JPH03215356A - Barium titanate-based semiconductor ceramic composition - Google Patents
Barium titanate-based semiconductor ceramic compositionInfo
- Publication number
- JPH03215356A JPH03215356A JP2007933A JP793390A JPH03215356A JP H03215356 A JPH03215356 A JP H03215356A JP 2007933 A JP2007933 A JP 2007933A JP 793390 A JP793390 A JP 793390A JP H03215356 A JPH03215356 A JP H03215356A
- Authority
- JP
- Japan
- Prior art keywords
- barium titanate
- mol
- based semiconductor
- less
- ceramic composition
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 229910002113 barium titanate Inorganic materials 0.000 title claims abstract description 23
- 239000000203 mixture Substances 0.000 title claims abstract description 13
- 239000004065 semiconductor Substances 0.000 title claims description 24
- JRPBQTZRNDNNOP-UHFFFAOYSA-N barium titanate Chemical compound [Ba+2].[Ba+2].[O-][Ti]([O-])([O-])[O-] JRPBQTZRNDNNOP-UHFFFAOYSA-N 0.000 title claims description 22
- 239000000919 ceramic Substances 0.000 title claims description 12
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims abstract description 20
- 239000003795 chemical substances by application Substances 0.000 claims abstract description 14
- 239000000377 silicon dioxide Substances 0.000 claims abstract description 10
- 229910052748 manganese Inorganic materials 0.000 claims abstract description 9
- 229910052761 rare earth metal Inorganic materials 0.000 claims abstract description 4
- 229910052727 yttrium Inorganic materials 0.000 claims abstract description 4
- 229910052787 antimony Inorganic materials 0.000 claims abstract description 3
- 229910052797 bismuth Inorganic materials 0.000 claims abstract description 3
- 229910052746 lanthanum Inorganic materials 0.000 claims abstract description 3
- 229910052758 niobium Inorganic materials 0.000 claims abstract description 3
- 229910052684 Cerium Inorganic materials 0.000 claims abstract 2
- 229910052776 Thorium Inorganic materials 0.000 claims abstract 2
- 229910052721 tungsten Inorganic materials 0.000 claims abstract 2
- 239000011572 manganese Substances 0.000 claims description 11
- PWHULOQIROXLJO-UHFFFAOYSA-N Manganese Chemical compound [Mn] PWHULOQIROXLJO-UHFFFAOYSA-N 0.000 claims description 7
- WPBNNNQJVZRUHP-UHFFFAOYSA-L manganese(2+);methyl n-[[2-(methoxycarbonylcarbamothioylamino)phenyl]carbamothioyl]carbamate;n-[2-(sulfidocarbothioylamino)ethyl]carbamodithioate Chemical compound [Mn+2].[S-]C(=S)NCCNC([S-])=S.COC(=O)NC(=S)NC1=CC=CC=C1NC(=S)NC(=O)OC WPBNNNQJVZRUHP-UHFFFAOYSA-L 0.000 claims description 2
- 239000006104 solid solution Substances 0.000 claims description 2
- 229910052745 lead Inorganic materials 0.000 abstract description 5
- 229910003781 PbTiO3 Inorganic materials 0.000 abstract description 2
- NUJOXMJBOLGQSY-UHFFFAOYSA-N manganese dioxide Chemical compound O=[Mn]=O NUJOXMJBOLGQSY-UHFFFAOYSA-N 0.000 abstract 4
- 229910002370 SrTiO3 Inorganic materials 0.000 abstract 1
- 229910052681 coesite Inorganic materials 0.000 abstract 1
