JPH0312787B2 - - Google Patents

Info

Publication number
JPH0312787B2
JPH0312787B2 JP60102700A JP10270085A JPH0312787B2 JP H0312787 B2 JPH0312787 B2 JP H0312787B2 JP 60102700 A JP60102700 A JP 60102700A JP 10270085 A JP10270085 A JP 10270085A JP H0312787 B2 JPH0312787 B2 JP H0312787B2
Authority
JP
Japan
Prior art keywords
layer
superconductor layer
superconductor
etching
etching mask
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP60102700A
Other languages
English (en)
Japanese (ja)
Other versions
JPS61263180A (ja
Inventor
Takukatsu Yoshida
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
National Institute of Advanced Industrial Science and Technology AIST
Original Assignee
Agency of Industrial Science and Technology
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Agency of Industrial Science and Technology filed Critical Agency of Industrial Science and Technology
Priority to JP60102700A priority Critical patent/JPS61263180A/ja
Publication of JPS61263180A publication Critical patent/JPS61263180A/ja
Publication of JPH0312787B2 publication Critical patent/JPH0312787B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N60/00—Superconducting devices
    • H10N60/01—Manufacture or treatment

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Superconductor Devices And Manufacturing Methods Thereof (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP60102700A 1985-05-16 1985-05-16 ジヨセフソン接合素子の製造方法 Granted JPS61263180A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP60102700A JPS61263180A (ja) 1985-05-16 1985-05-16 ジヨセフソン接合素子の製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60102700A JPS61263180A (ja) 1985-05-16 1985-05-16 ジヨセフソン接合素子の製造方法

Publications (2)

Publication Number Publication Date
JPS61263180A JPS61263180A (ja) 1986-11-21
JPH0312787B2 true JPH0312787B2 (2) 1991-02-21

Family

ID=14334534

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60102700A Granted JPS61263180A (ja) 1985-05-16 1985-05-16 ジヨセフソン接合素子の製造方法

Country Status (1)

Country Link
JP (1) JPS61263180A (2)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63205974A (ja) * 1987-02-23 1988-08-25 Agency Of Ind Science & Technol ジヨセフソン接合の製造方法

Also Published As

Publication number Publication date
JPS61263180A (ja) 1986-11-21

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Legal Events

Date Code Title Description
EXPY Cancellation because of completion of term