JPH0314043B2 - - Google Patents

Info

Publication number: JPH0314043B2
Authority: JP; Japan
Prior art keywords: base material; coating; fluorine; substrate; polymer compound
Prior art date: 1983-02-28
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.): Expired

Application number

JP3325983A

Other languages

English (en)

Japanese (ja)

Other versions

JPS59159806A (ja

Inventor

Takeaki Nakajima

Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)

Daikin Industries Ltd

Original Assignee

Daikin Industries Ltd

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1983-02-28

Filing date

1983-02-28

Publication date

1991-02-25

1983-02-28 Application filed by Daikin Industries Ltd filed Critical Daikin Industries Ltd

1983-02-28 Priority to JP3325983A priority Critical patent/JPS59159806A/ja

1984-09-10 Publication of JPS59159806A publication Critical patent/JPS59159806A/ja

1991-02-25 Publication of JPH0314043B2 publication Critical patent/JPH0314043B2/ja

Status Granted legal-status Critical Current

Links

238000000576 coating method Methods 0.000 claims description 31
239000011248 coating agent Substances 0.000 claims description 30
150000001875 compounds Chemical class 0.000 claims description 23
229910052731 fluorine Inorganic materials 0.000 claims description 22
239000011737 fluorine Substances 0.000 claims description 22
239000000463 material Substances 0.000 claims description 21
YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 claims description 18
239000000758 substrate Substances 0.000 claims description 17
238000000034 method Methods 0.000 claims description 14
229920000642 polymer Polymers 0.000 claims description 14
238000010438 heat treatment Methods 0.000 claims description 8
239000011261 inert gas Substances 0.000 claims description 3
150000007529 inorganic bases Chemical class 0.000 claims description 3
150000007530 organic bases Chemical class 0.000 claims description 2
XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 14
239000002904 solvent Substances 0.000 description 8
230000000052 comparative effect Effects 0.000 description 6
125000004435 hydrogen atom Chemical group [H]* 0.000 description 6
239000010935 stainless steel Substances 0.000 description 6
229910001220 stainless steel Inorganic materials 0.000 description 6
125000001153 fluoro group Chemical group F* 0.000 description 4
239000011521 glass Chemical class 0.000 description 4
229920000620 organic polymer Polymers 0.000 description 4
VZGDMQKNWNREIO-UHFFFAOYSA-N tetrachloromethane Chemical compound ClC(Cl)(Cl)Cl VZGDMQKNWNREIO-UHFFFAOYSA-N 0.000 description 4
229910000831 Steel Inorganic materials 0.000 description 3
239000010959 steel Substances 0.000 description 3
BFKJFAAPBSQJPD-UHFFFAOYSA-N tetrafluoroethene Chemical compound FC(F)=C(F)F BFKJFAAPBSQJPD-UHFFFAOYSA-N 0.000 description 3
ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical group [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 description 2
XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical group [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 2
VOPWNXZWBYDODV-UHFFFAOYSA-N Chlorodifluoromethane Chemical compound FC(F)Cl VOPWNXZWBYDODV-UHFFFAOYSA-N 0.000 description 2
UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 2
XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
239000004952 Polyamide Substances 0.000 description 2
GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Chemical group BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 description 2
229910052794 bromium Inorganic materials 0.000 description 2
125000004432 carbon atom Chemical group C* 0.000 description 2
238000006243 chemical reaction Methods 0.000 description 2
239000000460 chlorine Substances 0.000 description 2
229910052801 chlorine Inorganic materials 0.000 description 2
125000001309 chloro group Chemical group Cl* 0.000 description 2
230000008034 disappearance Effects 0.000 description 2
238000001035 drying Methods 0.000 description 2
239000001257 hydrogen Substances 0.000 description 2
229910052739 hydrogen Inorganic materials 0.000 description 2
229910052740 iodine Chemical group 0.000 description 2
239000011630 iodine Chemical group 0.000 description 2
239000007788 liquid Substances 0.000 description 2
239000002184 metal Substances 0.000 description 2
229910052751 metal Inorganic materials 0.000 description 2