- 229910052906 cristobalite Inorganic materials 0.000 abstract 1
- 235000012239 silicon dioxide Nutrition 0.000 abstract 1
- 229910052682 stishovite Inorganic materials 0.000 abstract 1
- 229910052905 tridymite Inorganic materials 0.000 abstract 1
- 229910052573 porcelain Inorganic materials 0.000 description 9
- 230000000694 effects Effects 0.000 description 7
- 238000010304 firing Methods 0.000 description 5
- 238000002474 experimental method Methods 0.000 description 4
- 239000000654 additive Substances 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- 239000002994 raw material Substances 0.000 description 2
- JCLFHZLOKITRCE-UHFFFAOYSA-N 4-pentoxyphenol Chemical compound CCCCCOC1=CC=C(O)C=C1 JCLFHZLOKITRCE-UHFFFAOYSA-N 0.000 description 1
- 229910000807 Ga alloy Inorganic materials 0.000 description 1
- 206010028980 Neoplasm Diseases 0.000 description 1
- 229910004738 SiO1 Inorganic materials 0.000 description 1
- 229910002367 SrTiO Inorganic materials 0.000 description 1
- 230000002159 abnormal effect Effects 0.000 description 1
- 230000000996 additive effect Effects 0.000 description 1
- 239000011230 binding agent Substances 0.000 description 1
- 238000013329 compounding Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 239000002689 soil Substances 0.000 description 1
- 229910052718 tin Inorganic materials 0.000 description 1
- 229910052726 zirconium Inorganic materials 0.000 description 1
Landscapes
- Compositions Of Oxide Ceramics (AREA)
- Thermistors And Varistors (AREA)
Abstract
Description
【発明の詳細な説明】
C産業上の利用分野〕
本発明は、一定温度を越えると急激に電気抵抗値が変化
する正の抵抗温度特性を有するチタン酸バリウム系半導
体磁器に関し、特に必要な耐電圧を確保しながら、常温
における比抵抗を小さくでき、ひいては低瘍抗回路素子
として有用なチタン酸バリウム系半導体磁器組成物に関
する.〔従来の技術)
一般にチタン酸バリウム系半導体磁器は、主成分として
のチタン酸バリウムに、半導体化剤としてY,La,C
e等の希土類元素,あるいはNb,Bi,Sb.W,T
h等のうち少なくとも一種以上を微量添加し、これを高
温で焼成して得られる.この半導体磁器は、常温におけ
る比抵抗が小さく、かつキュリー点を超えると著しい正
の抵抗温度変化を示す特性を有しており、例えば定温度
発熱用素子.電流制限用素子,温度制御用素子等として
使用されている.
また上記チタン酸バリウム系半導体磁器のキュリー点は
、その主成分であるチタン酸バリウムの?響により通常
120℃付近である.そして、このキュリー点を高温側
に移行させるためにBaの一部をpbで置換する方法が
知られている.逆に上記キュリー点を低温側に移行させ
るためにBaの一部をSrで置換したり、Tlの一部を
Zr,Sn等で置換したりする方法も知られている.ま
た、マンガンを微量(Mnに換算して0.03〜0.
15s+o j!%)添加することにより、キュリー点
を超えた後の抵抗温度変化率を著しく増大させることも
知られている.さらにまた、SiO■を微量(0.5〜
5mof%)添加することで、常温における比抵抗を低
く安定したものにできることも知られている.
ここで、上記チタン酸バリウム系半導体磁器においては
、耐電圧が高く、かつ常温における比抵抗の小さい低抵
抗回路素子として有用なものが要求されている.従来、
このような比抵抗特性の向上を図るために、Baの一部
をCa,又はSrで置換し、添加物としてMn,S i
Oxを添加したものが提案されている.これによれば
常温における比抵抗が10Ω・1以下の特性が得られる
.また、特公昭63−28324号公報には、Baの一
部をPb,S r t C aで同時に置換し、これら
Pb,Sr,Caを共存状態で主成分のチタン酸バリウ
ムに含有させることにより、IOOV/■以上の耐電圧
が得られることが記載されている.
〔発明が解決しようとする問題点〕
しかしながら上記従来のチタン酸バリウム系半導体磁器
において、上述したBaの一部をCa,又はSrで置換
したものは、比抵抗では満足できる値が得られるものの
、耐電圧が最高のもので48V/mしか得られず実用上
十分な値ではない.また、上記公報のようにBaの一部
をPb.Sr,Caで同時に置換したものは、高い耐電
圧を得ることができるものの、比抵抗は35Ω・1まで
しか下げることができない.従って、比抵抗10Ω・1
以下,耐電圧100V/鶏以上の両方を満足できるチタ
ン酸バリウム系半導体磁器の出現が要請されている.本
発明の目的は、高い耐電圧を有し、かつ比抵抗の小さい
チタン酸バリウム系半導体磁器組成物を提供することに
ある.
c問題点を解決するための手段〕
本件発明者らは、上記目的を達成するために鋭意研究を
重ねたところ、BaTIOs.CaTiOs ,SrT
iOs .PbTl03を主成分とし、これに添加する
副成分を選定するとともに、これの添加量を限定すれば
比抵抗,耐電圧の両方の特性を満足できることを見出し
、本発明を成したものである.
