JPH03211A - Manufacture of epoxy resin forming material - Google Patents
Manufacture of epoxy resin forming materialInfo
- Publication number
- JPH03211A JPH03211A JP1134010A JP13401089A JPH03211A JP H03211 A JPH03211 A JP H03211A JP 1134010 A JP1134010 A JP 1134010A JP 13401089 A JP13401089 A JP 13401089A JP H03211 A JPH03211 A JP H03211A
- Authority
- JP
- Japan
- Prior art keywords
- epoxy resin
- pts
- weight
- parts
- inorganic filler
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W74/00—Encapsulations, e.g. protective coatings
- H10W74/40—Encapsulations, e.g. protective coatings characterised by their materials
- H10W74/47—Encapsulations, e.g. protective coatings characterised by their materials comprising organic materials, e.g. plastics or resins
- H10W74/473—Encapsulations, e.g. protective coatings characterised by their materials comprising organic materials, e.g. plastics or resins containing a filler
Landscapes
- Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)
- Processes Of Treating Macromolecular Substances (AREA)
- Processing And Handling Of Plastics And Other Materials For Molding In General (AREA)
- Epoxy Resins (AREA)
Abstract
Description
【発明の詳細な説明】
(産業上の利用分野〕
この発明は、半導体素子を保護する目的で用いられる半
導体封止に有用なエポキシ樹脂成形材料の製造方法に関
する。DETAILED DESCRIPTION OF THE INVENTION (Field of Industrial Application) The present invention relates to a method for producing an epoxy resin molding material useful for semiconductor encapsulation used for the purpose of protecting semiconductor elements.
近年、半導体分野においては高集積、高機能、高速、高
出力化の要求が年々高まってきている。In recent years, in the semiconductor field, demands for higher integration, higher functionality, higher speed, and higher output have been increasing year by year.
それに伴い半導体装置を封止成形する封止成形材料に対
して、耐湿性はもちろんのこと低応力、高熱伝導性など
の要求がなされている。このために、無Ill賞充填材
をますます高充填させる必要に迫られてきている。しか
しながら、低応力、高熱伝導性のために無機質充填材を
高充填させると成形材料の低粘度を確保することはでき
なかった。したがって、成形材料の高粘度化のために半
導体装室内のワイヤー変形や切断を招き、さらには耐湿
性に有害な成形品としての半導体装置に未充填やボイド
などを生じると言う問題があった。Accordingly, there are demands for encapsulating materials for encapsulating semiconductor devices to have not only moisture resistance but also low stress and high thermal conductivity. For this reason, there is an increasing need to increase the loading of non-Ill award fillers. However, it has not been possible to ensure low viscosity of the molding material when the inorganic filler is highly filled in order to achieve low stress and high thermal conductivity. Therefore, the high viscosity of the molding material leads to wire deformation and breakage within the semiconductor package, and furthermore, there are problems in that the semiconductor device as a molded product is unfilled or voids, which are harmful to moisture resistance.
(発明が解決しようとする課題]
無機質充填材を高充填させながら、なおかつ低粘度で成
形性に優れたエポキシ樹脂成形材料の製造方法を提供す
ることにある。(Problems to be Solved by the Invention) An object of the present invention is to provide a method for producing an epoxy resin molding material that is highly filled with an inorganic filler, has a low viscosity, and has excellent moldability.
(課題を解決するための手段)
本発明者らは、課題を解決するために成形前にあっては
、樹脂の硬化を殆ど進行させずに、無機質充填材と樹脂
を充分に混練して濡らしてやると成形材料として低粘度
化が図れることを見出し、本発明に至った。すなわち、
本発明は、(イ)エポキシ樹脂、
(ロ)フェノールノボラック系硬化剤、(ハ)および、
無機質充填材からなる樹脂組成物を加熱、溶融、混練し
た後、冷却、粉砕した粉粒体に
(ニ)硬化助剤を分散させることを特徴とするエポキシ
樹脂成形材料の製造方法を要旨としている。(Means for Solving the Problems) In order to solve the problems, the present inventors have discovered that, before molding, the inorganic filler and the resin are thoroughly kneaded and wetted without substantially progressing the curing of the resin. It was discovered that the viscosity of the molding material can be lowered by using it as a molding material, and the present invention was developed based on this discovery. That is,
The present invention provides (a) an epoxy resin, (b) a phenol novolak curing agent, (c) and
The gist of this article is a method for producing an epoxy resin molding material, which comprises heating, melting, and kneading a resin composition made of an inorganic filler, and then cooling and pulverizing the powder to disperse (d) a curing aid therein. .
