JPH03122002A - Atomic oxygen generation method - Google Patents
Atomic oxygen generation methodInfo
- Publication number
- JPH03122002A JPH03122002A JP25809889A JP25809889A JPH03122002A JP H03122002 A JPH03122002 A JP H03122002A JP 25809889 A JP25809889 A JP 25809889A JP 25809889 A JP25809889 A JP 25809889A JP H03122002 A JPH03122002 A JP H03122002A
- Authority
- JP
- Japan
- Prior art keywords
- oxygen
- arc discharge
- flow path
- atomic oxygen
- argon gas
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 title claims description 84
- 238000000034 method Methods 0.000 title claims description 10
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 claims description 52
- 239000001301 oxygen Substances 0.000 claims description 47
- 229910052760 oxygen Inorganic materials 0.000 claims description 47
- 239000007789 gas Substances 0.000 claims description 38
- 238000010891 electric arc Methods 0.000 claims description 27
- 229910052786 argon Inorganic materials 0.000 claims description 26
- 239000012159 carrier gas Substances 0.000 claims description 24
- 238000005192 partition Methods 0.000 claims description 12
- 238000012360 testing method Methods 0.000 description 15
- 239000000463 material Substances 0.000 description 12
- 230000006866 deterioration Effects 0.000 description 9
- 239000004642 Polyimide Substances 0.000 description 6
- 238000010494 dissociation reaction Methods 0.000 description 6
- 230000005593 dissociations Effects 0.000 description 6
- 239000007772 electrode material Substances 0.000 description 6
- 229920001721 polyimide Polymers 0.000 description 6
- 230000000694 effects Effects 0.000 description 4
- 239000001307 helium Substances 0.000 description 4
- 229910052734 helium Inorganic materials 0.000 description 4
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 4
- 230000002411 adverse Effects 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- 238000011109 contamination Methods 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- 239000000498 cooling water Substances 0.000 description 2
- 230000004907 flux Effects 0.000 description 2
- 230000003647 oxidation Effects 0.000 description 2
- 238000007254 oxidation reaction Methods 0.000 description 2
- 238000011282 treatment Methods 0.000 description 2
- 229910052582 BN Inorganic materials 0.000 description 1
- PZNSFCLAULLKQX-UHFFFAOYSA-N Boron nitride Chemical compound N#B PZNSFCLAULLKQX-UHFFFAOYSA-N 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 238000006731 degradation reaction Methods 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 239000010408 film Substances 0.000 description 1
- 239000012212 insulator Substances 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 231100000989 no adverse effect Toxicity 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- 238000010301 surface-oxidation reaction Methods 0.000 description 1
- 239000000725 suspension Substances 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- 238000011144 upstream manufacturing Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B13/00—Oxygen; Ozone; Oxides or hydroxides in general
- C01B13/02—Preparation of oxygen
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Oxygen, Ozone, And Oxides In General (AREA)
Abstract
(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.
Description
【発明の詳細な説明】
［産業上の利用分野］
本発明は人工衛星等の宇宙飛行体の如く、低地球高度軌
跡を飛行して宇宙大気に暴露される材料の耐環境性評価
に使用する原子酸素を発生させるための原子酸素発生方
法に関するものである。[Detailed Description of the Invention] [Industrial Application Field] The present invention is used for evaluating the environmental resistance of materials that are exposed to the space atmosphere while flying in low earth altitude trajectories, such as space vehicles such as artificial satellites. The present invention relates to an atomic oxygen generation method for generating atomic oxygen.
