JPH0323491B2 - - Google Patents
Info
- Publication number
- JPH0323491B2 JPH0323491B2 JP4983182A JP4983182A JPH0323491B2 JP H0323491 B2 JPH0323491 B2 JP H0323491B2 JP 4983182 A JP4983182 A JP 4983182A JP 4983182 A JP4983182 A JP 4983182A JP H0323491 B2 JPH0323491 B2 JP H0323491B2
- Authority
- JP
- Japan
- Prior art keywords
- fluoride
- metal
- glass
- oxide
- filler
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000011521 glass Substances 0.000 claims description 23
- PUZPDOWCWNUUKD-UHFFFAOYSA-M sodium fluoride Chemical compound [F-].[Na+] PUZPDOWCWNUUKD-UHFFFAOYSA-M 0.000 claims description 16
- 239000000919 ceramic Substances 0.000 claims description 11
- 239000000945 filler Substances 0.000 claims description 10
- 238000010438 heat treatment Methods 0.000 claims description 8
- 239000011347 resin Substances 0.000 claims description 8
- 229920005989 resin Polymers 0.000 claims description 8
- 239000011775 sodium fluoride Substances 0.000 claims description 8
- 235000013024 sodium fluoride Nutrition 0.000 claims description 8
- 230000002378 acidificating effect Effects 0.000 claims description 7
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 7
- 238000004519 manufacturing process Methods 0.000 claims description 4
- 238000002844 melting Methods 0.000 claims description 4
- 230000008018 melting Effects 0.000 claims description 4
- 229910052751 metal Inorganic materials 0.000 claims description 4
- 239000002184 metal Substances 0.000 claims description 4
- 229910001512 metal fluoride Inorganic materials 0.000 claims description 4
- 229910044991 metal oxide Inorganic materials 0.000 claims description 4
- 150000004706 metal oxides Chemical class 0.000 claims description 4
- 229910001463 metal phosphate Inorganic materials 0.000 claims description 4
- 150000003467 sulfuric acid derivatives Chemical class 0.000 claims description 4
- 150000002736 metal compounds Chemical class 0.000 claims description 3
- 238000000034 method Methods 0.000 description 11
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 6
- 238000005260 corrosion Methods 0.000 description 6
- 230000007797 corrosion Effects 0.000 description 6
- 239000000203 mixture Substances 0.000 description 6
- -1 tiles Substances 0.000 description 5
- 239000003518 caustics Substances 0.000 description 4
- AXCZMVOFGPJBDE-UHFFFAOYSA-L calcium dihydroxide Chemical compound [OH-].[OH-].[Ca+2] AXCZMVOFGPJBDE-UHFFFAOYSA-L 0.000 description 3
- 238000000576 coating method Methods 0.000 description 3
- 239000004925 Acrylic resin Substances 0.000 description 2
- 229920000178 Acrylic resin Polymers 0.000 description 2
- UQSXHKLRYXJYBZ-UHFFFAOYSA-N Iron oxide Chemical compound [Fe]=O UQSXHKLRYXJYBZ-UHFFFAOYSA-N 0.000 description 2
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 2
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 2
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 2
- TZCXTZWJZNENPQ-UHFFFAOYSA-L barium sulfate Chemical compound [Ba+2].[O-]S([O-])(=O)=O TZCXTZWJZNENPQ-UHFFFAOYSA-L 0.000 description 2
