JPH03213863A - Development processing method for original plate for waterless planographic printing plate - Google Patents
Development processing method for original plate for waterless planographic printing plateInfo
- Publication number
- JPH03213863A JPH03213863A JP904390A JP904390A JPH03213863A JP H03213863 A JPH03213863 A JP H03213863A JP 904390 A JP904390 A JP 904390A JP 904390 A JP904390 A JP 904390A JP H03213863 A JPH03213863 A JP H03213863A
- Authority
- JP
- Japan
- Prior art keywords
- acid
- silicone rubber
- processing liquid
- rubber layer
- diazo
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000003672 processing method Methods 0.000 title description 2
- 229920002379 silicone rubber Polymers 0.000 claims abstract description 52
- 239000004945 silicone rubber Substances 0.000 claims abstract description 51
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 29
- 239000007788 liquid Substances 0.000 claims abstract description 16
- 238000000034 method Methods 0.000 claims description 16
- 239000002243 precursor Substances 0.000 claims description 14
- 238000011282 treatment Methods 0.000 claims description 13
- 150000001989 diazonium salts Chemical class 0.000 claims description 4
- 239000010410 layer Substances 0.000 description 62
- -1 ester salts Chemical class 0.000 description 40
- 229920005989 resin Polymers 0.000 description 28
- 239000011347 resin Substances 0.000 description 28
- 125000000664 diazo group Chemical group [N-]=[N+]=[*] 0.000 description 22
- 239000000243 solution Substances 0.000 description 18
- 239000000203 mixture Substances 0.000 description 15
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 14
- 150000001875 compounds Chemical class 0.000 description 14
- 239000002253 acid Substances 0.000 description 12
- 239000002736 nonionic surfactant Substances 0.000 description 12
- 229920000642 polymer Polymers 0.000 description 10
- 125000000217 alkyl group Chemical group 0.000 description 9
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 9
- 229920003171 Poly (ethylene oxide) Polymers 0.000 description 8
- 239000000463 material Substances 0.000 description 8
- 229910052782 aluminium Inorganic materials 0.000 description 7
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 7
- 239000003960 organic solvent Substances 0.000 description 7
- 239000004094 surface-active agent Substances 0.000 description 7
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 6
- WPYMKLBDIGXBTP-UHFFFAOYSA-N benzoic acid Chemical compound OC(=O)C1=CC=CC=C1 WPYMKLBDIGXBTP-UHFFFAOYSA-N 0.000 description 6
- 239000000975 dye Substances 0.000 description 6
- RTZKZFJDLAIYFH-UHFFFAOYSA-N ether Substances CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 6
- 229920001296 polysiloxane Polymers 0.000 description 6
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 5
- 239000002202 Polyethylene glycol Substances 0.000 description 5
- 239000006087 Silane Coupling Agent Substances 0.000 description 5
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 5
- 239000003945 anionic surfactant Substances 0.000 description 5
- 239000007864 aqueous solution Substances 0.000 description 5
- 239000011230 binding agent Substances 0.000 description 5
- 125000004432 carbon atom Chemical group C* 0.000 description 5
- 238000006243 chemical reaction Methods 0.000 description 5
- 230000000052 comparative effect Effects 0.000 description 5
- 229920001577 copolymer Polymers 0.000 description 5
- 229910052751 metal Inorganic materials 0.000 description 5
- 239000002184 metal Substances 0.000 description 5
- 239000000123 paper Substances 0.000 description 5
- 229920001223 polyethylene glycol Polymers 0.000 description 5
- 159000000000 sodium salts Chemical class 0.000 description 5
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 4
- WOBHKFSMXKNTIM-UHFFFAOYSA-N Hydroxyethyl methacrylate Chemical compound CC(=C)C(=O)OCCO WOBHKFSMXKNTIM-UHFFFAOYSA-N 0.000 description 4
- 125000003545 alkoxy group Chemical group 0.000 description 4
- 125000003118 aryl group Chemical group 0.000 description 4
- 239000003822 epoxy resin Substances 0.000 description 4
- BXWNKGSJHAJOGX-UHFFFAOYSA-N hexadecan-1-ol Chemical compound CCCCCCCCCCCCCCCCO BXWNKGSJHAJOGX-UHFFFAOYSA-N 0.000 description 4
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 4
- 239000000178 monomer Substances 0.000 description 4
- 229920003986 novolac Polymers 0.000 description 4
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 4
- 229920000647 polyepoxide Polymers 0.000 description 4
- 229920005749 polyurethane resin Polymers 0.000 description 4
- 239000002244 precipitate Substances 0.000 description 4
- 150000003839 salts Chemical class 0.000 description 4
- GEHJYWRUCIMESM-UHFFFAOYSA-L sodium sulfite Chemical compound [Na+].[Na+].[O-]S([O-])=O GEHJYWRUCIMESM-UHFFFAOYSA-L 0.000 description 4
- 239000000126 substance Substances 0.000 description 4
- 125000001424 substituent group Chemical group 0.000 description 4
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 3
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 3
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 3
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 3
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 3
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 description 3
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 3
- 239000000654 additive Substances 0.000 description 3
- 150000001298 alcohols Chemical class 0.000 description 3
- 150000007933 aliphatic carboxylic acids Chemical class 0.000 description 3
- 150000003863 ammonium salts Chemical class 0.000 description 3
- 229920005601 base polymer Polymers 0.000 description 3
- 239000012965 benzophenone Substances 0.000 description 3
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 3
- 230000001680 brushing effect Effects 0.000 description 3
- ZTQSAGDEMFDKMZ-UHFFFAOYSA-N butyric aldehyde Natural products CCCC=O ZTQSAGDEMFDKMZ-UHFFFAOYSA-N 0.000 description 3
- 150000001732 carboxylic acid derivatives Chemical class 0.000 description 3
- 239000003795 chemical substances by application Substances 0.000 description 3
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 description 3
- 239000011248 coating agent Substances 0.000 description 3
- 238000000576 coating method Methods 0.000 description 3
- 238000009833 condensation Methods 0.000 description 3
- 230000005494 condensation Effects 0.000 description 3
- 238000004132 cross linking Methods 0.000 description 3
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 3
- 239000006185 dispersion Substances 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 229930195733 hydrocarbon Natural products 0.000 description 3
- 150000002430 hydrocarbons Chemical class 0.000 description 3
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 3
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 description 3
- 229920002037 poly(vinyl butyral) polymer Polymers 0.000 description 3
- 229920006122 polyamide resin Polymers 0.000 description 3
- 229920000728 polyester Polymers 0.000 description 3
- 229920002545 silicone oil Polymers 0.000 description 3
- 229910052708 sodium Inorganic materials 0.000 description 3
- 239000011734 sodium Substances 0.000 description 3
- 229910052725 zinc Inorganic materials 0.000 description 3
- 239000011701 zinc Substances 0.000 description 3
- VBICKXHEKHSIBG-UHFFFAOYSA-N 1-monostearoylglycerol Chemical compound CCCCCCCCCCCCCCCCCC(=O)OCC(O)CO VBICKXHEKHSIBG-UHFFFAOYSA-N 0.000 description 2
- LNETULKMXZVUST-UHFFFAOYSA-N 1-naphthoic acid Chemical compound C1=CC=C2C(C(=O)O)=CC=CC2=C1 LNETULKMXZVUST-UHFFFAOYSA-N 0.000 description 2
- XUVKSPPGPPFPQN-UHFFFAOYSA-N 10-Methyl-9(10H)-acridone Chemical compound C1=CC=C2N(C)C3=CC=CC=C3C(=O)C2=C1 XUVKSPPGPPFPQN-UHFFFAOYSA-N 0.000 description 2
- GLDQAMYCGOIJDV-UHFFFAOYSA-N 2,3-dihydroxybenzoic acid Chemical compound OC(=O)C1=CC=CC(O)=C1O GLDQAMYCGOIJDV-UHFFFAOYSA-N 0.000 description 2
- UIAFKZKHHVMJGS-UHFFFAOYSA-N 2,4-dihydroxybenzoic acid Chemical compound OC(=O)C1=CC=C(O)C=C1O UIAFKZKHHVMJGS-UHFFFAOYSA-N 0.000 description 2
- AKEUNCKRJATALU-UHFFFAOYSA-N 2,6-dihydroxybenzoic acid Chemical compound OC(=O)C1=C(O)C=CC=C1O AKEUNCKRJATALU-UHFFFAOYSA-N 0.000 description 2
- HZAXFHJVJLSVMW-UHFFFAOYSA-N 2-Aminoethan-1-ol Chemical compound NCCO HZAXFHJVJLSVMW-UHFFFAOYSA-N 0.000 description 2
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 2
- NJWGQARXZDRHCD-UHFFFAOYSA-N 2-methylanthraquinone Chemical compound C1=CC=C2C(=O)C3=CC(C)=CC=C3C(=O)C2=C1 NJWGQARXZDRHCD-UHFFFAOYSA-N 0.000 description 2
- CNPVJWYWYZMPDS-UHFFFAOYSA-N 2-methyldecane Chemical compound CCCCCCCCC(C)C CNPVJWYWYZMPDS-UHFFFAOYSA-N 0.000 description 2
- ALYNCZNDIQEVRV-UHFFFAOYSA-N 4-aminobenzoic acid Chemical compound NC1=CC=C(C(O)=O)C=C1 ALYNCZNDIQEVRV-UHFFFAOYSA-N 0.000 description 2
- FJKROLUGYXJWQN-UHFFFAOYSA-N 4-hydroxybenzoic acid Chemical compound OC(=O)C1=CC=C(O)C=C1 FJKROLUGYXJWQN-UHFFFAOYSA-N 0.000 description 2
- PAYRUJLWNCNPSJ-UHFFFAOYSA-N Aniline Chemical compound NC1=CC=CC=C1 PAYRUJLWNCNPSJ-UHFFFAOYSA-N 0.000 description 2
- 239000005711 Benzoic acid Substances 0.000 description 2
- KAKZBPTYRLMSJV-UHFFFAOYSA-N Butadiene Chemical compound C=CC=C KAKZBPTYRLMSJV-UHFFFAOYSA-N 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical group [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- 239000004215 Carbon black (E152) Substances 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- ROSDSFDQCJNGOL-UHFFFAOYSA-N Dimethylamine Chemical compound CNC ROSDSFDQCJNGOL-UHFFFAOYSA-N 0.000 description 2
- QUSNBJAOOMFDIB-UHFFFAOYSA-N Ethylamine Chemical compound CCN QUSNBJAOOMFDIB-UHFFFAOYSA-N 0.000 description 2
- IAYPIBMASNFSPL-UHFFFAOYSA-N Ethylene oxide Chemical group C1CO1 IAYPIBMASNFSPL-UHFFFAOYSA-N 0.000 description 2
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- AMIMRNSIRUDHCM-UHFFFAOYSA-N Isopropylaldehyde Chemical compound CC(C)C=O AMIMRNSIRUDHCM-UHFFFAOYSA-N 0.000 description 2
- OFOBLEOULBTSOW-UHFFFAOYSA-N Malonic acid Chemical class OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 2
- BAVYZALUXZFZLV-UHFFFAOYSA-N Methylamine Chemical compound NC BAVYZALUXZFZLV-UHFFFAOYSA-N 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- 229910019142 PO4 Inorganic materials 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
- 239000004793 Polystyrene Substances 0.000 description 2
- 239000004372 Polyvinyl alcohol Substances 0.000 description 2
- NBBJYMSMWIIQGU-UHFFFAOYSA-N Propionic aldehyde Chemical compound CCC=O NBBJYMSMWIIQGU-UHFFFAOYSA-N 0.000 description 2
- LSNNMFCWUKXFEE-UHFFFAOYSA-N Sulfurous acid Chemical compound OS(O)=O LSNNMFCWUKXFEE-UHFFFAOYSA-N 0.000 description 2
- UKLDJPRMSDWDSL-UHFFFAOYSA-L [dibutyl(dodecanoyloxy)stannyl] dodecanoate Chemical compound CCCCCCCCCCCC(=O)O[Sn](CCCC)(CCCC)OC(=O)CCCCCCCCCCC UKLDJPRMSDWDSL-UHFFFAOYSA-L 0.000 description 2
- 235000011054 acetic acid Nutrition 0.000 description 2
- 229940048053 acrylate Drugs 0.000 description 2
- 239000012790 adhesive layer Substances 0.000 description 2
- 150000001299 aldehydes Chemical class 0.000 description 2
- 150000001412 amines Chemical class 0.000 description 2
