JPH0282028U - - Google Patents

Info

Publication number
JPH0282028U
JPH0282028U JP1988162530U JP16253088U JPH0282028U JP H0282028 U JPH0282028 U JP H0282028U JP 1988162530 U JP1988162530 U JP 1988162530U JP 16253088 U JP16253088 U JP 16253088U JP H0282028 U JPH0282028 U JP H0282028U
Authority
JP
Japan
Prior art keywords
base
storage portion
induction heating
frequency induction
heating type
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1988162530U
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP1988162530U priority Critical patent/JPH0282028U/ja
Publication of JPH0282028U publication Critical patent/JPH0282028U/ja
Pending legal-status Critical Current

Links

Description

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本考案の一実施例を示す保持台の断面
図、第2図は他の実施例を示す保持台の断面図、
第3図はさらに別の実施例を示す保持台の断面図
、第4図は従来の気相成長装置の一例を示す断面
図である。 10……保持台、11……基台、12,12A
……貯留部、13……介在金属、P……基板。
FIG. 1 is a cross-sectional view of a holding stand showing one embodiment of the present invention, FIG. 2 is a cross-sectional view of a holding stand showing another embodiment,
FIG. 3 is a sectional view of a holding table showing yet another embodiment, and FIG. 4 is a sectional view showing an example of a conventional vapor phase growth apparatus. 10... Holding stand, 11... Base, 12, 12A
...Reservoir, 13...Intervening metal, P...Substrate.

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] 基板の保持と加熱とを兼ねる高周波誘導加熱式
保持台を備えた気相成長装置において、前記高周
波誘導加熱式保持台は、基台と、該基台の上面に
基板により大径で、かつ適宜深さに形成された凹
部状の貯留部と、該貯留部に貯留される前記基板
より高比重で、かつ気相成長温度で液体となる介
在金属とで構成することを特徴とする気相成長装
置。
In a vapor phase growth apparatus equipped with a high-frequency induction heating type holder that serves both to hold and heat the substrate, the high-frequency induction heating type holder includes a base, and a large diameter plate on the upper surface of the base, and as appropriate. Vapor phase growth characterized by comprising a concave-shaped storage portion formed at a depth, and an intervening metal that has a higher specific gravity than the substrate stored in the storage portion and becomes liquid at the vapor growth temperature. Device.
JP1988162530U 1988-12-14 1988-12-14 Pending JPH0282028U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1988162530U JPH0282028U (en) 1988-12-14 1988-12-14

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1988162530U JPH0282028U (en) 1988-12-14 1988-12-14

Publications (1)

Publication Number Publication Date
JPH0282028U true JPH0282028U (en) 1990-06-25

Family

ID=31446439

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1988162530U Pending JPH0282028U (en) 1988-12-14 1988-12-14

Country Status (1)

Country Link
JP (1) JPH0282028U (en)

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