JPH03215986A - Metal base wiring board - Google Patents
Metal base wiring boardInfo
- Publication number
- JPH03215986A JPH03215986A JP1146290A JP1146290A JPH03215986A JP H03215986 A JPH03215986 A JP H03215986A JP 1146290 A JP1146290 A JP 1146290A JP 1146290 A JP1146290 A JP 1146290A JP H03215986 A JPH03215986 A JP H03215986A
- Authority
- JP
- Japan
- Prior art keywords
- metal
- wiring board
- boron nitride
- resin
- metal plate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 229910052751 metal Inorganic materials 0.000 title claims description 19
- 239000002184 metal Substances 0.000 title claims description 19
- 229920005989 resin Polymers 0.000 claims description 9
- 239000011347 resin Substances 0.000 claims description 9
- 229910052582 BN Inorganic materials 0.000 claims description 7
- PZNSFCLAULLKQX-UHFFFAOYSA-N Boron nitride Chemical compound N#B PZNSFCLAULLKQX-UHFFFAOYSA-N 0.000 claims description 7
- 239000011888 foil Substances 0.000 claims description 3
- 229920001187 thermosetting polymer Polymers 0.000 claims description 3
- 239000010410 layer Substances 0.000 description 8
- 229910052782 aluminium Inorganic materials 0.000 description 5
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 5
- 230000000052 comparative effect Effects 0.000 description 5
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 4
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 4
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 3
- 239000011229 interlayer Substances 0.000 description 3
- -1 zinc and nickel Chemical class 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 2
- 239000000956 alloy Substances 0.000 description 2
- 229910045601 alloy Inorganic materials 0.000 description 2
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 2
- 239000002131 composite material Substances 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000003822 epoxy resin Substances 0.000 description 2
- 230000017525 heat dissipation Effects 0.000 description 2
- 229910052742 iron Inorganic materials 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 238000000465 moulding Methods 0.000 description 2
- 229910052759 nickel Inorganic materials 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 229920000647 polyepoxide Polymers 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- 229910052725 zinc Inorganic materials 0.000 description 2
- 239000011701 zinc Substances 0.000 description 2
- QTWJRLJHJPIABL-UHFFFAOYSA-N 2-methylphenol;3-methylphenol;4-methylphenol Chemical compound CC1=CC=C(O)C=C1.CC1=CC=CC(O)=C1.CC1=CC=CC=C1O QTWJRLJHJPIABL-UHFFFAOYSA-N 0.000 description 1
- 229920000877 Melamine resin Polymers 0.000 description 1
- 239000004640 Melamine resin Substances 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 239000010953 base metal Substances 0.000 description 1
- 239000011247 coating layer Substances 0.000 description 1
- 239000011889 copper foil Substances 0.000 description 1
- 229930003836 cresol Natural products 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000004744 fabric Substances 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 239000011256 inorganic filler Substances 0.000 description 1
- 239000012948 isocyanate Substances 0.000 description 1
- 150000002513 isocyanates Chemical class 0.000 description 1
- 238000003475 lamination Methods 0.000 description 1
- 239000000395 magnesium oxide Substances 0.000 description 1
- CPLXHLVBOLITMK-UHFFFAOYSA-N magnesium oxide Inorganic materials [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 description 1
- AXZKOIWUVFPNLO-UHFFFAOYSA-N magnesium;oxygen(2-) Chemical compound [O-2].[Mg+2] AXZKOIWUVFPNLO-UHFFFAOYSA-N 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 239000012766 organic filler Substances 0.000 description 1
- 239000005011 phenolic resin Substances 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 239000009719 polyimide resin Substances 0.000 description 1
- 229920005749 polyurethane resin Polymers 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
- 229920006337 unsaturated polyester resin Polymers 0.000 description 1
Landscapes
- Laminated Bodies (AREA)
- Insulated Metal Substrates For Printed Circuits (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は電子機器、電気機器、通偏機器、計算機器等に
用込られ、特に耐電圧性を要求する機器に用(八られる
金属ベース配線基板に関するものである。[Detailed Description of the Invention] [Industrial Application Field] The present invention is applicable to electronic equipment, electrical equipment, biasing equipment, computing equipment, etc., and is particularly applicable to equipment that requires high voltage resistance (metal-based This invention relates to wiring boards.
