JPH0250829A - Manufacture of electric laminated board - Google Patents
Manufacture of electric laminated boardInfo
- Publication number
- JPH0250829A JPH0250829A JP63202313A JP20231388A JPH0250829A JP H0250829 A JPH0250829 A JP H0250829A JP 63202313 A JP63202313 A JP 63202313A JP 20231388 A JP20231388 A JP 20231388A JP H0250829 A JPH0250829 A JP H0250829A
- Authority
- JP
- Japan
- Prior art keywords
- resin
- hole
- prepreg
- metal plate
- holes
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000004519 manufacturing process Methods 0.000 title claims description 8
- 239000011347 resin Substances 0.000 claims abstract description 68
- 229920005989 resin Polymers 0.000 claims abstract description 68
- 238000004080 punching Methods 0.000 claims abstract description 5
- 229910052751 metal Inorganic materials 0.000 claims description 63
- 239000002184 metal Substances 0.000 claims description 63
- 239000002131 composite material Substances 0.000 claims description 10
- 238000010438 heat treatment Methods 0.000 claims description 8
- 238000011049 filling Methods 0.000 claims description 3
- 239000000945 filler Substances 0.000 abstract description 23
- 239000011888 foil Substances 0.000 abstract description 12
- 238000000465 moulding Methods 0.000 abstract description 8
- 238000005553 drilling Methods 0.000 abstract description 3
- 238000003475 lamination Methods 0.000 abstract description 2
- 230000000149 penetrating effect Effects 0.000 abstract 6
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 10
- 238000000034 method Methods 0.000 description 7
- 229920001721 polyimide Polymers 0.000 description 7
- 239000011521 glass Substances 0.000 description 6
- 229910052802 copper Inorganic materials 0.000 description 5
- 239000010949 copper Substances 0.000 description 5
- 239000011889 copper foil Substances 0.000 description 5
- 238000007747 plating Methods 0.000 description 5
- 239000000843 powder Substances 0.000 description 5
- 239000004642 Polyimide Substances 0.000 description 4
- 238000001816 cooling Methods 0.000 description 4
- 238000005530 etching Methods 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- 239000002966 varnish Substances 0.000 description 4
- 238000001035 drying Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 239000003822 epoxy resin Substances 0.000 description 3
- 229920000647 polyepoxide Polymers 0.000 description 3
- 239000009719 polyimide resin Substances 0.000 description 3
- VTYYLEPIZMXCLO-UHFFFAOYSA-L Calcium carbonate Chemical compound [Ca+2].[O-]C([O-])=O VTYYLEPIZMXCLO-UHFFFAOYSA-L 0.000 description 2
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 2
- 229910052593 corundum Inorganic materials 0.000 description 2
- 239000004744 fabric Substances 0.000 description 2
- 238000010030 laminating Methods 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 238000002156 mixing Methods 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- 238000004381 surface treatment Methods 0.000 description 2
- 229920001187 thermosetting polymer Polymers 0.000 description 2
- 229910001845 yogo sapphire Inorganic materials 0.000 description 2
- XQUPVDVFXZDTLT-UHFFFAOYSA-N 1-[4-[[4-(2,5-dioxopyrrol-1-yl)phenyl]methyl]phenyl]pyrrole-2,5-dione Chemical class O=C1C=CC(=O)N1C(C=C1)=CC=C1CC1=CC=C(N2C(C=CC2=O)=O)C=C1 XQUPVDVFXZDTLT-UHFFFAOYSA-N 0.000 description 1
- 229920000271 Kevlar® Polymers 0.000 description 1
- 239000002841 Lewis acid Substances 0.000 description 1
- -1 Lewis acid compound Chemical class 0.000 description 1
- 244000061354 Manilkara achras Species 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 239000004760 aramid Substances 0.000 description 1
- 229920006231 aramid fiber Polymers 0.000 description 1
- 230000031709 bromination Effects 0.000 description 1
- 238000005893 bromination reaction Methods 0.000 description 1
- 229910000019 calcium carbonate Inorganic materials 0.000 description 1
- 235000010216 calcium carbonate Nutrition 0.000 description 1
- 238000007906 compression Methods 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 238000007872 degassing Methods 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- 238000010292 electrical insulation Methods 0.000 description 1
- 238000009713 electroplating Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000000835 fiber Substances 0.000 description 1
- 238000000227 grinding Methods 0.000 description 1
- 150000003949 imides Chemical class 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 239000004761 kevlar Substances 0.000 description 1
- 239000004850 liquid epoxy resins (LERs) Substances 0.000 description 1
- 239000000155 melt Substances 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 238000007788 roughening Methods 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 239000000454 talc Substances 0.000 description 1
- 229910052623 talc Inorganic materials 0.000 description 1
Landscapes
- Laminated Bodies (AREA)
- Production Of Multi-Layered Print Wiring Board (AREA)
Abstract
Description
本発明は、金属板を基板として用いた多層の電気積層板
の製造方法に関するものである。The present invention relates to a method for manufacturing a multilayer electrical laminate using a metal plate as a substrate.
