JPH024258A - Negative photosensitive printing plate - Google Patents
Negative photosensitive printing plateInfo
- Publication number
- JPH024258A JPH024258A JP15271888A JP15271888A JPH024258A JP H024258 A JPH024258 A JP H024258A JP 15271888 A JP15271888 A JP 15271888A JP 15271888 A JP15271888 A JP 15271888A JP H024258 A JPH024258 A JP H024258A
- Authority
- JP
- Japan
- Prior art keywords
- acid
- group
- printing plate
- coupling agent
- photosensitive
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000007639 printing Methods 0.000 title claims abstract description 29
- 229920005989 resin Polymers 0.000 claims abstract description 36
- 239000011347 resin Substances 0.000 claims abstract description 36
- 125000000664 diazo group Chemical group [N-]=[N+]=[*] 0.000 claims abstract description 33
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims abstract description 25
- 239000006087 Silane Coupling Agent Substances 0.000 claims abstract description 13
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims abstract description 11
- 239000007822 coupling agent Substances 0.000 claims abstract description 9
- -1 aromatic diazonium compound Chemical class 0.000 claims description 31
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 claims description 15
- 239000010936 titanium Substances 0.000 claims description 5
- 229910052719 titanium Inorganic materials 0.000 claims description 5
- 125000000962 organic group Chemical group 0.000 claims description 3
- 239000000470 constituent Substances 0.000 claims description 2
- 125000003118 aryl group Chemical group 0.000 abstract description 12
- 239000011230 binding agent Substances 0.000 abstract description 5
- 239000012954 diazonium Substances 0.000 abstract description 5
- 230000035945 sensitivity Effects 0.000 abstract description 5
- 239000000126 substance Substances 0.000 abstract description 5
- IJGRMHOSHXDMSA-UHFFFAOYSA-O diazynium Chemical compound [NH+]#N IJGRMHOSHXDMSA-UHFFFAOYSA-O 0.000 abstract 1
- 125000000896 monocarboxylic acid group Chemical group 0.000 abstract 1
- 239000000178 monomer Substances 0.000 description 18
- 150000001875 compounds Chemical class 0.000 description 15
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 13
- 229920001577 copolymer Polymers 0.000 description 12
- 229920000642 polymer Polymers 0.000 description 12
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 10
- 239000000203 mixture Substances 0.000 description 10
- 238000011282 treatment Methods 0.000 description 10
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 9
- 150000001491 aromatic compounds Chemical class 0.000 description 9
- WPYMKLBDIGXBTP-UHFFFAOYSA-N benzoic acid Chemical compound OC(=O)C1=CC=CC=C1 WPYMKLBDIGXBTP-UHFFFAOYSA-N 0.000 description 9
- 125000004432 carbon atom Chemical group C* 0.000 description 9
- 238000000034 method Methods 0.000 description 9
- HRPVXLWXLXDGHG-UHFFFAOYSA-N Acrylamide Chemical compound NC(=O)C=C HRPVXLWXLXDGHG-UHFFFAOYSA-N 0.000 description 8
- BAPJBEWLBFYGME-UHFFFAOYSA-N Methyl acrylate Chemical compound COC(=O)C=C BAPJBEWLBFYGME-UHFFFAOYSA-N 0.000 description 8
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 8
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 8
- 239000002253 acid Substances 0.000 description 8
- 229910052782 aluminium Inorganic materials 0.000 description 8
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 8
- 238000000576 coating method Methods 0.000 description 8
- FJKROLUGYXJWQN-UHFFFAOYSA-N papa-hydroxy-benzoic acid Natural products OC(=O)C1=CC=C(O)C=C1 FJKROLUGYXJWQN-UHFFFAOYSA-N 0.000 description 8
- 239000000243 solution Substances 0.000 description 8
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical group [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 7
- 239000003795 chemical substances by application Substances 0.000 description 7
- 239000011248 coating agent Substances 0.000 description 7
- 229910052710 silicon Inorganic materials 0.000 description 7
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 6
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 6
- 239000005711 Benzoic acid Substances 0.000 description 6
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 6
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 5
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 5
- 239000007864 aqueous solution Substances 0.000 description 5
- LNTHITQWFMADLM-UHFFFAOYSA-N gallic acid Chemical compound OC(=O)C1=CC(O)=C(O)C(O)=C1 LNTHITQWFMADLM-UHFFFAOYSA-N 0.000 description 5
- 125000005647 linker group Chemical group 0.000 description 5
- 235000011007 phosphoric acid Nutrition 0.000 description 5
- LULAYUGMBFYYEX-UHFFFAOYSA-N 3-chlorobenzoic acid Chemical compound OC(=O)C1=CC=CC(Cl)=C1 LULAYUGMBFYYEX-UHFFFAOYSA-N 0.000 description 4
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 4
- 150000003926 acrylamides Chemical class 0.000 description 4
- 125000000217 alkyl group Chemical group 0.000 description 4
- 125000002947 alkylene group Chemical group 0.000 description 4
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 4
- 235000010233 benzoic acid Nutrition 0.000 description 4
- 229940074391 gallic acid Drugs 0.000 description 4
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 4
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 4
- 239000002244 precipitate Substances 0.000 description 4
- YGSDEFSMJLZEOE-UHFFFAOYSA-N salicylic acid Chemical compound OC(=O)C1=CC=CC=C1O YGSDEFSMJLZEOE-UHFFFAOYSA-N 0.000 description 4
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 3
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- 229940090248 4-hydroxybenzoic acid Drugs 0.000 description 3
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- NLHHRLWOUZZQLW-UHFFFAOYSA-N Acrylonitrile Chemical compound C=CC#N NLHHRLWOUZZQLW-UHFFFAOYSA-N 0.000 description 3
- WVDDGKGOMKODPV-UHFFFAOYSA-N Benzyl alcohol Chemical compound OCC1=CC=CC=C1 WVDDGKGOMKODPV-UHFFFAOYSA-N 0.000 description 3
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 3
- CERQOIWHTDAKMF-UHFFFAOYSA-M Methacrylate Chemical compound CC(=C)C([O-])=O CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 description 3
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 3
- 229930040373 Paraformaldehyde Natural products 0.000 description 3
- OFOBLEOULBTSOW-UHFFFAOYSA-N Propanedioic acid Natural products OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- 230000001476 alcoholic effect Effects 0.000 description 3
- 150000001299 aldehydes Chemical class 0.000 description 3
- 125000003545 alkoxy group Chemical group 0.000 description 3
- 150000001450 anions Chemical class 0.000 description 3
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 description 3
- 238000001816 cooling Methods 0.000 description 3
- 239000000975 dye Substances 0.000 description 3
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 3
- 235000004515 gallic acid Nutrition 0.000 description 3
- 150000002576 ketones Chemical class 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 229910001507 metal halide Inorganic materials 0.000 description 3
- 150000005309 metal halides Chemical class 0.000 description 3
- FQPSGWSUVKBHSU-UHFFFAOYSA-N methacrylamide Chemical class CC(=C)C(N)=O FQPSGWSUVKBHSU-UHFFFAOYSA-N 0.000 description 3
- 125000005395 methacrylic acid group Chemical group 0.000 description 3
- 229910017604 nitric acid Inorganic materials 0.000 description 3
- 239000003921 oil Substances 0.000 description 3
- 239000003960 organic solvent Substances 0.000 description 3
- RPQRDASANLAFCM-UHFFFAOYSA-N oxiran-2-ylmethyl prop-2-enoate Chemical compound C=CC(=O)OCC1CO1 RPQRDASANLAFCM-UHFFFAOYSA-N 0.000 description 3
- ATGUVEKSASEFFO-UHFFFAOYSA-N p-aminodiphenylamine Chemical compound C1=CC(N)=CC=C1NC1=CC=CC=C1 ATGUVEKSASEFFO-UHFFFAOYSA-N 0.000 description 3
- 229920002866 paraformaldehyde Polymers 0.000 description 3
- 239000007787 solid Substances 0.000 description 3
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 3
- UZKWTJUDCOPSNM-UHFFFAOYSA-N 1-ethenoxybutane Chemical compound CCCCOC=C UZKWTJUDCOPSNM-UHFFFAOYSA-N 0.000 description 2
- JLIDVCMBCGBIEY-UHFFFAOYSA-N 1-penten-3-one Chemical compound CCC(=O)C=C JLIDVCMBCGBIEY-UHFFFAOYSA-N 0.000 description 2
- GPVDHNVGGIAOQT-UHFFFAOYSA-N 2,4-dimethoxybenzoic acid Chemical compound COC1=CC=C(C(O)=O)C(OC)=C1 GPVDHNVGGIAOQT-UHFFFAOYSA-N 0.000 description 2
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 2
- WHBAYNMEIXUTJV-UHFFFAOYSA-N 2-chloroethyl prop-2-enoate Chemical compound ClCCOC(=O)C=C WHBAYNMEIXUTJV-UHFFFAOYSA-N 0.000 description 2
- 125000000954 2-hydroxyethyl group Chemical group [H]C([*])([H])C([H])([H])O[H] 0.000 description 2
- OMIGHNLMNHATMP-UHFFFAOYSA-N 2-hydroxyethyl prop-2-enoate Chemical compound OCCOC(=O)C=C OMIGHNLMNHATMP-UHFFFAOYSA-N 0.000 description 2
- XLLIQLLCWZCATF-UHFFFAOYSA-N 2-methoxyethyl acetate Chemical compound COCCOC(C)=O XLLIQLLCWZCATF-UHFFFAOYSA-N 0.000 description 2
- TXFPEBPIARQUIG-UHFFFAOYSA-N 4'-hydroxyacetophenone Chemical compound CC(=O)C1=CC=C(O)C=C1 TXFPEBPIARQUIG-UHFFFAOYSA-N 0.000 description 2
- JLBJTVDPSNHSKJ-UHFFFAOYSA-N 4-Methylstyrene Chemical compound CC1=CC=C(C=C)C=C1 JLBJTVDPSNHSKJ-UHFFFAOYSA-N 0.000 description 2
- BBMFSGOFUHEVNP-UHFFFAOYSA-N 4-hydroxy-2-methylbenzoic acid Chemical compound CC1=CC(O)=CC=C1C(O)=O BBMFSGOFUHEVNP-UHFFFAOYSA-N 0.000 description 2
- ZEYHEAKUIGZSGI-UHFFFAOYSA-N 4-methoxybenzoic acid Chemical compound COC1=CC=C(C(O)=O)C=C1 ZEYHEAKUIGZSGI-UHFFFAOYSA-N 0.000 description 2
- HCJMNOSIAGSZBM-UHFFFAOYSA-N 6-methylsalicylic acid Chemical compound CC1=CC=CC(O)=C1C(O)=O HCJMNOSIAGSZBM-UHFFFAOYSA-N 0.000 description 2
- LRFVTYWOQMYALW-UHFFFAOYSA-N 9H-xanthine Chemical compound O=C1NC(=O)NC2=C1NC=N2 LRFVTYWOQMYALW-UHFFFAOYSA-N 0.000 description 2
- KWOLFJPFCHCOCG-UHFFFAOYSA-N Acetophenone Chemical compound CC(=O)C1=CC=CC=C1 KWOLFJPFCHCOCG-UHFFFAOYSA-N 0.000 description 2
- KAKZBPTYRLMSJV-UHFFFAOYSA-N Butadiene Chemical compound C=CC=C KAKZBPTYRLMSJV-UHFFFAOYSA-N 0.000 description 2
- SOGAXMICEFXMKE-UHFFFAOYSA-N Butylmethacrylate Chemical compound CCCCOC(=O)C(C)=C SOGAXMICEFXMKE-UHFFFAOYSA-N 0.000 description 2
- KCXZNSGUUQJJTR-UHFFFAOYSA-N Di-n-hexyl phthalate Chemical compound CCCCCCOC(=O)C1=CC=CC=C1C(=O)OCCCCCC KCXZNSGUUQJJTR-UHFFFAOYSA-N 0.000 description 2
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 2
- JIGUQPWFLRLWPJ-UHFFFAOYSA-N Ethyl acrylate Chemical compound CCOC(=O)C=C JIGUQPWFLRLWPJ-UHFFFAOYSA-N 0.000 description 2
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 description 2
- RRHGJUQNOFWUDK-UHFFFAOYSA-N Isoprene Chemical compound CC(=C)C=C RRHGJUQNOFWUDK-UHFFFAOYSA-N 0.000 description 2
- AFVFQIVMOAPDHO-UHFFFAOYSA-N Methanesulfonic acid Chemical compound CS(O)(=O)=O AFVFQIVMOAPDHO-UHFFFAOYSA-N 0.000 description 2
- 239000004115 Sodium Silicate Substances 0.000 description 2
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 2
