JPH03216174A - Aseptic freezing device using liquefied nitrogen - Google Patents
Aseptic freezing device using liquefied nitrogenInfo
- Publication number
- JPH03216174A JPH03216174A JP2009446A JP944690A JPH03216174A JP H03216174 A JPH03216174 A JP H03216174A JP 2009446 A JP2009446 A JP 2009446A JP 944690 A JP944690 A JP 944690A JP H03216174 A JPH03216174 A JP H03216174A
- Authority
- JP
- Japan
- Prior art keywords
- nitrogen
- nitrogen gas
- liquefied
- liquefied nitrogen
- heat exchanger
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P60/00—Technologies relating to agriculture, livestock or agroalimentary industries
- Y02P60/80—Food processing, e.g. use of renewable energies or variable speed drives in handling, conveying or stacking
- Y02P60/85—Food storage or conservation, e.g. cooling or drying
Landscapes
- Freezing, Cooling And Drying Of Foods (AREA)
Abstract
(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.
Description
【発明の詳細な説明】
ぐ産業上の利用分野〉
本発明は、液化窒素を用いた薬剤などの無菌化凍結装置
に関し、主にバイアル瓶などに充填する凍結薬剤を微生
物、塵埃などの汚染から防護して、安全に凍結できるも
のを提洪する。[Detailed description of the invention] Industrial application field> The present invention relates to a device for sterilizing and freezing drugs and the like using liquefied nitrogen, and mainly for preventing contamination of frozen drugs filled into vials etc. by microorganisms, dust, etc. Protect and donate items that can be safely frozen.
〈従来技術〉
従来、液化窒素を用いた薬剤などの凍結粉末化は、液化
窒素ガスボンベから導出した液化窒素の極低温液の中に
、対象となる薬剤を直接的に浸漬して行っていた。<Prior Art> Conventionally, the freezing and powdering of drugs and the like using liquefied nitrogen has been carried out by directly immersing the target drug in a cryogenic liquid of liquefied nitrogen derived from a liquefied nitrogen gas cylinder.
く発明が解決しようとする課題〉
しかしながら、上記従来技術では、元来、液化窒素中に
微量の塵埃や雑菌が混入していることは避けられず、液
(ヒ窒素を接触させて被処理物を凍結する場合、通常の
畜肉、魚肉などの食品では比較的問題が少ないか、バイ
アル瓶充填用、或は、注射器充填用の薬剤では人体への
影響を考慮すれば問題は大きい。Problems to be Solved by the Invention> However, in the above-mentioned conventional technology, it is unavoidable that trace amounts of dust and bacteria are mixed into the liquefied nitrogen. When freezing foods such as ordinary livestock meat and fish meat, there is relatively little problem, but when it comes to drugs for filling vials or syringes, the problem is serious considering the effect on the human body.
本発明は、液化窒素を用いて被処理物を凍結する場合、
雑菌や塵埃などの汚染を円滑に除去することを技術的課
題とする。In the present invention, when freezing a processed material using liquefied nitrogen,
The technical challenge is to smoothly remove contamination such as germs and dust.
く課題を解決するための手段〉
上記課題を解消する手段を、実施例に対応する図面を用
いて以下に説明する。Means for Solving the Problems> Means for solving the above problems will be described below using drawings corresponding to embodiments.
即ち、本第1発明は、液化窒素供給源7を気化手段8を
介してこ過装置3に接続し、r過装置3を窒素ガス供給
路4て凍結室5に接続して、液化窒素を気化手段8で気
化して窒素ガスとし、窒素ガスをろ過装置3に通し、極
低温状態の窒素ガスを窒素ガス供給路4で凍結室5に送
り、凍結室5に収容した被処理物に当該窒素ガスを接触
させて、被処理物を極低温の窒素ガスで凍結するように
構成したことを特徴とする液化窒素を用いた無菌化凍結
装置てある。That is, the first invention connects the liquefied nitrogen supply source 7 to the filtration device 3 via the vaporization means 8, connects the filtration device 3 to the freezing chamber 5 through the nitrogen gas supply path 4, and vaporizes the liquefied nitrogen. The means 8 vaporizes the nitrogen gas, passes it through the filtration device 3, sends the nitrogen gas in an extremely low temperature state to the freezing chamber 5 through the nitrogen gas supply path 4, and injects the nitrogen into the object to be treated stored in the freezing chamber 5. This is a sterilization freezing device using liquefied nitrogen, characterized in that it is configured to freeze the object to be treated with extremely low temperature nitrogen gas by bringing the gas into contact with the object.