［従来の技術］
低地球高度（２００〜５００Ｋｍ）の軌道には原子酸素
Ｏか存在するため、上記低地球高度を飛行する飛行体の
表面か原子酸素の衝突により酸化して劣化することが知
られている。そのため、低地球高度での原子酸素による
材料の劣化を評価すると共に、原子酸素と材料との反応
メカニズムを明らかにすることを目的として、原子酸素
発生装置により発生させた原子酸素を用いて種々の試験
か行われている。[Prior Art] Since atomic oxygen O exists in orbits at low earth altitudes (200 to 500 km), it is known that the surfaces of aircraft flying at low earth altitudes are oxidized and deteriorated due to collisions with atomic oxygen. It is being Therefore, in order to evaluate the degradation of materials due to atomic oxygen at low Earth altitudes and to clarify the reaction mechanism between atomic oxygen and materials, we conducted various experiments using atomic oxygen generated by an atomic oxygen generator. A test is being conducted.
上記原子酸素発生装置では、原子酸素を発生させるため
に、従来、第５図に一例を示す如ざ型式の直流アークジ
ェットが用いられている。In the above-described atomic oxygen generator, a DC arc jet of the type shown in FIG. 5, an example of which is shown in FIG. 5, has conventionally been used to generate atomic oxygen.
詳述すると、上記従来の直流アークジェットは、本体ケ
ーシングａの前面板の外側面に、原子酸素ビームｂを噴
射させるためのノズルオリフィスＣを有するノズルチッ
プｄを取り付け、一方、上記本体ケーシングａの前面板
の内側面に、内部に上記ノズルオリフィスＣに直通する
プラズマ流路ｅを有し且つ該プラズマ流路ｅの下流部に
酸素供給流路ｆを導設してなる陽極ｑを配置して、該陽
極ｑを電極ホルダーｈの先端に支持さけると共に、該電
（へホルダーｈの先端部に、外周部に上記プラズマ流路
ｅと連絡するキャリアガス流路ｉが形成されるようにし
た陰極ｊを、その先端部が上記プラズマ流路ｅ内に臨む
ようにして同心状に支持させ、上記キャリアガス流路ｉ
を通してプラズマ流路ｅに送給したヘリウムガスとアル
ゴンガス（又は酸素）との混合ガスからなるキャリアカ
スに中で直流アーク放電させ、該アーク放電で生成され
たプラズマ中に酸素供給流路ｆを通して酸素（０２＞
１を供給することにより、酸素１を解離させてノズルチ
ップｄのノズルオリフィスＣから原子酸素ビームｂを噴
射させるようにしである。なお、ｍ、 ｎ、 ｑはそれ
ぞれノズルチップｄ、陽極ｑ１陰（１ｊを冷却するため
の冷却水流路である。To be more specific, the above-mentioned conventional DC arc jet has a nozzle tip d having a nozzle orifice C for injecting an atomic oxygen beam b attached to the outer surface of the front plate of the main body casing a; An anode q is disposed on the inner surface of the front plate, the anode q having a plasma flow path e therein which communicates directly with the nozzle orifice C, and an oxygen supply flow path f introduced downstream of the plasma flow path e. , the anode q is supported at the tip of an electrode holder h, and a carrier gas flow path i communicating with the plasma flow path e is formed on the outer periphery of the electrode holder h. j is supported concentrically with its tip facing into the plasma flow path e, and the carrier gas flow path i
DC arc discharge is caused in the carrier gas consisting of a mixed gas of helium gas and argon gas (or oxygen) which is supplied to the plasma flow path e through the plasma flow path e, and the plasma generated by the arc discharge is passed through the oxygen supply flow path f. Oxygen (02>
By supplying oxygen 1, oxygen 1 is dissociated and an atomic oxygen beam b is ejected from the nozzle orifice C of the nozzle tip d. Note that m, n, and q are cooling water flow paths for cooling the nozzle tip d, anode q1, and negative (1j), respectively.
