JPH03213861A - Development processing method for original plate for waterless planographic printing plate - Google Patents
Development processing method for original plate for waterless planographic printing plateInfo
- Publication number
- JPH03213861A JPH03213861A JP904190A JP904190A JPH03213861A JP H03213861 A JPH03213861 A JP H03213861A JP 904190 A JP904190 A JP 904190A JP 904190 A JP904190 A JP 904190A JP H03213861 A JPH03213861 A JP H03213861A
- Authority
- JP
- Japan
- Prior art keywords
- silicone rubber
- water
- rubber layer
- printing plate
- diazo
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000007639 printing Methods 0.000 title claims abstract description 27
- 238000003672 processing method Methods 0.000 title claims 2
- 229920002379 silicone rubber Polymers 0.000 claims abstract description 46
- 239000004945 silicone rubber Substances 0.000 claims abstract description 45
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 27
- 238000000034 method Methods 0.000 claims abstract description 10
- 239000002243 precursor Substances 0.000 claims description 17
- 239000010410 layer Substances 0.000 description 50
- -1 ester salts Chemical class 0.000 description 35
- 229920005989 resin Polymers 0.000 description 29
- 239000011347 resin Substances 0.000 description 29
- 125000000664 diazo group Chemical group [N-]=[N+]=[*] 0.000 description 16
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 14
- 239000002736 nonionic surfactant Substances 0.000 description 12
- 125000000217 alkyl group Chemical group 0.000 description 9
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 8
- 229920003171 Poly (ethylene oxide) Polymers 0.000 description 8
- 229910052782 aluminium Inorganic materials 0.000 description 8
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 8
- 239000000203 mixture Substances 0.000 description 8
- 150000001875 compounds Chemical class 0.000 description 7
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 7
- 229920000642 polymer Polymers 0.000 description 7
- 229920001296 polysiloxane Polymers 0.000 description 7
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 6
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 6
- 239000002253 acid Substances 0.000 description 6
- 239000007864 aqueous solution Substances 0.000 description 6
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 6
- 239000000975 dye Substances 0.000 description 6
- RTZKZFJDLAIYFH-UHFFFAOYSA-N ether Substances CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 6
- 239000003960 organic solvent Substances 0.000 description 6
- 239000004094 surface-active agent Substances 0.000 description 6
- 239000006087 Silane Coupling Agent Substances 0.000 description 5
- 239000003945 anionic surfactant Substances 0.000 description 5
- 238000006243 chemical reaction Methods 0.000 description 5
- 229910052751 metal Inorganic materials 0.000 description 5
- 239000002184 metal Substances 0.000 description 5
- 239000000178 monomer Substances 0.000 description 5
- WOBHKFSMXKNTIM-UHFFFAOYSA-N Hydroxyethyl methacrylate Chemical compound CC(=C)C(=O)OCCO WOBHKFSMXKNTIM-UHFFFAOYSA-N 0.000 description 4
- 125000003118 aryl group Chemical group 0.000 description 4
- 239000011230 binding agent Substances 0.000 description 4
- 229920001577 copolymer Polymers 0.000 description 4
- 239000003822 epoxy resin Substances 0.000 description 4
- 229920003986 novolac Polymers 0.000 description 4
- 239000000123 paper Substances 0.000 description 4
- 229920000647 polyepoxide Polymers 0.000 description 4
- 229920005749 polyurethane resin Polymers 0.000 description 4
- 239000002244 precipitate Substances 0.000 description 4
- 159000000000 sodium salts Chemical class 0.000 description 4
- 125000001424 substituent group Chemical group 0.000 description 4
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 3
- 239000002202 Polyethylene glycol Substances 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 description 3
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 3
- 239000000654 additive Substances 0.000 description 3
- 125000003545 alkoxy group Chemical group 0.000 description 3
- 229920005601 base polymer Polymers 0.000 description 3
- ZTQSAGDEMFDKMZ-UHFFFAOYSA-N butyric aldehyde Natural products CCCC=O ZTQSAGDEMFDKMZ-UHFFFAOYSA-N 0.000 description 3
- 239000003795 chemical substances by application Substances 0.000 description 3
- 238000004132 cross linking Methods 0.000 description 3
- 239000006185 dispersion Substances 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- BXWNKGSJHAJOGX-UHFFFAOYSA-N hexadecan-1-ol Chemical compound CCCCCCCCCCCCCCCCO BXWNKGSJHAJOGX-UHFFFAOYSA-N 0.000 description 3
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 3
- 239000007788 liquid Substances 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 3
- 239000000049 pigment Substances 0.000 description 3
- 229920002037 poly(vinyl butyral) polymer Polymers 0.000 description 3
- 229920006122 polyamide resin Polymers 0.000 description 3
- 229920001223 polyethylene glycol Polymers 0.000 description 3
- 229920002545 silicone oil Polymers 0.000 description 3
- 239000000243 solution Substances 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- 239000011701 zinc Substances 0.000 description 3
- 229910052725 zinc Inorganic materials 0.000 description 3
- VBICKXHEKHSIBG-UHFFFAOYSA-N 1-monostearoylglycerol Chemical compound CCCCCCCCCCCCCCCCCC(=O)OCC(O)CO VBICKXHEKHSIBG-UHFFFAOYSA-N 0.000 description 2
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 2
- OMIGHNLMNHATMP-UHFFFAOYSA-N 2-hydroxyethyl prop-2-enoate Chemical compound OCCOC(=O)C=C OMIGHNLMNHATMP-UHFFFAOYSA-N 0.000 description 2
- CNPVJWYWYZMPDS-UHFFFAOYSA-N 2-methyldecane Chemical compound CCCCCCCCC(C)C CNPVJWYWYZMPDS-UHFFFAOYSA-N 0.000 description 2
- YEJRWHAVMIAJKC-UHFFFAOYSA-N 4-Butyrolactone Chemical compound O=C1CCCO1 YEJRWHAVMIAJKC-UHFFFAOYSA-N 0.000 description 2
- KAKZBPTYRLMSJV-UHFFFAOYSA-N Butadiene Chemical compound C=CC=C KAKZBPTYRLMSJV-UHFFFAOYSA-N 0.000 description 2
- 239000004215 Carbon black (E152) Substances 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- XTHFKEDIFFGKHM-UHFFFAOYSA-N Dimethoxyethane Chemical compound COCCOC XTHFKEDIFFGKHM-UHFFFAOYSA-N 0.000 description 2
- IAYPIBMASNFSPL-UHFFFAOYSA-N Ethylene oxide Chemical group C1CO1 IAYPIBMASNFSPL-UHFFFAOYSA-N 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 2
- AMIMRNSIRUDHCM-UHFFFAOYSA-N Isopropylaldehyde Chemical compound CC(C)C=O AMIMRNSIRUDHCM-UHFFFAOYSA-N 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- 229910019142 PO4 Inorganic materials 0.000 description 2
- 239000004372 Polyvinyl alcohol Substances 0.000 description 2
- NBBJYMSMWIIQGU-UHFFFAOYSA-N Propionic aldehyde Chemical compound CCC=O NBBJYMSMWIIQGU-UHFFFAOYSA-N 0.000 description 2
- UKLDJPRMSDWDSL-UHFFFAOYSA-L [dibutyl(dodecanoyloxy)stannyl] dodecanoate Chemical compound CCCCCCCCCCCC(=O)O[Sn](CCCC)(CCCC)OC(=O)CCCCCCCCCCC UKLDJPRMSDWDSL-UHFFFAOYSA-L 0.000 description 2
- 150000001299 aldehydes Chemical class 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 2
- 125000004432 carbon atom Chemical group C* 0.000 description 2
- 239000003054 catalyst Substances 0.000 description 2
- 229960000541 cetyl alcohol Drugs 0.000 description 2
- NEHMKBQYUWJMIP-UHFFFAOYSA-N chloromethane Chemical compound ClC NEHMKBQYUWJMIP-UHFFFAOYSA-N 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 238000009833 condensation Methods 0.000 description 2
- 230000005494 condensation Effects 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- 239000003431 cross linking reagent Substances 0.000 description 2
- 239000000945 filler Substances 0.000 description 2
- 238000001914 filtration Methods 0.000 description 2
- KWIUHFFTVRNATP-UHFFFAOYSA-N glycine betaine Chemical compound C[N+](C)(C)CC([O-])=O KWIUHFFTVRNATP-UHFFFAOYSA-N 0.000 description 2
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 2
- 229930195733 hydrocarbon Natural products 0.000 description 2
- 150000002430 hydrocarbons Chemical class 0.000 description 2
- KWGKDLIKAYFUFQ-UHFFFAOYSA-M lithium chloride Chemical compound [Li+].[Cl-] KWGKDLIKAYFUFQ-UHFFFAOYSA-M 0.000 description 2
- WSFSSNUMVMOOMR-NJFSPNSNSA-N methanone Chemical compound O=[14CH2] WSFSSNUMVMOOMR-NJFSPNSNSA-N 0.000 description 2
- XZSZONUJSGDIFI-UHFFFAOYSA-N n-(4-hydroxyphenyl)-2-methylprop-2-enamide Chemical compound CC(=C)C(=O)NC1=CC=C(O)C=C1 XZSZONUJSGDIFI-UHFFFAOYSA-N 0.000 description 2
- 239000000025 natural resin Substances 0.000 description 2
- 125000000962 organic group Chemical group 0.000 description 2
- 150000002989 phenols Chemical class 0.000 description 2
- 239000010452 phosphate Substances 0.000 description 2
- 229920002503 polyoxyethylene-polyoxypropylene Polymers 0.000 description 2
