発明の効果を奏する程度に他の帯電防止剤と併用して
もよい。併用してもよい帯電防止剤としては、特に特開
昭61−109044号、同62−215272号に記
載の含フツ素界面活性剤あるいは重合体、特開昭60−
76742号、同60−80846号、同60〜808
48号、同60−80839号、同80−78741号
、同58−208743号、同62−172343号、
同62−173459号、同62−215272号、な
どに記載されているノニオン系界面活性剤、特開昭84
−68751に記載されているポリフォスフアゼン、あ
るいは特開昭57−204540号、同62−2152
72号に記載されている導電性ポリマー又はラテックス
(ノニオン性、アニオン性、カチオン性、両性)等があ
る。Although the compound of the present invention has an effect as an antistatic agent,
It may be used in combination with other antistatic agents to the extent that the effects of the present invention are achieved. Examples of antistatic agents that may be used in combination include fluorine-containing surfactants or polymers described in JP-A-61-109044 and JP-A-62-215272;
No. 76742, No. 60-80846, No. 60-808
No. 48, No. 60-80839, No. 80-78741, No. 58-208743, No. 62-172343,
Nonionic surfactants described in No. 62-173459, No. 62-215272, etc., JP-A-84
Polyphosphazene described in -68751, or JP-A-57-204540, JP-A-62-2152
Examples include conductive polymers or latexes (nonionic, anionic, cationic, amphoteric) described in No. 72.
又、無機系帯電防止剤としてはアンモニウム、アルカリ
金属、アルカリ土類金属のハロゲン塩、硝酸塩、過塩素
酸塩、硫酸塩、酢酸塩、リン酸塩、チオシアン酸塩なと
か、又、特開昭57−118242号なとに記載の導電
性酸化スズ、酸化亜鉛又はこれらの金属酸化物にアンチ
モン等をドープした複合酸化物を用いることができる。Inorganic antistatic agents include ammonium, alkali metal, alkaline earth metal halogen salts, nitrates, perchlorates, sulfates, acetates, phosphates, thiocyanates, and JP-A-Sho. Conductive tin oxide, zinc oxide, or a composite oxide obtained by doping antimony or the like with these metal oxides described in No. 57-118242 can be used.
更に各種の電荷移動錯体、π共役系高分子及びそのドー
ピング物も帯電防止剤として利用でき、例えばTCNQ
、/TTF、ポリアセチレン、ポリピロールなどがある
。これらは森田他、科学と工業59(3)、103−[
1(1985)、同¥L(4)、】48〜152(19
85)に記載されている。Furthermore, various charge transfer complexes, π-conjugated polymers, and their dopings can also be used as antistatic agents, such as TCNQ.
, /TTF, polyacetylene, polypyrrole, etc. These are Morita et al., Science and Industry 59(3), 103-[
1 (1985), ¥L (4), ]48-152 (19
85).
本発明の写真感光材料の乳剤層や中間層に用いることの
できる結合剤または保護コロイドとしては、ゼラチンを
もちいるのが有利であるが、それ以外の親水性コロイド
も用いることができる。As the binder or protective colloid that can be used in the emulsion layer or intermediate layer of the photographic light-sensitive material of the present invention, it is advantageous to use gelatin, but other hydrophilic colloids can also be used.
例えばゼラチン誘導体、ゼラチンと他の高分子とのグラ
フトポリマー、アルブミン、カゼイン等の蛋白質:ヒド
ロキシエチルセルロース、カルボキシメチルセルロース
、セルロース硫酸エステル類等の如きセルロース誘導体
、アルギン酸ソーダ、デキストラン、澱粉誘導体などの
糖誘導体:ポリビニルアル°」−ル、ポリビニルアルコ
ール部分アセタール、ポリ−N−ビニルピロリドン、ポ
リアクリル酸、ポリメタクリル酸、ポリアクリルアミド
、ポリビニルイミダゾール、ポリビニルピラゾール等の
単一あるいは共重合体の如き多種の合成親水性高分子物
質を用いることができる。For example, gelatin derivatives, graft polymers of gelatin and other polymers, proteins such as albumin and casein; cellulose derivatives such as hydroxyethyl cellulose, carboxymethyl cellulose, and cellulose sulfates; sugar derivatives such as sodium alginate, dextran, and starch derivatives: Various synthetic hydrophilic compounds such as single or copolymers of polyvinyl alcohol, polyvinyl alcohol partial acetal, poly-N-vinylpyrrolidone, polyacrylic acid, polymethacrylic acid, polyacrylamide, polyvinylimidazole, polyvinylpyrazole, etc. Polymeric substances can be used.
ゼラチンとしては石灰処理ゼラチンのほか、酸処理ゼラ
チンや酵素処理ゼラチンを用いてもよく、また、ゼラチ
ンの加水分解物や酵素分解物も用いることができる。As the gelatin, in addition to lime-treated gelatin, acid-treated gelatin or enzyme-treated gelatin may be used, and gelatin hydrolysates or enzymatically decomposed products may also be used.
これらの中でもゼラチンとともにデキストラン及びポリ
アクリルアミドを併用することが好ましい。Among these, it is preferable to use dextran and polyacrylamide together with gelatin.
本発明の写真感光材料の親水性コロイド層には、トリメ
チロールプロパン、ベンタンジオール、ブタンジオール
、ユチレングリコール、グリセリン、ソルビトール等の
ポリオール類を可塑剤として用いることができる。Polyols such as trimethylolpropane, bentanediol, butanediol, ethylene glycol, glycerin, and sorbitol can be used as plasticizers in the hydrophilic colloid layer of the photographic material of the present invention.
本発明の写真感光材料に用いられる写真乳剤中のハロゲ
ン化銀粒子は、立方体、八面体のような規則的(reg
ular)な結晶体を有するものでもよく、また球状、
板状などのような結晶形をもつもの、あるいはこれらの
結晶形の複合形をもつものでもよい。更にはりサーチ・
ディスクロージャー225巻&22534.20〜58
頁(198341)特開昭58−127921号、同5
B−111926号に記載された平板粒子であってもよ
い。種々の結晶形の粒子の混合から成ってもよい。The silver halide grains in the photographic emulsion used in the photographic light-sensitive material of the present invention are regular (regular) grains such as cubes and octahedrons.
It may have a spherical, spherical,
It may have a crystal shape such as a plate shape, or a composite shape of these crystal shapes. Further beam search・
Disclosure Volume 225 & 22534.20-58
Page (198341) JP-A No. 58-127921, No. 5
The tabular grains described in No. B-111926 may also be used. It may also consist of a mixture of particles of various crystalline forms.
ハロゲン化銀粒子は、粒子を形成する過程及び/又は成
長させる過程で、カドミウム塩、亜鉛塩、鉛塩、タリウ
ム塩、イリジウム塩(H塩を含む)、ロジウム塩(錯塩
を含む)及び鉄塩(錯塩を含む)から選ばれる少なくと
も1種を用いて金属イオンを添加し、粒子内部に及び/
又は粒子表面にこれらの金属元素を含有させることがで
き、また適当な還元的雰囲気におくことにより、粒子内
部及び/又は粒子表面に還元増感核を付与できる。During the process of grain formation and/or growth, silver halide grains are produced using cadmium salts, zinc salts, lead salts, thallium salts, iridium salts (including H salts), rhodium salts (including complex salts), and iron salts. (including complex salts) to add metal ions to the inside of the particles and/or
Alternatively, these metal elements can be contained on the particle surface, and reduction sensitizing nuclei can be provided inside the particle and/or on the particle surface by placing the particle in an appropriate reducing atmosphere.
