JPH03165318A - ハードディスクのためのバニシ仕上げ用ヘッド及びその製造方法 - Google Patents

ハードディスクのためのバニシ仕上げ用ヘッド及びその製造方法

Info

Publication number: JPH03165318A
Authority: JP; Japan
Prior art keywords: burnishing; head; burnishing head; head according; microskids
Prior art date: 1989-11-10
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.): Pending

Application number

JP30591290A

Other languages

English (en)

Japanese (ja)

Inventor

Deroux-Dauphin Patrice

パトリス・ドウルー―ドーフアン

Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)

LCC CICE CIE EUROP COMPOS ELECTRON

Original Assignee

LCC CICE CIE EUROP COMPOS ELECTRON

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1989-11-10

Filing date

1990-11-09

Publication date

1991-07-17

1990-11-09 Application filed by LCC CICE CIE EUROP COMPOS ELECTRON filed Critical LCC CICE CIE EUROP COMPOS ELECTRON

1991-07-17 Publication of JPH03165318A publication Critical patent/JPH03165318A/ja

Status Pending legal-status Critical Current

Links

238000004519 manufacturing process Methods 0.000 title claims description 8
239000000758 substrate Substances 0.000 claims abstract description 17
238000000034 method Methods 0.000 claims description 9
239000010410 layer Substances 0.000 claims description 8
XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 7
229910052710 silicon Inorganic materials 0.000 claims description 7
239000010703 silicon Substances 0.000 claims description 7
239000002344 surface layer Substances 0.000 claims description 7
238000005530 etching Methods 0.000 claims description 6
230000004048 modification Effects 0.000 description 5
238000012986 modification Methods 0.000 description 5
230000000873 masking effect Effects 0.000 description 4
VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 3
238000010586 diagram Methods 0.000 description 3
239000011347 resin Substances 0.000 description 3
229920005989 resin Polymers 0.000 description 3
229910052814 silicon oxide Inorganic materials 0.000 description 3
230000003647 oxidation Effects 0.000 description 2
238000007254 oxidation reaction Methods 0.000 description 2
238000005498 polishing Methods 0.000 description 2
OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
229910052581 Si3N4 Inorganic materials 0.000 description 1
PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
230000015572 biosynthetic process Effects 0.000 description 1
229910052799 carbon Inorganic materials 0.000 description 1
238000000354 decomposition reaction Methods 0.000 description 1
230000007812 deficiency Effects 0.000 description 1
229910003460 diamond Inorganic materials 0.000 description 1
239000010432 diamond Substances 0.000 description 1
238000005516 engineering process Methods 0.000 description 1
238000000227 grinding Methods 0.000 description 1
238000004377 microelectronic Methods 0.000 description 1
239000002245 particle Substances 0.000 description 1
238000001020 plasma etching Methods 0.000 description 1
238000000623 plasma-assisted chemical vapour deposition Methods 0.000 description 1
238000007517 polishing process Methods 0.000 description 1
238000011084 recovery Methods 0.000 description 1
238000006748 scratching Methods 0.000 description 1
230000002393 scratching effect Effects 0.000 description 1
238000007493 shaping process Methods 0.000 description 1
HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 1
229910010271 silicon carbide Inorganic materials 0.000 description 1
HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
238000004544 sputter deposition Methods 0.000 description 1
MTPVUVINMAGMJL-UHFFFAOYSA-N trimethyl(1,1,2,2,2-pentafluoroethyl)silane Chemical compound C[Si](C)(C)C(F)(F)C(F)(F)F MTPVUVINMAGMJL-UHFFFAOYSA-N 0.000 description 1
238000007740 vapor deposition Methods 0.000 description 1

Classifications

- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B39/00—Burnishing machines or devices, i.e. requiring pressure members for compacting the surface zone; Accessories therefor
- B24B39/06—Burnishing machines or devices, i.e. requiring pressure members for compacting the surface zone; Accessories therefor designed for working plane surfaces

Landscapes

Engineering & Computer Science (AREA)
Mechanical Engineering (AREA)
Manufacturing Of Magnetic Record Carriers (AREA)

JP30591290A 1989-11-10 1990-11-09 ハードディスクのためのバニシ仕上げ用ヘッド及びその製造方法 Pending JPH03165318A (ja)

Applications Claiming Priority (2)

Application Number	Priority Date	Filing Date	Title
FR8914775		1989-11-10
FR8914775A FR2654543A1 (fr)	1989-11-10	1989-11-10	Tete de brunissage pour disques durs et son procede de fabrication.

