JPH0317857B2 - - Google Patents
Info
- Publication number
- JPH0317857B2 JPH0317857B2 JP388486A JP388486A JPH0317857B2 JP H0317857 B2 JPH0317857 B2 JP H0317857B2 JP 388486 A JP388486 A JP 388486A JP 388486 A JP388486 A JP 388486A JP H0317857 B2 JPH0317857 B2 JP H0317857B2
- Authority
- JP
- Japan
- Prior art keywords
- prepreg
- epoxy resin
- weight
- printed wiring
- parts
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000003822 epoxy resin Substances 0.000 claims description 32
- 229920000647 polyepoxide Polymers 0.000 claims description 32
- -1 inorganic acid salt Chemical class 0.000 claims description 10
- 239000000463 material Substances 0.000 claims description 6
- 239000005011 phenolic resin Substances 0.000 claims description 6
- 239000002966 varnish Substances 0.000 claims description 6
- 239000007822 coupling agent Substances 0.000 claims description 5
- ZBCBWPMODOFKDW-UHFFFAOYSA-N diethanolamine Chemical compound OCCNCCO ZBCBWPMODOFKDW-UHFFFAOYSA-N 0.000 claims description 5
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 claims description 5
- 238000004519 manufacturing process Methods 0.000 claims description 5
- 229920001568 phenolic resin Polymers 0.000 claims description 5
- 238000001035 drying Methods 0.000 claims description 4
- KXGFMDJXCMQABM-UHFFFAOYSA-N 2-methoxy-6-methylphenol Chemical compound [CH]OC1=CC=CC([CH])=C1O KXGFMDJXCMQABM-UHFFFAOYSA-N 0.000 claims description 3
- 125000001841 imino group Chemical group [H]N=* 0.000 claims description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 14
- 239000011889 copper foil Substances 0.000 description 12
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 10
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 9
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 9
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 9
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 8
- PXKLMJQFEQBVLD-UHFFFAOYSA-N bisphenol F Chemical compound C1=CC(O)=CC=C1CC1=CC=C(O)C=C1 PXKLMJQFEQBVLD-UHFFFAOYSA-N 0.000 description 8
- 229920003986 novolac Polymers 0.000 description 8
- 229920005989 resin Polymers 0.000 description 8
- 239000011347 resin Substances 0.000 description 8
- 230000000052 comparative effect Effects 0.000 description 7
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 6
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 6
- 239000002904 solvent Substances 0.000 description 6
- 238000005553 drilling Methods 0.000 description 5
- 238000002156 mixing Methods 0.000 description 5
- 230000000694 effects Effects 0.000 description 4
- XWBDWHCCBGMXKG-UHFFFAOYSA-N ethanamine;hydron;chloride Chemical compound Cl.CCN XWBDWHCCBGMXKG-UHFFFAOYSA-N 0.000 description 4
- 239000011521 glass Substances 0.000 description 4
- 238000003860 storage Methods 0.000 description 4
- BPSIOYPQMFLKFR-UHFFFAOYSA-N trimethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](OC)(OC)CCCOCC1CO1 BPSIOYPQMFLKFR-UHFFFAOYSA-N 0.000 description 4
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- QUSNBJAOOMFDIB-UHFFFAOYSA-N Ethylamine Chemical compound CCN QUSNBJAOOMFDIB-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 230000007423 decrease Effects 0.000 description 3
- 239000004744 fabric Substances 0.000 description 3
- 150000002460 imidazoles Chemical class 0.000 description 3
- 230000007774 longterm Effects 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- QAOWNCQODCNURD-UHFFFAOYSA-N sulfuric acid Substances OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 3
- LLPKQRMDOFYSGZ-UHFFFAOYSA-N 2,5-dimethyl-1h-imidazole Chemical compound CC1=CN=C(C)N1 LLPKQRMDOFYSGZ-UHFFFAOYSA-N 0.000 description 2
- QTWJRLJHJPIABL-UHFFFAOYSA-N 2-methylphenol;3-methylphenol;4-methylphenol Chemical compound CC1=CC=C(O)C=C1.CC1=CC=CC(O)=C1.CC1=CC=CC=C1O QTWJRLJHJPIABL-UHFFFAOYSA-N 0.000 description 2