ハロゲン化銀乳剤は、ハロゲン化銀粒子の成長の終了後
に不要な可溶性塩類を除去してもよいし、あるいは含有
させたままでもよい。該塩類を除去する場合には、リサ
ーチ・ディスクロージャー&1764aII項Cl97
8年】2月)に記載の方法に基づいて行うことができる
。Unnecessary soluble salts may be removed from the silver halide emulsion after the growth of silver halide grains is completed, or they may be left contained. When removing the salts, please refer to Research Disclosure & 1764a II Cl97.
It can be carried out based on the method described in [February 2008].
ハロゲン化銀粒子は、粒子内において均一なハロゲン化
銀組成分布を有するものでも、粒子の内部と表面層とで
ハロゲン化銀組成が異なるコア/シェル粒子でありても
よい。The silver halide grains may have a uniform silver halide composition distribution within the grain, or may be core/shell grains in which the silver halide composition differs between the inside of the grain and the surface layer.
ハロゲン化銀乳剤は、いかなる粒子サイズ分布を持つも
のを用いても構わない。粒子サイズ分布の広い乳剤(多
分散乳剤と称する)を用いてもよいし、粒子サイズ分布
の狭い乳剤(単分散乳剤と称する。ここでいう単分散乳
剤とは、粒径の分布の標準偏差を平均粒径で割ったとき
に、その値が0.20以下のものをいう。ここで粒径は
球状のハロゲン化銀の場合はその直径を、球状以外の形
状の粒子の場合は、その投影像を同面積の円像に換算し
たときの直径を示す。)を単独又は数種混合して用いて
もよい。又、多分散乳剤と単分散乳剤を混合して用いて
もよい。Silver halide emulsions having any grain size distribution may be used. An emulsion with a wide grain size distribution (referred to as a polydisperse emulsion) may be used, or an emulsion with a narrow grain size distribution (referred to as a monodisperse emulsion). A particle with a value of 0.20 or less when divided by the average grain size.The grain size is the diameter in the case of spherical silver halide, and the projection of the grain in the case of grains with a shape other than spherical. It shows the diameter when the image is converted into a circular image of the same area.) may be used alone or in combination. Further, a mixture of a polydisperse emulsion and a monodisperse emulsion may be used.
また、本発明に用いられる乳剤は、米国特許2゜996
.382、同3,397,987、同3゜705.85
8に記載の如く、感光性ハロゲン化銀乳剤と内部のかぶ
りたハロゲン化銀乳剤の混合乳剤もしくは別層に併用し
たものであってもよい。Further, the emulsion used in the present invention is disclosed in U.S. Patent No. 2゜996
.. 382, 3,397,987, 3°705.85
As described in Section 8, a mixed emulsion of a photosensitive silver halide emulsion and an internally fogged silver halide emulsion or an emulsion used in combination in a separate layer may be used.
ここで、特開昭81−48862に記載されたメルカプ
ト化合物を更に併用するとカブリの抑制、経時保存性の
改良などの点で好ましい。Here, it is preferable to further use the mercapto compound described in JP-A-81-48862 in combination to suppress fogging and improve storage stability over time.
本発明に用いられる写真乳剤には、感光材料の製造工程
、保存中あるいは写真処理中のカブリを防止し、あるい
は写真性能を安定化させる目的で、種々の化合物を含有
させることができる。すなわちアゾール類、例えばベン
ゾチアゾリウム塩、ニトロイミダゾール類、ニトロベン
ズイミダゾール類、クロロベンズイミダゾール類、ブロ
モベンズイミダゾール類、メルカプトチアゾール類、メ
ルカプトベンゾチアゾール類、メルカプトベンズイミダ
ゾール類、メルカプトチアジアゾール類、アミノトリア
ゾール類、ベンゾトリアゾール類、ニトロベンゾトリア
ゾール類、メルカプトテトラゾールm(#に1−フェニ
ル−5−メルカプトテトラゾール)など:メルカプトピ
リミジン類;メルカプトトリアジン類、たとえばオキサ
ドリンチオンのようなチオケト化合物ニアザインデン類
、たとえばトリアザインデン撃、テトラアザインデン類
(特に4−ヒドロキシ置換(1,3,3a、 7)テ
トラアザインデン類)、ペンタアザインデン類など:ベ
ンゼンチオスルフォン酸、ベンゼンスルフィン酸、ベン
ゼンスルフオン酸アミド等のようなカブリ防止剤または
安定剤として知られた、多くの化合物を加えることがで
きる。The photographic emulsion used in the present invention can contain various compounds for the purpose of preventing fog during the manufacturing process, storage, or photographic processing of the light-sensitive material, or for stabilizing photographic performance. Namely, azoles such as benzothiazolium salts, nitroimidazoles, nitrobenzimidazoles, chlorobenzimidazoles, bromobenzimidazoles, mercaptothiazoles, mercaptobenzothiazoles, mercaptobenzimidazoles, mercaptothiadiazoles, aminotriazoles. benzotriazoles, nitrobenzotriazoles, mercaptotetrazole m (1-phenyl-5-mercaptotetrazole in #), etc.: mercaptopyrimidines; mercaptotriazines, such as thioketo compounds such as oxadorinthion; niazaindenes, such as triazine; Zainden, tetraazaindene (especially 4-hydroxy substituted (1,3,3a,7) tetraazaindene), pentaazaindene, etc.: benzenethiosulfonic acid, benzenesulfinic acid, benzenesulfonic acid amide, etc. A number of compounds known as antifoggants or stabilizers can be added, such as.
本発明の写真感材の親水性コロイド層にはナルキルアク
リレートのホモポリマー又はコポリマー塩化ビニリデン
のコポリマーの如く当業界でよく知られたポリマーラテ
ックスを含有せしめることが出来る。ポリマーラテック
スは特開昭6】−230136号に記載のごとくノニオ
ン界面活性剤で予め安定化されていてもよい。The hydrophilic colloid layer of the photographic material of the present invention may contain polymer latexes well known in the art, such as homopolymers or copolymers of narkylacrylate and copolymers of vinylidene chloride. The polymer latex may be pre-stabilized with a nonionic surfactant as described in JP-A No. 6-230136.
本発明の写真感光材料の写真乳剤層には感度上昇、コン
トラスト上昇、または現像促進の目的でたとえばポリア
ルキレンオキシドまたはそのエーテル、エステル、アミ
ンなどの誘導体、チオエーテル化合物、チオモルフォリ
ン類、四級アンモニウム塩化合物、ウレタン誘導体、尿
素誘導体、イミダゾール誘導体、3−ビラプリトン類等
を含んでもよい。The photographic emulsion layer of the photographic light-sensitive material of the present invention contains, for example, polyalkylene oxide or its derivatives such as ethers, esters, and amines, thioether compounds, thiomorpholines, and quaternary ammonium for the purpose of increasing sensitivity, increasing contrast, or promoting development. It may also contain salt compounds, urethane derivatives, urea derivatives, imidazole derivatives, 3-virapritones, and the like.