- 229920002689 polyvinyl acetate Polymers 0.000 description 2
- 239000011118 polyvinyl acetate Substances 0.000 description 2
- 229920002451 polyvinyl alcohol Polymers 0.000 description 2
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 2
- 150000003839 salts Chemical class 0.000 description 2
- 125000005372 silanol group Chemical group 0.000 description 2
- 239000011734 sodium Substances 0.000 description 2
- GEHJYWRUCIMESM-UHFFFAOYSA-L sodium sulfite Chemical compound [Na+].[Na+].[O-]S([O-])=O GEHJYWRUCIMESM-UHFFFAOYSA-L 0.000 description 2
- PNGLEYLFMHGIQO-UHFFFAOYSA-M sodium;3-(n-ethyl-3-methoxyanilino)-2-hydroxypropane-1-sulfonate;dihydrate Chemical compound O.O.[Na+].[O-]S(=O)(=O)CC(O)CN(CC)C1=CC=CC(OC)=C1 PNGLEYLFMHGIQO-UHFFFAOYSA-M 0.000 description 2
- 150000003871 sulfonates Chemical class 0.000 description 2
- ZUHZGEOKBKGPSW-UHFFFAOYSA-N tetraglyme Chemical compound COCCOCCOCCOCCOC ZUHZGEOKBKGPSW-UHFFFAOYSA-N 0.000 description 2
- 238000011282 treatment Methods 0.000 description 2
- ROVRRJSRRSGUOL-UHFFFAOYSA-N victoria blue bo Chemical compound [Cl-].C12=CC=CC=C2C(NCC)=CC=C1C(C=1C=CC(=CC=1)N(CC)CC)=C1C=CC(=[N+](CC)CC)C=C1 ROVRRJSRRSGUOL-UHFFFAOYSA-N 0.000 description 2
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 2
- 229920002554 vinyl polymer Polymers 0.000 description 2
- 238000005406 washing Methods 0.000 description 2
- JIAARYAFYJHUJI-UHFFFAOYSA-L zinc dichloride Chemical compound [Cl-].[Cl-].[Zn+2] JIAARYAFYJHUJI-UHFFFAOYSA-L 0.000 description 2
- JNYAEWCLZODPBN-JGWLITMVSA-N (2r,3r,4s)-2-[(1r)-1,2-dihydroxyethyl]oxolane-3,4-diol Chemical compound OC[C@@H](O)[C@H]1OC[C@H](O)[C@H]1O JNYAEWCLZODPBN-JGWLITMVSA-N 0.000 description 1
- PJMXUSNWBKGQEZ-UHFFFAOYSA-N (4-hydroxyphenyl) 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OC1=CC=C(O)C=C1 PJMXUSNWBKGQEZ-UHFFFAOYSA-N 0.000 description 1
- WXWYJCSIHQKADM-ZNAKCYKMSA-N (e)-n-[bis[[(e)-butan-2-ylideneamino]oxy]-ethenylsilyl]oxybutan-2-imine Chemical compound CC\C(C)=N\O[Si](O\N=C(/C)CC)(O\N=C(/C)CC)C=C WXWYJCSIHQKADM-ZNAKCYKMSA-N 0.000 description 1
- QGLWBTPVKHMVHM-KTKRTIGZSA-N (z)-octadec-9-en-1-amine Chemical compound CCCCCCCC\C=C/CCCCCCCCN QGLWBTPVKHMVHM-KTKRTIGZSA-N 0.000 description 1
- DHKHKXVYLBGOIT-UHFFFAOYSA-N 1,1-Diethoxyethane Chemical compound CCOC(C)OCC DHKHKXVYLBGOIT-UHFFFAOYSA-N 0.000 description 1
- LZDKZFUFMNSQCJ-UHFFFAOYSA-N 1,2-diethoxyethane Chemical compound CCOCCOCC LZDKZFUFMNSQCJ-UHFFFAOYSA-N 0.000 description 1
- YUCTUWYCFFUCOR-UHFFFAOYSA-N 1,4-dihexoxy-1,4-dioxobutane-2-sulfonic acid;sodium Chemical compound [Na].CCCCCCOC(=O)CC(S(O)(=O)=O)C(=O)OCCCCCC YUCTUWYCFFUCOR-UHFFFAOYSA-N 0.000 description 1
- CUOSYYRDANYHTL-UHFFFAOYSA-N 1,4-dioctoxy-1,4-dioxobutane-2-sulfonic acid;sodium Chemical compound [Na].CCCCCCCCOC(=O)CC(S(O)(=O)=O)C(=O)OCCCCCCCC CUOSYYRDANYHTL-UHFFFAOYSA-N 0.000 description 1
- PQUXFUBNSYCQAL-UHFFFAOYSA-N 1-(2,3-difluorophenyl)ethanone Chemical compound CC(=O)C1=CC=CC(F)=C1F PQUXFUBNSYCQAL-UHFFFAOYSA-N 0.000 description 1
- QHIGBUQIFLDZPZ-UHFFFAOYSA-N 1-[(4e)-4-diazo-2-methoxycyclohexa-1,5-dien-1-yl]pyrrolidine Chemical compound C1=CC(=[N+]=[N-])CC(OC)=C1N1CCCC1 QHIGBUQIFLDZPZ-UHFFFAOYSA-N 0.000 description 1
- FHDQFPCQZMLBFE-UHFFFAOYSA-N 1-[(4e)-4-diazo-2-methylcyclohexa-1,5-dien-1-yl]pyrrolidine Chemical compound C1=CC(=[N+]=[N-])CC(C)=C1N1CCCC1 FHDQFPCQZMLBFE-UHFFFAOYSA-N 0.000 description 1
- RRQYJINTUHWNHW-UHFFFAOYSA-N 1-ethoxy-2-(2-ethoxyethoxy)ethane Chemical compound CCOCCOCCOCC RRQYJINTUHWNHW-UHFFFAOYSA-N 0.000 description 1
- ARXJGSRGQADJSQ-UHFFFAOYSA-N 1-methoxypropan-2-ol Chemical compound COCC(C)O ARXJGSRGQADJSQ-UHFFFAOYSA-N 0.000 description 1
- PFHLGQKVKALLMD-UHFFFAOYSA-N 2,2-dimethylhexan-3-ol Chemical compound CCCC(O)C(C)(C)C PFHLGQKVKALLMD-UHFFFAOYSA-N 0.000 description 1
- RSZXXBTXZJGELH-UHFFFAOYSA-N 2,3,4-tri(propan-2-yl)naphthalene-1-sulfonic acid Chemical compound C1=CC=CC2=C(C(C)C)C(C(C)C)=C(C(C)C)C(S(O)(=O)=O)=C21 RSZXXBTXZJGELH-UHFFFAOYSA-N 0.000 description 1
- XDESGXRLUIHEJT-UHFFFAOYSA-N 2,3,4-tribenzylphenol Chemical compound C=1C=CC=CC=1CC1=C(CC=2C=CC=CC=2)C(O)=CC=C1CC1=CC=CC=C1 XDESGXRLUIHEJT-UHFFFAOYSA-N 0.000 description 1
- IRLYGRLEBKCYPY-UHFFFAOYSA-N 2,5-dimethylbenzenesulfonic acid Chemical compound CC1=CC=C(C)C(S(O)(=O)=O)=C1 IRLYGRLEBKCYPY-UHFFFAOYSA-N 0.000 description 1
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- MWGATWIBSKHFMR-UHFFFAOYSA-N 2-anilinoethanol Chemical compound OCCNC1=CC=CC=C1 MWGATWIBSKHFMR-UHFFFAOYSA-N 0.000 description 1
- POAOYUHQDCAZBD-UHFFFAOYSA-N 2-butoxyethanol Chemical compound CCCCOCCO POAOYUHQDCAZBD-UHFFFAOYSA-N 0.000 description 1
- ZNQVEEAIQZEUHB-UHFFFAOYSA-N 2-ethoxyethanol Chemical compound CCOCCO ZNQVEEAIQZEUHB-UHFFFAOYSA-N 0.000 description 1
- QTWJRLJHJPIABL-UHFFFAOYSA-N 2-methylphenol;3-methylphenol;4-methylphenol Chemical class CC1=CC=C(O)C=C1.CC1=CC=CC(O)=C1.CC1=CC=CC=C1O QTWJRLJHJPIABL-UHFFFAOYSA-N 0.000 description 1
- QCDWFXQBSFUVSP-UHFFFAOYSA-N 2-phenoxyethanol Chemical compound OCCOC1=CC=CC=C1 QCDWFXQBSFUVSP-UHFFFAOYSA-N 0.000 description 1
- XLLXMBCBJGATSP-UHFFFAOYSA-N 2-phenylethenol Chemical compound OC=CC1=CC=CC=C1 XLLXMBCBJGATSP-UHFFFAOYSA-N 0.000 description 1
- YEYKMVJDLWJFOA-UHFFFAOYSA-N 2-propoxyethanol Chemical compound CCCOCCO YEYKMVJDLWJFOA-UHFFFAOYSA-N 0.000 description 1
- JSGVZVOGOQILFM-UHFFFAOYSA-N 3-methoxy-1-butanol Chemical compound COC(C)CCO JSGVZVOGOQILFM-UHFFFAOYSA-N 0.000 description 1
- MFKRHJVUCZRDTF-UHFFFAOYSA-N 3-methoxy-3-methylbutan-1-ol Chemical compound COC(C)(C)CCO MFKRHJVUCZRDTF-UHFFFAOYSA-N 0.000 description 1
- SCETWWDGKCBPMK-UHFFFAOYSA-N 4-[(4e)-4-diazocyclohexa-1,5-dien-1-yl]morpholine Chemical compound C1=CC(=[N+]=[N-])CC=C1N1CCOCC1 SCETWWDGKCBPMK-UHFFFAOYSA-N 0.000 description 1
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- LAXPFHMCFLHGKK-UHFFFAOYSA-N 4-diazo-n,n-dimethylcyclohexa-1,5-dien-1-amine Chemical compound CN(C)C1=CCC(=[N+]=[N-])C=C1 LAXPFHMCFLHGKK-UHFFFAOYSA-N 0.000 description 1
- GEGJJEQPYVHPRG-UHFFFAOYSA-N 6-diazo-2,5-dimethoxy-3-(4-methylphenyl)sulfanylcyclohexa-1,3-diene Chemical compound COC1=CC(=[N+]=[N-])C(OC)C=C1SC1=CC=C(C)C=C1 GEGJJEQPYVHPRG-UHFFFAOYSA-N 0.000 description 1
- RSWGJHLUYNHPMX-UHFFFAOYSA-N Abietic-Saeure Natural products C12CCC(C(C)C)=CC2=CCC2C1(C)CCCC2(C)C(O)=O RSWGJHLUYNHPMX-UHFFFAOYSA-N 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 1
- 229920002126 Acrylic acid copolymer Polymers 0.000 description 1
- 229920000178 Acrylic resin Polymers 0.000 description 1
- 239000004925 Acrylic resin Substances 0.000 description 1
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 1
- 101100433727 Caenorhabditis elegans got-1.2 gene Proteins 0.000 description 1
- OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical compound [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 description 1
- BVKZGUZCCUSVTD-UHFFFAOYSA-L Carbonate Chemical compound [O-]C([O-])=O BVKZGUZCCUSVTD-UHFFFAOYSA-L 0.000 description 1
- 229920000623 Cellulose acetate phthalate Polymers 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- KLHYPYAETJWSBK-UHFFFAOYSA-J Cl[Zn](Cl)(Cl)Cl Chemical compound Cl[Zn](Cl)(Cl)Cl KLHYPYAETJWSBK-UHFFFAOYSA-J 0.000 description 1
- LCGLNKUTAGEVQW-UHFFFAOYSA-N Dimethyl ether Chemical compound COC LCGLNKUTAGEVQW-UHFFFAOYSA-N 0.000 description 1
- BRLQWZUYTZBJKN-UHFFFAOYSA-N Epichlorohydrin Chemical compound ClCC1CO1 BRLQWZUYTZBJKN-UHFFFAOYSA-N 0.000 description 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- 239000004166 Lanolin Substances 0.000 description 1
- 229930040373 Paraformaldehyde Natural products 0.000 description 1
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- 125000003342 alkenyl group Chemical group 0.000 description 1
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- 229920000259 polyoxyethylene lauryl ether Polymers 0.000 description 1
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- 229920002223 polystyrene Polymers 0.000 description 1
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Landscapes
- Photosensitive Polymer And Photoresist Processing (AREA)
Abstract
Description
【発明の詳細な説明】
[産業上の利用分野]
本発明は、水なし平版印刷版用原版の現像処理方法に関
するものであり、更に詳しくはハイライト部からシャド
ウ部まての網点画像再現性に優れ、かつシリコーンゴム
層にキズがつきにくく、T、、:安全衛生上好ましい水
なし平版印刷版用原版の現像処理方法に関するものであ
る。[Detailed Description of the Invention] [Industrial Application Field] The present invention relates to a method for developing a waterless lithographic printing plate precursor, and more specifically, to reproduction of halftone images from highlight areas to shadow areas. This invention relates to a method for developing a waterless lithographic printing plate precursor, which has excellent properties and is resistant to scratches on the silicone rubber layer, and is preferable from the viewpoint of safety and hygiene.
