JPH03212811A - Jig for dry etching of magnetic head - Google Patents

Jig for dry etching of magnetic head

Info

Publication number
JPH03212811A
JPH03212811A JP616490A JP616490A JPH03212811A JP H03212811 A JPH03212811 A JP H03212811A JP 616490 A JP616490 A JP 616490A JP 616490 A JP616490 A JP 616490A JP H03212811 A JPH03212811 A JP H03212811A
Authority
JP
Japan
Prior art keywords
holding jig
workpiece
jig
work pieces
protective film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP616490A
Other languages
Japanese (ja)
Other versions
JP2834249B2 (en
Inventor
Kiyoshi Akamatsu
潔 赤松
Yousuke Sono
薗 容介
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP616490A priority Critical patent/JP2834249B2/en
Publication of JPH03212811A publication Critical patent/JPH03212811A/en
Application granted granted Critical
Publication of JP2834249B2 publication Critical patent/JP2834249B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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  • ing And Chemical Polishing (AREA)
  • Adjustment Of The Magnetic Head Position Track Following On Tapes (AREA)

Abstract

PURPOSE:To form protective films having a uniform film thickness on work pieces and jig surface by inserting the work pieces into the groove shape parts of the holding jig and regulating the clearances and steps between the work pieces and the holding jig. CONSTITUTION:The groove shapes are formed in the holding jig 1 and the clearances (b) and steps (a) of the work pieces 2 and the upper surface of the holding jig 1 are regulated. An org. resist or silicone resin is injected into the spaces between the walls of the work pieces 2 and the holding jig 1 and is impregnated therein. Namely, the relations between the clearances and the steps between the holding jig 1 and the work pieces 2 and the fluctuation in the thickness of the protective films are regulated within the prescribed range. The protective film is uniformly formed atop the work pieces and the holding jig in this way and the protective film is formed on the side faces of the work pieces.

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明は、薄膜磁気ヘッドのドライエツチングプロセス
におけるヘッドブロック加工用治具に関する。
DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a jig for machining a head block in a dry etching process of a thin film magnetic head.

〔従来の技術〕[Conventional technology]

従来の薄膜磁気ヘッドの加工方法は、特開昭60136
025号広報に記載のように、ヘッドスライダ端面のエ
ツチング防止用の保護膜を形成したことを特徴としてい
る。
The conventional processing method for thin film magnetic heads is disclosed in Japanese Patent Application Laid-Open No. 60136.
As described in Publication No. 025, it is characterized in that a protective film is formed on the end face of the head slider to prevent etching.

〔発明が解決しようとする課題〕[Problem to be solved by the invention]

上記従来技術は、ヘッドスライダ端面の保護膜形成を述
べているが、ヘッドスライダとへラドスライダ、あるい
は、ヘッドスライダとその保持治具とのすき間の保護膜
形成、さらに、治具面上の保護膜の形成の点について考
慮がされておらず、ヘッドスライダ側面、及び、治具面
がエツチングされる問題があった。
The above conventional technology describes the formation of a protective film on the end face of the head slider, but it is also possible to form a protective film in the gap between the head slider and the slider, or between the head slider and its holding jig. No consideration was given to the formation of the head slider and the jig surface was etched.

本発明の目的はへラドスライダ側面、及び、治具面のエ
ツチングを防止すること、さらに、ヘッドスライダ及び
治具面に均一な膜厚の保護膜を形成することにあり、さ
らに、均一な保護膜形成によって、ヘッドスライダのエ
ツチング寸法精度を向上することにより、浮上性の優れ
た磁気ヘッド及びに磁気ディスク装置を提供することに
ある。
The purpose of the present invention is to prevent etching of the head slider side surface and jig surface, and to form a protective film of uniform thickness on the head slider and jig surface. An object of the present invention is to provide a magnetic head and a magnetic disk device with excellent flying properties by improving the etching dimensional accuracy of a head slider.

〔課題を解決するための手段〕[Means to solve the problem]

上記目的を達成するために、被加工物の保持治具に溝形
状を形成し、被加工物と保持治具上面とのすき間、およ
び、段差を規定したものである。
In order to achieve the above object, a groove shape is formed in a holding jig for a workpiece, and a gap and a step between the workpiece and the upper surface of the holding jig are defined.

また、被加工物と保持治具との壁間に、有機系レジスト
、あるいは、シリコン系樹脂を注入し、含浸させること
にしたものである。
In addition, an organic resist or a silicone resin is injected and impregnated between the walls of the workpiece and the holding jig.