- ZCUJYXPAKHMBAZ-UHFFFAOYSA-N 2-phenyl-1h-imidazole Chemical compound C1=CNC(C=2C=CC=CC=2)=N1 ZCUJYXPAKHMBAZ-UHFFFAOYSA-N 0.000 description 2
- BVYPJEBKDLFIDL-UHFFFAOYSA-N 3-(2-phenylimidazol-1-yl)propanenitrile Chemical compound N#CCCN1C=CN=C1C1=CC=CC=C1 BVYPJEBKDLFIDL-UHFFFAOYSA-N 0.000 description 2
- NLHHRLWOUZZQLW-UHFFFAOYSA-N Acrylonitrile Chemical compound C=CC#N NLHHRLWOUZZQLW-UHFFFAOYSA-N 0.000 description 2
- SRORDPCXIPXEAX-UHFFFAOYSA-N CCCCCCCCCCCCCP(CCCCCCCCCCCCC)(O)(OCCCCCCCC)OCCCCCCCC.CCCCCCCCCCCCCP(CCCCCCCCCCCCC)(O)(OCCCCCCCC)OCCCCCCCC Chemical compound CCCCCCCCCCCCCP(CCCCCCCCCCCCC)(O)(OCCCCCCCC)OCCCCCCCC.CCCCCCCCCCCCCP(CCCCCCCCCCCCC)(O)(OCCCCCCCC)OCCCCCCCC SRORDPCXIPXEAX-UHFFFAOYSA-N 0.000 description 2
- 239000004593 Epoxy Substances 0.000 description 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 2
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 2
- BAVYZALUXZFZLV-UHFFFAOYSA-N Methylamine Chemical compound NC BAVYZALUXZFZLV-UHFFFAOYSA-N 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
- 239000006087 Silane Coupling Agent Substances 0.000 description 2
- UMHKOAYRTRADAT-UHFFFAOYSA-N [hydroxy(octoxy)phosphoryl] octyl hydrogen phosphate Chemical compound CCCCCCCCOP(O)(=O)OP(O)(=O)OCCCCCCCC UMHKOAYRTRADAT-UHFFFAOYSA-N 0.000 description 2
- 125000001931 aliphatic group Chemical group 0.000 description 2
- 238000005452 bending Methods 0.000 description 2
- YCIMNLLNPGFGHC-UHFFFAOYSA-N catechol Chemical compound OC1=CC=CC=C1O YCIMNLLNPGFGHC-UHFFFAOYSA-N 0.000 description 2
- 239000003795 chemical substances by application Substances 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- 229930003836 cresol Natural products 0.000 description 2
- QGBSISYHAICWAH-UHFFFAOYSA-N dicyandiamide Chemical compound NC(N)=NC#N QGBSISYHAICWAH-UHFFFAOYSA-N 0.000 description 2
- 125000003700 epoxy group Chemical group 0.000 description 2
- 125000000524 functional group Chemical group 0.000 description 2
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 2
- QCTJRYGLPAFRMS-UHFFFAOYSA-N prop-2-enoic acid;1,3,5-triazine-2,4,6-triamine Chemical compound OC(=O)C=C.NC1=NC(N)=NC(N)=N1 QCTJRYGLPAFRMS-UHFFFAOYSA-N 0.000 description 2
- WYTZZXDRDKSJID-UHFFFAOYSA-N (3-aminopropyl)triethoxysilane Chemical compound CCO[Si](OCC)(OCC)CCCN WYTZZXDRDKSJID-UHFFFAOYSA-N 0.000 description 1
- MTZUIIAIAKMWLI-UHFFFAOYSA-N 1,2-diisocyanatobenzene Chemical compound O=C=NC1=CC=CC=C1N=C=O MTZUIIAIAKMWLI-UHFFFAOYSA-N 0.000 description 1
- ZXHZWRZAWJVPIC-UHFFFAOYSA-N 1,2-diisocyanatonaphthalene Chemical compound C1=CC=CC2=C(N=C=O)C(N=C=O)=CC=C21 ZXHZWRZAWJVPIC-UHFFFAOYSA-N 0.000 description 1
- FBHPRUXJQNWTEW-UHFFFAOYSA-N 1-benzyl-2-methylimidazole Chemical compound CC1=NC=CN1CC1=CC=CC=C1 FBHPRUXJQNWTEW-UHFFFAOYSA-N 0.000 description 1
- IEKHISJGRIEHRE-UHFFFAOYSA-N 16-methylheptadecanoic acid;propan-2-ol;titanium Chemical compound [Ti].CC(C)O.CC(C)CCCCCCCCCCCCCCC(O)=O.CC(C)CCCCCCCCCCCCCCC(O)=O.CC(C)CCCCCCCCCCCCCCC(O)=O IEKHISJGRIEHRE-UHFFFAOYSA-N 0.000 description 1
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 1
- 125000000022 2-aminoethyl group Chemical group [H]C([*])([H])C([H])([H])N([H])[H] 0.000 description 1
- KKOHCQAVIJDYAF-UHFFFAOYSA-N 2-dodecylbenzenesulfonic acid;propan-2-ol;titanium Chemical compound [Ti].CC(C)O.CCCCCCCCCCCCC1=CC=CC=C1S(O)(=O)=O.CCCCCCCCCCCCC1=CC=CC=C1S(O)(=O)=O.CCCCCCCCCCCCC1=CC=CC=C1S(O)(=O)=O KKOHCQAVIJDYAF-UHFFFAOYSA-N 0.000 description 1
- PQAMFDRRWURCFQ-UHFFFAOYSA-N 2-ethyl-1h-imidazole Chemical compound CCC1=NC=CN1 PQAMFDRRWURCFQ-UHFFFAOYSA-N 0.000 description 1
- QUPKCFBHJFNUEW-UHFFFAOYSA-N 2-ethyl-4,5-dihydro-1h-imidazole Chemical compound CCC1=NCCN1 QUPKCFBHJFNUEW-UHFFFAOYSA-N 0.000 description 1
- YTWBFUCJVWKCCK-UHFFFAOYSA-N 2-heptadecyl-1h-imidazole Chemical compound CCCCCCCCCCCCCCCCCC1=NC=CN1 YTWBFUCJVWKCCK-UHFFFAOYSA-N 0.000 description 1