[発明の背景]
従来、水なし平版印刷版用原版としては、支持体上に感
光層及びインキ反発層を順次塗設した構成を有するもの
を始め、種々のものが知られている。[Background of the Invention] Various types of waterless lithographic printing plate precursors have been known, including those having a structure in which a photosensitive layer and an ink repellent layer are sequentially coated on a support.
この水なし平版印刷版用原版は画像露光された後、現像
されるが、これに使用される現像液としては、従来アイ
ソパーHやトルエン等の炭化水素系の有機溶剤を用いた
ものが知られているが、前記水なし平版印刷版用原版の
現像液として、これらの炭化水素系の有機溶剤を用いた
場合、現像に際しシリコーンゴム層が膨潤するためこの
状態でシリコーンゴム層をこすると、該シリコーンゴム
層に傷が付き、したがってこのような印刷板を用いて印
刷すると印刷物に汚れを生じやすくなる。This waterless lithographic printing plate precursor is imagewise exposed and then developed, and the developer used for this is conventionally known to use a hydrocarbon-based organic solvent such as Isopar H or toluene. However, when these hydrocarbon-based organic solvents are used as the developer for the waterless lithographic printing plate precursor, the silicone rubber layer swells during development, so if the silicone rubber layer is rubbed in this state, the silicone rubber layer swells. The silicone rubber layer is scratched, and printing with such a printing plate is therefore likely to cause stains on the printed matter.
また水系現像液として、例えば特開平1−257847
号公報には、水なし平版印刷版用原版を現像するための
現像液であり、具体的には感光層の未露光部分を溶解又
は膨潤する有機溶剤、塩基性化合物及び界面活性剤を含
むアルカリ性の水系現像液について開示されている。こ
の現像液は、塩基性物質を含ませることにより、現像液
中のヘドロの゛発生を防止するものであるが、水系現像
液であるためシリコーンゴム層に傷が付きにくいという
利点はある。しかしながらこの現像液はアルカリ性のた
め現像液が経時や処理により疲労し易く、現像の仕上が
りが変化してしまう欠点がある。In addition, as an aqueous developer, for example, JP-A-1-257847
The publication describes a developer for developing a waterless lithographic printing plate precursor, specifically an alkaline developer containing an organic solvent, a basic compound, and a surfactant that dissolves or swells the unexposed portions of the photosensitive layer. A water-based developer is disclosed. This developer contains a basic substance to prevent the formation of sludge in the developer, but since it is an aqueous developer, it has the advantage of being less likely to damage the silicone rubber layer. However, since this developer is alkaline, the developer is easily fatigued over time or during processing, and has the disadvantage that the finish of the development changes.
更に特開昭63−280251号公報には、光重合性感
光層及びシリコーンゴム層を有する水なし平版印刷版用
原版を画像露光後、該原版を温水で現像処理して未露光
部のシリコーンゴム層と感光層とを共に除去する技術が
記載されている。Furthermore, JP-A No. 63-280251 discloses that after imagewise exposure of a waterless lithographic printing plate precursor having a photopolymerizable photosensitive layer and a silicone rubber layer, the original is developed with warm water to remove silicone rubber from unexposed areas. Techniques are described for removing both the layer and the photosensitive layer.
この技術は未露光部の感光層が水溶性であるため水系現
像液により現像することができるが、露光部において感
光層は光硬化するものの、感光層は膨潤するので、現像
時のブラシ等によるこすっで画像が欠落しやすく、特に
シャドウ部の再現性が不良になりやすい。In this technology, the photosensitive layer in the unexposed area is water-soluble, so it can be developed with an aqueous developer. However, although the photosensitive layer is photocured in the exposed area, it swells, so it is difficult to use a brush etc. during development. Images tend to be missing when rubbed, and the reproducibility of shadow areas in particular tends to be poor.
そこで、本発明者等は、前記問題点を種々検討した結果
、光硬化性水不溶性感光層を有する水なし平版印刷版用
原版の現像液において、現像液中の水の量及びpHを調
整することにより前記問題点を解決することができ、こ
の点に基すいて本発明は成された。Therefore, as a result of various studies on the above-mentioned problems, the inventors of the present invention have decided to adjust the amount and pH of water in the developer of a waterless lithographic printing plate precursor having a photocurable water-insoluble photosensitive layer. This makes it possible to solve the above-mentioned problems, and the present invention has been accomplished based on this point.
[発明の目的]
したがって、本発明の目的は、ハイライト部からシャド
ウ部までの網点画像再現性に優れ、かつシリコーンゴム
層にキズがつきにくく、更に安全衛生上好ましいと共に
現像性の変動がない水なし平版印刷版用原版の現像処理
方法を提供することにある。[Objective of the Invention] Therefore, the object of the present invention is to provide a method that has excellent halftone image reproducibility from highlight areas to shadow areas, is resistant to scratches on the silicone rubber layer, is preferable from a safety and health perspective, and is free from fluctuations in developability. An object of the present invention is to provide a method for developing a waterless lithographic printing plate precursor.
[発明の構成]
本発明の前記目的は、支持体上に光硬化性水不溶性感光
層及びシリコーンゴム層を順次有する水なし平版印刷版
用原版の現像処理方法において、水を90重量%以上含
有し、かつpHが55〜9,0の範囲の現像液を用いて
前記水なし平版印刷版用原版の露光済原版の版面を擦り
画像部のシリコーンゴム層を除去することを特徴とする
水なし平版印刷版用原版の現像処理方法によって達成さ
れた。[Structure of the Invention] The object of the present invention is to provide a method for developing a waterless lithographic printing plate precursor having a photocurable water-insoluble photosensitive layer and a silicone rubber layer sequentially on a support, which contain 90% by weight or more of water. and the surface of the exposed original plate of the waterless lithographic printing plate precursor is rubbed using a developer having a pH in the range of 55 to 9.0 to remove the silicone rubber layer in the image area. This was achieved by a method of developing a lithographic printing plate precursor.
以下、本発明を具体的に説明する。The present invention will be specifically explained below.
本発明の水なし平版印刷版用原版の現像処理方法に用い
られる現像液は、実質的に90重量%以上の水を含有し
ており、かつ該現像液のpHが5.5〜9.0の範囲で
用いられる。更にこのような現像液を用いて版面を擦す
り画像部のシリコーンゴム層を除去する。しかしこれに
よっては未露光部(画像部)の感光層は実質的に除去さ
れない。The developer used in the method for developing a waterless lithographic printing plate precursor of the present invention contains substantially 90% by weight or more of water, and has a pH of 5.5 to 9.0. Used within the range of Furthermore, the plate surface is rubbed using such a developer to remove the silicone rubber layer in the image area. However, this does not substantially remove the photosensitive layer in the unexposed areas (image areas).
この現像液には界面活性剤を添加すると更に好ましい。It is more preferable to add a surfactant to this developer.
前記界面活性剤としては、好ましくはアニオン型界面活
性剤及びノニオン型界面活性剤が用いられる。As the surfactant, anionic surfactants and nonionic surfactants are preferably used.
このアニオン型界面活性剤としては、高級アルコール(
C,a〜C22)硫酸エステル塩類[例えば、ラウリル
アルコールサルフェートのナトリウム塩、セチルアルコ
ールサルフェートのナトリウム塩、ラウリルアルコール
サルフェートのアンモニウム塩、「ティーポールB−8
1」 (商品名・シェル化学社製)、第二ナトリウムア
ルキルサルフェート等]、脂肪族アルコールリン酸エス
テル塩類(例えば、セチルアルコールリン酸エステルの
ナトリウム塩等)、アルキルアリールスルホン酸塩類(
例えば、ドデシルベンゼンスルホン酸ナトリウム塩、イ
ソプロピルナフタレンスルホン酸のナトリウム塩、シナ
フタレンジスルホン酸のナトリウム塩、メタニトロベン
ゼンスルホン酸のナトリウム塩等)、アルキルアミドの
スルホン酸塩二塩基性脂肪酸エステルのスルホン酸塩類
(例えば、ナトリウムスルホコハク酸ジオクチルエステ
ル、ナトリウムスルホコハク酸ジヘキシルエステル等)
がある。これらの中で特にスルホン酸塩類が好適に用い
られる。This anionic surfactant is a higher alcohol (
C, a to C22) Sulfuric ester salts [e.g., sodium salt of lauryl alcohol sulfate, sodium salt of cetyl alcohol sulfate, ammonium salt of lauryl alcohol sulfate, "T-Pole B-8
1" (trade name, manufactured by Shell Chemical Co., Ltd.), sodium chloride alkyl sulfate, etc.), aliphatic alcohol phosphate ester salts (e.g., sodium salt of cetyl alcohol phosphate ester, etc.), alkylaryl sulfonates (
For example, dodecylbenzenesulfonic acid sodium salt, isopropylnaphthalenesulfonic acid sodium salt, sinapthalenedisulfonic acid sodium salt, metanitrobenzenesulfonic acid sodium salt, etc.), sulfonates of alkylamides, sulfonates of dibasic fatty acid esters (For example, sodium sulfosuccinate dioctyl ester, sodium sulfosuccinate dihexyl ester, etc.)