本発明に用いられる写真乳剤は、メチン色素類その他に
よって分光増感されてもよい。用いられる色素には、シ
アニン色素、メロシアニン色素、複合シアニン色素、複
合メロシアニン色素、ホロポーラ−シアニン色素、ヘミ
シアニン色素、スチリル色素およびヘミオキソノール色
素が包含される。特に有用な色素は、シアニン色素、メ
ロシアニン色素、および複合メロシアニン色素に属する
色素である。The photographic emulsions used in the present invention may be spectrally sensitized with methine dyes and others. The dyes used include cyanine dyes, merocyanine dyes, complex cyanine dyes, complex merocyanine dyes, holopolar cyanine dyes, hemicyanine dyes, styryl dyes and hemioxonol dyes. Particularly useful dyes are those belonging to the cyanine dyes, merocyanine dyes, and complex merocyanine dyes.
本発明に用いる支持体には、アンチハレーション層を設
けることもできる。この目的のためにはカーボンブラッ
クあるいは各種の染料、例えば、オキソノール染料、ア
ゾ染料、アリルメタン染料、スチリル染料、アントラキ
ノン染料、メロシアニン染料及びトリ(又はジ)アリル
メタン染料等があげられる。その場合に染料がアンチハ
レーション層から拡散しないようにカチオン性ポリマー
又はラテックスを使用してもよい。The support used in the present invention can also be provided with an antihalation layer. For this purpose, carbon black or various dyes such as oxonol dyes, azo dyes, allylmethane dyes, styryl dyes, anthraquinone dyes, merocyanine dyes and tri(or di)allylmethane dyes may be used. Cationic polymers or latexes may then be used to prevent the dye from diffusing out of the antihalation layer.
これらはリサーチ ディスクロージャ 176巻N(L
]7643.1項C197B年12月)に記載されてい
る。また、現像銀の色阿を改良するために特開昭61−
285445号に記載された如きのマゼンタ染料を用い
てもよい。These are Research Disclosure Volume 176 N (L
] Section 7643.1 C197B December). In addition, in order to improve the color of developed silver,
Magenta dyes such as those described in No. 285,445 may also be used.
本発明に用いられる親水性コロイド層にはコロイドシリ
カや硫酸バリウムストロンチウム、ポリメタクリル酸メ
チル、メタクリル酸メチル−メタクリル酸共重合体、特
開昭63−216046号に記載のメタクリル酸メチル
−スチレンスルホン酸共重合体、特開昭61−2301
36号に記載のフッ素基を含有した粒子等からなるいわ
ゆるマット剤を用いることが出来る。The hydrophilic colloid layer used in the present invention includes colloidal silica, barium strontium sulfate, polymethyl methacrylate, methyl methacrylate-methacrylic acid copolymer, and methyl methacrylate-styrene sulfonic acid described in JP-A-63-216046. Copolymer, JP-A-61-2301
A so-called matting agent made of particles containing fluorine groups as described in No. 36 can be used.
本発明の写真感光材料には、写真乳剤層その他の構成層
に無機または有機の硬膜剤を含有してよい。例えばアル
デヒド類(ホルムアルデヒド、グリオキザール、ゲルタ
ールアルデヒドなど)、活性ビニル化合物(1,3,5
−)リアクリロイルへキサヒドロ−8−トリアジン、1
.3−ビニルスルホニル−2−プロパツールなど)、活
性ハロゲン化合物(2,4−ジクロル−6−ヒドロキシ
−5−)リアジンなど)、ムコハロゲン酸類(ムコクロ
ル酸、ムコフェノキシクロル酸など)、などを単独また
は組合わせて用いることができる。The photographic material of the present invention may contain an inorganic or organic hardener in the photographic emulsion layer and other constituent layers. For example, aldehydes (formaldehyde, glyoxal, geltaraldehyde, etc.), active vinyl compounds (1,3,5
-) lyacryloylhexahydro-8-triazine, 1
.. 3-vinylsulfonyl-2-propatur, etc.), active halogen compounds (2,4-dichloro-6-hydroxy-5-)riazine, etc.), mucohalogen acids (mucochloric acid, mucophenoxychloroic acid, etc.), etc. alone. Or they can be used in combination.
好ましく用いられる硬膜剤は下記一般式で表されるビニ
ルスルホン系化合物である。The hardening agent preferably used is a vinyl sulfone compound represented by the following general formula.
(CH,=CH−3○、−CH,→ゴA式中、Aは2f
S基を表わすがなくても良い。(CH,=CH-3○,-CH,→goA In the formula, A is 2f
Although it represents an S group, it is not necessary.
本発明の写真感光材料は現像主薬を含有しつる。The photographic material of the present invention contains a developing agent.
現像主薬として、リサーチ・ディスクロージャー第17
6巻、29頁のrDevelophing agent
sJの項に記載されているものが用いられうる。As a developing agent, Research Disclosure No. 17
rDeveloping agent in volume 6, page 29
Those described in the section sJ can be used.
特にハイドロキノン、ビラプリトン類は好ましく用いら
れる。In particular, hydroquinone and birapritones are preferably used.
本発明においては、イエロー、シアン、マゼンタに発色
するカプラーを用いてもよく、例えば特開昭62−21
5272号に詳細に記載しである。In the present invention, a coupler that develops yellow, cyan, or magenta may be used, for example, in JP-A No. 62-21
It is described in detail in No. 5272.
本発明においては、写真感光材料を構成する層を付与す
るための塗布方法は、特に限定されるものではなく、例
えば、バー塗布法、ロール筒布法、ナイフ塗布法、流し
塗布法(カーテン塗布法)、グラビア塗布法、噴霧塗布
法、浸漬塗布法や押し出し塗布法等の従来技術を挙げる
ことができる。In the present invention, the coating method for applying the layers constituting the photographic material is not particularly limited, and examples include bar coating, roll tube coating, knife coating, and flow coating (curtain coating). Conventional techniques such as gravure coating method, spray coating method, dip coating method and extrusion coating method can be mentioned.
本発明の写真感光材料の現像処理には銀画像を形成する
処理(黒白現像処理)、あるいは色画像を形成する現像
処理のいずれであっても良い。もし反転法で作画する場
合にはまず黒白ネガ現像工程を行ない、次いで白色露光
を与えるか、あるいはカブリ剤を含有する浴で処理しカ
ラー現像処理を行なう。(又感光材料中に色素を含有さ
せておき、露光後黒白現像処理工程を施し銀画像を作り
、これを漂白触媒として色素を漂白する銀色素漂白を用
いてもよい。)
黒白現像処理としては、現像処理工程、定着処理工程、
水洗処理工程がなされる。現像処理工程後、停止処理工
程を行ったり定着処理工程後、安定住処理工程を施す場
合は、水洗処理工程が省略される場合がある。また現像
主薬またはそのプレカーサーを感光材料中に内蔵し、現
像処理工程をアルカリ液のみで行ってもよい。現像液と
してリス現像液を用いた現像処理工程を行ってもよい。The developing process for the photographic light-sensitive material of the present invention may be either a process for forming a silver image (black and white development process) or a process for forming a color image. If an image is to be produced by the reversal method, a black and white negative development step is first carried out, and then a color development process is carried out by applying white exposure or processing with a bath containing a fogging agent. (Silver dye bleaching may also be used, in which a dye is contained in a photosensitive material, a black and white development process is performed after exposure to create a silver image, and this is used as a bleaching catalyst to bleach the dye.) As a black and white development process, , development process, fixing process,
A water washing process is performed. In the case where a stop treatment step is performed after the development treatment step or a stable residence treatment step is performed after the fixation treatment step, the water washing treatment step may be omitted. Alternatively, a developing agent or its precursor may be incorporated into the photosensitive material, and the developing process may be performed using only an alkaline solution. A development process using a lithium developer as a developer may also be performed.