金属板2を基板とする電気積層板においては、スルーホ
ール5を形成するために孔明きの金属板2が用いられる
。すなわち、第2図(a)に示すように金属板2にスル
ーホール5を形成すべき箇所においてスルーホール5の
径よりも大きな通孔1゜1・・・を設けておき、この複
数枚の金属板2,2・・・をプリプレグ3を介して重ね
て加熱加圧成形をおこなうことによって、プリプレグ3
に含浸した樹脂を硬化させて各金属板2,2・・・を積
層接着すると共にプリプレグ3に含浸した樹脂を金属板
2の各通孔1,1・・・に流入充填させて硬化させる。
このとき各金属板2間には片面プリント配線板や両面プ
リント配線板、多層プリント配線板などの回路板12.
12・・・を挟み込むと共に最外層に銅箔などの金属?
113を重ねて成形をおこなうものであり、第2図(b
)のように回路板12.12・・・を各金属板2.2・
・・間に積層すると共に最外層に金属M13を積層する
。そして通孔1に充jiIEさせた樹脂14の部分にお
いて第2図(c)のようにスルーホール5を穿孔加工す
ることによって、樹脂14で金属板2との開の絶縁性が
確保されたスルーホ−ル5を形成することができるので
ある。こののちに、金属箔13をエツチング加工して回
路形成をすると共にスルーホール5内にスルーホールメ
ツキを施すことによって、多層の金属板2をベースとし
、回路板1.2,12・・・による内層回路と金属箔1
3による外層回路とで多層の回路を形成した多層の電気
積層板に仕上げることができる。In an electrical laminate using a metal plate 2 as a substrate, a perforated metal plate 2 is used to form through holes 5. That is, as shown in FIG. 2(a), a through hole 1° 1... larger than the diameter of the through hole 5 is provided at the location where the through hole 5 is to be formed in the metal plate 2, and the plurality of through holes are formed. The prepreg 3 is formed by stacking the metal plates 2, 2... with the prepreg 3 interposed therebetween and performing heating and pressure forming.
The resin impregnated in the prepreg 3 is cured and the metal plates 2, 2, . At this time, between each metal plate 2 is a circuit board 12 such as a single-sided printed wiring board, a double-sided printed wiring board, or a multilayer printed wiring board.
12... and a metal such as copper foil on the outermost layer?
113 is overlapped and molded, as shown in Figure 2 (b).
), connect the circuit board 12.12... to each metal plate 2.2.
... and laminated in between, and metal M13 is laminated on the outermost layer. Then, by drilling a through hole 5 as shown in FIG. 2(c) in the part of the resin 14 that has filled the through hole 1, a through hole is formed in which the resin 14 ensures insulation from the metal plate 2. - 5 can be formed. Thereafter, by etching the metal foil 13 to form a circuit and plating the through holes 5, the multilayer metal plate 2 is used as a base, and the circuit boards 1, 2, 12, etc. are formed. Inner layer circuit and metal foil 1
It is possible to finish a multilayer electrical laminate in which a multilayer circuit is formed with the outer layer circuit according to No. 3.
しかし、第2図のような工程で成形をおこなって電気積
層板を製造するに際して、金属板2の通孔1はプリプレ
グ3に含浸されている樹脂14で充jlれるために、プ
リプレグ3のうち通孔1に対応する部分の樹脂が通孔1
内に多量に流入されれプリプレグ3のこの部分の樹脂量
が少なくなり、この結果第3図に示すように、最外層の
プリプレグ3においては樹脂量が少なくなる通孔1の部
分でくぽみ15が生じ、金属箔13にもこのくばみ15
が及んで表面に凹凸が生じることになる。特に樹脂14
と金属板2とは熱膨張率の差が大きいために、積層成形
後の冷却過程で通孔2内の樹脂14が金属板2に比べて
大きく収縮することによってくぼみ15は大きくなり、
凹凸も大きく生じることになる。そしてこのように金属
箔6に凹凸が生じるとエツチングレノストの塗布などを
正確におこなうことができなくなり、回路形成が困難に
なる等の問題が生じるものであった。
本発明は上記の点に鑑みて為されたものであり、表面に
凹凸が生じるようなことなく積層をおこなうことができ
る電気積層板の製造方法を提供することを目的とするも
のである。However, when manufacturing an electrical laminate by molding in the process shown in FIG. The resin in the part corresponding to through hole 1 is through hole 1.