There is. Among these, sulfonate salts are particularly preferably used.
またノニオン型界面活性剤としては、種々のものが使用
できる。Furthermore, various types of nonionic surfactants can be used.
即ち、ノニオン型界面活性剤は大別すると、ポリエチレ
ングリコール型と多価アルコール型に分類することがで
き、本発明にはこのどちらでも使用することができるが
、効果の大きい点からはポリエチレングリコール型のノ
ニオン型界面活性剤がこのまつしい。That is, nonionic surfactants can be broadly classified into polyethylene glycol type and polyhydric alcohol type, and either of these can be used in the present invention, but polyethylene glycol type is most effective. This is a nonionic surfactant.
その中でもエチレンオキサイド基(−CHaCH20−
)を3つ以上有し、かツHLB値(HLB値はHydr
ophile Lipophile Ba1anceの
略)が5つ以上(より好ましくは8〜20)のノニオン
型界面活性剤がより好ましい。Among them, ethylene oxide group (-CHaCH20-
), and has three or more HLB values (HLB values are Hydro
A nonionic surfactant having a Lipophile Balance of 5 or more (more preferably 8 to 20) is more preferred.
また、ノニオン型界面活性剤のうち、エチレンオキシ基
とプロピレンオキシド基の両者を有するものが特に好ま
しく、その中でHLB値が8以上のものがより好ましい
。Furthermore, among nonionic surfactants, those having both an ethylene oxy group and a propylene oxide group are particularly preferred, and among these, those having an HLB value of 8 or more are more preferred.
本発明に用いられるノニオン型界面活性剤の好ましい例
としては、下記の一般式[I]〜−数式[■]で表され
る化合物が挙げられる。Preferred examples of the nonionic surfactant used in the present invention include compounds represented by the following general formulas [I] to -numerical formulas [■].
−数式[1]
%式%)
一般式[2]
一般式[3]
%式%)
一般式[4]
一般式[5]
一般式[6]
HO(C2H40)a−(CsHaO)b−(C2H4
0)CH般式[7]
一般式[8〕
HO−(CH2C)120) nH
−数式[1]〜−数式[8]において、Rは水素原子又
は1価の有機基を表す。該有機きとしては、例えば直鎮
もしくは分岐の炭素数1〜30の置換基(例えばフェニ
ル基のようなアリール基)を有していてもよいアルキル
基、アルキル部分が上記アルキル基であるアルキルカル
ボニル基、置換基(例えばヒドロキシル基、上記のよう
なアルキル基等)を有していてもよいフェニル基等が挙
げられる。- Formula [1] % formula %) General formula [2] General formula [3] % formula %) General formula [4] General formula [5] General formula [6] HO(C2H40)a-(CsHaO)b-( C2H4
0) CH General formula [7] General formula [8] HO-(CH2C)120) nH -Formula [1] to -Formula [8], R represents a hydrogen atom or a monovalent organic group. The organic group includes, for example, a straight or branched alkyl group which may have a substituent having 1 to 30 carbon atoms (for example, an aryl group such as a phenyl group), and an alkylcarbonyl group in which the alkyl moiety is the above-mentioned alkyl group. and a phenyl group which may have a substituent (for example, a hydroxyl group, an alkyl group as described above, etc.).
a、b、c%m、n、x及びyは各々1〜40の整数を
表す。a, b, c%m, n, x and y each represent an integer of 1 to 40.
次に本発明に用いられる非イオン型界面活性剤の具体例
を示す。Next, specific examples of the nonionic surfactant used in the present invention will be shown.
ポリエチレングリコール、ポリオキシエチレンラウリル
エーテル、ポリオキシエチレンノニルエーテル、ポリオ
キシエチレンセチルエーテル、ポリオキシエチレンステ
アリルエーテル、ポリオキシエチレンベヘニルエーテル
、ポリオキシエチレンポリオキシプロピレンセチルエー
テル、ポリオキシエチレンポリオキシプロピレンベヘニ
ルエーテル、ポリオキシエチレンノニルフェニルエーテ
ル、ポリオキシエチレンオクチルフェニルエーテル、ポ
リオキシエチレンステアリルアミン、ポリオキシエチレ
ンオレイルアミン、ポリオキシエチレンステアリン酸ア
ミド、ポリオキシエチレンオレイン酸アミド、ポリオキ
シエチレンヒマシ油、ポリオキシエチレンアビエチルエ
ーテル、ポリオキシエチレンラノリンエーテル、ポリオ
キシエチレンモノラウレート、ポリオキシエチレンモノ
ステアレート、ポリオキシエチレングリセリルモノオレ
ート、ポリオキシエチレングリセルモノステアレート、
ポリオキシエチレンプロピレングリコールモノステアレ
ート、オキシエチレンオキシプロピレンブロックポリマ
ー ジスデシン化フェノールポリエチレンオキシド付加
物、トリベンジルフェノールポリエチレンオキシド付加
物、オクチルフェノールポリオキシエチレンポリオキシ
ブロビレン付加物、グリセロールモノステアレート、ソ
ルビタンモノラウレート、ポリオキシエチレンソルビタ
ンモノラウレート等これらの非イオン型界面活性剤は1
種を単独で含有させても、また2種以上を併用しても良
い。Polyethylene glycol, polyoxyethylene lauryl ether, polyoxyethylene nonyl ether, polyoxyethylene cetyl ether, polyoxyethylene stearyl ether, polyoxyethylene behenyl ether, polyoxyethylene polyoxypropylene cetyl ether, polyoxyethylene polyoxypropylene behenyl ether , polyoxyethylene nonylphenyl ether, polyoxyethylene octylphenyl ether, polyoxyethylene stearylamine, polyoxyethylene oleylamine, polyoxyethylene stearic acid amide, polyoxyethylene oleic acid amide, polyoxyethylene castor oil, polyoxyethylene abyssalin Ethyl ether, polyoxyethylene lanolin ether, polyoxyethylene monolaurate, polyoxyethylene monostearate, polyoxyethylene glyceryl monooleate, polyoxyethylene glycer monostearate,
Polyoxyethylene propylene glycol monostearate, oxyethylene oxypropylene block polymer, disdecynated phenol polyethylene oxide adduct, tribenzylphenol polyethylene oxide adduct, octylphenol polyoxyethylene polyoxybrobylene adduct, glycerol monostearate, sorbitan monolau These nonionic surfactants, such as polyoxyethylene sorbitan monolaurate,
The seeds may be contained alone or two or more kinds may be used in combination.
本発明に用いる非イオン型界面活性剤の重量平均分子量
は300〜10000の範囲が好ましく、500〜50
00の範囲が特に好ましい。The weight average molecular weight of the nonionic surfactant used in the present invention is preferably in the range of 300 to 10,000, preferably 500 to 50.
A range of 00 is particularly preferred.
界面活性剤の現像液への添加量は、アニオン型界面活性
剤及びノニオン型界面活性剤とも0.01〜10重量%
であり、0.01重量%未満では効果が弱く、10重量
%を越えると現像が抑制されてしまい、良好な性能が得
られない。The amount of surfactant added to the developer is 0.01 to 10% by weight for both anionic surfactant and nonionic surfactant.
If it is less than 0.01% by weight, the effect is weak, and if it exceeds 10% by weight, development is inhibited and good performance cannot be obtained.
また前記現像液には、有機溶剤を添加することができ、
好ましくは感光層を溶解しない範囲で用いられる。Further, an organic solvent may be added to the developer,
It is preferably used within a range that does not dissolve the photosensitive layer.
本発明に用いられる好ましい有機溶剤としては、20℃
において水に対する溶解度か1重量%以上のものであり
、例えばメタノール、エタノール、n−プロパツール、
イソプロパツール、3−メトキシブタノール、3−メチ
ル−3−メトキシブタノール、tert−ブチルブタノ
ール、エチレングリコール、エチレングリコールモノメ
チルエーテル、エチレングリコールモノエチルエーテル
、エチレングリコールモノプロピルエーテル、エチレン
グリコールモノブチルエーテル、エチレングリコールモ
ノフェニルエーテル、エチレングリコールジメチルエー
テル、エチレングリコールジエチルエーテル、ジエチレ
ングリコール、ジエチレングリコール千ツメチルエーテ
ル、ジエチレングリコールジメチルエーテル、ジエチレ
ングリコールモノエチルエーテル、ジエチレングリコー
ルジエチルエーテル、ジエチレングリコールモノブチル
エーテル、トリエチレングリコール、トリエチレングリ
コールモノメチルエーテル、トリエチレングリコールジ
メチルエーテル、テトラエチレングリコール、テトラエ
チレングリコールモノメチルエーテル、テトラエチレン
グリコールジメチルエーテル、プロピレングリコールモ
ノメチルエーテル、ベンジルアルコール、γ−ブチロラ
クトン、β−アニリノエタノール等がある。As a preferable organic solvent used in the present invention, 20°C
The solubility in water is 1% by weight or more, such as methanol, ethanol, n-propanol,
Isopropanol, 3-methoxybutanol, 3-methyl-3-methoxybutanol, tert-butylbutanol, ethylene glycol, ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol monopropyl ether, ethylene glycol monobutyl ether, ethylene glycol Monophenyl ether, ethylene glycol dimethyl ether, ethylene glycol diethyl ether, diethylene glycol, diethylene glycol 1,000 methyl ether, diethylene glycol dimethyl ether, diethylene glycol monoethyl ether, diethylene glycol diethyl ether, diethylene glycol monobutyl ether, triethylene glycol, triethylene glycol monomethyl ether, triethylene glycol dimethyl ether , tetraethylene glycol, tetraethylene glycol monomethyl ether, tetraethylene glycol dimethyl ether, propylene glycol monomethyl ether, benzyl alcohol, γ-butyrolactone, β-anilinoethanol, and the like.