従来の金属ベース配線基板はその放熱性を買われ、多様
な用途に用(八られているが、耐電圧が比較的低b問題
があった。Conventional metal-based wiring boards are valued for their heat dissipation properties and are used for a variety of purposes, but they have the problem of relatively low withstand voltage.
従来の技術で述べたように、従来の金属ベース配線基叛
け耐電比が比較的低力問題があーた。このため、アルミ
ニウムベース基板にあってはアルミニウム表面をアルマ
イト処理したり、アルミナ熔射することが試みられたが
、層間接肴性、べ一ス金属表面の平滑性が低下する等の
欠点があった6本発明は従来の技術における上述の問題
点に鑑みてなされたもので、その目的とするところは耐
電圧に優れた金属ベース配線基板を提供することにある
。As mentioned in the prior art section, conventional metal-based interconnects have a relatively low dielectric strength ratio. For this reason, attempts have been made to treat the aluminum surface with alumite or alumina spraying for aluminum-based substrates, but these methods have drawbacks such as deterioration of interlayer applicability and smoothness of the base metal surface. The present invention has been made in view of the above-mentioned problems in the prior art, and its object is to provide a metal-based wiring board with excellent withstand voltage.
〔問題点を解決するための手段)
本発明は金属板の上面及び又は下面に、窒化ボロン含有
熱硬化性樹脂層を介して金属箔を配設一体化してなるこ
とを特徴とする金属ベース配線基板のため、低誘電率の
窒化ボロンが耐電圧を大巾に向上し、上記目的を達成す
ることができたもので、以下本発明を詳細に説明する。[Means for Solving the Problems] The present invention provides a metal base wiring characterized in that metal foil is integrally disposed on the upper and/or lower surfaces of a metal plate via a boron nitride-containing thermosetting resin layer. Since the substrate is made of boron nitride with a low dielectric constant, the withstand voltage is greatly improved, and the above object can be achieved.The present invention will be described in detail below.
本発明に用−る金属板としてはアルミニウム、鉄、銅、
亜鉛、ニッケル等の単独、合金、複合板金用論ることが
でき、厚みは0.1〜lQffであることが好ましく、
更に金属板表面を物理処理、化学処理で活性化、粗面化
し、゜層間接着性全向上させることもできる。熱硬化性
樹脂層としては、フェノール樹脂、クレゾール樹脂、メ
ラミン樹脂、エポキシ樹脂、不飽和ポリエステル樹脂、
ポリイミド樹脂、イソシアネート樹脂、ポリウレタン樹
脂等の単独、変性物、混合物よりなり、必要に応じて無
機、有機の充填剤を混入することもできるが、窒化ホロ
ンを含有させることが必要である。窒化ボロンの添加量
は樹脂の10〜100重層係(以下単に係と記す)が好
ましー。即ちIO%未満では耐電圧が向上し難く、10
0%をこえると層間接看性が低下する傾向にあるからで
ある。窒化ボロンの平均粒径は0.1〜5ミクロンであ
ることが好まし(八。樹脂層は塗布層、フイルム層、シ
ート層、樹脂含浸基材層等であり特に限定するものでは
なく、更に樹脂層の厚みにつhても限定するものではな
ーか、lO〜250ミクロンであることが好ましい。Metal plates used in the present invention include aluminum, iron, copper,
It can be used for individual, alloy, and composite sheet metals such as zinc and nickel, and the thickness is preferably 0.1 to 1Qff.
Furthermore, the surface of the metal plate can be activated and roughened by physical treatment or chemical treatment to completely improve interlayer adhesion. As the thermosetting resin layer, phenol resin, cresol resin, melamine resin, epoxy resin, unsaturated polyester resin,
It is composed of polyimide resins, isocyanate resins, polyurethane resins, etc. alone, modified products, and mixtures, and inorganic or organic fillers can be mixed as necessary, but it is necessary to contain phoron nitride. The amount of boron nitride added is preferably 10 to 100 times the amount of the resin (hereinafter simply referred to as the amount). That is, if it is less than IO%, it is difficult to improve the withstand voltage;
This is because when it exceeds 0%, interlayer visibility tends to decrease. The average particle size of boron nitride is preferably 0.1 to 5 microns (8. The resin layer is not particularly limited, and may be a coating layer, a film layer, a sheet layer, a resin-impregnated base material layer, etc. The thickness of the resin layer is not particularly limited, but it is preferably 10 to 250 microns.