- KKEYFWRCBNTPAC-UHFFFAOYSA-N Terephthalic acid Chemical compound OC(=O)C1=CC=C(C(O)=O)C=C1 KKEYFWRCBNTPAC-UHFFFAOYSA-N 0.000 description 2
- ZFOZVQLOBQUTQQ-UHFFFAOYSA-N Tributyl citrate Chemical compound CCCCOC(=O)CC(O)(C(=O)OCCCC)CC(=O)OCCCC ZFOZVQLOBQUTQQ-UHFFFAOYSA-N 0.000 description 2
- WGLPBDUCMAPZCE-UHFFFAOYSA-N Trioxochromium Chemical compound O=[Cr](=O)=O WGLPBDUCMAPZCE-UHFFFAOYSA-N 0.000 description 2
- UMHKOAYRTRADAT-UHFFFAOYSA-N [hydroxy(octoxy)phosphoryl] octyl hydrogen phosphate Chemical compound CCCCCCCCOP(O)(=O)OP(O)(=O)OCCCCCCCC UMHKOAYRTRADAT-UHFFFAOYSA-N 0.000 description 2
- 125000004423 acyloxy group Chemical group 0.000 description 2
- 239000003513 alkali Substances 0.000 description 2
- 150000003868 ammonium compounds Chemical group 0.000 description 2
- 238000007743 anodising Methods 0.000 description 2
- 125000004429 atom Chemical group 0.000 description 2
- HUMNYLRZRPPJDN-UHFFFAOYSA-N benzaldehyde Chemical compound O=CC1=CC=CC=C1 HUMNYLRZRPPJDN-UHFFFAOYSA-N 0.000 description 2
- SRSXLGNVWSONIS-UHFFFAOYSA-N benzenesulfonic acid Chemical compound OS(=O)(=O)C1=CC=CC=C1 SRSXLGNVWSONIS-UHFFFAOYSA-N 0.000 description 2
- 229940092714 benzenesulfonic acid Drugs 0.000 description 2
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 2
- FUSUHKVFWTUUBE-UHFFFAOYSA-N buten-2-one Chemical compound CC(=O)C=C FUSUHKVFWTUUBE-UHFFFAOYSA-N 0.000 description 2
- CQEYYJKEWSMYFG-UHFFFAOYSA-N butyl acrylate Chemical compound CCCCOC(=O)C=C CQEYYJKEWSMYFG-UHFFFAOYSA-N 0.000 description 2
- 229910052799 carbon Inorganic materials 0.000 description 2
- 150000001732 carboxylic acid derivatives Chemical class 0.000 description 2
- YCIMNLLNPGFGHC-UHFFFAOYSA-N catechol Chemical compound OC1=CC=CC=C1O YCIMNLLNPGFGHC-UHFFFAOYSA-N 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 238000009833 condensation Methods 0.000 description 2
- 230000005494 condensation Effects 0.000 description 2
- 125000004093 cyano group Chemical group *C#N 0.000 description 2
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 2
- 150000001989 diazonium salts Chemical class 0.000 description 2
- DOIRQSBPFJWKBE-UHFFFAOYSA-N dibutyl phthalate Chemical compound CCCCOC(=O)C1=CC=CC=C1C(=O)OCCCC DOIRQSBPFJWKBE-UHFFFAOYSA-N 0.000 description 2
- FLKPEMZONWLCSK-UHFFFAOYSA-N diethyl phthalate Chemical compound CCOC(=O)C1=CC=CC=C1C(=O)OCC FLKPEMZONWLCSK-UHFFFAOYSA-N 0.000 description 2
- DMBHHRLKUKUOEG-UHFFFAOYSA-N diphenylamine Chemical compound C=1C=CC=CC=1NC1=CC=CC=C1 DMBHHRLKUKUOEG-UHFFFAOYSA-N 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- 239000008151 electrolyte solution Substances 0.000 description 2
- FJKIXWOMBXYWOQ-UHFFFAOYSA-N ethenoxyethane Chemical compound CCOC=C FJKIXWOMBXYWOQ-UHFFFAOYSA-N 0.000 description 2
- SUPCQIBBMFXVTL-UHFFFAOYSA-N ethyl 2-methylprop-2-enoate Chemical compound CCOC(=O)C(C)=C SUPCQIBBMFXVTL-UHFFFAOYSA-N 0.000 description 2
- VOZRXNHHFUQHIL-UHFFFAOYSA-N glycidyl methacrylate Chemical compound CC(=C)C(=O)OCC1CO1 VOZRXNHHFUQHIL-UHFFFAOYSA-N 0.000 description 2
- JTHNLKXLWOXOQK-UHFFFAOYSA-N hex-1-en-3-one Chemical compound CCCC(=O)C=C JTHNLKXLWOXOQK-UHFFFAOYSA-N 0.000 description 2
- LNMQRPPRQDGUDR-UHFFFAOYSA-N hexyl prop-2-enoate Chemical compound CCCCCCOC(=O)C=C LNMQRPPRQDGUDR-UHFFFAOYSA-N 0.000 description 2
- 229910052740 iodine Inorganic materials 0.000 description 2
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 2
- 229910052753 mercury Inorganic materials 0.000 description 2
- ZWLPBLYKEWSWPD-UHFFFAOYSA-N o-toluic acid Chemical compound CC1=CC=CC=C1C(O)=O ZWLPBLYKEWSWPD-UHFFFAOYSA-N 0.000 description 2
- 229940065472 octyl acrylate Drugs 0.000 description 2
- ANISOHQJBAQUQP-UHFFFAOYSA-N octyl prop-2-enoate Chemical compound CCCCCCCCOC(=O)C=C ANISOHQJBAQUQP-UHFFFAOYSA-N 0.000 description 2
- 235000006408 oxalic acid Nutrition 0.000 description 2
- BVJSUAQZOZWCKN-UHFFFAOYSA-N p-hydroxybenzyl alcohol Chemical compound OCC1=CC=C(O)C=C1 BVJSUAQZOZWCKN-UHFFFAOYSA-N 0.000 description 2
- GYDSPAVLTMAXHT-UHFFFAOYSA-N pentyl 2-methylprop-2-enoate Chemical compound CCCCCOC(=O)C(C)=C GYDSPAVLTMAXHT-UHFFFAOYSA-N 0.000 description 2
- ULDDEWDFUNBUCM-UHFFFAOYSA-N pentyl prop-2-enoate Chemical compound CCCCCOC(=O)C=C ULDDEWDFUNBUCM-UHFFFAOYSA-N 0.000 description 2
- PNJWIWWMYCMZRO-UHFFFAOYSA-N pent‐4‐en‐2‐one Natural products CC(=O)CC=C PNJWIWWMYCMZRO-UHFFFAOYSA-N 0.000 description 2
- LCPDWSOZIOUXRV-UHFFFAOYSA-N phenoxyacetic acid Chemical compound OC(=O)COC1=CC=CC=C1 LCPDWSOZIOUXRV-UHFFFAOYSA-N 0.000 description 2
- XNGIFLGASWRNHJ-UHFFFAOYSA-N phthalic acid Chemical compound OC(=O)C1=CC=CC=C1C(O)=O XNGIFLGASWRNHJ-UHFFFAOYSA-N 0.000 description 2
- 239000004014 plasticizer Substances 0.000 description 2
- 239000011148 porous material Substances 0.000 description 2
- PNXMTCDJUBJHQJ-UHFFFAOYSA-N propyl prop-2-enoate Chemical compound CCCOC(=O)C=C PNXMTCDJUBJHQJ-UHFFFAOYSA-N 0.000 description 2
- WQGWDDDVZFFDIG-UHFFFAOYSA-N pyrogallol Chemical compound OC1=CC=CC(O)=C1O WQGWDDDVZFFDIG-UHFFFAOYSA-N 0.000 description 2
- 238000007788 roughening Methods 0.000 description 2
- 229960004889 salicylic acid Drugs 0.000 description 2
- 150000003839 salts Chemical class 0.000 description 2
- NTHWMYGWWRZVTN-UHFFFAOYSA-N sodium silicate Chemical compound [Na+].[Na+].[O-][Si]([O-])=O NTHWMYGWWRZVTN-UHFFFAOYSA-N 0.000 description 2
- 229910052911 sodium silicate Inorganic materials 0.000 description 2
- PNGLEYLFMHGIQO-UHFFFAOYSA-M sodium;3-(n-ethyl-3-methoxyanilino)-2-hydroxypropane-1-sulfonate;dihydrate Chemical compound O.O.[Na+].[O-]S(=O)(=O)CC(O)CN(CC)C1=CC=CC(OC)=C1 PNGLEYLFMHGIQO-UHFFFAOYSA-M 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- 125000001424 substituent group Chemical group 0.000 description 2
- ISXSCDLOGDJUNJ-UHFFFAOYSA-N tert-butyl prop-2-enoate Chemical compound CC(C)(C)OC(=O)C=C ISXSCDLOGDJUNJ-UHFFFAOYSA-N 0.000 description 2
- 238000005406 washing Methods 0.000 description 2
- JIAARYAFYJHUJI-UHFFFAOYSA-L zinc dichloride Chemical compound [Cl-].[Cl-].[Zn+2] JIAARYAFYJHUJI-UHFFFAOYSA-L 0.000 description 2
- CROCAQYJJNCZQH-UHFFFAOYSA-N (2,6-dihydroxyphenyl)acetic acid Chemical compound OC(=O)CC1=C(O)C=CC=C1O CROCAQYJJNCZQH-UHFFFAOYSA-N 0.000 description 1
- WYTZZXDRDKSJID-UHFFFAOYSA-N (3-aminopropyl)triethoxysilane Chemical compound CCO[Si](OCC)(OCC)CCCN WYTZZXDRDKSJID-UHFFFAOYSA-N 0.000 description 1
- NIUHGYUFFPSEOW-UHFFFAOYSA-N (4-hydroxyphenyl) prop-2-enoate Chemical compound OC1=CC=C(OC(=O)C=C)C=C1 NIUHGYUFFPSEOW-UHFFFAOYSA-N 0.000 description 1
- ISBHMJZRKAFTGE-ONEGZZNKSA-N (e)-pent-2-enenitrile Chemical compound CC\C=C\C#N ISBHMJZRKAFTGE-ONEGZZNKSA-N 0.000 description 1
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- BJQHLKABXJIVAM-UHFFFAOYSA-N bis(2-ethylhexyl) phthalate Chemical compound CCCCC(CC)COC(=O)C1=CC=CC=C1C(=O)OCC(CC)CCCC BJQHLKABXJIVAM-UHFFFAOYSA-N 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- 150000001721 carbon Chemical group 0.000 description 1
- 150000001735 carboxylic acids Chemical class 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 229910001914 chlorine tetroxide Inorganic materials 0.000 description 1
- 125000001309 chloro group Chemical group Cl* 0.000 description 1
- 125000004218 chloromethyl group Chemical group [H]C([H])(Cl)* 0.000 description 1
- KRVSOGSZCMJSLX-UHFFFAOYSA-L chromic acid Substances O[Cr](O)(=O)=O KRVSOGSZCMJSLX-UHFFFAOYSA-L 0.000 description 1
- 229910000423 chromium oxide Inorganic materials 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 238000007334 copolymerization reaction Methods 0.000 description 1
- 229930003836 cresol Natural products 0.000 description 1
- 238000004132 cross linking Methods 0.000 description 1
- 238000007766 curtain coating Methods 0.000 description 1
- OIWOHHBRDFKZNC-UHFFFAOYSA-N cyclohexyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OC1CCCCC1 OIWOHHBRDFKZNC-UHFFFAOYSA-N 0.000 description 1
- SOCTUWSJJQCPFX-UHFFFAOYSA-N dichromate(2-) Chemical compound [O-][Cr](=O)(=O)O[Cr]([O-])(=O)=O SOCTUWSJJQCPFX-UHFFFAOYSA-N 0.000 description 1
- COVFEVWNJUOYRL-UHFFFAOYSA-N digallic acid Chemical compound OC(=O)C1=CC(O)=C(O)C(OC(=O)C=2C=C(O)C(O)=C(O)C=2)=C1 COVFEVWNJUOYRL-UHFFFAOYSA-N 0.000 description 1
- WMYWOWFOOVUPFY-UHFFFAOYSA-L dihydroxy(dioxo)chromium;phosphoric acid Chemical compound OP(O)(O)=O.O[Cr](O)(=O)=O WMYWOWFOOVUPFY-UHFFFAOYSA-L 0.000 description 1
- 238000010790 dilution Methods 0.000 description 1
- 239000012895 dilution Substances 0.000 description 1
- PFKRTWCFCOUBHS-UHFFFAOYSA-N dimethyl(octadecyl)azanium;chloride Chemical group [Cl-].CCCCCCCCCCCCCCCCCC[NH+](C)C PFKRTWCFCOUBHS-UHFFFAOYSA-N 0.000 description 1
- XMQYIPNJVLNWOE-UHFFFAOYSA-N dioctyl hydrogen phosphite Chemical compound CCCCCCCCOP(O)OCCCCCCCC XMQYIPNJVLNWOE-UHFFFAOYSA-N 0.000 description 1
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- 230000000694 effects Effects 0.000 description 1
- 239000003792 electrolyte Substances 0.000 description 1
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- IINNWAYUJNWZRM-UHFFFAOYSA-L erythrosin B Chemical compound [Na+].[Na+].[O-]C(=O)C1=CC=CC=C1C1=C2C=C(I)C(=O)C(I)=C2OC2=C(I)C([O-])=C(I)C=C21 IINNWAYUJNWZRM-UHFFFAOYSA-L 0.000 description 1
- 125000004185 ester group Chemical group 0.000 description 1
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- RTZKZFJDLAIYFH-UHFFFAOYSA-N ether Substances CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 1
- 125000001301 ethoxy group Chemical group [H]C([H])([H])C([H])([H])O* 0.000 description 1
- 229920001249 ethyl cellulose Polymers 0.000 description 1
- 235000019325 ethyl cellulose Nutrition 0.000 description 1
- JVICFMRAVNKDOE-UHFFFAOYSA-M ethyl violet Chemical compound [Cl-].C1=CC(N(CC)CC)=CC=C1C(C=1C=CC(=CC=1)N(CC)CC)=C1C=CC(=[N+](CC)CC)C=C1 JVICFMRAVNKDOE-UHFFFAOYSA-M 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 238000010528 free radical solution polymerization reaction Methods 0.000 description 1
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- 125000005843 halogen group Chemical group 0.000 description 1
- UXVMTJSLLAUFTO-UHFFFAOYSA-M hydrogen sulfate;4-(4-methoxyanilino)benzenediazonium Chemical compound OS([O-])(=O)=O.C1=CC(OC)=CC=C1NC1=CC=C([N+]#N)C=C1 UXVMTJSLLAUFTO-UHFFFAOYSA-M 0.000 description 1
- 230000005660 hydrophilic surface Effects 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-M hydroxide Chemical compound [OH-] XLYOFNOQVPJJNP-UHFFFAOYSA-M 0.000 description 1
- 239000003999 initiator Substances 0.000 description 1
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 150000007517 lewis acids Chemical class 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 229940107698 malachite green Drugs 0.000 description 1
- FDZZZRQASAIRJF-UHFFFAOYSA-M malachite green Chemical compound [Cl-].C1=CC(N(C)C)=CC=C1C(C=1C=CC=CC=1)=C1C=CC(=[N+](C)C)C=C1 FDZZZRQASAIRJF-UHFFFAOYSA-M 0.000 description 1
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 1
- 239000011976 maleic acid Substances 0.000 description 1
- FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical compound O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229940098779 methanesulfonic acid Drugs 0.000 description 1
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 description 1
- 229920000609 methyl cellulose Polymers 0.000 description 1
- DWCZIOOZPIDHAB-UHFFFAOYSA-L methyl green Chemical compound [Cl-].[Cl-].C1=CC(N(C)C)=CC=C1C(C=1C=CC(=CC=1)[N+](C)(C)C)=C1C=CC(=[N+](C)C)C=C1 DWCZIOOZPIDHAB-UHFFFAOYSA-L 0.000 description 1
- 239000001923 methylcellulose Substances 0.000 description 1
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- PHQOGHDTIVQXHL-UHFFFAOYSA-N n'-(3-trimethoxysilylpropyl)ethane-1,2-diamine Chemical compound CO[Si](OC)(OC)CCCNCCN PHQOGHDTIVQXHL-UHFFFAOYSA-N 0.000 description 1
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- XZSZONUJSGDIFI-UHFFFAOYSA-N n-(4-hydroxyphenyl)-2-methylprop-2-enamide Chemical compound CC(=C)C(=O)NC1=CC=C(O)C=C1 XZSZONUJSGDIFI-UHFFFAOYSA-N 0.000 description 1
- POVITWJTUUJBNK-UHFFFAOYSA-N n-(4-hydroxyphenyl)prop-2-enamide Chemical compound OC1=CC=C(NC(=O)C=C)C=C1 POVITWJTUUJBNK-UHFFFAOYSA-N 0.000 description 1
- DNTMQTKDNSEIFO-UHFFFAOYSA-N n-(hydroxymethyl)-2-methylprop-2-enamide Chemical compound CC(=C)C(=O)NCO DNTMQTKDNSEIFO-UHFFFAOYSA-N 0.000 description 1
- PMJFVKWBSWWAKT-UHFFFAOYSA-N n-cyclohexylprop-2-enamide Chemical compound C=CC(=O)NC1CCCCC1 PMJFVKWBSWWAKT-UHFFFAOYSA-N 0.000 description 1
- BNTUIAFSOCHRHV-UHFFFAOYSA-N n-ethyl-n-phenylprop-2-enamide Chemical compound C=CC(=O)N(CC)C1=CC=CC=C1 BNTUIAFSOCHRHV-UHFFFAOYSA-N 0.000 description 1
- SWPMNMYLORDLJE-UHFFFAOYSA-N n-ethylprop-2-enamide Chemical compound CCNC(=O)C=C SWPMNMYLORDLJE-UHFFFAOYSA-N 0.000 description 1
- FYCBGURDLIKBDA-UHFFFAOYSA-N n-hexyl-2-methylprop-2-enamide Chemical compound CCCCCCNC(=O)C(C)=C FYCBGURDLIKBDA-UHFFFAOYSA-N 0.000 description 1
- BPCNEKWROYSOLT-UHFFFAOYSA-N n-phenylprop-2-enamide Chemical compound C=CC(=O)NC1=CC=CC=C1 BPCNEKWROYSOLT-UHFFFAOYSA-N 0.000 description 1
- KKFHAJHLJHVUDM-UHFFFAOYSA-N n-vinylcarbazole Chemical compound C1=CC=C2N(C=C)C3=CC=CC=C3C2=C1 KKFHAJHLJHVUDM-UHFFFAOYSA-N 0.000 description 1
- PSZYNBSKGUBXEH-UHFFFAOYSA-N naphthalene-1-sulfonic acid Chemical compound C1=CC=C2C(S(=O)(=O)O)=CC=CC2=C1 PSZYNBSKGUBXEH-UHFFFAOYSA-N 0.000 description 1
- 125000001624 naphthyl group Chemical group 0.000 description 1
- 239000000025 natural resin Substances 0.000 description 1
- 239000002736 nonionic surfactant Substances 0.000 description 1
- 229920003986 novolac Polymers 0.000 description 1
- 150000007524 organic acids Chemical class 0.000 description 1
- 235000005985 organic acids Nutrition 0.000 description 1
- GIPDEPRRXIBGNF-KTKRTIGZSA-N oxolan-2-ylmethyl (z)-octadec-9-enoate Chemical compound CCCCCCCC\C=C/CCCCCCCC(=O)OCC1CCCO1 GIPDEPRRXIBGNF-KTKRTIGZSA-N 0.000 description 1
- 125000005440 p-toluyl group Chemical group [H]C1=C([H])C(=C([H])C([H])=C1C(*)=O)C([H])([H])[H] 0.000 description 1
- QNGNSVIICDLXHT-UHFFFAOYSA-N para-ethylbenzaldehyde Natural products CCC1=CC=C(C=O)C=C1 QNGNSVIICDLXHT-UHFFFAOYSA-N 0.000 description 1
- UCUUFSAXZMGPGH-UHFFFAOYSA-N penta-1,4-dien-3-one Chemical class C=CC(=O)C=C UCUUFSAXZMGPGH-UHFFFAOYSA-N 0.000 description 1
- VLTRZXGMWDSKGL-UHFFFAOYSA-M perchlorate Chemical compound [O-]Cl(=O)(=O)=O VLTRZXGMWDSKGL-UHFFFAOYSA-M 0.000 description 1
- 229960005323 phenoxyethanol Drugs 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- CMPQUABWPXYYSH-UHFFFAOYSA-N phenyl phosphate Chemical compound OP(O)(=O)OC1=CC=CC=C1 CMPQUABWPXYYSH-UHFFFAOYSA-N 0.000 description 1
- 150000003016 phosphoric acids Chemical class 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 1
- 229920002037 poly(vinyl butyral) polymer Polymers 0.000 description 1
- 239000004584 polyacrylic acid Substances 0.000 description 1
- 229920006122 polyamide resin Polymers 0.000 description 1
- 238000006068 polycondensation reaction Methods 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 229920001223 polyethylene glycol Polymers 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 229920005749 polyurethane resin Polymers 0.000 description 1
- NHARPDSAXCBDDR-UHFFFAOYSA-N propyl 2-methylprop-2-enoate Chemical compound CCCOC(=O)C(C)=C NHARPDSAXCBDDR-UHFFFAOYSA-N 0.000 description 1
- 229940079877 pyrogallol Drugs 0.000 description 1
- 150000003856 quaternary ammonium compounds Chemical group 0.000 description 1
- 239000011541 reaction mixture Substances 0.000 description 1
- GHMLBKRAJCXXBS-UHFFFAOYSA-N resorcinol Chemical compound OC1=CC=CC(O)=C1 GHMLBKRAJCXXBS-UHFFFAOYSA-N 0.000 description 1
- 229960001755 resorcinol Drugs 0.000 description 1
- PYWVYCXTNDRMGF-UHFFFAOYSA-N rhodamine B Chemical compound [Cl-].C=12C=CC(=[N+](CC)CC)C=C2OC2=CC(N(CC)CC)=CC=C2C=1C1=CC=CC=C1C(O)=O PYWVYCXTNDRMGF-UHFFFAOYSA-N 0.000 description 1
- 229940043267 rhodamine b Drugs 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 229910000077 silane Inorganic materials 0.000 description 1
- 235000019795 sodium metasilicate Nutrition 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 239000003381 stabilizer Substances 0.000 description 1
- 238000010186 staining Methods 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 150000003460 sulfonic acids Chemical class 0.000 description 1
- CXVGEDCSTKKODG-UHFFFAOYSA-N sulisobenzone Chemical compound C1=C(S(O)(=O)=O)C(OC)=CC(O)=C1C(=O)C1=CC=CC=C1 CXVGEDCSTKKODG-UHFFFAOYSA-N 0.000 description 1
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- 230000002194 synthesizing effect Effects 0.000 description 1
- 229940033123 tannic acid Drugs 0.000 description 1
- 235000015523 tannic acid Nutrition 0.000 description 1
- 229920002258 tannic acid Polymers 0.000 description 1
- 235000002906 tartaric acid Nutrition 0.000 description 1
- 239000011975 tartaric acid Substances 0.000 description 1
- ISIJQEHRDSCQIU-UHFFFAOYSA-N tert-butyl 2,7-diazaspiro[4.5]decane-7-carboxylate Chemical compound C1N(C(=O)OC(C)(C)C)CCCC11CNCC1 ISIJQEHRDSCQIU-UHFFFAOYSA-N 0.000 description 1
- 229940072958 tetrahydrofurfuryl oleate Drugs 0.000 description 1
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- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 1
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- GQIUQDDJKHLHTB-UHFFFAOYSA-N trichloro(ethenyl)silane Chemical compound Cl[Si](Cl)(Cl)C=C GQIUQDDJKHLHTB-UHFFFAOYSA-N 0.000 description 1
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- DQZNLOXENNXVAD-UHFFFAOYSA-N trimethoxy-[2-(7-oxabicyclo[4.1.0]heptan-4-yl)ethyl]silane Chemical compound C1C(CC[Si](OC)(OC)OC)CCC2OC21 DQZNLOXENNXVAD-UHFFFAOYSA-N 0.000 description 1
- BPSIOYPQMFLKFR-UHFFFAOYSA-N trimethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](OC)(OC)CCCOCC1CO1 BPSIOYPQMFLKFR-UHFFFAOYSA-N 0.000 description 1
- AAAQKTZKLRYKHR-UHFFFAOYSA-N triphenylmethane Chemical compound C1=CC=CC=C1C(C=1C=CC=CC=1)C1=CC=CC=C1 AAAQKTZKLRYKHR-UHFFFAOYSA-N 0.000 description 1
- LLWJPGAKXJBKKA-UHFFFAOYSA-N victoria blue B Chemical compound [Cl-].C1=CC(N(C)C)=CC=C1C(C=1C=CC(=CC=1)N(C)C)=C(C=C1)C2=CC=CC=C2C1=[NH+]C1=CC=CC=C1 LLWJPGAKXJBKKA-UHFFFAOYSA-N 0.000 description 1
- ROVRRJSRRSGUOL-UHFFFAOYSA-N victoria blue bo Chemical compound [Cl-].C12=CC=CC=C2C(NCC)=CC=C1C(C=1C=CC(=CC=1)N(CC)CC)=C1C=CC(=[N+](CC)CC)C=C1 ROVRRJSRRSGUOL-UHFFFAOYSA-N 0.000 description 1
- KOZCZZVUFDCZGG-UHFFFAOYSA-N vinyl benzoate Chemical compound C=COC(=O)C1=CC=CC=C1 KOZCZZVUFDCZGG-UHFFFAOYSA-N 0.000 description 1
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- 150000003739 xylenols Chemical class 0.000 description 1
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Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は、ネガ型感光性印刷版に係り、特に製版および
印刷工程における耐薬品性、UVインキ適性、感度なら
びに現像性に優れたネガ型感光性印刷版に関する。Detailed Description of the Invention [Field of Industrial Application] The present invention relates to a negative-working photosensitive printing plate, particularly a negative-working printing plate that has excellent chemical resistance, UV ink suitability, sensitivity, and developability in plate making and printing processes. Regarding photosensitive printing plates.
ネガ型感光性平版印刷版は、一般にアルミニウム板等の
表面を親水化処理した支持体上に、感光性組成物が塗布
されており、これを、遇明陰画を通して紫外線等の活性
光線により露光すると、露光部においては重合あるいは
架橋が起こり不溶性かつ親油性の膜が形成される。一方
、未露光部を現像液を用いて溶出することにより、親水
性の支持体表面が露呈する。すなわち、水を反発してイ
ンキを受容する画像部と水を受容してインキを反発する
非画像部が得られることになる。Negative-working photosensitive lithographic printing plates generally have a photosensitive composition coated on a support such as an aluminum plate whose surface has been made hydrophilic, and when this is exposed to active light such as ultraviolet rays through a negative image, In the exposed area, polymerization or crosslinking occurs to form an insoluble and lipophilic film. On the other hand, by eluting the unexposed areas using a developer, the hydrophilic surface of the support is exposed. That is, an image area that repels water and receives ink and a non-image area that receives water and repel ink are obtained.
この場合における感光性組成物としては、特にネガ型2
8版では、p−ジアゾジフェニルアミンとホルムアルデ
ヒドとの縮合物などのジアゾ樹脂が広く用いられてきた
。In this case, the photosensitive composition is particularly suitable for negative type 2
In the 8th edition, diazo resins such as the condensate of p-diazodiphenylamine and formaldehyde have been widely used.
また、その高分子量縮合ジアゾ樹脂を使用することは、
特開昭59−78340号公報などによって知られてお
り、さらに特公昭49−48001号公報によって、ジ
アゾ共縮合樹脂を使用することも知られている。In addition, using the high molecular weight condensed diazo resin
It is known from Japanese Patent Application Laid-Open No. 59-78340, and furthermore, it is also known from Japanese Patent Publication No. 49-48001 to use a diazo cocondensation resin.
他方、多数の印刷物を一枚の印刷版にて得るために、画
像部と支持体とが強固に接着するとともに、製版工程お
よび印刷工程において使用される各種薬品に対して耐薬
品性を高めるために、特開昭59−192250号公報
には、支持体と感光層との間にシランカップリング剤を
含有する非感光性中間層を設けることが示されている。On the other hand, in order to obtain a large number of printed materials on a single printing plate, the image area and the support are strongly bonded, and in order to improve the chemical resistance against various chemicals used in the plate-making process and the printing process. Furthermore, JP-A-59-192250 discloses providing a non-photosensitive intermediate layer containing a silane coupling agent between the support and the photosensitive layer.
しかし、上記の縮合ジアゾ樹脂を高分子量化すると、高
感度にはなるけれども、アルカリ難溶性となるため、現
像性が反比例して悪くなる。However, when the above-mentioned condensed diazo resin is made to have a high molecular weight, although it becomes highly sensitive, it becomes poorly soluble in alkali, so the developability deteriorates inversely.
また前記の共縮合ジアゾ樹脂は、現像性に優れるものの
、感度が低い欠点があった。Further, although the above-mentioned co-condensed diazo resin has excellent developability, it has a drawback of low sensitivity.
他方、特開昭59−192250号公報のように、支持
体と感光層との間にシランカップリング剤を有する非感
光性中間層を設けた場合、非画像部に汚れを生じるなど
の欠点がある。On the other hand, when a non-photosensitive intermediate layer containing a silane coupling agent is provided between the support and the photosensitive layer as in JP-A-59-192250, there are drawbacks such as staining in non-image areas. be.
