JPH03291987A - Manufacture of flexible printed circuit board - Google Patents
Manufacture of flexible printed circuit boardInfo
- Publication number
- JPH03291987A JPH03291987A JP9213190A JP9213190A JPH03291987A JP H03291987 A JPH03291987 A JP H03291987A JP 9213190 A JP9213190 A JP 9213190A JP 9213190 A JP9213190 A JP 9213190A JP H03291987 A JPH03291987 A JP H03291987A
- Authority
- JP
- Japan
- Prior art keywords
- polyamic acid
- circuit board
- printed circuit
- flexible printed
- acid solution
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000004519 manufacturing process Methods 0.000 title claims description 6
- 229920005575 poly(amic acid) Polymers 0.000 claims abstract description 39
- 239000011888 foil Substances 0.000 claims abstract description 24
- 229910052751 metal Inorganic materials 0.000 claims abstract description 21
- 239000002184 metal Substances 0.000 claims abstract description 21
- CBCKQZAAMUWICA-UHFFFAOYSA-N 1,4-phenylenediamine Chemical compound NC1=CC=C(N)C=C1 CBCKQZAAMUWICA-UHFFFAOYSA-N 0.000 claims abstract description 10
- 230000003746 surface roughness Effects 0.000 claims abstract description 6
- 238000002156 mixing Methods 0.000 claims abstract description 5
- 239000000203 mixture Substances 0.000 claims abstract description 5
- 239000002966 varnish Substances 0.000 claims abstract description 4
- GTDPSWPPOUPBNX-UHFFFAOYSA-N ac1mqpva Chemical compound CC12C(=O)OC(=O)C1(C)C1(C)C2(C)C(=O)OC1=O GTDPSWPPOUPBNX-UHFFFAOYSA-N 0.000 claims description 17
- 238000010438 heat treatment Methods 0.000 claims description 12
- VLDPXPPHXDGHEW-UHFFFAOYSA-N 1-chloro-2-dichlorophosphoryloxybenzene Chemical compound ClC1=CC=CC=C1OP(Cl)(Cl)=O VLDPXPPHXDGHEW-UHFFFAOYSA-N 0.000 claims description 9
- HLBLWEWZXPIGSM-UHFFFAOYSA-N 4-Aminophenyl ether Chemical compound C1=CC(N)=CC=C1OC1=CC=C(N)C=C1 HLBLWEWZXPIGSM-UHFFFAOYSA-N 0.000 claims description 4
- 239000002253 acid Substances 0.000 claims description 3
- 238000005266 casting Methods 0.000 claims description 2
- JVERADGGGBYHNP-UHFFFAOYSA-N 5-phenylbenzene-1,2,3,4-tetracarboxylic acid Chemical compound OC(=O)C1=C(C(O)=O)C(C(=O)O)=CC(C=2C=CC=CC=2)=C1C(O)=O JVERADGGGBYHNP-UHFFFAOYSA-N 0.000 claims 1
- 230000001070 adhesive effect Effects 0.000 abstract description 10
- 230000037303 wrinkles Effects 0.000 abstract description 8
- 238000000576 coating method Methods 0.000 abstract description 3
- WKDNYTOXBCRNPV-UHFFFAOYSA-N bpda Chemical compound C1=C2C(=O)OC(=O)C2=CC(C=2C=C3C(=O)OC(C3=CC=2)=O)=C1 WKDNYTOXBCRNPV-UHFFFAOYSA-N 0.000 abstract description 2
- 239000011248 coating agent Substances 0.000 abstract description 2
- ANSXAPJVJOKRDJ-UHFFFAOYSA-N furo[3,4-f][2]benzofuran-1,3,5,7-tetrone Chemical compound C1=C2C(=O)OC(=O)C2=CC2=C1C(=O)OC2=O ANSXAPJVJOKRDJ-UHFFFAOYSA-N 0.000 abstract 1
- 238000005096 rolling process Methods 0.000 abstract 1
- 229920001187 thermosetting polymer Polymers 0.000 abstract 1
- 239000000243 solution Substances 0.000 description 20
- 238000006243 chemical reaction Methods 0.000 description 16
- 238000000034 method Methods 0.000 description 16
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 11
- 239000011889 copper foil Substances 0.000 description 10
- 239000002904 solvent Substances 0.000 description 10
- 239000000853 adhesive Substances 0.000 description 9
- 229920001721 polyimide Polymers 0.000 description 7
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 6
- 125000006158 tetracarboxylic acid group Chemical group 0.000 description 6
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 6
- 150000004985 diamines Chemical class 0.000 description 5