そこで本発明は、チタン酸バリウム又はその固溶体から
なる主成分に、半導体化剤.マンガン.及びシリカが添
加含有されているチタン酸バリウム系半導体磁器組成物
において、上記主成分が、B a T i 0
. 30〜95soj %、 c a T i
O s 3 〜25mol %、 S r
T i Os 1 ”−25mol %、
P b T I O s1〜30■oJ%からな
り、該主成分に半導体化剤として、Y,La,Co等の
希土類元素あるいはNb.Bi.Sb.W.Thの酸化
物のうち少なくとも一種が0.05mol%以上Q,j
moj%未満添加され、かつマンガンがMnO.に換算
して0.003 sol%以上0.03aoj%未満、
シリヵが3101に換算Li’0.01moj%以上0
.5 mail%未満それぞれ添加含有されていること
を特徴としている.ここで、本発明における各種の条件
を限定した理由について説明する.
■ 上記BaTiOs ,CaTiOs ,SrTi
Os . P bT i Osを主成分としたのは、
このBaの一部をCa,Sr,Pbで同時に置換するこ
とにより、耐電圧値を向上させるためである.上記Pb
,Srは単独ではキュリー点をそれぞれ高温側.低温側
へ移行させるものであるが、これらCa,Sr.Pbを
共存状態で主成分に含有させることにより、耐電圧10
0V/ wa以上を実現できる.
■ 上記各主成分の範囲の限定理由は以下のとおりであ
る.
上記B a T i O sを30〜95moj%とし
たのは、30mo j%未満では半導体化が困難となり
比抵抗も増大するからであり、95−o 1%を超える
と電気的特性が著しく低下するからである.
また、上記C a T i O sを3〜25mo J
%としたのは、amol%未満ではその含有効果が得ら
れず、かつ25mo J%を超えると耐電圧特性.耐突
入電流特性の低下をもたらすからである.
さらに、上記SrTiO,を1〜25mo II%とし
たのは、lmol%未満ではその改善特性の効果が少な
く、また25*o II%を超えると電気的特性が劣化
するからである.
さらにまた、上記PbTi03を1〜30mo 14%
としたのは、lmoj%未満では特性改善の効果が少な
く実用に適さないからであり、また30mo j%を超
えると半導体化が困難となるからである.■ また、上
記半導体化剤は、チタン酸バリウム系半導体磁器を得る
ために添加することは公知であり、この添加量としては
0.05mol%以上0.21101%未満の範囲が比
抵抗を低くする上で最適である.
■ さらに、上記マンガンを添加することによりキュリ
ー点を越えた正の抵抗温度特性の変化率を著しく増大さ
せることができる.このマンガンの添加量をMnO.に
換算して0.003■oj%以上0.03moj%未満
としたのは、この添加量が0.03mol%以上になる
と常温での比抵抗が高くなり、また0.003 moj
%未満ではその添加効果が得られず、かえって耐電圧特
性が劣化するからである.■ さらにまた、上記シリカ
をSiO!に換算して0.01mo 1%以上0.5s
oj%未満としたのは、半導体化剤の微量添加のわずか
な変動によって生じる比抵抗の変化を抑制し、かつ焼結
体の異常粒成長を抑えるためであり、上記範囲を外れる
と上記効果が得られなくなるからである.