また、第2発明は、上記第1発明において、窒素ガス供
給路4に熱交換器15を介在させ、窒素ガス供給路4を
通る窒素ガスと、液fヒ窒素供給源7から導出された液
化窒素とを熱交換器15内に熱交換可能に流し、当該液
化窒素を熱交換器15から気{ヒ手段8に流すように構
成して、気化手段8での気化により高温になった上記窒
素ガスに液化窒素の冷熱を付与して、熱交換器15内で
高温の窒素ガスを極低温に冷却するにように構成したも
のである。Further, in a second invention, in the first invention, a heat exchanger 15 is interposed in the nitrogen gas supply path 4, and the nitrogen gas passing through the nitrogen gas supply path 4 and the liquefied nitrogen gas derived from the liquid nitrogen supply source 7 are provided. The liquefied nitrogen is made to flow into the heat exchanger 15 so as to be able to exchange heat with nitrogen, and the liquefied nitrogen is flowed from the heat exchanger 15 to the air blowing means 8. The structure is such that high-temperature nitrogen gas is cooled to an extremely low temperature in a heat exchanger 15 by applying the cold energy of liquefied nitrogen to the gas.
上記被処理物とは、バイアル瓶に充填した薬剤、或は、
注射器に充填するための薬剤を初めとして、畜肉や魚肉
などの生肉、その他の食品をも包含する。The above-mentioned object to be processed is a drug filled in a vial, or
It includes drugs for filling into syringes, raw meat such as livestock meat and fish, and other foods.
上記気化手段とは、加熱器、熱交換器などのべイパライ
ザをいう。The vaporization means mentioned above refers to vaporizers such as heaters and heat exchangers.
上記P過装置とは、例えば、除菌フィルターなどであっ
て、微生物、塵埃などの微細物を枦過・除去するものを
いう。The above-mentioned P filtration device refers to, for example, a sterilization filter that filters out and removes minute substances such as microorganisms and dust.
上記凍結室に供給する窒素カスは、
■気化により高温1ヒした窒素カスを、上記第2発明に
示すように、液1ヒ窒素の冷熱で冷却して極低温にして
ら良いし、
■気化手段の調整により、液化窒素を気化した時点で窒
素ガスを極低温状態にするようにしても差し支えない(
但し、この場合には、低温使用の可能なア過装置が必要
である)。The nitrogen sludge to be supplied to the freezing chamber is as follows: (1) Nitrogen sludge that has been heated to a high temperature by vaporization may be cooled to an extremely low temperature by using the cold heat of liquid arsenic nitrogen as shown in the second invention; (2) Vaporizing means It is also possible to bring the nitrogen gas to a cryogenic state at the time the liquefied nitrogen is vaporized by adjusting the
However, in this case, a filter device that can be used at low temperatures is required.)
上記凍結室は、極低温窒素ガスを被処理物に直接吹き付
けて凍結するようにしても、
室内に極低温窒素ガスを充満させて、窒素ガス雰囲気に
被処理物を接触させるように構成しても差し支えない。The above-mentioned freezing chamber may be configured so that cryogenic nitrogen gas is directly sprayed onto the processed material to freeze it, or the chamber is filled with cryogenic nitrogen gas and the processed material is brought into contact with the nitrogen gas atmosphere. There is no problem.
く作用〉 (1)第1発明では、下記のとおり作用する。Effect〉 (1) The first invention operates as follows.
液(ヒ窒素供給源7から導出された液化窒素は、気化手
段で一旦窒素ガスの気体にされたのち、P過装置3を通
過する際に、
■細菌、糸状菌、酵母などの微生物を除菌され、■微細
な塵埃を除塵される。The liquefied nitrogen derived from the nitrogen supply source 7 is once converted into nitrogen gas by the vaporization means, and then when passing through the P filter device 3, microorganisms such as bacteria, filamentous fungi, and yeast are removed. ■ Microscopic dust is removed.