前記現像液には、更に有機酸、無機酸等を加えることが
できる。An organic acid, an inorganic acid, etc. can be further added to the developer.
本発明に用いられる現像液には版面の画像部と非画像部
との識別を容易にするために色素を加えてもよい。加え
ることのできる色素としては、例えば、ビクトリアピュ
アブルー80H(保土谷化学社製)、オイルブルー”6
03 (オリエント化学工業社製)等のトリフェニルメ
タン系、ジフェニルメタン系色素等が挙げられる。A dye may be added to the developer used in the present invention in order to facilitate the discrimination between image areas and non-image areas of the printing plate. Examples of pigments that can be added include Victoria Pure Blue 80H (manufactured by Hodogaya Chemical Co., Ltd.) and Oil Blue "6".
03 (manufactured by Orient Chemical Industry Co., Ltd.), triphenylmethane-based dyes, diphenylmethane-based dyes, and the like.
本発明に用いられる現像液には、更に以下のような添加
剤を加えることができる。例えば、特開昭58−751
52号公報記載のNaCjl 、にC1)、にBr等の
中性塩、特開昭58−190952号公報記載のEDT
A、 NTA等のキレート剤、特開昭59−12133
6号公報記載の[Co (N)13) 6コCJ、C0
Cf2・6H20等の錯体、特開昭50−51324号
公報記載のアルキルナフタレンスルホン酸ソーダ、N−
テトラデシルN、N−ジヒドロキシエチルベタイン等の
アニオンまたは両性界面活性剤、米国特許第4,374
,920号明細書記載のテトラメチルデシンジオール等
の非イオン性界面活性剤、特開昭55−95946号公
報記載のp−ジメチルアミノメチルポリスチレンのメチ
ルクロライドの第4級化合物等のカチオニックボリマー
、特開昭56−142528号公報記載のビニルベンジ
ルトリメチルアンモニウムクロライトとアクリル酸ナト
リウムの共重合体等の両性高分子電解質、特開昭57−
192952号公報記載の亜硫酸ナトリウム等の還元性
無機塩、特開昭58−59444号公報記載の塩化リチ
ウム等の無機リチウム化合物、特公昭50−34442
号公報記載の安息香酸リチウム等の有機リチウム化合物
、特開昭59−75255号公報記載の硅素、チタン等
を含む有機金属界面活性剤、特開昭59−84241号
公報記載の有機ホウ素化合物、ヨーロッパ特許第toi
oto号明細書記載のテトラアルキルアンモニウムオキ
サイド等の第4級アンモニウム塩等の添加剤が挙げられ
る。The following additives can be further added to the developer used in the present invention. For example, JP-A-58-751
Neutral salts such as NaCjl, C1), and Br described in JP-A No. 52, EDT described in JP-A-58-190952
A, Chelating agent such as NTA, JP-A-59-12133
[Co (N)13) 6CJ, C0 described in Publication No. 6
Complexes such as Cf2.6H20, sodium alkylnaphthalenesulfonate described in JP-A-50-51324, N-
Anionic or amphoteric surfactants such as tetradecyl N, N-dihydroxyethyl betaine, U.S. Pat. No. 4,374
, nonionic surfactants such as tetramethyldesynediol described in JP-A-55-95946, and cationic polymers such as quaternary compounds of methyl chloride of p-dimethylaminomethyl polystyrene described in JP-A-55-95946. , ampholytic polymer electrolytes such as the copolymer of vinylbenzyltrimethylammonium chlorite and sodium acrylate described in JP-A-56-142528, JP-A-57-1988
Reducing inorganic salts such as sodium sulfite described in Japanese Patent Publication No. 192952, inorganic lithium compounds such as lithium chloride described in JP-A-58-59444, Japanese Patent Publication No. 50-34442
Organolithium compounds such as lithium benzoate described in JP-A No. 59-75255, organometallic surfactants containing silicon, titanium, etc. described in JP-A-59-75255, organoboron compounds described in JP-A-59-84241, Europe Patent No. TOI
Examples include additives such as quaternary ammonium salts such as tetraalkylammonium oxides described in the OTO specification.
本発明に用いられる感光層としては、ジアゾ樹脂の種々
のものを含むが、好ましくは、p−ジアゾジフェニルア
ミンとホルムアルデヒドとの縮合物で代表されるジアゾ
樹脂であって、水不溶性で有機溶媒可溶性のもので、好
ましくは特公昭47−1167号及び同57−4389
0号公報等に記載されているような水不溶性かつ通常の
有機溶媒可溶性のものが使用される。特に好ましくは下
記の一般式[1]で示されるジアゾ樹脂である。The photosensitive layer used in the present invention includes various diazo resins, but preferably a diazo resin represented by a condensate of p-diazodiphenylamine and formaldehyde, which is water-insoluble and organic solvent-soluble. and preferably Japanese Patent Publication No. 47-1167 and No. 57-4389.
Those that are water-insoluble and soluble in ordinary organic solvents, such as those described in Publication No. 0, etc., are used. Particularly preferred is a diazo resin represented by the following general formula [1].
数式[I]
[式中、
1
2
およびR3
は、
水素原子、
ア
ルキル基又はアルコキシ基を示し、R4は水素原子、ア
ルキル基又はフェニル基を示す。Numerical formula [I] [wherein 1 2 and R3 represent a hydrogen atom, an alkyl group, or an alkoxy group, and R4 represents a hydrogen atom, an alkyl group, or a phenyl group.
XはPFa又は BF4を示し、Yは−NH−−S−又
は−〇−を示す。]
本発明に用いられるジアゾ樹脂におけるジアゾモノマー
としては、例えば、4−ジアゾ−ジフェニルアミン、l
−ジアゾ−4−N、N−ジメチルアミノベンゼン、!−
ジアゾー4− N、N−ジエチルアミノベンゼン、1−
ジアゾ−4−N−エチル−N−ヒドロキシエチルアミノ
ベンゼン、l−ジアゾ−4−N−メチル−N−ヒドロキ
シエチルアミノベンゼン、l−ジアゾ−2,5−ジェト
キシ−4−ベンゾイルアミノベンゼン、1−ジアゾ−4
−N−ベンジルアミノベンゼン、l−ジアゾ−4−N、
N−ジメチルアミノベンゼン、1−ジアゾ−4−モルホ
リノベンゼン、1−ジアゾ−2,5−ジメトキシ−4−
p−トリルメルカプトベンゼン、1−ジアゾ−2−エト
キシ−4−N、N−ジメチルアミノベンゼン、p−ジア
ゾージメチルアニルン、1−ジアゾ−2,5−ジブトキ
シ−4−モルホリノベンゼン、1−ジアゾ−2,5−ジ
ェトキシ−4−モルホリノベンゼン、1−ジアゾ−2,
5−ジメトキシ−4−モルホリノベンゼン、1−ジアゾ
−2,5−ジェトキシ−4−p−1−リルメルカブトベ
ンゼン、l−ジアゾ−4−N−エチル−N−ヒドロキシ
エチルアミノベンゼン、1−ジアゾ−3−エトキシ−4
−N−メチル−N−ヘンシルアミノベンゼン、1−ジア
ゾ−3−クロロ−4−N、N−ジエチルアミノベンゼン
、1−ジアゾ−3−メチル−4−ピロリジノベンゼン、
1−ジアゾ−2−クロロ−4−N N−ジメチルアミノ
−5−メトキシベンゼン、1−ジアゾ−3−メトキシ−
4−ピロリジノベンゼン、3−メトキシ−4−ジアゾジ
フェニルアミン、3−エトキシ−4−ジアゾジフェニル
アミン、3−(n−プロポキシ)−4−ジアゾジフェニ
ルアミン、3−(インプロポキシ)−4−ジアゾジフェ
ニルアミン等か挙げられる。X represents PFa or BF4, and Y represents -NH--S- or -0-. ] Examples of the diazo monomer in the diazo resin used in the present invention include 4-diazo-diphenylamine, l
-Diazo-4-N,N-dimethylaminobenzene,! −
Diazo 4- N, N-diethylaminobenzene, 1-
Diazo-4-N-ethyl-N-hydroxyethylaminobenzene, l-diazo-4-N-methyl-N-hydroxyethylaminobenzene, l-diazo-2,5-jethoxy-4-benzoylaminobenzene, 1- Diazo-4
-N-benzylaminobenzene, l-diazo-4-N,
N-dimethylaminobenzene, 1-diazo-4-morpholinobenzene, 1-diazo-2,5-dimethoxy-4-
p-Tolylmercaptobenzene, 1-diazo-2-ethoxy-4-N, N-dimethylaminobenzene, p-diazodimethylaniline, 1-diazo-2,5-dibutoxy-4-morpholinobenzene, 1-diazo -2,5-jethoxy-4-morpholinobenzene, 1-diazo-2,
5-dimethoxy-4-morpholinobenzene, 1-diazo-2,5-jethoxy-4-p-1-lylmercabutobenzene, l-diazo-4-N-ethyl-N-hydroxyethylaminobenzene, 1-diazo -3-ethoxy-4
-N-methyl-N-hensylaminobenzene, 1-diazo-3-chloro-4-N, N-diethylaminobenzene, 1-diazo-3-methyl-4-pyrrolidinobenzene,
1-Diazo-2-chloro-4-N N-dimethylamino-5-methoxybenzene, 1-diazo-3-methoxy-
4-pyrrolidinobenzene, 3-methoxy-4-diazodiphenylamine, 3-ethoxy-4-diazodiphenylamine, 3-(n-propoxy)-4-diazodiphenylamine, 3-(impropoxy)-4-diazodiphenylamine, etc. Can be mentioned.
前記ジアゾモノマーとの縮合剤として用いられるアルデ
ヒドとしては、例えば、ホルムアルデヒド、アセトアル
デヒド、プロピオンアルデヒド、ブチルアルデヒド、イ
ソブチルアルデヒド、またはヘンズアルデヒド等が挙げ
られる。Examples of the aldehyde used as a condensing agent with the diazo monomer include formaldehyde, acetaldehyde, propionaldehyde, butyraldehyde, isobutyraldehyde, and henzaldehyde.