そこで、本発明の主たる目的は、感光層における感度が
高く、現像性および耐剛力に優れ、しかもUVインキ適
性が良好であり、さらに非画像部に汚れのないネガ型感
光性印刷版を提供することにある。Therefore, the main object of the present invention is to provide a negative-working photosensitive printing plate that has high sensitivity in the photosensitive layer, excellent developability and stiffness resistance, good suitability for UV ink, and is free from stains in non-image areas. There is a particular thing.
上記課題は、支持体上に感光層を有するネガ型感光性印
刷版において;前記感光層が、(A) 少くとも1つ
のカルボキシル基、ならびに少くとも1つのヒドロキシ
ル基のうち少くとも一方の有機基を有する芳香族化合物
と、芳香族ジアゾニウム化合物とを構成単位として含む
共縮合ジアゾ樹脂、
(B) シランカフプリング剤お、よびチタンカッ
プリング剤のうち少くとも1種のカンプリング剤、を含
有することで解決できる。The above problem is achieved in a negative-working photosensitive printing plate having a photosensitive layer on a support; the photosensitive layer comprises (A) at least one organic group of at least one carboxyl group and at least one hydroxyl group; a co-condensed diazo resin containing an aromatic compound having an aromatic diazonium compound as a structural unit, (B) a silane cuff pulling agent, and at least one kind of camping agent among a titanium coupling agent. This can be solved.
以下本発明をさらに詳述する。 The present invention will be described in further detail below.
本発明において、ジアゾ樹脂として、少くとも1つのカ
ルボキシル基、ならびに少くとも1つのヒドロキシル基
のうち少くとも一方の有機基を有する芳香族化合物と、
芳香族ジアゾニウム化合物とを構成単位として含む共縮
合ジアゾ樹脂が用いられる。In the present invention, the diazo resin is an aromatic compound having at least one organic group among at least one carboxyl group and at least one hydroxyl group;
A co-condensed diazo resin containing an aromatic diazonium compound as a constituent unit is used.
本発明に係る前記のカルボキシル基およびまたはヒドロ
キシル基を有する芳香族化合物は、少なくとも1つのカ
ルボキシル基で置換された芳香族環およびまたは少なく
とも1つのヒドロキシル基で置換した芳香族環を分子中
に含むものであって、この場合、上記カルボキシル基と
ヒドロキシル基とが同一の芳香族環に置換されていても
よい。The aromatic compound having a carboxyl group and/or a hydroxyl group according to the present invention includes an aromatic ring substituted with at least one carboxyl group and/or an aromatic ring substituted with at least one hydroxyl group in the molecule. In this case, the carboxyl group and the hydroxyl group may be substituted with the same aromatic ring.
そして上記の芳香族環としては、好ましくはアリール基
例えばフェニル基、ナフチル基を挙げることができる。Preferable examples of the aromatic ring include aryl groups such as phenyl and naphthyl groups.
また前記のカルボキシル基あるいはヒドロキシル基は芳
香族環に直接結合してもよく、ジヨイントを介して結合
していてもよい。Furthermore, the above carboxyl group or hydroxyl group may be bonded directly to the aromatic ring or may be bonded via a joint.
本発明において1つの芳香族環に結合するカルボキシル
基の数としては1または2が好ましく、また1つの芳香
族環に結合するヒドロキシル基の数としてはl乃至3が
好ましい。さらにジヨイントとしては例えば炭素数1乃
至4のアルキレン基を挙げることができる。In the present invention, the number of carboxyl groups bonded to one aromatic ring is preferably 1 or 2, and the number of hydroxyl groups bonded to one aromatic ring is preferably 1 to 3. Furthermore, examples of joints include alkylene groups having 1 to 4 carbon atoms.
本発明に利用されるカルボキシル基および/又はヒドロ
キシル基を含有する芳香族化合物の具体例としては、安
息香酸、0−り6口安息香酸、mクロロ安息香酸、p−
クロロ安息香酸、フタル酸、テレフタル酸、ジフェニル
酢酸、フヱノキシ酢酸、p−メトキシフェニル酢酸、p
−メトキシ安息香酸、2,4−ジメトキシ安息香酸、2
.4−ジメチル安息香酸、p−フェノキシ安息香酸、4
アニリノ安息香酸、4−(m−メトキシアニリノ)安息
香酸、4−(p−メトキシベンゾイル)安息香酸、4−
(p−メチルアニリノ)安息香酸、4−フェニルスルホ
ニル安息香酸、フェノール、(o、m、p)クレゾール
、キシレノール、レゾルシン、2−メチルレゾルシン、
(o、m、p)−メトキシフェノール、m−エトキシフ
ェノール、カテコール、フロログリシン、p−ヒドロキ
シエチルフェノール、ナフトール、ピロガロール、ヒド
ロキノン、p−ヒドロキシベンジルアルコール、4−ク
ロロレゾルシン、ビフェニル4.4′−ジオール、1,
2.4−ベンゼントリオール、ビスフェノールA、2.
4−ジヒドロキシベンゾフェノン、2.3.4−トリヒ
ドロキシベンゾフェノン、p−ヒドロキシアセトフェノ
ン、4.4−ジヒドロキシジフヱニルエーテル、4.4
′−ジヒドロキシジフェニルアミン、4.4′−ジヒド
ロキシジフェニルスルフィド、クミルフェノール、 (
o、m、p)−クロロフェノール、(o、m、p)−ブ
ロモフェノール、サリチル酸、4−メチルサリチル酸、
6−メチルサリチル酸、4−エチルサリチル酸、6プロ
ビルサリチル酸、6−ラウリルサリチル酸、6−スチア
リルサリチル酸、4.6−シメチルサリチル酸、p−ヒ
ドロキシ安息香酸、2−メチル−4−ヒドロキシ安息香
酸、6−メチル−4−ヒドロキシル安息香酸、2.6−
シメチルー4−ヒドロキシ安息香酸、2.4−ジヒドロ
キシ安息香酸、2.4−ジヒドロキシ−6−メチル安息
香酸、2.6−ジヒドロキシ安息香酸、2.6−ジヒド
ロキシ4−安息香酸、4−クロロ−2,6−ジヒドロキ
シ安息香酸、4−メトキシ−2,6−ジオキシ安息香酸
、没食子酸、フロログルシンカルボン酸、2,4.5ト
リヒドロキシ安息香酸、m−ガロイル没食子酸、タンニ
ン酸、m−ベンゾイル没食子酸、m(p−トルイル)没
食子酸、プロトカテクオイルー没食子酸、4.6−シヒ
ドロキシフタル酸、(2,4−ジヒドロキシフェニル)
酢酸、(2,6−ジヒドロキシフェニル)酢酸、(3,
4,5−)ジヒドロキシフェニル)酢酸、p−ヒドロキ
シメチル安息香酸、p−ヒドロキシエチル安息香H14
−(P−ヒドロキシフェニル)メチル安息香酸、4−(
〇−ヒドロキシベンゾイル)安息香酸、4−(2,4ジ
ヒドロキシベンゾイル)安息香酸、4−(p−ヒドロキ
シフェノキシ)安息香!、4−(p−ヒドロキシアニリ
ノ)安息香酸、ビス(3−カルボキシ−4−ヒドロキシ
フェニル)アミン、4−(p−ヒドロキシフェニルスル
ホニル)安息香M、4−(p−ヒドロキシフェニルチオ
)安息香酸等があげられ、このうち特に好ましいものは
、サリチル酸、p−ヒドロキシ安息香酸、p−メトキシ
安息香酸、メタクロロ安息香酸である。Specific examples of aromatic compounds containing a carboxyl group and/or hydroxyl group that can be used in the present invention include benzoic acid, 0-di6-benzoic acid, m-chlorobenzoic acid, p-
Chlorobenzoic acid, phthalic acid, terephthalic acid, diphenylacetic acid, phenoxyacetic acid, p-methoxyphenylacetic acid, p
-methoxybenzoic acid, 2,4-dimethoxybenzoic acid, 2
.. 4-dimethylbenzoic acid, p-phenoxybenzoic acid, 4
Anilinobenzoic acid, 4-(m-methoxyanilino)benzoic acid, 4-(p-methoxybenzoyl)benzoic acid, 4-
(p-methylanilino)benzoic acid, 4-phenylsulfonylbenzoic acid, phenol, (o, m, p) cresol, xylenol, resorcin, 2-methylresorcin,
(o,m,p)-methoxyphenol, m-ethoxyphenol, catechol, phloroglycine, p-hydroxyethylphenol, naphthol, pyrogallol, hydroquinone, p-hydroxybenzyl alcohol, 4-chlororesorcin, biphenyl 4.4'- Diol, 1,
2.4-benzenetriol, bisphenol A, 2.
4-dihydroxybenzophenone, 2.3.4-trihydroxybenzophenone, p-hydroxyacetophenone, 4.4-dihydroxydiphenyl ether, 4.4
'-dihydroxydiphenylamine, 4,4'-dihydroxydiphenyl sulfide, cumylphenol, (
o, m, p)-chlorophenol, (o, m, p)-bromophenol, salicylic acid, 4-methylsalicylic acid,
6-methylsalicylic acid, 4-ethylsalicylic acid, 6-probylsalicylic acid, 6-laurylsalicylic acid, 6-styarylsalicylic acid, 4,6-dimethylsalicylic acid, p-hydroxybenzoic acid, 2-methyl-4-hydroxybenzoic acid, 6-Methyl-4-hydroxybenzoic acid, 2.6-
Dimethyl-4-hydroxybenzoic acid, 2.4-dihydroxybenzoic acid, 2.4-dihydroxy-6-methylbenzoic acid, 2.6-dihydroxybenzoic acid, 2.6-dihydroxy4-benzoic acid, 4-chloro-2 , 6-dihydroxybenzoic acid, 4-methoxy-2,6-dioxybenzoic acid, gallic acid, phloroglucincarboxylic acid, 2,4.5 trihydroxybenzoic acid, m-galloyl gallic acid, tannic acid, m-benzoyl Gallic acid, m(p-toluyl) gallic acid, protocatechuo-gallic acid, 4,6-cyhydroxyphthalic acid, (2,4-dihydroxyphenyl)
Acetic acid, (2,6-dihydroxyphenyl)acetic acid, (3,
4,5-)dihydroxyphenyl)acetic acid, p-hydroxymethylbenzoic acid, p-hydroxyethylbenzoic acid H14
-(P-hydroxyphenyl)methylbenzoic acid, 4-(
〇-Hydroxybenzoyl)benzoic acid, 4-(2,4 dihydroxybenzoyl)benzoic acid, 4-(p-hydroxyphenoxy)benzoic acid! , 4-(p-hydroxyanilino)benzoic acid, bis(3-carboxy-4-hydroxyphenyl)amine, 4-(p-hydroxyphenylsulfonyl)benzoic M, 4-(p-hydroxyphenylthio)benzoic acid, etc. Among these, particularly preferred are salicylic acid, p-hydroxybenzoic acid, p-methoxybenzoic acid, and metachlorobenzoic acid.
本発明の芳香族ジアゾニウム化合物には、例えば特公昭
49−48001号に挙げられているようなジアゾニウ
ム塩を用いることができるが、特に、ジフェニルアミン
−4−ジアゾニウム塩類が好ましい。For the aromatic diazonium compound of the present invention, diazonium salts such as those listed in Japanese Patent Publication No. 49-48001 can be used, but diphenylamine-4-diazonium salts are particularly preferred.
ジフェニルアミン−4−ジアゾニウム塩類は、4−アミ
ノ−ジフェニルアミン類から誘導されるが、このような
4−アミノ−ジフェニルアミン類としては、4−アミノ
−ジフェニルアミン、4−アミノ−3−メトキシ−ジフ
ェニルアミン、4−アミノ−2−メトキシ−ジフェニル
アミン、4′−アミノ−2−メトキシ−ジフェニルアミ
ン、4′アミノ−4−メトキシジフェニルアミン、4−
アミノ−3−メチルジフェニルアミン、4−アミノ3−
エトキシ−ジフェニルアミン、4−アミノ−3−β−ヒ
ドロキシ−エトキシジフェニルアミン、4−アミノ−ジ
フェニルアミン−2−スルホン酸、4−アミノ−ジフェ
ニルアミン−2−カルボン酸、4−アミノ−ジフェニル
アミン−2′カルボン酸等があげられ、特に好ましくは
3−メトキシ−4−アミノ−ジフェニルアミン、4−ア
ミノ−ジフェニルアミンである。Diphenylamine-4-diazonium salts are derived from 4-amino-diphenylamines, such as 4-amino-diphenylamine, 4-amino-3-methoxy-diphenylamine, 4-amino-diphenylamine, Amino-2-methoxy-diphenylamine, 4'-amino-2-methoxy-diphenylamine, 4'-amino-4-methoxydiphenylamine, 4-
Amino-3-methyldiphenylamine, 4-amino 3-
Ethoxy-diphenylamine, 4-amino-3-β-hydroxy-ethoxydiphenylamine, 4-amino-diphenylamine-2-sulfonic acid, 4-amino-diphenylamine-2-carboxylic acid, 4-amino-diphenylamine-2'carboxylic acid, etc. Among them, 3-methoxy-4-amino-diphenylamine and 4-amino-diphenylamine are particularly preferred.
上記の共縮合ジアゾ樹脂は、芳香族ジアゾニウム化合物
を縮合させてなる縮合ジアゾ樹脂と併用するとさらに好
ましい。The above co-condensed diazo resin is more preferably used in combination with a condensed diazo resin formed by condensing an aromatic diazonium compound.
この場合において、共縮合ジアゾ樹脂は、ジアゾ樹脂中
に5重量%以上、縮合ジアゾ樹脂は、ジアゾ樹脂中に9
5重量%以下の構成とされる。共縮合ジアゾ樹脂:縮合
ジアゾ樹脂の重量%比は、感度および現像性が共に優れ
るために、特に望ましいのは、30〜70ニア0〜30
である。In this case, the co-condensed diazo resin is 5% by weight or more in the diazo resin, and the condensed diazo resin is 9% by weight in the diazo resin.