二の場合、P過装置3のア過対象は気体てあって液体で
はないので、7戸過精度を高めてより微細な微生物或は
塵埃を有効に除去できる。In case 2, since the object to be filtered by the P filtering device 3 is gas and not liquid, the filtering accuracy can be improved and more minute microorganisms or dust can be effectively removed.
一般に、微生物は、液化窒素を気(ヒ手段で加熱して窒
素ガスにする際に、ある程度は死滅するはずであるが、
当該加熱によっても殺菌の容易でないバチルス属(Ba
Ci l lus)、クロストリシウム属(Clost
ridium)などの耐熱性芽胞を作る細菌をも枦過装
置3で有効に除菌できる。Generally, microorganisms should be killed to some extent when liquefied nitrogen is heated to nitrogen gas.
Even with this heating, it is difficult to sterilize Bacillus (Ba
Ci l lus), Clostricium spp.
Bacteria that produce heat-resistant spores such as P. ridium can also be effectively sterilized by the filtration device 3.
また、気体を一過処理するので、通過抵抗が少なくなっ
て沢過装置3を小型化てきる。Furthermore, since the gas is subjected to one-time treatment, the passing resistance is reduced and the filtration device 3 can be made smaller.
P過装置3を通過した液化窒素は、極低温の状態で凍結
室5に供給され、凍結室3内の被処理物20を無菌化凍
結する。The liquefied nitrogen that has passed through the phosphor filtration device 3 is supplied to the freezing chamber 5 at an extremely low temperature to sterilize and freeze the object 20 in the freezing chamber 3 .
(2)第2発明では、上記液化窒素供給源7から導出さ
れた液化窒素は気化手段8で気化して、高温の窒素ガス
になるが、熱交換器15を通る際に、液化窒素の冷熱で
冷却されて極低温の窒素ガスとなる。(2) In the second invention, the liquefied nitrogen derived from the liquefied nitrogen supply source 7 is vaporized by the vaporization means 8 to become high-temperature nitrogen gas, but when passing through the heat exchanger 15, the cold heat of the liquefied nitrogen is It is cooled down and becomes cryogenic nitrogen gas.
一方、液化窒素供給源7から出た直後の液化窒素は、熱
交換器15で窒素ガスから温熱をムらって昇温するので
、気(ヒ手段15で叶与される熱を低パして、気(ヒエ
ネ、ルギーを省力化できる。On the other hand, the temperature of the liquefied nitrogen immediately after coming out of the liquefied nitrogen supply source 7 is increased by distributing heat from the nitrogen gas in the heat exchanger 15, so that the heat provided by the air (heat) means 15 is reduced. It can save energy and energy.
(発明の効果)
(1)従来技術では、薬剤などの凍結手段である液(ヒ
窒素自体を除菌するという技術的思想はなかったのに対
し、第1及び2発明では、液fヒ窒素を窒素カスにした
うえて、P過装置で除菌、除塵するので(除菌手段がP
過なので、特に、耐熱性芽胞を作る細菌をちスムーズに
除去できるので)、薬剤を初めとする被処理物を無菌1
ヒ凍結して、人体への安全を確保できる。(Effects of the Invention) (1) In the prior art, there was no technical idea of sterilizing the liquid (arsenic nitrogen itself) that is a means of freezing drugs, etc., whereas in the first and second inventions, the liquid f is converted into nitrogen scum, and then sterilized and dusted with a P filter device (the sterilization method is P
This method allows for the smooth removal of bacteria that produce heat-resistant spores.)
It can be frozen to ensure safety for humans.
(2)第1・2発明ては、窒素を液体から気体に変換し
たうえでP過処理するので、より微細な雑菌、塵埃まで
強力に除去でき、安全度を高められる。(2) In the first and second inventions, nitrogen is converted from a liquid to a gas and then subjected to P overtreatment, so even finer germs and dust can be strongly removed, increasing safety.
(3)第2発明では、液化窒素の冷熱及び窒素ガスの温
熱を互いにうまく利用し合えるので、熱交換効率を高め
、気化手段を小型化できる。(3) In the second invention, since the cold heat of liquefied nitrogen and the warm heat of nitrogen gas can be effectively utilized, the heat exchange efficiency can be increased and the vaporization means can be downsized.