更に陰イオンとしては、塩素イオンやテトラクロロ亜鉛
酸等を用いることにより水溶性のジアゾ樹脂を得ること
ができ、また四フッ化ホウ素、六フッ化燐酸、トリイソ
プロピルナフタレンスルホン酸、4.4−ビフェニルジ
スルホン酸、2.5−ジメチルベンゼンスルホン酸、2
−二トロベンゼンスルホン酸、2−メトキシ−4−ヒド
ロキシ−5−ベンゾイル−ベンゼンスルホン酸等を用い
ることにより、有機溶剤可溶性のジアゾ樹脂を得ること
ができる。特に好ましくは、六フッ化燐酸からなるジア
ゾ樹脂が用いられる。Furthermore, water-soluble diazo resins can be obtained by using chloride ions, tetrachlorozinc acid, etc. as anions, and boron tetrafluoride, hexafluorophosphoric acid, triisopropylnaphthalenesulfonic acid, 4.4- biphenyldisulfonic acid, 2,5-dimethylbenzenesulfonic acid, 2
By using -nitrobenzenesulfonic acid, 2-methoxy-4-hydroxy-5-benzoyl-benzenesulfonic acid, etc., an organic solvent-soluble diazo resin can be obtained. Particularly preferably, a diazo resin made of hexafluorophosphoric acid is used.
ジアゾ樹脂は皮膜形成性樹脂、特に水酸基を有する高分
子化合物と混合して使用するのが好ましい。特に好まし
くは、高分子化合物としては、側鎖に脂肪族水酸基を有
する千ツマ−1例えば2−ヒドロキシエチルアクリレー
ト又は2−ヒドロキシエチルメタクリレートと他の共重
合し得るモノマーとの共重合体が挙げられる。The diazo resin is preferably used in combination with a film-forming resin, particularly a polymer compound having a hydroxyl group. Particularly preferably, the polymer compound includes a copolymer having an aliphatic hydroxyl group in the side chain, such as 2-hydroxyethyl acrylate or 2-hydroxyethyl methacrylate, and another copolymerizable monomer. .
これら以外にも、必要に応じてポリビニルブチラール樹
脂、ポリウレタン樹脂、ポリアミド樹脂、エポキシ樹脂
、ノボラック樹脂、天然樹脂等を添加してもよい。In addition to these, polyvinyl butyral resins, polyurethane resins, polyamide resins, epoxy resins, novolak resins, natural resins, etc. may be added as necessary.
この他ジアゾニウム塩と併用される結合剤としては種々
の高分子化合物が使用され得るが、好まシくハ特開昭5
4−98613号公報に記載されているような芳香族性
水酸基を有する単量体、例えばN−(4−ヒドロキシフ
ェニル)アクリルアミド、N−(4−ヒドロキシフェニ
ル)メタクリルアミド、(L−1m 、 またはp
−ヒドロキシスチレン、O−,1ll−、またはp−ヒ
ドロキシフェニルメタクリレート等と他の単量体との共
重合体、米国特許第4,123.276号明細書に記載
されているようなヒドロキシエチルアクリレート単位ま
たはヒドロキシエチルメタクリレート単位を主なる繰り
返し単位として含むポリマー等が挙げられる。In addition, various polymer compounds can be used as the binder used in combination with the diazonium salt, but preferably
A monomer having an aromatic hydroxyl group as described in Japanese Patent No. 4-98613, such as N-(4-hydroxyphenyl)acrylamide, N-(4-hydroxyphenyl)methacrylamide, (L-1m, or p
- Copolymers of hydroxystyrene, O-, 11-, or p-hydroxyphenyl methacrylate and the like with other monomers, hydroxyethyl acrylate as described in U.S. Pat. No. 4,123,276. Examples include polymers containing hydroxyethyl methacrylate units or hydroxyethyl methacrylate units as main repeating units.
ここに用いられるアクリル酸及びメタクリル酸単位は、
バインダー樹脂に対し10重量%以下を用いることが好
ましい。The acrylic acid and methacrylic acid units used here are:
It is preferable to use 10% by weight or less based on the binder resin.
前記ポリマー以外にも、必要に応じてポリビニルブチラ
ール樹脂、ポリウレタン樹脂、ポリアミド樹脂、エポキ
シ樹脂、ノボラック樹脂、シェラツク、ロジン等の天然
樹脂、ポリビニルアルコール、米国特許第3,751,
257号明細書に記載されているポリアミド樹脂、米国
特許第3,660.097号明細書に記載されている線
状ポリウレタン樹脂、ポリビニルアルコールのフタレー
ト化樹脂、ビスフェノールAとエピクロルヒドリンから
縮合されたエポキシ樹脂、酢酸セルロース、セルロース
アセテートフタレート等のセルロース類が含有される。In addition to the above polymers, natural resins such as polyvinyl butyral resin, polyurethane resin, polyamide resin, epoxy resin, novolac resin, shellac, rosin, polyvinyl alcohol, U.S. Pat. No. 3,751,
257, linear polyurethane resins as described in U.S. Pat. No. 3,660.097, phthalated polyvinyl alcohol resins, and epoxy resins condensed from bisphenol A and epichlorohydrin. , cellulose acetate, cellulose acetate phthalate, and other celluloses.
アルカリ可溶性樹脂としては、ノボラック樹脂、フェノ
ール性水酸基を有するビニル系重合体、特開昭55−5
7841号公報に記載されている多価フェノールとアル
デヒド又はケトンとの縮合樹脂等が挙げられる。ノボラ
ック樹脂としては、例えばフェノール・ホルムアルデヒ
ド樹脂、クレゾール・ホルムアルデヒド樹脂、特開昭5
5−57841号公報に記載されているようなフェノー
ル・クレゾール・ホルムアルデヒド共重縮合樹脂、特開
昭55−127553号公報に記載されているよりなp
−置換フェノールとフェノールもしくは、クレゾールと
ホルムアルデヒドとの共重縮合樹脂等が挙げられる。Examples of the alkali-soluble resin include novolac resin, vinyl polymer having a phenolic hydroxyl group, and JP-A-55-5
Examples include condensation resins of polyhydric phenols and aldehydes or ketones described in Japanese Patent No. 7841. Examples of novolac resins include phenol/formaldehyde resin, cresol/formaldehyde resin, and JP-A-5
Phenol-cresol-formaldehyde copolycondensation resin as described in Japanese Patent Application Laid-Open No. 55-127553,
Examples include copolycondensation resins of -substituted phenol and phenol or cresol and formaldehyde.
本発明に用いられるジアゾ樹脂は、バインダー樹脂と混
合して用いられるが、このバインダー樹脂を100とし
た場合に、ジアゾ樹脂30〜2゜O(重量比)の範囲が
よく、好ましくは50〜150更に好ましくは70〜1
20の範囲である。The diazo resin used in the present invention is used in a mixture with a binder resin, and when the binder resin is taken as 100, the diazo resin is preferably in the range of 30 to 2°O (weight ratio), preferably 50 to 150. More preferably 70-1
The range is 20.
これらの感光性組成物には、その他の染料、顔料等の色
素、感脂化剤、可塑剤、界面活性剤などを添加すること
ができる。これらの添加剤の添加量としては、感光層の
固形分中に0.1重量%〜20重量%、好ましくは0.
5重量%〜10重量%の範囲で用いられる。Other dyes, pigments such as pigments, fat-sensitizing agents, plasticizers, surfactants, etc. can be added to these photosensitive compositions. The amount of these additives added is 0.1% to 20% by weight, preferably 0.1% to 20% by weight in the solid content of the photosensitive layer.
It is used in a range of 5% to 10% by weight.
本発明に用いられるシリコーンゴムとしては、次のよう
な一般式[1]で示される繰り返し単位を有する分子量
数千〜数十刃の主鎖中または主鎖の末端に水酸基を有す
る線状有機ポリシロキサンを主成分とするものが好まし
い。The silicone rubber used in the present invention is a linear organic polymer having a repeating unit represented by the following general formula [1] and having a molecular weight of several thousand to several tens of blades and a hydroxyl group in the main chain or at the end of the main chain. Those containing siloxane as a main component are preferred.
一般式[1]
%式%
ここでnは2以上の整数、Rは炭素数1〜10のアルキ
ル基、ハロゲン化アルキル基、アルコキシル基、ビニル
基、アリール基、シラノール基(OI(基) であり、
Rの60%以上がメチル基であるものが好ましい。なお
上記シラノール基(O)I基)は主鎖中または主鎖の末
端のどちらにあってもよいが、末端にあることが好まし
い。General formula [1] % formula % where n is an integer of 2 or more, R is an alkyl group having 1 to 10 carbon atoms, a halogenated alkyl group, an alkoxyl group, a vinyl group, an aryl group, a silanol group (OI (group)) can be,
Preferably, 60% or more of R is a methyl group. The silanol group (O)I group) may be located either in the main chain or at the end of the main chain, but is preferably located at the end.
本発明に用いられるシランカップリング剤(またはシリ
コーン架橋剤)としては、
Rn S iX a −n
(式中、nは1〜3の整数であり、Rはアルキル、アリ
ール、アルケニルまたはこれらの組合された一価の基を
表し、またこれらの基はハロゲン、アミン、ヒドロキシ
、アルコキシ、アリーロキシ、チオール等の官能基を有
していてもよい。The silane coupling agent (or silicone crosslinking agent) used in the present invention includes Rn SiX a -n (wherein, n is an integer of 1 to 3, and R is alkyl, aryl, alkenyl, or a combination thereof). In addition, these groups may have functional groups such as halogen, amine, hydroxy, alkoxy, aryloxy, and thiol.
Xは一〇)1、−0R2、−0Ac、−o−N−cり、
−cp、−Br、−In2
等の置換基を表す。ここでR2、R3は上記のRと同し
ものを表し、R2、R3はそれぞれ同じであっても異っ
ていてもよい。またAcはアセチル基を表す。)で示さ
れるシラン化合物である。X is 10) 1, -0R2, -0Ac, -o-N-c,
Represents a substituent such as -cp, -Br, -In2, etc. Here, R2 and R3 represent the same thing as R above, and R2 and R3 may be the same or different, respectively. Moreover, Ac represents an acetyl group. ) is a silane compound represented by
つまり本発明において有用なシリコーンゴムは、このよ
うなシリコーン・ベースポリマーと、上記に挙げるよう
なシリコーン架橋剤との縮合反応によって得られるもの
である。That is, the silicone rubber useful in the present invention is obtained by a condensation reaction between such a silicone base polymer and a silicone crosslinking agent such as those listed above.