- 229960004050 aminobenzoic acid Drugs 0.000 description 2
- 125000000129 anionic group Chemical group 0.000 description 2
- HUMNYLRZRPPJDN-UHFFFAOYSA-N benzaldehyde Chemical compound O=CC1=CC=CC=C1 HUMNYLRZRPPJDN-UHFFFAOYSA-N 0.000 description 2
- 235000010233 benzoic acid Nutrition 0.000 description 2
- RWCCWEUUXYIKHB-UHFFFAOYSA-N benzophenone Chemical compound C=1C=CC=CC=1C(=O)C1=CC=CC=C1 RWCCWEUUXYIKHB-UHFFFAOYSA-N 0.000 description 2
- WGQKYBSKWIADBV-UHFFFAOYSA-N benzylamine Chemical compound NCC1=CC=CC=C1 WGQKYBSKWIADBV-UHFFFAOYSA-N 0.000 description 2
- HQABUPZFAYXKJW-UHFFFAOYSA-N butan-1-amine Chemical compound CCCCN HQABUPZFAYXKJW-UHFFFAOYSA-N 0.000 description 2
- 239000011575 calcium Substances 0.000 description 2
- 239000003054 catalyst Substances 0.000 description 2
- 229920002678 cellulose Polymers 0.000 description 2
- 235000010980 cellulose Nutrition 0.000 description 2
- 229960000541 cetyl alcohol Drugs 0.000 description 2
- NEHMKBQYUWJMIP-UHFFFAOYSA-N chloromethane Chemical compound ClC NEHMKBQYUWJMIP-UHFFFAOYSA-N 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- 239000003431 cross linking reagent Substances 0.000 description 2
- GHVNFZFCNZKVNT-UHFFFAOYSA-N decanoic acid Chemical compound CCCCCCCCCC(O)=O GHVNFZFCNZKVNT-UHFFFAOYSA-N 0.000 description 2
- 150000008049 diazo compounds Chemical class 0.000 description 2
- 235000014113 dietary fatty acids Nutrition 0.000 description 2
- XBDQKXXYIPTUBI-UHFFFAOYSA-N dimethylselenoniopropionate Natural products CCC(O)=O XBDQKXXYIPTUBI-UHFFFAOYSA-N 0.000 description 2
- POULHZVOKOAJMA-UHFFFAOYSA-N dodecanoic acid Chemical compound CCCCCCCCCCCC(O)=O POULHZVOKOAJMA-UHFFFAOYSA-N 0.000 description 2
- 230000007613 environmental effect Effects 0.000 description 2
- 239000000194 fatty acid Substances 0.000 description 2
- 229930195729 fatty acid Natural products 0.000 description 2
- 239000000945 filler Substances 0.000 description 2
- 238000001914 filtration Methods 0.000 description 2
- OVBPIULPVIDEAO-LBPRGKRZSA-N folic acid Chemical compound C=1N=C2NC(N)=NC(=O)C2=NC=1CNC1=CC=C(C(=O)N[C@@H](CCC(O)=O)C(O)=O)C=C1 OVBPIULPVIDEAO-LBPRGKRZSA-N 0.000 description 2
- LNTHITQWFMADLM-UHFFFAOYSA-N gallic acid Chemical compound OC(=O)C1=CC(O)=C(O)C(O)=C1 LNTHITQWFMADLM-UHFFFAOYSA-N 0.000 description 2
- VOZRXNHHFUQHIL-UHFFFAOYSA-N glycidyl methacrylate Chemical compound CC(=C)C(=O)OCC1CO1 VOZRXNHHFUQHIL-UHFFFAOYSA-N 0.000 description 2
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 2
- IPCSVZSSVZVIGE-UHFFFAOYSA-N hexadecanoic acid Chemical compound CCCCCCCCCCCCCCCC(O)=O IPCSVZSSVZVIGE-UHFFFAOYSA-N 0.000 description 2
- ZSIAUFGUXNUGDI-UHFFFAOYSA-N hexan-1-ol Chemical compound CCCCCCO ZSIAUFGUXNUGDI-UHFFFAOYSA-N 0.000 description 2
- NAQMVNRVTILPCV-UHFFFAOYSA-N hexane-1,6-diamine Chemical compound NCCCCCCN NAQMVNRVTILPCV-UHFFFAOYSA-N 0.000 description 2
- FUZZWVXGSFPDMH-UHFFFAOYSA-N hexanoic acid Chemical compound CCCCCC(O)=O FUZZWVXGSFPDMH-UHFFFAOYSA-N 0.000 description 2
- KWGKDLIKAYFUFQ-UHFFFAOYSA-M lithium chloride Chemical compound [Li+].[Cl-] KWGKDLIKAYFUFQ-UHFFFAOYSA-M 0.000 description 2
- 150000002642 lithium compounds Chemical class 0.000 description 2
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 2
- 229910052753 mercury Inorganic materials 0.000 description 2
- WSFSSNUMVMOOMR-NJFSPNSNSA-N methanone Chemical compound O=[14CH2] WSFSSNUMVMOOMR-NJFSPNSNSA-N 0.000 description 2
- XZSZONUJSGDIFI-UHFFFAOYSA-N n-(4-hydroxyphenyl)-2-methylprop-2-enamide Chemical compound CC(=C)C(=O)NC1=CC=C(O)C=C1 XZSZONUJSGDIFI-UHFFFAOYSA-N 0.000 description 2
- 239000000025 natural resin Substances 0.000 description 2
- FBUKVWPVBMHYJY-UHFFFAOYSA-N nonanoic acid Chemical compound CCCCCCCCC(O)=O FBUKVWPVBMHYJY-UHFFFAOYSA-N 0.000 description 2
- WWZKQHOCKIZLMA-UHFFFAOYSA-N octanoic acid Chemical compound CCCCCCCC(O)=O WWZKQHOCKIZLMA-UHFFFAOYSA-N 0.000 description 2
- 125000000962 organic group Chemical group 0.000 description 2
- RPQRDASANLAFCM-UHFFFAOYSA-N oxiran-2-ylmethyl prop-2-enoate Chemical compound C=CC(=O)OCC1CO1 RPQRDASANLAFCM-UHFFFAOYSA-N 0.000 description 2
- 239000010452 phosphate Substances 0.000 description 2
- XNGIFLGASWRNHJ-UHFFFAOYSA-N phthalic acid Chemical compound OC(=O)C1=CC=CC=C1C(O)=O XNGIFLGASWRNHJ-UHFFFAOYSA-N 0.000 description 2
- 239000000049 pigment Substances 0.000 description 2
- 239000004014 plasticizer Substances 0.000 description 2
- 229920002503 polyoxyethylene-polyoxypropylene Polymers 0.000 description 2
- 229920002689 polyvinyl acetate Polymers 0.000 description 2
- 239000011118 polyvinyl acetate Substances 0.000 description 2
- 229920002451 polyvinyl alcohol Polymers 0.000 description 2
- 125000005372 silanol group Chemical group 0.000 description 2
- 235000010265 sodium sulphite Nutrition 0.000 description 2
- PNGLEYLFMHGIQO-UHFFFAOYSA-M sodium;3-(n-ethyl-3-methoxyanilino)-2-hydroxypropane-1-sulfonate;dihydrate Chemical compound O.O.[Na+].[O-]S(=O)(=O)CC(O)CN(CC)C1=CC=CC(OC)=C1 PNGLEYLFMHGIQO-UHFFFAOYSA-M 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- 150000003871 sulfonates Chemical class 0.000 description 2
- 230000008961 swelling Effects 0.000 description 2
- ZIBGPFATKBEMQZ-UHFFFAOYSA-N triethylene glycol Chemical compound OCCOCCOCCO ZIBGPFATKBEMQZ-UHFFFAOYSA-N 0.000 description 2
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 2
- 238000005406 washing Methods 0.000 description 2
- JNELGWHKGNBSMD-UHFFFAOYSA-N xanthone Chemical compound C1=CC=C2C(=O)C3=CC=CC=C3OC2=C1 JNELGWHKGNBSMD-UHFFFAOYSA-N 0.000 description 2
- JIAARYAFYJHUJI-UHFFFAOYSA-L zinc dichloride Chemical compound [Cl-].[Cl-].[Zn+2] JIAARYAFYJHUJI-UHFFFAOYSA-L 0.000 description 2
- RLUFBDIRFJGKLY-UHFFFAOYSA-N (2,3-dichlorophenyl)-phenylmethanone Chemical compound ClC1=CC=CC(C(=O)C=2C=CC=CC=2)=C1Cl RLUFBDIRFJGKLY-UHFFFAOYSA-N 0.000 description 1
- JNYAEWCLZODPBN-JGWLITMVSA-N (2r,3r,4s)-2-[(1r)-1,2-dihydroxyethyl]oxolane-3,4-diol Chemical compound OC[C@@H](O)[C@H]1OC[C@H](O)[C@H]1O JNYAEWCLZODPBN-JGWLITMVSA-N 0.000 description 1
- PJMXUSNWBKGQEZ-UHFFFAOYSA-N (4-hydroxyphenyl) 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OC1=CC=C(O)C=C1 PJMXUSNWBKGQEZ-UHFFFAOYSA-N 0.000 description 1
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- 229940039717 lanolin Drugs 0.000 description 1
- 229940070765 laurate Drugs 0.000 description 1
- 239000011133 lead Substances 0.000 description 1
- 229940031993 lithium benzoate Drugs 0.000 description 1
- LDJNSLOKTFFLSL-UHFFFAOYSA-M lithium;benzoate Chemical compound [Li+].[O-]C(=O)C1=CC=CC=C1 LDJNSLOKTFFLSL-UHFFFAOYSA-M 0.000 description 1
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 1
- 239000011976 maleic acid Substances 0.000 description 1
- WPBNNNQJVZRUHP-UHFFFAOYSA-L manganese(2+);methyl n-[[2-(methoxycarbonylcarbamothioylamino)phenyl]carbamothioyl]carbamate;n-[2-(sulfidocarbothioylamino)ethyl]carbamodithioate Chemical compound [Mn+2].[S-]C(=S)NCCNC([S-])=S.COC(=O)NC(=S)NC1=CC=CC=C1NC(=S)NC(=O)OC WPBNNNQJVZRUHP-UHFFFAOYSA-L 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 229910001507 metal halide Inorganic materials 0.000 description 1
- 150000005309 metal halides Chemical class 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- FQPSGWSUVKBHSU-UHFFFAOYSA-N methacrylamide Chemical compound CC(=C)C(N)=O FQPSGWSUVKBHSU-UHFFFAOYSA-N 0.000 description 1
- 125000005397 methacrylic acid ester group Chemical group 0.000 description 1
- UZKWTJUDCOPSNM-UHFFFAOYSA-N methoxybenzene Substances CCCCOC=C UZKWTJUDCOPSNM-UHFFFAOYSA-N 0.000 description 1
- 229920000609 methyl cellulose Polymers 0.000 description 1
- 229940050176 methyl chloride Drugs 0.000 description 1
- 239000001923 methylcellulose Substances 0.000 description 1
- 235000010981 methylcellulose Nutrition 0.000 description 1
- ZIUHHBKFKCYYJD-UHFFFAOYSA-N n,n'-methylenebisacrylamide Chemical compound C=CC(=O)NCNC(=O)C=C ZIUHHBKFKCYYJD-UHFFFAOYSA-N 0.000 description 1
- GEMHFKXPOCTAIP-UHFFFAOYSA-N n,n-dimethyl-n'-phenylcarbamimidoyl chloride Chemical compound CN(C)C(Cl)=NC1=CC=CC=C1 GEMHFKXPOCTAIP-UHFFFAOYSA-N 0.000 description 1
- POVITWJTUUJBNK-UHFFFAOYSA-N n-(4-hydroxyphenyl)prop-2-enamide Chemical compound OC1=CC=C(NC(=O)C=C)C=C1 POVITWJTUUJBNK-UHFFFAOYSA-N 0.000 description 1
- WQEPLUUGTLDZJY-UHFFFAOYSA-N n-Pentadecanoic acid Natural products CCCCCCCCCCCCCCC(O)=O WQEPLUUGTLDZJY-UHFFFAOYSA-N 0.000 description 1
- 125000001624 naphthyl group Chemical group 0.000 description 1
- 230000007935 neutral effect Effects 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 229920001778 nylon Polymers 0.000 description 1
- QIQXTHQIDYTFRH-UHFFFAOYSA-N octadecanoic acid Chemical compound CCCCCCCCCCCCCCCCCC(O)=O QIQXTHQIDYTFRH-UHFFFAOYSA-N 0.000 description 1
- OQCDKBAXFALNLD-UHFFFAOYSA-N octadecanoic acid Natural products CCCCCCCC(C)CCCCCCCCC(O)=O OQCDKBAXFALNLD-UHFFFAOYSA-N 0.000 description 1
- 229960002446 octanoic acid Drugs 0.000 description 1
- 229920002114 octoxynol-9 Polymers 0.000 description 1
- 239000003921 oil Substances 0.000 description 1
- 229920000620 organic polymer Polymers 0.000 description 1
- 125000002524 organometallic group Chemical group 0.000 description 1
- 150000004866 oxadiazoles Chemical class 0.000 description 1
- QNGNSVIICDLXHT-UHFFFAOYSA-N para-ethylbenzaldehyde Natural products CCC1=CC=C(C=O)C=C1 QNGNSVIICDLXHT-UHFFFAOYSA-N 0.000 description 1
- 239000012188 paraffin wax Substances 0.000 description 1
- 229920002866 paraformaldehyde Polymers 0.000 description 1
- WXZMFSXDPGVJKK-UHFFFAOYSA-N pentaerythritol Chemical compound OCC(CO)(CO)CO WXZMFSXDPGVJKK-UHFFFAOYSA-N 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 229920001568 phenolic resin Polymers 0.000 description 1
- 150000002989 phenols Chemical class 0.000 description 1
- 229920006287 phenoxy resin Polymers 0.000 description 1
- 239000013034 phenoxy resin Substances 0.000 description 1
- NBIIXXVUZAFLBC-UHFFFAOYSA-K phosphate Chemical compound [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 description 1
- 239000003504 photosensitizing agent Substances 0.000 description 1
- 239000002985 plastic film Substances 0.000 description 1
- 229920006255 plastic film Polymers 0.000 description 1
- 229920000435 poly(dimethylsiloxane) Polymers 0.000 description 1
- 229920002239 polyacrylonitrile Polymers 0.000 description 1
- 229920002647 polyamide Polymers 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 229920005668 polycarbonate resin Polymers 0.000 description 1
- 239000004431 polycarbonate resin Substances 0.000 description 1
- 229920001225 polyester resin Polymers 0.000 description 1
- 239000004645 polyester resin Substances 0.000 description 1
- 239000005518 polymer electrolyte Substances 0.000 description 1
- 229920000259 polyoxyethylene lauryl ether Polymers 0.000 description 1
- 239000000256 polyoxyethylene sorbitan monolaurate Substances 0.000 description 1
- 235000010486 polyoxyethylene sorbitan monolaurate Nutrition 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- XAEFZNCEHLXOMS-UHFFFAOYSA-M potassium benzoate Chemical compound [K+].[O-]C(=O)C1=CC=CC=C1 XAEFZNCEHLXOMS-UHFFFAOYSA-M 0.000 description 1
- 159000000001 potassium salts Chemical class 0.000 description 1
