JPH03117828U - - Google Patents
Info
- Publication number
- JPH03117828U JPH03117828U JP2715290U JP2715290U JPH03117828U JP H03117828 U JPH03117828 U JP H03117828U JP 2715290 U JP2715290 U JP 2715290U JP 2715290 U JP2715290 U JP 2715290U JP H03117828 U JPH03117828 U JP H03117828U
- Authority
- JP
- Japan
- Prior art keywords
- wafer
- wafer stage
- exposure
- reticle
- reduction lens
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000009434 installation Methods 0.000 description 1
Description
第１図は本考案実施例の作用部位、又他の関連
部位の縮小投影露光装置概略構成側面図、第２図
は本考案実施例の具体的取付例の下面図、第３図
は本考案実施例の具体的取付例の側面図である。
１……照明系、２……レテイクル原画面、３…
…縮小レンズ、４……ウエハ・ステージ、５……
ウエハ、６……ウエハキヤリア、７……ジヨブカ
ード、８……ウエハキヤリア台、９……読み取り
機。
Fig. 1 is a side view of the schematic configuration of a reduced projection exposure apparatus of the working part and other related parts of the embodiment of the invention, Fig. 2 is a bottom view of a specific installation example of the embodiment of the invention, and Fig. 3 is the invention of the invention. It is a side view of the specific example of attachment of an Example. 1...Lighting system, 2...Reticle original screen, 3...
...Reducing lens, 4...Wafer stage, 5...
Wafer, 6...Wafer carrier, 7...Job card, 8...Wafer carrier stand, 9...Reader.
Claims (1)
テージと、このウエハステージを駆動するウエハ
ステージ制御部と、ウエハステージ上方に配置さ
れた縮小レンズと、この縮小レンズ上方に配置さ
れたレテイクルと、このレテイクル上の回路パタ
ーンを前述ウエハ上に転写する露光の光源と、装
置全体を制御する全体制御部とを具備する投影露
光装置に於いて、ウエハ露光条件をウエハキヤリ
アに具備したジヨブカードから直接読み富み、自
動起動露光処理を行い、オペレータのパラメータ
入力を必要としない事を特徴とした投影露光装置
。 A wafer stage on which a wafer, etc. is placed and step-feeded, a wafer stage control unit that drives this wafer stage, a reduction lens placed above the wafer stage, a reticle placed above this reduction lens, and this reticle. In a projection exposure apparatus equipped with an exposure light source for transferring the above circuit pattern onto the wafer and an overall control section for controlling the entire apparatus, the wafer exposure conditions can be read directly from a job card provided in the wafer carrier, A projection exposure system that performs automatic start-up exposure processing and does not require operator parameter input.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2715290U JPH03117828U (en) | 1990-03-19 | 1990-03-19 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2715290U JPH03117828U (en) | 1990-03-19 | 1990-03-19 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH03117828U true JPH03117828U (en) | 1991-12-05 |
Family
ID=31530020
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2715290U Pending JPH03117828U (en) | 1990-03-19 | 1990-03-19 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH03117828U (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2008277296A (en) * | 2007-05-07 | 2008-11-13 | Hon Hai Precision Industry Co Ltd | Card connector and card connector assembly |
-
1990
- 1990-03-19 JP JP2715290U patent/JPH03117828U/ja active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2008277296A (en) * | 2007-05-07 | 2008-11-13 | Hon Hai Precision Industry Co Ltd | Card connector and card connector assembly |
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