本発明に用いられるシランカップリング剤の具体例とし
ては、
)IN [(CH2) 3si (OMe) 3]2
% ビニルトリエトキシシラン、CI (CI(2)
3si (OMe) 3、CH35t (OAC) 3
、)Is (C)12) 3si (OMe) s、ビ
ニルトリス(メチルエチルケトオキシム)シラン等が挙
げられる。Specific examples of the silane coupling agent used in the present invention include )IN [(CH2) 3si (OMe) 3]2
% Vinyltriethoxysilane, CI (CI(2)
3si (OMe) 3, CH35t (OAC) 3
, )Is (C)12) 3si (OMe) s, vinyltris(methylethylketoxime)silane, and the like.
前記のシリコーンゴムは市販品としても入手でき、例え
は東芝シリコーン社製YE−3085等がある。またそ
の他の有用なシリコーンゴムは、前述の如きベース・ポ
リマーと、次のような一般式[II ]で示される繰り
返し単位を有するシリコーンオイルとの反応、あるいは
Rの3%程度がビニル基であるシリコーンのベース・ポ
リマーとの付加反応、あるいは該シリコーンオイル同士
の反応によっても得ることができる。The silicone rubber described above is also available as a commercial product, such as YE-3085 manufactured by Toshiba Silicone Co., Ltd. Other useful silicone rubbers can be produced by reacting the above-mentioned base polymer with a silicone oil having repeating units represented by the following general formula [II], or by reacting a silicone oil in which about 3% of R is a vinyl group. It can also be obtained by addition reaction of silicone with a base polymer or reaction of the silicone oils with each other.
一般式[II ] HR
(式中、Rは一般式[1]で示されるポリマーの置換基
であるRと同義であり、mは2以上の整数、nは0また
は1以上の整数である。)このような架橋反応によって
シリコーンゴムを得るためには、架橋反応を触媒を用い
て行う。この触媒としては、錫、亜鉛、コバルト、鉛、
カルシウム、マンガン、等の金属の有機カルボン酸塩、
例えばラウリル酸ジブチルスズ、スズ(II )オクト
エート、ナフテン酸コバルト等、あるいは塩化金酸等が
用いられる。General formula [II] HR (wherein, R has the same meaning as R, which is a substituent of the polymer represented by general formula [1], m is an integer of 2 or more, and n is an integer of 0 or 1 or more. ) In order to obtain silicone rubber by such a crosslinking reaction, the crosslinking reaction is carried out using a catalyst. This catalyst includes tin, zinc, cobalt, lead,
Organic carboxylates of metals such as calcium, manganese, etc.
For example, dibutyltin laurate, tin(II) octoate, cobalt naphthenate, or chloroauric acid may be used.
またシリコーンゴムの強度を向上させ、印刷作業中に生
じる摩擦力に耐えるシリコーンゴムを得るだめには、充
填剤(フィラー)を混合することもてきる。予めフィラ
ーの混合されたシリコーンゴムは、シリコーンゴムスト
ック、あるいはシリコーンゴムディスバージョンとして
市販されており、本発明のようにコーティングによりシ
リコーンゴム膜を得ることが好ましい場合には、RTV
あるいはLTVシリコーンゴムのディスバージョンか好
んで用いられる。このような例としては、トーレシリコ
ーン社製syt Off 23.5RX−257,5H
237等のペーパーコーティング用シリコーンゴムディ
スバージョンがある。In order to improve the strength of the silicone rubber and obtain a silicone rubber that can withstand the frictional forces generated during printing operations, fillers can be mixed. Silicone rubber mixed with filler in advance is commercially available as silicone rubber stock or silicone rubber dispersion, and when it is preferable to obtain a silicone rubber film by coating as in the present invention, RTV
Alternatively, a dispersion of LTV silicone rubber is preferably used. An example of this is syt Off 23.5RX-257,5H manufactured by Toray Silicone.
There are silicone rubber dispersions for paper coating such as 237.
本発明においては、縮合架橋タイプのシリコーンゴムを
用いることが好ましい。In the present invention, it is preferable to use condensation and crosslinking type silicone rubber.
シリコーンゴム層には、更に接着性を向上させるために
アミノ基を有するシランカップリング剤を含有している
ことが好ましい。The silicone rubber layer preferably contains a silane coupling agent having an amino group in order to further improve adhesiveness.
好ましいシランカップリング剤としては、例えは次のよ
うなものがある。Examples of preferable silane coupling agents include the following.
(a) 82NC)12c82NH(CH2) 3s
i (OCI(3) 3(、b) H2NCE2にH2
NH(CI(2) ssi (QC)I312 (CI
43)(C)H2N((:R2)351 (OEt)s
本発明に用いられるシリコーンゴム層中には、更に光増
感剤を少量含有させることができる。(a) 82NC)12c82NH(CH2) 3s
i (OCI(3) 3(,b) H2NCE2
NH(CI(2) ssi(QC)I312(CI
43)(C)H2N((:R2)351 (OEt)s
The silicone rubber layer used in the present invention may further contain a small amount of photosensitizer.
本発明に用いられるシリコーンゴム層は、シリコーンゴ
ムを適当な溶媒に溶解した後、感光層上に塗布、乾燥す
る。The silicone rubber layer used in the present invention is prepared by dissolving silicone rubber in a suitable solvent, applying it onto the photosensitive layer, and drying it.
本発明の支持体としては、通常の平版印刷機にセットで
きるたわみ性と印刷時に加わる荷重に耐えるものである
ことが好ましく、例えばアルミニウム、亜鉛、銅、鋼等
の金属板、及びクロム、亜鉛、銅、ニッケル、アルミニ
ウム及び鉄等がメツキまたは蒸着された金属板、紙、プ
ラスチックフィルム及びガラス板、樹脂コート紙、アル
ミニウム等の金属箔が張られた紙等が挙げられる。The support of the present invention is preferably one that is flexible enough to be set in a normal lithographic printing machine and that can withstand the load applied during printing, such as metal plates such as aluminum, zinc, copper, and steel, and metal plates such as chromium, zinc, Examples include metal plates plated or vapor-deposited with copper, nickel, aluminum, iron, etc., paper, plastic films, glass plates, resin-coated paper, paper covered with metal foil such as aluminum, and the like.
これらのうち好ましいものはアルミニウム板である。Among these, aluminum plates are preferred.
上記接着性向上のための支持体自体に対する処理は特に
限定されるものではなく、各種粗面化処理等が含まれる
。The treatment for the support itself to improve the adhesion is not particularly limited, and includes various surface roughening treatments.
支持体にはプライマー層を有していてもよく、該ブライ
マー層には例えばポリエステル樹脂、塩化ビニル−酢酸
ビニル共重合体、アクリル樹脂、塩化ビニル樹脂、ポリ
アミド樹脂、ポリビニルブチラール樹脂、エポキシ樹脂
、アクリレート系共重合体、酢酸ビニル系共重合体、フ
ェノキシ樹脂、ポリウレタン樹脂、ポリカーボネート樹
脂、ポリアクリロニトリルブタジェン、ポリ酢酸ビニル
等が挙げられる。これらのブライマー層には、前記露光
により酸を発生する化合物及び酸により変色あるいは褪
色する染料を添加することができる。The support may have a primer layer, and the primer layer may include, for example, polyester resin, vinyl chloride-vinyl acetate copolymer, acrylic resin, vinyl chloride resin, polyamide resin, polyvinyl butyral resin, epoxy resin, acrylate. Examples include polyvinyl acetate copolymers, vinyl acetate copolymers, phenoxy resins, polyurethane resins, polycarbonate resins, polyacrylonitrile butadiene, and polyvinyl acetate. A compound that generates an acid upon exposure to light and a dye that changes color or fades due to the acid can be added to these brimer layers.
また上記ブライマー層を構成するアンカー剤としては、
例えば前記シランカップリング剤、シリコーンブライマ
ー等を用いることができ、また有機チタネート等も有効
である。In addition, as the anchor agent constituting the above-mentioned brimer layer,
For example, the aforementioned silane coupling agents, silicone primers, etc. can be used, and organic titanates and the like are also effective.
本発明の版材を構成する各層の厚さは、以下の通りであ
る。即ち支持体は50〜400μm、好ましくは100
〜300 μm 、感光層は0.05〜10μm 、好
ましくは0.5〜5μm1シリコ一ンゴム層は0.1〜
lOμ11好ましくは0.5〜2μmである。The thickness of each layer constituting the plate material of the present invention is as follows. That is, the support has a thickness of 50 to 400 μm, preferably 100 μm.
-300 μm, photosensitive layer 0.05-10 μm, preferably 0.5-5 μm, silicone rubber layer 0.1-10 μm
lOμ11 is preferably 0.5 to 2 μm.
本発明において、シリコーンゴム層の上面には必要に応
して保護層を有していてもよい。In the present invention, a protective layer may be provided on the upper surface of the silicone rubber layer, if necessary.
[実施例]
以下、本発明を実施例により説明するが、本発明は、こ
れらに限定されるものではない。[Examples] The present invention will be described below with reference to Examples, but the present invention is not limited thereto.
実施例1
[アルミニウム板aの製造コ
厚さ0.2mmのアルミニウム板を3%水酸化ナトリウ
ム水溶液に浸漬して脱脂し、水洗した後、塩酸濃度1%
及びホウ酸濃度1%の水溶液中において、温度25℃で
3A/dm2の条件で5分間電解エツチングを行い、水
洗後、40%硫酸水溶液中において温度30℃で1.5
A/dm2の条件で2分間陽極酸化を行い、水洗し、1
%メタケイ酸ナトリウム水溶液に温度85℃で37秒間
浸漬し、更に温度90℃の水(pH8,5)に25秒間
浸漬し、水洗、乾燥してアルミニウム板aを得た。Example 1 [Production of aluminum plate a] An aluminum plate with a thickness of 0.2 mm is immersed in a 3% aqueous sodium hydroxide solution to degrease it, washed with water, and then diluted with hydrochloric acid at a concentration of 1%.
In an aqueous solution with a boric acid concentration of 1%, electrolytic etching was performed at a temperature of 25°C for 5 minutes at a rate of 3A/dm2, and after washing with water, etching was performed in an aqueous solution of 40% sulfuric acid at a temperature of 1.5°C at a temperature of 30°C.