ここで、上記半導体化剤.マンガン,及びシリカの各添
加量を限定したのは、必要耐電圧を確保しながら低比抵
抗化を容易にするためであり、上記1つでも範囲を外れ
ると低抵抗化のための焼成等の条件設定が困難になる可
能性がある.〔作用〕
本発明に係るチタン酸バリウム系半導体磁器組成物によ
れば、上述のようにBaTiO.,CaTies *
SrTiOs .PbTiOsを主成分としたので、
つまりこのBaの一部をCa,Sr,pbで同時に置換
したので耐電圧を向上でき、さらに上記主成分に添加す
る半導体化剤を0.05■oj%以上0.2soJ%未
満とし、かつマンガンをMn08に換算して0.003
moj%以上0.03moj%未満,シリカをSlo
gに換算して0.01mol%以上0.51104%未
満としたので、必要耐電圧を確保しながら比抵抗を小さ
くでき、その結果耐電圧100V/■以上、比抵抗10
Ω・1以下の低抵抗回路素子を実現でき、上述した要請
に応えられる.
〔実施例〕
以下、本発明の実施例を説明する.
本実施例は、本発明における各主成分,各副成分の添加
量を見出した実験について説明する.まず、実験に使用
した試料の製造方法について説明する.
主成分としてB a T i O s(60〜90mo
j%).Ca T i O s (0〜30mo j
%),SrTiOs (0〜12mol%) , P
b T i Os (0〜13moj%)、半導体化
剖としてYt Os (0.1〜1.5 mol%).
La富O s (0. 15so j%) ,
C e Ox(0.15 go 1%》 .Ndg
Os(0 .15mo J%)、及び添加物としてM
n C O s ( M n O *に換算して0.
01〜0.15moj%) . S i O!(0.1
〜1.O vlol%)を準備する.この各原材料を
第1表に示す比率のチタン酸バリウム系半導体磁器組成
物が得られるように配合し、湿式混合する.
次に、上記スラリー状の原料を脱水乾燥し、1150℃
×2時間で仮焼成する.次いでこの仮焼結体を粉砕混合
し、これにバインダーを加えて造粒し、成形圧力100
0kg/ cdで円板状にプレス成形する.次にこの円
板状の成形体を10℃/■inで1360℃まで昇温し
で所定時間保持した後、10℃/s+inで冷却する焼
成プロファイルで焼成した.これにより直径17.5X
厚さ0.6簡の円板状の半導体磁器を得る.そして、こ
の半導体磁器の両主面にIn−Ga合金からなる電極を
付与し、これを本実験用試料とした.
そして本実験では、上記各試料の常温中(25℃)にお
ける比抵抗,耐電圧.キュリー点をそれぞれ測定した.
なお、上記耐電圧は試料に破壊が生じる寸前の最高印加
電圧値を測定した.第1表及び第2表はその結果を示し
、第1表は上記主成分.半導体化剤,及び添加物のそれ
ぞれの配合比率を示し、第2表は各測定結果を示す.表
中、試料旭7〜9、Pkl 1〜13、P&L16.及
びぬ18〜20は本発明の範囲内であり、これ以外の*
印は本発明の範囲外である.
同表からも明らかなように、各主成分の添加量が所定範
囲を外れた場合(−1〜6)は、いずれも耐電圧が45
V/fi以下と低い.また半導体化剤,SiO1,Mn
Ot.及びCaTiOsの添加量がそれぞれ所定範囲を
越えた場合(llhlO.Nal4.15、Nal 7
)は、比抵抗が著しく増大したり、焼成時に融着したり
しており、いずれの試料においても比抵抗.耐電圧の両
方とも満足できる特性が得られていない.これに対して
各添加量が本発明範囲内の場合(1117〜9、l1h
ll−13、陳16、−18〜20)は、いずれもキュ
リー点は103〜122℃、比抵抗は3.2〜4.9Ω
・1と低く、かつ耐電圧は104〜152V/ Wと高
くなっており、満足できる値が得られていることがわか
る.〔発明の効果〕
以上のように本発明に係るチタン酸バリウム系半導体磁
器組成物によれば、B a T i Os 3G〜95
soil%.CaTiOs 3〜25mo/%.SrT
iOs1〜25soJ%, P b T i Os
1 〜301101% を主成分とし、これに半導体化
剤0.05mo j%以上0.2whol%未溝を添加
するとともに、Mn jcM n O *に換算して0
.003 soj!%以上0.03mol%未満、Si
Ox O.01moj%以上0.5moj%未満をそ
れぞれ添加含有したので、耐電圧100V/ M以上、
比抵抗10Ω・1以下の優れた特性が得られるとともに
、低抵抗回路素子として有用な半導体磁器が得られる効
果がある.DETAILED DESCRIPTION OF THE INVENTION Field of Industrial Application] The present invention relates to barium titanate-based semiconductor porcelain, which has a positive resistance-temperature characteristic in which the electrical resistance value changes rapidly when the temperature exceeds a certain temperature. This invention relates to a barium titanate-based semiconductor ceramic composition that can reduce specific resistance at room temperature while ensuring voltage, and is useful as a low tumor anti-circuit element. [Prior art] Generally, barium titanate-based semiconductor porcelain contains barium titanate as a main component and Y, La, C as a semiconducting agent.