- 239000011230 binding agent Substances 0.000 description 2
- OSGAYBCDTDRGGQ-UHFFFAOYSA-L calcium sulfate Chemical compound [Ca+2].[O-]S([O-])(=O)=O OSGAYBCDTDRGGQ-UHFFFAOYSA-L 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- AMWRITDGCCNYAT-UHFFFAOYSA-L hydroxy(oxo)manganese;manganese Chemical compound [Mn].O[Mn]=O.O[Mn]=O AMWRITDGCCNYAT-UHFFFAOYSA-L 0.000 description 2
- PQXKHYXIUOZZFA-UHFFFAOYSA-M lithium fluoride Chemical compound [Li+].[F-] PQXKHYXIUOZZFA-UHFFFAOYSA-M 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- UBXAKNTVXQMEAG-UHFFFAOYSA-L strontium sulfate Chemical compound [Sr+2].[O-]S([O-])(=O)=O UBXAKNTVXQMEAG-UHFFFAOYSA-L 0.000 description 2
- 238000005406 washing Methods 0.000 description 2
- BHHYHSUAOQUXJK-UHFFFAOYSA-L zinc fluoride Chemical compound F[Zn]F BHHYHSUAOQUXJK-UHFFFAOYSA-L 0.000 description 2
- IRPGOXJVTQTAAN-UHFFFAOYSA-N 2,2,3,3,3-pentafluoropropanal Chemical compound FC(F)(F)C(F)(F)C=O IRPGOXJVTQTAAN-UHFFFAOYSA-N 0.000 description 1
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 1
- 229910016569 AlF 3 Inorganic materials 0.000 description 1
- KLZUFWVZNOTSEM-UHFFFAOYSA-K Aluminum fluoride Inorganic materials F[Al](F)F KLZUFWVZNOTSEM-UHFFFAOYSA-K 0.000 description 1
- 229910021583 Cobalt(III) fluoride Inorganic materials 0.000 description 1
- QPLDLSVMHZLSFG-UHFFFAOYSA-N Copper oxide Chemical compound [Cu]=O QPLDLSVMHZLSFG-UHFFFAOYSA-N 0.000 description 1
- 239000005751 Copper oxide Substances 0.000 description 1
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 description 1
- 229910021569 Manganese fluoride Inorganic materials 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- BPQQTUXANYXVAA-UHFFFAOYSA-N Orthosilicate Chemical compound [O-][Si]([O-])([O-])[O-] BPQQTUXANYXVAA-UHFFFAOYSA-N 0.000 description 1
- 235000008331 Pinus X rigitaeda Nutrition 0.000 description 1
- 235000011613 Pinus brutia Nutrition 0.000 description 1
- 241000018646 Pinus brutia Species 0.000 description 1
- 239000004698 Polyethylene Substances 0.000 description 1
- 239000004743 Polypropylene Substances 0.000 description 1
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 1
- WGLPBDUCMAPZCE-UHFFFAOYSA-N Trioxochromium Chemical compound O=[Cr](=O)=O WGLPBDUCMAPZCE-UHFFFAOYSA-N 0.000 description 1
- VIPVVZWMYONGMA-UHFFFAOYSA-J [O-]P([O-])(=O)OP(=O)([O-])[O-].[Sb+4] Chemical compound [O-]P([O-])(=O)OP(=O)([O-])[O-].[Sb+4] VIPVVZWMYONGMA-UHFFFAOYSA-J 0.000 description 1
- WPXVRWPSDRRNMH-UHFFFAOYSA-B [O-]P([O-])(=O)OP(=O)([O-])[O-].[Y+3].[O-]P([O-])(=O)OP(=O)([O-])[O-].[O-]P([O-])(=O)OP(=O)([O-])[O-].[Y+3].[Y+3].[Y+3] Chemical compound [O-]P([O-])(=O)OP(=O)([O-])[O-].[Y+3].[O-]P([O-])(=O)OP(=O)([O-])[O-].[O-]P([O-])(=O)OP(=O)([O-])[O-].[Y+3].[Y+3].[Y+3] WPXVRWPSDRRNMH-UHFFFAOYSA-B 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- ILRRQNADMUWWFW-UHFFFAOYSA-K aluminium phosphate Chemical compound O1[Al]2OP1(=O)O2 ILRRQNADMUWWFW-UHFFFAOYSA-K 0.000 description 1
