JPH0243916A - Method and apparatus for pressure swing adsorbing - Google Patents
Method and apparatus for pressure swing adsorbingInfo
- Publication number
- JPH0243916A JPH0243916A JP63193596A JP19359688A JPH0243916A JP H0243916 A JPH0243916 A JP H0243916A JP 63193596 A JP63193596 A JP 63193596A JP 19359688 A JP19359688 A JP 19359688A JP H0243916 A JPH0243916 A JP H0243916A
- Authority
- JP
- Japan
- Prior art keywords
- gas
- adsorption
- tower
- recovered
- adsorbing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000000034 method Methods 0.000 title claims abstract description 53
- 239000002994 raw material Substances 0.000 claims abstract description 18
- 238000001179 sorption measurement Methods 0.000 claims description 80
- 238000003795 desorption Methods 0.000 claims description 23
- 239000003463 adsorbent Substances 0.000 claims description 16
- 238000004140 cleaning Methods 0.000 claims description 12
- 238000011084 recovery Methods 0.000 claims description 10
- 239000007789 gas Substances 0.000 abstract description 76
- 238000005406 washing Methods 0.000 abstract description 4
- 239000002912 waste gas Substances 0.000 abstract 1
- 238000010586 diagram Methods 0.000 description 8
- 239000012535 impurity Substances 0.000 description 6
- 238000002474 experimental method Methods 0.000 description 3
- 229910021536 Zeolite Inorganic materials 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 2
- HNPSIPDUKPIQMN-UHFFFAOYSA-N dioxosilane;oxo(oxoalumanyloxy)alumane Chemical compound O=[Si]=O.O=[Al]O[Al]=O HNPSIPDUKPIQMN-UHFFFAOYSA-N 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000002699 waste material Substances 0.000 description 2
- 239000010457 zeolite Substances 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
Classifications
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P20/00—Technologies relating to chemical industry
- Y02P20/151—Reduction of greenhouse gas [GHG] emissions, e.g. CO2
Landscapes
- Separation Of Gases By Adsorption (AREA)
- Oxygen, Ozone, And Oxides In General (AREA)
Abstract
Description
【発明の詳細な説明】
[a業上の利用分野]
本発明は高純度ガスの製造に利用される圧力スイング吸
着方法及び装置(以下車にPSA方法及びPSA装置と
いう)に関し、詳細には吸着塔内における不純成分の残
存を極力抑制して製品ガスをより高純度に得ることので
きるPSA方法及びPSA装置に関するものである。Detailed Description of the Invention [Field of Application in Industry A] The present invention relates to a pressure swing adsorption method and device (hereinafter referred to as a PSA method and a PSA device) used in the production of high-purity gas, and more particularly, The present invention relates to a PSA method and a PSA device that can obtain product gas with higher purity by suppressing the remaining impurity components in the column as much as possible.
以下においてはその代表例として原料空気からN2ガス
を高純度に回収するPSA装置及びPSA方法について
説明するが、本発明の適用対象はこれによって限定解釈
されてはならない。In the following, a PSA device and a PSA method for recovering N2 gas with high purity from raw material air will be described as a representative example, but the scope of application of the present invention should not be construed as limited by this.
[従来の技術]
原料空気をPSA装置に導入してN2ガスを濃縮回収す
る方法を大別すると、02ガスを吸着剤に吸着させて除
去する方法、及びN2ガスを吸着剤に吸着させ更に脱着
回収する方法の2つに分類される。このうち後者はゼオ
ライト系の吸着剤を吸着塔内に装填し、N2ガス吸着後
の吸着塔を減圧することにより、高純度のN2ガスを脱
着回収する方法である。以下この方法に利用されるPS
A装置について説明する。[Prior art] Methods for concentrating and recovering N2 gas by introducing raw air into a PSA device can be roughly divided into two methods: a method in which 02 gas is adsorbed on an adsorbent and removed, and a method in which N2 gas is adsorbed on an adsorbent and further desorbed. There are two types of collection methods. Among these, the latter is a method in which a zeolite-based adsorbent is loaded into an adsorption tower and the pressure of the adsorption tower is reduced after N2 gas adsorption, thereby desorbing and recovering high-purity N2 gas. PS used for this method below
Device A will be explained.