さらに、以上の被加工物と保持治具を連続して均一な耐
エツチング保護膜を形成したものである1〔作用〕 被加工物をその保持治具の溝形成状部に挿入し、被加工
物と保持治具とのすき間と段差を規定することにより、
耐エツチング保護膜は、被加工物と保持治具間で切断す
ることなく連続して膜の形成ができる。
Furthermore, a uniform etching-resistant protective film is formed by continuously connecting the workpiece and the holding jig as described above. By specifying the gap and level difference between the object and the holding jig,
The etching-resistant protective film can be formed continuously without cutting between the workpiece and the holding jig.

また、被加工間と保持治具とのすき間に、有機系レジス
ト、あるいは、シリコン系樹脂を注入し、含浸させるこ
とによって、被加工物の側面に保護膜を形成できるので
、被加工物の側面の素子回路のエツチングを防ぐことが
できる。
In addition, by injecting and impregnating organic resist or silicone resin into the gap between the workpiece and the holding jig, a protective film can be formed on the side surface of the workpiece. Etching of the element circuit can be prevented.

さらに、被加工物と保持治具上に有機系レジストを均一
に塗布することによって、被加工物のエツチングの寸法
精度を向上することができ、さらに、保持治具上にも保
護膜を形成しているので、保持治具のエツチングを防止
することによって、保持治具の形状寸法を維持すること
ができ、くり返し使用できる効果が生じる。
Furthermore, by uniformly coating the organic resist on the workpiece and the holding jig, the dimensional accuracy of etching the workpiece can be improved, and a protective film can also be formed on the holding jig. Therefore, by preventing etching of the holding jig, the shape and dimensions of the holding jig can be maintained, resulting in the effect that it can be used repeatedly.

〔実施例〕〔Example〕

以下、本発明の一実施例を第1図ないし第5図により説
明する。第1図において、保持治具1の溝形状部分に被
加工物2を挿入している。被加工物2及び保持治具1の
上面に、有機系保護膜を塗布した場合、保持治具1と被
加工物2とのすき間、および、段差と保護膜の膜厚ばら
つきの関係を第2図と第3図に示す。保護膜厚の均一化
のためには、たとえば、膜厚のばらつきを10%以内と
するには、被加工物2と保持治具1とのすき間を250
μm以内、段差を30μm以内に規定する必要があり、
この規定は保護膜の均一化に効果がある。
An embodiment of the present invention will be described below with reference to FIGS. 1 to 5. In FIG. 1, a workpiece 2 is inserted into a groove-shaped portion of a holding jig 1. When an organic protective film is applied to the upper surfaces of the workpiece 2 and the holding jig 1, the relationship between the gap between the holding jig 1 and the workpiece 2, and the difference in level and the film thickness variation of the protective film is determined by the second method. As shown in Fig. and Fig. 3. In order to make the protective film thickness uniform, for example, in order to keep the variation in film thickness within 10%, the gap between the workpiece 2 and the holding jig 1 should be set to 250 mm.
It is necessary to specify the level difference within 30 μm.
This regulation is effective in making the protective film uniform.

次に、第4図により本実施例を説明する。被加工物2は
、保護治具1の溝部分に挿入している。
Next, this embodiment will be explained with reference to FIG. The workpiece 2 is inserted into the groove portion of the protection jig 1.

保護治具1と被加工物2とのすき間に、有機系レジスト
あるいはシリコン系樹脂3を注入充填しである。本実施
例によれば、充填した有機系レジストあるいはシリコン
系樹脂3が被加工物2の側面を保護しているので、被加
工物2の側面をエツチングすることを防ぐことができる
An organic resist or silicone resin 3 is injected into the gap between the protective jig 1 and the workpiece 2. According to this embodiment, since the filled organic resist or silicon resin 3 protects the side surfaces of the workpiece 2, it is possible to prevent the side surfaces of the workpiece 2 from being etched.

なお、第5図は、被加工物2と保持治具1とのすき間、
および、段差を規定し、そのすき間に保護膜を注入充填
し、さらに、被加工物2と保持治具lの上面に、有機系
レジストを均一に塗布している状態を示している。
In addition, FIG. 5 shows the gap between the workpiece 2 and the holding jig 1,
A step is defined, a protective film is injected and filled into the gap, and an organic resist is evenly applied to the upper surfaces of the workpiece 2 and the holding jig 1.

さらに、他の実施例について、第6図、第7図により説
明する。厚さの異なる被加工物2を保持治具1に挿入す
ると、段差が大きくなる。保持治具lには、溝部深さ設
定治具5を内蔵している。
Further, other embodiments will be explained with reference to FIGS. 6 and 7. When workpieces 2 of different thicknesses are inserted into the holding jig 1, the level difference becomes large. The holding jig l has a groove depth setting jig 5 built therein.