カラー現像処理は、発色現像処理工程、漂白処理工程、
定着処理工程、水洗処理工程及び必要に応じて安定化処
理工程を行うが、漂白液を用いた処理工程と定着液を用
いた処理工程の代わりに、1浴漂白定着液を用いて、漂
白定着処理工程を行うこともできるし、発色現像、漂白
、定着を1浴中で行うことができる1浴現像漂白定着処
理液を用いたモノバス処理工程を行うこともできる。Color development processing includes a color development processing process, a bleaching processing process,
A fixing process, a water washing process, and a stabilizing process are performed as necessary, but instead of a process using a bleach solution and a process using a fixer, a one-bath bleach-fix solution is used for bleach-fixing. It is also possible to perform a monobath treatment process using a one-bath development, bleach-fixing solution that allows color development, bleaching, and fixing to be performed in one bath.
これらの処理工程に組み合わせて前硬膜処理工程、その
中和工程、停止定着処理工程、後硬膜処理工程等を行っ
てもよい。これら処理において発色現像処理工程の代わ
りに発色現像主薬、またはそのプレカーサーを材料中に
含有させておき現像処理をアクチベータ液で行うアクチ
ベータ処理工程わ行ってもよいし、そのモノバス処理に
アクチべ一ター処理を適用することができる。In combination with these processing steps, a pre-hardening process, its neutralization process, a stop-fixing process, a post-hardening process, etc. may be performed. In these treatments, instead of the color development process, an activator treatment process may be performed in which a color developing agent or its precursor is contained in the material and the development process is performed with an activator solution, or an activator solution may be used in the monobath process. Processing can be applied.
処理温度は通常、10℃〜65℃の範囲に選ばれるが、
65℃をこえる温度としてもよい。好ましくは25℃〜
45℃で処理される。The processing temperature is usually selected in the range of 10°C to 65°C,
The temperature may exceed 65°C. Preferably from 25°C
Processed at 45°C.
黒白現像処理に用いられる黒白現像液は通常知られてい
る黒白写真感光材料の処理に用いられるものであり、一
般に黒白現像液に添加される各種の添加剤を含有せしめ
ることができる。The black-and-white developer used in the black-and-white development process is commonly used in processing known black-and-white photographic materials, and can contain various additives that are generally added to black-and-white developers.
代表的な添加剤としては1−フェニル−3−ビラプリト
ン、メトール及びハイドロキノンのような現像主薬、亜
硫酸塩のような保恒剤、水酸化ナトリウム、炭酸ナトリ
ウム、炭酸カリウム等のアルカリからなる促進剤、臭化
カリウムや2−メチルベンツイミダゾール、メチルベン
ツチアゾール等の無機性、もしくは有機性の抑制剤、ポ
リリン塩酸のような硬水軟化剤、微量の沃化物やメルカ
プト化合物からなる表面過現像防止剤等を挙げることが
できる。Typical additives include developing agents such as 1-phenyl-3-virapritone, metol and hydroquinone, preservatives such as sulfites, accelerators consisting of alkalis such as sodium hydroxide, sodium carbonate, potassium carbonate, etc. Inorganic or organic inhibitors such as potassium bromide, 2-methylbenzimidazole, and methylbenzthiazole, water softeners such as polyphosphoric acid, and surface overdevelopment inhibitors consisting of trace amounts of iodide and mercapto compounds. can be mentioned.
又、X−レイ感材に於いては従来現像処理時間の短縮化
が活発である。更には又処理の簡易化手段も開発されて
きており、本発明の化合物はこれらの最近の処理技術に
対して極めて優れた写真感光材料を提供することができ
る。Furthermore, in the case of X-ray sensitive materials, efforts have been made to shorten the development processing time. Furthermore, means to simplify processing have also been developed, and the compounds of the present invention can provide photographic materials that are extremely superior to these recent processing techniques.
以下に実施例を挙げて本発明を例証するが本発明はこれ
に限定されるものではない。The present invention will be illustrated below with reference to Examples, but the present invention is not limited thereto.
実施例1
(1) 単分散ハロゲン化銀乳剤のanゼラチンと臭
化カリウムと水が入った55℃に加温された容器に適当
量のアンモニアを入れた後、反応容器中のpAg値を7
.60に保ちつつ硝酸銀水溶液と銀に対するイリジウム
のモル比で】0−7モルとなるようにヘキサクロロイリ
ジウム(I[)酸塩を添加した臭化カリウム水溶液とを
ダブルジェット法により添加して平均粒子サイズが0.
55μの単分散臭化銀乳剤粒子をvI製した。この乳
副粒子は、平均粒子サイズの丈40%以内に全粒子数の
98%が存在していた。この乳剤を脱塩処理後、pHを
6.2、pAgを8.6に合わせてからチオ硫酸ナトリ
ウムと塩化金酸とにより金・硫黄増感を行ない所望の写
真性を得た。Example 1 (1) After putting an appropriate amount of ammonia into a container heated to 55°C containing a monodisperse silver halide emulsion of gelatin, potassium bromide, and water, the pAg value in the reaction container was reduced to 7.
.. The average particle size was determined by adding a silver nitrate aqueous solution and a potassium bromide aqueous solution to which hexachloroiridate (I[) salt was added so that the molar ratio of iridium to silver was 0 to 7 mol while maintaining the average particle size at 60% by double jet method. is 0.
Monodisperse silver bromide emulsion grains of 55μ were prepared vI. 98% of the total number of milk sub-particles existed within 40% of the average particle size. After desalting this emulsion, the pH was adjusted to 6.2 and the pAg to 8.6, and then gold/sulfur sensitization was performed using sodium thiosulfate and chloroauric acid to obtain desired photographic properties.
二の乳剤の(100)面/ (111)面比率をクベル
カムンク法で測定したところ98/2であった。この乳
剤をAと命名した。The (100) plane/(111) plane ratio of the second emulsion was measured by the Kubelkamunk method and was found to be 98/2. This emulsion was named A.
次にAから粒子形成前に添加するアンモニア量を減らす
だけの変更を行なって平均粒子サイズが0.35μ及び
0.25μの単分散乳剤B及びCを調製した。Next, monodisperse emulsions B and C having average grain sizes of 0.35μ and 0.25μ were prepared by changing A only by reducing the amount of ammonia added before grain formation.