金属箔としては厚み0.018〜9.07 mの銅、ア
ルミニウム、鉄、ニッケル、亜鉛等の単独、合金、複合
板を用−必妥に応じて接着面を物理的処理や化学的処理
で表面処理しておくことが好ましい。As the metal foil, use individual, alloy, or composite plates of copper, aluminum, iron, nickel, zinc, etc., with a thickness of 0.018 to 9.07 m - the adhesive surface may be physically or chemically treated as necessary. It is preferable to carry out surface treatment.
体化手段としては、プレス、ロール、ダブルベルト等の
ように#層一体化できるものであればよく特に限定する
ものではなb0
以下本発明全実施例にもとづbて説明する。The forming means is not particularly limited as long as it can integrate the # layer, such as a press, a roll, a double belt, etc.b0 The following description will be made based on all the embodiments of the present invention.
実施例
厚みIHのアルミニウム板表面をサンドペーパーで研磨
後、平均粒径50ミクロンの窒化ボロン全50係含有す
るエボキシ樹脂フェスを厚み0. 1 mのガラス布に
乾燥後樹脂董が50%になるように含浸、乾燥した樹脂
含浸基材1枚を介して厚みQ.0 3 mの銅箔を配設
した積層体を成形圧力20KQ/d, 165℃で90
分間積層成形して金属ベース配線基板を得た。Example After polishing the surface of an aluminum plate with a thickness of IH with sandpaper, an epoxy resin face containing a total of 50 parts of boron nitride with an average particle size of 50 microns was applied to a thickness of 0. After drying, a 1 m glass cloth was impregnated with resin to a thickness of 50%, and then passed through one dried resin-impregnated base material to a thickness of Q. A laminate with 0.3 m of copper foil was molded at a molding pressure of 20 KQ/d and a temperature of 90° C. at 165°C.
A metal base wiring board was obtained by lamination molding for minutes.
比較例1乃至3
実施例の窒化ボロンを比較例1につbては酸化マグネシ
ウム、比較例2についてはシリカ、比較例3につーては
アルミナにした以外は実施例と同様に処理して金属ベー
ス配線基板を得た。Comparative Examples 1 to 3 The boron nitride was treated in the same manner as in the example except that magnesium oxide was used in comparative example 1, silica was used in comparative example 2, and alumina was used in comparative example 3. A metal base wiring board was obtained.
実施例及び比較例1乃至3の金属ベース配線基板の性能
は第1表のようである。The performances of the metal-based wiring boards of Examples and Comparative Examples 1 to 3 are shown in Table 1.
注
壷 25φ電極、1分* O−5 m A力9トオフ電
流〔発明の効果〕
本発明は上述した如く構成されてbる。特許請求の範囲
に記載した構成を有する金属ベース配線基板においては
放熱性を維持した上で、耐電圧を向上させることのでき
る効果がある。Pot: 25φ electrode, 1 minute* O-5 m, A force, 9 to-off current [Effects of the Invention] The present invention is constructed as described above. The metal base wiring board having the structure described in the claims has the effect of improving the withstand voltage while maintaining heat dissipation.
Claims (1)
硬化性樹脂層を介して金属箔を配設一体化してなること
を特徴とする金属ベース配線基板。(1) A metal-based wiring board characterized in that a metal foil is integrally disposed on the upper and/or lower surface of a metal plate via a boron nitride-containing thermosetting resin layer.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1146290A JPH03215986A (en) | 1990-01-19 | 1990-01-19 | Metal base wiring board |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1146290A JPH03215986A (en) | 1990-01-19 | 1990-01-19 | Metal base wiring board |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH03215986A true JPH03215986A (en) | 1991-09-20 |
Family
ID=11778758
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1146290A Pending JPH03215986A (en) | 1990-01-19 | 1990-01-19 | Metal base wiring board |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH03215986A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102009000882A1 (en) * | 2009-02-16 | 2010-08-26 | Semikron Elektronik Gmbh & Co. Kg | Substrate for receiving at least one component and method for producing a substrate |
-
1990
- 1990-01-19 JP JP1146290A patent/JPH03215986A/en active Pending
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102009000882A1 (en) * | 2009-02-16 | 2010-08-26 | Semikron Elektronik Gmbh & Co. Kg | Substrate for receiving at least one component and method for producing a substrate |
| DE102009000882B4 (en) * | 2009-02-16 | 2010-10-21 | Semikron Elektronik Gmbh & Co. Kg | Substrate for receiving at least one component and method for producing a substrate |
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