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 4
- 239000004642 Polyimide Substances 0.000 description 4
- 238000005530 etching Methods 0.000 description 4
- 238000003756 stirring Methods 0.000 description 4
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 3
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- 239000003795 chemical substances by application Substances 0.000 description 3
- 230000000052 comparative effect Effects 0.000 description 3
- 239000007822 coupling agent Substances 0.000 description 3
- 229910001873 dinitrogen Inorganic materials 0.000 description 3
- 238000001035 drying Methods 0.000 description 3
- 239000011261 inert gas Substances 0.000 description 3
- 238000006116 polymerization reaction Methods 0.000 description 3
- 239000002994 raw material Substances 0.000 description 3
- 229920005989 resin Polymers 0.000 description 3
- 239000011347 resin Substances 0.000 description 3
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 2
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 2
- 239000012790 adhesive layer Substances 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 150000001412 amines Chemical class 0.000 description 2
- ADCOVFLJGNWWNZ-UHFFFAOYSA-N antimony trioxide Chemical compound O=[Sb]O[Sb]=O ADCOVFLJGNWWNZ-UHFFFAOYSA-N 0.000 description 2
- -1 aromatic primary amine Chemical class 0.000 description 2
- 239000012298 atmosphere Substances 0.000 description 2
- UORVGPXVDQYIDP-UHFFFAOYSA-N borane Chemical compound B UORVGPXVDQYIDP-UHFFFAOYSA-N 0.000 description 2
- 238000001723 curing Methods 0.000 description 2
- 239000003063 flame retardant Substances 0.000 description 2
- 238000013007 heat curing Methods 0.000 description 2
- 239000011259 mixed solution Substances 0.000 description 2
- 230000003647 oxidation Effects 0.000 description 2
- 238000007254 oxidation reaction Methods 0.000 description 2
- 239000002798 polar solvent Substances 0.000 description 2
- HHVIBTZHLRERCL-UHFFFAOYSA-N sulfonyldimethane Chemical compound CS(C)(=O)=O HHVIBTZHLRERCL-UHFFFAOYSA-N 0.000 description 2
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 1
- RNFJDJUURJAICM-UHFFFAOYSA-N 2,2,4,4,6,6-hexaphenoxy-1,3,5-triaza-2$l^{5},4$l^{5},6$l^{5}-triphosphacyclohexa-1,3,5-triene Chemical compound N=1P(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP=1(OC=1C=CC=CC=1)OC1=CC=CC=C1 RNFJDJUURJAICM-UHFFFAOYSA-N 0.000 description 1
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 description 1
- 239000004593 Epoxy Substances 0.000 description 1
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 1
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- LGRFSURHDFAFJT-UHFFFAOYSA-N Phthalic anhydride Natural products C1=CC=C2C(=O)OC(=O)C2=C1 LGRFSURHDFAFJT-UHFFFAOYSA-N 0.000 description 1
- 239000004962 Polyamide-imide Substances 0.000 description 1
- 239000004697 Polyetherimide Substances 0.000 description 1
- KZTYYGOKRVBIMI-UHFFFAOYSA-N S-phenyl benzenesulfonothioate Natural products C=1C=CC=CC=1S(=O)(=O)C1=CC=CC=C1 KZTYYGOKRVBIMI-UHFFFAOYSA-N 0.000 description 1
- 239000006087 Silane Coupling Agent Substances 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- 229910000085 borane Inorganic materials 0.000 description 1
- JHIWVOJDXOSYLW-UHFFFAOYSA-N butyl 2,2-difluorocyclopropane-1-carboxylate Chemical compound CCCCOC(=O)C1CC1(F)F JHIWVOJDXOSYLW-UHFFFAOYSA-N 0.000 description 1
- 239000006229 carbon black Substances 0.000 description 1
- 239000000969 carrier Substances 0.000 description 1
- 239000013522 chelant Substances 0.000 description 1
- 239000011247 coating layer Substances 0.000 description 1