(2)乳剤塗布液の調製
乳剤A、B、Cの各0.333kgを40℃に加温して
乳剤を溶解後赤外域増感色素(下記の構造式A)のメタ
ノール溶液(9x 10″4mol/ f )を70c
c、強色増感剤4,4′−ビス〔4,6−ジ(ナフチル
−2−オキシ)ピリミジン−2−イルアミノコスチルベ
ン−2,2′−ジスルホン酸ジナトリウム塩(4,4X
] 0” mol/ 1)水溶液(4,4×10−f
[lol、#’) 90cc、下記の構造式Bのメタノ
ール溶液(2,8X ] O”n+ol#) 35cc
、4−ヒドロキシメチル−6−メチル−1゜3.3a、
7−チトラザインデン水溶液、塗布助剤ドデシルベンゼ
ンスルフォン酸塩の水溶液、増粘剤ボリボタシウムーP
−スチレンスルフォネート化合物の水溶液を添加して乳
剤塗布液とした。(2) Preparation of emulsion coating solution After heating 0.333 kg each of emulsions A, B, and C to 40°C to dissolve the emulsions, add a methanol solution (9 x 10'') of an infrared sensitizing dye (structural formula A below) 4mol/f) to 70c
c, supersensitizer 4,4'-bis[4,6-di(naphthyl-2-oxy)pyrimidin-2-ylaminocostilbene-2,2'-disulfonic acid disodium salt (4,4X
] 0” mol/1) Aqueous solution (4,4×10-f
[lol, #') 90cc, methanol solution of the following structural formula B (2,8X] O"n+ol#) 35cc
, 4-hydroxymethyl-6-methyl-1°3.3a,
7-chitrazaindene aqueous solution, coating aid dodecylbenzenesulfonate aqueous solution, thickener Bolibotacium P
- An aqueous solution of a styrene sulfonate compound was added to prepare an emulsion coating solution.
構造式A
構造式B
(3)感材層の表面保護層用塗布液の調製40°Cに加
温された1 0wt%ゼラチン水溶液(0,9g/n(
)に、ポリアクリルアミド水溶液(分子量4万)(0,
1g/ポ)、増粘剤ポリスチレンスルフオン酸ソーダ水
溶液、マント剤ポリメチルメタクリレート(平均粒径2
.0μm)、硬膜剤N、N’−エチレンビス−(ビニル
スルホニルアセトアミド)、塗布助剤
C工H3
CHtCOO−CHzCH−C4)1*(n)を添加し
て塗布液とした。Structural formula A Structural formula B (3) Preparation of coating solution for surface protective layer of sensitive material layer 10 wt% aqueous gelatin solution (0.9 g/n (0.9 g/n) heated to 40°C
), polyacrylamide aqueous solution (molecular weight 40,000) (0,
1g/po), thickener polystyrene sulfonate sodium aqueous solution, capping agent polymethyl methacrylate (average particle size 2
.. A coating liquid was prepared by adding a hardening agent N, N'-ethylenebis-(vinylsulfonylacetamide), and a coating aid CCHtCOO-CHzCH-C4)1*(n).
(4)バック塗布液の調製
40℃に加温された1 0wt%のゼラチン水溶液1k
gに増粘剤ポリスチレンスルフオン酸ソーダ水溶液、構
造式Cの染料水溶液(5x10−zモル/j2)50c
c、硬膜剤N、N’ −エチレンビス−(ビニルスルホ
ニルアセトアミド)水溶液、塗布助剤
CaHe
CHzCOOCLCH−C−L(n)
C)IcOOcLcI(−C,H,(n)50、Na
C2H4
とを加えて塗布液とした。(4) Preparation of back coating solution 1k of 10wt% gelatin aqueous solution heated to 40℃
g, thickener polystyrene sulfonate sodium aqueous solution, dye aqueous solution of structural formula C (5 x 10-z mol/j2) 50 c
c, hardener N, N'-ethylene bis-(vinylsulfonylacetamide) aqueous solution, coating aid CaHe CHzCOOCLCH-C-L(n) C) IcOOcLcI(-C,H,(n)50, Na
C2H4 was added to prepare a coating liquid.
構造式C
(5)バック層の表面保護層用塗布液の調製40゛Cに
加温された1 0wt%ゼラチン水溶液(Ig/rrf
)に増粘剤としてポリスチレンスルフオン酸ソーダ水溶
液(20■/ホ)、マット荊としてメチルメタクリレー
ト−スチレンスルホン酸ソーダ(40■/rrr)
(モル比97:3)、塗布助剤として
C,)Is
CHzCOOCHzCH−CaI2(n)CHCOOC
HzCH−CaHe (ロ)SO,Na CJ。Structural formula C (5) Preparation of coating solution for surface protective layer of back layer 10 wt% aqueous gelatin solution (Ig/rrf) heated to 40°C.
), an aqueous solution of sodium polystyrene sulfonate (20 μ/rrr) as a thickener, and methyl methacrylate-sodium styrene sulfonate (40 μ/rrr) as a matte.
(molar ratio 97:3), C as a coating aid,)Is CHzCOOCHzCH-CaI2(n)CHCOOC
HzCH-CaHe (b)SO, Na CJ.
(20■/ホ)及びp−ノニルフェノキシブチルスルホ
ン酸ナトリウム塩水溶液(2■/nf) 、 ヲ添加し
た。(20 μ/f) and p-nonylphenoxybutylsulfonic acid sodium salt aqueous solution (2 μ/nf) were added.
二の溶液に本発明の化合物として表11−2〜1−5の
化合物を所定量添加、溶解させ、表1】−3,1−5で
は表】中に示される金属イオンの塩を添加、溶解させ、
これに水を加えてゼラチンが5 w t 96となるよ
うに塗布液を調製した。Add and dissolve a predetermined amount of the compounds of Tables 11-2 to 1-5 as the compounds of the present invention to the solution of No. 2, add salts of metal ions shown in Tables 1-3 and 1-5, Dissolve,
Water was added to this to prepare a coating solution so that the gelatin content was 5 wt 96.
また比較用化合物として表11−6〜1−10の化合物
を所定量添加、溶解させ、表1110では更に表1中に
示される金属イオンの塩を添加、溶解させ、これに水を
加えてゼラチンが5wt%となるように塗布液を調製し
た。In addition, predetermined amounts of the compounds in Tables 11-6 to 1-10 were added and dissolved as comparative compounds, and in Table 1110, salts of metal ions shown in Table 1 were further added and dissolved, and water was added to make gelatin. A coating liquid was prepared so that the amount of 5 wt% was 5 wt%.
表11−1は未添加のコントロール実験である。Table 11-1 is a control experiment without addition.
(6)塗布試料の作成
前述のバック塗布液をバック層の表面保護層塗布液とと
もにポリエチレンテレフタレート支持体の一方の側にゼ
ラチン塗布量が4g/mとなるように塗布した。これに
続いて支持体の反対の側に(2)で述べた赤外増感色素
入りの乳剤塗布液とこれ用の表面保護層塗布液とを塗布
銀量が3.5gydとなるように塗布した。なお、その
他の添加物の添加量は前記した(g/m)または(■7
/rIりで示した。得られた試料フィルムを後述する方
法で、それぞれおよびウレタンローン−及びナイロンに
対するスタチックマーク、画像ムラ、定着液の汚染性、
塗布試料のブツ数を調べた。(6) Preparation of coating sample The above-mentioned back coating solution was coated on one side of a polyethylene terephthalate support together with the surface protective layer coating solution for the back layer so that the gelatin coating amount was 4 g/m. Subsequently, on the opposite side of the support, coat the emulsion coating solution containing the infrared sensitizing dye described in (2) and the surface protective layer coating solution so that the coated silver amount is 3.5 gyd. did. In addition, the amount of other additives added is as described above (g/m) or (■7
/rI ri. The obtained sample films were tested for static marks, image unevenness, fixer staining, and staining of the urethane lawn and nylon using the methods described below.