〈実施例〉 以下、本発明の実施例を図面に基づいて述べる。<Example> Embodiments of the present invention will be described below based on the drawings.
図面は液化窒素1!用式無菌化凍結装置の概略説明図で
あって、当該凍結装置は、液化窒素供給ライン1、ヒー
タ式加熱器8、窒素ガス導入ライン2、除菌フィルター
3、窒素ガス導出ライン4及び凍結室5を順番に接続し
て構成される。The drawing is liquefied nitrogen 1! FIG. 2 is a schematic explanatory diagram of a commercial sterilization freezing device, which includes a liquefied nitrogen supply line 1, a heater type heater 8, a nitrogen gas introduction line 2, a sterilization filter 3, a nitrogen gas derivation line 4, and a freezing chamber. 5 are connected in order.
複数の液化窒素ボンベ6を組み合わせて液化窒素供給源
7efll成し、液化窒素供給源7を上記液[ヒ窒素供
給ライン1でヒータ式加熱器Sに接続する。A plurality of liquefied nitrogen cylinders 6 are combined to form a liquefied nitrogen supply source 7efll, and the liquefied nitrogen supply source 7 is connected to the heater type heater S through the liquid nitrogen supply line 1.
上記加熱器8を窒素ガス導入ライン2を介して除菌フィ
ルター3に接続し、除菌フィルター3を窒素ガス導出ラ
イン4で凍結室5に接続する。The heater 8 is connected to the sterilizing filter 3 through the nitrogen gas introduction line 2, and the sterilizing filter 3 is connected to the freezing chamber 5 through the nitrogen gas deriving line 4.
上記除菌フィルター3はセラミックス製の沢過膜に被処
理ガスを通す構造であって、下記の特性を持つ。The sterilization filter 3 has a structure in which the gas to be treated passes through a ceramic permeation membrane, and has the following characteristics.
沢過精度:
常用圧力:
使用温度:
最大流量:
上記窒素ガス導入ライ
02μm
2.0KI?/am2
一20℃〜0℃
150m3/Hr
ン2に温度センサ11を
臨ませ、加熱器8に温度制陣装置12を連動して、温度
セシサ11からの検知温度信号を受けた温度制御装置1
2が加熱器8の加熱温度を制即し、導入ライン2を流れ
る窒素ガスを所定温度に保持するように構成する。Overflow accuracy: Normal pressure: Operating temperature: Maximum flow rate: Nitrogen gas introduction line above 02μm 2.0KI? /am2 - 20°C to 0°C 150m3/Hr Temperature control device 1 has temperature sensor 11 facing oven 2, and has temperature control device 12 interlocked with heater 8 to receive a detected temperature signal from temperature control device 11.
2 controls the heating temperature of the heater 8 and is configured to maintain the nitrogen gas flowing through the introduction line 2 at a predetermined temperature.
上記窒素ガス導入ライン2の途中部を二股状に分岐して
、一方に可変絞り弁9aを、他方に可変絞り弁9bと流
量調整弁10とを各々1寸設する。The nitrogen gas introduction line 2 is branched into two parts in the middle, and a variable throttle valve 9a is installed on one side, and a variable throttle valve 9b and a flow rate adjustment valve 10 are installed on the other side.
また、前記凍結室5に温度センサ13を付設し、上記流
量調整弁10に温度制御装置14を連動して、温度セン
サ13からの検知温度信号を受けた温度制御装置14が
流量調整弁10の流量を制御して凍結室5内の雰囲気を
所定温度に保持するように構成する。Further, a temperature sensor 13 is attached to the freezing chamber 5, and a temperature control device 14 is linked to the flow rate adjustment valve 10, so that the temperature control device 14, which receives the detected temperature signal from the temperature sensor 13, controls the flow rate adjustment valve 10. The atmosphere in the freezing chamber 5 is maintained at a predetermined temperature by controlling the flow rate.