- 239000000571 coke Substances 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 238000006482 condensation reaction Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- XCJYREBRNVKWGJ-UHFFFAOYSA-N copper(II) phthalocyanine Chemical compound [Cu+2].C12=CC=CC=C2C(N=C2[N-]C(C3=CC=CC=C32)=N2)=NC1=NC([C]1C=CC=CC1=1)=NC=1N=C1[C]3C=CC=CC3=C2[N-]1 XCJYREBRNVKWGJ-UHFFFAOYSA-N 0.000 description 1
- 230000018044 dehydration Effects 0.000 description 1
- 238000006297 dehydration reaction Methods 0.000 description 1
- 238000012691 depolymerization reaction Methods 0.000 description 1
- 239000002612 dispersion medium Substances 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000000945 filler Substances 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 238000009499 grossing Methods 0.000 description 1
- 229920006015 heat resistant resin Polymers 0.000 description 1
- 150000003949 imides Chemical class 0.000 description 1
- 238000013035 low temperature curing Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000002609 medium Substances 0.000 description 1
- 239000010445 mica Substances 0.000 description 1
- 229910052618 mica group Inorganic materials 0.000 description 1
- 239000012046 mixed solvent Substances 0.000 description 1
- DOBFTMLCEYUAQC-UHFFFAOYSA-N naphthalene-2,3,6,7-tetracarboxylic acid Chemical compound OC(=O)C1=C(C(O)=O)C=C2C=C(C(O)=O)C(C(=O)O)=CC2=C1 DOBFTMLCEYUAQC-UHFFFAOYSA-N 0.000 description 1
- 239000012454 non-polar solvent Substances 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- 229920003055 poly(ester-imide) Polymers 0.000 description 1
- 229920002312 polyamide-imide Polymers 0.000 description 1
- 229920001601 polyetherimide Polymers 0.000 description 1
- 239000009719 polyimide resin Substances 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- HNJBEVLQSNELDL-UHFFFAOYSA-N pyrrolidin-2-one Chemical compound O=C1CCCN1 HNJBEVLQSNELDL-UHFFFAOYSA-N 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 238000010992 reflux Methods 0.000 description 1
- 238000006798 ring closing metathesis reaction Methods 0.000 description 1
- 238000007363 ring formation reaction Methods 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 238000000935 solvent evaporation Methods 0.000 description 1
- 238000003892 spreading Methods 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- 230000002194 synthesizing effect Effects 0.000 description 1
- 239000000454 talc Substances 0.000 description 1
- 229910052623 talc Inorganic materials 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000004034 viscosity adjusting agent Substances 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
Landscapes
- Laminated Bodies (AREA)
- Manufacturing Of Printed Wiring (AREA)
Abstract
Description
【発明の詳細な説明】
(産業上の利用分野)
本発明は、ポリアミック酸混合溶液を無粗化金属箔上に
直接流延塗布し、加熱イミド化することにより、耐熱性
、耐寒性、電気特性、機械特性、耐薬品性に優れたカー
ルのないフレキシブルプリント回路板の製造方法に係る
ものである。Detailed Description of the Invention (Field of Industrial Application) The present invention improves heat resistance, cold resistance, The present invention relates to a method for manufacturing a curl-free flexible printed circuit board that has excellent properties, mechanical properties, and chemical resistance.
本発明で得られたフレキシブルプリント回路板は各種の
電気、電子機器用配線基板のみならずフラットモータ、
テープキャリヤー、フロッピーディスクヘッド、高周波
アンテナ、電磁シールド板などにも利用される。The flexible printed circuit board obtained by the present invention can be used not only for wiring boards for various electrical and electronic devices, but also for flat motors,
It is also used in tape carriers, floppy disk heads, high frequency antennas, electromagnetic shielding plates, etc.