- NCVGSSQICKMAIA-UHFFFAOYSA-N 2-heptadecyl-4,5-dihydro-1h-imidazole Chemical compound CCCCCCCCCCCCCCCCCC1=NCCN1 NCVGSSQICKMAIA-UHFFFAOYSA-N 0.000 description 1
- VWSLLSXLURJCDF-UHFFFAOYSA-N 2-methyl-4,5-dihydro-1h-imidazole Chemical compound CC1=NCCN1 VWSLLSXLURJCDF-UHFFFAOYSA-N 0.000 description 1
- FUOZJYASZOSONT-UHFFFAOYSA-N 2-propan-2-yl-1h-imidazole Chemical compound CC(C)C1=NC=CN1 FUOZJYASZOSONT-UHFFFAOYSA-N 0.000 description 1
- BTYIFQSAIPDZQW-UHFFFAOYSA-N 2-propan-2-yl-4,5-dihydro-1h-imidazole Chemical compound CC(C)C1=NCCN1 BTYIFQSAIPDZQW-UHFFFAOYSA-N 0.000 description 1
- LLEASVZEQBICSN-UHFFFAOYSA-N 2-undecyl-1h-imidazole Chemical compound CCCCCCCCCCCC1=NC=CN1 LLEASVZEQBICSN-UHFFFAOYSA-N 0.000 description 1
- FQHUDZKKDCTQET-UHFFFAOYSA-N 2-undecyl-4,5-dihydro-1h-imidazole Chemical compound CCCCCCCCCCCC1=NCCN1 FQHUDZKKDCTQET-UHFFFAOYSA-N 0.000 description 1
- IKYAJDOSWUATPI-UHFFFAOYSA-N 3-[dimethoxy(methyl)silyl]propane-1-thiol Chemical compound CO[Si](C)(OC)CCCS IKYAJDOSWUATPI-UHFFFAOYSA-N 0.000 description 1
- BMYNFMYTOJXKLE-UHFFFAOYSA-N 3-azaniumyl-2-hydroxypropanoate Chemical compound NCC(O)C(O)=O BMYNFMYTOJXKLE-UHFFFAOYSA-N 0.000 description 1
- LVNLBBGBASVLLI-UHFFFAOYSA-N 3-triethoxysilylpropylurea Chemical compound CCO[Si](OCC)(OCC)CCCNC(N)=O LVNLBBGBASVLLI-UHFFFAOYSA-N 0.000 description 1
- UUEWCQRISZBELL-UHFFFAOYSA-N 3-trimethoxysilylpropane-1-thiol Chemical compound CO[Si](OC)(OC)CCCS UUEWCQRISZBELL-UHFFFAOYSA-N 0.000 description 1
- UPMLOUAZCHDJJD-UHFFFAOYSA-N 4,4'-Diphenylmethane Diisocyanate Chemical compound C1=CC(N=C=O)=CC=C1CC1=CC=C(N=C=O)C=C1 UPMLOUAZCHDJJD-UHFFFAOYSA-N 0.000 description 1
- VPWNQTHUCYMVMZ-UHFFFAOYSA-N 4,4'-sulfonyldiphenol Chemical compound C1=CC(O)=CC=C1S(=O)(=O)C1=CC=C(O)C=C1 VPWNQTHUCYMVMZ-UHFFFAOYSA-N 0.000 description 1
- CPHGOBGXZQKCKI-UHFFFAOYSA-N 4,5-diphenyl-1h-imidazole Chemical compound N1C=NC(C=2C=CC=CC=2)=C1C1=CC=CC=C1 CPHGOBGXZQKCKI-UHFFFAOYSA-N 0.000 description 1
- TYOXIFXYEIILLY-UHFFFAOYSA-N 5-methyl-2-phenyl-1h-imidazole Chemical compound N1C(C)=CN=C1C1=CC=CC=C1 TYOXIFXYEIILLY-UHFFFAOYSA-N 0.000 description 1
- JJUVAPMVTXLLFR-UHFFFAOYSA-N 5-methyl-2-phenyl-4,5-dihydro-1h-imidazole Chemical compound N1C(C)CN=C1C1=CC=CC=C1 JJUVAPMVTXLLFR-UHFFFAOYSA-N 0.000 description 1
- ULKLGIFJWFIQFF-UHFFFAOYSA-N 5K8XI641G3 Chemical compound CCC1=NC=C(C)N1 ULKLGIFJWFIQFF-UHFFFAOYSA-N 0.000 description 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 description 1
- 239000005977 Ethylene Substances 0.000 description 1
- PIICEJLVQHRZGT-UHFFFAOYSA-N Ethylenediamine Chemical compound NCCN PIICEJLVQHRZGT-UHFFFAOYSA-N 0.000 description 1
- 239000005057 Hexamethylene diisocyanate Substances 0.000 description 1
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 1
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 1
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- 229920001665 Poly-4-vinylphenol Polymers 0.000 description 1
- LSNNMFCWUKXFEE-UHFFFAOYSA-N Sulfurous acid Chemical compound OS(O)=O LSNNMFCWUKXFEE-UHFFFAOYSA-N 0.000 description 1
- 239000007983 Tris buffer Substances 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- 125000002723 alicyclic group Chemical group 0.000 description 1
- 125000003545 alkoxy group Chemical group 0.000 description 1
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 1
- 150000001412 amines Chemical group 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 230000008878 coupling Effects 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 238000005859 coupling reaction Methods 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- WHGNXNCOTZPEEK-UHFFFAOYSA-N dimethoxy-methyl-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](C)(OC)CCCOCC1CO1 WHGNXNCOTZPEEK-UHFFFAOYSA-N 0.000 description 1