一方、上記窒素ガス導出ライン4に熱交換器15を介在
させ、窒素カス導出ライン4の窒素ガスと、前記液化窒
素供給ライン1の液化窒素とを熱交換可能に当該熱交換
器15内に流し、除菌フィルター3で除菌された窒素ガ
スを液化窒素の冷熱で冷却するように構成する。On the other hand, a heat exchanger 15 is interposed in the nitrogen gas derivation line 4, and the nitrogen gas in the nitrogen waste derivation line 4 and the liquefied nitrogen in the liquefied nitrogen supply line 1 are allowed to flow into the heat exchanger 15 so as to be able to exchange heat. , so that the nitrogen gas sterilized by the sterilization filter 3 is cooled by the cold energy of liquefied nitrogen.
上記凍結室ヲには、窒素ガス導出ライン4で送給された
瘉低温窒素ガスが噴射ノズル16から噴き込まれ、換気
ファン17て撹拌されて、凍結室5内を極低温に傑持し
、搬送ライン18により搬送される被処理拘20(例え
ば、点滴用薬液)を凍結室5内で凍結して粉末化する。Low-temperature nitrogen gas supplied through the nitrogen gas derivation line 4 is injected into the freezing chamber from the injection nozzle 16, and is stirred by the ventilation fan 17 to maintain the inside of the freezing chamber 5 at an extremely low temperature. The material to be treated 20 (for example, a medical solution for intravenous drip) transported by the transport line 18 is frozen and powdered in the freezing chamber 5 .
そこで、上記凍結装置の機能を説明する。Therefore, the functions of the above-mentioned freezing device will be explained.
(1)液化窒素供給ライン1から供給される−180゜
Cの液化窒素を熱交換器15で予め昇温したのち、加熱
器8で気化してO℃の窒素ガスにする。(1) After the liquefied nitrogen at -180°C supplied from the liquefied nitrogen supply line 1 is heated in advance in the heat exchanger 15, it is vaporized in the heater 8 to become nitrogen gas at 0°C.
この場合、加熱器8から排出される窒素ガスは、上述の
ように、比較的高温での使用が条件付けられた除菌フィ
ルター3を通すために、一旦0℃にまで昇温する必要が
あるが、当該窒素ガスの温度は、温度制御装置12で温
度制御される。In this case, the nitrogen gas discharged from the heater 8 needs to be heated once to 0°C in order to pass through the sterilization filter 3, which is required to be used at relatively high temperatures, as described above. The temperature of the nitrogen gas is controlled by a temperature control device 12.
(2)高温化された窒素ガスは、窒素ガス導入ライン2
で除菌フィルター3に通されて、細菌、糸状菌などの微
生物(特に、耐熱性芽胞を作る細菌)を除菌され、微細
な塵埃を除塵されて清浄化される.(3)漬浄イ}′さ
れた高温の9素ガスは、窒素ガス導出ライン4て熱交換
器15に送られて、−180゜Cの液1ヒ窒素の冷熱を
付与され、−170℃の極低温に冷却される。(2) The heated nitrogen gas is transferred to the nitrogen gas introduction line 2.
Then, it is passed through a sterilization filter 3, where microorganisms such as bacteria and filamentous fungi (especially bacteria that produce heat-resistant spores) are sterilized, and fine dust is removed and purified. (3) The high-temperature nine element gas that has been soaked and purified is sent to the heat exchanger 15 through the nitrogen gas derivation line 4, where it is given the cooling heat of -180°C liquid 1 nitrogen, and is heated to -170°C. It is cooled to an extremely low temperature.
(4)i低渦の窒素ガスを吹き込まれた凍結室5は、送
給される窒素ガスの流量を流量調整弁10で制御されて
、室温を−80〜−100℃の範囲内に低温保持される
。(4) i The freezing chamber 5 into which low-vortex nitrogen gas is blown is kept at a low temperature within the range of -80 to -100°C by controlling the flow rate of the nitrogen gas fed by the flow rate adjustment valve 10. be done.
この結果、搬送ライン18で間欠的に搬送されて凍結室
5に入った被処理物20は、液体状態Pから粉末状WQ
に凍結粉末化される。As a result, the processed material 20 that has been intermittently transported by the transport line 18 and entered the freezing chamber 5 changes from the liquid state P to the powder state WQ.
It is frozen and powdered.