- GSWGDDYIUCWADU-UHFFFAOYSA-N aluminum magnesium oxygen(2-) Chemical compound [O--].[Mg++].[Al+3] GSWGDDYIUCWADU-UHFFFAOYSA-N 0.000 description 1
- OYLGJCQECKOTOL-UHFFFAOYSA-L barium fluoride Chemical compound [F-].[F-].[Ba+2] OYLGJCQECKOTOL-UHFFFAOYSA-L 0.000 description 1
- 229910001632 barium fluoride Inorganic materials 0.000 description 1
- WAKZZMMCDILMEF-UHFFFAOYSA-H barium(2+);diphosphate Chemical compound [Ba+2].[Ba+2].[Ba+2].[O-]P([O-])([O-])=O.[O-]P([O-])([O-])=O WAKZZMMCDILMEF-UHFFFAOYSA-H 0.000 description 1
- HUTDDBSSHVOYJR-UHFFFAOYSA-H bis[(2-oxo-1,3,2$l^{5},4$l^{2}-dioxaphosphaplumbetan-2-yl)oxy]lead Chemical compound [Pb+2].[Pb+2].[Pb+2].[O-]P([O-])([O-])=O.[O-]P([O-])([O-])=O HUTDDBSSHVOYJR-UHFFFAOYSA-H 0.000 description 1
- WUKWITHWXAAZEY-UHFFFAOYSA-L calcium difluoride Chemical compound [F-].[F-].[Ca+2] WUKWITHWXAAZEY-UHFFFAOYSA-L 0.000 description 1
- 229910001634 calcium fluoride Inorganic materials 0.000 description 1
- 229910000389 calcium phosphate Inorganic materials 0.000 description 1
- 239000001506 calcium phosphate Substances 0.000 description 1
- 235000011010 calcium phosphates Nutrition 0.000 description 1
- TYAVIWGEVOBWDZ-UHFFFAOYSA-K cerium(3+);phosphate Chemical compound [Ce+3].[O-]P([O-])([O-])=O TYAVIWGEVOBWDZ-UHFFFAOYSA-K 0.000 description 1
- UOFSYWKPJBAFDB-UHFFFAOYSA-B cerium(3+);phosphonato phosphate Chemical compound [Ce+3].[Ce+3].[Ce+3].[Ce+3].[O-]P([O-])(=O)OP([O-])([O-])=O.[O-]P([O-])(=O)OP([O-])([O-])=O.[O-]P([O-])(=O)OP([O-])([O-])=O UOFSYWKPJBAFDB-UHFFFAOYSA-B 0.000 description 1
- QCCDYNYSHILRDG-UHFFFAOYSA-K cerium(3+);trifluoride Chemical compound [F-].[F-].[F-].[Ce+3] QCCDYNYSHILRDG-UHFFFAOYSA-K 0.000 description 1
- 229910021563 chromium fluoride Inorganic materials 0.000 description 1
- 229910000423 chromium oxide Inorganic materials 0.000 description 1
- 229910000428 cobalt oxide Inorganic materials 0.000 description 1
- JECJVZVHLPZRNM-UHFFFAOYSA-J cobalt(2+);phosphonato phosphate Chemical compound [Co+2].[Co+2].[O-]P([O-])(=O)OP([O-])([O-])=O JECJVZVHLPZRNM-UHFFFAOYSA-J 0.000 description 1
- YCYBZKSMUPTWEE-UHFFFAOYSA-L cobalt(ii) fluoride Chemical compound F[Co]F YCYBZKSMUPTWEE-UHFFFAOYSA-L 0.000 description 1
- IVMYJDGYRUAWML-UHFFFAOYSA-N cobalt(ii) oxide Chemical compound [Co]=O IVMYJDGYRUAWML-UHFFFAOYSA-N 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 229910000431 copper oxide Inorganic materials 0.000 description 1
- CTNMMTCXUUFYAP-UHFFFAOYSA-L difluoromanganese Chemical compound F[Mn]F CTNMMTCXUUFYAP-UHFFFAOYSA-L 0.000 description 1
- CADNYOZXMIKYPR-UHFFFAOYSA-B ferric pyrophosphate Chemical compound [Fe+3].[Fe+3].[Fe+3].[Fe+3].[O-]P([O-])(=O)OP([O-])([O-])=O.[O-]P([O-])(=O)OP([O-])([O-])=O.[O-]P([O-])(=O)OP([O-])([O-])=O CADNYOZXMIKYPR-UHFFFAOYSA-B 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 230000002209 hydrophobic effect Effects 0.000 description 1
- SHXXPRJOPFJRHA-UHFFFAOYSA-K iron(iii) fluoride Chemical compound F[Fe](F)F SHXXPRJOPFJRHA-UHFFFAOYSA-K 0.000 description 1