第3図は前処理装置2によってN20とCo2を除去し
た後の02 / N 2混合ガスを3塔式のPSA装置
に供給してN2ガスを選択的に回収する装置の概略説明
図である。FIG. 3 is a schematic explanatory diagram of an apparatus for selectively recovering N2 gas by supplying the 02/N2 mixed gas from which N20 and Co2 have been removed by the pretreatment apparatus 2 to a three-column PSA apparatus.
圧縮機9によって加圧された空気は前処理装置2に送給
され、吸着剤にN20及びC02成分を吸着させて除去
し、これを通過した0□/ N 2混合ガスをPSA装
置の原料ガス供給管1aへ送り込む。原料ガス供給管1
aは自動開閉弁(以下車に弁という)■、〜■3を介し
て吸着塔3a3b、3c頂部に接続され、各吸着塔の底
部には弁V4〜V6を介して排ガス廃棄管4aが連結さ
れる。また各吸着塔3a、3b、3cの底部には脱着用
管5a、5b、5cが配設され、夫々弁■ア〜v9を介
してそれより下流側で合流される。合流された脱着用管
5には真空ポンプ6が設けられて製品ガスホルダ20に
連結され、吸着塔3a、3b、3cより脱着回収された
高純度N2ガスを貯留する。前記製品ガスホルダ20に
は、製品ガスの一部を吸着塔の洗浄のために抜き出す洗
浄用管8が配設され、該洗浄用管8は分岐された後弁V
I3〜VISを介して吸着塔3a、3b。The air pressurized by the compressor 9 is sent to the pretreatment device 2, where the adsorbent adsorbs and removes N20 and CO2 components, and the 0□/N2 mixed gas that has passed through this is used as the raw material gas for the PSA device. Send it into the supply pipe 1a. Raw material gas supply pipe 1
A is connected to the top of adsorption towers 3a, 3b and 3c via automatic on-off valves (hereinafter referred to as valves) 3, and exhaust gas waste pipe 4a is connected to the bottom of each adsorption tower via valves V4 to V6. be done. Furthermore, desorption pipes 5a, 5b, and 5c are provided at the bottoms of the adsorption towers 3a, 3b, and 3c, and the pipes are merged downstream from the pipes via valves (1) to (v9), respectively. The combined desorption tube 5 is provided with a vacuum pump 6 and connected to the product gas holder 20, and stores the high-purity N2 gas desorbed and recovered from the adsorption towers 3a, 3b, and 3c. The product gas holder 20 is provided with a cleaning pipe 8 for extracting a part of the product gas for cleaning the adsorption tower, and after the cleaning pipe 8 is branched, a valve V
Adsorption towers 3a, 3b via I3-VIS.
3cの各頂部に連結される。尚各吸着塔3a。3c. In addition, each adsorption tower 3a.
3b、3cは連結配管10a、10b、10cによって
直列的に連結され、各連結管には弁VIO〜v1□が設
けられる。3b and 3c are connected in series by connecting pipes 10a, 10b, and 10c, and each connecting pipe is provided with valves VIO to v1□.
第4図は、吸着塔3a、3b、3cのうち1塔の作動工
程を示すタイムスケジュール(時間は左から右方向に進
む)であり、吸着工程開始時から脱着工程終了時までの
作動工程を1工程サイクルとしている。この1工程サイ
クルは図示の如く吸着工程、回収工程、洗浄工程及び脱
着工程より構成される。まず吸着工程では脱着工程で減
圧された吸着塔内を昇圧する操作として、02/N2混
合ガスを供給管1aから加圧供給し、回収目的成分のN
2ガスを吸着剤に吸着させ不純成分ガス(主に0.ガス
)を排ガス廃棄管4aを介して放出させる。又脱着工程
では吸着塔を真空ポンプ6によって減圧し、塔内の吸着
剤に吸着されたN2成分を脱着し、脱着用管5を通して
製品ガスホルダ20に回収貯留する。Figure 4 is a time schedule (time progresses from left to right) showing the operating process of one of the adsorption towers 3a, 3b, and 3c, and shows the operating process from the start of the adsorption process to the end of the desorption process. It is one process cycle. As shown in the figure, this one-step cycle consists of an adsorption step, a recovery step, a washing step, and a desorption step. First, in the adsorption process, as an operation to increase the pressure inside the adsorption tower, which has been depressurized in the desorption process, 02/N2 mixed gas is supplied under pressure from the supply pipe 1a, and the N of the target component to be recovered is
2 gases are adsorbed by the adsorbent, and impure component gases (mainly 0.2 gases) are released through the exhaust gas waste pipe 4a. In the desorption step, the adsorption tower is depressurized by the vacuum pump 6, and the N2 component adsorbed by the adsorbent in the tower is desorbed and collected and stored in the product gas holder 20 through the desorption pipe 5.