以下に、前記の発明を説明する。まず本発明のエポキシ
樹脂(イ)としては、耐湿性、耐熱性等の性能の良好な
ものとして知られている公知のものを適宜使用すること
ができる。このようなエポキシ樹脂自体としては、例え
ばノボラック型エポキシ樹脂、ビスフェノールA型エポ
キシ樹脂、ビスフェノールF型エポキシ樹脂、脂環式エ
ポキシ樹脂、ハロゲン化エポキシ樹脂などを例示するこ
とができ、10〜20重量部の範囲で用いることができ
る。The invention described above will be explained below. First, as the epoxy resin (a) of the present invention, any known resin known to have good properties such as moisture resistance and heat resistance can be used as appropriate. Examples of such epoxy resins include novolac type epoxy resins, bisphenol A type epoxy resins, bisphenol F type epoxy resins, alicyclic epoxy resins, halogenated epoxy resins, etc., and 10 to 20 parts by weight. It can be used within the range of.
フェノールノボラック系硬化剤(ロ)としては1分子中
に2個以上のフェノール性水酸基を有するフェノールノ
ボランク型樹脂を好ましいものとして例示することがで
き、従来より使用されているフェノールノボラック樹脂
、タレゾールノボラック樹脂、キシレノールノボランク
樹脂などを5〜10重量部の範囲で用いることができる
。Preferred examples of the phenol novolak curing agent (b) include phenol novolak type resins having two or more phenolic hydroxyl groups in one molecule, including conventionally used phenol novolak resins and Talesol. Novolac resin, xylenol novolank resin, etc. can be used in an amount of 5 to 10 parts by weight.
無機質充填材(ハ)としては、通常使用される例えば結
晶シリカ、溶融シリカ、アルミナ、窒化ケイ素、酸化チ
タン、炭酸カルシュラムなどの粉末を単独又は、組合せ
て(イ)および(ロ)成分の合計量100重量部に対し
て400〜1000重量部用いることができる。特には
、高純度の結晶シリカ、溶融シリカ、アルミナ、窒化ケ
イ素が望ましい、また、これら無機質充填材の粒径は、
100μ未満のものが成形金型のゲートを詰まらせない
ので好ましい、なお無機質充填材と樹脂との濡れを良(
するためにこれら無機質充填材を予めカップリング剤、
例えばエポキシシラン、アミノシランなどで処理するこ
ともできる。As the inorganic filler (c), commonly used powders such as crystalline silica, fused silica, alumina, silicon nitride, titanium oxide, calcium carbonate, etc. may be used alone or in combination, and the total amount of components (a) and (b) may be used. 400 to 1000 parts by weight can be used per 100 parts by weight. In particular, high-purity crystalline silica, fused silica, alumina, and silicon nitride are desirable, and the particle size of these inorganic fillers is
A material of less than 100μ is preferable because it does not clog the gate of the molding mold, and it also allows for good wetting of the inorganic filler and the resin.
Coupling agents are added to these inorganic fillers in order to
For example, it can also be treated with epoxysilane, aminosilane, etc.
硬化助剤(ニ)としては、イミダゾール類、3級アミン
などが望ましく、その使用量は(イ)および、(ロ)成
分の合計11100重量部に対して0.05〜5重量部
用いることができる。なお、硬化助剤は後添加するので
固形が好ましく、成形金型のゲート詰まり防止と、均一
分散するためにその粒径は100メツシュ未満の微粒子
であることが好ましい。As the curing aid (d), imidazoles, tertiary amines, etc. are desirable, and the amount used is 0.05 to 5 parts by weight based on the total of 11,100 parts by weight of components (a) and (b). can. Since the curing aid is added later, it is preferably solid, and the particle size is preferably less than 100 mesh in order to prevent clogging of the mold gate and to ensure uniform dispersion.
その他、離型剤として、通常使用される例えば、カルナ
バワックス、ステアリン酸、ステアリン酸の金属塩など
が用いられ、染顔料としてはカーボンブラック、酸化チ
タン、アゾ系の含金属化合物の黒色有機染料などが用い
られ、難燃剤としては二酸化アンチモン、水酸化アルミ
ニウムなどが必要に応じて用いられる。Other commonly used mold release agents include carnauba wax, stearic acid, and metal salts of stearic acid, and dyes and pigments include carbon black, titanium oxide, and black organic dyes of azo metal-containing compounds. is used, and antimony dioxide, aluminum hydroxide, etc. are used as flame retardants as necessary.