As a result, as shown in FIG. 3, in the outermost layer of prepreg 3, a hollow is created at the part of the through hole 1 where the amount of resin is reduced. 15 is formed, and this dent 15 is also formed on the metal foil 13.
This will cause unevenness on the surface. Especially resin 14
Since there is a large difference in coefficient of thermal expansion between the metal plate 2 and the resin 14 in the through hole 2 during the cooling process after laminated molding, the depression 15 becomes larger.
Large irregularities will also occur. If the metal foil 6 has such irregularities, it becomes impossible to apply the etching lens accurately, which causes problems such as making it difficult to form a circuit. The present invention has been made in view of the above points, and it is an object of the present invention to provide a method for manufacturing an electrical laminate that can be laminated without causing unevenness on the surface.
上記課題を解決するために本発明に係る電気積層板の製
造方法は、通孔1を設けた金属板2の片面にプリプレグ
3aを重ねて一体化することによって通孔1の片側の開
口を閉じ、金属板2との熱膨張率の差が20 ppm/
’C以下の充填剤入り樹脂4を通孔1内に充填した後
に、この金属板1とプリプレグ3aとの複合体6を他の
プリプレグ31]を介して複数枚重ね、これを加熱加圧
して積層成形し、しかる後に通孔1内の充填剤入り樹脂
4の部分で=4
スルーホール5を穿孔加工することを特徴とするもので
ある。In order to solve the above problems, the method for manufacturing an electrical laminate according to the present invention is to close the opening on one side of the through hole 1 by overlapping and integrating the prepreg 3a on one side of the metal plate 2 provided with the through hole 1. , the difference in thermal expansion coefficient with metal plate 2 is 20 ppm/
After filling the through hole 1 with a filler-containing resin 4 of C or less, a plurality of composites 6 of this metal plate 1 and prepreg 3a are stacked with another prepreg 31 interposed therebetween, and this is heated and pressurized. It is characterized in that it is laminated and molded, and then a =4 through hole 5 is punched in the portion of the filler-containing resin 4 in the through hole 1.
【作用1
金属板2の片面にプリプレグ3aを重ねた状態で予め通
孔1に充填剤入り樹脂4を充填しておくために、成形の
際にプリプレグ3 a、 3 bがら通孔1内に樹脂を
流入させる場合のような凹凸が発生することを防止する
ことができ、さらに金属板2と充填剤入す樹脂4との熱
膨張率の差を20ppm/℃以下にすることによって、
熱膨張率の差によって金属板2と樹脂4の部分とで凹凸
が生じることを防止することができる。
以下本発明の詳細な説明する。
金属板2は銅板やアルミニウム板などで形成されもので
あり、スルーホール5を形成する箇所において第1図(
、)に示すように通孔1が穿設加工しである。通孔1は
スルーホール5の直径よりも大きな直径で形成されるも
のである。通孔1を形成したのちに金属板2には樹脂と
の密着性を高めるために表面処理を施しておくのが好ま
しい。表面処理としては、酸化処理液などを用いる黒化
処理やブラウン処理、電解メツキによる表面こぶ付は処
理などを採用することができる。次にこの金属板2の片
面(下面)にプリプレグ3aを重ねて第1図(b)のよ
うに一体化させる。一体化は金属板2にプリプレグ3a
を重ねると共にさらにその上下に離型紙などを重ね、こ
の状態で加熱加圧成形したり、あるいは熱を加えて熱圧
着したりすることによっておこなうことができる。プリ
プレグ3aはガラス布や紙などを基材とし、これにエポ
キシ樹脂やポリイミドなどの熱硬化性樹脂を含浸して乾
燥することによって調製されるものであり、このプリプ