次に回収工程及び洗浄工程を、第3図の吸着塔3aの場
合を例に挙げて説明する。Next, the recovery process and the washing process will be explained using the case of the adsorption tower 3a in FIG. 3 as an example.
即ち製品ガスホルダ2o側からの高純度N2ガスは矢印
Aに示す様に洗浄用管8を通って吸着塔3c内へ導入さ
れ、該吸着塔3a内に残留する不純成分をN2成分と置
換し、これによって追放されたガスは矢印Bに示す様に
吸着工程の終了した吸着塔3bへ連結配管10aを介し
て送り込まれる。従ってこのとき吸着塔3aでは洗浄工
程が行なわれ、吸着塔3bではN2の回収工程が行なわ
れる。That is, high-purity N2 gas from the product gas holder 2o side is introduced into the adsorption tower 3c through the cleaning pipe 8 as shown by arrow A, replacing impurity components remaining in the adsorption tower 3a with N2 components, The gas thus expelled is sent via the connecting pipe 10a to the adsorption tower 3b where the adsorption process has been completed, as shown by arrow B. Therefore, at this time, a cleaning process is performed in the adsorption tower 3a, and a N2 recovery process is performed in the adsorption tower 3b.
[発明が解決しようとする課題]
第5図(a)〜 (d)は吸着塔3aの各工程における
N2ガス吸着状態を示す模式説明図である。尚斜線部は
N2の高濃度吸着部分を示す。図の様に吸着塔3aの頂
部側から原料ガス及び洗浄ガス等が供給される場合は、
該吸着塔の上方側よりN2成分の吸着又は置換が進行し
、下方部分においては不純成分であ、る0□成分が脱着
工程の開始時まで残存することになる(吸着剤中の02
成分はN2成分と置換されずに吸着されたまま残ってい
たり、或は吸着剤の装填隙間に残存していたりする)。[Problems to be Solved by the Invention] FIGS. 5(a) to 5(d) are schematic explanatory diagrams showing the N2 gas adsorption state in each step of the adsorption tower 3a. Note that the shaded area indicates a high concentration adsorption area of N2. When the raw material gas, cleaning gas, etc. are supplied from the top side of the adsorption tower 3a as shown in the figure,
Adsorption or replacement of the N2 component proceeds from the upper side of the adsorption tower, and in the lower part, the impure component, the 0□ component, remains until the start of the desorption process (02 in the adsorbent).
The component may remain adsorbed without being replaced by the N2 component, or may remain in the loading gap of the adsorbent).
特に上記の様に吸着工程において02/N2混合ガスが
吸着塔の頂部側より供給されると、N2成分の吸着は装
填吸着剤の上方から進行し、吸着塔下方部においては0
2リツチの混合ガスが接触することになり、02成分が
残存する比率が高くなる。In particular, as mentioned above, when the 02/N2 mixed gas is supplied from the top side of the adsorption tower in the adsorption process, the adsorption of the N2 component proceeds from above the loaded adsorbent, and in the lower part of the adsorption tower there is no
2 rich of the mixed gas will come into contact with each other, increasing the proportion of the 02 component remaining.