- NNHHDJVEYQHLHG-UHFFFAOYSA-N potassium silicate Chemical compound [K+].[K+].[O-][Si]([O-])=O NNHHDJVEYQHLHG-UHFFFAOYSA-N 0.000 description 1
- 229910052913 potassium silicate Inorganic materials 0.000 description 1
- 235000019353 potassium silicate Nutrition 0.000 description 1
- BHZRJJOHZFYXTO-UHFFFAOYSA-L potassium sulfite Chemical compound [K+].[K+].[O-]S([O-])=O BHZRJJOHZFYXTO-UHFFFAOYSA-L 0.000 description 1
- 235000019252 potassium sulphite Nutrition 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 235000019260 propionic acid Nutrition 0.000 description 1
- 239000011241 protective layer Substances 0.000 description 1
- 150000003242 quaternary ammonium salts Chemical class 0.000 description 1
- IUVKMZGDUIUOCP-BTNSXGMBSA-N quinbolone Chemical compound O([C@H]1CC[C@H]2[C@H]3[C@@H]([C@]4(C=CC(=O)C=C4CC3)C)CC[C@@]21C)C1=CCCC1 IUVKMZGDUIUOCP-BTNSXGMBSA-N 0.000 description 1
- 239000011541 reaction mixture Substances 0.000 description 1
- 230000002940 repellent Effects 0.000 description 1
- 239000005871 repellent Substances 0.000 description 1
- 238000007788 roughening Methods 0.000 description 1
- ZLGIYFNHBLSMPS-ATJNOEHPSA-N shellac Chemical compound OCCCCCC(O)C(O)CCCCCCCC(O)=O.C1C23[C@H](C(O)=O)CCC2[C@](C)(CO)[C@@H]1C(C(O)=O)=C[C@@H]3O ZLGIYFNHBLSMPS-ATJNOEHPSA-N 0.000 description 1
- 239000004208 shellac Substances 0.000 description 1
- 229940113147 shellac Drugs 0.000 description 1
- 235000013874 shellac Nutrition 0.000 description 1
- 229910000077 silane Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 229940047670 sodium acrylate Drugs 0.000 description 1
- 235000017550 sodium carbonate Nutrition 0.000 description 1
- 229910000029 sodium carbonate Inorganic materials 0.000 description 1
- 239000011780 sodium chloride Substances 0.000 description 1
- FAPWRFPIFSIZLT-UHFFFAOYSA-M sodium chloride Inorganic materials [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 1
- 235000019795 sodium metasilicate Nutrition 0.000 description 1
- NTHWMYGWWRZVTN-UHFFFAOYSA-N sodium silicate Chemical compound [Na+].[Na+].[O-][Si]([O-])=O NTHWMYGWWRZVTN-UHFFFAOYSA-N 0.000 description 1
- 229910052911 sodium silicate Inorganic materials 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000003381 stabilizer Substances 0.000 description 1
- 239000008117 stearic acid Substances 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 150000005846 sugar alcohols Polymers 0.000 description 1
- BDHFUVZGWQCTTF-UHFFFAOYSA-M sulfonate Chemical compound [O-]S(=O)=O BDHFUVZGWQCTTF-UHFFFAOYSA-M 0.000 description 1
- 150000008054 sulfonate salts Chemical class 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- 239000011975 tartaric acid Substances 0.000 description 1
- 235000002906 tartaric acid Nutrition 0.000 description 1
- 125000005207 tetraalkylammonium group Chemical group 0.000 description 1
- 150000003573 thiols Chemical class 0.000 description 1
- 229910052718 tin Inorganic materials 0.000 description 1
- 239000011135 tin Substances 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 1
- KHPCPRHQVVSZAH-UHFFFAOYSA-N trans-cinnamyl beta-D-glucopyranoside Natural products OC1C(O)C(O)C(CO)OC1OCC=CC1=CC=CC=C1 KHPCPRHQVVSZAH-UHFFFAOYSA-N 0.000 description 1
- 150000003918 triazines Chemical class 0.000 description 1
- AAAQKTZKLRYKHR-UHFFFAOYSA-N triphenylmethane Chemical compound C1=CC=CC=C1C(C=1C=CC=CC=1)C1=CC=CC=C1 AAAQKTZKLRYKHR-UHFFFAOYSA-N 0.000 description 1
- HGBOYTHUEUWSSQ-UHFFFAOYSA-N valeric aldehyde Natural products CCCCC=O HGBOYTHUEUWSSQ-UHFFFAOYSA-N 0.000 description 1
- LLWJPGAKXJBKKA-UHFFFAOYSA-N victoria blue B Chemical compound [Cl-].C1=CC(N(C)C)=CC=C1C(C=1C=CC(=CC=1)N(C)C)=C(C=C1)C2=CC=CC=C2C1=[NH+]C1=CC=CC=C1 LLWJPGAKXJBKKA-UHFFFAOYSA-N 0.000 description 1
- ROVRRJSRRSGUOL-UHFFFAOYSA-N victoria blue bo Chemical compound [Cl-].C12=CC=CC=C2C(NCC)=CC=C1C(C=1C=CC(=CC=1)N(CC)CC)=C1C=CC(=[N+](CC)CC)C=C1 ROVRRJSRRSGUOL-UHFFFAOYSA-N 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
- 239000003799 water insoluble solvent Substances 0.000 description 1
- 239000011592 zinc chloride Substances 0.000 description 1
- 235000005074 zinc chloride Nutrition 0.000 description 1
Landscapes
- Photosensitive Polymer And Photoresist Processing (AREA)
Abstract
Description
【発明の詳細な説明】
[産業上の利用分野]
本発明は、水なし平版印刷版用原版の現像処理方法に関
するものであり、更に詳しくはシリコーンゴム層のキズ
付きが防止され、画質、網点画像再現性に優れ、かつ安
全性、環境保全性が良好であると共にインクの着肉性が
向上した水なし平版印刷版用原版の現像処理方法に関す
るものである。Detailed Description of the Invention [Field of Industrial Application] The present invention relates to a method for developing a waterless lithographic printing plate precursor, and more specifically, it prevents scratches on the silicone rubber layer and improves image quality and mesh. The present invention relates to a method for developing a waterless lithographic printing plate precursor that has excellent point image reproducibility, good safety and environmental protection, and improved ink receptivity.
[発明の背景]
従来、水なし平版印刷版用原版としては、支持体上に感
光層及びインキ反発層を順次塗設した構成を有するもの
を始め、種々のものが知られている。[Background of the Invention] Various types of waterless lithographic printing plate precursors have been known, including those having a structure in which a photosensitive layer and an ink repellent layer are sequentially coated on a support.
この水なし平版印刷版用原版は画像露光された後、現像
されるが、これに使用される現像液としては、従来アイ
ソパーHやトルエン等の炭化水素系の有機溶剤を用いた
ものが知られているが、前記水なし平版印刷版用原版の
現像処理方法としては、例えば特公昭56−30856
号公報には、光重合接着層、シリコーンゴム層を順次設
けた印刷用原版を画像模様に露光し、ついでパラフィン
系炭化水素系等のシリコーンゴムを膨潤し得る性質の現
像液を用いて現像し未露光部分のシリコーンゴム層を除
去した後、水を主成分とする処理液を用いて未露光部分
に残存する光重合接着層を除去することにより紙粉の付
着が防止され、非画線部表面を傷付けることなく、再現
性の良好な平版印刷板か得られることか記載されている
。This waterless lithographic printing plate precursor is imagewise exposed and then developed, and the developer used for this is conventionally known to use a hydrocarbon-based organic solvent such as Isopar H or toluene. However, as a developing treatment method for the waterless lithographic printing plate precursor, for example, Japanese Patent Publication No. 56-30856
The publication discloses that a printing original plate having a photopolymerizable adhesive layer and a silicone rubber layer sequentially provided thereon is exposed to light in an image pattern, and then developed using a developer such as a paraffinic hydrocarbon-based developer capable of swelling the silicone rubber. After removing the silicone rubber layer in the unexposed areas, the photopolymerizable adhesive layer remaining in the unexposed areas is removed using a water-based treatment solution to prevent paper powder from adhering to the non-image areas. It is described that a lithographic printing plate with good reproducibility can be obtained without damaging the surface.
しかしながら、この現像処理方法は、パラフィン系炭化
水素等の有機溶剤を使用しているため、非画線部のシリ
コーンゴム層をも一部膨潤して除去されてしまうので、
非画線部のシリコーンゴム層の傷付きを完全に防止する
ことは困難であり、今一つ問題であるということができ
る。However, since this development method uses organic solvents such as paraffin hydrocarbons, the silicone rubber layer in non-image areas is partially swollen and removed.
It is difficult to completely prevent the silicone rubber layer in the non-image areas from being scratched, and this can be said to be a serious problem.
一方、シリコーンゴム層の傷付きを防止し、再現性を向
上させたものに、特公昭63−33140号公報かあり
、具体的には感光層とシリコーンゴム層とを順次有する
平版印刷板を像形状に露光した後、水、アルコール類等
の画線部の感光層の一部または全部を溶解し得る処理液
を用いて画線部の感光層の一部または全部を溶出させ、
ついてシリコーンゴム層を膨潤させる作用のない水また
は水を主成分とする溶媒の存在下で版面を擦ることによ
り画線部のシリコーンゴム層を除去する技術が開示され
ている。On the other hand, Japanese Patent Publication No. 63-33140 discloses a method that prevents scratches on the silicone rubber layer and improves reproducibility. After exposing to light in the shape, part or all of the photosensitive layer in the image area is eluted using a processing liquid such as water or alcohol that can dissolve part or all of the photosensitive layer in the image area,
A technique has been disclosed in which the silicone rubber layer in the image area is removed by rubbing the printing plate in the presence of water or a solvent containing water as a main component, which does not have the effect of swelling the silicone rubber layer.
しかしながら、この方法は、感光層の一部または全部が
溶解し、画線部のシリコーンゴム層との界面接着力が低
下して浮き上がった状態となる。However, in this method, part or all of the photosensitive layer dissolves, and the interfacial adhesive force with the silicone rubber layer in the image area decreases, resulting in a floating state.
このシリコーンゴム層は画線部のエツジ付近では強く付
着しているので、この部分のシリコーンゴム層の除去に
は強く擦る必要があり、このため非画線部のシリコーン
ゴム層に傷が付き易いという問題かある。This silicone rubber layer is strongly adhered near the edges of the image area, so it is necessary to rub it strongly to remove the silicone rubber layer in this area, which easily scratches the silicone rubber layer in the non-image area. There is a problem.
そこで、本発明者等は、前記問題点を種々検討した結果
、光硬化性感光層を有する水なし平版印刷版用原版の現
像処理方法において、第1にシリコーンゴム層の除去を
行い次いで感光層の除去を行うことて、前記問題点を解
決することかでき、この点に基すいて本発明は成された
。Therefore, as a result of various studies on the above-mentioned problems, the present inventors have developed a method for developing a waterless lithographic printing plate precursor having a photocurable photosensitive layer, in which the silicone rubber layer is first removed, and then the photosensitive layer is removed. The above-mentioned problems can be solved by removing the above, and the present invention has been accomplished based on this point.
[発明の目的]
したかって、本発明の目的は、シリコーンゴム層のキズ
付きが防止され、画質、網点画像再現性に優れ、かつ安
全性、環境保全性が良好であると共にインクの着肉性が
向上した水なし平版印刷版用原版の現像処理方法を提供
することにある。[Object of the Invention] Therefore, the object of the present invention is to prevent the silicone rubber layer from being scratched, to provide excellent image quality and halftone image reproducibility, and to provide good safety and environmental protection, as well as to provide a method for ink deposition. An object of the present invention is to provide a method for developing a waterless lithographic printing plate precursor with improved properties.
[発明の構成]
本発明の前記目的は、
l)支持体上に光硬化性感光層及びシリコーンゴム層を
順次有する水なし平版印刷版用原版の現像処理方法にお
いて、pH9未満の水を主成分とする処理液で処理した
後、p)19以上のアルカリ性処理液で処理することを
特徴とする水なし平版印刷版用原版の現像処理方法及び
、
2)第1項記載の光硬化性感光層がジアゾニウム化合物
を含むことを特徴とする水なし平版印刷版用原版の現像
処理方法によってそれぞれ達成された。[Structure of the Invention] The object of the present invention is to provide: l) A method for developing a waterless lithographic printing plate precursor having a photocurable photosensitive layer and a silicone rubber layer sequentially on a support, in which water with a pH of less than 9 is the main component. and 2) a photocurable photosensitive layer according to item 1. Each of these was achieved by a method for developing a waterless lithographic printing plate precursor, which is characterized in that it contains a diazonium compound.
以下、本発明を具体的に説明する。The present invention will be specifically explained below.
本発明の水なし平版印刷版用原版の現像処理方法に用い
られる現像液は、pH9未満の水を主成分とする処理液
(以下第1現像処理液という。)とpH9以上のアルカ
リ性処理?&(以下第2現像処理液という。)との2f
!類のものが用いられる。The developing solution used in the developing method for the waterless lithographic printing plate precursor of the present invention is a processing solution containing water as a main component with a pH of less than 9 (hereinafter referred to as the first development processing solution) and an alkaline processing solution with a pH of 9 or more. 2f with & (hereinafter referred to as the second developing solution)
! Similar types are used.