レグ3aは金属板2の通孔1の底の開口を閉塞する作用
をなすだけであるために、厚みか(1、1+nm程度の
薄いもので十分である。またこのプリプレグ3aを調製
する樹脂には充填剤を配合する必要はない。
次に、充填剤を配合した樹脂4を金属板2の通孔1に流
し込んで第1図(c)のように充填する。
この充填剤入り樹脂4の樹脂としては特に限定されるも
のではないが、エポキシ樹脂やポリイミドなどプリプレ
グ3aに含浸した樹脂と同種のものを用いるのが好まし
い。また充填剤としては、Al2O3、Al2O3・H
20、A 1203・3H20,タルク、M I?OS
CaCO3,5b203、Ab20sなどの球状粉末や
、E7yラスやD77′ラス、T〃ガラスR〃ガラスQ
ガラスなどのがラスM&維や、ケブラー(デュポン社製
)、チク/−ラ(音大社製)などのアラミド繊維等を細
かく切断してすりつぶした針状粉末を例示することがで
きる。本発明にあっては充填剤入り樹脂4の熱膨張率(
樹脂が硬化した後の熱膨張率)が、金属板2の熱膨張率
との差が20 ppm/ ’C以下になるように、すな
わち充填剤入り樹脂4の熱膨張率をαR1金属板2の熱
膨張率をαhとすると、
αM 20 ppm/ ”C≦a6≦αM + 2
0 ppm/ ’Cとなるように、充填剤入り樹脂4に
配合される充填剤の種類や配合量を調整して設定するも
のである。通孔1への充填剤入り樹脂4の充填は、充填
剤入す樹脂4をワニス状など液状に調製して流し込むよ
うにする他、粉末状に調製して流し込むようにしたり、
予め通孔1の形に成形しておいて固形の状態で嵌め込ん
でおこなうことができる。そして必要に応じて減圧脱気
しつつ加熱することによって通孔1内の樹脂を硬化させ
る。
次に、上記のように通孔1に樹脂4を充填した金属板1
とプリプレグ3aとを積層して形成される複合体6を用
いて電気積層板を製造するにあたっては、第1図(cl
)のようにプリプレグ31)を介して複合体6を数枚重
ねると共に最外層の複合体6の外面にプリプレグ313
を介して銅箔などの金属箔13を重ねる。このとき各複
合体6開にはプリプレグ3bを介して片面プリント配線
板や両面プリント配線板、多層プリント配線板などの内
層用回路を形成した回路板12.12・・・がセットし
である。このプリプレグ3bとしては、前記プリプレグ
3aと同様にガラス布や紙などを基材とし、これにエポ
キシ樹脂やポリイミドなどの熱硬化性樹脂を含浸して乾
燥することによって調製されるものが用いられるもので
あり、この樹脂としてはプリプレグ3aの調製に用いる
樹脂と同種のものを使用するのが好ましい。またこのプ
リプレグ3bを調製する樹脂にも充填剤を配合する必要
はない。
そして加熱加圧成形をおこなうことによって、プリプレ
グ3bに含浸した樹脂を硬化させて各複合体6と回路板
12とを交互に積層接着させ、第2図(b)の場合と同
様な層構成で金属板2と回路板10とを交互に積層する
と共に最外層に金属箔13を積層接着した電気積層板を
得ることができる。
このとき、金属板2の通孔1には樹脂4が予め充填され
ているために、プリプレグ3bに含浸した樹脂は通孔1
内に流入されるようなことがなく、従って通孔1に対応
する部分で最外層のプリプレグ3bにくぼみが生じるよ
うなおそれはなく、<ばみによって金属?113の表面
に凹凸が生じるようなおそれもない。しがも、金属板2
の熱膨張率と通孔1に充填される充填剤入り樹脂4の熱
膨張率はその差が20 ppm/ ”Cと小さいために
、積層成形後の冷却に際して金属板2と樹脂4との収縮
の度合の差が小さく、熱膨張率の差に起因して通孔1の
樹脂40部分でくぼみが発生するようなおそれもない。
金属板2の熱膨張率と充填剤入り樹脂4の熱膨張率の差
が201)凹/’Cより大きいと、熱膨張率の差に起因
してくぼみが発生するおそれがある。
以上のようにして金属板2と回路板12とを交互に積層
すると共に表面に金属箔13を積層したのちに、ドリル
加工やパンチ加工などでスルーホール5を穿孔加工する
。スルーホール5は第2図(c)に示すと同様に、通孔
1に充填した樹脂4の部分において通孔1の直径よりも
小さい直径で形成されるものであり、従ってスルーホー
ル5の内周と金属板2との間の電気絶縁性は樹脂4によ
って確保されることになる。尚、スルーホール5のうち
一部のものはアースなどのために金属板2を貫通して形
成されている。そしてスルーホール5を加工したのちに
、スルーホール5の内周に銅メツキなどでスルーホール
メツキを形成したり、金属箔13をエツチング処理して
外層回路を形成したりして、多層の金属板2をベースと
し回路板12による内層回路と金属箔13による外層回
路とを設けた多層の電気積層板として仕上げるのである
。
このものにあって、金属板2の通孔1に充填した樹脂4
には充填剤が配合されているので、スルーホール5を加
工する際にスルーホール5の内周面に充填剤が露出して
スルーホール5の内周面が凹凸面となり、凹凸面のアン
カー効果などでスルーホール5の内周面に施すスルーホ
ールメツキの密着性が高まるものである。
【実施例】
次に本発明を実施例によって具体的に説明する。
1.2、 1〜3
末端官能型イミド樹脂(住人化学社製TMS20)20
0重量部、液状エポキシ樹脂149重量部、ブロム化7
ボラツク樹脂136重量部、ルイス酸化合物82重量部
、不飽和ビスマレイミド20重量部を混合し、90℃で
50分間加熱したのちに常温にまで冷却して30分間攪
拌下反応させることによってエポキシ変性ポリイミド樹
脂ワニスを調製した。次にこのエポキシ変性ポリイミド
樹脂ワニスに基材としてガラスペーパー(日本バイリー
ン製EP−4075ニア5g/m勺を浸漬し、次いで乾
燥することによって、780 g/ +n2のプリプレ
グを作成した。ここで乾燥の条件はプリプレグ中の樹脂
の130℃での溶融粘度が300−700ボイズに、1
70°C、20kg/ c+++2.10分間の条件で
のグリニス(樹脂流れ性)が20〜25%なるように設
定した。
一方、金属板として500+n+nX400m+nX0
05■の銅板を用い、直径が1.5 mmの通孔を1.