- PNZDZRMOBIIQTC-UHFFFAOYSA-N ethanamine;hydron;bromide Chemical compound Br.CCN PNZDZRMOBIIQTC-UHFFFAOYSA-N 0.000 description 1
- YVPJCJLMRRTDMQ-UHFFFAOYSA-N ethyl diazoacetate Chemical compound CCOC(=O)C=[N+]=[N-] YVPJCJLMRRTDMQ-UHFFFAOYSA-N 0.000 description 1
- 150000004820 halides Chemical class 0.000 description 1
- RRAMGCGOFNQTLD-UHFFFAOYSA-N hexamethylene diisocyanate Chemical compound O=C=NCCCCCCN=C=O RRAMGCGOFNQTLD-UHFFFAOYSA-N 0.000 description 1
- 239000004615 ingredient Substances 0.000 description 1
- 239000012948 isocyanate Substances 0.000 description 1
- 150000002513 isocyanates Chemical class 0.000 description 1
- ZFSLODLOARCGLH-UHFFFAOYSA-N isocyanuric acid Chemical compound OC1=NC(O)=NC(O)=N1 ZFSLODLOARCGLH-UHFFFAOYSA-N 0.000 description 1
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 239000002932 luster Substances 0.000 description 1
- 230000014759 maintenance of location Effects 0.000 description 1
- 230000000873 masking effect Effects 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 150000007522 mineralic acids Chemical class 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- KBJFYLLAMSZSOG-UHFFFAOYSA-N n-(3-trimethoxysilylpropyl)aniline Chemical compound CO[Si](OC)(OC)CCCNC1=CC=CC=C1 KBJFYLLAMSZSOG-UHFFFAOYSA-N 0.000 description 1
- 239000004745 nonwoven fabric Substances 0.000 description 1
- 150000002903 organophosphorus compounds Chemical class 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- AFEQENGXSMURHA-UHFFFAOYSA-N oxiran-2-ylmethanamine Chemical compound NCC1CO1 AFEQENGXSMURHA-UHFFFAOYSA-N 0.000 description 1
- OJMIONKXNSYLSR-UHFFFAOYSA-N phosphorous acid Chemical compound OP(O)O OJMIONKXNSYLSR-UHFFFAOYSA-N 0.000 description 1
- 230000001737 promoting effect Effects 0.000 description 1
- 150000003242 quaternary ammonium salts Chemical class 0.000 description 1
- 238000007788 roughening Methods 0.000 description 1
- 238000005476 soldering Methods 0.000 description 1
- 150000003512 tertiary amines Chemical class 0.000 description 1
- JXUKBNICSRJFAP-UHFFFAOYSA-N triethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CCO[Si](OCC)(OCC)CCCOCC1CO1 JXUKBNICSRJFAP-UHFFFAOYSA-N 0.000 description 1
- HQYALQRYBUJWDH-UHFFFAOYSA-N trimethoxy(propyl)silane Chemical compound CCC[Si](OC)(OC)OC HQYALQRYBUJWDH-UHFFFAOYSA-N 0.000 description 1
- DIHAURBCYGTGCV-UHFFFAOYSA-N xi-4,5-Dihydro-2,4(5)-dimethyl-1H-imidazole Chemical compound CC1CN=C(C)N1 DIHAURBCYGTGCV-UHFFFAOYSA-N 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/03—Use of materials for the substrate
- H05K1/0313—Organic insulating material
- H05K1/0353—Organic insulating material consisting of two or more materials, e.g. two or more polymers, polymer + filler, + reinforcement
- H05K1/0366—Organic insulating material consisting of two or more materials, e.g. two or more polymers, polymer + filler, + reinforcement reinforced, e.g. by fibres, fabrics
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Reinforced Plastic Materials (AREA)
Description
〔産業上の利用分野〕
本発明は印刷配線板用プリプレグの製造方法に
関するものである。
〔従来の技術〕
印刷配線板の高密度化に伴い、高多層化、スル
ーホールの小径化などが進み、ドリル加工性の良
好な印刷配線板用材料が要求されている。ドリル
加工性のなかでも、スミアの発生は内層回路銅と
スルーホールめつき銅との導通を妨げ著しくスル
ーホール信頼性を損なう。スミアを除去するため
に印刷配線板メーカではへスミア除去処理を行う
が濃硫酸、フツ化水素酸、クロムなどを用いるた
め安全上の問題がある。またこのような処理はス
ルーホール内壁をあらし、スルーホール信頼性を
低下させる原因ともなる。スミアの発生原因は、
ドリル加工時に発生する摩擦熱により軟化した樹
脂が、スルーホール内の内層回路銅箔断面に付着
することによるといわれている。従来使用されて
いる印刷配線板用プリプレグは十分に硬化させた
場合でも硬化融着する温度は低く、250℃程度で
ある。一般にドリル加工時のドリル温度は300℃
程度になるといわれており、従来の印刷配線板用
プリプレグ樹脂硬化物(例えばジシアンジアミド
硬化エポキシ樹脂)では軟化し、内層回路銅箔断
面に付着してスミアとなる。
また印刷配線板は部品を搭載して使用された場
合、100℃以上の温度になることがある。したが
つて気中での長期耐熱性が要求される。従来使用
されている印刷配線板用プリプレグを用いて作製
した積層板を170℃の乾燥器中で長時間処理した
場合、曲げ強さ保持率が50%以下になるまでに要
する時間は約500時間である。この時間をさらに
長くすることによつて、部品を搭載して通電して
使用された場合の信頼性が向上する。
以上のような要求を満足する樹脂系として多官
能フエノール樹脂で硬化させたエポキシ樹脂があ
る。多官能フエノール硬化エポキシ樹脂を印刷配
線板用プリプレグに適用した場合、ドリル加工性