［発明が解決しようとする課題］
ところが、上記従来のアークジェットにより原子酸素を
発生させると、キャリアガスにとしてヘリウムガスを含
むガスを用いているため陽極Ｑ及び陰極ｊの各電極に悪
影響を与えること、酸素ｆが高温になった電極（陽極ｇ
）に直接触れるため電極を酸化させてしまうこと、酸素
を解離させて高密度の原子酸素をｊｑるために投入する
アーク放電用の電力が大きい（１０〜１５ＫＷ）こと、
等の理由により、陽極Ｑ及び陰極ｊの各電極の損耗が激
しくなり、飛散した電極材（タングステン）が混入され
た状態で原子酸素ビームｂが噴射される結果、材料劣化
試験中に試験片が電極材により汚染され、本来の材料劣
化試験が正確に実施できなくなる問題があった。[Problems to be Solved by the Invention] However, when atomic oxygen is generated by the conventional arc jet described above, since a gas containing helium gas is used as a carrier gas, it has an adverse effect on each electrode of the anode Q and the cathode J. In other words, the electrode (anode g) where the oxygen f has reached a high temperature
), which oxidizes the electrode, and the arc discharge power required to dissociate oxygen and produce high-density atomic oxygen is large (10 to 15 KW).
Due to these reasons, the wear and tear of the anode Q and cathode J became severe, and as a result of the atomic oxygen beam b being injected with the scattered electrode material (tungsten) mixed in, the test piece was damaged during the material deterioration test. There was a problem that the electrode material became contaminated and the original material deterioration test could not be carried out accurately.
そこで、本発明は、キャリアガスによって電極に悪影響
を与えることがないようにすると共に、アーク放電に伴
う電（への損耗を防止し、且つ小さな投入電力によって
高密度の原子酸素が得られるような原子酸素発生方法を
提供しようとするものである。Therefore, the present invention aims to prevent the carrier gas from having an adverse effect on the electrode, prevent the damage to the electrode caused by arc discharge, and obtain high-density atomic oxygen with a small input power. The present invention aims to provide a method for generating atomic oxygen.
［課題を解決するための手段］
本発明は、上記課題を解決するために、先端部にノズル
部を有する筒状の陽極内に、陰極を配置して、該陰極の
先端と上記ノズル部との間にアーク放電領域か形成され
るようにし、且つ上記陽極と陰極の両電極間に中空形状
の仕切壁を配置して、該仕切壁の内外側を上記アーク放
電領域へ向かうキャリアガス流路とし、更に酸素か直接
電極に触れないようにするため上記仕切壁の内部を、上
記アーク放電領域へ向かう酸素流路としてなる構成の直
流アークジェットを用い、上記アーク放電領域に上記キ
ャリアガス流路を通しアルゴンカスのみを送給して該ア
ルゴンカスのみをキャリアカスとしてアーク放電させ、
該アーク放電により生成されたプラズマ中に、上記アル
ゴンガスの流量に対して１〜５％の流量の酸素を上記酸
素流路を通して添加させることを特徴とする原子酸素発
生方法とする。[Means for Solving the Problems] In order to solve the above problems, the present invention arranges a cathode within a cylindrical anode having a nozzle portion at its tip, and connects the tip of the cathode with the nozzle portion. A hollow partition wall is arranged between the anode and cathode electrodes, and a carrier gas flow path is formed on the inside and outside of the partition wall toward the arc discharge region. Furthermore, in order to prevent oxygen from coming into direct contact with the electrodes, a DC arc jet is used, which has a configuration in which the inside of the partition wall serves as an oxygen flow path toward the arc discharge region, and the carrier gas flow path is provided in the arc discharge region. By feeding only the argon gas through the argon gas and causing arc discharge using only the argon gas as a carrier gas,
The atomic oxygen generation method is characterized in that oxygen is added through the oxygen flow path into the plasma generated by the arc discharge at a flow rate of 1 to 5% of the flow rate of the argon gas.
［作 用１
アルゴンガスのみをキャリアカスとしてアーク放電させ
るようにするので、従来の如きヘリウムガスが電極に与
えていた悪影響をなくすことができる。又、酸素の添加
量をアルゴンガスの流量に対して１〜５％とすることに
より、酸素の解離度を高められて投入電源の低減化を図
ることができるようになる。[Function 1] Since arc discharge is performed using only argon gas as a carrier gas, it is possible to eliminate the adverse effects that conventional helium gas had on the electrodes. Further, by setting the amount of oxygen added to 1 to 5% with respect to the flow rate of argon gas, the degree of dissociation of oxygen can be increased and the power required to be turned on can be reduced.