The number of spots on the coated sample was examined.
(7)現像液及び定着液の組成は次の通りである。(7) The compositions of the developer and fixer are as follows.
〈現像液〉
水酸化カリウム 17g亜硫酸ナ
トリウム 60gジエチレントリア
ミン五酢酸 2g炭酸カリ
5gホウ酸
3gヒドロキノン
35gジエチレングリコール 12g
4−ヒドロキシメチル−4−メチル
ニーフェニル−3−ピラゾリド
ン
1. 65g5−メチルベンゾトリアゾール 0
.6g酢酸 1,8g臭
化カリウム 2g水でIIと
する(pH10,50に調整する。)〈定着液〉
チオ硫酸アンモニウム 140g亜硫酸ナ
トリウム 15gエチレンジアミン
四酢酸・ニナトリ
ウム・二水塩 25■水酸化ナト
リウム 6g水で11とする(酢
酸でpH4,95に調整する)。<Developer> Potassium hydroxide 17g Sodium sulfite 60g Diethylenetriaminepentaacetic acid 2g Potassium carbonate
5g boric acid
3g hydroquinone
35g diethylene glycol 12g
4-hydroxymethyl-4-methylniphenyl-3-pyrazolidone
1. 65g5-methylbenzotriazole 0
.. 6g acetic acid 1.8g potassium bromide 2g Make II with water (adjust to pH 10.50) <Fixer> Ammonium thiosulfate 140g Sodium sulfite 15g Ethylenediaminetetraacetic acid disodium dihydrate 25■ Sodium hydroxide 6g Water to 11 (adjust to pH 4.95 with acetic acid).
現像工程は以下の通りである。The development process is as follows.
処理温度 時 開
現 像 35℃ 11.5秒定 着
35℃ 12.5秒水 洗 20℃
7.5秒乾 燥 60℃
Dry to Dry 処理時間 60秒(8
)スタチックマークの評価
未露光の試料を25°C110%RHで2時間調湿した
後、同一空調条件の暗室中において、試料を、対素材に
対してそのスタチックマークがどのようになるかを調べ
るべくウレタンゴムローラー及び、ナイロンゴムローラ
ーで摩擦した後、前述の方法で現像処理した。Processing temperature Time Development image 35℃ 11.5 seconds fixation
35℃ 12.5 seconds water washing 20℃
7.5 seconds drying 60℃ Dry to Dry processing time 60 seconds (8
) Static mark evaluation After conditioning an unexposed sample at 25°C, 110% RH for 2 hours, in a dark room under the same air conditioning conditions, evaluate the static mark on the sample against the material. In order to investigate this, the film was rubbed with a urethane rubber roller and a nylon rubber roller, and then developed using the method described above.
そのスタチックマーク発生度の評価は以下の4段階に分
けて行なった。The degree of occurrence of static marks was evaluated in the following four stages.
A;スタチックマークの発生が全く認められずB:
# 少し認められるC 、
# # かなり認められる
D= # 〃 はぼ全面に認められる
(9)画像ムラ評価
試料フィルム25anX30cmに現像処理後の画像温
度がマクベス濃度計で濃度1.5になるように赤外光を
照射し、前述の現像・定着・水洗・乾燥を行ないその画
像上のムラを以下の4段階で評価した。A: No static marks were observed at all B:
# Slightly recognized C,
# # Considerably recognized D= # 〃 Observed almost on the entire surface (9) Image unevenness evaluation A sample film of 25 x 30 cm was irradiated with infrared light so that the image temperature after development became 1.5 using a Macbeth densitometer. The image was developed, fixed, washed, and dried as described above, and the unevenness on the image was evaluated on the following four scales.
八:画像ムラが全く認められない。8: No image unevenness observed at all.
B: # 少し認められる。B: # Slightly recognized.
C: # かなり認められる。C: # Quite acceptable.
D=画像ムラが全面に認められる。D=Image unevenness is observed over the entire surface.
0@ 定着液汚染性評価
マクベス濃度計で濃度1.5になるように赤外露光され
た試料25anX30anを、新しく調液された現像液
、定着液を用いて500枚現像処理した。そして定着液
中に浮遊して来る不溶解分を以下の4段階で評価した。0@ Fixer Contamination Evaluation 500 sheets of samples 25an x 30an, which had been exposed to infrared light to give a density of 1.5 using a Macbeth densitometer, were developed using newly prepared developer and fixer. The undissolved matter floating in the fixer was evaluated on the following four scales.
なお現像液及び定着液の補充量は各々50CC/’枚及
び60cc/枚である。The replenishment amounts of the developer and fixer were 50 cc/sheet and 60 cc/sheet, respectively.
A:浮遊物が全く認められない
B: 〃 わずかに認められる
C: I かなり 〃
D: 〃 激しく 〃
aつ 塗布性の評価
塗布性の評価はフィルム1平方メートル当たりの乳剤層
側のブツの数で示した。数値の大きい程塗布性は悪い。A: No floating matter observed B: 〃 Slightly observed C: 〃 Quite 〃 D: 〃 Severe 〃 Atsu Coating property evaluation Coating property evaluation is based on the number of particles on the emulsion layer side per square meter of film. Indicated. The larger the value, the worse the coating properties.
比較化合物人
C+ a H* *○+CH! CH,C)+rr−H
比較化合物B
(Mw= 2500)
R,r
0(CHaCHzO) *−CH−
R,/・
0 (C)1*CHtO)i(CdL)(C−](,7
)表1のごとく本発明の化合物を用いた試料ニ2〜I−
5は、スタチックマークの発生もなく画像ムラと定着液
汚染性の全くないものであり又塗布性も良好なものであ
った。Comparison compound person C+ a H* *○+CH! CH,C)+rr-H
Comparative compound B (Mw = 2500) R, r 0 (CHaCHzO) *-CH- R, / 0 (C) 1 * CHtO) i (CdL) (C-] (,7
) Samples 2-I- using the compounds of the present invention as shown in Table 1
No. 5 had no static marks, no image unevenness, no fixer contamination, and had good coating properties.
一方、試料ニー1(コントロール)は、本発明の化合物
を含有していないためにスタチックマークと画像ムラが
悪い。又比較試料I−6、I−7はポリオキシエチレン
基を有するノニオン界面活性剤を含有した試料であるが
、画像ムラと定着液汚染性の点で本発明に比べ著しく劣
る。更に比較試料I−8〜ニー10は本発明の化合物と
類似した構造を有しているが、画像ムラと定着液汚染性
の点で本発明には及ばない。On the other hand, sample knee 1 (control) did not contain the compound of the present invention, and therefore had poor static marks and image unevenness. Comparative samples I-6 and I-7 are samples containing a nonionic surfactant having a polyoxyethylene group, but are significantly inferior to the present invention in terms of image unevenness and fixer staining properties. Comparative samples I-8 to Nee-10 have similar structures to the compounds of the present invention, but are not as good as the present invention in terms of image unevenness and fixer staining properties.