以上の成分を配合して成形材料化するに際しては、加熱
、溶融、混練は熱ロール又は、ニーダ−などによりおこ
なうことができ、分散、冷却、粉砕も成形材料の生産に
用いられる通常の装置を使用することができる。これら
の装置を用いて、成分(イ)のエポキシ樹脂、成分(ロ
)のフェノールノボラック系硬化剤、成分(ハ)の無機
質充填材および離型剤、染顔料、難燃剤など、その他、
成分を必要に応じて配合し、混合分散機にかけた粉体を
、熱ロールでシート状にし、冷却機で固くし、粉砕機で
粉粒体とした。この粉粒体に成分(ニ)の硬化助剤を後
添加し、混合分散機にかけて均一分散してエポキシ樹脂
成形材料を製造することができる。When blending the above ingredients to make a molding material, heating, melting, and kneading can be performed using heated rolls or a kneader, and dispersion, cooling, and pulverization can also be performed using ordinary equipment used in the production of molding materials. can be used. Using these devices, component (a) epoxy resin, component (b) phenol novolak curing agent, component (c) inorganic filler and mold release agent, dyes and pigments, flame retardants, etc.
The ingredients were blended as necessary, and the powder that was applied to a mixing and dispersing machine was formed into a sheet using a hot roll, hardened using a cooling machine, and made into powder using a pulverizer. The hardening aid component (d) is added to this powder and granular material afterward, and the mixture is uniformly dispersed using a mixing and dispersing machine to produce an epoxy resin molding material.
実施例1
エポキシ樹脂としてオルソクレゾールノボラックエポキ
シ樹脂(エポキシ当量220、軟化点64°C)を14
重量部、硬化剤としてフェノールノボラック樹脂(○H
当量110、軟化点80℃)を7重量部、無機質充填材
としては、結晶シリカを100重量部、この結晶シリカ
の表面改質としてエポキシシランカップリング剤を0.
5重量部、離型剤としてカルナバワックスを0.4重量
部、顔料としてはカーボンブラックを0.4重量部、こ
れらの成分を均一分散した後、100°Cの熱ロールで
加熱、溶融、混練を25回操り返し充分に行ったものを
冷却、粉砕して粉粒体としたものに硬化助剤として、粒
径1001791未満の2メチルイミダゾールを0.1
重量部加えて、均一分散、混合してエポキシ樹脂成形材
料とした。Example 1 Orthocresol novolak epoxy resin (epoxy equivalent: 220, softening point: 64°C) was used as an epoxy resin at 14
Part by weight, phenol novolac resin (○H) as curing agent
100 parts by weight of crystalline silica was used as an inorganic filler, and 0.0% of an epoxy silane coupling agent was used to modify the surface of the crystalline silica.
5 parts by weight, 0.4 parts by weight of carnauba wax as a mold release agent, and 0.4 parts by weight of carbon black as a pigment.After uniformly dispersing these components, they were heated, melted, and kneaded with a heated roll at 100°C. The process was repeated 25 times, then cooled and crushed to form powder, and as a hardening agent, 0.1% of 2-methylimidazole with a particle size of less than 1001791 was added.
Parts by weight were added, uniformly dispersed, and mixed to obtain an epoxy resin molding material.
実施例2
実施例1の硬化助剤2メチルイミダゾールの配合割合を
0.2重量部とした以外は実施例1と全く同様にしてエ
ポキシ樹脂成形材料とした。Example 2 An epoxy resin molding material was prepared in exactly the same manner as in Example 1, except that the blending ratio of the hardening aid 2-methylimidazole in Example 1 was changed to 0.2 parts by weight.
実施例3
実施例1の硬化助剤2メチルイミダゾールの粒径を10
0メツシュ以上の2メチルイミダゾールとした以外は、
実施例1と全く同様にしてエポキシ樹脂成形材料とした
。Example 3 The particle size of the hardening aid 2 methylimidazole in Example 1 was changed to 10
Except for using 2-methylimidazole with a mesh size of 0 or more,
An epoxy resin molding material was prepared in exactly the same manner as in Example 1.
