JPH03108331A - High precision polishing equipment - Google Patents
High precision polishing equipmentInfo
- Publication number
- JPH03108331A JPH03108331A JP1245926A JP24592689A JPH03108331A JP H03108331 A JPH03108331 A JP H03108331A JP 1245926 A JP1245926 A JP 1245926A JP 24592689 A JP24592689 A JP 24592689A JP H03108331 A JPH03108331 A JP H03108331A
- Authority
- JP
- Japan
- Prior art keywords
- precision polishing
- wafer
- wax
- autocollimator
- high precision
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
- Mechanical Treatment Of Semiconductor (AREA)
Abstract
(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.
Description
【発明の詳細な説明】
〔産業上の利用分野〕
この発明は、高精度研磨装置に係り、特にウェハの平行
度調整に関するものである。DETAILED DESCRIPTION OF THE INVENTION [Industrial Field of Application] The present invention relates to a high-precision polishing apparatus, and particularly to parallelism adjustment of a wafer.
第２図は従来のこの種の高精度研磨装置を示す断面図で
あり、図において、１はウェハ、２はオプティカル・フ
ラット（以下、Ｏ／Ｆという）、４はシリンダ、５は角
度調整ネジ（Ｘ／Ｙ）、６はバネ、７はウェハ取付台、
８は平行度を測定するオートコリメータ、９はウェハを
研磨するガラス板である。Fig. 2 is a sectional view showing a conventional high-precision polishing device of this type. In the figure, 1 is a wafer, 2 is an optical flat (hereinafter referred to as O/F), 4 is a cylinder, and 5 is an angle adjustment screw. (X/Y), 6 is a spring, 7 is a wafer mount,
8 is an autocollimator for measuring parallelism, and 9 is a glass plate for polishing the wafer.
次に作用について説明する。高精度研磨装置は、オート
コリメータ８により光学的にウェハ１の平行度を調整、
検査をしながら研磨する装置である。Next, the effect will be explained. The high-precision polishing device optically adjusts the parallelism of the wafer 1 using an autocollimator 8,
This is a device that polishes while inspecting.
０７Ｆ２に対し平行にウェハ１を貼り付け、それをウェ
ハ取付台７に固定する。このウェハ取付台７の中心には
円柱状の空洞７ａが形成されており、この空洞を通して
オートコリメータ８から発した光が０／Ｆ２に当たり、
そのはね返ってきた光の位置でＯ／Ｆ２の平行度を調整
する。この際、Ｏ／Ｆ２とウェハ１は平行でなれければ
ならないが、高精度に平行にするには、０／Ｆ２を多孔
質セラミック製のものとし、この０／Ｆ２の上（表面Ａ
）にヒータで加熱しながらワックスを塗り、完全にワッ
クスが溶けるとウェハをのせるようにする。The wafer 1 is pasted parallel to 07F2 and fixed to the wafer mount 7. A cylindrical cavity 7a is formed in the center of this wafer mount 7, and the light emitted from the autocollimator 8 passes through this cavity and hits 0/F2.
Adjust the parallelism of O/F2 based on the position of the reflected light. At this time, O/F2 and wafer 1 must be parallel to each other, but in order to make them parallel with high precision, O/F2 should be made of porous ceramic, and above this O/F2 (surface A
) while heating it with a heater, and when the wax is completely melted, place the wafer on it.
その時、第３図のように多孔質セラミックでできたＯ／
Ｆにワックスがしみ込み、ウェハ１と０／Ｆ２との間の
ワックスが極力おさえられ、ワックス厚を薄く均一に、
かつ平行に貼り付けることができる。At that time, as shown in Figure 3, an O/
The wax soaks into F, and the wax between wafer 1 and 0/F2 is suppressed as much as possible, making the wax thin and uniform.
And they can be pasted in parallel.
従来の高精度研磨装置は以上のように構成されているが
、０／Ｆ２にワックスを塗った際、Ｏ／Ｆの裏面Ｂにワ
ックスがしみ出してきて、Ｏ／Ｆの裏面が反射鏡の役割
を果せなくなり、オートコリメータからの光を反射する
ことができず、平行度の調整に困難が生ずる場合があっ
た。Conventional high-precision polishing equipment is configured as described above, but when wax is applied to 0/F2, the wax seeps out to the back side B of the O/F, and the back side of the O/F is exposed to the reflective mirror. In some cases, the autocollimator becomes unable to fulfill its role and cannot reflect the light from the autocollimator, making it difficult to adjust the parallelism.
この発明は上記のような問題点を解消するためになされ
たもので、Ｏ／Ｆの裏面からのワックスのしみ出しを無
くし、Ｏ／Ｆの反射鏡としての性能を向上させ、オート
コリメータによるウェハの平行度の調整を容易にできる
高精度研磨装置を得ることを目的とする。This invention was made in order to solve the above-mentioned problems, and it eliminates wax seepage from the back side of the O/F, improves the performance of the O/F as a reflector, and improves the performance of the wafer by an autocollimator. The object of the present invention is to obtain a high-precision polishing device that allows easy adjustment of parallelism.
この発明に係る高精度研磨装置は、多孔質セラミックで
できたＯ／Ｆの裏面に熱膨張率がそれと同程度の反射鏡
を貼着したものである。The high-precision polishing device according to the present invention has a reflecting mirror having a coefficient of thermal expansion similar to that of the O/F made of porous ceramic attached to the back surface of the O/F.
〔作用〕
この発明における高精度研磨装置は、反射鏡を貼り付け
た多孔質セラミックのＯ／Ｆにより、ワックスが裏面に
しみ出さず、両脇からしみ出し、オートコリメータから
の光の反射を容易にする。[Function] The high-precision polishing device of this invention uses a porous ceramic O/F with a reflecting mirror attached, so that the wax does not seep out from the back side but from both sides, making it easy to reflect light from the autocollimator. Make it.