図面は液化窒素使用式無菌化凍結装置の概略説明図であ
る。
1・・・液化窒素供給ライン、2・・・窒素ガス導入ラ
イン、3・・・P過装置、4・・・窒素ガス導出ライン
、5・凍結室、7・・・液化窒素供給源、8・・・気化
手段、15・・・熱交換器、20・・・被処理物。The drawing is a schematic illustration of a sterilization freezing device using liquefied nitrogen. DESCRIPTION OF SYMBOLS 1...Liquid nitrogen supply line, 2...Nitrogen gas introduction line, 3...P filtration device, 4...Nitrogen gas derivation line, 5.Freezing chamber, 7...Liquid nitrogen supply source, 8 . . . Vaporization means, 15. Heat exchanger, 20. Object to be treated.
Claims (1)
に接続し、ろ過装置3を窒素ガス供給路4で凍結室5に
接続して、液化窒素を気化手段8で気化して窒素ガスと
し、窒素ガスをろ過装置3に通し、極低温状態の窒素ガ
スを窒素ガス供給路4で凍結室5に送り、凍結室5に収
容した被処理物に当該窒素ガスを接触させて、被処理物
を極低温の窒素ガスで凍結するように構成したことを特
徴とする液化窒素を用いた無菌化凍結装置 2、窒素ガス供給路4に熱交換器15を介在させ、窒素
ガス供給路4を通る窒素ガスと、液化窒素供給源7から
導出された液化窒素とを熱交換器15内に熱交換可能に
流し、当該液化窒素を熱交換器15から気化手段8に流
すように構成して、 気化手段8での気化により高温になった上記窒素ガスに
液化窒素の冷熱を付与して、熱交換器15内で高温の窒
素ガスを極低温に冷却するにように構成したことを特徴
とする請求項1に記載の液化窒素を用いた無菌化凍結装
置[Claims] 1. The liquefied nitrogen supply source 7 is passed through the filtration device 3 through the vaporization means 8.
The filtration device 3 is connected to the freezing chamber 5 through the nitrogen gas supply line 4, the liquefied nitrogen is vaporized by the vaporization means 8 to form nitrogen gas, the nitrogen gas is passed through the filtration device 3, and the nitrogen gas in the cryogenic state is The gas is sent to the freezing chamber 5 through the nitrogen gas supply path 4, and the nitrogen gas is brought into contact with the object to be processed stored in the freezing chamber 5, so that the object to be processed is frozen with extremely low temperature nitrogen gas. A sterilization freezing device 2 that uses liquefied nitrogen is characterized in that a heat exchanger 15 is interposed in the nitrogen gas supply path 4, and the nitrogen gas passing through the nitrogen gas supply path 4 and the liquefied nitrogen derived from the liquefied nitrogen supply source 7 are and is configured to flow into the heat exchanger 15 so as to be able to exchange heat, and the liquefied nitrogen is flowed from the heat exchanger 15 to the vaporization means 8, and is liquefied into the nitrogen gas which has become high temperature due to vaporization in the vaporization means 8. The sterilization freezing apparatus using liquefied nitrogen according to claim 1, characterized in that the apparatus is configured to cool high-temperature nitrogen gas to an extremely low temperature in a heat exchanger 15 by applying cold energy of nitrogen.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2009446A JPH03216174A (en) | 1990-01-17 | 1990-01-17 | Aseptic freezing device using liquefied nitrogen |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2009446A JPH03216174A (en) | 1990-01-17 | 1990-01-17 | Aseptic freezing device using liquefied nitrogen |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH03216174A true JPH03216174A (en) | 1991-09-24 |
| JPH051024B2 JPH051024B2 (en) | 1993-01-07 |
Family
ID=11720521
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2009446A Granted JPH03216174A (en) | 1990-01-17 | 1990-01-17 | Aseptic freezing device using liquefied nitrogen |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH03216174A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2008128606A (en) * | 2006-11-24 | 2008-06-05 | Mitsubishi Heavy Ind Ltd | Refrigeration system, and operating method for refrigeration system |
-
1990
- 1990-01-17 JP JP2009446A patent/JPH03216174A/en active Granted
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2008128606A (en) * | 2006-11-24 | 2008-06-05 | Mitsubishi Heavy Ind Ltd | Refrigeration system, and operating method for refrigeration system |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH051024B2 (en) | 1993-01-07 |
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