比較例1
実施例1と同じ成分配合で、硬化助剤の2メチルイミダ
ゾールも他の成分と一緒に最初から均一分散した後、1
00℃の熱ロールで加熱、溶融、混練を6回繰り返し行
ったものを、冷却、粉砕して粉粒体のエポキシ樹脂成形
材料とした。なお、同じ配合品で100°Cの熱ロール
で加熱、溶融、混練を12回操り返し行ったものを、冷
却、粉砕して粉粒体のエポキシ樹脂成形材料としたもの
においては、成形することができないぐらい硬化が進ん
でいた。Comparative Example 1 With the same component composition as in Example 1, the hardening aid 2-methylimidazole was uniformly dispersed from the beginning along with other components, and then 1
The mixture was heated, melted, and kneaded six times using a hot roll at 00°C, then cooled and pulverized to obtain a granular epoxy resin molding material. In addition, if the same compounded product is heated, melted, and kneaded 12 times with a heated roll at 100°C, then cooled and crushed to form a powdered epoxy resin molding material, molding is prohibited. The hardening had progressed to the point where it could not be removed.
以上で得たそれぞれのエポキシ樹脂成形材料を用いて成
形材料の成形性代用特性として、溶融粘度を島津製高化
式フローテスター(ノズルの形状φ1m、厚み2m、荷
重30kg/cd、ボット温度150°C)で、スパイ
ラルフローをEMM rに準じ金型温度170°Cで、
ゲルタイムをJSR型キュラストメーター(金型温度1
70’C)でそれぞれ測定し、これらの値を第1表に示
した。また、実際の成形性として、アルミニウム配線T
EG素子を実装したリードフレームを16DIPにトラ
ンスファー成形で成形した後、ワイヤー変形は軟X線で
φ25μの金線の変形度合いを観察して判定し、ボイド
は16DIP成形品の外観を観察して穴径が0.3皿以
上の穴径のものがあれば×として判定し、未充填も16
0IP成形品の外観を観察して判定し、これらの結果も
第1表に示した。Using each of the epoxy resin molding materials obtained above, the melt viscosity was measured using a Shimadzu Koka type flow tester (nozzle shape φ1 m, thickness 2 m, load 30 kg/cd, bot temperature 150°) as a substitute for the moldability of the molding material. In C), the spiral flow was performed according to EMM r at a mold temperature of 170°C,
Measure the gel time using a JSR type Curelastometer (mold temperature 1).
70'C), and these values are shown in Table 1. In addition, as for actual formability, aluminum wiring T
After molding the lead frame with the EG element mounted on it using 16DIP transfer molding, wire deformation was determined by observing the degree of deformation of the φ25μ gold wire using soft X-rays, and voids were determined by observing the appearance of the 16DIP molded product. If there is a hole with a diameter of 0.3 or more, it will be judged as ×, and if it is not filled, it will be judged as 16.
The appearance of the 0IP molded product was observed and judged, and the results are also shown in Table 1.
比較例1に対して実施例1では、同じ配合で硬化助剤の
添加時期を変えたことにより、溶融粘度を大幅に低下、
スパイラルフローを大幅に大きくすることができ、16
DIPの実際の成形でも良い結果を示している。また、
実施例2は比較例1とゲルタイムが同等にもかかわらず
、硬化助剤の添加時期を変えたことにより、溶融粘度を
大幅に低下、スパイラルフローを大幅に大きくすること
ができ、16DrPの実際の成形でも良い成形性を示し
ている。しかし、実施例3に示したように後添加の硬化
助剤が100メツシュ以上の粒子を含むものになると、
均一分散が損なわれて特性評価値にバラツキを生じたり
、金型のゲート詰まりを生じ成形品に未充填を発生させ
るなど好ましくない。In Example 1, compared to Comparative Example 1, by changing the timing of addition of the curing aid with the same formulation, the melt viscosity was significantly reduced,
Spiral flow can be greatly increased, 16
Good results have also been shown in actual DIP molding. Also,
Although Example 2 had the same gel time as Comparative Example 1, by changing the timing of addition of the curing aid, the melt viscosity was significantly lowered and the spiral flow was significantly increased. It also shows good moldability when molded. However, as shown in Example 3, when the post-added curing aid contains particles of 100 mesh or more,
It is undesirable that uniform dispersion is impaired, resulting in variations in the characteristic evaluation values, or that the gate of the mold is clogged, resulting in unfilled molded products.