rare earth elements such as e, or Nb, Bi, Sb. W,T
It is obtained by adding a trace amount of at least one of h, etc. and firing it at a high temperature. This semiconductor porcelain has a characteristic that it has a low specific resistance at room temperature and exhibits a significant positive temperature change in resistance when it exceeds the Curie point, and can be used, for example, as a constant temperature heating element. It is used as a current limiting element, temperature control element, etc. Also, what is the Curie point of the barium titanate-based semiconductor porcelain mentioned above for its main component, barium titanate? The temperature is usually around 120℃ due to the sound. In order to shift this Curie point to the high temperature side, a method is known in which a part of Ba is replaced with Pb. Conversely, methods are also known in which a portion of Ba is replaced with Sr or a portion of Tl is replaced with Zr, Sn, etc. in order to shift the Curie point to the lower temperature side. It also contains a trace amount of manganese (0.03 to 0.00 in terms of Mn).
15s+oj! %) is known to significantly increase the rate of resistance temperature change after exceeding the Curie point. Furthermore, a trace amount (0.5~
It is also known that by adding 5mof%), the specific resistance at room temperature can be made low and stable. Here, the barium titanate-based semiconductor porcelain is required to have a high withstand voltage and a low specific resistance at room temperature, making it useful as a low-resistance circuit element. Conventionally,
In order to improve such resistivity characteristics, a part of Ba is replaced with Ca or Sr, and Mn, Si and Sr are added as additives.
Ox-added products have been proposed. According to this, a characteristic with a specific resistance of 10Ω·1 or less at room temperature can be obtained. In addition, Japanese Patent Publication No. 63-28324 discloses that by simultaneously replacing a part of Ba with Pb and Sr t Ca and incorporating these Pb, Sr, and Ca in a coexisting state in the main component barium titanate, It is stated that a withstand voltage of IOOV/■ or more can be obtained. [Problems to be Solved by the Invention] However, in the above-mentioned conventional barium titanate-based semiconductor porcelain, in which a part of the Ba mentioned above is replaced with Ca or Sr, although a satisfactory value of resistivity can be obtained, The highest voltage withstand voltage is only 48V/m, which is not a sufficient value for practical use. Further, as in the above publication, a part of Ba may be replaced with Pb. When Sr and Ca are substituted at the same time, a high withstand voltage can be obtained, but the specific resistance can only be lowered to 35Ω·1. Therefore, specific resistance 10Ω・1
There is a demand for the emergence of barium titanate-based semiconductor porcelain that can satisfy both the dielectric strength requirements of 100 V and above. An object of the present invention is to provide a barium titanate-based semiconductor ceramic composition that has high withstand voltage and low specific resistance. c.Means for Solving Problems] The inventors of the present invention have conducted extensive research to achieve the above object, and have found that BaTIOs. CaTiOs, SrT
iOs. The present invention was made based on the discovery that by using PbTl03 as the main component, selecting the subcomponents to be added to the main component, and limiting the amount added, it is possible to satisfy both the specific resistance and withstand voltage characteristics. Therefore, the present invention provides a main component consisting of barium titanate or a solid solution thereof, and a semiconducting agent. manganese. and a barium titanate-based semiconductor ceramic composition containing silica, wherein the main component is B a T i 0
.. 30-95 soj%, c a Ti
O s 3 ~ 25 mol %, S r
TiOs 1”-25mol%,
P b T I O s 1 to 30 oJ%, and the main component contains a rare earth element such as Y, La, Co, etc. or Nb. Bi. Sb. W. At least one type of oxide of Th is 0.05 mol% or more Q,j
moj% and manganese is added less than MnO. Converting to 0.003 sol% or more and less than 0.03 aoj%,
Silica converted to 3101 Li'0.01 moj% or more 0
.. It is characterized in that it contains less than 5 mail% of each. Here, the reasons for limiting various conditions in the present invention will be explained. ■ Above BaTiOs, CaTiOs, SrTi
Os. The main component was P bT i Os.