その結果脱着工程において回収されるN2ガス濃度は9
9.9%とするのが限度であり、これ以上高純度のN2
ガス回収は不可能とされていた。As a result, the concentration of N2 gas recovered in the desorption process was 9
The upper limit is 9.9%, and higher purity N2
Gas recovery was considered impossible.
そこで本発明者らは回収目的成分ガスを99.9%以上
の高純度で得ることを目的として研究を積み重ねた結果
、本発明を完成したのである。Therefore, the present inventors have completed the present invention as a result of repeated research aimed at obtaining a component gas to be recovered with a high purity of 99.9% or more.
[課題を解決するための手段]
上記目的を達成した本発明方法は、脱着工程終了後の吸
着塔へ高純度の回収目的成分ガスを150〜300mm
Hgまで初期導入し、その後、前記吸着塔の初期導入口
の反対側より原料ガスを供給して吸着工程を行なうこと
を要旨とする。[Means for Solving the Problems] The method of the present invention, which achieves the above object, supplies high-purity recovery target component gas to an adsorption tower after the desorption step is 150 to 300 mm.
The gist is to initially introduce up to Hg, and then to perform the adsorption step by supplying the raw material gas from the opposite side of the initial introduction port of the adsorption tower.
また上記方法に利用する圧力スイング吸着装置は、前記
吸着塔における原料ガス供給管接続側と対峙する側には
、前記洗浄管から分岐した初期導入管が連結されてなる
点を要旨とするものである。Further, the pressure swing adsorption apparatus used in the above method is characterized in that an initial introduction pipe branched from the cleaning pipe is connected to the side of the adsorption tower opposite to the raw material gas supply pipe connection side. be.
[作用及び実施例]
第1図(A)は本発明の代表的なPSA装置の実施例を
示す概略説明図である。第3図に示す従来装置と相違す
る特徴的な構成は、洗浄管8を分岐して初期導入管11
a、llb、llcを配設し、各初期導入管11a、j
lb、llcは自動開閉弁via〜Viaを介して各吸
着塔3a、3b。[Operations and Examples] FIG. 1(A) is a schematic explanatory diagram showing an example of a typical PSA device of the present invention. The characteristic configuration different from the conventional device shown in FIG.
a, llb, llc are arranged, and each initial introduction pipe 11a, j
lb and llc are connected to each adsorption tower 3a and 3b via automatic on-off valves via to via.
3cの底部へ連結した点にある。即ち各吸着塔において
原料ガス供給管1aの接続位置と上下反対側に初期導入
管11a、llb、llcを接続する。It is located at the point connected to the bottom of 3c. That is, in each adsorption tower, the initial introduction pipes 11a, llb, and llc are connected to the upper and lower sides opposite to the connection position of the raw material gas supply pipe 1a.
第2図(A)〜(D)は第1図(A)に示したPSA装
置による吸着塔3aにおける吸着工程直前から脱着工程
直前までを順に示す模式説明図である。FIGS. 2(A) to 2(D) are schematic explanatory diagrams sequentially showing the steps from immediately before the adsorption step to immediately before the desorption step in the adsorption tower 3a using the PSA apparatus shown in FIG. 1(A).
第2図(A)に示す様に、脱着工程が終了して吸着工程
を開始する直前に、前記初期導入管11aを通して製品
ガスホルダ20内の高純度N2ガスを吸着塔3aの底部
側から塔内に導入し、主として塔内下方部側に装填され
た吸着剤にN2成分を吸着させておく。その後弁の切換
えを行なって吸着工程に移行し、原料ガス供給管1aよ
り02/N2混合ガスを吸着塔3a頂部側から導入する
[第2図(B) ]。このとき吸着剤へのN2成分の吸
着は吸着塔3a上方部から進行し、該工程前のN2初期
導入に加えて本工程供給N2を塔内の吸着剤に吸着させ
、吸着工程を終了する。これによって吸着剤に吸着され
る0□成分は従来に比べて減少し、この時点で既に不純
成分濃度の低下が達成される。なぜなら吸着工程時に0
2リツチなガスと接触される吸着剤には初期導入によっ
てすでにN2が吸着されており、o2吸着の割合は非常
に低いものとなるからである。As shown in FIG. 2(A), immediately before the desorption process is completed and the adsorption process is started, high-purity N2 gas in the product gas holder 20 is introduced into the tower from the bottom side of the adsorption tower 3a through the initial introduction pipe 11a. The N2 component is mainly introduced into the column and adsorbed on the adsorbent loaded in the lower part of the column. Thereafter, the valve is switched to proceed to the adsorption step, and the 02/N2 mixed gas is introduced from the top side of the adsorption tower 3a through the raw material gas supply pipe 1a [FIG. 2(B)]. At this time, the adsorption of the N2 component onto the adsorbent proceeds from the upper part of the adsorption tower 3a, and in addition to the initial introduction of N2 before this step, the N2 supplied in this step is adsorbed onto the adsorbent in the tower, and the adsorption step is completed. As a result, the number of 0□ components adsorbed by the adsorbent is reduced compared to the conventional method, and at this point, a reduction in the impurity component concentration is already achieved. This is because 0 during the adsorption process.