8111111ピツチで縦100×横60の個数設けた
。そしてこの金属板の下面に上記プリプレグを重ねて1
50°Cに加熱することによって金属板の下面にプリプ
レグを貼り付け、この状態で、上記エポキシ変性ポリイ
ミド樹脂ワニスに充填剤としてEガラス微粉末を配合し
て調製した充填剤入り樹脂を流し込んで充填した。Eガ
ラス微粉末としては平均長さが35μ、平均直径が13
μのものを用い、第1表に示す配合量で配合して用いた
。
そしてこの金属板とプリプレグとの複合体を3枚、両面
銅張ポリイミド樹脂積層板の銅箔をエツチング加工して
回路を設けることによって形成した両面プリント配線板
を2枚用い、これらを第1図(d)のように上記プリプ
レグを介して交互に重ねると共に上下にプリプレグを介
して35μ厚の銅箔を重ね、まず20kg/cm2の加
圧条件を維持しっつ140°Cで20分間、170℃で
90分間加熱すると共に20分間を要して冷却して積層
成形をおこなうことによって、金属板と両面プリント配
線板とを交互に積層し表面に銅箔を張った多層積層板を
得た。こののちに金属板の通孔の部分において多層積層
板に直径が0.9mmのスルーホールをドリル加工し、
次いで銅メツキおこなってスルーホールの内周にスルー
ホールメツキを施した。
このようにして得た電気積層板の表面の凹凸を測定した
。凹凸の最大値を第1表に示す。また充填剤を配合した
樹脂の熱膨張率αR(単位ppm/’C=X10−’/
”C)を第1表に示す。さらに銅の金属板の熱膨張率α
ゎは17 ppm/ ”Cであり、充填剤入り樹脂の熱
膨張率と金属板の熱膨張率との差第
表
第1表の実施例1や実施例2にみられるように、金属板
の熱膨張率と充填剤入り樹脂の熱膨張率の差を20 p
pm/ ’C以下に設定することによって、凹凸の発生
がほとんど問題にならない程度に小さくなることが確認
される。[Effect 1] In order to fill the through hole 1 with filler-containing resin 4 in advance with the prepreg 3a stacked on one side of the metal plate 2, prepregs 3a and 3b are poured into the through hole 1 during molding. It is possible to prevent unevenness from occurring when resin is introduced, and furthermore, by setting the difference in thermal expansion coefficient between the metal plate 2 and the resin 4 containing the filler to 20 ppm/°C or less,
It is possible to prevent unevenness from occurring between the metal plate 2 and the resin 4 due to the difference in coefficient of thermal expansion. The present invention will be explained in detail below. The metal plate 2 is made of a copper plate, an aluminum plate, etc., and the portion where the through hole 5 is formed is shown in FIG.
