JPH025006U - - Google Patents
Info
- Publication number
- JPH025006U JPH025006U JP8329788U JP8329788U JPH025006U JP H025006 U JPH025006 U JP H025006U JP 8329788 U JP8329788 U JP 8329788U JP 8329788 U JP8329788 U JP 8329788U JP H025006 U JPH025006 U JP H025006U
- Authority
- JP
- Japan
- Prior art keywords
- metal thin
- conversion element
- thin film
- reflected light
- detection means
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000006243 chemical reaction Methods 0.000 claims description 5
- 239000002184 metal Substances 0.000 claims description 5
- 239000010409 thin film Substances 0.000 claims description 5
- 238000001514 detection method Methods 0.000 claims 2
- 239000010408 film Substances 0.000 claims 2
- 239000011248 coating agent Substances 0.000 claims 1
- 238000000576 coating method Methods 0.000 claims 1
- 239000011521 glass Substances 0.000 claims 1
- 230000001678 irradiating effect Effects 0.000 claims 1
- 229920002120 photoresistant polymer Polymers 0.000 claims 1
- 239000000758 substrate Substances 0.000 claims 1
- 238000005259 measurement Methods 0.000 description 1
Landscapes
- Length Measuring Devices By Optical Means (AREA)
- Investigating Or Analysing Materials By Optical Means (AREA)
Description
第１図は本考案の一実施例を示す断面概略図、
第２図はその上面概略図。
１……レーザ、２……金属薄膜、４……基台、
７……４分割光電変換素子、１１……測定用光電
変換素子。
FIG. 1 is a schematic cross-sectional view showing an embodiment of the present invention;
FIG. 2 is a schematic top view. 1... Laser, 2... Metal thin film, 4... Base,
7...4-split photoelectric conversion element, 11... photoelectric conversion element for measurement.
Claims (1)
たガラス基板の上記金属薄膜の膜厚ムラ測定器で
あつて、上記金属薄膜面にレーザ光を照射する手
段と、その反射光の光量を測定する光電変換素子
と、該光電変換素子への上記反射光の照射位置を
検出する位置検出手段とを有し、上記照射位置を
一定にするよう上記位置検出手段の出力に応じて
上記光電変換素子の位置を制御することを特徴と
する金属薄膜の膜厚ムラ測定器。 This is a film thickness unevenness measuring device for a metal thin film on a glass substrate provided with a metal thin film for coating a photoresist, which comprises a means for irradiating a laser beam onto the surface of the metal thin film, and a photoelectric device for measuring the amount of reflected light. It has a conversion element and a position detection means for detecting the irradiation position of the reflected light onto the photoelectric conversion element, and the position of the photoelectric conversion element is determined according to the output of the position detection means so as to keep the irradiation position constant. A film thickness unevenness measuring device for metal thin films, which is characterized by controlling:
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8329788U JPH025006U (en) | 1988-06-23 | 1988-06-23 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8329788U JPH025006U (en) | 1988-06-23 | 1988-06-23 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH025006U true JPH025006U (en) | 1990-01-12 |
Family
ID=31308021
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP8329788U Pending JPH025006U (en) | 1988-06-23 | 1988-06-23 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH025006U (en) |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5646404A (en) * | 1979-09-25 | 1981-04-27 | Nec Corp | Measuring device of optical film thickness |
| JPS60242308A (en) * | 1984-02-02 | 1985-12-02 | ロ−レンス・エス・キヤニノ | Method and device for measuring thickness of thin sample andmethod and device for measuring characteristic of thin sample |
-
1988
- 1988-06-23 JP JP8329788U patent/JPH025006U/ja active Pending
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5646404A (en) * | 1979-09-25 | 1981-04-27 | Nec Corp | Measuring device of optical film thickness |
| JPS60242308A (en) * | 1984-02-02 | 1985-12-02 | ロ−レンス・エス・キヤニノ | Method and device for measuring thickness of thin sample andmethod and device for measuring characteristic of thin sample |