この深さ設定治具5を上、下に移動させることにより、
被加工物2と保持治具1との段差を規定値30μm以内
とすることができる。この上下位置の調整により、被加
工物2と保持治具1の上面の保護膜の膜厚を均一化する
ことができる。
By moving this depth setting jig 5 up and down,
The height difference between the workpiece 2 and the holding jig 1 can be within the specified value of 30 μm. By adjusting the vertical position, the thickness of the protective film on the upper surfaces of the workpiece 2 and the holding jig 1 can be made uniform.

さらに、他の実施例について、第8図により説明する。Furthermore, another embodiment will be explained with reference to FIG.

保持治具1の溝部分の巾に比べて、小さい被加工物2を
挿入している場合、有機系レジスト、あるいは、シリコ
ン系樹脂によって形成しであるシート6、及び、7を、
被加工物2の厚みに応じて溝部分に挿入する。シート6
及びシート7により、被加工物2の厚みばらつきが生じ
ても、すき間を2501t m以内と規定でき、所要の
保護膜厚の均一化を図ることができる。
When inserting a workpiece 2 that is smaller than the width of the groove of the holding jig 1, the sheets 6 and 7 made of organic resist or silicone resin are inserted.
It is inserted into the groove portion according to the thickness of the workpiece 2. sheet 6
Even if the thickness of the workpiece 2 varies, the gap can be defined to be within 2501 tm, and the required thickness of the protective film can be made uniform.

さらに、他の実施例の一つを第9図により説明する。保
持治具1の溝部分の壁面に、多孔質部8と、保持治具に
連通する貫通孔9がある0本実施例によれば、被加工物
2と保持治具1とのすき間に有機系レジスト、あるいは
、シリコン系樹脂を加熱乾燥する時、溶液に含有する溶
剤が気化する時、多孔質部8及び貫通孔9より、保持治
具1の外周ににがすことができるので、溶剤が被加工物
2の上面方向に抜ける量が低減できる。従って、溶剤の
気化による、被加工物2の上面に気化痕(あぶく)の発
生を低減できるので、上面の保護膜の膜厚の均一化に効
果がある。
Furthermore, one of the other embodiments will be explained with reference to FIG. The wall surface of the groove portion of the holding jig 1 has a porous portion 8 and a through hole 9 that communicates with the holding jig. When drying the resist or silicone resin by heating, when the solvent contained in the solution evaporates, it can be removed from the porous portion 8 and the through hole 9 to the outer periphery of the holding jig 1. It is possible to reduce the amount of particles that escape in the direction of the upper surface of the workpiece 2. Therefore, it is possible to reduce the occurrence of vaporization marks (foam) on the upper surface of the workpiece 2 due to the vaporization of the solvent, which is effective in making the thickness of the protective film on the upper surface uniform.

し発明の効果〕 本発明によれば、被加工物、及び、保持治具とのすき間
及び段差を規定し、そのすき間に保護膜を充填し、被加
工物及び保持治具の上面に均一に保護膜を形成でき、し
かも、被加工物の側面に保護膜を形成することができる
。以上の膜形成により、被加工物の側面のエツチングを
防止でき、しかも、被加工物の保護膜を均一化できるの
で、被加工物のエツチングの寸法精度を向上することが
できる。
[Effects of the Invention] According to the present invention, the gap and step between the workpiece and the holding jig are defined, the gap is filled with a protective film, and the upper surfaces of the workpiece and the holding jig are uniformly coated. A protective film can be formed, and moreover, a protective film can be formed on the side surface of the workpiece. By forming the film as described above, etching of the side surface of the workpiece can be prevented, and the protective film of the workpiece can be made uniform, so that the dimensional accuracy of the etching of the workpiece can be improved.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は本発明の一実施例の被加工物の保持状態を示す
断面図、第2図及び第3図は、被加工物の保持条件と保
護膜のばらつきの関係の示す特性図、第4図は被加工物
と保持治具とのすき間への保護膜の充填状態を示す断面
図、第5図は被加工物と保持治具上面に保護膜を形成し
た状態を示す□、□6□51.24よ、ゆ。□つ1−す
被加工物と保持治具との関係を示す断面図である。 l・・・・・・・・・保持治具 2・・・・・・・・・被加工物 3・・・・・・・・・有機系レジストあるいはシリコン
系樹脂 4・・・・・・・・・有機系レジスト イ1図 罰2図 寸5間 乱 (pm) 股L Cμmン 凭4図 ¥J5図 デ○図
FIG. 1 is a cross-sectional view showing the holding state of a workpiece according to an embodiment of the present invention, and FIGS. 2 and 3 are characteristic diagrams showing the relationship between the holding conditions of the workpiece and variations in the protective film. Figure 4 is a cross-sectional view showing how the protective film is filled into the gap between the workpiece and the holding jig, and Figure 5 is a cross-sectional view showing how the protective film is formed on the upper surfaces of the workpiece and the holding jig □, □6 □51.24, Yu. □It is a sectional view showing the relationship between the workpiece and the holding jig. l...Holding jig 2...Workpiece 3...Organic resist or silicone resin 4...・・・Organic resist toy 1 figure penalty 2 figures size 5 disturbance (pm) Crotch L Cμm 4 figure ¥ J5 figure de ○ figure