As shown in , ), the through hole 1 is drilled. The through hole 1 is formed with a diameter larger than that of the through hole 5. After forming the through holes 1, it is preferable that the metal plate 2 is subjected to a surface treatment in order to improve its adhesion to the resin. As the surface treatment, blackening treatment or browning treatment using an oxidizing treatment liquid or the like, surface roughening treatment by electrolytic plating, etc. can be employed. Next, a prepreg 3a is stacked on one side (lower side) of this metal plate 2 and integrated as shown in FIG. 1(b). Integration is prepreg 3a on metal plate 2
This can be done by stacking them and then layering release paper or the like on top and bottom, and then heating and press-molding them in this state, or applying heat and thermo-compression bonding. The prepreg 3a is prepared by impregnating a base material such as glass cloth or paper with a thermosetting resin such as epoxy resin or polyimide and drying it. Since it only acts to close the opening at the bottom of 1, a thin material with a thickness of about 1. Next, the resin 4 mixed with a filler is poured into the through hole 1 of the metal plate 2 and filled as shown in FIG. 1(c).The resin 4 containing the filler is not particularly limited. However, it is preferable to use the same type of resin as the resin impregnated into the prepreg 3a, such as epoxy resin or polyimide.Furthermore, as the filler, Al2O3, Al2O3・H
20, A 1203・3H20, Talc, M I? OS
Spherical powders such as CaCO3, 5b203, Ab20s, E7y lath, D77' lath, T〃Glass R〃Glass Q
Examples include acicular powder obtained by finely cutting and grinding lath M&fiber such as glass, aramid fibers such as Kevlar (manufactured by DuPont), and Chiku/-La (manufactured by Ontaisha). In the present invention, the coefficient of thermal expansion of the filler-containing resin 4 (
In other words, the coefficient of thermal expansion of the filler-containing resin 4 is adjusted so that the difference in coefficient of thermal expansion (after the resin is cured) from that of the metal plate 2 is 20 ppm/'C or less. If the coefficient of thermal expansion is αh, αM 20 ppm/ ”C≦a6≦αM + 2
The type and amount of the filler added to the filler-containing resin 4 are adjusted and set so that it becomes 0 ppm/'C. In order to fill the through hole 1 with the filler-containing resin 4, the resin 4 containing the filler may be prepared in a liquid state such as varnish and poured, or may be prepared in a powder form and poured.
This can be done by forming the through hole 1 in advance and fitting it in a solid state. Then, the resin in the through hole 1 is cured by heating while depressurizing and degassing as necessary. Next, the metal plate 1 with the resin 4 filled in the through hole 1 as described above.
In manufacturing an electrical laminate using a composite body 6 formed by laminating a prepreg 3a and a prepreg 3a, the method shown in FIG.
), several sheets of composite 6 are stacked via prepreg 31), and prepreg 313 is placed on the outer surface of the outermost layer of composite 6.
A metal foil 13 such as copper foil is layered on top of the metal foil 13 via the metal foil 13. At this time, circuit boards 12, 12, . . . on which internal layer circuits such as a single-sided printed wiring board, a double-sided printed wiring board, and a multilayer printed wiring board are formed are set in each composite body 6 via the prepreg 3b. As with the prepreg 3a, this prepreg 3b is prepared by using glass cloth or paper as a base material, impregnating it with a thermosetting resin such as epoxy resin or polyimide, and drying it. As this resin, it is preferable to use the same kind of resin as the resin used for preparing the prepreg 3a. Further, there is no need to add a filler to the resin used to prepare this prepreg 3b. Then, by performing heat and pressure molding, the resin impregnated into the prepreg 3b is cured, and each composite body 6 and the circuit board 12 are laminated and bonded alternately, resulting in a layered structure similar to that shown in FIG. 2(b). An electrical laminate can be obtained in which metal plates 2 and circuit boards 10 are alternately laminated and metal foil 13 is laminated and bonded to the outermost layer. At this time, since the resin 4 is filled in the through holes 1 of the metal plate 2 in advance, the resin impregnated into the prepreg 3b is absorbed into the through holes 1.