本発明の水なし平版印刷版用原版の現像処理方法は、露
光済の版材にp)19未満の水を主成分とする処理液で
処理した後、pH9以上のアルカリ性処理液で処理する
点にある。The development processing method for a waterless lithographic printing plate precursor of the present invention is that the exposed plate material is treated with a processing solution whose main component is water with a pH of less than p) 19, and then treated with an alkaline processing solution with a pH of 9 or more. It is in.
まず第1現像処理液は、版面の非画像部のシリコーンゴ
ム層を除去するものであり、現像液としては実質的に水
を用いている。First, the first developing solution is used to remove the silicone rubber layer in the non-image area of the printing plate, and water is essentially used as the developing solution.
第1現像処理液には他の成分として必要に応じて界面活
性剤(この界面活性剤としては後述の第2現像処理液中
に用いられる界面活性剤を用いることができる。)を0
.01重量%〜10重量%添加してもよく、また有機溶
剤については、シリコーンゴム層や感光層を溶解しない
範囲で加えることができる。更に版の画像を識別するた
めに色素を加えてもよい。The first developing solution contains 0 surfactant (the surfactant used in the second developing solution described below can be used as this surfactant) as another component if necessary.
.. The organic solvent may be added in an amount of 0.01% to 10% by weight, and the organic solvent may be added within a range that does not dissolve the silicone rubber layer or the photosensitive layer. Additionally, dyes may be added to identify the image on the plate.
第2現像処理液は、感光層を除去しインク着肉を高める
ために用いられ、好ましくは珪酸カリウムを含有してお
り、p)111〜14に調整するのがよい。またアニオ
ン又はノニオン界面活性剤を添加することができ、更に
は有機カルボン酸及び/又はその塩や亜硫酸塩を添加す
ることができる。The second developing solution is used to remove the photosensitive layer and improve ink adhesion, preferably contains potassium silicate, and is preferably adjusted to p) 111 to 14. Further, an anionic or nonionic surfactant can be added, and further an organic carboxylic acid and/or its salt or sulfite can be added.
アニオン型界面活性剤としては、高級アルコール(Ca
−C22)硫酸エステル塩類[例えば、ラウリルアルコ
ールサルフェートのナトリウム塩、セチルアルコールサ
ルフェートのナトリウム塩、ラウリルアルコールサルフ
ェートのアンモニウム塩、「ティーボールB−81J
(商品名・シェル化学社製)、第二ナトリウムアルキ
ルサルフェート等コ、脂肪族アルコールリン酸エステル
塩類(例えば、セチルアルコールリン酸エステルのナト
リウム塩等)、アルキルアリールスルホン酸塩類(例え
ば、ドデシルベンゼンスルホン酸ナトリウム塩、イソプ
ロピルナフタレンスルホン酸のナトリウム塩、シナフタ
レンジスルホン酸のナトリウム塩、メタニトロベンゼン
スルホン酸のナトリウム塩等)、アルキルアミドのスル
ホン酸塩二塩基性脂肪酸エステルのスルホン酸塩類(例
えば、ナトリウムスルホコハク酸ジオクチルエステル、
ナトリウムスルホコハク酸ジヘキシルエステル等)があ
る。これらの中で特にスルホン酸塩類が好適に用いられ
る。As anionic surfactants, higher alcohols (Ca
-C22) Sulfuric ester salts [e.g., sodium salt of lauryl alcohol sulfate, sodium salt of cetyl alcohol sulfate, ammonium salt of lauryl alcohol sulfate, "T-Ball B-81J
(trade name, manufactured by Shell Chemical Co., Ltd.), sodium chloride alkyl sulfate, aliphatic alcohol phosphate ester salts (e.g., sodium salt of cetyl alcohol phosphate, etc.), alkylaryl sulfonates (e.g., dodecylbenzenesulfone) sodium salts of isopropylnaphthalenesulfonic acid, sodium salts of sinapthalenedisulfonic acid, sodium salts of metanitrobenzenesulfonic acid, etc.), sulfonates of alkylamides, sulfonates of dibasic fatty acid esters (e.g. acid dioctyl ester,
sodium sulfosuccinate dihexyl ester, etc.). Among these, sulfonate salts are particularly preferably used.
アニオン型界面活性剤の含有量としては、災羞液全体に
対して、1重量%〜30重量%、好ましくは3重量%〜
15重量%である。The content of the anionic surfactant is 1% to 30% by weight, preferably 3% to 30% by weight, based on the entire liquid.
It is 15% by weight.
またノニオン型界面活性剤としては、種々のものが使用
できる。Furthermore, various types of nonionic surfactants can be used.
即ち、ノニオン型界面活性剤は大別すると、ポリエチレ
ングリコール型と多価アルコール型に分類することがで
き、本発明にはこのどちらでも使用することができるが
、効果の大きい点からはポリエチレングリコール型のノ
ニオン型界面活性剤がこのまっしい。That is, nonionic surfactants can be broadly classified into polyethylene glycol type and polyhydric alcohol type, and either of these can be used in the present invention, but polyethylene glycol type is most effective. This is a nonionic surfactant.
その中でもエチレンオキサイド基(−CH2CH20−
)を3つ以上有し、かつ)ILB値(HLB値はHyd
rophile Lipophile Ba1ance
の略)が5つ以上(より好ましくは8〜20)のノニオ
ン型界面活性剤がより好ましい。Among them, ethylene oxide group (-CH2CH20-
)3 or more, and) ILB value (HLB value is Hyd
rophile Lipophile Ba1ance
A nonionic surfactant having 5 or more (more preferably 8 to 20) surfactants is more preferable.
また、ノニオン型界面活性剤のうち、エチレンオキシ基
とプロピレンオキシド基の両者を有するものが特に好ま
しく、その中で)ILB値が8以上のものがより好まし
い。Furthermore, among nonionic surfactants, those having both an ethylene oxy group and a propylene oxide group are particularly preferable, and among these, those having an ILB value of 8 or more are more preferable.
本発明に用いられるノニオン型界面活性剤の好ましい例
としては、下記の一般式[I]〜−数式[■]で表され
る化合物が挙げられる。Preferred examples of the nonionic surfactant used in the present invention include compounds represented by the following general formulas [I] to -numerical formulas [■].
数式[1コ
R−0−(CH2C)+20) n)l−数式[2]
一般式[3コ
L
R−0−(CH2CH2)m−’(CH2CH2O)
nH−数式[4コ
数式[5]
一般式
[6]
HO(C2H40)a−(C3H60)b−(C2H4
0)cH−数式[7]
数式[8]
)10− (CH2C820) nH
−数式[1]〜−数式[8]において、Rは水素原子又
は1価の有機基を表す。該有機きとしては、例えば直鎖
もしくは分岐の炭素数1〜30の置換基(例えばフェニ
ル基のようなアリール基)を有していてもよいアルキル
基、アルキル部分が上記アルキル基であるアルキルカル
ボニル基、置換基(例えはヒドロキシル基、上記のよう
なアルキル基等)を有していてもよいフェニル基等が挙
げられる。Formula [1 R-0-(CH2C)+20) n)l-Formula [2] General formula [3 L R-0-(CH2CH2)m-'(CH2CH2O)
nH-Formula [4 formulas [5] General formula [6] HO(C2H40)a-(C3H60)b-(C2H4
0) cH - Formula [7] Formula [8] ) 10 - (CH2C820) nH - Formula [1] to - Formula [8], R represents a hydrogen atom or a monovalent organic group. The organic group includes, for example, a linear or branched alkyl group which may have a substituent having 1 to 30 carbon atoms (for example, an aryl group such as a phenyl group), and an alkylcarbonyl group in which the alkyl moiety is the above-mentioned alkyl group. and a phenyl group which may have a substituent (eg, a hydroxyl group, an alkyl group as described above, etc.).
a、b、c、m、n、x及びyは各々1〜4゜の整数を
表す。a, b, c, m, n, x and y each represent an integer of 1 to 4 degrees.
次に本発明に用いられる非イオン型界面活性剤の具体例
を示す。Next, specific examples of the nonionic surfactant used in the present invention will be shown.
ポリエチレングリコール、ポリオキシエチレンラウリル
エーテル、ポリオキシエチレンノニルエーテル、ポリオ
キシエチレンセチルエーテル、ポリオキシエチレンステ
アリルエーテル、ポリオキシエチレンベヘニルエーテル
、ポリオキシエチレンポリオキシプロピレンセチルエー
テル、ポリオキシエチレンポリオキシプロピレンベヘニ
ルエーテル、ポリオキシエチレンノニルフェニルエーテ
ル、ポリオキシエチレンオクチルフェニルエーテル、ポ
リオキシエチレンステアリルアミン、ポリオキシエチレ
ンオレイルアミン、ポリオキシエチレンステアリン酸ア
ミド、ポリオキシエチレンオレイン酸アミド、ポリオキ
シエチレンヒマシ油、ポリオキシエチレンアビエチルエ
ーテル、ポリオキシエチレンラノリンエーテル、ポリオ
キシエチレンモノラウレート、ポリオキシエチレンモノ
ステアレート、ポリオキシエチレングリセリルモノオレ
ート、ポリオキシエチレングリセルモノステアレート、
ポリオキシエチレンプロピレングリコールモノステアレ
ート、オキシエチレンオキシプロピレンブロックボリマ
ー ジスデシン化フェノールポリエチレンオキシド付加
物、トリベンジルフェノールポリエチレンオキシド付加
物、オクチルフェノールポリオキシエチレンポリオキシ
ブロビレン付加物、グリセロールモノステアレート、ソ
ルビタンモノラウレート、ポリオキシエチレンソルビタ
ンモノラウレート等本発明に用いる非イオン型界面活性
剤の重量平均分子量は300〜10000の範囲が好ま
しく、500〜5000の範囲が特に好ましい。Polyethylene glycol, polyoxyethylene lauryl ether, polyoxyethylene nonyl ether, polyoxyethylene cetyl ether, polyoxyethylene stearyl ether, polyoxyethylene behenyl ether, polyoxyethylene polyoxypropylene cetyl ether, polyoxyethylene polyoxypropylene behenyl ether , polyoxyethylene nonylphenyl ether, polyoxyethylene octylphenyl ether, polyoxyethylene stearylamine, polyoxyethylene oleylamine, polyoxyethylene stearic acid amide, polyoxyethylene oleic acid amide, polyoxyethylene castor oil, polyoxyethylene abyssalin Ethyl ether, polyoxyethylene lanolin ether, polyoxyethylene monolaurate, polyoxyethylene monostearate, polyoxyethylene glyceryl monooleate, polyoxyethylene glycer monostearate,
Polyoxyethylene propylene glycol monostearate, oxyethylene oxypropylene block polymer, disdecinated phenol polyethylene oxide adduct, tribenzylphenol polyethylene oxide adduct, octylphenol polyoxyethylene polyoxybrobylene adduct, glycerol monostearate, sorbitan mono The weight average molecular weight of the nonionic surfactant used in the present invention, such as laurate and polyoxyethylene sorbitan monolaurate, is preferably in the range of 300 to 10,000, particularly preferably in the range of 500 to 5,000.
非イオン型界面活性剤は1種を単独で含有させても、ま
た2種以上を併用しても良い。One nonionic surfactant may be contained alone, or two or more types may be used in combination.
本発明に係る現像液に添加される有機カルボン酸及び/
又はその塩としては、好ましくは炭素原子数6〜20の
脂肪族カルボン酸および芳香族カルボン酸である。Organic carboxylic acid and/or added to the developer according to the present invention
Or as a salt thereof, preferably an aliphatic carboxylic acid having 6 to 20 carbon atoms and an aromatic carboxylic acid.
炭素原子数6〜20の脂肪族カルボン酸の具体的な例と
しては、カプロン酸、エナンチル酸、カプリル酸、ペラ
ルゴン酸、カプリン酸、ラウリン酸、ミスチリン酸、パ
ルミチン酸、ステアリン酸等があり、特に好ましいのは
炭素原子数8〜12のアルカン酸である。また炭素鎖中
に二重結合を有する脂肪酸でも、枝分かれした炭素鎖の
ものでもよい。Specific examples of aliphatic carboxylic acids having 6 to 20 carbon atoms include caproic acid, enantylic acid, caprylic acid, pelargonic acid, capric acid, lauric acid, mystylic acid, palmitic acid, stearic acid, etc. Preferred are alkanoic acids having 8 to 12 carbon atoms. Further, fatty acids having a double bond in the carbon chain or those with branched carbon chains may be used.
上記脂肪族カルボン酸は水溶性を高めるためにナトリウ
ムやカリウムの塩またはアンモニウム塩として用いるの
が好ましい。The above aliphatic carboxylic acids are preferably used as sodium or potassium salts or ammonium salts in order to improve water solubility.
