JPH0242067U - - Google Patents
Info
- Publication number
- JPH0242067U JPH0242067U JP12227388U JP12227388U JPH0242067U JP H0242067 U JPH0242067 U JP H0242067U JP 12227388 U JP12227388 U JP 12227388U JP 12227388 U JP12227388 U JP 12227388U JP H0242067 U JPH0242067 U JP H0242067U
- Authority
- JP
- Japan
- Prior art keywords
- nozzle
- high frequency
- vertically movable
- showing
- view
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000012495 reaction gas Substances 0.000 claims description 3
- 239000003575 carbonaceous material Substances 0.000 claims description 2
- 239000007789 gas Substances 0.000 description 3
- 239000000498 cooling water Substances 0.000 description 2
- 239000012159 carrier gas Substances 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Crystals, And After-Treatments Of Crystals (AREA)
Description
第１図はこの考案を構成する上下可動ノズルの
実施例を示した一部切欠縦断面図、第２図は第１
図と別の実施態様を示した一部切欠縦断面図であ
る。第３図は高周波プラズマトーチを示した概略
説明図である。第４図は高周波プラズマトーチに
セツトされる従来のノズル筒を示した側面図、第
５図は第４図の上面図である。第６図は従来構造
の上下可動ノズルを示した縦断面図である。
１……高周波電源、２……ワークコイル、３…
…反応ガス供給装置、４，５，６，７……バルブ
、８……ノズル筒、９……基体、１０……支持具
、１１……排気装置、１２……プラズマ発生室、
１３……反応ガス導入管、１４……冷却水導入管
、１４′……冷却水導出管、１５……外筒、１６
……上下可動ノズル、１７……シーガス孔、１８
……ラジアルガス孔、１９……アクシヤルガス孔
、２０……キヤリアガス用孔、２１……二重管水
冷ジヤケツト、２２……スエジロツク、２３……
中空円筒ノズル部位、２４……炭素質材料、２５
……基幹部。
Fig. 1 is a partially cutaway vertical sectional view showing an embodiment of the vertically movable nozzle constituting this invention, and Fig.
FIG. 3 is a partially cutaway vertical cross-sectional view showing an embodiment different from the one shown in FIG. FIG. 3 is a schematic explanatory diagram showing a high frequency plasma torch. FIG. 4 is a side view showing a conventional nozzle tube set in a high frequency plasma torch, and FIG. 5 is a top view of FIG. FIG. 6 is a vertical sectional view showing a vertically movable nozzle of a conventional structure. 1... High frequency power supply, 2... Work coil, 3...
... Reaction gas supply device, 4, 5, 6, 7 ... Valve, 8 ... Nozzle tube, 9 ... Base, 10 ... Support, 11 ... Exhaust device, 12 ... Plasma generation chamber,
13...Reaction gas introduction pipe, 14...Cooling water introduction pipe, 14'...Cooling water outlet pipe, 15...Outer cylinder, 16
... Vertically movable nozzle, 17 ... Sea gas hole, 18
... Radial gas hole, 19 ... Axial gas hole, 20 ... Carrier gas hole, 21 ... Double pipe water cooling jacket, 22 ... Swage lock, 23 ...
Hollow cylindrical nozzle part, 24... Carbonaceous material, 25
...Key personnel.
Claims (1)
給するための複重管構造を有するノズル筒８にお
いて、中心部に位置する上下可動ノズル１６の少
なくとも先端部分を炭素質材料により構成してな
る高周波プラズマトーチ用ノズル。 In a nozzle tube 8 having a double-pipe structure installed at the upper end of a torch to supply a reaction gas into the system, at least the tip portion of a vertically movable nozzle 16 located at the center is made of a carbonaceous material. Nozzle for high frequency plasma torch.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1988122273U JPH0527504Y2 (en) | 1988-09-19 | 1988-09-19 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1988122273U JPH0527504Y2 (en) | 1988-09-19 | 1988-09-19 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0242067U true JPH0242067U (en) | 1990-03-23 |
| JPH0527504Y2 JPH0527504Y2 (en) | 1993-07-13 |
Family
ID=31370050
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1988122273U Expired - Lifetime JPH0527504Y2 (en) | 1988-09-19 | 1988-09-19 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0527504Y2 (en) |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5767017A (en) * | 1980-10-09 | 1982-04-23 | Nippon Telegr & Teleph Corp <Ntt> | Manufacture of thin silicon film |
| JPS59184519A (en) * | 1983-04-05 | 1984-10-19 | Agency Of Ind Science & Technol | Method for generating ionized cluster beam and device therefor |
-
1988
- 1988-09-19 JP JP1988122273U patent/JPH0527504Y2/ja not_active Expired - Lifetime
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5767017A (en) * | 1980-10-09 | 1982-04-23 | Nippon Telegr & Teleph Corp <Ntt> | Manufacture of thin silicon film |
| JPS59184519A (en) * | 1983-04-05 | 1984-10-19 | Agency Of Ind Science & Technol | Method for generating ionized cluster beam and device therefor |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0527504Y2 (en) | 1993-07-13 |