- 229910000464 lead oxide Inorganic materials 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- ORUIBWPALBXDOA-UHFFFAOYSA-L magnesium fluoride Chemical compound [F-].[F-].[Mg+2] ORUIBWPALBXDOA-UHFFFAOYSA-L 0.000 description 1
- 229910001635 magnesium fluoride Inorganic materials 0.000 description 1
- ZTERWYZERRBKHF-UHFFFAOYSA-N magnesium iron(2+) oxygen(2-) Chemical compound [Mg+2].[O-2].[Fe+2].[O-2] ZTERWYZERRBKHF-UHFFFAOYSA-N 0.000 description 1
- 239000000155 melt Substances 0.000 description 1
- 229910000480 nickel oxide Inorganic materials 0.000 description 1
- DBJLJFTWODWSOF-UHFFFAOYSA-L nickel(ii) fluoride Chemical compound F[Ni]F DBJLJFTWODWSOF-UHFFFAOYSA-L 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- SIWVEOZUMHYXCS-UHFFFAOYSA-N oxo(oxoyttriooxy)yttrium Chemical compound O=[Y]O[Y]=O SIWVEOZUMHYXCS-UHFFFAOYSA-N 0.000 description 1
- YEXPOXQUZXUXJW-UHFFFAOYSA-N oxolead Chemical compound [Pb]=O YEXPOXQUZXUXJW-UHFFFAOYSA-N 0.000 description 1
- GNRSAWUEBMWBQH-UHFFFAOYSA-N oxonickel Chemical compound [Ni]=O GNRSAWUEBMWBQH-UHFFFAOYSA-N 0.000 description 1
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 229920001155 polypropylene Polymers 0.000 description 1
- CHKVPAROMQMJNQ-UHFFFAOYSA-M potassium bisulfate Chemical compound [K+].OS([O-])(=O)=O CHKVPAROMQMJNQ-UHFFFAOYSA-M 0.000 description 1
- 229910000343 potassium bisulfate Inorganic materials 0.000 description 1
- SKFYTVYMYJCRET-UHFFFAOYSA-J potassium;tetrafluoroalumanuide Chemical compound [F-].[F-].[F-].[F-].[Al+3].[K+] SKFYTVYMYJCRET-UHFFFAOYSA-J 0.000 description 1
- RMAQACBXLXPBSY-UHFFFAOYSA-N silicic acid Chemical compound O[Si](O)(O)O RMAQACBXLXPBSY-UHFFFAOYSA-N 0.000 description 1
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 1
- 229910010271 silicon carbide Inorganic materials 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 239000011780 sodium chloride Substances 0.000 description 1
- 239000006104 solid solution Substances 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- FVRNDBHWWSPNOM-UHFFFAOYSA-L strontium fluoride Chemical compound [F-].[F-].[Sr+2] FVRNDBHWWSPNOM-UHFFFAOYSA-L 0.000 description 1
- 229910001637 strontium fluoride Inorganic materials 0.000 description 1
- DAZSLCYGSKMFLB-UHFFFAOYSA-B tetrabismuth;phosphonato phosphate Chemical compound [Bi+3].[Bi+3].[Bi+3].[Bi+3].[O-]P([O-])(=O)OP([O-])([O-])=O.[O-]P([O-])(=O)OP([O-])([O-])=O.[O-]P([O-])(=O)OP([O-])([O-])=O DAZSLCYGSKMFLB-UHFFFAOYSA-B 0.000 description 1
- IPIGTJPBWJEROO-UHFFFAOYSA-B thorium(4+);tetraphosphate Chemical compound [Th+4].[Th+4].[Th+4].[O-]P([O-])([O-])=O.[O-]P([O-])([O-])=O.[O-]P([O-])([O-])=O.[O-]P([O-])([O-])=O IPIGTJPBWJEROO-UHFFFAOYSA-B 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- QORWJWZARLRLPR-UHFFFAOYSA-H tricalcium bis(phosphate) Chemical compound [Ca+2].[Ca+2].[Ca+2].[O-]P([O-])([O-])=O.[O-]P([O-])([O-])=O QORWJWZARLRLPR-UHFFFAOYSA-H 0.000 description 1
- FTBATIJJKIIOTP-UHFFFAOYSA-K trifluorochromium Chemical compound F[Cr](F)F FTBATIJJKIIOTP-UHFFFAOYSA-K 0.000 description 1