This is to improve the withstand voltage value by replacing a part of this Ba with Ca, Sr, and Pb at the same time. The above Pb
, Sr alone have their Curie points on the high temperature side. These Ca, Sr. By containing Pb in the coexisting state as a main component, the withstand voltage of 10
Achieves 0V/wa or more. ■ The reason for limiting the range of each principal component above is as follows. The reason why the above B a Ti O s is set to 30 to 95 moj% is that if it is less than 30 moj%, it becomes difficult to convert it into a semiconductor and the specific resistance increases, but if it exceeds 95-o 1%, the electrical characteristics will deteriorate significantly. Because it does. In addition, the above C a Ti O s is added to 3 to 25 mo J
% because if it is less than amol%, the effect of its inclusion will not be obtained, and if it exceeds 25moJ%, the withstand voltage properties will be poor. This is because it results in a decrease in inrush current characteristics. Furthermore, the above SrTiO is set at 1 to 25 mo II% because if it is less than 1 mol %, the effect of improving the properties is small, and if it exceeds 25*o II%, the electrical properties deteriorate. Furthermore, 1 to 30 mo 14% of the above PbTi03
This is because if it is less than lmoj%, the effect of improving characteristics is small and it is not suitable for practical use, and if it exceeds 30moj%, it becomes difficult to make it into a semiconductor. ■ Furthermore, it is known that the above-mentioned semiconducting agent is added to obtain barium titanate-based semiconductor ceramics, and the amount added is in the range of 0.05 mol% or more and less than 0.21101% to lower the specific resistance. The above is optimal. ■Furthermore, by adding the above-mentioned manganese, it is possible to significantly increase the rate of change of the positive resistance temperature characteristic beyond the Curie point. The amount of manganese added is MnO. The reason for setting the amount to be 0.003 moj% or more and less than 0.03 moj% in terms of 0.003 moj% or more is because when the amount added is 0.03 mol% or more, the resistivity at room temperature becomes high, and 0.003 moj% or more
This is because if the amount is less than %, the effect of addition cannot be obtained, and the withstand voltage characteristics will deteriorate on the contrary. ■ Furthermore, the above silica is SiO! Convert to 0.01mo 1% or more 0.5s
The reason why it is set to less than 0.0j% is to suppress changes in resistivity caused by slight fluctuations in the addition of a small amount of semiconducting agent, and to suppress abnormal grain growth in the sintered body.If it is outside the above range, the above effect will be lost. This is because you will not be able to obtain it. Here, the above-mentioned semiconducting agent. The amount of manganese and silica added was limited to facilitate lowering the specific resistance while ensuring the necessary withstand voltage.If even one of the above is out of range, firing, etc. to lower the resistance may be required. Condition setting may be difficult. [Function] According to the barium titanate-based semiconductor ceramic composition according to the present invention, as described above, BaTiO. , CaTies *
SrTiOs. Since PbTiOs is the main component,
In other words, since a part of this Ba is replaced with Ca, Sr, and PB at the same time, the withstand voltage can be improved.Furthermore, the semiconducting agent added to the above main component is 0.05■oj% or more and less than 0.2soJ%, and manganese Convert to Mn08 and get 0.003
moj% or more but less than 0.03moj%, silica Slo
Since it is 0.01 mol% or more and less than 0.51104% in terms of g, it is possible to reduce the specific resistance while ensuring the necessary withstand voltage, resulting in a withstand voltage of 100 V/■ or more and a specific resistance of 10
It is possible to realize a low-resistance circuit element of Ω・1 or less, meeting the above-mentioned requirements. [Examples] Examples of the present invention will be described below. This example describes an experiment in which the amounts of each main component and each subcomponent added in the present invention were determined. First, we will explain the method for manufacturing the samples used in the experiment. B a Ti O s (60 to 90 mo
j%). Ca TiOs (0~30moj
%), SrTiOs (0-12 mol%), P
b T i Os (0-13 moj%), Yt Os (0.1-1.5 mol%) as a semiconducting agent.