Claims (4)

【特許請求の範囲】[Claims] 1. 被加工物の保持治具において、 前記被加工物を治具溝形状部分に挿入して保持する時、
前記被加工物と前記保持治具とのすき間および段差を規
定し、前記被加工物と前記保持治具とのすき間に有機系
レジスト、あるいは、シリコン系樹脂等を注入して充填
させ、前記被加工物および前記保持治具上に前記有期系
レジストを均一に塗布するように構成したことを特徴と
する磁気ヘッドのドライエッチング加工用治具。
1. In the workpiece holding jig, when the workpiece is inserted into the jig groove-shaped portion and held,
A gap and a step difference between the workpiece and the holding jig are defined, and an organic resist, silicone resin, etc. is injected and filled into the gap between the workpiece and the holding jig, and the gap between the workpiece and the holding jig is filled. A jig for dry etching a magnetic head, characterized in that the fixed-term resist is uniformly applied on the workpiece and the holding jig.
2. 請求項1において、前期被加工物と前記保持治具
との段差を調整する機能を付加した磁気ヘッドのドライ
エッチング加工用治具。
2. 2. The jig for dry etching a magnetic head according to claim 1, further comprising a function of adjusting a step difference between the workpiece and the holding jig.
3. 請求項1において、前記被加工物と前記保持治具
とのすき間に、前記有機系レジスト、あるいは前記シリ
コン系樹脂等で形成したシートを挿入させた磁気ヘッド
のドライエッチング加工用治具。
3. 2. A jig for dry etching a magnetic head according to claim 1, wherein a sheet made of the organic resist or the silicon resin is inserted into a gap between the workpiece and the holding jig.
4. 請求項1において、前記保持治具の溝部分の壁面
に、前記保持治具の外周面に連通する貫通孔を設けてな
る磁気ヘッドのドライエッチング加工用治具。
4. 2. The jig for dry etching a magnetic head according to claim 1, wherein a through hole communicating with an outer circumferential surface of the holding jig is provided in a wall surface of a groove portion of the holding jig.
JP616490A 1990-01-17 1990-01-17 Manufacturing method of magnetic head Expired - Lifetime JP2834249B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP616490A JP2834249B2 (en) 1990-01-17 1990-01-17 Manufacturing method of magnetic head

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP616490A JP2834249B2 (en) 1990-01-17 1990-01-17 Manufacturing method of magnetic head

Publications (2)

Publication Number Publication Date
JPH03212811A true JPH03212811A (en) 1991-09-18
JP2834249B2 JP2834249B2 (en) 1998-12-09

Family

ID=11630892

Family Applications (1)

Application Number Title Priority Date Filing Date
JP616490A Expired - Lifetime JP2834249B2 (en) 1990-01-17 1990-01-17 Manufacturing method of magnetic head

Country Status (1)

Country Link
JP (1) JP2834249B2 (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5824361A (en) * 1994-08-05 1998-10-20 Tdk Corporation Method forming a uniform photoresist film using gas flow
US5874365A (en) * 1993-11-04 1999-02-23 Nippondenso Co., Ltd. Semiconductor wafer etching method
US6094805A (en) * 1995-12-28 2000-08-01 Tdk Corporation Method for manufacturing magnetic head

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5874365A (en) * 1993-11-04 1999-02-23 Nippondenso Co., Ltd. Semiconductor wafer etching method
US6251542B1 (en) 1993-11-04 2001-06-26 Nippondenso Co., Ltd. Semiconductor wafer etching method
US5824361A (en) * 1994-08-05 1998-10-20 Tdk Corporation Method forming a uniform photoresist film using gas flow
US6037007A (en) * 1994-08-05 2000-03-14 Tdk Corporation Method of forming a uniform photoresist film using gas flow
US6094805A (en) * 1995-12-28 2000-08-01 Tdk Corporation Method for manufacturing magnetic head

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Publication number Publication date
JP2834249B2 (en) 1998-12-09

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