［実 施 例］ 以下、本発明の実施例を図面を参照して説明する。[Example] Embodiments of the present invention will be described below with reference to the drawings.
第１図は本発明の原子酸素発生方法の実施に用いる直流
アークジェット１１の一例を示すもので、先端部に内径
を絞ってノズル部１を形成した筒状の陽極２内に、先端
が上記ノズル部１より所要量内側に引き込まれた位置に
あるように棒状の陰極３を同心状に配置し、且つ上記陽
極２と陰極３の両電極間に、窒化ボロン等からなる筒状
の仕切壁４を、その先端が陰極３の先端と陽極２のノズ
ル部１との間におけるアーク放電領Ｖｉ５より僅かに上
流位置まで延びるように配設して、該仕切壁４の内側と
外側に、キレリアガス６を流通させるためのキャリアガ
ス流路７と８を分割して形成し、更に上記仕切壁４内に
、酸素９を上記アーク放電領域５へ向けて送給するため
の酸素流路１０を形成させた構成としである。なお、第
１図において、１２は陽極の先端部内に形成した冷却水
流路である。FIG. 1 shows an example of a DC arc jet 11 used for carrying out the atomic oxygen generation method of the present invention. A rod-shaped cathode 3 is arranged concentrically so as to be drawn inward by a required amount from the nozzle part 1, and a cylindrical partition wall made of boron nitride or the like is provided between the anode 2 and cathode 3. 4 is disposed such that its tip extends slightly upstream of the arc discharge area Vi5 between the tip of the cathode 3 and the nozzle portion 1 of the anode 2, and Kyrelia gas is provided inside and outside of the partition wall 4. Carrier gas flow paths 7 and 8 for circulating oxygen 6 are formed separately, and an oxygen flow path 10 for feeding oxygen 9 toward the arc discharge region 5 is further formed within the partition wall 4. The configuration is as follows. In addition, in FIG. 1, 12 is a cooling water flow path formed within the tip of the anode.
上記直流アークジェット１１にアルゴンガスを送って該
アルゴンガスのみをキャリアカス６として直流アーク放
電により生成させたプラズマＰ中に、アルゴンガスの流
量に対して１〜５％の添加量で酸素９を送給させるよう
にするため、上記仕切壁４の内、外に形成されたキャリ
アガス流路７，８に、第２図に示す如く、マスフローコ
ントローラ等のガス制御器１３と開閉弁１４を介してア
ルゴンガスボンベ１５を接続し、且つ上記仕切壁４内に
形成された酸素流路１０に、上記ガス制御器１３と同様
なカス制御器１６と開閉弁１７を介して酸素ボンベ１８
を接続し、上記各キャリアガス流路７，８を通してアー
ク放電領域５に送ったアルゴンガスボンベ１５からのア
ルゴンカスをキャリアガス６として、直流の定電流電源
１９によって陽極２と陰極３の間のアーク放電領域５で
直流アークを放電させ、該直流アークの放電により生成
されたプラズマＰ中に、酸素ボンベ１８からの酸素９を
、酸素流路１０を通して上記キャリアガス６の流量に対
し１〜５％の流量で添加することにより、酸素９を解離
させてノズル部１からクリーンな状態の原子酸素ビーム
２０を発生させるようにする。Argon gas is sent to the DC arc jet 11 and only the argon gas is used as the carrier gas 6. Oxygen 9 is added to the plasma P generated by DC arc discharge in an amount of 1 to 5% with respect to the flow rate of the argon gas. In order to supply the carrier gas to the carrier gas channels 7 and 8 formed inside and outside the partition wall 4, as shown in FIG. The oxygen cylinder 18 is connected to the oxygen flow path 10 formed in the partition wall 4 through a gas controller 16 similar to the gas controller 13 and an on-off valve 17.