The content is 5% by weight or less. The weight percent ratio of co-condensed diazo resin:condensed diazo resin is particularly preferably 30 to 70, near 0 to 30, for both sensitivity and developability.
It is.
本発明の共縮合ジアゾ樹脂、および縮合ジアゾ樹脂は、
公知の方法、例えば、フォトグラフィック・サイエンス
・アンド・エンジニアリング(Photo、 Sci、
、 Eng、)第17巻、第33頁、(1973)、
米国特許第2,063,631号、同第2,679,4
98号各明細書に記載の方法に従い、硫酸やリン酸ある
いは塩酸中でジアゾニウム塩、カルボキシおよびヒドロ
キシル基を有する芳香族化合物およびアルデヒド類、例
えばパラホルムアルデヒド、アセトアルデヒド、ベンズ
アルデヒドあるいはケトン類、例えばアセトン、アセト
フェノンとを重縮合させることによって得られる。The co-condensed diazo resin and condensed diazo resin of the present invention are
Known methods such as Photographic Science and Engineering (Photo, Sci,
, Eng.) Volume 17, Page 33, (1973),
U.S. Patent No. 2,063,631, U.S. Patent No. 2,679,4
According to the methods described in each specification of No. 98, diazonium salts, aromatic compounds having carboxyl and hydroxyl groups, and aldehydes, such as paraformaldehyde, acetaldehyde, benzaldehyde, or ketones, such as acetone and acetophenone, in sulfuric acid, phosphoric acid, or hydrochloric acid. It is obtained by polycondensation of
また、これら分子中にカルボキシル基および/またはヒ
ドロキシル基を有する芳香族化合物、芳香族ジアゾ化合
物およびアルデヒド類またはケトン類は相互に組合せ自
由であり、さらに各々2種以上を混ぜて共縮合すること
も可能である。Furthermore, these aromatic compounds, aromatic diazo compounds, and aldehydes or ketones having carboxyl groups and/or hydroxyl groups in their molecules can be freely combined with each other, and two or more of each can also be mixed and co-condensed. It is possible.
カルボキシル基およびヒドロキシル基のうち少くとも一
方を有する芳香族化合物と芳香族ジアゾニウム化合物の
仕込みモル比は、1:0.1〜0.1=1;好ましくは
1:0.5〜0.2:1、より好ましくは1:l〜0.
2:1である。またこの場合カルボキシル基およびヒド
ロキシル基のうち少くとも一方を有する芳香族化合物お
よび芳香族ジアゾニウム化合物の合計とアルデヒド類ま
たはケトン類とをモル比で通常1:0.6〜1.2、好
ましくはzo、7〜1.5で仕込み、低温で短時間、例
えば3時間程度反応させることにより共縮合ジアゾ樹脂
が得られる。The molar ratio of the aromatic compound having at least one of a carboxyl group and a hydroxyl group to the aromatic diazonium compound is 1:0.1 to 0.1=1; preferably 1:0.5 to 0.2: 1, more preferably 1:l to 0.
The ratio is 2:1. In this case, the molar ratio of the sum of aromatic compounds and aromatic diazonium compounds having at least one of a carboxyl group and a hydroxyl group to aldehydes or ketones is usually 1:0.6 to 1.2, preferably zo , 7 to 1.5, and reacted at a low temperature for a short time, for example, about 3 hours, to obtain a co-condensed diazo resin.
本発明において使用されるジアゾ樹脂の対アニオンは、
該ジアゾ樹脂と安定に塩を形成し、かつ該樹脂を有機溶
媒に可溶となすアニオンを含む。The counter anion of the diazo resin used in the present invention is
It contains an anion that stably forms a salt with the diazo resin and makes the resin soluble in an organic solvent.
これらは、デカン酸および安息香酸等の有機カルボン酸
、フェニルリン酸等の有機リン酸およびスルホン酸を含
み、典型的な例としては、メタンスルホン酸、クロロエ
タンスルホン酸、ドデカンスルホン酸、ベンゼンスルホ
ン酸、トルエンスルホン酸、メシチレンスルホン酸、お
よびアントラキノンスルホン酸、2−ヒドロキシ−4−
メトキシベンゾフェノン−5−スルホン酸、ヒドロキシ
スルホン酸、4−アセチルベンゼンスルホン酸、ジメチ
ル−5−スルホイソフタレート等の脂肪族並びに芳香族
スルホン酸、2.2’ 、4.4 ’−テトラヒドロキ
シベンゾフェノン、1,2.3−1−リヒドロキシベン
ゾフエノン、2.2 ’ 、4−)リヒドロキシヘンゾ
フェノン等の水酸基含有芳香族化合物、ヘキサフルオロ
リン酸、テトラフルオロホウ酸等のハロゲン化ルイス酸
、ClO4,roa等の過/\oil’ン酸等が挙げら
れるが、これに限られるものではない。これらの中で、
特に好ましいものは、ヘキサフルオロリン酸、2−ヒド
ロキシ−4−メトキシベンゾフェノン−5−スルホン酸
である。These include organic carboxylic acids such as decanoic acid and benzoic acid, organic phosphoric acids such as phenylphosphoric acid, and sulfonic acids; typical examples include methanesulfonic acid, chloroethanesulfonic acid, dodecanesulfonic acid, benzenesulfonic acid. , toluenesulfonic acid, mesitylenesulfonic acid, and anthraquinonesulfonic acid, 2-hydroxy-4-
Aliphatic and aromatic sulfonic acids such as methoxybenzophenone-5-sulfonic acid, hydroxysulfonic acid, 4-acetylbenzenesulfonic acid, dimethyl-5-sulfoisophthalate, 2.2', 4.4'-tetrahydroxybenzophenone, Hydroxyl group-containing aromatic compounds such as 1,2,3-1-lyhydroxybenzophenone, 2,2',4-lyhydroxyhenzophenone, halogenated Lewis acids such as hexafluorophosphoric acid and tetrafluoroboric acid, Examples include peroxylic acids such as ClO4 and roa, but are not limited thereto. Among these,
Particularly preferred are hexafluorophosphoric acid and 2-hydroxy-4-methoxybenzophenone-5-sulfonic acid.
本発明の共縮合ジアゾ樹脂は、各単量体のモル比および
縮合条件を種々変えることにより、その分子量は任意の
値として得ることができるが、本発明の目的とする使途
に有効に供するためには分子量が約400乃至to、o
ooのものが使用可能であるが、好ましくは、約800
乃至s、oooのものが適当である。The co-condensed diazo resin of the present invention can have any molecular weight by varying the molar ratio of each monomer and the condensation conditions; however, in order to effectively serve the purpose of the present invention, has a molecular weight of about 400 to, o
oo can be used, but preferably about 800
Suitable values are from s to ooo.
本発明における感光層には、上記の感光性ジアゾ樹脂、
後述するバインダーとともに、シランカップリング剤お
よびチタンカップリング剤のうち少くとも一種のカップ
リング剤が含有される。The photosensitive layer in the present invention includes the above photosensitive diazo resin,
At least one coupling agent selected from among a silane coupling agent and a titanium coupling agent is contained together with the binder described below.
カンプリング剤として、特にシランカップリング剤が好
ましく、これは、4価のケイ素原子に少なくとも2種の
反応性の基および/または原子を直接または連結基を介
して結合している化合物をいう。ここに反応性の基とし
ては、例えばアミノ基、ビニル基、エポキシエチル基(
CH,−CH−)、\ 1
エポキシエチレン基、(−CIl −CIl−)、メル
カゝ・、1
ブト基、アルコキシ基、アルキル基、アシルオキシ基、
アンモニウム化合物残基を挙げることができる。アルコ
キシ基としては、例えばメトキシ基、エトキシ基のよう
な炭素原子数が1乃至4のものを挙げることができる。As the camping agent, a silane coupling agent is particularly preferred, and this refers to a compound in which at least two reactive groups and/or atoms are bonded to a tetravalent silicon atom directly or via a linking group. Examples of reactive groups include amino groups, vinyl groups, and epoxyethyl groups (
CH, -CH-), \ 1 epoxyethylene group, (-CIl -CIl-), merka, 1 buto group, alkoxy group, alkyl group, acyloxy group,
Ammonium compound residues may be mentioned. Examples of the alkoxy group include those having 1 to 4 carbon atoms, such as a methoxy group and an ethoxy group.
アルキル基としては、メチル基、エチル基のような炭素
原子数が1乃至4のものを挙げることができる。アシル
オキシル基としては、例えばアセチルオキシ基、ブチリ
ルオキシ基のような炭素原子数が2乃至4のアルキルカ
ルボニルオキシ基を挙げることができる。アンモニウム
化合物残基としては、例えばオクタデシルジメチルアン
モニウムクロライド残基のような第4級アンモニウム化
合物残基を挙げることができる。Examples of the alkyl group include those having 1 to 4 carbon atoms, such as a methyl group and an ethyl group. Examples of the acyloxyl group include alkylcarbonyloxy groups having 2 to 4 carbon atoms, such as an acetyloxy group and a butyryloxy group. Examples of ammonium compound residues include quaternary ammonium compound residues such as octadecyldimethylammonium chloride residues.
これらの基は置換基を有してもよく、置換基を有する基
としては、例えばα−メチルビニル基、β−メトキシエ
トギシ基、アニリノ基、ビス(βヒドロキシエチル)ア
ミノ基等を挙げることができる。These groups may have a substituent, and examples of groups having a substituent include α-methylvinyl group, β-methoxyethoxy group, anilino group, bis(β-hydroxyethyl)amino group, etc. .
上記ケイ素原子に直接または連結基を介して結合する原
子としては、例えばクロル原子のようなハロゲン原子を
挙げることができる。Examples of the atom bonded to the silicon atom directly or via a linking group include a halogen atom such as a chlorine atom.
上記連結基としては、例えばエチレン基、プロピレン基
、トリメチレン基、テトラメチレン基のような炭素原子
数が1乃至5のアルキレン基、トリメチレンオキシメチ
レン基、エチレンオキシエチレン基のような炭素原子数
が2乃至8個のアルキレンオキシアルキレン基、トリメ
チレンアミノエチレン基の゛ような炭素原子数が2乃至
8個のアルキレンアミノアルキレン基、エチレンオキシ
カルボニル基、トリメチレンオキシカルボニル基のよう
な炭素原子数が2乃至5個のアルキレンオキシカルボニ
ル基(ただし、アルキレン基が直接ケイ素原子に結合す
る。)、トリメチレンアミノエチレンアミノメチレンフ
ェニレン基のような炭素原子数が9乃至15個のアルキ
レンアミノアルキレンアミノフェニレン基(ただし、ア
ルキレン基が直接ケイ素原子に結合する。)等を挙げる
ことができる。また、前述のエポキシエチル基は連結基
と結合して例えばβ−(3,4−エポキシシクロヘキシ
ルエチル基の如く、エポキシシクロアルキルアルキル基
としてケイ素原子に結合する。Examples of the above-mentioned linking group include alkylene groups having 1 to 5 carbon atoms such as ethylene, propylene, trimethylene, and tetramethylene groups, and carbon atoms such as trimethyleneoxymethylene and ethyleneoxyethylene groups. Alkyleneoxyalkylene groups having 2 to 8 carbon atoms, such as trimethyleneaminoethylene groups, alkyleneaminoalkylene groups having 2 to 8 carbon atoms, such as ethyleneoxycarbonyl groups, and trimethyleneoxycarbonyl groups; Alkyleneaminoalkyleneaminophenylene groups having 9 to 15 carbon atoms, such as 2 to 5 alkyleneoxycarbonyl groups (however, the alkylene group is directly bonded to the silicon atom), trimethyleneaminoethyleneaminomethylenephenylene groups; (However, the alkylene group is directly bonded to the silicon atom.). Further, the above-mentioned epoxyethyl group is bonded to a linking group and bonded to a silicon atom as an epoxycycloalkylalkyl group, such as a β-(3,4-epoxycyclohexylethyl group).
本発明において用いられるシランカップリング剤には、
更にヘキサアルキルジシラザンのようなジシラザン系化
合物が併有されていてもよい。The silane coupling agent used in the present invention includes:
Furthermore, a disilazane compound such as hexaalkyldisilazane may also be contained.
シランカップリング剤の具体例としては、ビニルトリク
ロロシラン、ビニルトリメトキシシランビニルトリエト
キシシラン、ビニルトリス(2−メトキシエトキシ)シ
ラン、N−(2−アミノエチル)3〜アミノプロピルメ
チルジメトキシシラン、N−(2−アミノエチル)3−
アミノプロピルトリメトキシシラン、3−アミノプロピ
ルトリエトキシシラン、3−グリシドキシプロピルトリ
メトキシシラン、2−(3,4−エポキシシクロヘキシ
ル)エチルトリメトキシシラン、3−クロロプロピルト
リメトキシシラン、3−メタクリルオキシプロピルトリ
メトキシシラン、3−メルカプトプロピルトリメトキシ
シラン、3−ウレイドプロピルトリエトキシシランなど
が挙げられる。また、チタンカップリング剤としては、
イソプロピルトリイソステアロイルチタネート、イソプ
ロビルトリドデシルヘンゼンスルホニルチタネート、イ
ソプロピルトリ (ジオクチルピロホスフェート)チタ
ネート、テトライソプロピルビス(ジオクチルホスファ
イト)チタネート、テトラオクチルビス(ジトリデシル
ホスファイト)チタネート、テトラ(2,2−ジアリル
オキシメチル−1−ブチル)ビス(ジトリデシルホスフ
ァイト)チタネート、ビス(ジオクチルピロホスフェー
ト)−オキシアセテートチタネート、ビス(ジオクチル
ピロホスフェート)エチレンチクネートなどが挙げられ
る。Specific examples of the silane coupling agent include vinyltrichlorosilane, vinyltrimethoxysilane, vinyltriethoxysilane, vinyltris(2-methoxyethoxy)silane, N-(2-aminoethyl)3-aminopropylmethyldimethoxysilane, N- (2-aminoethyl)3-
Aminopropyltrimethoxysilane, 3-aminopropyltriethoxysilane, 3-glycidoxypropyltrimethoxysilane, 2-(3,4-epoxycyclohexyl)ethyltrimethoxysilane, 3-chloropropyltrimethoxysilane, 3-methacrylic Examples include oxypropyltrimethoxysilane, 3-mercaptopropyltrimethoxysilane, and 3-ureidopropyltriethoxysilane. In addition, as a titanium coupling agent,
Isopropyl triisostearoyl titanate, isopropyl tridodecylhenzensulfonyl titanate, isopropyl tri(dioctylpyrophosphate) titanate, tetraisopropyl bis(dioctyl phosphite) titanate, tetraoctyl bis(ditridecyl phosphite) titanate, tetra(2,2) Examples include -diallyloxymethyl-1-butyl)bis(ditridecylphosphite)titanate, bis(dioctylpyrophosphate)-oxyacetate titanate, and bis(dioctylpyrophosphate)ethylene thicnate.