150000002739 metals Chemical class 0.000 description 2
238000009832 plasma treatment Methods 0.000 description 2
229920000058 polyacrylate Polymers 0.000 description 2
229920002647 polyamide Polymers 0.000 description 2
229920000728 polyester Polymers 0.000 description 2
238000006116 polymerization reaction Methods 0.000 description 2
229920000098 polyolefin Polymers 0.000 description 2
239000000126 substance Substances 0.000 description 2
BIIBYWQGRFWQKM-JVVROLKMSA-N (2S)-N-[4-(cyclopropylamino)-3,4-dioxo-1-[(3S)-2-oxopyrrolidin-3-yl]butan-2-yl]-2-[[(E)-3-(2,4-dichlorophenyl)prop-2-enoyl]amino]-4,4-dimethylpentanamide Chemical compound CC(C)(C)C[C@@H](C(NC(C[C@H](CCN1)C1=O)C(C(NC1CC1)=O)=O)=O)NC(/C=C/C(C=CC(Cl)=C1)=C1Cl)=O BIIBYWQGRFWQKM-JVVROLKMSA-N 0.000 description 1
MIZLGWKEZAPEFJ-UHFFFAOYSA-N 1,1,2-trifluoroethene Chemical compound FC=C(F)F MIZLGWKEZAPEFJ-UHFFFAOYSA-N 0.000 description 1
NPNPZTNLOVBDOC-UHFFFAOYSA-N 1,1-difluoroethane Chemical compound CC(F)F NPNPZTNLOVBDOC-UHFFFAOYSA-N 0.000 description 1
RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
XPDWGBQVDMORPB-UHFFFAOYSA-N Fluoroform Chemical compound FC(F)F XPDWGBQVDMORPB-UHFFFAOYSA-N 0.000 description 1
239000004642 Polyimide Substances 0.000 description 1
239000004793 Polystyrene Substances 0.000 description 1
239000004372 Polyvinyl alcohol Substances 0.000 description 1
229910045601 alloy Inorganic materials 0.000 description 1
239000000956 alloy Substances 0.000 description 1
229910052782 aluminium Inorganic materials 0.000 description 1
XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
229910052786 argon Inorganic materials 0.000 description 1
239000000919 ceramic Substances 0.000 description 1
KYKAJFCTULSVSH-UHFFFAOYSA-N chloro(fluoro)methane Chemical compound F[C]Cl KYKAJFCTULSVSH-UHFFFAOYSA-N 0.000 description 1
238000007796 conventional method Methods 0.000 description 1
229910052802 copper Inorganic materials 0.000 description 1
239000010949 copper Substances 0.000 description 1
238000004132 cross linking Methods 0.000 description 1
-1 cyclic alkene Chemical class 0.000 description 1
150000001924 cycloalkanes Chemical class 0.000 description 1
238000000354 decomposition reaction Methods 0.000 description 1
PXBRQCKWGAHEHS-UHFFFAOYSA-N dichlorodifluoromethane Chemical compound FC(F)(Cl)Cl PXBRQCKWGAHEHS-UHFFFAOYSA-N 0.000 description 1
235000019404 dichlorodifluoromethane Nutrition 0.000 description 1
UMNKXPULIDJLSU-UHFFFAOYSA-N dichlorofluoromethane Chemical compound FC(Cl)Cl UMNKXPULIDJLSU-UHFFFAOYSA-N 0.000 description 1
230000005684 electric field Effects 0.000 description 1
239000003822 epoxy resin Substances 0.000 description 1
238000011156 evaluation Methods 0.000 description 1
XUCNUKMRBVNAPB-UHFFFAOYSA-N fluoroethene Chemical compound FC=C XUCNUKMRBVNAPB-UHFFFAOYSA-N 0.000 description 1
229920002313 fluoropolymer Polymers 0.000 description 1
239000007789 gas Substances 0.000 description 1
239000001307 helium Substances 0.000 description 1
229910052734 helium Inorganic materials 0.000 description 1
SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 1
229910052742 iron Inorganic materials 0.000 description 1
230000014759 maintenance of location Effects 0.000 description 1
239000000203 mixture Substances 0.000 description 1
229910052757 nitrogen Inorganic materials 0.000 description 1
230000003287 optical effect Effects 0.000 description 1
239000003960 organic solvent Substances 0.000 description 1
229920003229 poly(methyl methacrylate) Polymers 0.000 description 1
229920000515 polycarbonate Polymers 0.000 description 1
239000004417 polycarbonate Substances 0.000 description 1
229920000647 polyepoxide Polymers 0.000 description 1
229920001721 polyimide Polymers 0.000 description 1
239000004926 polymethyl methacrylate Substances 0.000 description 1
229920002223 polystyrene Polymers 0.000 description 1
229920002451 polyvinyl alcohol Polymers 0.000 description 1
229920000915 polyvinyl chloride Polymers 0.000 description 1
239000004800 polyvinyl chloride Substances 0.000 description 1
238000005086 pumping Methods 0.000 description 1
239000002994 raw material Substances 0.000 description 1
CYRMSUTZVYGINF-UHFFFAOYSA-N trichlorofluoromethane Chemical compound FC(Cl)(Cl)Cl CYRMSUTZVYGINF-UHFFFAOYSA-N 0.000 description 1
238000002604 ultrasonography Methods 0.000 description 1
238000005406 washing Methods 0.000 description 1