におけるスミアの発生はジシアンジアミド硬化エ
ポキシ樹脂を使用した従来品の1/2以下となりま
た長期耐熱性において、曲げ強さ保財率が50%以
下になるまでの170℃での処理時間は従来品の2
倍以上になる。
しかしながら、多官能フエノール樹脂を硬化剤
としたエポキシ樹脂は銅箔など金属との接着性が
従来品に比べて良好ではない。例えば片面を粗化
した35μm厚の銅箔の引きはがし強さは従来品で
は約2Kg/cmであるのに対して多官能フエノール
硬化エポキシ樹脂を使用した製品では約1〜1.5
Kg/cmである。また金属光沢面に粗化および酸化
処理を施した場合の引きはがし強さも低下する。
例えばこのような処理を行つた銅箔光沢面との接
着性は従来品が約1.5Kg/cmであるのに対して、
多官能フエノール硬化エポキシ樹脂を使用した製
品では約0.5〜1Kg/cmである。さらに、これら
の試験片を塩酸に浸漬した後に引きはがし強さを
測定すると、従来品ではほとんど低下しないが、
多官能フエノール硬化エポキシ樹脂を使用した製
品では値が半減する。
〔発明が解決しようとする問題点〕
本発明は、かゝる状況に鑑みてなされたもので
あつてドリル加工性、長期気中耐熱性の良好な多
官能フエノール硬化エポキシ樹脂を使用した印刷
配線板用プリプレグの、金属との接着性を改良す
ることを目的とするものである。
〔問題点を解決するための手段〕
すなわち本発明の印刷配線板用プリプレグの製
造方法は、
(a) エポキシ樹脂
(b) 多宮能フエノール
(c) 脂肪族アミンの無機酸塩
(d) カツプリング剤および
(e) 硬化促進剤
を必須成分として配合したワニスを基材に含浸
後、乾燥させることを特徴とする。
以下、本発明を詳細に説明する。
(a)のエポキシ樹脂としては、多官能であればど
のようなものでもよく、例えばビスフエノールA
型エポキシ樹脂、ビスフエノールF型エポキシ樹
脂、ビスフエノールS型エポキシ樹脂、フエノー
ルノボラツク型エポキシ樹脂、クレゾールノボラ
ツク型エポキシ樹脂、ビスフエノールAノボラツ
ク型エポキシ樹脂、ビスフエノールFノボラツク
型エポキシ樹脂、脂環式エポキシ樹脂、グリシジ
ルエステル型エポキシ樹脂、グリシジルアミン型
エポキシ樹脂、ビダントイン型エポキシ樹脂、イ
ソシアヌレート型エポキシ樹脂、脂肪族鎖状エポ
キシ樹脂およびそれらのハロゲン化物、水素添加
物などがあり、分子量はどのようなものでもよ
く、また何種類かを併用することもできる。
(b)の多官能フエノール樹脂としては、1分子中
に官能基が2個以上あり、エポキシ樹脂と重合す
ればどのようなものでもよく、例えば、ビスフエ
ノールA、ビスフエノールF、ポリビニルフエノ
ール、またはフエノール、クレゾール、アルキル
フエノール、カテコール、ビスフエノールA、ビ
スフエノールFなどのノボラツク樹脂およびこれ
らのフエノール樹脂のハロゲン化物などがある。
これらのフエノール樹脂は、何種類かを併用する
こともできる。配合量は、エポキシ基に対してフ
エノール性水酸基が0.5〜1.5当量の範囲であるこ
とがドリル加工性の点から好ましい。
(c)の脂肪族アミンの無機塩酸は銅箔引きはがし
強さを向上させるために必要であり、脂肪族アミ
ンの例としてはエチルアミン、メチルアミン、エ
チレンジアミン、その他の脂肪族の一価および多
価アミンである。無機酸の例としては、塩酸、臭
化水素酸などのハロゲン化水素酸、その他、リン
酸、硫酸、亜硫酸などがある。
これら化合物は何種類かを併用することができ
る。配合量はエポキシ樹脂100重量部に対して0.1
〜10重量部であることが好ましい。0.1重量部よ
り少ないと銅箔引きはがし強さに効果がなく、10
重量部よりも多いとドリル加工性が低下する。
(d)のカツプリング剤は、銅箔引きはがし強さを
向上させるために必要なものであり、脂肪族アミ
ンの無機酸塩と併用することにより著しく改良で
きる。シランカツプリング剤、チタネートカツプ
リング剤等が用いられる。シランカツプリング剤
としてはγ−グリシドキシプロピルトリメトキシ
シラン、γ−グリシドキシプロピルトリエトキシ
シラン、γ−グリシドキシプロピルメチルジメト
キシシラン、N−β(アミノエチル)−γ−アミノ
プロピルメトキシシラン、γ−メルカプトプロピ
ルトリメトキシシラン、γ−アミノプロピルトリ
エトキシシラン、γ−ウレイドプロピルトリエト
キシシラン、N−フエニル−γ−アミノプロピル
トリメトキシシラン、N−ビニルベンジル−δ−
アミノプロピルトリエトキシシランなどがあり、
その他、エポキシ基、フエノール性水酸基と反応
する官能基を持ち、加水分解性のアルコキシ基を
同時に持つものであれば何でもよい。チタネート
カツプリング剤としては、イソプロピルトリイソ
ステアロイルチタネート、イソプロピルトリドデ
シルベンゼンスルホニルチタネート、イソプロピ
ルトリス(ジオチクルバイロホスフエート)チタ
ネート、テトラプロピルビス(ジオクチルホスフ
アイト)チタネート、テトラオクチルビス(ジト
リデシルホスフアイト)チタネート、テトラ
(2,2−ジアリルオキシメチル−1−ブチル)
ビス(ジ−トリデシル)ホスフアイトチタネー
ト、ビス(ジオクチルパイロホスフエート)オキ
シアセテートチタネート、ビス(ジオクチルパイ
ロホスフエート)エチレンチタネートなどがあ
り、さらに低分子量のチタネートでもかまわな
い。
これらのカツプリング剤の配合量は、エポキシ
樹脂100重量部に対し、0.1〜10重量部が好まし
く、これより少ないと銅箔引きはがし強さに対す
る効果はなく、これより多いと耐熱性、ドリル加
工性が低下する。
(e)の硬化促進剤としては、イミダゾール化合
物、有機リン化合物、第3級アミン、第4級アン
モニウム塩などが用いられるが、イミノ基をアク
リロニトリル、イソシアネート、メラミンアクリ
レートなどでマスク化されたイミダゾール化合物
を用いると、従来の2倍以上の保存安定性を持つ
プリプレグを得ることができる。
ここで用いられるイミダゾール化合物として
は、イミダゾール、2−エチルイミダゾール、2
−エチル−4−メチルイミダゾール、2−フエニ
ルイミダゾール、2−ウンデシルイミダゾール、
1−ベンジル−2−メチルイミダゾール、2−ヘ
プタデシルイミダゾール、4,5−ジフエニルイ
ミダゾール、2−メチルイミダゾリン、2−フエ
ニルイミゾダリン、2−ウンデシルイミダゾリ
ン、2−ヘプタデシルイミダゾリン、2−イソプ
ロピルイミダゾール、2,4−ジメチルイミダゾ
ール、2−フエニル−4−メチルイミダゾール、
2−エチルイミダゾリン、2−イソプロピルイミ
ダゾリン、2,4−ジメチルイミダゾリン、2−
フエニル−4−メチルイミダゾリンなどがあり、
マスク化剤としては、アクリロニトリル、フエニ
レンジイソシアネート、トリエンジイソシアネー
ト、ナフタレンジイソシアネート、ヘキサメチレ
ンジイソシアネート、メチレンビスフエニルイソ
シアネート、メラミンアクリレートなどがある。
これらの硬化促進剤は何種類かを併用してもよ
く、配合量はエポキシ樹脂100重量部に対し0.01
〜5重量部が好ましい。0.01重量部より少ないと
促進効果が小さく、5重量部より多いと保存安定
性が悪くなる。
また配合したワニスを基材に含浸する際に、し
ばしば溶剤が用いられる。それらの溶剤として
は、アセトン、メチルエチルケトン、トルエン、
キシレン、メチルイソブチルケトン、酢酸エチ
ル、エチレングリコールモノメチルエーテル、
N,N−ジメチルホルムアミド、N,N−ジメチ
ルアセトアミド、メタノール、エタノールなどが
あり、これらは、何種類かを混合して用いてもよ
い。
前記(a)、(b)、(c)、(d)および(e)を配合して得たワ
ニスをガラス布、ガラス不織布または紙、ガラス
以外を基材に含有後、乾燥炉中で80〜200℃の範
囲成分とする布で乾燥させ、印刷配線板用プリプ
レグを得る。プリプレグは、加熱加圧して印刷配
線板または金属張積層板(以下MCLと称する)
を製造することに用いられる。ここでの乾燥と
は、溶剤を使用した場合には溶剤を除去するこ
と、溶剤を使用しない場合には室温で流動性がな
くなるようにすることをいう。
〔実施例〕
以下、本発明の実施例を記載する。
実施例 1
臭素化ビスフエノールA型エポキシ樹脂
(エポキシ当量530) 80重量部
フエノールノボラツク型エポキシ樹脂
(エポキシ当量200) 20重量部
フエノールノボラツク樹脂 30重量部
エチルアミン塩酸塩 2重量部
γ−グリシドキプロピルトリメトキシシラン
2重量部
1−シアノエチル−2−フエニルイミダゾール
0.2重量部
上記化合物をメチルエチルケトンに溶解し、不
揮発分60%のワニスとした。このワニスを0.1mm
厚のガラス布に含浸後、130℃で5分間乾燥して