以上述べたごとく本発明の化合物を用いて作成した試料
フィルムは、スタチックマーク、画像ムラ、定着液汚染
性、塗布性すべてを満足するものであり、本発明が優れ
たものであることは明白である。As described above, the sample film prepared using the compound of the present invention satisfies all of the static marks, image unevenness, fixer staining property, and coatability, and it is clear that the present invention is superior. It is.
実施例2
(1)平板状ハロゲン化銀粒子の調製
臭化カリウム、チオエーテル
0to(CH,) 、5(CH2) 、5(CH,)
、OH)、及びゼラチンを加えて溶解し、70℃に保っ
た水溶液中に、攪拌しながら硝酸銀溶液と沃化カリウム
と臭化カリウムの混合溶液をダブルジェット法により添
加した。Example 2 (1) Preparation of tabular silver halide grains Potassium bromide, thioether 0to(CH,), 5(CH2), 5(CH,)
, OH) and gelatin were added and dissolved, and into the aqueous solution maintained at 70°C, a mixed solution of silver nitrate solution, potassium iodide, and potassium bromide was added by a double jet method while stirring.
添加終了後、35°Cまで降温し沈降法により可溶性塩
類を除去したのち、再び40℃に昇温してゼラチン60
gを追添して溶解しpHを6.8に調整した。得られた
平板状ハロゲン化銀粒子は平均直径が1.24μmで厚
み0.17μm、平均の直径/厚み比は7.3であり沃
化銀が3モル%であった。また40℃でpAgは8.9
5であった。After the addition was completed, the temperature was lowered to 35°C and soluble salts were removed by the sedimentation method, and then the temperature was raised to 40°C again and gelatin 60%
g was added and dissolved, and the pH was adjusted to 6.8. The obtained tabular silver halide grains had an average diameter of 1.24 μm, a thickness of 0.17 μm, an average diameter/thickness ratio of 7.3, and a silver iodide content of 3 mol %. Also, pAg at 40℃ is 8.9
It was 5.
この乳剤を金、イオウ増感を併用して化学増感した。こ
の化学増感後の溶液に増感色素アンヒドロ−5,5′−
ジクロロ−9−エチル−3,3′ジ(3−スルフォプロ
ビル)オキサカルボシアニンハイドロオキサイドナトリ
ウム塩500■、沃化カリ200■を銀1モル当たりに
添加して緑色増感をした。さらに安定剤として4−ヒド
ロキシ−6−メチル−1+ 3. 3a、 ?−テ
トラザインデンと2.6−ビス(ヒドロキシアミノ)−
4−ジエチルアミノ−1,3,5−)リアジンを、また
重量平均分子量(MW)40000のデキストラン、エ
チルアクリレート/アクリル酸(モル比95:5)のラ
テックス溶液を添加し、平板状乳剤用塗布液とした。塗
布液の比重は、】9】75、銀/ゼラチンの重量比は1
.30、デキストラン/ゼラチンの重量比は0.30で
あった。This emulsion was chemically sensitized using gold and sulfur sensitization. The sensitizing dye anhydro-5,5'- is added to the solution after chemical sensitization.
Green sensitization was carried out by adding 500 µm of dichloro-9-ethyl-3,3' di(3-sulfoprobyl)oxacarbocyanine hydroxide sodium salt and 200 µm of potassium iodide per mole of silver. Additionally, 4-hydroxy-6-methyl-1+ as a stabilizer 3. 3a, ? -Tetrazaindene and 2,6-bis(hydroxyamino)-
4-diethylamino-1,3,5-)riazine, dextran with a weight average molecular weight (MW) of 40,000, and a latex solution of ethyl acrylate/acrylic acid (molar ratio 95:5) were added to form a coating solution for tabular emulsions. And so. The specific gravity of the coating solution is ]9]75, and the weight ratio of silver/gelatin is 1.
.. 30, and the dextran/gelatin weight ratio was 0.30.
(2)表面保護層用塗布液の調製
ゼラチン、塗布剤
J−
CH*C00CH−CH−C4H−(n)C)ICOO
CH* CH−CtL (n)JO,Na組
硬膜剤N、N’−エチレンビス−(ビニルスルホニルア
セトアミド)及び重量平均分子量(MW)8000のポ
リアクリルアミド、ポリメチルメタクリレート粒子(平
均粒径3.5μm)及びこの溶液に表2中に示される本
発明の化合物として表22−2〜2−5を所定量添加、
溶解させ、表22−3.2−5は更に表2中に示される
金属イオンの塩を所定量添加、溶解させ、これに水を加
えてゼラチンが5wt%となるように塗布液を調製 し
ブこ。(2) Preparation of coating solution for surface protective layer Gelatin, coating agent J- CH*C00CH-CH-C4H-(n)C)ICOO
CH* CH-CtL (n) JO, Na set hardener N, N'-ethylene bis-(vinylsulfonylacetamide), polyacrylamide with a weight average molecular weight (MW) of 8000, polymethyl methacrylate particles (average particle size 3. 5 μm) and adding a predetermined amount of Tables 22-2 to 2-5 as the compounds of the present invention shown in Table 2 to this solution,
Dissolve, further add and dissolve a prescribed amount of metal ion salts shown in Table 22-3.2-5, and add water to this to prepare a coating solution so that the gelatin content is 5 wt%. Buko.
また比較化合物として表22−6〜2−10の化合物を
所定量添加、溶解させ、表22−10においては更に表
2沖に示される金属イオンの塩を添加、溶解させ、これ
に水を加えてゼラチンが5wt%となるように塗布液を
調製した。In addition, as comparative compounds, prescribed amounts of compounds shown in Tables 22-6 to 2-10 are added and dissolved, and in Table 22-10, salts of metal ions shown in Table 2 are further added and dissolved, and water is added to this. A coating solution was prepared so that the gelatin content was 5 wt%.
表22−1は未添加のコントロール実験である。Table 22-1 is a control experiment without addition.
(3)写真材料の作成方法
下塗済みの180μmの厚みを有するポリエチレンテレ
フタレートフィルム支持体上に、乳剤層及び表面保護層
をこの順に、同時押し出し塗布法により塗布乾燥し、こ
の時塗布銀量は2.0g/dになるように、また表面保
護層中の素材は、それぞれ、ゼラチンはO,Bog/r
t!、塗布剤C2H&
CH2C00CH2C1(−C,)1. (n)CHC
OOCH,CH−C,)Is (n)SOsNa
C2H&
は20■/r!!、硬膜剤は40■7′コ、ポリアクリ
ルアミドは0.80g/X1!、ポリメチルメタクリレ
ート粒子は50■7/己になるように塗布した。(3) Method for producing photographic materials An emulsion layer and a surface protective layer are coated and dried in this order on an undercoated polyethylene terephthalate film support having a thickness of 180 μm by a simultaneous extrusion coating method, at which time the amount of coated silver is 2 0g/d, and the materials in the surface protective layer were O for gelatin and Bog/r for gelatin, respectively.