上述のように本発明の硬化助剤を後から添加する方決に
よって、無機質充填材を高充填させながら、なおかつ低
粘度で成形性に優れたエポキシ樹脂成形材料の製造を可
能にすることができるのである。As described above, by adding the curing aid of the present invention later, it is possible to manufacture an epoxy resin molding material that is highly filled with inorganic fillers, has low viscosity, and has excellent moldability. It is.
特許出願人 松下電工株式会社Patent applicant Matsushita Electric Works Co., Ltd.
Claims (3)
体に (ニ)硬化助剤を分散させることを特徴と するエポキシ樹脂成形材料の製造方法。(1) After heating, melting, and kneading a resin composition consisting of (a) an epoxy resin, (b) a phenol novolac curing agent, (c), and an inorganic filler, cooling and grinding the resulting powder into powder and granules, ) A method for producing an epoxy resin molding material, which comprises dispersing a curing aid.
されている固形の粉末であることを特徴とする請求項1
記載のエポキシ樹脂成形材料の製造方法。(2) Claim 1, wherein the curing aid is a solid powder composed of particles of less than 100 mesh.
A method for manufacturing the epoxy resin molding material described.
部、(ロ)成分のフェノールノボラック系硬化剤が5〜
10重量部、(イ)および(ロ)成分の合計量100重
量部に対して(ハ)成分の無機質充填材が400〜10
00重量部、そして同じく(ニ)成分の硬化助剤が0.
05〜5重量部の割合で配合してなる請求項1又は、2
記載のエポキシ樹脂成形材料の製造方法。(3) 10 to 20 parts by weight of the epoxy resin as the component (a) and 5 to 20 parts by weight of the phenol novolak curing agent as the component (b).
10 parts by weight, the inorganic filler of component (c) is 400 to 10 parts by weight per 100 parts by weight of the total amount of components (a) and (b).
00 parts by weight, and also 0.00 parts by weight of the curing aid, component (2).
Claim 1 or 2, wherein the composition is blended in a proportion of 0.05 to 5 parts by weight.
A method for manufacturing the epoxy resin molding material described.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1134010A JPH0716946B2 (en) | 1989-05-26 | 1989-05-26 | Method for producing epoxy resin molding material |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1134010A JPH0716946B2 (en) | 1989-05-26 | 1989-05-26 | Method for producing epoxy resin molding material |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH03211A true JPH03211A (en) | 1991-01-07 |
| JPH0716946B2 JPH0716946B2 (en) | 1995-03-01 |
Family
ID=15118271
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1134010A Expired - Lifetime JPH0716946B2 (en) | 1989-05-26 | 1989-05-26 | Method for producing epoxy resin molding material |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0716946B2 (en) |
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH11309713A (en) * | 1998-02-16 | 1999-11-09 | Sumitomo Bakelite Co Ltd | Equipment for milling resin compositions |
| WO2012017571A1 (en) * | 2010-08-05 | 2012-02-09 | 住友ベークライト株式会社 | Functional particle, group of functional particles, filler, resin composition for electronic part, electronic part, and semiconductor device |
| WO2012029762A1 (en) * | 2010-09-02 | 2012-03-08 | 住友ベークライト株式会社 | Resin molded product and process for producing same, resin composition and process for producing same, and electronic component device |
| JP2012180485A (en) * | 2011-03-02 | 2012-09-20 | Sumitomo Bakelite Co Ltd | Semiconductor sealing resin composition, semiconductor device and production method therefor |
| JP2013001893A (en) * | 2011-06-21 | 2013-01-07 | Sumitomo Bakelite Co Ltd | Production method of resin raw powder, resin raw powder, resin molded article and electronic component device |
| WO2022149594A1 (en) * | 2021-01-08 | 2022-07-14 | 昭和電工マテリアルズ株式会社 | Method for producing thermosetting resin composition, thermosetting resin composition, and electronic component device |
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| JPS52135673A (en) * | 1976-05-10 | 1977-11-12 | Hitachi Ltd | Resin composition for semiconductor sealing |
| JPS59129231A (en) * | 1983-01-12 | 1984-07-25 | Hitachi Chem Co Ltd | Production of epoxy resin molding material |
| JPS60257548A (en) * | 1984-06-04 | 1985-12-19 | Hitachi Chem Co Ltd | Manufacture of molding material for sealing |
| JPS6227111A (en) * | 1985-07-29 | 1987-02-05 | 渡辺 邦夫 | Method of molding concrete product |