- JOPDZQBPOWAEHC-UHFFFAOYSA-H tristrontium;diphosphate Chemical compound [Sr+2].[Sr+2].[Sr+2].[O-]P([O-])([O-])=O.[O-]P([O-])([O-])=O JOPDZQBPOWAEHC-UHFFFAOYSA-H 0.000 description 1
- 239000002699 waste material Substances 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
- 229940105963 yttrium fluoride Drugs 0.000 description 1
- 229910000164 yttrium(III) phosphate Inorganic materials 0.000 description 1
- RBORBHYCVONNJH-UHFFFAOYSA-K yttrium(iii) fluoride Chemical compound F[Y](F)F RBORBHYCVONNJH-UHFFFAOYSA-K 0.000 description 1
- UXBZSSBXGPYSIL-UHFFFAOYSA-K yttrium(iii) phosphate Chemical compound [Y+3].[O-]P([O-])([O-])=O UXBZSSBXGPYSIL-UHFFFAOYSA-K 0.000 description 1
- 239000011787 zinc oxide Substances 0.000 description 1
- 229910001928 zirconium oxide Inorganic materials 0.000 description 1
- 229910000166 zirconium phosphate Inorganic materials 0.000 description 1
- LEHFSLREWWMLPU-UHFFFAOYSA-B zirconium(4+);tetraphosphate Chemical compound [Zr+4].[Zr+4].[Zr+4].[O-]P([O-])([O-])=O.[O-]P([O-])([O-])=O.[O-]P([O-])([O-])=O.[O-]P([O-])([O-])=O LEHFSLREWWMLPU-UHFFFAOYSA-B 0.000 description 1
Landscapes
- Surface Treatment Of Glass (AREA)
Description
【発明の詳細な説明】
本発明は腐食ガラス表面を有するセラミツクス
の製造方法に関するものであり、その目的は表面
を腐食加工されたセラミツク製品を効率よく安定
して得ることにある。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a method for manufacturing ceramics having a corroded glass surface, and its purpose is to efficiently and stably obtain ceramic products whose surfaces have been corroded.
本出願人が既に出願したガラスの腐食方法とは
所謂乾式の腐食方法であり、これは例えば
（NH4）3AlF6、（NH4）2CuF4等のガラス腐食剤を
主成分とするインキ組成物をガラス表面に塗布し
た後、加熱処理することによりガラス腐食性ガス
を発生させ、ガラスを腐食させる方法である（特
願昭56−187128号参照）。この方法はそれまでの
所謂湿式の腐食方法における作業者の安全性、廃
液処理等の問題を解決するものであるが、経済的
な面などにおいて改善の余地があつた。 The glass corrosion method that the present applicant has already applied for is a so-called dry corrosion method, which uses an ink whose main component is a glass corrosive such as (NH 4 ) 3 AlF 6 or (NH 4 ) 2 CuF 4 . This is a method of applying a composition to a glass surface and then subjecting it to a heat treatment to generate a glass corrosive gas to corrode the glass (see Japanese Patent Application No. 187128/1982). Although this method solved the problems of worker safety, waste liquid treatment, etc. of the so-called wet corrosion method, there was room for improvement in terms of economics and other aspects.
本発明者はかかる従来法をより一層改良せんと
し、種々研究考察を重ねた結果、本発明を完成す
るに至つたものである。即ち、本発明は金属酸化
物、金属フツ化物、金属硫酸塩及び金属リン酸塩
よりなる群から選ばれた少なくとも１つの金属化
合物で、水に難溶性又は不溶性であり且つ融点が
800℃以上である充填剤と酸性フツ化ナトリウム
とを含有せしめた樹脂被膜をガラス質表面に形成
せしめた後、200℃〜600℃で加熱することを特徴
とする腐食ガラス表面を有するセラミツクスの製
造方法である。 The present inventor sought to further improve such conventional methods, and as a result of various research and considerations, the present invention was completed. That is, the present invention provides at least one metal compound selected from the group consisting of metal oxides, metal fluorides, metal sulfates, and metal phosphates, which is sparingly soluble or insoluble in water, and has a melting point.