This is because the adsorbent that comes into contact with the O2-rich gas has already adsorbed N2 upon initial introduction, and the rate of O2 adsorption will be very low.
そして第2図(C) 、 (D)に示す回収工程及び洗
浄工程によって僅かに残留している不純成分ガスをほぼ
完全に追放した後、脱着工程において高純度N2ガスを
回収する。After the slightly remaining impurity component gas is almost completely expelled by the recovery process and cleaning process shown in FIGS. 2(C) and 2(D), high-purity N2 gas is recovered in the desorption process.
上記の様に吸着工程直前に、吸着塔における原料ガス導
入方力に対して反対側から高純度N2ガスを導入してお
くことによって、脱着工程まで塔内に不純成分が残るの
が抑制できる様になり、回収されるN2ガス純度は99
.99%以上を達成することができる様になる。As mentioned above, by introducing high-purity N2 gas from the side opposite to the feed gas introduction direction in the adsorption tower immediately before the adsorption process, it is possible to prevent impurity components from remaining in the tower until the desorption process. The purity of the recovered N2 gas is 99
.. You will be able to achieve 99% or more.
第1図(B)は初期導入管11a、llb。FIG. 1(B) shows the initial introduction tubes 11a and llb.
11cによる吸着塔へのN2ガス供給量(分圧で示す)
と製品ガス純度との関係を示すグラフである。即ち吸着
塔の大きさは直径80 mm、高さ1000mmとし、
吸着工程における原料供給を0.5〜0.1 kg/c
m”Gで行ない、脱着工程を真空ポンプによって100
〜50 m+nHgまで減圧して脱着を行なった。その
結果吸着工程直前の高純度N2ガスの導入は150〜3
00mmHgの範囲とする必要があることが分かった。Amount of N2 gas supplied to the adsorption tower by 11c (indicated by partial pressure)
It is a graph showing the relationship between and product gas purity. That is, the size of the adsorption tower is 80 mm in diameter and 1000 mm in height.
0.5 to 0.1 kg/c of raw material supply in the adsorption process
m”G, and the desorption process was carried out at 100 mG using a vacuum pump.
Desorption was performed under reduced pressure to ~50 m+nHg. As a result, the introduction of high-purity N2 gas just before the adsorption process was 150~3
It was found that it was necessary to keep the temperature within the range of 00 mmHg.
なぜならば150mmHg未満であるとN2ガスを初期
導入しても従来と比較して回収ガス濃度の向上効果はさ
ほど期待できず、また300mmHgより多くなると吸
着工程に招けるN2吸着量が減少してしまい回収率が低
下してしまうためである。This is because if it is less than 150 mmHg, even if N2 gas is initially introduced, it cannot be expected to have much effect on improving the recovered gas concentration compared to the conventional method, and if it is more than 300 mmHg, the amount of N2 adsorbed in the adsorption process will decrease. This is because the recovery rate will decrease.