The arc discharge between the anode 2 and the cathode 3 is performed by a DC constant current power supply 19 using the argon gas from the argon gas cylinder 15 sent to the arc discharge area 5 through the carrier gas channels 7 and 8 as the carrier gas 6. A DC arc is discharged in the region 5, and oxygen 9 from the oxygen cylinder 18 is passed through the oxygen flow path 10 into the plasma P generated by the discharge of the DC arc at a rate of 1 to 5% of the flow rate of the carrier gas 6. By adding at a flow rate, the oxygen 9 is dissociated and a clean atomic oxygen beam 20 is generated from the nozzle section 1.
本発明の方法により発生させた原子酸素を用いて材料劣
化試験を行う場合は、第２図に示す如く、油回転ポンプ
やメカニカルブースタポンプ等の排気装置２１によって
真空に近い状態にされる真空チャンバー２２に、直流ア
ークジエツ１〜１１を設置して、該真空チャンバー２２
内にセットされた試料２３に向けて原子酸素ビーム２０
を照射させられるようにして使用する。なお、第２図に
おいて、２４は試料２３がセットされている試料ホルダ
ー、２５は該試料ホルダー２４にて保持される試料２３
の前面側にあって開閉可能に設けであるシャッター、２
６は排ガスを冷却するためのヒートシンク、２７は真空
計を示す。When performing a material deterioration test using atomic oxygen generated by the method of the present invention, as shown in FIG. The DC arc jets 1 to 11 are installed in the vacuum chamber 22.
An atomic oxygen beam 20 is directed toward a sample 23 set in the
Use it in such a way that it can be used to irradiate light. In addition, in FIG. 2, 24 is a sample holder in which the sample 23 is set, and 25 is the sample 23 held in the sample holder 24.
A shutter, which is provided on the front side of the camera and can be opened and closed, 2
6 is a heat sink for cooling exhaust gas, and 27 is a vacuum gauge.
地上での宇宙用材料の質量損失（劣化）試験として、た
とえば、人工衛星等の断熱材として用いられているポリ
イミドを、第２図に示す如く、真空チＶンバー２２内の
試料ホルダー２４に試料２３として保持させ、且つ上記
真空チャンバ２２内を真空に近い状態にしておいて、本
発明の方法により直流アークジェット１１から発生させ
た原子酸素ビーム２０を、試料２３である上記ポリイミ
ドに照射すると、該試料２３の貿伍損失試験を電極材飛
散による汚染を受けることなくクリーンな状態で行うこ
とかできる一二すなわち、本発明においては、直流アー
クジェット１１でア−り放電させる際のキャリアガス６
としてアルゴンガスのみを使用しているので、従来の如
きヘリウムガスが電極に与える悪影響かない。又、酸素
９は仕切壁４内の酸素流路１０を通してアーク放電によ
り生成されたプラズマＰ中に供給するので、酸素９が電
極に直接触れるようなことはなく電極の酸化が防止され
る。したかって、損耗により飛散した電極材が原子酸素
ビーム２０に混入して試料２３に衝突してしまうような
ことはなく、本来の試料２３の劣化試験を確実に行うこ
とができる。更にこの際、上記プラズマＰ中に添加する
酸素９の流量を、アルゴンカスのみからなるキャリアガ
ス６の流量に対して１〜５％としであるため、酸素分子
の原子への解離度を非常に高くすることができて酸素の
分子やイオン等の存在しない状態にでき、これにより、
直流アーク放電のために要する投入電力が１ ＫＷ前後
で済み、従来に比して大幅に電力を低減することができ
る。なお、酸素９のキャリアカス６に対する添加量を１
〜５％としたのは、１％以下では酸素濃度が低くなって
劣化加速試験としての有効性かなくなってしまうからで
あり、５％以上では第３図に示す如く、酸素の解離度が
極端に低下するからである。For mass loss (deterioration) testing of space materials on the ground, for example, a sample of polyimide, which is used as a heat insulator for artificial satellites, is placed in a sample holder 24 in a vacuum chamber 22, as shown in FIG. 23, and the inside of the vacuum chamber 22 is kept in a near-vacuum state, and when the polyimide sample 23 is irradiated with the atomic oxygen beam 20 generated from the DC arc jet 11 according to the method of the present invention, The trade loss test of the sample 23 can be conducted in a clean state without contamination due to scattering of electrode materials.In other words, in the present invention, the carrier gas 6 when performing arc discharge with the DC arc jet 11