芳香族カルホン酸としては、ベンゼン環、ナフタレン環
、アントラセン環等にアルボキシル基がW t!された
化合物で、具体的な化合物としては、安息香酸、0−ク
ロロ安息香酸、p−o−りoロチP、香酸、0−ヒドロ
キシ安息香酸、p−ヒドロキシ安息香酸、0−アミノ安
息香酸、p−アミノ安息香酸、2.4−ジヒドロキシ安
息香酸、2゜5−ジヒドロキシ安息香酸、2,6−ジヒ
ドロキシ安息香酸、2.3−ジヒドロキシ安息香酸、3
.5−ジヒドロキシ安息香酸、没食子酸、1ヒドロキシ
−2−ナフトエ酸、3−ヒドロキシ−2−ナフトエ酸、
2−ヒドロキシ−1−ナフトエ酸、1−ナフトエ酸、2
−ナフトエ酸等があるが、この中でも芳香族カルボン酸
は特に有効である。上記芳香族カルボン酸は水溶性を高
めるためにナトリウムやカリウムの塩またはアンモニウ
ム塩として用いるのが好ましい。Aromatic carbonic acids include a benzene ring, naphthalene ring, anthracene ring, etc. with an alkoxyl group W t! Specific compounds include benzoic acid, 0-chlorobenzoic acid, po-roti-P, folic acid, 0-hydroxybenzoic acid, p-hydroxybenzoic acid, and 0-aminobenzoic acid. , p-aminobenzoic acid, 2,4-dihydroxybenzoic acid, 2゜5-dihydroxybenzoic acid, 2,6-dihydroxybenzoic acid, 2,3-dihydroxybenzoic acid, 3
.. 5-dihydroxybenzoic acid, gallic acid, 1-hydroxy-2-naphthoic acid, 3-hydroxy-2-naphthoic acid,
2-hydroxy-1-naphthoic acid, 1-naphthoic acid, 2
- Naphthoic acid, among others, aromatic carboxylic acids are particularly effective. The above aromatic carboxylic acid is preferably used as a sodium or potassium salt or an ammonium salt in order to improve water solubility.
本発明の現像液に添加する有機カルボン酸の好ましい添
加量は、0.1重量%〜10重量%の範囲であり、より
好ましくは0.5重量%〜4重量%の範囲が適当である
。The amount of organic carboxylic acid added to the developer of the present invention is preferably in the range of 0.1% to 10% by weight, more preferably in the range of 0.5% to 4% by weight.
本発明に用いられる亜硫酸塩としては、亜硫酸ナトリウ
ム、亜硫酸カリウム、亜硫酸リチウム亜硫酸アンモニウ
ム等が有用である。As the sulfite used in the present invention, sodium sulfite, potassium sulfite, lithium sulfite ammonium sulfite, etc. are useful.
本発明に用いられる現像液には、更に以下のような添加
剤を加えることができる。例えば、特開昭58−751
52号公報記載のNaCR%KCI、KBr等の中性塩
、特開昭58−190952号公報記載のEDTA%N
TA等のキレート剤、特開昭59−121336号公報
記載の[Co (N)13) al Cl1−COC4
’2・6H20等の錯体、特開昭50−51324号公
報記載のアルキルナフタレンスルホン酸ソーダ、N−テ
トラデシルN、N−ジヒドロキシエチルベタイン等のア
ニオンまたは両性界面活性剤、米国特許第4,374,
920号明細書記載のテトラメチルデシンジオール等の
非イオン性界面活性剤、特開昭55−95946号公報
記載のp−ジメチルアミノメチルポリスチレンのメチル
クロライドの第4級化合物等のカチオニックポリマー、
特開昭56−142528号公報記載のビニルベンジル
トリメチルアンモニウムクロライドとアクリル酸ナトリ
ウムの共重合体等の両性高分子電解質、特開昭57−1
92952号公報記載の亜硫酸ナトリウム等の還元性無
機塩、特開昭58−59444号公報記載の塩化リチウ
ム等の無機リチウム化合物、特公昭50−34442号
公報記載の安息香酸リチウム等の有機リチウム化合物、
特開昭59−75255号公報記載の硅素、チタン等を
含む有機金属界面活性剤、特開昭59−84241号公
報記載の有機ホウ素化合物、ヨーロッパ特許第1010
10号明細書記載のテトラアルキルアンモニウムオキサ
イド等の第4級アンモニウム塩等の添加剤が挙げられる
。The following additives can be further added to the developer used in the present invention. For example, JP-A-58-751
Neutral salts such as NaCR%KCI and KBr described in JP-A-52, EDTA%N as described in JP-A-58-190952
Chelating agents such as TA, [Co (N)13) al Cl1-COC4 described in JP-A-59-121336;
complexes such as '2.6H20, anionic or amphoteric surfactants such as sodium alkylnaphthalene sulfonate described in JP-A-50-51324, N-tetradecyl N, and N-dihydroxyethyl betaine, U.S. Patent No. 4,374,
Nonionic surfactants such as tetramethyldecynediol described in No. 920, cationic polymers such as quaternary compounds of methyl chloride of p-dimethylaminomethyl polystyrene described in JP-A-55-95946;
Ampholytic polymer electrolyte such as a copolymer of vinylbenzyltrimethylammonium chloride and sodium acrylate described in JP-A-56-142528, JP-A-57-1
Reducing inorganic salts such as sodium sulfite described in Japanese Patent Publication No. 92952, inorganic lithium compounds such as lithium chloride described in JP-A No. 58-59444, organic lithium compounds such as lithium benzoate described in Japanese Patent Publication No. 50-34442,
Organometallic surfactants containing silicon, titanium, etc. described in JP-A-59-75255, organoboron compounds described in JP-A-59-84241, European Patent No. 1010
Examples include additives such as quaternary ammonium salts such as tetraalkylammonium oxides described in Specification No. 10.
本発明の現像液に適した感光層には、ジアゾ化合物、光
重合性化合物、光架橋性化合物等が用いられる。好まし
くはジアゾ化合物が用いられる。For the photosensitive layer suitable for the developer of the present invention, a diazo compound, a photopolymerizable compound, a photocrosslinkable compound, etc. are used. Preferably, diazo compounds are used.
本発明の感光層に用いられる感光性物質の例としては、
まず、本発明に用いられる感光層としては、ジアゾ樹脂
の種々のものを含むが、好ましくは、p−ジアゾジフェ
ニルアミンとホルムアルデヒドとの縮合物で代表される
ジアゾ樹脂であって、水不溶性で有機溶媒可溶性のもの
で、好ましくは特公昭47−1167号及び同57−4
3890号公報等に記載されているような水不溶性かつ
通常の有機溶媒可溶性のものが使用される。特に好まし
くは下記の一般式[11で示されるジアゾ樹脂である。Examples of photosensitive substances used in the photosensitive layer of the present invention include:
First, the photosensitive layer used in the present invention includes various diazo resins, but preferably a diazo resin represented by a condensate of p-diazodiphenylamine and formaldehyde, which is water-insoluble and organic solvent. Soluble, preferably Japanese Patent Publication No. 47-1167 and No. 57-4
Those that are water-insoluble and soluble in ordinary organic solvents, such as those described in Japanese Patent No. 3890, are used. Particularly preferred is a diazo resin represented by the following general formula [11].
一般式[I]
[式中、RI R2およびR3は、水素原子、アルキ
ル基又はアルコキシ基を示し、R4は水素原子、アルキ
ル基又はフェニル基を示す。General Formula [I] [In the formula, RI R2 and R3 represent a hydrogen atom, an alkyl group, or an alkoxy group, and R4 represents a hydrogen atom, an alkyl group, or a phenyl group.
XはPF6又は BF4を示し、Yは−NH−−S−又
は−〇−を示す。]
本発明に用いられるジアゾ樹脂におけるジアゾモノマー
としては、例えば、4−ジアゾ−ジフェニルアミン、l
−ジアゾ−4−N、N−ジメチルアミノベンゼン、1−
ジアゾ−4−N、N−ジエチルアミノベンゼン、l−ジ
アゾ−4−N−エチル−N−ヒドロキシエチル−ミノベ
ンゼン、l−ジアゾ−4−N−メチル−N−ヒドロキシ
エチルアミノベンゼン、1−ジアゾ−2,5−ジェトキ
シ−4−ベンゾイルアミノベンゼン、l−ジアゾ−4−
N−ベンジルアミノベンゼン、l−ジアゾ−4−N、N
−ジメチルアミノベンゼン、1−ジアゾ−4−モルホリ
ノベンゼン、1−ジアゾ−2,5−ジメトキシ−4−p
−トリルメルカプトベンゼン、1−ジアゾ−2−二トキ
シ−4−N、N−ジメチルアミノベンゼン、p−ジアゾ
ージメチルアニルン、l−ジアゾ−2,5−ジブトキシ
−4−モルホリノベンゼン、l−ジアゾ−2,5−ジェ
トキシ−4−モルホリノベンゼン、1−ジアゾ−2,5
−ジメトキシ−4−モルホリノベンゼン、1−ジアゾ−
2,5−ジェトキシ−4−p−トリルメルカプトベンゼ
ン、l−ジアゾ−4−N−エチル−N−ヒドロキシエチ
ルアミノベンゼン、1−ジアゾ−3−エトキシ−4−N
−メチル−N−ベンジルアミノベンゼン、1−ジアゾ−
3−クロロ−4−N、N−ジエチルアミノベンゼン、l
−ジアゾ−3−メチル−4−ピロリジノベンゼン、1−
ジアゾ−2−クロロ−4−N、N−ジメチルアミノ−5
−メトキシベンゼン、l−ジアゾ−3−メトキシ−4−
ピロリジノベンゼン、3−メトキシ−4−ジアゾジフェ
ニルアミン、3−エトキシ−4−ジアゾジフェニルアミ
ン、3(n−プロポキシ)−4−ジアゾジフェニルアミ
ン、3−(イソプロポキシ)−4−ジアゾジフェニルア
ミン等か挙げられる。X represents PF6 or BF4, and Y represents -NH--S- or -0-. ] Examples of the diazo monomer in the diazo resin used in the present invention include 4-diazo-diphenylamine, l
-Diazo-4-N,N-dimethylaminobenzene, 1-
Diazo-4-N, N-diethylaminobenzene, l-diazo-4-N-ethyl-N-hydroxyethyl-minobenzene, l-diazo-4-N-methyl-N-hydroxyethylaminobenzene, 1-diazo-2 , 5-jethoxy-4-benzoylaminobenzene, l-diazo-4-
N-benzylaminobenzene, l-diazo-4-N,N
-dimethylaminobenzene, 1-diazo-4-morpholinobenzene, 1-diazo-2,5-dimethoxy-4-p
-Tolylmercaptobenzene, 1-diazo-2-ditoxy-4-N,N-dimethylaminobenzene, p-diazodimethylaniline, l-diazo-2,5-dibutoxy-4-morpholinobenzene, l-diazo -2,5-jethoxy-4-morpholinobenzene, 1-diazo-2,5
-dimethoxy-4-morpholinobenzene, 1-diazo-
2,5-jethoxy-4-p-tolylmercaptobenzene, l-diazo-4-N-ethyl-N-hydroxyethylaminobenzene, 1-diazo-3-ethoxy-4-N
-Methyl-N-benzylaminobenzene, 1-diazo-
3-chloro-4-N,N-diethylaminobenzene, l
-Diazo-3-methyl-4-pyrrolidinobenzene, 1-
Diazo-2-chloro-4-N,N-dimethylamino-5
-methoxybenzene, l-diazo-3-methoxy-4-
Examples include pyrrolidinobenzene, 3-methoxy-4-diazodiphenylamine, 3-ethoxy-4-diazodiphenylamine, 3(n-propoxy)-4-diazodiphenylamine, and 3-(isopropoxy)-4-diazodiphenylamine.
前記ジアゾモノマーとの縮合剤として用いられるアルデ
ヒドとしては、例えは、ホルムアルデヒド、アセトアル
デヒド、プロピオンアルデヒド、ブチルアルデヒド、イ
ソブチルアルデヒド、またはベンズアルデヒド等が挙げ
られる。Examples of the aldehyde used as a condensing agent with the diazo monomer include formaldehyde, acetaldehyde, propionaldehyde, butyraldehyde, isobutyraldehyde, and benzaldehyde.
更に陰イオンとしては、塩素イオンやテトラクロロ亜鉛
酸等を用いることにより水溶性のジアソ樹脂を得ること
ができ、また四フッ化ホウ素、六フッ化燐酸、トリイソ
プロピルナフタレンスルホン酸、4,4°−ビフェニル
ジスルホン酸、2.5−ジメチルベンゼンスルホン酸、
2−ニトロベンゼンスルホン酸、2−メトキシ−4−ヒ
ドロキシづ−ベンゾイル−ヘンセンスルホン酸等を用い
ることにより、有機溶剤可溶性のジアゾ樹脂を得ること
がてきる。特に好ましくは、六フッ化燐酸からなるジア
ゾ樹脂か用いられる。Furthermore, water-soluble diaso resins can be obtained by using chloride ions, tetrachlorozinc acid, etc. as anions, and boron tetrafluoride, hexafluorophosphoric acid, triisopropylnaphthalenesulfonic acid, 4,4° -biphenyldisulfonic acid, 2,5-dimethylbenzenesulfonic acid,
By using 2-nitrobenzenesulfonic acid, 2-methoxy-4-hydroxybenzoyl-hensensulfonic acid, etc., it is possible to obtain a diazo resin soluble in organic solvents. Particularly preferably, a diazo resin made of hexafluorophosphoric acid is used.
ジアゾ樹脂は皮膜形成性樹脂、特に水酸基を有する高分
子化合物と混合して使用するのが好ましい。特に好まし
くは、高分子化合物としては、側鎖に脂肪族水酸基を有
する千ツマ−1例えば2−ヒドロキシエチルアクリレー
ト又は2−ヒドロキシエチルメタクリレートと他の共重
合し得る千ツマ−との共重合体が挙げられる。The diazo resin is preferably used in combination with a film-forming resin, particularly a polymer compound having a hydroxyl group. Particularly preferably, the polymer compound is a copolymer of 2-hydroxyethyl acrylate or 2-hydroxyethyl methacrylate having an aliphatic hydroxyl group in its side chain, and other copolymerizable mercury. Can be mentioned.
これら以外にも、必要に応じてポリビニルブチラール樹
脂、ポリウレタン樹脂、ポリアミド樹脂、エポキシ樹脂
、ノボラック樹脂、天然樹脂等を添加してもよい。In addition to these, polyvinyl butyral resins, polyurethane resins, polyamide resins, epoxy resins, novolak resins, natural resins, etc. may be added as necessary.