Anodize for 2 minutes at A/dm2, wash with water,
% sodium metasilicate aqueous solution at a temperature of 85°C for 37 seconds, and further immersed in water (pH 8.5) at a temperature of 90°C for 25 seconds, washed with water, and dried to obtain an aluminum plate a.
アルミニウム板aに下記の組成の感光性組成物を塗布し
、100℃で2分間乾燥して厚さ0.5μmの感光層を
形成した。A photosensitive composition having the composition shown below was applied to an aluminum plate a, and dried at 100° C. for 2 minutes to form a photosensitive layer having a thickness of 0.5 μm.
(1)ジアゾ樹脂−150部
(2)2−ヒドロキシエチルメタクリレート、N−(4
−ヒドロキシフェニル)メタアクリルアミド、アクリル
酸のモル比が40158/2の共重合体
50部(3)ビクトリアピュアブル
ーBOH
(保止ケ谷化学(株)製染料) 1部(4)メチルセ
ロソルブ 900部ジアゾ樹脂−1の合成
なお、ジアゾ樹脂−1は以下のようにして合成した。(1) Diazo resin - 150 parts (2) 2-hydroxyethyl methacrylate, N-(4
-Hydroxyphenyl)methacrylamide, acrylic acid copolymer with a molar ratio of 40158/2
50 parts (3) Victoria Pure Blue BOH (dye manufactured by Hodogaya Chemical Co., Ltd.) 1 part (4) Methyl cellosolve 900 parts Synthesis of diazo resin-1 Diazo resin-1 was synthesized as follows. .
p−ジアゾジフェニルアミン硫酸塩14.5g(50ミ
リモル)を水冷下で40.9gの濃硫酸に溶解した。こ
の反応液に1.35 (45ミリモル)のパラホルムア
ルデヒドをゆっくり反応温度か10℃を超えないように
添加した。14.5 g (50 mmol) of p-diazodiphenylamine sulfate was dissolved in 40.9 g of concentrated sulfuric acid under water cooling. To this reaction solution, 1.35 (45 mmol) of paraformaldehyde was slowly added so as not to exceed the reaction temperature of 10°C.
この反応混合物を水冷下、500m1のエタノールに滴
下し、生じた沈殿を濾過した。エタノールで洗浄後、こ
の沈殿物を100m1の純粋に溶解し、この液に6.8
gの塩化亜鉛を溶解した冷濃厚水溶液を加えた。生じた
沈殿を濾過した後、エタノールで洗浄し、これを150
m1純水に溶解した。この液に8gのへキサフルオロリ
ン酸アンモニウムを溶解した冷濃厚水溶液を加えた。生
じた沈殿を濾取し、水洗した後、乾燥してジアゾ樹脂−
1を得た。This reaction mixture was added dropwise to 500 ml of ethanol under water cooling, and the resulting precipitate was filtered. After washing with ethanol, this precipitate was dissolved in 100 ml of pure water, and 6.8
A cold concentrated aqueous solution of 1 g of zinc chloride was added. After filtering the resulting precipitate, it was washed with ethanol, and then washed with 150
Dissolved in ml pure water. To this liquid was added a cold concentrated aqueous solution in which 8 g of ammonium hexafluorophosphate was dissolved. The resulting precipitate was collected by filtration, washed with water, and dried to form a diazo resin.
I got 1.
ついで、上記の感光層上に下記のシリコーンゴム組成物
を乾燥重量で2.0g/m2になるように塗布し、90
℃で10分間乾燥し、湿し水不要の平版印刷版材料を得
た。Next, the following silicone rubber composition was applied onto the photosensitive layer at a dry weight of 2.0 g/m2.
It was dried at ℃ for 10 minutes to obtain a lithographic printing plate material that did not require dampening water.
[シリコーンゴム層組成物コ
両末端に水酸基を有するジメチルポリシロキサン(分子
量52,000) 100部トリアセトキ
シメチルシラン 10部ジブチル錫ラウレート
0.8部アイソパーG(エッソ化学製
) 900部上記版材料の上面にポジフィルムを
真空密着させた後、光源としてメタルハライドランプを
用いて露光した。次に現像液として45℃の温水に浸漬
し、版面をスポンジで擦ることにより、未露光部分のシ
リコーンゴム層が除去され、網点が2%から99%まて
良好に再現された印刷版か得られた。また版面のシリコ
ーンゴム層には傷が見られなかった。[Silicone rubber layer composition] Dimethylpolysiloxane having hydroxyl groups at both ends (molecular weight 52,000) 100 parts Triacetoxymethylsilane 10 parts Dibutyltin laurate 0.8 parts Isopar G (manufactured by Esso Chemical) 900 parts of the above plate material After a positive film was vacuum-adhered to the top surface, exposure was performed using a metal halide lamp as a light source. Next, by immersing the plate in warm water at 45°C as a developer and rubbing the plate surface with a sponge, the silicone rubber layer in the unexposed areas is removed, resulting in a printing plate with well-reproduced halftone dots ranging from 2% to 99%. Obtained. Further, no scratches were observed on the silicone rubber layer of the printing plate.
[比較例1コ
実施例1て用いた現像液である45℃の水の代りに、下
記の現像液を用いた以外は実施例1と同様にして試験を
行った。[Comparative Example 1] A test was conducted in the same manner as in Example 1, except that the following developer was used instead of the 45° C. water developer used in Example 1.
[現像液] (p++ 10.8 )ペンシルアルコ
ール 8重量部ペレックスNBL
(花王社製、アニオン界面活性剤) 10重量部炭酸
ソータ(Na、Co3) 2重量部水
80重量部その結
果、網点再現性は3%から96%で、特にシャドウ部の
再現性が不良であった。[Developer] (p++ 10.8) Pencil alcohol 8 parts by weight Perex NBL (manufactured by Kao Corporation, anionic surfactant) 10 parts by weight Carbonate sorter (Na, Co3) 2 parts by weight Water
80 parts by weight As a result, the halftone dot reproducibility was 3% to 96%, and the reproducibility in shadow areas was particularly poor.
シリコーンゴム層の傷は少し見られた。A few scratches on the silicone rubber layer were observed.
比較例1
実施例1て用いた水なし平版の感光層を下記の水溶性感
光層にかえた以外は、実施例1と同様に試験を行った。Comparative Example 1 A test was carried out in the same manner as in Example 1, except that the photosensitive layer of the waterless planographic plate used in Example 1 was replaced with the water-soluble photosensitive layer shown below.
感光層としては、下記の組成よりなる水溶性感光液を塗
布し、100℃、2分間乾燥させた。乾燥塗布重量は2
、0g/rn2であった。As a photosensitive layer, a water-soluble photosensitive liquid having the following composition was applied and dried at 100°C for 2 minutes. Dry application weight is 2
, 0g/rn2.
[水溶性感光液コ
ペンタエリスリトールトリアクリレート 0.7gポリ
(アリルメタクリレート/メタ
クリル酸カリウム塩:共重合モル比
80/20)(分子量40000 ) 1.5gニ
スレックスW−201
(セキスイブラステックス社製:
水溶性ポリビニールアセタール樹脂)
(25%水溶液)(分子量40000)2.0g
水
5g
メタノール 15gその結
果、未露光部のシリコーンゴム層と感光層とか除去され
たが、網点再現性は2%から96%であり、シャドウ部
の再現性か不良であった。[Water-soluble photosensitive liquid copentaerythritol triacrylate 0.7g poly(allyl methacrylate/potassium methacrylate: copolymerization molar ratio 80/20) (molecular weight 40000) 1.5g Nisrex W-201 (manufactured by Sekisui Blastex) Water-soluble polyvinyl acetal resin) (25% aqueous solution) (molecular weight 40,000) 2.0 g Water 5 g Methanol 15 g As a result, the silicone rubber layer and photosensitive layer in the unexposed area were removed, but the halftone dot reproducibility was 2%. It was 96%, indicating that the reproducibility of the shadow area was poor.
[発明の効果]
本発明は、90重量%以上の水を含有し、かつpi(5
,5〜9.0の範囲の現像液を用いて版面を擦すること
により、画像部のシリコーンゴム層が除去され、その結
果非画像部のシリコーンゴム層には傷かつかないと共に
ハイライト部からシャド一部までの再現性か優れている
。また実質的に水を使用しているので安全衛生上も好ま
しく、更には現像性の変動かない等の優れた効果を有す
る。[Effect of the invention] The present invention contains 90% by weight or more of water and pi(5% by weight).
By rubbing the plate surface with a developing solution in the range of .5 to 9.0, the silicone rubber layer in the image area is removed, and as a result, the silicone rubber layer in the non-image area is not scratched and the highlight area is removed. Excellent reproducibility up to part of the shadow. Furthermore, since water is essentially used, it is favorable from the viewpoint of safety and hygiene, and furthermore, it has excellent effects such as no change in developability.
Claims (1)
層を順次有する水なし平版印刷版用原版の現像処理方法
において、水を90重量%以上含有し、かつpHが5.
5〜9.0の範囲の現像液を用いて前記水なし平版印刷
版用原版の露光済原版の版面を擦り画像部のシリコーン
ゴム層を除去することを特徴とする水なし平版印刷版用
原版の現像処理方法。In a method for developing a waterless lithographic printing plate precursor having a photocurable water-insoluble photosensitive layer and a silicone rubber layer on a support in sequence, the plate precursor contains 90% by weight or more of water and has a pH of 5.
A waterless lithographic printing plate precursor, characterized in that the surface of the exposed original plate of the waterless lithographic printing plate precursor is rubbed using a developer in the range of 5 to 9.0 to remove the silicone rubber layer in the image area. Development processing method.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP904190A JPH03213861A (en) | 1990-01-18 | 1990-01-18 | Development processing method for original plate for waterless planographic printing plate |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP904190A JPH03213861A (en) | 1990-01-18 | 1990-01-18 | Development processing method for original plate for waterless planographic printing plate |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH03213861A true JPH03213861A (en) | 1991-09-19 |
Family
ID=11709562
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP904190A Pending JPH03213861A (en) | 1990-01-18 | 1990-01-18 | Development processing method for original plate for waterless planographic printing plate |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH03213861A (en) |
-
1990
- 1990-01-18 JP JP904190A patent/JPH03213861A/en active Pending
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