Production of ceramics having a corroded glass surface characterized by forming a resin film containing a filler and acidic sodium fluoride at 800°C or higher on a glassy surface and then heating at 200°C to 600°C. It's a method.
本発明においてガラス表面を有するセラミツク
スとはガラス、タイル、陶磁器、ガラス被覆アル
ミナ成型物、ガラス被覆炭化珪素成型物、ガラス
被覆窒化珪素成型物等を意味するものであり、そ
の表面に珪酸又は珪酸塩質の固溶体を有するもの
である。以下本発明を更に詳しく説明する。 In the present invention, ceramics having a glass surface means glass, tiles, ceramics, glass-coated alumina molded products, glass-coated silicon carbide molded products, glass-coated silicon nitride molded products, etc., and the surface thereof is coated with silicic acid or silicate. It has a high quality solid solution. The present invention will be explained in more detail below.
まずセラミツク基材表面に樹脂被膜を形成す
る。この被膜は充填剤と酸性フツ化ナトリウムを
主成分とするインキ組成物を用いてスプレー方
法、ロールコート方法、印刷方法等により形成さ
れる。充填剤には金属酸化物、金属フツ化物、金
属硫酸塩及び金属リン酸塩よりなる群から選ばれ
た少なくとも１つの金属化合物で、水に難溶性又
は不溶性であり且つ融点が800℃以上であるもの
を使用する。その例としては、金属酸化物には酸
化銅、酸化アルミニウム、酸化鉛、酸化亜鉛、酸
化チタニウム、酸化ジルコニウム、酸化クロム、
酸化マンガン、酸化鉄、酸化コバルト、酸化ニツ
ケル、酸化イツトリウム、酸化マグネシウムアル
ミニウム、酸化マグネシウム鉄等がある。金属フ
ツ化物としてはフツ化リチウム、フツ化マグネシ
ウム、フツ化カルシウム、フツ化ストロンチウ
ム、フツ化バリウム、フツ化亜鉛、フツ化アルミ
ニウム、フツ化クロム、フツ化マンガン、フツ化
鉄、フツ化コバルト、フツ化ニツケル、フツ化セ
リウム、フツ化イツトリウム、フツ化アルミニウ
ムナトリウム、フツ化アルミニウムカリウム等が
ある。金属硫酸塩としては硫酸カルシウム、硫酸
ストロンチウム、硫酸バリウム等がある。また金
属リン酸塩としてはリン酸カルシウム、リン酸ス
トロンチウム、リン酸バリウム、リン酸アルミニ
ウム、リン酸セリウム、リン酸鉛、リン酸ジルコ
ニウム、リン酸トリウム、リン酸イツトリウム、
ピロリン酸セリウム、ピロリン酸コバルト、ピロ
リン酸鉄、ピロリン酸ビスマス、ピロリン酸アン
チモン、ピロリン酸イツトリウム等がある。 First, a resin coating is formed on the surface of a ceramic base material. This film is formed by a spray method, a roll coating method, a printing method, etc. using an ink composition containing a filler and acidic sodium fluoride as main components. The filler is at least one metal compound selected from the group consisting of metal oxides, metal fluorides, metal sulfates, and metal phosphates, and is sparingly soluble or insoluble in water and has a melting point of 800°C or higher. use something Examples of metal oxides include copper oxide, aluminum oxide, lead oxide, zinc oxide, titanium oxide, zirconium oxide, chromium oxide,
Examples include manganese oxide, iron oxide, cobalt oxide, nickel oxide, yttrium oxide, magnesium aluminum oxide, and magnesium iron oxide. Metal fluorides include lithium fluoride, magnesium fluoride, calcium fluoride, strontium fluoride, barium fluoride, zinc fluoride, aluminum fluoride, chromium fluoride, manganese fluoride, iron fluoride, cobalt fluoride, and fluoride. Examples include nickel fluoride, cerium fluoride, yttrium fluoride, sodium aluminum fluoride, and potassium aluminum fluoride. Examples of metal sulfates include calcium sulfate, strontium sulfate, and barium sulfate. Metal phosphates include calcium phosphate, strontium phosphate, barium phosphate, aluminum phosphate, cerium phosphate, lead phosphate, zirconium phosphate, thorium phosphate, yttrium phosphate,
Examples include cerium pyrophosphate, cobalt pyrophosphate, iron pyrophosphate, bismuth pyrophosphate, antimony pyrophosphate, and yttrium pyrophosphate.