この他ジアゾニウム塩と併用される結合剤としては種々
の高分子化合物が使用され得るが、好ましくは特開昭5
4−98613号公報に記載されているような芳香族性
水酸基を有する単量体、例えばN−(4−ヒドロキシフ
ェニル)アクリルアミド、N−(4−ヒドロキシフェニ
ル)メタクリルアミド、o−、m −、またはp−ヒド
ロキシスチレン、o−、m−、またはp−ヒドロキシフ
ェニルメタクリレート等と他の単量体との共重合体、米
国特許第4.123.276号明細書に記載されている
ようなヒドロキシエチルアクリレート単位またはヒドロ
キシエチルメタクリレート単位を主なる繰り返し単位と
して含むポリマー等か挙げられる。In addition, various polymer compounds can be used as the binder used in combination with the diazonium salt, but preferably,
Monomers having an aromatic hydroxyl group such as those described in Japanese Patent No. 4-98613, such as N-(4-hydroxyphenyl)acrylamide, N-(4-hydroxyphenyl)methacrylamide, o-, m-, or copolymers of p-hydroxystyrene, o-, m-, or p-hydroxyphenyl methacrylate, etc., with other monomers, such as those described in U.S. Pat. No. 4,123,276. Examples include polymers containing ethyl acrylate units or hydroxyethyl methacrylate units as main repeating units.
これらポリマー以外にも、必要に応じてポリビニルブチ
ラール樹脂、ポリウレタン樹脂、ポリアミド樹脂、エポ
キシ樹脂、ノボラック樹脂、シェラツク、ロジン等の天
然樹脂、ポリビニルアルコル、米国特許第3.751,
257号明細書に記載されているポリアミド樹脂、米国
特許第3660.097号明細書に記載されている線状
ポリウレタン樹脂、ポリビニルアルコールのフタレート
化樹脂、ビスフェノールAとエピクロルヒドリンから縮
合されたエポキシ樹脂、酢酸セルロース、セルロースア
セテートフタレート等のセルロース類が含有される。In addition to these polymers, natural resins such as polyvinyl butyral resin, polyurethane resin, polyamide resin, epoxy resin, novolac resin, shellac, rosin, polyvinyl alcohol, U.S. Patent No. 3.751,
257, linear polyurethane resins as described in U.S. Pat. No. 3,660,097, phthalated polyvinyl alcohol resins, epoxy resins condensed from bisphenol A and epichlorohydrin, acetic acid. Contains celluloses such as cellulose and cellulose acetate phthalate.
アルカリ可溶性樹脂としては、ノボラック樹脂、フェノ
ール性水酸基を有するビニル系重合体、特開昭55−5
7841号公報に記載されている多価フェノールとアル
デヒド゛又はケトンとの縮合樹脂等が挙げられる。ノボ
ラック樹脂としては、例えはフェノール・ホルムアルデ
ヒド樹脂、クレゾール・ホルムアルデヒド樹脂、特開昭
55−57841号公報に記載されているようなフェノ
ール・クレゾール・ホルムアルデヒド共重縮合樹脂、特
開昭55−127553号公報に記載されているような
p−置換フェノールとフェノールもしくは、クレゾール
とホルムアルデヒドとの共重縮合樹脂等が挙げられる。Examples of the alkali-soluble resin include novolac resin, vinyl polymer having a phenolic hydroxyl group, and JP-A-55-5
Examples include condensation resins of polyhydric phenols and aldehydes or ketones described in Japanese Patent No. 7841. Examples of the novolac resin include phenol-formaldehyde resin, cresol-formaldehyde resin, phenol-cresol-formaldehyde copolycondensation resin as described in JP-A-55-57841, and JP-A-55-127553. Examples include copolycondensation resins of p-substituted phenol and phenol or cresol and formaldehyde as described in .
本発明に用いられるジアゾ樹脂は、バインダー樹脂と混
合して用いられるが、このバインダー樹脂を100とし
た場合に、ジアゾ樹脂30〜200(重量比)の範囲か
よく、好ましくは50〜150更に好ましくは70〜1
20の範囲である。The diazo resin used in the present invention is used in a mixture with a binder resin, and when this binder resin is taken as 100, the diazo resin may range from 30 to 200 (weight ratio), preferably from 50 to 150, and more preferably from 50 to 150. is 70-1
The range is 20.
これらの感光性組成物には、その他の染料、顔料等の色
素、感脂化剤、可塑剤、界面活性剤などを添加すること
ができる。これらの添加剤の添加量としては、感光層の
固形分中に0.1重量%〜20重量%、好ましくは0.
5重量%〜10重量%の範囲で用いられる。Other dyes, pigments such as pigments, fat-sensitizing agents, plasticizers, surfactants, etc. can be added to these photosensitive compositions. The amount of these additives added is 0.1% to 20% by weight, preferably 0.1% to 20% by weight in the solid content of the photosensitive layer.
It is used in a range of 5% to 10% by weight.
また重合体主鎖または側鎖に感光基として−CH−CH
−C−を含むポリエステル類、ポリアミド1
類、ポリカーボネート類のような感光性重合体を主成分
とするものも挙げられる。例えば、特開昭55−404
15号に記載されているようなフェニレンジエチルアク
リレートと水素添加したビスフェノールAおよびトリエ
チレングリコールとの縮合で得られる感光性ポリエステ
ル、米国特許第2,956.878号明細書中に記載さ
れているようなシンナミリデンマロン酸等の(2−プロ
ベリデン)マロン酸化合物C及び二官能性グリコール類
から話導される感光性ポリエステル類等が挙げられる。-CH-CH as a photosensitive group in the main chain or side chain of the polymer.
Also included are those whose main component is a photosensitive polymer such as -C--containing polyesters, polyamides, and polycarbonates. For example, JP-A-55-404
15, photosensitive polyesters obtained by condensation of phenylene diethyl acrylate with hydrogenated bisphenol A and triethylene glycol, as described in U.S. Pat. No. 2,956,878. Examples include photosensitive polyesters derived from (2-probeliden)malonic acid compounds C such as cinnamylidenemalonic acid and difunctional glycols.
さらにまた、付加重合性不飽和化合物からなる光重合性
組成物も挙げられる。Furthermore, a photopolymerizable composition comprising an addition polymerizable unsaturated compound may also be mentioned.
ここで不飽和上ツマ−としては、アルコール類(例えは
、エタノール、プロパツール、ヘキサノール、オクタツ
ール、シクロヘキサノール、エチレングリコール、プロ
ピレングリコール、ジエチレングリコール、トリエチレ
ングリコール、テトラエチレングリコール、ポリエチレ
ングリコール、グリセリン、トリメチロールプロパン、
ペンタエリスリトール等)のアクリル酸またはメタクリ
ル酸エステル、
アミン類(例えば、メチルアミン、エチルアミン、ブチ
ルアミン、ベンジルアミン、エチレンジアミン、ジエチ
レントリアミン、ヘキサメチレンジアミン、キシリレン
ジアミン、ジメチルアミン、ジエチルアミン、エタノー
ルアミン、ジェタノールアミン、アニリン等)とアクリ
ル酸グリシジルまたはメタクリル酸グリシジルとの反応
生成物。Examples of unsaturated alcohols include alcohols (for example, ethanol, propatool, hexanol, octatool, cyclohexanol, ethylene glycol, propylene glycol, diethylene glycol, triethylene glycol, tetraethylene glycol, polyethylene glycol, glycerin, trimethylolpropane,
acrylic or methacrylic acid esters of pentaerythritol, etc.), amines (e.g. methylamine, ethylamine, butylamine, benzylamine, ethylenediamine, diethylenetriamine, hexamethylenediamine, xylylenediamine, dimethylamine, diethylamine, ethanolamine, jetanolamine) , aniline, etc.) and glycidyl acrylate or glycidyl methacrylate.
カルボン酸(例えば、酢酸、プロピオン酸、安息香酸、
アクリル酸、メタクリル酸、コハク酸、マレイン酸、フ
タル酸、酒石酸、クエン酸等)とアクリル酸グリシジル
またはメタクリル酸グリシジルとの反応生成物。Carboxylic acids (e.g. acetic acid, propionic acid, benzoic acid,
acrylic acid, methacrylic acid, succinic acid, maleic acid, phthalic acid, tartaric acid, citric acid, etc.) and glycidyl acrylate or glycidyl methacrylate.
アミド誘導体(例えば、アクリルアミド、メタクリルア
ミド、N−メチロールアクリルアミド、メチレンビスア
クリルアミド等)、
エポキシ化合物とアクリル酸またはメタクリル酸との反
応物等を使用することができる。Amide derivatives (eg, acrylamide, methacrylamide, N-methylolacrylamide, methylenebisacrylamide, etc.), reaction products of epoxy compounds and acrylic acid or methacrylic acid, etc. can be used.
光重合開始剤としては、次のようなものを使用すること
ができる。As the photopolymerization initiator, the following can be used.
ヘンジインメチルエーテル、ベンゾインイソプロピルエ
ーテル、α、α−ジメトキシーα−フェニルアセトフェ
ノン等のベンゾイン誘導体、ベンゾフェノン、2.4−
ジクロルベンゾフェノン、0−ベンゾイル安息香酸メチ
ル、4,4°−ビス(ジメチルアミノ)ベンゾフェノン
、4.4−ビス(ジエチルアミノ)ベンゾフェノン等の
ベンゾフェノン話導体、2−クロルチオキサントン、2
−イソプロピルチオキサントン等のチオキサントン誘導
体、2−クロルアントラキノン、2−メチルアントラキ
ノン等のアントラキノン話導体、N−メチルアクリドン
、N−ブチルアクリドン等のアクリドン誘導体、α、α
−ジェトキシアセトフェノン、ベンジル、フルオし・ノ
ン、キサントン、ウラニル化合物、ハロゲン化合物等。Benzoin derivatives such as hengein methyl ether, benzoin isopropyl ether, α, α-dimethoxy α-phenylacetophenone, benzophenone, 2.4-
Benzophenone conductors such as dichlorobenzophenone, methyl 0-benzoylbenzoate, 4,4°-bis(dimethylamino)benzophenone, 4,4-bis(diethylamino)benzophenone, 2-chlorothioxanthone, 2
- Thioxanthone derivatives such as isopropylthioxanthone, anthraquinone derivatives such as 2-chloroanthraquinone and 2-methylanthraquinone, acridone derivatives such as N-methylacridone and N-butylacridone, α, α
- Jetoxyacetophenone, benzyl, fluorocarbon, xanthone, uranyl compound, halogen compound, etc.
またこの光重合性組成物は、好ましくは結合剤か添加さ
れる。結合剤としては、ジアゾ樹脂と共に用いたものが
使用で鮒、さらに好ましくは特公昭49−17874号
等に記載されている側鎖にエチレン性不飽和結合を有す
る光架橋性の共重合体が使用される。A binder is also preferably added to the photopolymerizable composition. As a binder, one used in combination with a diazo resin is used, and more preferably a photocrosslinkable copolymer having an ethylenically unsaturated bond in the side chain described in Japanese Patent Publication No. 49-17874 is used. be done.
感光層には、上記以外に露光後或は現像後に像を可視化
させるための色素、例えば、ビクトリアピュアブルーB
OH(保土谷化学社製)、オイルブルー’603 (オ
リエント化学工業社製)等のトリフェニルメタン系、ジ
フェニルメタン系色素等、露光により酸を発生する物質
(光酸発生剤)として、感光性ジアゾ化合物、0−ナフ
トキノンジアジド化合物、トリへロメチル基を有する芳
香族化合物、例えばトリへロメチル基を有するオキサジ
アゾール化合物あるいはトリへロメチル基を有するS−
トリアジン化合物等(具体的には特開昭62−1121
62号公報を参照)を含有している。In addition to the above, the photosensitive layer contains a dye for making the image visible after exposure or development, such as Victoria Pure Blue B.
Photosensitive diazo as a substance that generates acid upon exposure (photoacid generator), such as triphenylmethane-based and diphenylmethane-based dyes such as OH (manufactured by Hodogaya Chemical Co., Ltd.) and Oil Blue '603 (manufactured by Orient Chemical Industry Co., Ltd.). compounds, 0-naphthoquinonediazide compounds, aromatic compounds having a triheromethyl group, such as oxadiazole compounds having a triheromethyl group or S- having a triheromethyl group.
Triazine compounds, etc. (specifically, JP-A-62-1121
(see Publication No. 62).
また感光層には塗布性を改良するためのアルキルエーテ
ル類(例えば、エチルセルロース、メチルセルロース等
)、弗素系界面活性剤、ノニオン系界面活性剤(例えば
、プルロニックL64(旭電化社製)等)、塗膜の柔軟
性を付与するための可塑剤(例えば、ポリエチレングリ
コール、リン酸トリクレジル、アクリル酸又はメタクリ
ル酸ポリマー等)、安定剤(例えばリン酸等)を含有す
ることができる。In addition, the photosensitive layer contains alkyl ethers (e.g., ethyl cellulose, methyl cellulose, etc.), fluorine-based surfactants, nonionic surfactants (e.g., Pluronic L64 (manufactured by Asahi Denka), etc.) to improve coating properties. It may contain a plasticizer (for example, polyethylene glycol, tricresyl phosphate, acrylic acid or methacrylic acid polymer, etc.) and a stabilizer (for example, phosphoric acid, etc.) for imparting flexibility to the membrane.
本発明に用いられるシリコーンゴムとしては、次のよう
な一般式[I]で示される繰り返し単位を有する分子量
数千〜数十万の主鎖中または主鎖の末端に水酸基を有す
る線状有機ポリシロキサンを主成分とするものが好まし
い。The silicone rubber used in the present invention is a linear organic polymer having a repeating unit represented by the following general formula [I] and having a molecular weight of several thousand to hundreds of thousands and a hydroxyl group in the main chain or at the end of the main chain. Those containing siloxane as a main component are preferred.