プリプレグを得た。
実施例 2
実施例1におけるエチルアミン塩酸塩のかわり
にエチレンジアミン2塩酸塩を2重量部配合し
た。
実施例 3
実施例1におけるエチルアミン塩酸塩のかわり
にエチルアミン臭化水素を22重量部配合した。
実施例 4
実施例1におけるγ−グリシドキシプロピルト
リメトキシシランのかわりにγ−メルカプトプロ
ピルメチルジメトキシシランを1重量部配合し
た。
実施例 5
実施例1におけるγ−グリシドキシプロピルト
リメトキシシランのかわりにテトラオクチルビス
(ジトリデシルホスフアイト)チタネートを1重
量部配合した。
比較例 1
実施例1におけるエチルアミン塩酸塩とγ−グ
リシドキシプロピルトリメトキシシランを両方と
も配合しなかつた。
比較例 2
実施例1におけるエチルアミン塩酸塩を配合し
なかつた。
比較例 3
実施例1におけるγ−グリシドキシトリメトキ
シシランを配合しなかつた。
比較例 4
実施例1における1−シアノエチル−2−フエ
ニルイミダゾールのかわりに2−フエニルイミダ
ゾールを配合した。
比較例 5
実施例1におけるフエノールノボラツク樹脂の
かわりにジシアンジアミド4重量部を配合した。
溶剤は比較例1におけるメチルエチルケトンに加
えてN,N−ジメチルホルムアミドを用いた。乾
燥は、130℃、5分間に加えて、170℃、5分間行
つた。
実施例1〜5、比較例1〜5で得たプリプレグ
3枚と35μm厚の銅箔2枚を用いて、170℃、60
分、50Kg/cm2の条件で銅張積層板を作製した。
MCLに内層回路加工を施した後、MCL3枚とプ
リプレグ6枚を用いて6層配線板を作製した。こ
の6層配線板によつてドリル加工性、気中耐熱
性、銅箔引きはがし強さ、はんだ耐熱性を評価し
た。またプリプレグの保存安定性を評価するため
にプリプレグゲルタイムの経時変化を評価した結
果を表に示す。
[Industrial Field of Application] The present invention relates to a method for producing prepreg for printed wiring boards. [Prior Art] As the density of printed wiring boards increases, the number of layers increases, the diameter of through holes becomes smaller, and materials for printed wiring boards with good drillability are required. In terms of drillability, the occurrence of smear impedes the conduction between the inner layer circuit copper and the through-hole plated copper, significantly impairing the through-hole reliability. In order to remove smear, printed wiring board manufacturers perform a hesmear removal process, but it uses concentrated sulfuric acid, hydrofluoric acid, chromium, etc., which poses a safety problem. Further, such treatment roughens the inner wall of the through hole, causing a reduction in the reliability of the through hole. The cause of smear is
This is said to be caused by resin softened by the frictional heat generated during drilling and adhering to the cross section of the inner layer circuit copper foil inside the through hole. Even when the conventionally used prepreg for printed wiring boards is sufficiently cured, the temperature at which it cures and fuses is low, at about 250°C. Generally, the drill temperature during drilling is 300℃.
Conventional cured prepreg resins for printed wiring boards (for example, dicyandiamide cured epoxy resins) soften and adhere to the cross section of the inner layer circuit copper foil, resulting in smear. Furthermore, when printed wiring boards are used with components mounted on them, temperatures can reach temperatures of over 100°C. Therefore, long-term heat resistance in air is required. When a laminate made using conventional prepreg for printed wiring boards is treated in a dryer at 170°C for a long time, it takes about 500 hours for the bending strength retention rate to decrease to 50% or less. It is. By making this time longer, the reliability when used with components mounted and energized is improved. As a resin system that satisfies the above requirements, there is an epoxy resin cured with a polyfunctional phenolic resin. When polyfunctional phenol-cured epoxy resin is applied to prepreg for printed wiring boards, the occurrence of smear during drill workability is reduced to less than half that of conventional products using dicyandiamide-cured epoxy resin, and long-term heat resistance and bending strength are maintained. The processing time at 170°C until the yield rate falls below 50% is 2 times longer than that of conventional products.
It will more than double. However, epoxy resins using polyfunctional phenolic resin as a curing agent have poorer adhesion to metals such as copper foil than conventional products. For example, the peel strength of a 35 μm thick copper foil with one side roughened is about 2 Kg/cm for conventional products, whereas the peel strength for products using polyfunctional phenol-cured epoxy resin is about 1 to 1.5 Kg/cm.
