JPH0259621B2 - - Google Patents
Info
- Publication number
- JPH0259621B2 JPH0259621B2 JP58229291A JP22929183A JPH0259621B2 JP H0259621 B2 JPH0259621 B2 JP H0259621B2 JP 58229291 A JP58229291 A JP 58229291A JP 22929183 A JP22929183 A JP 22929183A JP H0259621 B2 JPH0259621 B2 JP H0259621B2
- Authority
- JP
- Japan
- Prior art keywords
- silicon
- polyimide
- polyimide precursor
- dianhydride
- adhesion
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P14/00—Formation of materials, e.g. in the shape of layers or pillars
- H10P14/60—Formation of materials, e.g. in the shape of layers or pillars of insulating materials
- H10P14/68—Organic materials, e.g. photoresists
- H10P14/683—Organic materials, e.g. photoresists carbon-based polymeric organic materials, e.g. polyimides, poly cyclobutene or PVC
Landscapes
- Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)
- Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
- Silicon Polymers (AREA)
- Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)
- Formation Of Insulating Films (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58229291A JPS59107522A (ja) | 1983-12-05 | 1983-12-05 | 珪素含有材からなる素地表面に密着性良好なポリイミド層を形成する方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58229291A JPS59107522A (ja) | 1983-12-05 | 1983-12-05 | 珪素含有材からなる素地表面に密着性良好なポリイミド層を形成する方法 |
Related Parent Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP56029240A Division JPS5813087B2 (ja) | 1981-02-27 | 1981-02-27 | シロキサン変性ポリイミド前駆体の製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS59107522A JPS59107522A (ja) | 1984-06-21 |
| JPH0259621B2 true JPH0259621B2 (de) | 1990-12-13 |
Family
ID=16889821
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP58229291A Granted JPS59107522A (ja) | 1983-12-05 | 1983-12-05 | 珪素含有材からなる素地表面に密着性良好なポリイミド層を形成する方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS59107522A (de) |
-
1983
- 1983-12-05 JP JP58229291A patent/JPS59107522A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS59107522A (ja) | 1984-06-21 |
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