Therefore, there is no fear that the outermost layer prepreg 3b will be dented in the portion corresponding to the through hole 1, and the metal ? There is no fear that unevenness will occur on the surface of 113. However, metal plate 2
Because the difference between the coefficient of thermal expansion of the resin 4 filled in the through hole 1 and the coefficient of thermal expansion of the filled resin 4 filled in the through hole 1 is as small as 20 ppm/''C, the metal plate 2 and the resin 4 contract during cooling after laminated molding. The difference in the degree of thermal expansion is small, and there is no fear that a dent will occur in the resin 40 portion of the through hole 1 due to a difference in thermal expansion coefficient. If the difference in coefficient is larger than 201) concave/'C, there is a risk that a depression will occur due to the difference in coefficient of thermal expansion. After laminating the metal foil 13 on the surface, a through-hole 5 is formed by drilling or punching.The through-hole 5 is formed by using the resin 4 filled in the through-hole 1 as shown in FIG. 2(c). The diameter of the through hole 5 is smaller than that of the through hole 1, and therefore, the resin 4 ensures electrical insulation between the inner periphery of the through hole 5 and the metal plate 2. , some of the through-holes 5 are formed to penetrate the metal plate 2 for grounding, etc. After processing the through-holes 5, the inner periphery of the through-holes 5 is plated with copper or the like. A multi-layered circuit is formed by forming hole plating or etching the metal foil 13 to form an outer layer circuit, so that the multilayer metal plate 2 is used as a base, and an inner layer circuit formed by the circuit board 12 and an outer layer circuit formed by the metal foil 13 are provided. It is finished as an electrical laminate.In this product, the resin 4 filled in the through hole 1 of the metal plate 2
contains a filler, so when the through hole 5 is processed, the filler is exposed on the inner circumferential surface of the through hole 5 and the inner circumferential surface of the through hole 5 becomes an uneven surface, resulting in an anchor effect of the uneven surface. This increases the adhesion of through-hole plating applied to the inner peripheral surface of through-hole 5. [Examples] Next, the present invention will be specifically explained using examples. 1.2, 1-3 Terminal functional imide resin (TMS20 manufactured by Sumima Kagaku Co., Ltd.) 20
0 parts by weight, liquid epoxy resin 149 parts by weight, bromination 7
Epoxy-modified polyimide was produced by mixing 136 parts by weight of Borac resin, 82 parts by weight of Lewis acid compound, and 20 parts by weight of unsaturated bismaleimide, heating at 90°C for 50 minutes, cooling to room temperature, and reacting with stirring for 30 minutes. A resin varnish was prepared. Next, a prepreg of 780 g/+n2 was prepared by dipping glass paper (EP-4075 manufactured by Nippon Vilene Co., Ltd., Nippon Vilene 5 g/m2) as a base material into this epoxy-modified polyimide resin varnish and then drying it. The conditions are that the melt viscosity of the resin in the prepreg at 130°C is 300-700 voids, and
The Glynis (resin flowability) under the conditions of 70°C and 20 kg/c++2.10 minutes was set to be 20 to 25%. On the other hand, as a metal plate 500+n+nX400m+nX0
Using a 05mm copper plate, make a through hole with a diameter of 1.5 mm.
The number of pieces was set at 8111111 pitch, 100 vertically by 60 horizontally. Then, overlap the above prepreg on the bottom surface of this metal plate and
The prepreg is pasted on the lower surface of the metal plate by heating it to 50°C, and in this state, a filler-containing resin prepared by blending E glass fine powder as a filler with the epoxy-modified polyimide resin varnish is poured and filled. did. E-glass fine powder has an average length of 35μ and an average diameter of 13
μ was used and mixed in the amounts shown in Table 1. Then, three composites of this metal plate and prepreg were used, and two double-sided printed wiring boards were formed by etching the copper foil of a double-sided copper-clad polyimide resin laminate to form a circuit. As shown in (d), the above prepregs are alternately stacked, and 35μ thick copper foils are stacked on top and bottom via the prepregs, and first, a pressurizing condition of 20kg/cm2 is maintained at 140°C for 20 minutes at 170°C. By heating at ℃ for 90 minutes and cooling for 20 minutes to perform lamination molding, a multilayer laminate was obtained in which metal plates and double-sided printed wiring boards were alternately laminated and copper foil was spread on the surface. After this, a through hole with a diameter of 0.9 mm was drilled in the multilayer laminate at the through hole part of the metal plate.
Next, copper plating was performed, and through-hole plating was applied to the inner periphery of the through-hole. The unevenness of the surface of the electrical laminate thus obtained was measured. The maximum values of unevenness are shown in Table 1. In addition, the coefficient of thermal expansion αR of the resin containing the filler (unit: ppm/'C=X10-'/
"C) is shown in Table 1. Furthermore, the coefficient of thermal expansion α of the copper metal plate
ゎ is 17 ppm/''C, and the difference between the coefficient of thermal expansion of the filled resin and the coefficient of thermal expansion of the metal plate is as shown in Examples 1 and 2 of Table 1. The difference between the coefficient of thermal expansion and the coefficient of thermal expansion of the filled resin is 20 p.
It is confirmed that by setting the temperature to pm/'C or less, the occurrence of unevenness becomes so small that it hardly becomes a problem.