Since only argon gas is used as the electrode, there is no adverse effect of helium gas on the electrodes as in the conventional case. Further, since the oxygen 9 is supplied into the plasma P generated by arc discharge through the oxygen flow path 10 in the partition wall 4, the oxygen 9 does not come into direct contact with the electrodes, thereby preventing oxidation of the electrodes. Therefore, the electrode material scattered due to wear does not mix into the atomic oxygen beam 20 and collide with the sample 23, and the original deterioration test of the sample 23 can be performed reliably. Furthermore, at this time, the flow rate of the oxygen 9 added to the plasma P is set to 1 to 5% of the flow rate of the carrier gas 6 consisting only of argon gas, so that the degree of dissociation of oxygen molecules into atoms is extremely high. It can be made into a state where there are no oxygen molecules or ions, and as a result,
The input power required for DC arc discharge is only around 1 kW, making it possible to significantly reduce power consumption compared to conventional methods. Note that the amount of oxygen 9 added to the carrier scum 6 is 1
The reason why it is set at ~5% is that if it is less than 1%, the oxygen concentration will be low and the effectiveness as an accelerated deterioration test will be lost.If it is more than 5%, the degree of oxygen dissociation will be extreme, as shown in Figure 3. This is because the value decreases to .
上記試料２３の貿吊］［１失試験を、−例として、キャ
リアカス６として用いるアルゴンガスの流量を２ｊ／ｍ
ｉｎとし、アルゴンガスに添加する酸素９の流量を６０
ＣＣ／ｍｉｎとし、直流アーク放電に用いる投入電力を
４５Ａ−２０Ｖ （０，９にΔ）とし、真空度を０．０
６Ｔ ｏｒｒの各条件で行うと、試料２３に衝突する原
子酸素ビーム２０のガス速度は１〜２Ｋｍ／ｓｅｃとな
り、宇宙空間での人工衛星か原子酸素に衝突する速度と
同一レベルの速度が（ｑられる。このとぎ、解離した原
子酸素の濃度は１０１２個／ｃｍ３程度となり、流束（
ガス速度×原子酸素淵度）としては１０” （（ｉ！１
／ ｃｍ３− ｓｅｃとなり、宇宙空間の１００〜１ｏ
ｏｏ倍の流束となる。[Transfer suspension of the above sample 23] [One loss test - As an example, the flow rate of argon gas used as the carrier scum 6 was set to 2j/m.
in, and the flow rate of oxygen 9 added to the argon gas was set to 60
CC/min, the input power used for DC arc discharge is 45A-20V (Δ at 0,9), and the degree of vacuum is 0.0.
When carried out under each condition of 6T orr, the gas velocity of the atomic oxygen beam 20 colliding with the sample 23 will be 1 to 2 Km/sec, which is the same level of velocity as the velocity at which an artificial satellite collides with atomic oxygen in space (q At this point, the concentration of dissociated atomic oxygen is about 1012 atoms/cm3, and the flux (
Gas velocity x atomic oxygen depth) is 10” ((i!1
/cm3-sec, 100~1o in outer space
The flux will be oo times.