Kg/cm. In addition, when the metallic luster surface is subjected to roughening and oxidation treatment, the peel strength also decreases.
For example, the adhesion to the glossy surface of copper foil that has been treated in this way is approximately 1.5 kg/cm compared to the conventional product.
For products using polyfunctional phenol-cured epoxy resins, it is approximately 0.5 to 1 kg/cm. Furthermore, when we measured the peel strength of these specimens after immersing them in hydrochloric acid, we found that the peel strength of conventional products hardly decreased;
For products using polyfunctional phenol-cured epoxy resins, the value is halved. [Problems to be Solved by the Invention] The present invention has been made in view of the above circumstances, and provides printed wiring using a polyfunctional phenol-cured epoxy resin that has good drill workability and long-term atmospheric heat resistance. The purpose is to improve the adhesion of plate prepreg to metal. [Means for Solving the Problems] That is, the method for producing a prepreg for a printed wiring board of the present invention includes: (a) an epoxy resin (b) a multifunctional phenol (c) an inorganic acid salt of an aliphatic amine (d) coupling The method is characterized in that a base material is impregnated with a varnish containing a curing accelerator and (e) a curing accelerator as essential components, and then dried. The present invention will be explained in detail below. Any polyfunctional epoxy resin may be used as the epoxy resin (a), such as bisphenol A
type epoxy resin, bisphenol F type epoxy resin, bisphenol S type epoxy resin, phenol novolak type epoxy resin, cresol novolak type epoxy resin, bisphenol A novolak type epoxy resin, bisphenol F type novolak type epoxy resin, alicyclic resin There are formula epoxy resins, glycidyl ester type epoxy resins, glycidylamine type epoxy resins, vidantoin type epoxy resins, isocyanurate type epoxy resins, aliphatic chain epoxy resins, and their halides and hydrogenated products. It is also possible to use several types in combination. The polyfunctional phenol resin (b) may be any resin as long as it has two or more functional groups in one molecule and can be polymerized with an epoxy resin, such as bisphenol A, bisphenol F, polyvinylphenol, or Examples include novolak resins such as phenol, cresol, alkylphenol, catechol, bisphenol A, and bisphenol F, and halogenated products of these phenolic resins.
Several types of these phenolic resins can also be used in combination. The blending amount is preferably in the range of 0.5 to 1.5 equivalents of phenolic hydroxyl group to epoxy group from the viewpoint of drill workability. (c) The aliphatic amine inorganic hydrochloric acid is necessary to improve the peel strength of copper foil, and examples of aliphatic amines include ethylamine, methylamine, ethylenediamine, and other aliphatic monovalent and polyvalent It is an amine. Examples of inorganic acids include hydrohalic acids such as hydrochloric acid and hydrobromic acid, as well as phosphoric acid, sulfuric acid, and sulfurous acid. Several types of these compounds can be used in combination. The blending amount is 0.1 per 100 parts by weight of epoxy resin.
The amount is preferably 10 parts by weight. If it is less than 0.1 part by weight, it has no effect on copper foil peeling strength, and 10
If the amount exceeds the weight part, drilling workability will be reduced. The coupling agent (d) is necessary to improve the peel strength of the copper foil, and can be significantly improved by using it in combination with an inorganic acid salt of an aliphatic amine. Silane coupling agents, titanate coupling agents, etc. are used. Silane coupling agents include γ-glycidoxypropyltrimethoxysilane, γ-glycidoxypropyltriethoxysilane, γ-glycidoxypropylmethyldimethoxysilane, and N-β(aminoethyl)-γ-aminopropylmethoxysilane. , γ-mercaptopropyltrimethoxysilane, γ-aminopropyltriethoxysilane, γ-ureidopropyltriethoxysilane, N-phenyl-γ-aminopropyltrimethoxysilane, N-vinylbenzyl-δ-
Aminopropyltriethoxysilane, etc.
In addition, any material may be used as long as it has a functional group that reacts with an epoxy group or a phenolic hydroxyl group, and also has a hydrolyzable alkoxy group. Titanate coupling agents include isopropyl triisostearoyl titanate, isopropyl tridodecylbenzenesulfonyl titanate, isopropyl tris(dioticle birophosphate) titanate, tetrapropyl bis(dioctyl phosphite) titanate, tetraoctyl bis(ditridecyl phosphite) Titanate, tetra(2,2-diallyloxymethyl-1-butyl)
Examples include bis(di-tridecyl) phosphite titanate, bis(dioctyl pyrophosphate) oxyacetate titanate, and bis(dioctyl pyrophosphate) ethylene titanate, and titanates with lower molecular weights may also be used. The blending amount of these coupling agents is preferably 0.1 to 10 parts by weight per 100 parts by weight of the epoxy resin. Less than this has no effect on copper foil peeling strength, and more than this has no effect on heat resistance and drilling workability. decreases. As the curing accelerator (e), imidazole compounds, organic phosphorus compounds, tertiary amines, quaternary ammonium salts, etc. are used, but imidazole compounds whose imino groups are masked with acrylonitrile, isocyanate, melamine acrylate, etc. By using this method, it is possible to obtain a prepreg that has storage stability that is more than twice that of conventional prepregs. The imidazole compounds used here include imidazole, 2-ethylimidazole, 2
-ethyl-4-methylimidazole, 2-phenylimidazole, 2-undecylimidazole,
1-benzyl-2-methylimidazole, 2-heptadecyl imidazole, 4,5-diphenylimidazole, 2-methylimidazoline, 2-phenylimizodalin, 2-undecylimidazoline, 2-heptadecylimidazoline, 2-isopropyl imidazole, 2,4-dimethylimidazole, 2-phenyl-4-methylimidazole,
2-ethylimidazoline, 2-isopropylimidazoline, 2,4-dimethylimidazoline, 2-
phenyl-4-methylimidazoline, etc.
Examples of masking agents include acrylonitrile, phenylene diisocyanate, triene diisocyanate, naphthalene diisocyanate, hexamethylene diisocyanate, methylene bisphenyl isocyanate, and melamine acrylate. Several types of these curing accelerators may be used in combination, and the blending amount is 0.01 parts by weight per 100 parts by weight of epoxy resin.