以下、この発明の一実施例を図について説明する。第１
図において、１はウェハ、２はＯ／Ｆの主部をなしワッ
クスをしみ込ませることのできる多孔質セラミックでで
きたＯ／Ｆ、３はこの多孔質セラミックの裏面Ｂに貼着
され、それと同程度の熱膨張率でなる、例えば、金属、
ガラス、セラミックなど反射鏡になり得る部材で、ワッ
クスがしみ込まずオートコリメータから発した光を反射
することができる。そしてこれら２と３とにより０７Ｆ
を形成する。An embodiment of the present invention will be described below with reference to the drawings. 1st
In the figure, 1 is a wafer, 2 is an O/F that is the main part of the O/F and is made of porous ceramic that can be impregnated with wax, and 3 is an O/F that is attached to the back side B of this porous ceramic and is the same as the O/F. For example, metals with a coefficient of thermal expansion of about
A material that can be used as a reflective mirror, such as glass or ceramic, can reflect the light emitted from the autocollimator without soaking in the wax. And with these 2 and 3, 07F
form.
次にその作用について説明する。この発明では、０／Ｆ
が、ワックスをしみこますための多孔質セラミック２の
部分と、オートコリメータ８からの光を反射させる反射
鏡３の部分に分かれた構造となっているため、従来例の
ように、Ｏ／Ｆにワックスを塗った際、裏面にワックス
がしみ出してきてＯ／Ｆの裏面が反射鏡の役割を果せな
くなるようなことはなく、オートコリメータからの光を
容易に反射することができ、ウェハの平行度の調整を改
善し得る。Next, its effect will be explained. In this invention, 0/F
However, since the structure is divided into a porous ceramic 2 part for soaking wax and a reflecting mirror 3 part to reflect the light from the autocollimator 8, unlike the conventional example, the O/F When wax is applied, the wax does not ooze out to the back side of the O/F and the back side of the O/F cannot function as a reflector, and the light from the autocollimator can be easily reflected. Parallelism adjustment may be improved.
以上のようにこの発明によれば、Ｏ／Ｆを多孔質セラミ
ックと反射鏡により構成したので、オートコリメータに
よるウェハ平行出しが容易になり、精度の高い研磨装置
が得られる効果がある。As described above, according to the present invention, since the O/F is constituted by a porous ceramic and a reflecting mirror, the wafer can be easily parallelized by an autocollimator, and a highly accurate polishing apparatus can be obtained.
第１図はこの発明の一実施例による高精度研磨装置のＯ
／Ｆを示す断面側面図、第２図は従来の高精度研磨装置
を示す断面側面図、第３図は従来の高精度研磨装置の０
／Ｆを示す断面側面図である。
図中、１はウェハ、２はＯ／Ｆ、３は反射鏡、４はシリ
ンダ、５は角度調整ネジ、６はバネ、７はウェハ取付台
、８はオートコリメータ、９はガラス板である。
なお、図中同一符号は同−又は相当部分を示す。FIG. 1 shows a high-precision polishing device according to an embodiment of the present invention.
2 is a cross-sectional side view showing a conventional high-precision polishing device, and FIG. 3 is a cross-sectional side view showing a conventional high-precision polishing device.
It is a cross-sectional side view showing /F. In the figure, 1 is a wafer, 2 is an O/F, 3 is a reflecting mirror, 4 is a cylinder, 5 is an angle adjustment screw, 6 is a spring, 7 is a wafer mount, 8 is an autocollimator, and 9 is a glass plate. Note that the same reference numerals in the figures indicate the same or equivalent parts.
Claims (1)
備えた高精度研磨装置において、上記オプティカル・フ
ラットの片面の少なくとも一部に反射鏡となる部材を貼
着したことを特徴とする高精度研磨装置。A high-precision polishing device equipped with an optical flat made of a porous ceramic layer, characterized in that a member serving as a reflecting mirror is attached to at least a portion of one side of the optical flat.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1245926A JPH03108331A (en) | 1989-09-20 | 1989-09-20 | High precision polishing equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1245926A JPH03108331A (en) | 1989-09-20 | 1989-09-20 | High precision polishing equipment |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH03108331A true JPH03108331A (en) | 1991-05-08 |
Family
ID=17140905
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1245926A Pending JPH03108331A (en) | 1989-09-20 | 1989-09-20 | High precision polishing equipment |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH03108331A (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105619184A (en) * | 2015-12-29 | 2016-06-01 | 上海现代先进超精密制造中心有限公司 | High precision machining method for X-direction reflection mirror |
| CN107052948A (en) * | 2017-04-24 | 2017-08-18 | 上海现代先进超精密制造中心有限公司 | A kind of Cassegrain's primary mirror precision processing method and its matched clamp |
| US12144284B2 (en) | 2018-07-30 | 2024-11-19 | Kubota Corporation | Combine harvester with a threshing device and detachable top plate |
-
1989
- 1989-09-20 JP JP1245926A patent/JPH03108331A/en active Pending
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105619184A (en) * | 2015-12-29 | 2016-06-01 | 上海现代先进超精密制造中心有限公司 | High precision machining method for X-direction reflection mirror |
| CN107052948A (en) * | 2017-04-24 | 2017-08-18 | 上海现代先进超精密制造中心有限公司 | A kind of Cassegrain's primary mirror precision processing method and its matched clamp |
| US12144284B2 (en) | 2018-07-30 | 2024-11-19 | Kubota Corporation | Combine harvester with a threshing device and detachable top plate |
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