JPH03185400A - x-ray source - Google Patents
x-ray sourceInfo
- Publication number
- JPH03185400A JPH03185400A JP32502989A JP32502989A JPH03185400A JP H03185400 A JPH03185400 A JP H03185400A JP 32502989 A JP32502989 A JP 32502989A JP 32502989 A JP32502989 A JP 32502989A JP H03185400 A JPH03185400 A JP H03185400A
- Authority
- JP
- Japan
- Prior art keywords
- ray source
- synchrotron
- shape
- radiation
- present
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000005684 electric field Effects 0.000 claims description 3
- 238000010894 electron beam technology Methods 0.000 claims 1
- 230000005469 synchrotron radiation Effects 0.000 description 6
- 238000000034 method Methods 0.000 description 3
- 230000005855 radiation Effects 0.000 description 3
- 230000000694 effects Effects 0.000 description 2
- 230000004075 alteration Effects 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000003384 imaging method Methods 0.000 description 1
Landscapes
- Particle Accelerators (AREA)
- X-Ray Techniques (AREA)
Abstract
(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.
Description
【発明の詳細な説明】
［産業上の利用分野コ
本発明は、反射結塚糸を用いた走査型ｘ森露光装置にお
けるＸＨ源に関する。DETAILED DESCRIPTION OF THE INVENTION [Industrial Field of Application] The present invention relates to an XH source in a scanning type x-mori exposure apparatus using reflective condensed yarn.
［従来の技術］
従来、シンクロトロン放射光は、円軌道にて目幅する加
速電子の接祿方回に第２図に示す如きほぼ矩形に近い形
の放射光２をべＩＪ リウム窓から放射させるのが通例
であった。[Prior Art] Conventionally, synchrotron synchrotron radiation is produced by emitting synchrotron radiation from a beam window in a nearly rectangular shape as shown in Fig. 2 at the intersection of accelerated electrons that are spaced apart in a circular orbit. It was customary to do so.
［発明が解決しようとする課題］
しかし、上記従来技術によると、透過系Ｘ線マスクを用
いて、グロキシミティー露光する場合には走査露光法に
より用いる事ができるが、Ｘ線反射投影露光装置による
結像液を用いたｘ！！露光では矩形状光源では面収差が
生じ、解像力が低下すると云う課題があった。[Problem to be Solved by the Invention] However, according to the above-mentioned prior art, when performing gloximity exposure using a transmission type X-ray mask, scanning exposure method can be used, but X-ray reflection projection exposure apparatus x! using an imaging solution according to ! During exposure, a rectangular light source has the problem of surface aberration, which reduces resolution.
本発明は、かかる従来技術の課題を解決し、解像力を向
上する為のシンクロトロン放射光の新らしい形状を提供
すると共に、その形状を得る為の新らしい方法をも提供
する事を目的とする。The present invention aims to solve the problems of the prior art and provide a new shape of synchrotron radiation light for improving resolution, as well as a new method for obtaining the shape. .
［課題を解決するための手段］
上記課題を解決する為に、本発明は、Ｘ線源に一シ、シ
ンクロトロン走行電子＃！を磁場又は電場により円弧状
に整形する手段を取り、結果として放射Ｘａ、の形状を
円弧状となす手段を取る。[Means for Solving the Problems] In order to solve the above problems, the present invention uses a synchrotron traveling electron system as an X-ray source. A method is taken to shape the radiation Xa into an arc shape using a magnetic field or an electric field, and as a result, the shape of the radiation Xa is made into an arc shape.
［実施例コ 以下、実施例により本発明を詳述する。[Example code] Hereinafter, the present invention will be explained in detail with reference to Examples.
いま、シンクロトロン内にて円運動をしている電子に対
し、丁度ウィンゲラ−による電子軌道の変更の如く、磁
場又は電場により、わずかに左右に円弧状に振る力を印
加する事により、放射される放射光は、第１図に示す円
弧状の放射光１の如くになる。該円弧状放射光は、反射
投影減光装置に例えば反射マスクを反射させて導くこと
により、面数差の無いパターンが、被電光試料表面に結
像することとなる。Now, by applying a force to the electrons that are moving in a circular motion in a synchrotron in a slight arc to the left or right using a magnetic or electric field, just as Wingerer changes the electron trajectory, the electrons can be radiated. The emitted light is like the arc-shaped emitted light 1 shown in FIG. By guiding the arcuate radiation to a reflection projection attenuator by reflecting it off, for example, a reflection mask, a pattern with no difference in the number of surfaces is imaged on the surface of the sample to be illuminated.
［発明の効果］
本発明により反射投影減光装置ＩＩＬを用いた高解像力
の１８ｍ光が可能となる効果がある。[Effects of the Invention] The present invention has the effect of making it possible to produce 18 m light with high resolution using the reflection projection attenuator IIL.
ｆｇ１図は本発明の一実施例を示すシンクロトロン放射
光の断面形状を示す図であり、第２図は従来技術による
。シンクロトロン放射光の断面形状を示す図である。
１．２・・・・・・放射光
第１
図
第２図Figure fg1 is a diagram showing a cross-sectional shape of synchrotron radiation light showing an embodiment of the present invention, and Figure 2 is based on the prior art. It is a figure showing the cross-sectional shape of synchrotron radiation light. 1.2... Synchrotron radiation Figure 1 Figure 2
Claims (1)
に整形して、放射Ｘ線の形状を円弧状となす事を特徴と
するＸ線源。An X-ray source characterized in that a synchrotron traveling electron beam is shaped into an arc shape by a magnetic field or an electric field, so that the emitted X-rays have an arc shape.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP32502989A JPH03185400A (en) | 1989-12-15 | 1989-12-15 | x-ray source |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP32502989A JPH03185400A (en) | 1989-12-15 | 1989-12-15 | x-ray source |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH03185400A true JPH03185400A (en) | 1991-08-13 |
Family
ID=18172352
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP32502989A Pending JPH03185400A (en) | 1989-12-15 | 1989-12-15 | x-ray source |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH03185400A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0838837A3 (en) * | 1996-10-25 | 2000-03-08 | Canon Kabushiki Kaisha | Electron beam exposure apparatus and method |
-
1989
- 1989-12-15 JP JP32502989A patent/JPH03185400A/en active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0838837A3 (en) * | 1996-10-25 | 2000-03-08 | Canon Kabushiki Kaisha | Electron beam exposure apparatus and method |
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