| JPS6325015A (en) * | 1986-05-26 | 1988-02-02 | パウル・トロエスタ・マシ−ネンファブリック | Extrusion molding machine |
| JPS63251420A (en) * | 1987-04-07 | 1988-10-18 | Shin Etsu Chem Co Ltd | epoxy resin composition |
-
1989
- 1989-05-26 JP JP1134010A patent/JPH0716946B2/en not_active Expired - Lifetime
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
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| JPS52135673A (en) * | 1976-05-10 | 1977-11-12 | Hitachi Ltd | Resin composition for semiconductor sealing |
| JPS59129231A (en) * | 1983-01-12 | 1984-07-25 | Hitachi Chem Co Ltd | Production of epoxy resin molding material |
| JPS60257548A (en) * | 1984-06-04 | 1985-12-19 | Hitachi Chem Co Ltd | Manufacture of molding material for sealing |
| JPS6227111A (en) * | 1985-07-29 | 1987-02-05 | 渡辺 邦夫 | Method of molding concrete product |
| JPS6325015A (en) * | 1986-05-26 | 1988-02-02 | パウル・トロエスタ・マシ−ネンファブリック | Extrusion molding machine |
| JPS63251420A (en) * | 1987-04-07 | 1988-10-18 | Shin Etsu Chem Co Ltd | epoxy resin composition |
Cited By (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH11309713A (en) * | 1998-02-16 | 1999-11-09 | Sumitomo Bakelite Co Ltd | Equipment for milling resin compositions |
| JP2012052087A (en) * | 2010-08-05 | 2012-03-15 | Sumitomo Bakelite Co Ltd | Functional particle group, filler, resin composition for electronic part, electronic part, and semiconductor device |
| JP2012052089A (en) * | 2010-08-05 | 2012-03-15 | Sumitomo Bakelite Co Ltd | Functional particle, filler, resin composition for electronic part, electronic part, and semiconductor device |
| JP2012052090A (en) * | 2010-08-05 | 2012-03-15 | Sumitomo Bakelite Co Ltd | Functional particle and its manufacturing method, filler, resin composition for electronic component, electronic component, and semiconductor device |
| JP2012052088A (en) * | 2010-08-05 | 2012-03-15 | Sumitomo Bakelite Co Ltd | Composition and method for producing the same, filler, resin composition for electronic part, electronic part, and semiconductor device |
| WO2012017571A1 (en) * | 2010-08-05 | 2012-02-09 | 住友ベークライト株式会社 | Functional particle, group of functional particles, filler, resin composition for electronic part, electronic part, and semiconductor device |
| JPWO2012017571A1 (en) * | 2010-08-05 | 2013-09-19 | 住友ベークライト株式会社 | Functional particle, functional particle group, filler, resin composition for electronic component, electronic component and semiconductor device |
| WO2012029762A1 (en) * | 2010-09-02 | 2012-03-08 | 住友ベークライト株式会社 | Resin molded product and process for producing same, resin composition and process for producing same, and electronic component device |
| JP2012072379A (en) * | 2010-09-02 | 2012-04-12 | Sumitomo Bakelite Co Ltd | Resin molded product and process for producing the same, resin composition and process for producing the same, and electronic component device |
| CN103228709A (en) * | 2010-09-02 | 2013-07-31 | 住友电木株式会社 | Resin molded product and process for producing same, resin composition and process for producing same, and electronic component device |
| US8957532B2 (en) | 2010-09-02 | 2015-02-17 | Sumitomo Bakelite Company Limited | Resin compact, method for producing resin compact, resin composition, method for producing resin composition and electronic component device |
| JP2012180485A (en) * | 2011-03-02 | 2012-09-20 | Sumitomo Bakelite Co Ltd | Semiconductor sealing resin composition, semiconductor device and production method therefor |
| JP2013001893A (en) * | 2011-06-21 | 2013-01-07 | Sumitomo Bakelite Co Ltd | Production method of resin raw powder, resin raw powder, resin molded article and electronic component device |
| WO2022149594A1 (en) * | 2021-01-08 | 2022-07-14 | 昭和電工マテリアルズ株式会社 | Method for producing thermosetting resin composition, thermosetting resin composition, and electronic component device |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0716946B2 (en) | 1995-03-01 |
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