JPH0282041U - - Google Patents
Info
- Publication number
- JPH0282041U JPH0282041U JP1988162857U JP16285788U JPH0282041U JP H0282041 U JPH0282041 U JP H0282041U JP 1988162857 U JP1988162857 U JP 1988162857U JP 16285788 U JP16285788 U JP 16285788U JP H0282041 U JPH0282041 U JP H0282041U
- Authority
- JP
- Japan
- Prior art keywords
- photomask
- moisture absorbent
- substrate according
- bag body
- container
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 230000002745 absorbent Effects 0.000 claims description 9
- 239000002250 absorbent Substances 0.000 claims description 9
- 239000000758 substrate Substances 0.000 claims description 6
- 239000002274 desiccant Substances 0.000 claims description 4
- 239000000463 material Substances 0.000 claims description 4
- 239000011347 resin Substances 0.000 claims description 3
- 229920005989 resin Polymers 0.000 claims description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 2
- 239000000741 silica gel Substances 0.000 claims description 2
- 229910002027 silica gel Inorganic materials 0.000 claims description 2
- -1 polypropylene Polymers 0.000 claims 2
- 239000004698 Polyethylene Substances 0.000 claims 1
- 239000004743 Polypropylene Substances 0.000 claims 1
- 229920000573 polyethylene Polymers 0.000 claims 1
- 229920001155 polypropylene Polymers 0.000 claims 1
- 238000010586 diagram Methods 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
Description
第１図は本考案のフオトマスク又はフオトマス
ク用基板の吸湿体の１実施例を示す断面図、第２
図は乾燥材シートの拡大断面図、第３図は上記本
考案と従来の吸湿体を容器に収納し、振動を加え
たときの吸湿体からの塵の発生数を比較説明する
ための図、第４図は従来のフオトマスクの容器の
断面図、第５図は従来のフオトマスク用の吸湿体
の斜視図である。
２１……フオトマスク又はフオトマスク用基板
用吸湿体、２２……袋体、２３……乾燥材シート
、２５……シリカゲル、２６……発泡樹脂。
FIG. 1 is a cross-sectional view showing one embodiment of a moisture absorbent for a photomask or photomask substrate of the present invention, and FIG.
The figure is an enlarged sectional view of a desiccant sheet, and Figure 3 is a diagram for comparing and explaining the number of dust generated from the moisture absorbent when the moisture absorbent of the present invention and the conventional moisture absorbent are housed in a container and subjected to vibration. FIG. 4 is a sectional view of a conventional photomask container, and FIG. 5 is a perspective view of a conventional moisture absorbent for a photomask. 21... Moisture absorbent for photomask or photomask substrate, 22... Bag, 23... Drying material sheet, 25... Silica gel, 26... Foamed resin.
Claims (1)
材シートからなる吸湿体において、前記袋体はマ
イクロポーラスなフイルターであり、前記乾燥材
シートはシリカゲルを発泡樹脂内に封入したもの
であることを特徴とするフオトマスク又はフオト
マスク用基板の吸湿体。 (2) 前記袋体がポリプロピレンシートであり、
前記発泡樹脂がポリエチレンであることを特徴と
する請求項１記載のフオトマスク又はフオトマス
ク用基板の吸湿体。 (3) 前記乾燥材シートの表面に凹凸を形成する
ことを特徴とする請求項１記載のフオトマスク又
はフオトマスク用基板の吸湿体。 (4) 前記吸湿体を容器の蓋部に収納することを
特徴とする請求項１記載ないし請求項３にいずれ
か記載のフオトマスク又はフオトマスク用基板の
容器。[Claims for Utility Model Registration] (1) A moisture absorbent body comprising a bag body and a desiccant sheet laminated and stored in the bag, wherein the bag body is a microporous filter, and the desiccant sheet is made of silica gel. A hygroscopic material for a photomask or a substrate for a photomask, characterized in that the material is encapsulated in a foamed resin. (2) the bag body is a polypropylene sheet;
The moisture absorbent for a photomask or photomask substrate according to claim 1, wherein the foamed resin is polyethylene. (3) The hygroscopic material for a photomask or photomask substrate according to claim 1, characterized in that unevenness is formed on the surface of the desiccant sheet. (4) The container for a photomask or photomask substrate according to any one of claims 1 to 3, wherein the moisture absorbent is housed in a lid of the container.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1988162857U JPH0626903Y2 (en) | 1988-12-15 | 1988-12-15 | Moisture absorber and container for photomask or photomask substrate |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1988162857U JPH0626903Y2 (en) | 1988-12-15 | 1988-12-15 | Moisture absorber and container for photomask or photomask substrate |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0282041U true JPH0282041U (en) | 1990-06-25 |
| JPH0626903Y2 JPH0626903Y2 (en) | 1994-07-20 |
Family
ID=31447067
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1988162857U Expired - Fee Related JPH0626903Y2 (en) | 1988-12-15 | 1988-12-15 | Moisture absorber and container for photomask or photomask substrate |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0626903Y2 (en) |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6046114U (en) * | 1983-09-05 | 1985-04-01 | 加藤 隆義 | humidity regulator |
| JPS61185313A (en) * | 1985-02-08 | 1986-08-19 | Sekisui Chem Co Ltd | Composite sheet and dehumidification device |
| JPS6334273U (en) * | 1986-04-07 | 1988-03-05 |
-
1988
- 1988-12-15 JP JP1988162857U patent/JPH0626903Y2/en not_active Expired - Fee Related
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6046114U (en) * | 1983-09-05 | 1985-04-01 | 加藤 隆義 | humidity regulator |
| JPS61185313A (en) * | 1985-02-08 | 1986-08-19 | Sekisui Chem Co Ltd | Composite sheet and dehumidification device |
| JPS6334273U (en) * | 1986-04-07 | 1988-03-05 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0626903Y2 (en) | 1994-07-20 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| LAPS | Cancellation because of no payment of annual fees |