Publications (1)

Publication Number	Publication Date
JPH03165318A true JPH03165318A (ja)	1991-07-17

Family

ID=9387283

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
JP30591290A Pending JPH03165318A (ja)	1989-11-10	1990-11-09	ハードディスクのためのバニシ仕上げ用ヘッド及びその製造方法

Country Status (3)

Country	Link
EP (1)	EP0427612A1 (fr)
JP (1)	JPH03165318A (fr)
FR (1)	FR2654543A1 (fr)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
US6497021B2 (en)	1999-01-14	2002-12-24	International Business Machines Corporation	Method and apparatus for providing a low cost contact burnish slider
US7164557B2 (en)	2004-02-23	2007-01-16	Hitachi Global Storage Technologies Netherlands Bv	Apparatus for burnishing small asperities and cleaning loose particles from magnetic recording media

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
DE2937276A1 (de) *	1979-09-14	1981-03-19	Siemens AG, 1000 Berlin und 8000 München	Einrichtung zum glaetten der oberflaechen von platten fuer plattenspeicher
US4430782A (en) *	1982-01-11	1984-02-14	International Business Machines Corporation	Apparatus and method for burnishing magnetic disks
US4711115A (en) *	1985-12-30	1987-12-08	Aluminum Company Of America	Method for forming memory discs by forging
US4845816A (en) *	1986-07-18	1989-07-11	Xebec Corporation	Burnishing head for memory disk drive

1989
- 1989-11-10 FR FR8914775A patent/FR2654543A1/fr active Pending
1990
- 1990-11-06 EP EP90403137A patent/EP0427612A1/fr not_active Withdrawn
- 1990-11-09 JP JP30591290A patent/JPH03165318A/ja active Pending

Also Published As

Publication number	Publication date
EP0427612A1 (fr)	1991-05-15
FR2654543A1 (fr)	1991-05-17

Similar Documents

Publication	Publication Date	Title
US5761790A (en)	1998-06-09	Process for manufacturing a thin film slider with protruding R/W element formed by chemical-mechanical polishing
US5462636A (en)	1995-10-31	Method for chemically scribing wafers
US6556380B2 (en)	2003-04-29	Silicon sliders with trapezoidal shape and drie process for fabrication
US20080202036A1 (en)	2008-08-28	Method and apparatus for treating the surface of a media, such as a magnetic hard disk, while operating, such as during dynamic electrical testing
KR100278138B1 (ko)	2001-01-15	자기헤드 및 자기헤드의 제조방법
JPH04262589A (ja)	1992-09-17	光半導体装置の製造方法
JPH03165318A (ja)	1991-07-17	ハードディスクのためのバニシ仕上げ用ヘッド及びその製造方法
KR100347782B1 (ko)	2002-08-07	하드 디스크 처리용 버니싱 헤드
US20050005426A1 (en)	2005-01-13	Manufacturing method of flying magnetic head slider
US6623652B1 (en)	2003-09-23	Reactive ion etching of the lapped trailing edge surface of a slider
US6357095B1 (en)	2002-03-19	Hard disk burnishing head
JPS583291B2 (ja)	1983-01-20	浮動ヘツドスライダ
JP2644069B2 (ja)	1997-08-25	半導体装置の製造方法
US6212033B1 (en)	2001-04-03	Slider and method for manufacturing the same
JPH0438716A (ja)	1992-02-07	磁気デイスク
JPH06162431A (ja)	1994-06-10	積層型磁気ヘッドの製造方法
JPS591163A (ja)	1984-01-06	基板の加工法
JPH1153727A (ja)	1999-02-26	浮動型磁気ヘッドスライダおよびその加工方法
JPH02134717A (ja)	1990-05-23	磁気ヘッドの製造方法
JPS62124684A (ja)	1987-06-05	ヘツドスライダ
JP2680750B2 (ja)	1997-11-19	磁気ヘッドの製造方法
JPS59142776A (ja)	1984-08-16	負圧スライダおよびその製造方法
JPH05347008A (ja)	1993-12-27	垂直記録再生磁気ヘッドおよびその製造方法
JPH07235019A (ja)	1995-09-05	コンタクト型薄膜磁気ヘッド及びその製造方法
JPS6240605A (ja)	1987-02-21	磁気ヘツド