以上の充填剤は腐食剤である酸性フツ化ナトリ
ウムが加熱時に溶融し、流れ過ぎるのを防ぎ且つ
ガラス表面におけるフツ素イオンの滞留時間を延
長するために混合するものであり、充填剤と酸性
フツ化ナトリウムとの混合比は得ようとする艶消
し面によつて適宜調節する。即ち一般的傾向とし
ては充填剤が少ない場合は比較的細かな艶消し面
が得られ、充填剤が多い場合は比較的粗い艶消し
面が得られる。 The above fillers are mixed to prevent acidic sodium fluoride, which is a corrosive agent, from melting and flowing when heated, and to extend the residence time of fluorine ions on the glass surface. The mixing ratio with sodium chloride is adjusted as appropriate depending on the matte surface to be obtained. That is, the general tendency is that when the amount of filler is small, a relatively fine matte surface is obtained, and when the amount of filler is large, a relatively coarse matte surface is obtained.
前記充填剤と酸性フツ化ナトリウムを主成分と
してインキ組成物を作成するには適当な溶剤及び
樹脂バインダーと混合する。樹脂バインダーとし
ては重フツ化ソーダと反応せず且つ吸水性の少な
い樹脂、例えばポリエチレン、ポリプロピレン等
が好ましい。更に、必要に応じてKH2PO4、
KHSO4等の反応促進剤を添加する。 To prepare an ink composition containing the filler and acidic sodium fluoride as main components, the filler and acidic sodium fluoride are mixed with a suitable solvent and a resin binder. As the resin binder, resins that do not react with heavy sodium fluoride and have low water absorption properties, such as polyethylene and polypropylene, are preferred. Furthermore, KH 2 PO 4 if necessary,
Add a reaction accelerator such as KHSO4 .
セラミツク表面に前記インキ組成物を用いて疎
水性被膜を形成した後、200℃〜600℃、好ましく
は250℃〜500℃の温度範囲で加熱する。この加熱
処理によつて酸性フツ化ナトリウムは溶融し、充
填剤を湿潤し、ついで熱分解して腐食性物質を生
成し、これが分解した樹脂被膜を貫通してガラス
表面を有するセラミツクスに到達し腐食が行われ
る。故に均一で腐食ムラのないマツト加工を施す
ことができ、又腐食効率も優れているので、腐食
剤を有効に使用することができる。 After a hydrophobic film is formed on the ceramic surface using the ink composition, it is heated in a temperature range of 200°C to 600°C, preferably 250°C to 500°C. Through this heat treatment, the acidic sodium fluoride melts, wets the filler, and then thermally decomposes to produce a corrosive substance, which penetrates the decomposed resin coating and reaches the glass-surfaced ceramics, causing corrosion. will be held. Therefore, it is possible to perform pine processing uniformly and without uneven corrosion, and since the corrosion efficiency is also excellent, corrosive agents can be used effectively.
加熱処理によつて生じた残存物は適宜の手段に
よつて洗浄除去する。その一例として、加熱処理
後セラミツク基材を石灰水に浸漬し、その後反応
を残滓を水洗除去する方法がある。 Residues generated by the heat treatment are washed away by appropriate means. One example is a method in which the ceramic base material is immersed in lime water after heat treatment, and then the reaction residue is removed by washing with water.
本発明は以上述べたような艶消し表面セラミツ
クの製造方法であるから、本発明を適用すること
により均一なマツト加工された艶消し表面を腐食
剤を有効に使用して安定して得ることができるも
のである。 Since the present invention is a method for manufacturing ceramic with a matte surface as described above, by applying the present invention, it is possible to stably obtain a uniform matte surface with a matte finish by effectively using a corrosive agent. It is possible.