La wealth Os (0.15so j%),
C e Ox (0.15 go 1%) .Ndg
Os (0.15mo J%), and M as an additive
n CO s (converted to M n O *0.
01-0.15moj%). SiO! (0.1
~1. Prepare O vlol%). These raw materials are blended and wet-mixed so as to obtain a barium titanate-based semiconductor ceramic composition having the ratio shown in Table 1. Next, the slurry-like raw material was dehydrated and dried at 1150°C.
× Temporary firing for 2 hours. Next, this pre-sintered body is pulverized and mixed, a binder is added thereto, granulated, and a molding pressure of 100
Press into a disc shape at 0 kg/cd. Next, this disc-shaped compact was heated to 1360°C at 10°C/in, held for a predetermined time, and then fired using a firing profile in which it was cooled at 10°C/s+in. This makes the diameter 17.5X
Obtain a disc-shaped semiconductor porcelain with a thickness of 0.6. Then, electrodes made of In-Ga alloy were provided on both main surfaces of this semiconductor ceramic, and this was used as a sample for this experiment. In this experiment, we investigated the specific resistance and withstand voltage of each sample at room temperature (25°C). The Curie points of each were measured.
The above withstand voltage was measured at the maximum applied voltage value just before the sample was destroyed. Tables 1 and 2 show the results, and Table 1 shows the above main components. The compounding ratios of the semiconducting agent and additives are shown, and Table 2 shows the results of each measurement. In the table, samples Asahi 7-9, Pkl 1-13, P&L16. and 18 to 20 are within the scope of the present invention, and other *
Marks are outside the scope of this invention. As is clear from the table, when the amount of each main component added is outside the specified range (-1 to 6), the withstand voltage is 45%.
Low, below V/fi. Also, semiconducting agents, SiO1, Mn
Ot. When the addition amount of CaTiOs and CaTiOs exceeds the specified range (llhlO.Nal 4.15, Nal 7
), the resistivity increased significantly or fused during firing, and the resistivity of all samples increased. Satisfactory characteristics have not been obtained for both withstand voltage and voltage. On the other hand, when each addition amount is within the range of the present invention (1117 to 9, l1h
ll-13, Chen 16, -18 to 20) have a Curie point of 103 to 122°C and a specific resistance of 3.2 to 4.9Ω.
-1, and the withstand voltage is high at 104 to 152 V/W, indicating that a satisfactory value has been obtained. [Effects of the Invention] As described above, according to the barium titanate-based semiconductor ceramic composition of the present invention, B a T i Os 3G to 95
soil%. CaTiOs 3-25 mo/%. SrT
iOs1-25soJ%, P b T i Os
1 to 301101% as the main component, to which 0.05 mo j% or more of a semiconductor forming agent and 0.2 whole % ungrooved are added, and 0 in terms of Mn jcM n O *
.. 003 soj! % or more and less than 0.03 mol%, Si
Ox O. 01moj% or more and less than 0.5moj%, respectively, so the withstand voltage is 100V/M or more,
It has the effect of providing excellent characteristics with a resistivity of 10Ω·1 or less, and of producing semiconductor porcelain useful as a low-resistance circuit element.
Claims (1)
に、半導体化剤,マンガン,及びシリカが添加含有され
ているチタン酸バリウム系半導体磁器組成物において、
上記主成分は、BaTiO_3が30〜95mol%、
CaTiO_3が3〜25mol%、SrTiO_3が
1〜25mol%、PbTiO_3が1〜30mol%
からなり、上記主成分に対して半導体化剤として、Y,
La,Ce等の希土類元素あるいはNb,Bi,Sb,
W,Thの酸化物のうち少なくとも一種が0.05mo
l%以上0.2mol%未満添加含有され、かつマンガ
ンがMnO_2に換算して0.003mol%以上0.
03mol%未満、シリカがSiO_2に換算して0.