一般式[I]
+5i−0+?l
ここてnは2以上の整数、Rは炭素数1〜10のアルキ
ル基、ハロゲン化アルキル基、アルコキシル基、ビニル
基、アリール基、シラノール基(OH基)、であり、R
の60%以上がメチル基であるものが好ましい。なお上
記シラノール基(O)I基)は主鎖中または主鎖の末端
のどちらにあってもよいか、末端にあることが好ましい
。General formula [I] +5i-0+? l Here, n is an integer of 2 or more, R is an alkyl group having 1 to 10 carbon atoms, a halogenated alkyl group, an alkoxyl group, a vinyl group, an aryl group, a silanol group (OH group), and R
It is preferable that 60% or more of the methyl groups are methyl groups. The silanol group (O)I group) may be located either in the main chain or at the end of the main chain, and is preferably located at the end.
本発明に用いられるシランカップリング剤(またはシリ
コーン架橋剤)としては、
R4,5tX4−n
(式中、nは1〜3の整数であり、Rはアルキル、アリ
ール、アルケニルまたはこれらの組合された一価の基を
表し、またこれらの基は)\ロケン、アミン、ヒドロキ
シ、アルコキシ、アリーロキシ、チオール等の官能基を
有していてもよい。The silane coupling agent (or silicone crosslinking agent) used in the present invention is R4,5tX4-n (wherein n is an integer of 1 to 3, and R is alkyl, aryl, alkenyl, or a combination thereof. It represents a monovalent group, and these groups may have a functional group such as )\rokene, amine, hydroxy, alkoxy, aryloxy, thiol, etc.
2
Xは一〇H,−0R2、−0Ac、−o−N−cり、
−CN、−Br、−■3
等の置換基を表す。ここでR2、R3は上記のRと同じ
ものを表し、R2、R3はそれぞれ同してあっても異っ
ていてもよい。またACはアセチル基を表す。)で示さ
れるシラン化合物である。2 X is 10H, -0R2, -0Ac, -o-N-c,
Represents a substituent such as -CN, -Br, -■3, etc. Here, R2 and R3 represent the same thing as R above, and R2 and R3 may be the same or different. Moreover, AC represents an acetyl group. ) is a silane compound represented by
つまり本発明において有用なシリコーンゴムは、このよ
うなシリコーン・ベースポリマーと、上記に挙げるよう
なシリコーン架橋剤との縮合反応によって得られるもの
である。That is, the silicone rubber useful in the present invention is obtained by a condensation reaction between such a silicone base polymer and a silicone crosslinking agent such as those listed above.
本発明に用いられるシランカップリング剤の具体例とし
ては、
HN[(CH2)3si(OMe)3]2% ビニルト
リエトキシシラン、CF (CH2) 3si (OM
e) 3、CH35l (DAC) 3、R5(C)1
2) :+Si (OMe) s、ビニルトリス(メチ
ルエチルケトオキシム)シラン等が挙げられる。Specific examples of the silane coupling agent used in the present invention include HN[(CH2)3si(OMe)3]2% vinyltriethoxysilane, CF(CH2)3si(OMe)
e) 3, CH35l (DAC) 3, R5(C)1
2) :+Si(OMe)s, vinyl tris(methyl ethyl ketoxime) silane, and the like.
前記のシリコーンゴムは市販品としても入手でき、例え
は東芝シリコーン社製YE−3085等がある。またそ
の他の有用なシリコーンゴムは、前述の如きベース・ポ
リマーと、次のような一般式[II ]で示される繰り
返し単位を有するシリコーンオイルとの反応、あるいは
Rの3%程度がビニル基であるシリコーンのベース・ポ
リマーとの付加反応、あるいは該シリコーンオイル同士
の反応によっても得ることができる。The silicone rubber described above is also available as a commercial product, such as YE-3085 manufactured by Toshiba Silicone Co., Ltd. Other useful silicone rubbers can be produced by reacting the above-mentioned base polymer with a silicone oil having repeating units represented by the following general formula [II], or by reacting a silicone oil in which about 3% of R is a vinyl group. It can also be obtained by addition reaction of silicone with a base polymer or reaction of the silicone oils with each other.
Rl(
(式中、Rは一般式[1]で示されるポリマーの置換基
であるRと同義であり、■は2以上の整数、nは0また
は1以上の整数である。)このような架橋反応によって
シリコーンゴムな得るためには、架橋反応を触媒を用い
て行う。この触媒としては、錫、亜鉛、コバルト、鉛、
カルシウム、マンガン、等の金属の有機カルボン酸塩、
例えばラウリル酸ジブチルスズ、スズ(II)オクトエ
ート、ナフテン酸コバルト等、あるいは塩化金酸等が用
いられる。Rl ((wherein, R has the same meaning as R, which is a substituent of the polymer represented by general formula [1], ■ is an integer of 2 or more, and n is an integer of 0 or 1 or more) such In order to obtain silicone rubber by crosslinking reaction, the crosslinking reaction is carried out using a catalyst.This catalyst includes tin, zinc, cobalt, lead,
Organic carboxylates of metals such as calcium, manganese, etc.
For example, dibutyltin laurate, tin(II) octoate, cobalt naphthenate, or chloroauric acid may be used.
またシリコーンゴムの強度を向上させ、印刷作業中に生
じる摩擦力に耐えるシリコーンゴムを得るためには、充
填剤(フィラー)を混合することもできる。予めフィラ
ーの混合されたシリコーンゴムは、シリコーンゴムスト
ック、あるいはシリコーンゴムディスバージョンとして
市販されており、本発明のようにコーティングによりシ
リコーンゴム膜を得ることが好ましい場合には、RTV
あるいはLTVシリコーンゴムのディスバージョンが好
んで用いられる。このような例としては、)−−L/
シリニア −:/社製syl off 23.5RX−
257,5H237等のペーパーコーティング用シリコ
ーンゴムディスバージョンかある。Additionally, fillers can be mixed in to improve the strength of the silicone rubber and to obtain a silicone rubber that can withstand the frictional forces generated during printing operations. Silicone rubber mixed with filler in advance is commercially available as silicone rubber stock or silicone rubber dispersion, and when it is preferable to obtain a silicone rubber film by coating as in the present invention, RTV
Alternatively, dispersion of LTV silicone rubber is preferably used. An example of this is )--L/
Silinia -:/manufactured by syl off 23.5RX-
There are silicone rubber dispersions for paper coating such as 257 and 5H237.
本発明においては、縮合架橋タイプのシリコーンゴムを
用いることか好ましい。In the present invention, it is preferable to use condensation and crosslinking type silicone rubber.
シリコーンゴム層には、更に接着性を向上させるために
アミノ基を有するシランカップリング剤を含有している
ことが好ましい。The silicone rubber layer preferably contains a silane coupling agent having an amino group in order to further improve adhesiveness.
好ましいシランカップリング剤としては、例えば次のよ
うなものがある。Examples of preferable silane coupling agents include the following.
(a) H2NCH2CH2NH(CH2) 3si
(OCH3) 5(b) H2NCE2CH2NH(C
H2) sS t (OCH3) 2 (CH3)(c
) )12N ((、f!2) 351 (OEt)
3本発明に用いられるシリコーンゴム層中には、更に光
増感剤を少量含有させることができる。(a) H2NCH2CH2NH(CH2) 3si
(OCH3) 5(b) H2NCE2CH2NH(C
H2) sS t (OCH3) 2 (CH3) (c
) )12N ((,f!2) 351 (OEt)
3. The silicone rubber layer used in the present invention may further contain a small amount of photosensitizer.
本発明に用いられるシリコーンゴム層は、シリコーンゴ
ムを適当な溶媒に溶解した後、感光層上に塗布、乾燥す
る。The silicone rubber layer used in the present invention is prepared by dissolving silicone rubber in a suitable solvent, applying it onto the photosensitive layer, and drying it.
本発明の支持体としては、通常の平版印刷機にセットで
きるたわみ性と印刷時に加わる荷重に耐えるものである
ことが好ましく、例えばアルミニウム、亜鉛、銅、鋼等
の金属板、及びクロム、亜鉛、銅、ニッケル、アルミニ
ウム及び鉄等がメツキまたは蒸着された金属板、紙、プ
ラスチックフィルム及びガラス板、樹脂コート紙、アル
ミニウム等の金属箔が張られた紙等が挙げられる。The support of the present invention is preferably one that is flexible enough to be set in a normal lithographic printing machine and that can withstand the load applied during printing, such as metal plates such as aluminum, zinc, copper, and steel, and metal plates such as chromium, zinc, Examples include metal plates plated or vapor-deposited with copper, nickel, aluminum, iron, etc., paper, plastic films, glass plates, resin-coated paper, paper covered with metal foil such as aluminum, and the like.
これらのうち好ましいものはアルミニウム板である。Among these, aluminum plates are preferred.
上記接着性向上のための支持体自体に対する処理は特に
限定されるものではなく、各種粗面化処理等が含まれる
。The treatment for the support itself to improve the adhesion is not particularly limited, and includes various surface roughening treatments.
支持体にはプライマー層を有していてもよく、該プライ
マー層には例えばポリエステル樹脂、塩化ビニル−酢酸
ビニル共重合体、アクリル樹脂、塩化ビニル樹脂、ポリ
アミド樹脂、ポリビニルブチラール樹脂、エポキシ樹脂
、アクリレート系共重合体、酢酸ビニル系共重合体、フ
ェノキシ樹脂、ポリウレタン樹脂、ポリカーボネート樹
脂、ポリアクリロニトリルブタジェン、ポリ酢酸ビニル
等が挙げられる。これらのプライマー層には、前記露光
により酸を発生する化合物及び酸により変色あるいは褪
色する染料を添加することかてぎる。The support may have a primer layer, and the primer layer may include, for example, polyester resin, vinyl chloride-vinyl acetate copolymer, acrylic resin, vinyl chloride resin, polyamide resin, polyvinyl butyral resin, epoxy resin, acrylate. Examples include polyvinyl acetate copolymers, vinyl acetate copolymers, phenoxy resins, polyurethane resins, polycarbonate resins, polyacrylonitrile butadiene, and polyvinyl acetate. It is possible to add to these primer layers a compound that generates an acid upon exposure to light and a dye that changes color or fades when exposed to acid.
また上記プライマー層を構成するアンカー剤としては、
例えは前記シランカップリング剤、シリコーンブライマ
ー等を用いることができ、また有機チタネート等も有効
である。In addition, as the anchor agent constituting the primer layer,
For example, the aforementioned silane coupling agents, silicone primers, etc. can be used, and organic titanates and the like are also effective.
本発明の版材を構成する各層の厚さは、以下の通りであ
る。即ち支持体は50〜400μm、好ましくは100
〜300 Alm 、感光層は0.05〜10μm 、
好ましくは05〜5μm、シリコーンゴム層は0.1〜
lOμm、好ましくは0.5〜2μmである。The thickness of each layer constituting the plate material of the present invention is as follows. That is, the support has a thickness of 50 to 400 μm, preferably 100 μm.
~300 Alm, photosensitive layer 0.05~10 μm,
Preferably 05-5μm, silicone rubber layer 0.1-5μm
It is 10 μm, preferably 0.5 to 2 μm.
本発明において、シリコーンゴム層の上面には必要に応
じて保護層を有していてもよい。In the present invention, a protective layer may be provided on the upper surface of the silicone rubber layer, if necessary.
以下余白
[実施例コ
以下、本発明を実施例により説明するが、本発明は、こ
れらに限定されるものではない。The following margins [Examples] The present invention will be described below with reference to Examples, but the present invention is not limited to these.
実施例1
[アルミニウム板aの製造]
厚さ0.2mmのアルミニウム板を3%水酸化ナトリウ
ム水溶液に浸漬して脱脂し、水洗した後、塩酸濃度1%
及びホウ酸濃度1%の水溶液中において、温度25℃で
3A/dm2の条件で5分間電解エツチングを行い、水
洗後、40%硫酸水溶液中において温度30℃で1.5
A/dm2の条件で2分間陽極酸化を行い、水洗し、1
%メタケイ酸ナトリウム水溶液に温度85℃で37秒間
浸漬し、更に温度90℃の水(pH8,5)に25秒間
浸漬し、水洗、乾燥してアルミニウム板aを得た。Example 1 [Manufacture of aluminum plate a] An aluminum plate with a thickness of 0.2 mm was immersed in a 3% aqueous sodium hydroxide solution to degrease it, washed with water, and then diluted with 1% hydrochloric acid concentration.
In an aqueous solution with a boric acid concentration of 1%, electrolytic etching was performed at a temperature of 25°C for 5 minutes at a rate of 3A/dm2, and after washing with water, etching was performed in an aqueous solution of 40% sulfuric acid at a temperature of 1.5°C at a temperature of 30°C.
Anodize for 2 minutes at A/dm2, wash with water,
% sodium metasilicate aqueous solution at a temperature of 85°C for 37 seconds, and further immersed in water (pH 8.5) at a temperature of 90°C for 25 seconds, washed with water, and dried to obtain an aluminum plate a.
次に、以下に示すブライマー組成物を塗布し、85℃で
3分間乾燥した後、3KW超高圧水銀灯を用いて100
0 IDJ 7cm2の全面露光を行った。更に10
0℃で4分間乾燥して厚さ0.8μmのプライマー層を
形成した。Next, a brimer composition shown below was applied, dried at 85°C for 3 minutes, and heated to 100°C using a 3KW ultra-high pressure mercury lamp.