Landscapes

Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
Physical Vapour Deposition (AREA)
Treatments Of Macromolecular Shaped Articles (AREA)
Surface Treatment Of Glass (AREA)
Polymerisation Methods In General (AREA)

JP3325983A 1983-02-28 1983-02-28 含フツ素高分子化合物被膜の形成方法 Granted JPS59159806A (ja)

Priority Applications (1)

Application Number	Priority Date	Filing Date	Title
JP3325983A JPS59159806A (ja)	1983-02-28	1983-02-28	含フツ素高分子化合物被膜の形成方法

Applications Claiming Priority (1)

Application Number	Priority Date	Filing Date	Title
JP3325983A JPS59159806A (ja)	1983-02-28	1983-02-28	含フツ素高分子化合物被膜の形成方法

Publications (2)

Publication Number	Publication Date
JPS59159806A JPS59159806A (ja)	1984-09-10
JPH0314043B2 true JPH0314043B2 (de)	1991-02-25

Family

ID=12381509

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
JP3325983A Granted JPS59159806A (ja)	1983-02-28	1983-02-28	含フツ素高分子化合物被膜の形成方法

Country Status (1)

Country	Link
JP (1)	JPS59159806A (de)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
DE3326376A1 (de) *	1983-07-22	1985-01-31	Siemens AG, 1000 Berlin und 8000 München	Verfahren zum erzeugen von glimmpolymerisat-schichten
JPS61227978A (ja) *	1985-03-29	1986-10-11	ジェイエスアール株式会社	プラズマ重合膜被覆セラミツクス製品
JPS62111739A (ja) *	1985-11-11	1987-05-22	株式会社クラレ	多層シ−ト状構造物及びその製造方法
DE3739994A1 (de) *	1987-11-25	1989-06-08	Linde Ag	Verfahren zum fluorieren von kunststoffgegenstaenden

1983
- 1983-02-28 JP JP3325983A patent/JPS59159806A/ja active Granted

Also Published As

Publication number	Publication date
JPS59159806A (ja)	1984-09-10

Publication	Publication Date	Title
US5599489A (en)	1997-02-04	Preparing molded articles of fluorine-containing polymer with increased water-repellency
Strobel et al.	1985	Surface modification of polypropylene with CF4, CF3H, CF3Cl, and CF3Br plasmas
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TW201139467A (en)	2011-11-16	Liquid repellent surfaces
JPH08500628A (ja)	1996-01-23	フルオロポリマー類の精製
Loh et al.	1987	Surface modifications of polymers with fluorine‐containing plasmas: Deposition versus replacement reactions
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Zhang et al.	2001	Surface modification of aluminum foil and PTFE film by graft polymerization for adhesion enhancement
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CA2436253A1 (en)	2002-07-11	A method for the preparation of a substrate for immobilising chemical compounds and the substrate and the use thereof
Kranz et al.	1994	The effect of fluorination on the surface characteristics and adhesive properties of polyethylene and polypropylene
Bernett et al.	1967	Surface properties of perfluoro acids as affected by terminal branching and chlorine substitution
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