以上述べたシランカップリング剤の中でも本発明におい
て好ましいものは、アルコキシ基が2〜3個直接ケイ素
原子に結合し、更にビニル基が連結基を介してケイ素原
子に結合したものである。Among the above-mentioned silane coupling agents, preferred in the present invention are those in which 2 to 3 alkoxy groups are directly bonded to a silicon atom, and a vinyl group is further bonded to a silicon atom via a linking group.
本発明において、シランカップリング剤およびまたはチ
タンカップリング剤は、感光層を構成する感光性組成物
中に通常o、oi〜5重量%、特に0、1〜1.5重量
%の割合で含有させるのが好ましい。In the present invention, the silane coupling agent and/or the titanium coupling agent are usually contained in the photosensitive composition constituting the photosensitive layer at a ratio of o, oi to 5% by weight, particularly 0, 1 to 1.5% by weight. It is preferable to let
上記の感光性ジアゾ共縮合樹脂およびカップリング剤は
、アルカリ可溶性(もしくは膨潤性)の親油性高分子化
合物をバインダー樹脂として使用して、これと組合わせ
て使用するのが望ましい。The photosensitive diazo cocondensation resin and coupling agent described above are preferably used in combination with an alkali-soluble (or swellable) lipophilic polymer compound as a binder resin.
この親油性高分子化合物としては、下記(1)〜(2)
に示すモノマーをその構造単位とする通常2〜20万の
分子量をもつ共重合体が挙げられる。As this lipophilic polymer compound, the following (1) to (2) are used.
Examples include copolymers whose structural units are the monomers shown below and which usually have a molecular weight of 20,000 to 200,000.
(1)芳香族水酸基を有するアクリルアミド類、メタク
リルアミド類、アクリル酸エステル、およびメタクリル
酸エステル類、例えばN−(4−ヒドロキシフェニル)
アクリルアミド又はN−(4−ヒドロキシフェニル)メ
タクリルアミド、0−m−、p−ヒドロキシスチレン、
o −、m−、pヒドロキシフェニル−アクリレート又
はメタクリレート、
(2)脂肪族水酸基を有するアクリル酸エステル類、お
よびメタクリル酸エステル類、例えば2−ヒドロキシエ
チルアクリレート又は2−ヒドロキシエチルメタクリレ
ート、
(3) アクリル酸、メタクリル酸、無水マレイン酸
等のα、β−不飽和カルボン酸、
(4) アクリル酸メチル、アクリル酸エチル、アク
リル酸プロピル、アクリル酸ブチル、アクリル酸アミル
、アクリル酸ヘキシル、アクリル酸オクチル、アクリル
酸−2−クロロエチル、グリシジルアクリレート、N−
ジメチルアミノエチルアクリレート等の(置換)アルキ
ルアクリレート、(5) メチルメタクリレート、エ
チルメタクリレート、プロピルメタクリレート、ブチル
メタクリレート、アミルメタクリレート、シクロヘキシ
ルメタクリレート、4−ヒドロキシブチルメタクリレー
ト、グリシジルメタクリレート、N−ジメチルアミノエ
チルメタクリレート等の(置換)アルキルメタクリレー
ト、
(6) アクリルアミド、メタクリルアミド、N−メ
チロールアクリルアミド、N−メチロールメタクリルア
ミド、N−エチルアクリルアミド、N−へキシルメタク
リルアミド、N−シクロへキシルアクリルアミド、N−
ヒドロキシエチルアクリルアミド、N−フェニルアクリ
ルアミド、N−ニトロフェニルアクリルアミド、N−エ
チル−N−フェニルアクリルアミド等のアクリルアミド
若しくはメタクリルアミド類、
(7) エチルビニルエーテル、2−クロロエチルビ
ニルエーテル、ヒドロキシエチルビニルエーテル、プロ
ピルビニルエーテル、ブチルビニルエーテル、オクチル
ビニルエーテル、フェニルビニルエーテル等のビニルエ
ーテル類、
(8) ビニルアセテート、ビニルクロロアセテート
、ビニルブチレート、安息香酸ビニル等のビニルエステ
ル類、
(9)スチレン、α−メチルスチレン、メチルスチレン
、クロロメチルスチレン等のスチレン類、00) メ
チルビニルケトン、エチルビニルケトン、プロピルビニ
ルケトン、フェニルビニルケトン等のビニルケトン類、
Ql) エチレン、プロピレン、イソブチレン、ブタ
ジェン、イソプレン等のオレフィン類、(121N−ビ
ニルピロリドン、N−ビニルカルバゾール、4−ビニル
ピリジン、アクリロニトリル、メタクリレートリル等、
更に、上記モノマーと共重合し得るモノマーを共重合さ
せてもよい。また、上記モノマーの共重合によって得ら
れる共重合体を例えば、グリシジルメタクリレート、グ
リシジルアクリレート等によって修飾したものも含まれ
るがこれらに限られるものではない。(1) Acrylamides, methacrylamides, acrylic esters, and methacrylic esters having an aromatic hydroxyl group, such as N-(4-hydroxyphenyl)
acrylamide or N-(4-hydroxyphenyl)methacrylamide, 0-m-, p-hydroxystyrene,
o-, m-, p-hydroxyphenyl-acrylate or methacrylate, (2) acrylic esters and methacrylic esters with aliphatic hydroxyl groups, such as 2-hydroxyethyl acrylate or 2-hydroxyethyl methacrylate, (3) acrylics (4) Methyl acrylate, ethyl acrylate, propyl acrylate, butyl acrylate, amyl acrylate, hexyl acrylate, octyl acrylate, 2-chloroethyl acrylate, glycidyl acrylate, N-
(Substituted) alkyl acrylates such as dimethylaminoethyl acrylate, (5) methyl methacrylate, ethyl methacrylate, propyl methacrylate, butyl methacrylate, amyl methacrylate, cyclohexyl methacrylate, 4-hydroxybutyl methacrylate, glycidyl methacrylate, N-dimethylaminoethyl methacrylate, etc. (Substituted) alkyl methacrylate, (6) acrylamide, methacrylamide, N-methylol acrylamide, N-methylol methacrylamide, N-ethyl acrylamide, N-hexyl methacrylamide, N-cyclohexyl acrylamide, N-
Acrylamides or methacrylamides such as hydroxyethyl acrylamide, N-phenylacrylamide, N-nitrophenyl acrylamide, N-ethyl-N-phenylacrylamide, (7) ethyl vinyl ether, 2-chloroethyl vinyl ether, hydroxyethyl vinyl ether, propyl vinyl ether, Vinyl ethers such as butyl vinyl ether, octyl vinyl ether, phenyl vinyl ether, (8) Vinyl esters such as vinyl acetate, vinyl chloroacetate, vinyl butyrate, vinyl benzoate, etc. (9) Styrene, α-methylstyrene, methylstyrene, chloro Styrenes such as methylstyrene, 00) Vinyl ketones such as methyl vinyl ketone, ethyl vinyl ketone, propyl vinyl ketone, and phenyl vinyl ketone, Ql) Olefins such as ethylene, propylene, isobutylene, butadiene, and isoprene, (121N-vinylpyrrolidone) , N-vinylcarbazole, 4-vinylpyridine, acrylonitrile, methacrylatetrile, etc. Furthermore, monomers that can be copolymerized with the above monomers may be copolymerized.Also, copolymers obtained by copolymerization of the above monomers may be used, for example. , glycidyl methacrylate, glycidyl acrylate, etc., but are not limited to these.
更に具体的には、上記(11,(21に掲げたモノマー
等を含有する水酸基を有する共重合体が好ましく、芳香
族性水酸基を有する共重合体が更に好ましい。More specifically, a copolymer having a hydroxyl group containing the monomers listed in (11 and (21) above is preferred, and a copolymer having an aromatic hydroxyl group is even more preferred.
上記共重合体には(3)に掲げたα、β−不飽和カルボ
ン酸を含有することが好ましく、共重合体の好ましい酸
価の値は10〜100である。The copolymer preferably contains an α,β-unsaturated carboxylic acid listed in (3), and the copolymer preferably has an acid value of 10 to 100.
上記共重合体の好ましい分子量は4〜15万である。The preferred molecular weight of the above copolymer is 40,000 to 150,000.
また上記共重合体には必要に応じて、ポリビニルブチラ
ール樹脂、ポリウレタン樹脂、ポリアミド樹脂、エポキ
シ樹脂、ノボラック樹脂、天然樹脂等を添加してもよい
。Further, polyvinyl butyral resin, polyurethane resin, polyamide resin, epoxy resin, novolac resin, natural resin, etc. may be added to the above copolymer as necessary.
この種の親油性高分子化合物は感光性組成物の固形分中
に通常40〜99重量%、好ましくは50〜95重量%
含有させる。また、本発明に用いられる感光性ジアゾ樹
脂は通常1〜60重量%、好ましくは3〜30重量%含
有させる。This type of lipophilic polymer compound is usually 40 to 99% by weight, preferably 50 to 95% by weight in the solid content of the photosensitive composition.
Contain. Further, the photosensitive diazo resin used in the present invention is usually contained in an amount of 1 to 60% by weight, preferably 3 to 30% by weight.
他方、バインダーとして特に好ましいのは、メチルアク
リレートを構造単位として有する親油性高分子化合物で
ある。この場合、さらに好ましいのは、次記の共重合体
である。On the other hand, particularly preferred as a binder are lipophilic polymer compounds having methyl acrylate as a structural unit. In this case, more preferred are the following copolymers.
すなわち、分子構造中に、
(al アルコール性水酸基を有する構造単位及び/
又はフェノール性水酸基を有する構造単位を1〜50モ
ル%、
(b) 下記−数式I、
I
ClI2 C’−’−・−・−・−IN
(式中、R1は水素原子又はアルキル基を表わす。)
で表わされる構造単位を5〜40モル%、fC) メ
チルアクリレートから形成される単位を5〜40モル%
、
(dl 下記−数式■、
−CH2−C−−−−−−−−−−−−IfCOOR’
(式中、R2は水素原子、メチル基又はエチル基を表わ
し、R3は、炭素原子数2〜12のアルキル基又はアル
キル置換アリール基を表わす。)で表わされる構造単位
を25〜60モル%、及び
(el カルボキシル基を有する構造単位を2〜30
モル%
含有し、且つその重量平均分子量が5〜20万である共
重合体である。That is, in the molecular structure, (a structural unit having an alcoholic hydroxyl group and/or
or 1 to 50 mol% of a structural unit having a phenolic hydroxyl group, (b) the following formula I, I ClI2 C'-'-・-・--IN (wherein R1 represents a hydrogen atom or an alkyl group) .) 5 to 40 mol% of structural units represented by fC) 5 to 40 mol% of units formed from methyl acrylate
, (dl The following formula ■, -CH2-C------------IfCOOR' (wherein, R2 represents a hydrogen atom, a methyl group, or an ethyl group, and R3 represents a carbon atom number of 2 ~12 alkyl groups or alkyl-substituted aryl groups.
It is a copolymer having a weight average molecular weight of 50,000 to 200,000.
前記アルコール性水酸基を存する構造単位を形成するモ
ノマーの具体例としては、特公昭52−7364号公報
に記載されたような下記−数式(I[[)に示した化合
物のごとく (メタ)アクリル酸エステル類や、アクリ
ルアミド類が挙げられる。Specific examples of the monomer forming the structural unit containing an alcoholic hydroxyl group include (meth)acrylic acid such as the compound shown in the following formula (I[[) as described in Japanese Patent Publication No. 52-7364. Examples include esters and acrylamides.
式中、R4は水素原子又はメチル基、Rsは水素原子、
メチル基、エチル基又はクロロメチル基、そしてnは1
〜IOの整数を示す。In the formula, R4 is a hydrogen atom or a methyl group, Rs is a hydrogen atom,
Methyl group, ethyl group or chloromethyl group, and n is 1
~Indicates an integer of IO.
(メタ)アクリル酸エステル類の例としては、2−ヒド
ロキシエチル(メタ)アクリレート、2−ヒドロキシプ
ロピル(メタ)アクリレート、2ヒドロキシペンチル(
メタ)アクリレート等が、また、アクリルアミド類の例
としてはN−メチロール(メタ)アクリルアミド、N−
ヒドロキシエチル(メタ)アクリルアミド等が挙げられ
る。好ましくは2−ヒドロキシエチル(メタ)アクリレ
ートである。Examples of (meth)acrylic acid esters include 2-hydroxyethyl (meth)acrylate, 2-hydroxypropyl (meth)acrylate, and 2-hydroxypentyl (meth)acrylate.
Examples of acrylamides include N-methylol(meth)acrylamide, N-
Examples include hydroxyethyl (meth)acrylamide. Preferably it is 2-hydroxyethyl (meth)acrylate.