(比較実験例)
第1図(A)及び第3図に示した構造のPSA装置を使
って下記の条件で夫々N2ガス回収実験を行なって夫々
の回収ガス濃度を調べた。尚第1図(A) に示すPS
Aの使用に当たっては吸着工程開始直前に2秒間高純度
N2ガスの導入を行なった。(Comparative Experimental Example) Using the PSA apparatus having the structure shown in FIG. 1(A) and FIG. 3, N2 gas recovery experiments were conducted under the following conditions to examine the concentration of each recovered gas. Note that the PS shown in Figure 1 (A)
When using A, high purity N2 gas was introduced for 2 seconds immediately before the start of the adsorption process.
各吸着塔の内径を80mm、高さをZoo□+mとし、
充填する吸着剤は合成ゼオライト5A型を用いた。The inner diameter of each adsorption tower is 80 mm, the height is Zoo + m,
Synthetic zeolite type 5A was used as the adsorbent to be filled.
原料ガス供給圧カニ 0.2 kg/cm”G、脱着圧
カニ 70 Torr、
1塔の1工程サイクル=1分、
圧縮機9への
原料空気供給量:320ONIL/h、N2ガスの回収
量: 800 NfL/h。Raw material gas supply pressure: 0.2 kg/cm"G, desorption pressure: 70 Torr, 1 process cycle of 1 column = 1 minute, Raw material air supply amount to compressor 9: 320ONIL/h, N2 gas recovery amount: 800 NfL/h.
の条件で各々実験を行なった。Experiments were conducted under the following conditions.
この実験の結果、従来装置(第3図に示す)によって製
品ガスホルダ20内に回収されたN2成分の濃度は99
.9%であったのに対し、本発明のPSA装置の場合、
N2濃度は99.997%まで高めることができた。As a result of this experiment, the concentration of N2 component recovered in the product gas holder 20 by the conventional device (shown in FIG. 3) was 99.
.. 9%, whereas in the case of the PSA device of the present invention,
The N2 concentration could be increased to 99.997%.
各吸着塔において原料ガス供給側と反対側から高純度N
2ガスを吸着工程直前に導入する方法としては、第1図
(八)に示す実施例に限定されず、製品ガスホルダ20
とは別のN2ガスホルダを設けて該ホルダから吸着塔へ
初期導入管を接続するものであっても良いし、或は真空
ポンプ6の出口側又は製品ガスホルダ20から分岐して
初期導入管を連結するもの等であっても構わない。In each adsorption tower, high purity N is supplied from the side opposite to the feed gas supply side.
The method of introducing the two gases immediately before the adsorption process is not limited to the embodiment shown in FIG.
A separate N2 gas holder may be provided and the initial introduction pipe may be connected from the holder to the adsorption tower, or the initial introduction pipe may be connected to the outlet side of the vacuum pump 6 or branched from the product gas holder 20. It doesn't matter if it's something you do.
[発明の効果]
請求項(1)の方法によって脱着工程開始に至るまで吸
着塔内に残存する不純成分濃度を低減できるようになっ
た。また請求項(2)の装置により回収目的成分の所定
分圧を吸着工程直前の吸着塔へ正確に導入できる様にな
った。[Effects of the Invention] The method of claim (1) makes it possible to reduce the concentration of impurity components remaining in the adsorption tower until the start of the desorption process. Furthermore, the apparatus of claim (2) makes it possible to accurately introduce a predetermined partial pressure of the component to be recovered into the adsorption tower immediately before the adsorption step.
これらの結果製品ガスとして回収される目的成分ガス濃
度を従来より高純度化することができる様になった。As a result, the concentration of the target component gas recovered as a product gas can be made more purified than before.