上述のように本発明にあっては、通孔を設けた金属板の
片面にプリプレグを重ねて一体化することによって通孔
の片側の開口を閉じ、この通孔に充填剤入りの樹脂を充
填した後に、この金属板とプリプレグとの複合体を他の
プリプレグを介して複数枚重ね、これを加熱加圧して積
層成形するようにしたので、金属板の通孔に樹脂を充填
した状態で成形をおこなうことができ、プリプレグに含
浸した樹脂は通孔内に流入されることがないものであっ
て、通孔に対応する部分で最外層のプリプレグにくぼみ
が生じて表面に凹凸が発生することを防止できるもので
ある。また金属板の通孔に充填する充填剤入り樹脂とし
て金属板との熱膨張率の差が20 ppm/ ’C以下
のものを用いるようにしたので、積層成形後の冷却に際
して金属板と通孔に充填した樹脂との収縮の度合の差が
小さく、熱膨張率の差に起因して通孔の樹脂の部分でく
ぼみが生じて凹凸が発生するようなおそれもないもので
ある。As described above, in the present invention, prepreg is stacked and integrated on one side of a metal plate provided with a through hole to close one side of the through hole, and this through hole is filled with resin containing a filler. After that, we layered multiple composites of metal plates and prepregs with other prepregs interposed between them, and then layered them by heating and pressurizing them, so that we could mold them with resin filling the holes in the metal plates. The resin impregnated into the prepreg will not flow into the through holes, and the outermost layer of prepreg will be dented in the area corresponding to the through holes, causing unevenness on the surface. This is something that can be prevented. In addition, we used a resin with a thermal expansion coefficient of 20 ppm/'C or less to fill the through holes in the metal plate, so that the difference between the coefficient of thermal expansion of the metal plate and the through hole is 20 ppm/'C or less. The difference in the degree of shrinkage between the resin and the resin filled in the hole is small, and there is no fear that depressions will occur in the resin portion of the through hole and unevenness will occur due to the difference in coefficient of thermal expansion.
第1図(a)乃至(d)は電気積層板の製造の各工程を
示す断面図、第2図(a)(b)(c)は従来例の断面
図、第3図は第2図(b)のイ部分を拡大した図である
。
1は通孔、2は金属板、3 a、 3 bはプリプレグ
、4は充填剤入り樹脂、5はスルーホール、6は複合体
である。Figures 1 (a) to (d) are cross-sectional views showing each process of manufacturing an electric laminate, Figures 2 (a), (b), and (c) are cross-sectional views of a conventional example, and Figure 3 is a cross-sectional view of the conventional example. It is an enlarged view of part A in (b). 1 is a through hole, 2 is a metal plate, 3 a and 3 b are prepregs, 4 is a resin containing a filler, 5 is a through hole, and 6 is a composite.
Claims (1)
一体化することによって通孔の片側の開口を閉じ、金属
板との熱膨張率の差が20ppm/℃以下の充填剤入り
樹脂を通孔内に充填した後に、この金属板とプリプレグ
との複合体を他のプリプレグを介して複数枚重ね、これ
を加熱加圧して積層成形し、しかる後に通孔内の充填剤
入り樹脂の部分でスルーホールを穿孔加工することを特
徴とする電気積層板の製造方法。(1) By stacking prepreg on one side of a metal plate with a through hole and integrating it, the opening on one side of the through hole is closed, and the filled resin has a coefficient of thermal expansion difference of 20 ppm/℃ or less with the metal plate. After filling the through holes, multiple sheets of this metal plate and prepreg composite are stacked with other prepregs interposed between them, and this is laminated by heating and pressurizing, and then the filled resin in the through holes is A method for producing an electrical laminate, characterized by punching through holes in some parts.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP63202313A JPH0250829A (en) | 1988-08-12 | 1988-08-12 | Manufacture of electric laminated board |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP63202313A JPH0250829A (en) | 1988-08-12 | 1988-08-12 | Manufacture of electric laminated board |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0250829A true JPH0250829A (en) | 1990-02-20 |
| JPH0466181B2 JPH0466181B2 (en) | 1992-10-22 |
Family
ID=16455478
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP63202313A Granted JPH0250829A (en) | 1988-08-12 | 1988-08-12 | Manufacture of electric laminated board |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0250829A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7865059B2 (en) | 2003-10-07 | 2011-01-04 | Koninklijke Philips Electronics N.V. | Device and method for recording information including realtime data in accordance with a predefined recording format |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS59217392A (en) * | 1983-05-25 | 1984-12-07 | 株式会社日立製作所 | multilayer wiring circuit board |
| JPS60236294A (en) * | 1984-05-10 | 1985-11-25 | 松下電工株式会社 | Metal base circuit board |
-
1988
- 1988-08-12 JP JP63202313A patent/JPH0250829A/en active Granted
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS59217392A (en) * | 1983-05-25 | 1984-12-07 | 株式会社日立製作所 | multilayer wiring circuit board |
| JPS60236294A (en) * | 1984-05-10 | 1985-11-25 | 松下電工株式会社 | Metal base circuit board |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7865059B2 (en) | 2003-10-07 | 2011-01-04 | Koninklijke Philips Electronics N.V. | Device and method for recording information including realtime data in accordance with a predefined recording format |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0466181B2 (en) | 1992-10-22 |
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| LAPS | Cancellation because of no payment of annual fees |