以下本発明の実施例を説明する。 Examples of the present invention will be described below.
実施例 １
下記組成の腐食性インキを厚さ１mmのみがき
ソーダガラス板上にスクリーン印刷で厚さ15μの
固体皮膜を形成した。その後、該ガラス板を280
℃、30分の加熱処理を施した後、該ガラス板を石
灰水に浸漬し、残存物を水洗除去した結果、美麗
なマツト表面を有するガラス板を得ることができ
た。Example 1 A corrosive ink having the following composition was screen printed on a 1 mm thick polished soda glass plate to form a solid film with a thickness of 15 μm. Then, the glass plate was heated at 280°C.
After heat treatment at ℃ for 30 minutes, the glass plate was immersed in lime water and the residue was removed by washing with water. As a result, a glass plate with a beautiful matte surface could be obtained.
腐食性インキ
NaHF2 ７ｇ
AlF3 ３ｇ
アクリル樹脂 20ｇ
トルエン ５ｇ
実施例 ２
下記組成の腐食性インキを厚さ２mmのみがき
ソーダガラス板上にスプレー方法により厚さ25μ
の固体皮膜を形成した。その後該ガラス板を260
℃、20分で加熱処理した後、該ガラス板を石灰水
に浸漬し、残存物を水洗除去した結果、美麗なつ
や消し表面を有するガラス板を得る事ができた。 Corrosive ink NaHF 2 7g AlF 3 3g Acrylic resin 20g Toluene 5g Example 2 Corrosive ink of the following composition was sprayed onto a 2mm thick polished soda glass plate to a thickness of 25μ.
A solid film was formed. Then the glass plate was heated to 260
After heat treatment at .degree. C. for 20 minutes, the glass plate was immersed in lime water and the residue was washed away with water, resulting in a glass plate with a beautiful matte surface.
腐食性インキ NaHF2 ７ｇ Al2O3 ３ｇ アクリル樹脂 10ｇ トルエン ４ｇ キシレン ３ｇ Corrosive ink NaHF 2 7g Al 2 O 3 3g Acrylic resin 10g Toluene 4g Xylene 3g
Claims (1)
金属リン酸塩よりなる群から選ばれた少なくとも
１つの金属化合物で、水に難溶性又は不溶性であ
り且つ融点が800℃以上である充填剤と酸性フツ
化ナトリウムとを含有せしめた樹脂被膜をガラス
質表面に形成せしめた後、200℃〜600℃で加熱す
ることを特徴とする腐食ガラス表面を有するセラ
ミツクスの製造方法。1. A filler that is at least one metal compound selected from the group consisting of metal oxides, metal fluorides, metal sulfates, and metal phosphates, which is sparingly soluble or insoluble in water, and has a melting point of 800°C or higher. 1. A method for producing ceramics having a corroded glass surface, which comprises forming a resin film containing acidic sodium fluoride on a glass surface and then heating the resin film at 200°C to 600°C.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4983182A JPS58167447A (en) | 1982-03-26 | 1982-03-26 | Preparation of ceramic having etched glassy surface |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4983182A JPS58167447A (en) | 1982-03-26 | 1982-03-26 | Preparation of ceramic having etched glassy surface |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS58167447A JPS58167447A (en) | 1983-10-03 |
| JPH0323491B2 true JPH0323491B2 (en) | 1991-03-29 |
Family
ID=12842022
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP4983182A Granted JPS58167447A (en) | 1982-03-26 | 1982-03-26 | Preparation of ceramic having etched glassy surface |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS58167447A (en) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4647477A (en) * | 1984-12-07 | 1987-03-03 | Kollmorgen Technologies Corporation | Surface preparation of ceramic substrates for metallization |
| DE3523960A1 (en) * | 1985-07-04 | 1987-01-08 | Licentia Gmbh | METHOD FOR METALLIZING AN ELECTRICALLY BAD CONDUCTING SUBSTRATE FROM AN INORGANIC MATERIAL |
-
1982
- 1982-03-26 JP JP4983182A patent/JPS58167447A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS58167447A (en) | 1983-10-03 |
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