JPH0311460B2 - - Google Patents

Info

Publication number
JPH0311460B2
JPH0311460B2 JP9774483A JP9774483A JPH0311460B2 JP H0311460 B2 JPH0311460 B2 JP H0311460B2 JP 9774483 A JP9774483 A JP 9774483A JP 9774483 A JP9774483 A JP 9774483A JP H0311460 B2 JPH0311460 B2 JP H0311460B2
Authority
JP
Japan
Prior art keywords
layer
photosensitive
silicone rubber
heat
polyvinyl alcohol
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP9774483A
Other languages
English (en)
Japanese (ja)
Other versions
JPS59222841A (ja
Inventor
Kenji Kagami
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Oriental Photo Industrial Co Ltd
Original Assignee
Oriental Photo Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Oriental Photo Industrial Co Ltd filed Critical Oriental Photo Industrial Co Ltd
Priority to JP9774483A priority Critical patent/JPS59222841A/ja
Publication of JPS59222841A publication Critical patent/JPS59222841A/ja
Publication of JPH0311460B2 publication Critical patent/JPH0311460B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/06—Silver salts

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
JP9774483A 1983-06-01 1983-06-01 増感された感光性印刷板 Granted JPS59222841A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9774483A JPS59222841A (ja) 1983-06-01 1983-06-01 増感された感光性印刷板

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9774483A JPS59222841A (ja) 1983-06-01 1983-06-01 増感された感光性印刷板

Publications (2)

Publication Number Publication Date
JPS59222841A JPS59222841A (ja) 1984-12-14
JPH0311460B2 true JPH0311460B2 (de) 1991-02-18

Family

ID=14200391

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9774483A Granted JPS59222841A (ja) 1983-06-01 1983-06-01 増感された感光性印刷板

Country Status (1)

Country Link
JP (1) JPS59222841A (de)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7105284B1 (en) * 2005-03-17 2006-09-12 Eastman Kodak Company Thermally developable materials with narrow disperse amorphous silica

Also Published As

Publication number Publication date
JPS59222841A (ja) 1984-12-14

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