したかつて、宇宙空間の１００〜１０００倍の速さで試
験を行うことができる。囚に、ポリイミドの質量損失（
劣化量）は原子酸素ビーム２０の照射時間に比例し、宇
宙空間の約１０００倍の速さで第４図に示す如き試験結
果が得られた。第４図において、Ａ、Ｂ、Ｃ，Ｄはアル
ゴンガスだけが照射されたときの各種ポリイミドの質量
損失■を示し、Ａ’、 Ｂ’、 Ｃ’、 Ｄ’はアルゴ
ンガスと原子酸素との混合カス、つまり、直流アークジ
ェット１１で発生させた原子酸素ビーム２０が照射され
たときの各種ポリイミドの質量損失量を示す。Tests can be performed 100 to 1,000 times faster than in space. In particular, the mass loss of polyimide (
The amount of deterioration) was proportional to the irradiation time of the atomic oxygen beam 20, and test results as shown in FIG. 4 were obtained at a speed approximately 1000 times faster than in space. In Figure 4, A, B, C, and D indicate the mass loss of various polyimides when only argon gas is irradiated, and A', B', C', and D' indicate the mass loss between argon gas and atomic oxygen. The figure shows the amount of mass loss of various polyimides when irradiated with the mixed residue, that is, the atomic oxygen beam 20 generated by the DC arc jet 11.
なお、上記実施例では、試料の質量損失試験について実
施した場合を示したが、原子酸素ビーム２０を材料の表
面に照射すると、緻密な酸化膜を形成させることができ
るので、酸化劣化促進による材料評価装置、材料表面酸
化処理装置、酸化物薄膜製造装置等を用いた各種の酸化
処理のために利用することもできること、その細氷発明
の要旨を逸脱しない範囲内において種々変更を加え得る
ことは勿論でおる。In addition, in the above example, a case was shown in which a mass loss test of a sample was carried out, but when the surface of the material is irradiated with the atomic oxygen beam 20, a dense oxide film can be formed, so that the material is not affected by accelerated oxidative deterioration. It is understood that it can be used for various oxidation treatments using an evaluation device, a material surface oxidation treatment device, an oxide thin film manufacturing device, etc., and that various changes can be made within the scope of the gist of the thin ice invention. Of course.
［発明の効果］
以上）ホべた如く、本発明の原子酸素発生方法によれば
、酸素が電極に直接触れないようにした直流アークジェ
ットを用い、且つアルゴンガスのみをキャリアカスとし
てアーク放電させるようにするので、電極材の損耗を防
止できて、電極材飛散による汚染を受けることなくクリ
ーンな材料の試験を行うことかでき、又、酸素の添加量
をアルゴンカスの流量に対し１〜５％としたので、酸素
の解離度を高めることができて投入電力を低減すること
ができ、酸素のイオン化を防止できる、等の優れた効果
を発揮する。[Effects of the Invention] As mentioned above, according to the atomic oxygen generation method of the present invention, a DC arc jet is used in which oxygen does not come into direct contact with the electrode, and arc discharge is performed using only argon gas as a carrier gas. Therefore, it is possible to prevent wear and tear on the electrode material, and it is possible to perform tests on clean materials without contamination due to scattering of the electrode material.In addition, the amount of oxygen added can be kept at 1 to 5% of the flow rate of the argon gas. Therefore, the degree of dissociation of oxygen can be increased, the input power can be reduced, and ionization of oxygen can be prevented.
