JPH028138U - - Google Patents

Info

Publication number
JPH028138U
JPH028138U JP8726088U JP8726088U JPH028138U JP H028138 U JPH028138 U JP H028138U JP 8726088 U JP8726088 U JP 8726088U JP 8726088 U JP8726088 U JP 8726088U JP H028138 U JPH028138 U JP H028138U
Authority
JP
Japan
Prior art keywords
heater
heater section
wafer
radiation
lines
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP8726088U
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP8726088U priority Critical patent/JPH028138U/ja
Publication of JPH028138U publication Critical patent/JPH028138U/ja
Pending legal-status Critical Current

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Landscapes

  • Resistance Heating (AREA)

Description

【図面の簡単な説明】[Brief explanation of drawings]

第1図aは、本考案にかかるウエハ加熱ヒータ
の側面図、第1図bは本考案にかかるウエハ加熱
ヒータの平面図、第2図aは、従来のウエハ加熱
ヒータの側面図、第2図bは従来のウエハ加熱ヒ
ータの平面図、第3図は本考案にもとずく2系列
ヒータの受光量分布曲線の説明図、第4図は2系
列ヒータのモデルの説明図である。 1……内ヒータ部分、2……外ヒータ部分、3
……ヒータ固定円板、4……ウエハ。
FIG. 1a is a side view of a wafer heater according to the present invention, FIG. 1b is a plan view of a wafer heater according to the present invention, and FIG. 2a is a side view of a conventional wafer heater. Fig. b is a plan view of a conventional wafer heater, Fig. 3 is an explanatory diagram of a received light amount distribution curve of a two-series heater based on the present invention, and Fig. 4 is an explanatory diagram of a model of the two-series heater. 1...Inner heater part, 2...Outer heater part, 3
...Heater fixing disk, 4...Wafer.

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] ウエハの加熱機能を有する半導体製造装置に具
備されたウエハ加熱ヒータにおいて、幅射を行な
うヒータ部分を2系列に分け、内ヒータ部分と外
ヒータ部分の構成としたことを特徴とするウエハ
加熱ヒータ。
A wafer heater installed in a semiconductor manufacturing equipment having a wafer heating function, characterized in that a heater section that performs radiation radiation is divided into two lines, and is configured as an inner heater section and an outer heater section.
JP8726088U 1988-06-29 1988-06-29 Pending JPH028138U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8726088U JPH028138U (en) 1988-06-29 1988-06-29

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8726088U JPH028138U (en) 1988-06-29 1988-06-29

Publications (1)

Publication Number Publication Date
JPH028138U true JPH028138U (en) 1990-01-19

Family

ID=31311878

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8726088U Pending JPH028138U (en) 1988-06-29 1988-06-29

Country Status (1)

Country Link
JP (1) JPH028138U (en)

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