また、フェノール性水酸基を有する構造単位を形成する
七ツマ−としては、例えばN−(4−ヒドロキシフェニ
ル)=(メタ)アクリルアミド、N−(2−ヒドロキシ
フェニル)−(メタ)アクリルアミド、N−(4−ヒド
ロキシナフチル)−(メタ)アクリルアミド等の(メタ
)アクリルアミド類のモノマー:o−、m−+ 又はp
−ヒドロキシフェニル(メタ)アクリレートモノマー:
Om −又ハル−ヒドロキシスチレンモノマー等が挙げ
られる。好ましくは、o−、m−又はpヒドロキシフェ
ニル(メタ)アクリレートモノマ、N−(4−ヒドロキ
シフェニル)−(メタ)アクリルアミドモノマーであり
、さらに好ましくはN−(4−ヒドロキシフェニル)−
(メタ)アクリルアミドモノマーである。In addition, examples of the seven polymers forming a structural unit having a phenolic hydroxyl group include N-(4-hydroxyphenyl)=(meth)acrylamide, N-(2-hydroxyphenyl)-(meth)acrylamide, N-( Monomers of (meth)acrylamides such as 4-hydroxynaphthyl)-(meth)acrylamide: o-, m-+ or p
-Hydroxyphenyl (meth)acrylate monomer:
Examples include Om- or halo-hydroxystyrene monomers. Preferably, o-, m- or p-hydroxyphenyl (meth)acrylate monomers, N-(4-hydroxyphenyl)-(meth)acrylamide monomers, more preferably N-(4-hydroxyphenyl)-
(meth)acrylamide monomer.
上記アルコール性水酸基を有する構造単位及び/又はフ
ェノール性水酸基を有する構造単位は、高分子化合物中
、1〜50モル%、好ましくは、5〜30モル%の範囲
から選ばれる。The structural unit having an alcoholic hydroxyl group and/or the structural unit having a phenolic hydroxyl group is selected from the range of 1 to 50 mol%, preferably 5 to 30 mol%, in the polymer compound.
前記−数式■で表わされる構造単位を形成する、側鎖に
シアノ基を有するモノマーとしては、アクリロニトリル
、メタクロロニトリル、2−ペンテンニトリル、2−メ
チル−3−ブテンニトリル、2−シアノエチルアクリレ
ート、o+、m+、p−シアノスチレン等が挙げられる
。好ましくはアクリロニトリル、メタクロロニトリルで
ある。該側鎖にシアノ基を有する構造単位の高分子化合
物の分子中に含有される割合は5〜40モル%、好まし
くは15〜35モル%の範囲から選ばれる。The monomers having a cyano group in the side chain and forming the structural unit represented by the above-mentioned formula (2) include acrylonitrile, methachloronitrile, 2-pentenenitrile, 2-methyl-3-butenenitrile, 2-cyanoethyl acrylate, o+ , m+, p-cyanostyrene, and the like. Preferred are acrylonitrile and methachloronitrile. The proportion of the structural unit having a cyano group in the side chain contained in the molecule of the polymer compound is selected from the range of 5 to 40 mol%, preferably 15 to 35 mol%.
メチルアクリレートから形成される単位は、高分子化合
物中、5〜40モル%、好ましくは、10〜30モル%
の範囲から選ばれる。The unit formed from methyl acrylate is 5 to 40 mol%, preferably 10 to 30 mol% in the polymer compound.
selected from the range.
前記−数式■で表わされる構造単位を形成する、側鎖に
カルボキシエステル基を有するモノマーとしては、エチ
ルアクリレート、エチルメタクリレート、プロピルアク
リレート、ブチルアクリレート、アミルアクリレート、
アミルメタクリレート、ヘキシルアクリレート、オクチ
ルアクリレート、2−クロロエチルアクリレート、2−
ヒドロキシエチルアクリレート、グリシジルアクリレー
ト、等が挙げられる。該モノマーから形成される単位は
、高分子化合物中、25〜60モル%、好ましくは、3
5〜60モル%の範囲から選ばれる。Examples of the monomer having a carboxy ester group in the side chain and forming the structural unit represented by the formula (2) include ethyl acrylate, ethyl methacrylate, propyl acrylate, butyl acrylate, amyl acrylate,
amyl methacrylate, hexyl acrylate, octyl acrylate, 2-chloroethyl acrylate, 2-
Examples include hydroxyethyl acrylate, glycidyl acrylate, and the like. The unit formed from the monomer accounts for 25 to 60 mol%, preferably 3% by mole in the polymer compound.
It is selected from the range of 5 to 60 mol%.
また、カルボキシル基を有する構造単位を形成するモノ
マーとしては、メタクリル酸、アクリル酸、無水マレイ
ン酸、マレイン酸、等が挙げられる。該モノマーは、高
分子化合物中、2〜30モル%、好ましくは、5〜15
モル%の範囲から選ばれる。Furthermore, examples of monomers forming structural units having carboxyl groups include methacrylic acid, acrylic acid, maleic anhydride, maleic acid, and the like. The monomer accounts for 2 to 30 mol%, preferably 5 to 15 mol% in the polymer compound.
Selected from the range of mol%.
なお、以上の各構造単位は具体例として挙げたモノマー
から形成された単位に限定されるものではない。Note that each of the above structural units is not limited to units formed from the monomers listed as specific examples.
本発明組成物中のバインダーとしての高分子化合物を合
成する方法としては、−aに公知のラジカル重合法等に
よって、例えばアゾビスイソブチロニトリル、ヘンシイ
ルバーオキシド等の開始剤(0,1〜4.0モル%)を
使用して溶液重合法によって容易に合成される。As a method for synthesizing the polymer compound as a binder in the composition of the present invention, for example, using an initiator (0,1 ~4.0 mol%) by a solution polymerization method.
該高分子化合物の分子量としては、一般に公知のゲルパ
ーミェーションクロマトグラフ法による標準ポリスチレ
ン比較分子量にして、重量平均分子量(以下分子量の測
定法は同じ。)が5〜20万、好ましくは8〜15万の
範囲のものが使用される。The molecular weight of the polymer compound is 50,000 to 200,000, preferably 8,000 to 200,000, and preferably 8,000 to 200,000. A range of 150,000 to 150,000 is used.
本発明に用いる感光性組成物には、以上に説明した成分
のほか、必要に応じて更に染料、顔料、塗布性向上剤、
可塑剤などを添加することができる。In addition to the components described above, the photosensitive composition used in the present invention may further include dyes, pigments, coating properties improvers,
Plasticizers and the like can be added.
前記の染料としては、例えばビクトリアピュアーブルー
BOH(採土ケ谷化学社製)、オイルブルー#603(
オリエント化学社製)、パテントピュアーブルー(住友
三国化学社製)、クリスクルハイオレソト、ブリリアン
トグリーン、エチルバイオレット、メチルグリーン、エ
リスロシンB1ベイシソフックシン、マラカイトグリー
ン、オイルレッド、m−クレゾールパープル、ローダミ
ンB、オーラミン、4−p−ジエチルアミノフェニルイ
ミノナフトキノン、シアノ−p−ジエチルアミノフェニ
ルアセj・アニリド、等に代表されるトリフェニルメタ
ン系、ジフェニルメタン系、オキサジン系、キサンチン
系、イミノナフトキノン系、アゾメチン系又はアントラ
キノン系の色素が挙げられる。Examples of the above-mentioned dyes include Victoria Pure Blue BOH (manufactured by Osugaya Kagaku Co., Ltd.) and Oil Blue #603 (
(manufactured by Orient Chemical Co., Ltd.), Patent Pure Blue (manufactured by Sumitomo Mikuni Chemical Co., Ltd.), Criscle Hiolesotho, Brilliant Green, Ethyl Violet, Methyl Green, Erythrosin B1 Basisofucsin, Malachite Green, Oil Red, m-Cresol Purple, Rhodamine B, triphenylmethane-based, diphenylmethane-based, oxazine-based, xanthine-based, iminonaphthoquinone-based, azomethine-based or Examples include anthraquinone dyes.
染料は、感光性組成物中に通常約0.5〜約IO重量%
、好ましくは約1〜5重量%含有させる。The dye is usually present in the photosensitive composition in an amount of about 0.5% to about IO% by weight.
, preferably about 1 to 5% by weight.
塗布性向上剤としては、アルキルエーテル類(例えばエ
チルセルロース、メチルセルロース)、フッ素系界面活
性剤類や、ノニオン系界面活性剤〔例えば、プルロニッ
クL−64(旭電化社製)〕が挙げられ、塗膜の柔軟性
、耐摩耗性を賦与するための可塑剤としては、例えばブ
チルフタリル、ポリエチレングリコール、クエン酸トリ
ブチル、フタル酸ジエチル、フタル酸ジブチル、フタル
酸ジヘキシル、フタル酸ジオクチル、リン酸トリクレジ
ル、リン酸トリブチル、リン酸トリオクチル、オレイン
酸テトラヒドロフルフリル、アクリル酸又はメタクリル
酸のオリゴマーが挙げられ、画像部の感脂性を向上させ
るための感脂化剤としては例えば、特開昭55−527
号公報記載のスチレン−無水マレイン酸共重合体のアル
コールによるハーフエステル化物等が挙げられ、安定剤
としては例えば、ポリアクリル酸、酒石酸、リン酸、亜
リン酸、有機酸(アクリル酸、メタクリル酸、クエン酸
、シュウ酸、ベンゼンスルホン酸、ナフタレンスルボン
酸、4−メトキシ−2−ヒドロキシベンゾフェノン−5
−スルホン酸等)等が挙げられる。これらの添加剤の添
加量はその使用対象目的によって異なるが、一般に全固
形分に対して、0.01〜30重量%である。Examples of coating property improvers include alkyl ethers (e.g., ethyl cellulose, methyl cellulose), fluorine-based surfactants, and nonionic surfactants (e.g., Pluronic L-64 (manufactured by Asahi Denka)). Examples of plasticizers for imparting flexibility and wear resistance include butylphthalyl, polyethylene glycol, tributyl citrate, diethyl phthalate, dibutyl phthalate, dihexyl phthalate, dioctyl phthalate, tricresyl phosphate, and tributyl phosphate. , trioctyl phosphate, tetrahydrofurfuryl oleate, and oligomers of acrylic acid or methacrylic acid. Examples of the oil-sensitizing agent for improving the oil-sensitivity of the image area include JP-A-55-527.
Examples of stabilizers include polyacrylic acid, tartaric acid, phosphoric acid, phosphorous acid, organic acids (acrylic acid, methacrylic acid, , citric acid, oxalic acid, benzenesulfonic acid, naphthalenesulfonic acid, 4-methoxy-2-hydroxybenzophenone-5
-sulfonic acid, etc.). The amount of these additives added varies depending on the purpose of use, but is generally 0.01 to 30% by weight based on the total solid content.
上述の感光性組成物を支持体表面に塗布乾燥させること
により感光性平版印刷版が得られる。A photosensitive lithographic printing plate is obtained by applying the above photosensitive composition onto the surface of a support and drying it.
塗布溶媒としては、メチルセロソルブ、メチルセロソル
ブアセテート、エチルセロソルブ、エチルセロソルブア
セテート等のセロソルブ類、ジメチルホルムアミド、ジ
メチルスルホキシド、ジオキサン、アセトン、シクロヘ
キサノン、トリクロロエチレン、メチルエチルケトン等
が挙げられる。Examples of the coating solvent include cellosolves such as methyl cellosolve, methyl cellosolve acetate, ethyl cellosolve, and ethyl cellosolve acetate, dimethyl formamide, dimethyl sulfoxide, dioxane, acetone, cyclohexanone, trichloroethylene, and methyl ethyl ketone.
これら溶媒は、単独であるいは2種以上混合して使用す
る。These solvents may be used alone or in combination of two or more.
塗布方法は、従来公知の方法、例えば、回転塗布、ワイ
ヤーバー塗布、デイツプ塗布、エアーナイフ塗布、ロー
ル塗布、ブレード塗布及びカーテン塗布等が可能である
。塗布量は固形分して0.2〜l Og/n?が好まし
い。As the coating method, conventionally known methods such as spin coating, wire bar coating, dip coating, air knife coating, roll coating, blade coating, curtain coating, etc. can be used. The amount of application is 0.2 to 1 Og/n based on solid content. is preferred.
本発明の感光性平版印刷版の支持体にはアルミニウム板
を用いることが好ましい。硝酸又は硝酸を主成分とする
電解溶液中、もしくは塩酸又は塩酸を主成分とする電解
溶液中で電解粗面化することにより砂目立て処理し、好
ましくは、更に陽極酸化処理及び必要に応じて封孔処理
等の表面処理したものを使用する。It is preferable to use an aluminum plate as the support for the photosensitive lithographic printing plate of the present invention. The surface is grained by electrolytic roughening in nitric acid or an electrolytic solution containing nitric acid as a main component, or in hydrochloric acid or an electrolytic solution containing hydrochloric acid as a main component, preferably further anodized and sealed if necessary. Use one that has undergone surface treatment such as hole treatment.
電解粗面化は、0.1〜0.5 mol/ 1、好まし
くは0.2〜0.4 mol / lの硝酸もしくは塩
酸を含有する浴中にアルミニウム板を浸漬し、20〜5
0℃、好ましくは25〜40℃の温度、電流密度20〜
200 A/dm2で10秒〜3分程度電解エツチング
することが好ましい。この砂目立て処理の後、必要に応
じてアルカリあるいは酸の水溶液によってデスマット処
理を行なって中和し、水洗する。Electrolytic surface roughening is carried out by immersing an aluminum plate in a bath containing 0.1 to 0.5 mol/l, preferably 0.2 to 0.4 mol/l of nitric acid or hydrochloric acid, and
Temperature of 0°C, preferably 25-40°C, current density of 20-40°C
It is preferable to perform electrolytic etching at 200 A/dm2 for about 10 seconds to 3 minutes. After this graining treatment, if necessary, a desmut treatment is performed with an aqueous alkali or acid solution to neutralize the material, and the material is washed with water.
陽極酸化処理は、電解液として硫酸、クロム酸、シュウ
酸、リン酸、マロン酸等を1種又は2種以上含む溶液を
用い、アルミニウム板を陽極にして電解することにより
行なう。形成された陽極酸化皮膜量は1〜50mg/d
m”が適当であり、好ましくはlO〜40mg/dm”
である。ここで陽極酸化皮膜量は、例えばアルミニウム
液をリン酸クロム酸溶液(85%リン酸水溶液35II
11と、酸化クロム(Vl)20gとをIItの水に溶
解して生成)に浸漬して酸化皮膜を溶解し、板の皮膜溶
解前後の重置変化を測定することにより求めることがで
きる。The anodizing treatment is performed by electrolyzing using an aluminum plate as an anode using a solution containing one or more of sulfuric acid, chromic acid, oxalic acid, phosphoric acid, malonic acid, etc. as an electrolyte. The amount of anodic oxide film formed is 1 to 50 mg/d
m" is suitable, preferably 1O to 40 mg/dm"
It is. Here, the amount of anodized film is determined by, for example, replacing the aluminum solution with a phosphoric acid chromic acid solution (85% phosphoric acid aqueous solution 35II).