【図面の簡単な説明】
第1図(A)は本発明PSA装置の代表的な実施例を示
す概略説明図、第1図(B)は初期導入ガス分圧と製品
ガス純度の関係を示すグラフ、第2図(A)〜 (D)
は第1図(^)のPSA装置による1塔の工程状態を示
す模式説明図、第3図は従来のPSA装置を示す概略説
明図、第4図は1つの吸着塔の工程順序を示す説明図、
第5図は従来のPSA装置による1塔の工程状態を示す
模式説明図である。
la・・・原料ガス供給管 2・・・前処理装置3a
、3b、3c・・・吸着塔 5・・・脱着用管6・
・・真空ポンプ 8・・・洗浄用管9・・・圧縮
機[Brief Description of the Drawings] Figure 1 (A) is a schematic explanatory diagram showing a typical embodiment of the PSA device of the present invention, and Figure 1 (B) shows the relationship between the initially introduced gas partial pressure and the product gas purity. Graph, Figure 2 (A) to (D)
is a schematic explanatory diagram showing the process status of one column using the PSA device of FIG. 1 (^), FIG. 3 is a schematic explanatory diagram showing the conventional PSA device, and FIG. figure,
FIG. 5 is a schematic explanatory diagram showing a process state of one column using a conventional PSA apparatus. la... Raw material gas supply pipe 2... Pretreatment device 3a
, 3b, 3c...Adsorption tower 5...Desorption tube 6.
・・Vacuum pump 8・Cleaning pipe 9・Compressor
Claims (2)
的成分ガスを吸着剤に吸着し、脱着工程で該回収目的成
分ガスを脱着して回収し、上記吸着工程と脱着工程を繰
返す圧力スイング吸着方法において、 脱着工程終了後の吸着塔へ高純度の回収目的成分ガスを
150〜300mmHgまで初期導入し、その後、前記
吸着塔における該初期導入口の反対側より原料ガスを供
給して吸着工程を開始することを特徴とする圧力スイン
グ吸着方法。(1) In the adsorption step, the raw material gas is introduced into the adsorption tower and the target component gas to be recovered is adsorbed on the adsorbent, and in the desorption step, the target component gas to be recovered is desorbed and recovered, and the above adsorption and desorption steps are repeated. In the pressure swing adsorption method, a high-purity recovery target component gas is initially introduced to the adsorption tower after the desorption step is completed to a pressure of 150 to 300 mmHg, and then a raw material gas is supplied from the opposite side of the initial introduction port in the adsorption tower. A pressure swing adsorption method characterized by starting an adsorption process.
を連結してなる圧力スイング吸着装置において、 前記吸着塔における原料ガス供給管接続側と対峙する側
には、前記洗浄管から分岐した初期導入管が連結されて
なることを特徴とする圧力スイング吸着装置。(2) In a pressure swing adsorption device in which a raw material gas supply pipe, a desorption pipe, and a cleaning pipe are connected to an adsorption tower, a side opposite to the raw material gas supply pipe connection side of the adsorption tower is connected to the cleaning pipe from the cleaning pipe. A pressure swing adsorption device characterized by connecting branched initial introduction pipes.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP63193596A JPH0691925B2 (en) | 1988-08-02 | 1988-08-02 | Pressure swing adsorption method and device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP63193596A JPH0691925B2 (en) | 1988-08-02 | 1988-08-02 | Pressure swing adsorption method and device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0243916A true JPH0243916A (en) | 1990-02-14 |
| JPH0691925B2 JPH0691925B2 (en) | 1994-11-16 |
Family
ID=16310587
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP63193596A Expired - Lifetime JPH0691925B2 (en) | 1988-08-02 | 1988-08-02 | Pressure swing adsorption method and device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0691925B2 (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2010069452A (en) * | 2008-09-22 | 2010-04-02 | Sumitomo Seika Chem Co Ltd | Method for separating carbon monoxide and carbon monoxide separation apparatus |
| CN113559672A (en) * | 2021-09-01 | 2021-10-29 | 威海东兴电子有限公司 | Four tower purification devices of high-purity oxygen |
-
1988
- 1988-08-02 JP JP63193596A patent/JPH0691925B2/en not_active Expired - Lifetime
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2010069452A (en) * | 2008-09-22 | 2010-04-02 | Sumitomo Seika Chem Co Ltd | Method for separating carbon monoxide and carbon monoxide separation apparatus |
| CN113559672A (en) * | 2021-09-01 | 2021-10-29 | 威海东兴电子有限公司 | Four tower purification devices of high-purity oxygen |
| CN113559672B (en) * | 2021-09-01 | 2025-06-24 | 威海东兴电子有限公司 | A high-purity oxygen four-tower purification device |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0691925B2 (en) | 1994-11-16 |
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