01mol%以上0.5mol%未満それぞれ添加含有
されていることを特徴とするチタン酸バリウム系半導体
磁器組成物。(1) A barium titanate-based semiconductor ceramic composition in which a semiconducting agent, manganese, and silica are added to the main component consisting of barium titanate or a solid solution thereof,
The above main components include 30 to 95 mol% of BaTiO_3;
CaTiO_3 is 3-25 mol%, SrTiO_3 is 1-25 mol%, PbTiO_3 is 1-30 mol%
Y, as a semiconducting agent for the above main component.
Rare earth elements such as La, Ce or Nb, Bi, Sb,
At least one of the oxides of W and Th is 0.05 mo
1% or more and less than 0.2 mol%, and manganese is 0.003 mol% or more in terms of MnO_2.
Less than 0.03 mol%, silica is 0.03% in terms of SiO_2.
A barium titanate-based semiconductor ceramic composition, characterized in that the barium titanate-based semiconductor ceramic composition contains 0.01 mol% or more and less than 0.5 mol%.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2007933A JPH03215356A (en) | 1990-01-16 | 1990-01-16 | Barium titanate-based semiconductor ceramic composition |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2007933A JPH03215356A (en) | 1990-01-16 | 1990-01-16 | Barium titanate-based semiconductor ceramic composition |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH03215356A true JPH03215356A (en) | 1991-09-20 |
Family
ID=11679320
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2007933A Pending JPH03215356A (en) | 1990-01-16 | 1990-01-16 | Barium titanate-based semiconductor ceramic composition |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH03215356A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5777541A (en) * | 1995-08-07 | 1998-07-07 | U.S. Philips Corporation | Multiple element PTC resistor |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0388770A (en) * | 1989-08-31 | 1991-04-15 | Central Glass Co Ltd | Barium titanate-based semiconductor porcelain composition and thermistor |
-
1990
- 1990-01-16 JP JP2007933A patent/JPH03215356A/en active Pending
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0388770A (en) * | 1989-08-31 | 1991-04-15 | Central Glass Co Ltd | Barium titanate-based semiconductor porcelain composition and thermistor |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5777541A (en) * | 1995-08-07 | 1998-07-07 | U.S. Philips Corporation | Multiple element PTC resistor |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP3319314B2 (en) | Barium titanate-based semiconductor porcelain composition | |
| JPS6328324B2 (en) | ||
| KR20170016805A (en) | Semiconductive ceramic composition and ptc thermistor | |
| JPH0226866A (en) | Semiconductor ceramic composition | |
| JP3245984B2 (en) | Barium titanate-based semiconductor porcelain having a negative resistance temperature characteristic and method of manufacturing the same | |
| US6071842A (en) | Barium titanate-based semiconductor ceramic | |
| JPH0442501A (en) | Electronic device using barium titanate based semiconductor porcelain | |
| JPH03215356A (en) | Barium titanate-based semiconductor ceramic composition | |
| JP2014205585A (en) | Semiconductor ceramic composition and method of producing the same | |
| JP2014034505A (en) | Semiconductor ceramic composition and method of producing the same | |
| JPH03215354A (en) | Barium titanate-based semiconductor ceramic composition | |
| JP2536679B2 (en) | Positive characteristic thermistor material | |
| JP2990679B2 (en) | Barium titanate-based semiconductor porcelain composition | |
| JPH04104951A (en) | Barium titanate-based semiconductive porcelain material | |
| JP3003201B2 (en) | Barium titanate-based semiconductor porcelain composition | |
| WO2004110952A1 (en) | Barium titanate based semiconductor porcelain composition | |
| JP3166787B2 (en) | Barium titanate-based semiconductor porcelain composition | |
| JPH03215353A (en) | Barium titanate-based semiconductor ceramic composition | |
| JPH1179833A (en) | Barium titanate-based semiconductor ceramic | |
| JP3273468B2 (en) | Barium titanate-based semiconductor porcelain composition | |
| JPH0551254A (en) | Barium titanate-containing semiconductor porcelain composition | |
| JPH11139870A (en) | Barium titanate-base semiconductor porcelain | |
| JPS6046811B2 (en) | Composition for semiconductor ceramic capacitors | |
| JPS6048895B2 (en) | Grain boundary insulated semiconductor porcelain capacitor | |
| JPH07220902A (en) | Barium titanate semiconductor ceramic |