11 and 20 g of chromium oxide (Vl) dissolved in IIt water) to dissolve the oxide film, and measure the change in position before and after the film is dissolved.
封孔処理としては、沸騰水処理、水蒸気処理、ケイ酸ソ
ーダ処理、重クロム酸塩水溶液処理等がある。この他に
アルミニウム支持体に対して、水溶性高分子化合物や、
フッ化ジルコン酸等の金属塩の水溶液により下引処理を
施すこともできる。Pore sealing treatments include boiling water treatment, steam treatment, sodium silicate treatment, dichromate aqueous solution treatment, and the like. In addition, water-soluble polymer compounds,
Subbing treatment can also be performed using an aqueous solution of a metal salt such as fluorinated zirconate.
このようにして得られた感光性平版印刷版は公知の方法
により使用することができる。典型的には、感光性印刷
版にネガ型フィルムを密着させ、超高圧水銀灯、メタル
ハライドランプ灯で露光し、公知の様々な現像液を用い
て現像し、印刷版とする。このようにして作製された平
版印刷版は枚葉、オフ輪用印刷機において使用すること
ができる。The photosensitive lithographic printing plate thus obtained can be used by a known method. Typically, a negative film is brought into close contact with a photosensitive printing plate, exposed to light using an ultra-high pressure mercury lamp or a metal halide lamp, and developed using various known developers to obtain a printing plate. The lithographic printing plate produced in this way can be used in sheet-fed and off-wheel printing presses.
すなわち、線画像、網点画像灯を有する透明原画を通し
て感光し、次いで、水性現像液で現像することにより、
原画に対してネガのリレーフ像が得られる。露光に好適
な光源としては、カーボンアーク灯、水銀灯、キセノン
ランプ、メタルハライドランプ、ストロボ等が挙げられ
る。That is, by exposing through a transparent original with a line image, a halftone image lamp, and then developing with an aqueous developer,
A negative relief image is obtained for the original image. Light sources suitable for exposure include carbon arc lamps, mercury lamps, xenon lamps, metal halide lamps, strobes, and the like.
本発明の感光性平版印刷版の現像処理に用いられる現像
液は公知のいずれであっても良いが、例えば、ベンジル
アルコールやエチレングリコールモノフェニルエーテル
に代表される有機溶媒、アルカリ金属のケイ酸塩や有機
アミン化合物のようなアルカリ剤、および水を主成分と
して含有するものや、有機溶媒を含まず、上記アルカリ
剤、高級アルコール硫酸エステル塩類やアルキルアリー
ルスルホン酸塩類に代表されるアニオン型界面活性剤、
および有機カルボン酸を主成分として含有するものを用
いることが好ましい。The developer used in the development of the photosensitive lithographic printing plate of the present invention may be any known developer, but examples include organic solvents such as benzyl alcohol and ethylene glycol monophenyl ether, and alkali metal silicate. and alkaline agents such as organic amine compounds, and those containing water as a main component, those that do not contain organic solvents, and anionic surfactants such as the above alkaline agents, higher alcohol sulfate ester salts and alkylaryl sulfonates. agent,
It is preferable to use one containing an organic carboxylic acid as a main component.
本発明の感光性平版印刷版は、像様露光した後、上述の
現像液に接触させたり、あるいはこすったすすれば、約
10℃〜40℃にて10〜60秒後には、感光層の露光
部に悪影響を及ぼすことなく、非露光部の感光性組成物
が完全に除去されることになる。After the photosensitive lithographic printing plate of the present invention is imagewise exposed, if it is brought into contact with the above-mentioned developer or rubbed and rinsed, the photosensitive layer will be removed after 10 to 60 seconds at about 10 to 40 degrees Celsius. The photosensitive composition in the non-exposed areas is completely removed without adversely affecting the exposed areas.
以下本発明を実施例により更に具体的に説明するが、本
発明はこれら実施例に限定されない。EXAMPLES The present invention will be described in more detail below with reference to Examples, but the present invention is not limited to these Examples.
(共縮合ジアゾ樹脂の合成)
p−ヒドロキシ安息香酸3.5 g (0,025モル
)および4−ジアゾ−4′−メトキシジフェニルアミン
硫酸塩22.0 g (0,075モル)を水冷下で9
0gの濃硫酸に溶解した。この反応後に2.7gのパラ
ホルムアルデヒド(0,09モル)をゆっくり添加した
。この際、反応温度が10℃を超えないように添加して
いった。その後、2時間水冷下かくはんを続けた。この
反応混合物を水冷下、11のエタノールに注入し、生じ
た沈澱を濾過した。(Synthesis of co-condensed diazo resin) 3.5 g (0,025 mol) of p-hydroxybenzoic acid and 22.0 g (0,075 mol) of 4-diazo-4'-methoxydiphenylamine sulfate were mixed under water cooling with 9
Dissolved in 0g of concentrated sulfuric acid. After this reaction, 2.7 g of paraformaldehyde (0.09 mol) were added slowly. At this time, the addition was carried out so that the reaction temperature did not exceed 10°C. Thereafter, stirring was continued for 2 hours under water cooling. This reaction mixture was poured into 11 ethanol under water cooling, and the resulting precipitate was filtered.
エタノールで洗浄後、この沈澱物を200mj+の純水
に溶解し、この液に10.5 gの塩化亜鉛を溶解した
冷濃厚水溶液を加えた。生じた沈澱を濾過した後エタノ
ールで洗浄し、これを30On11の純水に溶解した。After washing with ethanol, this precipitate was dissolved in 200 mj+ pure water, and a cold concentrated aqueous solution in which 10.5 g of zinc chloride was dissolved was added to this solution. The resulting precipitate was filtered, washed with ethanol, and dissolved in 30On11 pure water.
この液に13.7 gのへキサフルオロリン酸アンモニ
ウムを溶解した冷濃厚水溶液を加えた。生じた沈澱を濾
別し水洗した後、30℃、1昼夜乾燥して共縮合ジアゾ
樹脂−1を得た。A cold concentrated aqueous solution containing 13.7 g of ammonium hexafluorophosphate was added to this solution. The resulting precipitate was filtered, washed with water, and then dried at 30°C for one day and night to obtain co-condensed diazo resin-1.
この共縮合ジアゾ樹脂−1をGPCにより分子量を測定
したところ、重量平均分子量で約2,300であった。When the molecular weight of this co-condensed diazo resin-1 was measured by GPC, the weight average molecular weight was about 2,300.
次に、アルミニウム板を3%水酸化ナトリウム水溶液に
て脱脂し、これを2%塩酸浴中で25℃、3A/dm”
の電流密度で電解エソチッグし、水洗後、5.3%硫酸
浴中で30℃1.5A/dm”の条件で2分間陽極酸化
処理した。次に1%メタケイ酸ナトリウム水溶液85℃
30秒間封孔処理し、水酸乾燥して、平版印刷版用アル
ミニウム板を得た。Next, the aluminum plate was degreased with a 3% aqueous sodium hydroxide solution, and then heated at 25°C in a 2% hydrochloric acid bath at 3A/d.
After washing with water, anodizing was performed at 30°C for 2 minutes at 1.5A/dm'' in a 5.3% sulfuric acid bath.Next, a 1% aqueous sodium metasilicate solution was applied at 85°C.
The pores were sealed for 30 seconds and dried with hydroxide to obtain an aluminum plate for a lithographic printing plate.
このアルミニウム板に次のような組成の感光液を乾燥後
の膜重量が1.1g/rdとなるように塗布して、感光
性平版印刷版試料を作成した。A photosensitive lithographic printing plate sample was prepared by coating this aluminum plate with a photosensitive liquid having the following composition so that the film weight after drying was 1.1 g/rd.
共縮合ジアゾ樹脂 1gH31P/
AN/HA/MAAの共重合体 10gジュリ
マー AC−1OL (日本純薬(援) 0.6g
ビクトリアピュアブルーB OH0,2g(採土ケ谷化
学@)
シランカップリング剤 第1表に記載メチルセ
ロソルブ 150gなお、上記共重合体
の割合(カッコで示す)および構造式を次に示す。Co-condensed diazo resin 1gH31P/
AN/HA/MAA copolymer 10g Jurimer AC-1OL (Nippon Pure Pharmaceutical Co., Ltd.) 0.6g
Victoria Pure Blue B OH 0.2 g (Odugaya Kagaku@) Silane coupling agent Listed in Table 1 Methyl cellosolve 150 g The proportions (shown in parentheses) and structural formula of the above copolymer are shown below.
第 1 表 で25℃40秒浸漬し脱脂綿で軽くこすって現像した。Chapter 1 Table The film was immersed at 25°C for 40 seconds and developed by rubbing lightly with absorbent cotton.
結果を第2表に示す。The results are shown in Table 2.
第 2 表
なお、比較例2はバインダーとして、1lyP/AN/
EA/MA/MA^(10/25/15/4515)を
用いた。比較例3は、共縮合樹脂に代えて、ジフェニル
アミンとパラホルムアルデヒドの縮合樹脂(対アニオン
PF、−)を用いた。Table 2 Note that Comparative Example 2 uses 1lyP/AN/
EA/MA/MA^ (10/25/15/4515) was used. In Comparative Example 3, a condensation resin of diphenylamine and paraformaldehyde (counter anion PF, -) was used instead of the cocondensation resin.
得られた試料にネガ原画及びステップウェッジ(濃度差
0.15)をのせて、2kWのメタルハライドランプで
60cmの距離から30秒露光した後、5DN−21現
像液(コニカ社製、l:3希釈)また、5DN−21の
希釈率を1:11にしたときの非画線部の汚れを第3表
に示す。A negative original image and a step wedge (density difference 0.15) were placed on the obtained sample, and after exposure for 30 seconds from a distance of 60 cm using a 2 kW metal halide lamp, 5DN-21 developer (manufactured by Konica Corporation, diluted 1:3) was applied. ) Also, Table 3 shows the stains in the non-print areas when the dilution ratio of 5DN-21 was 1:11.
またUV印刷用の洗い油ツルフィツト(クラレイソブレ
ンケミカル社製)に30秒浸漬し、残っている画線部の
残膜率を測定したところ、第5表の通りであった。Further, the film was immersed in UV printing cleaning oil Tsurfit (manufactured by Clarei Sobrene Chemical Co., Ltd.) for 30 seconds, and the residual film rate of the remaining image area was measured, and the results were as shown in Table 5.
第 5 表
○・・・全く汚れていない
×・・・汚れている
△・・・わずかに汚れている
これらの試料をウルトラプレートクリーナに1時間浸漬
し画線部の侵され方を見たところ、第4表の通りであっ
た。Table 5 ○... Not dirty at all ×... Dirty △... Slightly dirty These samples were immersed in Ultra Plate Cleaner for 1 hour to see how the printed areas were eroded. , as shown in Table 4.
第 4 表
〔発明の効果〕
以上の通り、本発明によれば、現像性、耐薬品性および
UV印刷適性などに優れる印刷版を得ることができる。Table 4 [Effects of the Invention] As described above, according to the present invention, a printing plate having excellent developability, chemical resistance, UV printability, etc. can be obtained.
○・・・はとんど変化なし ×・・・画線部がとれている○... has almost no change ×...The drawing area is removed.
Claims (1)
おいて;前記感光層が、 (A)少くとも1つのカルボキシル基、ならびに少くと
も1つのヒドロキシル基のうち少くとも一方の有機基を
有する芳香族化合物と、芳香族ジアゾニウム化合物とを
構成単位として含む共縮合ジアゾ樹脂、 (B)シランカップリング剤およびチタンカップリング
剤のうち少くとも1種のカップリング剤、を含有するこ
とを特徴とするネガ型感光性印刷版。(1) In a negative photosensitive printing plate having a photosensitive layer on a support; the photosensitive layer contains at least one organic group of (A) at least one carboxyl group and at least one hydroxyl group; a co-condensed diazo resin containing an aromatic diazonium compound as a constituent unit, and (B) at least one coupling agent selected from a silane coupling agent and a titanium coupling agent. A negative photosensitive printing plate.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15271888A JPH024258A (en) | 1988-06-21 | 1988-06-21 | Negative photosensitive printing plate |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15271888A JPH024258A (en) | 1988-06-21 | 1988-06-21 | Negative photosensitive printing plate |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH024258A true JPH024258A (en) | 1990-01-09 |
Family
ID=15546637
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP15271888A Pending JPH024258A (en) | 1988-06-21 | 1988-06-21 | Negative photosensitive printing plate |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH024258A (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH04274430A (en) * | 1991-03-01 | 1992-09-30 | Fuji Photo Film Co Ltd | Photosensitive composition |
| JPH05142768A (en) * | 1991-11-20 | 1993-06-11 | Fuji Photo Film Co Ltd | Photosensitive composition |
| EP0762208A2 (en) | 1995-09-08 | 1997-03-12 | Konica Corporation | Light sensitive composition, presensitized lithographic printing plate and image forming method employing the printing plate |
| JP2012192539A (en) * | 2011-03-15 | 2012-10-11 | Seiko Epson Corp | Printing method and semiconductor device |
-
1988
- 1988-06-21 JP JP15271888A patent/JPH024258A/en active Pending
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH04274430A (en) * | 1991-03-01 | 1992-09-30 | Fuji Photo Film Co Ltd | Photosensitive composition |
| JPH05142768A (en) * | 1991-11-20 | 1993-06-11 | Fuji Photo Film Co Ltd | Photosensitive composition |
| EP0762208A2 (en) | 1995-09-08 | 1997-03-12 | Konica Corporation | Light sensitive composition, presensitized lithographic printing plate and image forming method employing the printing plate |
| JP2012192539A (en) * | 2011-03-15 | 2012-10-11 | Seiko Epson Corp | Printing method and semiconductor device |
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