第１図は本発明の原子酸素発生方法の実施に用いる直流
アークジェットの一例を示す断面図、第２図は第１図に
示す直流アークジェットを用いて材料の劣化試験を行っ
ている状態を示Ｖ概要図、第３図はアルゴンカスへの酸
素添加■と酸素解離との関係を示す図、第４図は各種ポ
リイミドの質量損失の状態を照射時間との関係において
示す図、第５図は従来の直流アークジェットの一例を示
す断面図である。
１・・・ノズル部、２・・・陽（※（電・１へ）、３・
・・陰極（電極）、４・・・仕切壁、５・・・アーク放
電領域、６・・・キャリアガス（アルゴンガス）、γ８
・・・キャリアガス流路、９・・・酸素、１０・・・酸
素流路、１１・・・直流アークジェット、２０・・・原
子酸素ビーム、Ｐ・・・プラズマ。Figure 1 is a cross-sectional view showing an example of a DC arc jet used to implement the atomic oxygen generation method of the present invention, and Figure 2 shows a state in which a material deterioration test is performed using the DC arc jet shown in Figure 1. Figure 3 is a diagram showing the relationship between oxygen addition to the argon gas and oxygen dissociation, Figure 4 is a diagram showing the state of mass loss of various polyimides in relation to irradiation time, and Figure 5 is a diagram showing the relationship between oxygen addition to the argon gas and oxygen dissociation. It is a sectional view showing an example of a conventional DC arc jet. 1... Nozzle part, 2... Positive (* (to electric/1), 3...
... Cathode (electrode), 4... Partition wall, 5... Arc discharge area, 6... Carrier gas (argon gas), γ8
...Carrier gas channel, 9...Oxygen, 10...Oxygen channel, 11...DC arc jet, 20...Atomic oxygen beam, P...Plasma.
Claims (1)
を配置して、該陰極の先端と上記ノズル部との間にアー
ク放電領域が形成されるようにし、且つ上記陽極と陰極
の両電極間に中空形状の仕切壁を配置して、該仕切壁の
内外側を上記アーク放電領域へ向かうキャリアガス流路
とし、更に酸素が直接電極に触れないようにするため上
記仕切壁の内部を、上記アーク放電領域へ向かう酸素流
路としてなる構成の直流アークジェットを用い、上記ア
ーク放電領域に上記キャリアガス流路を通しアルゴンガ
スのみを送給して該アルゴンガスのみをキャリアガスと
してアーク放電させ、該アーク放電により生成されたプ
ラズマ中に、上記アルゴンガスの流量に対して１〜５％
の流量の酸素を上記酸素流路を通して添加させることを
特徴とする原子酸素発生方法。(1) A cathode is disposed within a cylindrical anode having a nozzle portion at the tip thereof, so that an arc discharge region is formed between the tip of the cathode and the nozzle portion, and the anode and the cathode A hollow partition wall is arranged between both electrodes, and the inside and outside of the partition wall are used as a carrier gas flow path toward the arc discharge region. Using a DC arc jet whose interior is configured as an oxygen flow path toward the arc discharge region, only argon gas is supplied to the arc discharge region through the carrier gas flow path, and only the argon gas is used as the carrier gas. Arc discharge is performed, and 1 to 5% of the flow rate of the argon gas is added to the plasma generated by the arc discharge.
A method for generating atomic oxygen, characterized in that oxygen is added through the oxygen flow path at a flow rate of .
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP25809889A JPH03122002A (en) | 1989-10-03 | 1989-10-03 | Atomic oxygen generation method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP25809889A JPH03122002A (en) | 1989-10-03 | 1989-10-03 | Atomic oxygen generation method |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH03122002A true JPH03122002A (en) | 1991-05-24 |
Family
ID=17315483
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP25809889A Pending JPH03122002A (en) | 1989-10-03 | 1989-10-03 | Atomic oxygen generation method |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH03122002A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH09165206A (en) * | 1995-12-19 | 1997-06-24 | Mitsubishi Electric Corp | Ozone generating method and ozone generating apparatus |
| JPH11255505A (en) * | 1998-03-10 | 1999-09-21 | Nissan Motor Co Ltd | Atomic oxygen collection device |
-
1989
- 1989-10-03 JP JP25809889A patent/JPH03122002A/en active Pending
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH09165206A (en) * | 1995-12-19 | 1997-06-24 | Mitsubishi Electric Corp | Ozone generating method and ozone generating apparatus |
| JPH11255505A (en) * | 1998-03-10 | 1999-09-21 | Nissan Motor Co Ltd | Atomic oxygen collection device |
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