~5 parts by weight is preferred. If it is less than 0.01 part by weight, the promoting effect will be small, and if it is more than 5 parts by weight, storage stability will be poor. Further, a solvent is often used when impregnating a base material with a blended varnish. These solvents include acetone, methyl ethyl ketone, toluene,
xylene, methyl isobutyl ketone, ethyl acetate, ethylene glycol monomethyl ether,
Examples include N,N-dimethylformamide, N,N-dimethylacetamide, methanol, and ethanol, and several types of these may be used in combination. The varnish obtained by blending the above (a), (b), (c), (d) and (e) is mixed with glass cloth, glass non-woven fabric or paper, or a base material other than glass, and then dried in a drying oven for 80 minutes. Dry with a cloth containing ingredients in the range of ~200°C to obtain prepreg for printed wiring boards. Prepreg is heated and pressed to produce printed wiring boards or metal clad laminates (hereinafter referred to as MCL).
It is used for manufacturing. Drying here means removing the solvent if a solvent is used, or making it lose fluidity at room temperature if no solvent is used. [Examples] Examples of the present invention will be described below. Example 1 Brominated bisphenol A type epoxy resin (epoxy equivalent: 530) 80 parts by weight Phenol novolak type epoxy resin (epoxy equivalent: 200) 20 parts by weight Phenol novolak resin 30 parts by weight Ethylamine hydrochloride 2 parts by weight γ-glycidoxy resin Propyltrimethoxysilane
2 parts by weight 1-cyanoethyl-2-phenylimidazole
0.2 parts by weight The above compound was dissolved in methyl ethyl ketone to prepare a varnish with a nonvolatile content of 60%. 0.1mm of this varnish
After impregnating a thick glass cloth, the mixture was dried at 130°C for 5 minutes to obtain a prepreg. Example 2 In place of ethylamine hydrochloride in Example 1, 2 parts by weight of ethylenediamine dihydrochloride was blended. Example 3 In place of ethylamine hydrochloride in Example 1, 22 parts by weight of ethylamine hydrogen bromide was blended. Example 4 Instead of γ-glycidoxypropyltrimethoxysilane in Example 1, 1 part by weight of γ-mercaptopropylmethyldimethoxysilane was blended. Example 5 In place of γ-glycidoxypropyltrimethoxysilane in Example 1, 1 part by weight of tetraoctyl bis(ditridecylphosphite) titanate was blended. Comparative Example 1 Both ethylamine hydrochloride and γ-glycidoxypropyltrimethoxysilane in Example 1 were not blended. Comparative Example 2 Ethylamine hydrochloride in Example 1 was not blended. Comparative Example 3 γ-Glycidoxytrimethoxysilane in Example 1 was not blended. Comparative Example 4 In place of 1-cyanoethyl-2-phenylimidazole in Example 1, 2-phenylimidazole was blended. Comparative Example 5 In place of the phenol novolac resin in Example 1, 4 parts by weight of dicyandiamide was blended.
In addition to methyl ethyl ketone in Comparative Example 1, N,N-dimethylformamide was used as a solvent. Drying was carried out at 170°C for 5 minutes in addition to 130°C for 5 minutes. Three sheets of prepreg obtained in Examples 1 to 5 and Comparative Examples 1 to 5 and two sheets of 35 μm thick copper foil were heated at 170°C for 60 minutes.
A copper-clad laminate was produced under the conditions of 50 kg/cm 2 and 50 kg/cm 2 .
After processing the inner layer circuit on the MCL, a 6-layer wiring board was fabricated using 3 MCL sheets and 6 prepreg sheets. Drill workability, air heat resistance, copper foil peeling strength, and soldering heat resistance were evaluated using this six-layer wiring board. The table also shows the results of evaluating the change in prepreg gel time over time in order to evaluate the storage stability of the prepreg.
【表】【table】
本発明の印刷配線板用プリプレグは、従来技術
に比べ多層配線板のドリル加工性、銅箔引きはが
し強さ、気中耐熱性、プリプレグの保存安定性が
向上する。
The prepreg for printed wiring boards of the present invention has improved drilling workability for multilayer wiring boards, copper foil peeling strength, in-air heat resistance, and storage stability of the prepreg compared to conventional techniques.
Claims (1)
せることを特徴とする印刷配線板用プリプレグの
製造方法。 2 硬化促進剤がイミノ基をマスクしたイミダゾ
ール化合物である特許請求の範囲第1項記載の印
刷配線板用プリプレグの製造方法。[Scope of Claims] 1. A varnish based on (a) an epoxy resin, (b) a multifunctional phenolic resin, (c) an inorganic acid salt of an aliphatic amine, (d) a coupling agent, and (e) a curing accelerator as essential components. A method for producing prepreg for printed wiring boards, which comprises impregnating the material and then drying it. 2. The method for producing a prepreg for a printed wiring board according to claim 1, wherein the curing accelerator is an imidazole compound with an imino group masked.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61003884A JPS62161838A (en) | 1986-01-10 | 1986-01-10 | Production of prepreg for printed circuit board |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61003884A JPS62161838A (en) | 1986-01-10 | 1986-01-10 | Production of prepreg for printed circuit board |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS62161838A JPS62161838A (en) | 1987-07-17 |
| JPH0317857B2 true JPH0317857B2 (en) | 1991-03-11 |
Family
ID=11569609
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP61003884A Granted JPS62161838A (en) | 1986-01-10 | 1986-01-10 | Production of prepreg for printed circuit board |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS62161838A (en) |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5685956A (en) * | 1979-12-15 | 1981-07-13 | Ricoh Co Ltd | Communication equipment |
| JPS5922475A (en) * | 1982-07-29 | 1984-02-04 | Hitachi Ltd | Remote maintenance system of facsimile device |
-
1986
- 1986-01-10 JP JP61003884A patent/JPS62161838A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS62161838A (en) | 1987-07-17 |
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