T! , coating agent C2H & CH2C00CH2C1 (-C,)1. (n)CHC
OOCH,CH-C,)Is(n)SOsNa
C2H& is 20■/r! ! , hardener is 40 x 7', polyacrylamide is 0.80 g/X1! The polymethyl methacrylate particles were coated at a ratio of 50 x 7/self.
これと同じ層構成で支持体と反対側にも塗布した。The same layer structure was applied to the opposite side of the support.
塗布は押し出し酸塗布で行なった。The coating was done by extrusion and acid coating.
得られた試料について実施例1で行なったと同じ様にス
タチックマーク、画像ムラ、定着液汚染性及び塗布ブツ
についてテストした。現像、定着及び水洗は現像液中に
グルタルアルデヒド5g、定着液中に硫酸アルミニウム
カリウム塩10gを加える以外は、実施例1と全く同様
にして行なった。The obtained sample was tested in the same manner as in Example 1 for static marks, image unevenness, fixer staining, and coating spots. Development, fixing and washing were carried out in the same manner as in Example 1, except that 5 g of glutaraldehyde was added to the developer and 10 g of aluminum potassium sulfate was added to the fixer.
その結果を表2に記す。The results are shown in Table 2.
上記表2の結果からも明らかなようにスタチックマーク
、画像ムラ、定着液汚染性、塗布性すべてを満足するの
は本発明の化合物のみであった。As is clear from the results in Table 2 above, only the compounds of the present invention satisfied all of the requirements for static marks, image unevenness, fixer staining, and coating properties.
(発明の効果)
以上に述へたように、本発明により、すなわち帯電防止
剤として一般式CI)で示される環状フォスフアゼン化
合物を写真感光材料に添加することで、現像処理液の汚
染を起こさず、また現像処理時に画像ムラを起こさない
、更には塗布性能の泉好な帯電防止されたハロゲン化銀
写真感光材料を提供することができる。(Effects of the Invention) As described above, according to the present invention, by adding the cyclic phosphazene compound represented by the general formula CI) as an antistatic agent to a photographic light-sensitive material, contamination of the developing processing solution does not occur. Furthermore, it is possible to provide an antistatic silver halide photographic material that does not cause image unevenness during development processing and has good coating performance.
Claims (2)
乳剤層を有する写真感光材料において、該写真感光材料
の構成層の少なくとも一層に、下記一般式〔 I 〕で表
される環状フォスファゼン化合物を含有することを特徴
とするハロゲン化銀写真感光材料。 一般式〔 I 〕 ▲数式、化学式、表等があります▼ 式中R^1およびR^4は同じであっても異なっていて
もよく炭素数2ないし20のアルキル基、アルケニル基
、アルキニル基、アリール基を表わす。 これらの置換基は別の置換基で置換されていてもよい。 R^2およびR^3は同じであっても異なっていてもよ
い炭素数1〜4のアルキル基を表わす。 pおよびsは0ないし50の整数を表し、同じであって
も異なっていてもよい。但し、pおよびsは同時に0と
はならない。qおよびrは0ないし5の整数を表し、同
じであっても異なっていてもよい。但しqおよびrは同
時に0とはならない。 xは3もしくは4を表わす。(1) In a photographic material having at least one photosensitive silver halide emulsion layer on a support, a cyclic phosphazene compound represented by the following general formula [I] is added to at least one of the constituent layers of the photographic material. A silver halide photographic material comprising: General formula [I] ▲There are mathematical formulas, chemical formulas, tables, etc.▼ In the formula, R^1 and R^4 may be the same or different and are an alkyl group, alkenyl group, alkynyl group, having 2 to 20 carbon atoms, Represents an aryl group. These substituents may be substituted with another substituent. R^2 and R^3 represent an alkyl group having 1 to 4 carbon atoms, which may be the same or different. p and s represent integers from 0 to 50, and may be the same or different. However, p and s do not become 0 at the same time. q and r represent integers from 0 to 5, and may be the same or different. However, q and r do not become 0 at the same time. x represents 3 or 4.
〕で表される環状フォスファゼン化合物と、周期律表
I a又はIIa族に属する金属イオンの塩を含有すること
を特徴とする特許請求の範囲第1項記載のハロゲン化銀
写真感光材料。(2) In one layer of the constituent layers of the photosensitive material, the general formula [I
] and the periodic table of cyclic phosphazene compounds represented by
2. The silver halide photographic material according to claim 1, which contains a salt of a metal ion belonging to Group Ia or Group IIa.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP27357090A JPH04149433A (en) | 1990-10-12 | 1990-10-12 | Silver halide photosensitive material |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP27357090A JPH04149433A (en) | 1990-10-12 | 1990-10-12 | Silver halide photosensitive material |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH04149433A true JPH04149433A (en) | 1992-05-22 |
Family
ID=17529650
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP27357090A Pending JPH04149433A (en) | 1990-10-12 | 1990-10-12 | Silver halide photosensitive material |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH04149433A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0834768A1 (en) * | 1996-10-02 | 1998-04-08 | Konica Corporation | Method for processing silver halide photographic light-sensitive material |
-
1990
- 1990-10-12 JP JP27357090A patent/JPH04149433A/en active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0834768A1 (en) * | 1996-10-02 | 1998-04-08 | Konica Corporation | Method for processing silver halide photographic light-sensitive material |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JPS62109044A (en) | Silver halide photographic sensitive material | |
| US4956270A (en) | Silver halide photographic material having improved antistatic and antiblocking properties | |
| GB2062271A (en) | Silver halide photographic light-sensitive elements | |
| US4943520A (en) | Silver halide photographic material containing antistatic agents | |
| JPS61143750A (en) | Silver halide photographic sensitive material | |
| US5153115A (en) | Silver halide photographic materials and method for manufacture thereof | |
| JPH04149433A (en) | Silver halide photosensitive material | |
| US4407937A (en) | Silver halide photographic sensitive element containing a fluorine containing compound as an antistatic agent | |
| JPH02311842A (en) | Silver halide photographic sensitive material | |
| JP2588749B2 (en) | Silver halide photographic material | |
| JPH01260437A (en) | Silver halide photographic sensitive material | |
| JPH02301749A (en) | Silver halide photographic sensitive material | |
| JPH02293844A (en) | Silver halide photographic sensitive material | |
| JPH02293741A (en) | Silver halide photographic sensitive material | |
| JPH035749A (en) | Silver halide photographic sensitive material and production thereof | |
| JPH02256048A (en) | Antistatic silver halide photographic sensitive material | |
| JPH02301748A (en) | Silver halide photographic sensitive material | |
| JPH02293843A (en) | Silver halide photographic sensitive material | |
| JPH0254248A (en) | Production of silver halide photographic emulsion | |
| US5108885A (en) | Silver halide photographic material containing crosslinked polymer | |
| JPH02304553A (en) | Silver halide photographic sensitive material | |
| JPH02300746A (en) | Silver halide photographic sensitive material | |
| JPH02301750A (en) | Silver halide photographic sensitive material | |
| JPH04217240A (en) | Silver halide photosensitive material | |
| JPH02308246A (en) | Silver halide photographic sensitive material |