0 IDJ Full-surface exposure of 7 cm2 was performed. 10 more
It was dried at 0° C. for 4 minutes to form a primer layer with a thickness of 0.8 μm.
[プライマー層組成物]
(1)ジアゾ樹脂−18部
(2)2−ヒドロキシエチルメタクリレート、メタクリ
ル酸メチルのモル比が34/66の共重合樹脂−192
部
(3)メチルセロソルブ 900部上述のブ
ライマー層上に下記の組成の感光性組成物1を塗布し、
100℃で2分間乾燥して厚さ0.5 μmの感光層を
形成した。[Primer layer composition] (1) Diazo resin - 18 parts (2) Copolymer resin 192 with a molar ratio of 2-hydroxyethyl methacrylate and methyl methacrylate of 34/66
Part (3) Methyl cellosolve 900 parts Apply photosensitive composition 1 having the following composition on the above-mentioned brimer layer,
It was dried at 100° C. for 2 minutes to form a photosensitive layer with a thickness of 0.5 μm.
[感光性組成物コ
(1)ジアゾ樹脂−140部
(2)2−ヒドロキシエチルメタクリレート、N−(4
−ヒドロキシフェニル)メタアクリルアミド、アクリル
酸のモル比が50747/3の共重合体
50部(3)ビクトリアピュアブル
ーBOH
(保土ケ谷化学(株)製染料) 1部(4)メチルセ
ロソルブ 900部ジアゾ樹脂−1の合成
なお、ジアゾ樹脂−1は以下のようにして合成した。[Photosensitive composition (1) Diazo resin - 140 parts (2) 2-hydroxyethyl methacrylate, N-(4
-Hydroxyphenyl) methacrylamide and acrylic acid in a molar ratio of 50747/3.
50 parts (3) Victoria Pure Blue BOH (dye manufactured by Hodogaya Chemical Co., Ltd.) 1 part (4) Methyl cellosolve 900 parts Synthesis of Diazo Resin-1 Diazo Resin-1 was synthesized as follows.
p−ジアゾジフェニルアミン硫酸塩14.5g(50ミ
リモル)を水冷下で409gの濃硫酸に溶解した。この
反応液に1.35 (45ミリモル)のパラホルムアル
デヒドをゆっくり反応温度が10℃を超えないように添
加した。14.5 g (50 mmol) of p-diazodiphenylamine sulfate was dissolved in 409 g of concentrated sulfuric acid under water cooling. To this reaction solution, 1.35 (45 mmol) of paraformaldehyde was slowly added so that the reaction temperature did not exceed 10°C.
この反応混合物を水冷下、500m1のエタノールに滴
下し、生した沈殿を濾過した。エタノールで洗浄後、こ
の沈殿物を100m1の純粋に溶解し、この液に6.8
gの塩化亜鉛を溶解した冷濃厚水溶液を加えた。生じた
沈殿を濾過した後、エタノールで洗浄し、これを150
m1純水に溶解した。この液に8gのへキサフルオロリ
ン酸アンモニウムを溶解した冷濃厚水溶液を加えた。生
した沈殿を濾取し、水洗した後、乾燥してジアゾ樹脂−
1を得た。This reaction mixture was added dropwise to 500 ml of ethanol under water cooling, and the resulting precipitate was filtered. After washing with ethanol, this precipitate was dissolved in 100 ml of pure water, and 6.8
A cold concentrated aqueous solution of 1 g of zinc chloride was added. After filtering the resulting precipitate, it was washed with ethanol, and then washed with 150
Dissolved in ml pure water. To this liquid was added a cold concentrated aqueous solution in which 8 g of ammonium hexafluorophosphate was dissolved. The formed precipitate is collected by filtration, washed with water, and dried to form a diazo resin.
I got 1.
ついで、上記の感光層上に下記のシリコーンゴム組成物
を乾燥重量て2.0g7m2になるように塗布し、90
℃で10分間乾燥し、湿し水不要の平版印刷版材料を得
た。Next, the following silicone rubber composition was coated on the above photosensitive layer so that the dry weight was 2.0 g and 7 m2.
It was dried at ℃ for 10 minutes to obtain a lithographic printing plate material that did not require dampening water.
[シリコーンゴム層組成物]
両末端に水酸基を有するジメチルポリシロキサン(分子
量52,000) 100部トリアセトキ
シメチルシラン 10部ジブチル錫ラウレート
0.8部アイソパーG(エッソ化学製
) 900部上記版材料の上面にポジフィルムを
真空密着させた後、光源としてメタルハライドランプを
用いて露光した。[Silicone rubber layer composition] Dimethylpolysiloxane having hydroxyl groups at both ends (molecular weight 52,000) 100 parts triacetoxymethylsilane 10 parts dibutyltin laurate 0.8 parts Isopar G (manufactured by Esso Chemical) 900 parts of the above plate material After a positive film was vacuum-adhered to the top surface, exposure was performed using a metal halide lamp as a light source.
次に第1図に示す処理装置を用いて現像を行った。ブラ
シロール1.2.3のブラシの径はいづれも100mm
、またブラシ毛はそれぞれ太さ0.15mm、 0.1
5mm%0.08mm、長さはいづれも20mmとした
。またブラシ毛にはナイロン6・10を使用した。ブラ
シロール1.2の回転速度は外径の周速度が120 m
/minとなるように調整し、更にブラシロール3につ
いては、20 m/minとなるようにそれぞれ回転数
を調整した。Next, development was performed using the processing apparatus shown in FIG. The diameter of the brushes of brush roll 1, 2, and 3 are all 100 mm.
, and the brush bristles are 0.15 mm and 0.1 thick, respectively.
5mm%0.08mm, and the length was 20mm. In addition, nylon 6.10 was used for the brush bristles. The rotational speed of the brush roll 1.2 is 120 m at the peripheral speed of the outer diameter.
The rotation speed of the brush roll 3 was adjusted to 20 m/min.
第1現像部の処理液には水を、第2現像部の処理液には
コニカ社製ps版用現像液5DR−1を水で6倍に稀釈
したものを使用した。Water was used as the processing liquid in the first developing section, and a 6-fold dilution of Konica PS plate developer 5DR-1 with water was used as the processing liquid in the second developing section.
いづれの処理液とも30℃に温調し処理を行った。第1
現像部での処理時間は100秒、第2現像部の処理時間
は25秒であった。The temperature of each treatment solution was controlled at 30°C. 1st
The processing time in the developing section was 100 seconds, and the processing time in the second developing section was 25 seconds.
処理後の印刷板は、画像部のシリコーンゴム層及び感光
層が除去されており、網点が2%〜99%まで良好に再
現されていた。In the printed plate after the treatment, the silicone rubber layer and photosensitive layer in the image area were removed, and the halftone dots were well reproduced in the range of 2% to 99%.
比較例1
第1現像部の処理液を、下記の現像液に代えた以外は実
施例1と同様にして処理を行った。Comparative Example 1 Processing was carried out in the same manner as in Example 1, except that the processing liquid in the first developing section was replaced with the following developer.
[現像液] (pHlo、a )
ヘンシルアルコール 8重量部ペレック
スNBL
(花王社製、アニオン界面活性剤) 10重量部炭酸
ソーダ(Na2CO3) 2重量部水
80重量部その
結果、網点再現性は3%から96%で、特にシャドウ部
の再現性が低下していた。[Developer] (pHlo, a) Hensyl alcohol 8 parts by weight Perex NBL (manufactured by Kao Corporation, anionic surfactant) 10 parts by weight Soda carbonate (Na2CO3) 2 parts by weight Water
80 parts by weight As a result, the halftone dot reproducibility ranged from 3% to 96%, and the reproducibility in shadow areas was particularly poor.
シリコーンゴム層には若干ではあるがブラシによるもの
と見られるスジ状の傷が発生していた。There were some streak-like scratches on the silicone rubber layer, which appeared to be caused by brushing.
実施例2
感光性組成物のジアゾ樹脂−1を25部とした以外は、
実施例1と全く同様の印刷版材を作製し、実施例1と同
様の露光処理を行った。Example 2 Except for using 25 parts of diazo resin-1 in the photosensitive composition,
A printing plate material exactly the same as in Example 1 was produced, and the same exposure treatment as in Example 1 was performed.
網点の再現域は2%〜98%まで良好に再現されていた
。シリコーンゴム層の傷は見られなかった。The reproduction range of halftone dots was well reproduced from 2% to 98%. No damage to the silicone rubber layer was observed.
比較例2
感光性組成物のジアゾ樹脂−1を25部とした以外は、
実施例1と全く同様の印刷版材を作製し、実施例1と同
様の露光処理を行った。Comparative Example 2 Except for using 25 parts of diazo resin-1 in the photosensitive composition,
A printing plate material exactly the same as in Example 1 was produced, and the same exposure treatment as in Example 1 was performed.
第1現像部の処理液を、比較例1の現像液に代えた以外
は実施例1と同様にして処理を行った。Processing was carried out in the same manner as in Example 1, except that the processing solution in the first developing section was replaced with the developer of Comparative Example 1.
その結果、網点再現性は3%から94%であった。シリ
コーンゴム層には若干ではあるがブラシによるものと見
られるスジ状の傷が発生していた。As a result, the halftone dot reproducibility was 3% to 94%. There were some streak-like scratches on the silicone rubber layer, which appeared to be caused by brushing.
実施例3
感光性組成物のジアゾ樹脂−1を100部とした以外は
、実施例1と全く同様の印刷版材を作製し、実施例1と
同様の露光処理を行フた。Example 3 A printing plate material was prepared in exactly the same manner as in Example 1, except that 100 parts of diazo resin-1 was used in the photosensitive composition, and the same exposure treatment as in Example 1 was carried out.
網点の再現域は3%〜99%まで良好に再現されていた
。シリコーンゴム層の傷は見られなかった。The reproduction range of halftone dots was well reproduced from 3% to 99%. No damage to the silicone rubber layer was observed.
比較例3
感光性組成物のジアゾ樹脂−1を100部とした以外は
、実施例1と全く同様の印刷版材を作製し、実施例1と
同様の露光処理を行フた。Comparative Example 3 A printing plate material was prepared in exactly the same manner as in Example 1, except that 100 parts of diazo resin-1 was used in the photosensitive composition, and the same exposure treatment as in Example 1 was performed.
第1現像部の処理液を、比較例1の現像液に代えた以外
は実施例1と同様にして処理を行った。Processing was carried out in the same manner as in Example 1, except that the processing solution in the first developing section was replaced with the developer of Comparative Example 1.
その結果、網点再現域は5%から96%であった。シリ
コーンゴム層には若干ではあるがブラシによるものと見
られるスジ状の傷が発生していた。As a result, the halftone dot reproduction range was 5% to 96%. There were some streak-like scratches on the silicone rubber layer, which appeared to be caused by brushing.
[発明の効果]
本発明は、pl(9未満の水を主成分とする処理液で処
理した後、pH9以上のアルカリ性処理液で処理するこ
とにより、シリコーンゴム層の傷つきが防止され、画質
、網点画像再現性に優れ、かつ安全性、環境保全性が良
好である。[Effects of the Invention] The present invention prevents damage to the silicone rubber layer and improves image quality by treating the silicone rubber layer with a treatment liquid whose main component is water with a pl (less than 9) and then with an alkaline treatment liquid with a pH of 9 or more. It has excellent halftone image reproducibility and is safe and environmentally friendly.
またインクの着肉性が向上する。更に光硬化性感光層か
ジアゾニウム化合物を含むことにより上記効果か顕著に
現れる。Furthermore, the ink receptivity is improved. Furthermore, the above effects are more pronounced when the photocurable photosensitive layer contains a diazonium compound.
第1図は、本発明に用いられる第1現像部(A)及び第
2現像部(B)を有する現像機を示す断面図である。
1.2.3・・ブラシ
4.5.6.7・・ローラー
8.9・・現像槽
10・・ポンプ
11.12.13.14・・シャワー
15.16.17・・ガイド板FIG. 1 is a sectional view showing a developing machine having a first developing section (A) and a second developing section (B) used in the present invention. 1.2.3...Brush 4.5.6.7...Roller 8.9...Developer tank 10...Pump 11.12.13.14...Shower 15.16.17...Guide plate
Claims (1)
順次有する水なし平版印刷版用原版の現像処理方法にお
いて、pH9未満の水を主成分とする処理液で処理した
後、pH9以上のアルカリ性処理液で処理することを特
徴とする水なし平版印刷版用原版の現像処理方法。 2)請求項1記載の光硬化性感光層がジアゾニウム化合
物を含むことを特徴とする水なし平版印刷版用原版の現
像処理方法。[Scope of Claims] 1) A method for developing a waterless lithographic printing plate precursor having a photocurable photosensitive layer and a silicone rubber layer sequentially on a support, in which treatment is performed with a processing liquid containing water as a main component and having a pH of less than 9. 1. A method for developing a waterless lithographic printing plate precursor, which comprises processing with an alkaline processing solution having a pH of 9 or higher. 2) A method for developing a waterless lithographic printing plate precursor, wherein the photocurable photosensitive layer according to claim 1 contains a diazonium compound.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP904390A JPH03213863A (en) | 1990-01-18 | 1990-01-18 | Development processing method for original plate for waterless planographic printing plate |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP904390A JPH03213863A (en) | 1990-01-18 | 1990-01-18 | Development processing method for original plate for waterless planographic printing plate |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH03213863A true JPH03213863A (en) | 1991-09-19 |
Family
ID=11709617
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP904390A Pending JPH03213863A (en) | 1990-01-18 | 1990-01-18 | Development processing method for original plate for waterless planographic printing plate |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH03213863A (en) |
-
1990
- 1990-01-18 JP JP904390A patent/JPH03213863A/en active Pending
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