(従来技術)
従来、フレキシブルプリント回路用基板はポリイミドフ
ィルムと金属箔とを、低温硬化可能な接着剤で貼合わせ
て製造したものを回路加工していた。高温硬化の接着剤
であると、熱圧着時の熱履歴により、常温に戻したとき
に、基板のカール、ネジレ、反りなどが発生し、その後
のバターニング等の作業が不可能な為である。(Prior Art) Conventionally, flexible printed circuit boards have been manufactured by bonding polyimide films and metal foils together using adhesives that can be cured at low temperatures, and processed into circuits. If the adhesive is cured at a high temperature, the heat history during thermocompression bonding will cause the board to curl, twist, or warp when it returns to room temperature, making subsequent work such as buttering impossible. .
ところが低温硬化の接着剤を使用しても、接着剤はもと
もと耐熱性に劣るため、回路加工した回踏板として耐熱
性の良いダリイミドフィルム本来の耐熱性を発揮させる
ことが出来なかった。However, even if a low-temperature curing adhesive was used, the adhesive originally had poor heat resistance, so it was not possible to utilize the inherent heat resistance of the dariimide film, which has good heat resistance, as a circuit-processed turning board.
そこで接着剤を使用しないでフレキシブルプリント回路
用基板を製造し、回路加工する方法が検討された0例え
ば米国特許3,179,634号に示されている様なピ
ロメリット酸等のテトラカルボン酸と 4,4゛−ジア
ミノジフェニルエーテル等の芳香族第一級アミンとの重
合により得られたポリアミック酸溶液な銅箔に直接塗布
し、次いで加熱する事により溶媒の除去及びポリアミッ
ク酸を閉環させて、ポリイミド銅張板を製造する方法で
ある。Therefore, methods of manufacturing flexible printed circuit boards and processing circuits without using adhesives were investigated. A polyamic acid solution obtained by polymerization with an aromatic primary amine such as 4,4'-diaminodiphenyl ether is applied directly to copper foil, and then heated to remove the solvent and ring-close the polyamic acid to form a polyimide. This is a method for manufacturing copper clad boards.
ところがこの方法では、上記反応が脱水縮合反応である
為に体積収縮が発生するが、そのため得られた回路基板
は、カールや、シワ、チヂレ等が発生し、場合によって
は金属箔と樹脂との間に剥離が生じてしまうといった欠
点があり、この方法でフレキシブルプリント回路用基板
を製造する上で大きな問題となっていた。However, in this method, since the above reaction is a dehydration condensation reaction, volumetric shrinkage occurs, and as a result, the resulting circuit board has curls, wrinkles, wrinkles, etc., and in some cases, the bond between the metal foil and the resin may deteriorate. This method has the disadvantage of causing peeling, which has been a major problem in manufacturing flexible printed circuit boards using this method.
(発明が解決しようとする課題)
本発明は、これまでにかかる欠点を克服すべく鋭意検討
した結果、特定のポリアミック酸混合溶液を粗化面のな
い金属箔上に直接塗布し、硬化させる方法で製造したフ
レキシブルプリント回路板が、カールやシワがなく、接
着性および強度が優れ しかも耐熱性が非常に良好であ
るとの知見を得、本発明を完成するに至ったものである
。(Problems to be Solved by the Invention) As a result of intensive studies to overcome these drawbacks, the present invention has developed a method in which a specific polyamic acid mixed solution is directly applied onto a metal foil without a roughened surface and cured. The present invention was completed based on the knowledge that the flexible printed circuit board manufactured by the above method is free from curls and wrinkles, has excellent adhesion and strength, and has very good heat resistance.
(課題を解決するための手段)
本発明は表面粗さRaが0. 3μ以下である粗化面の
ない金属箔上に3.3’,4.4’−ビフェニルテトラ
カルボン酸二無水物とパラフェニレンジアミンとを反応
させて得られたポリアミック酸溶液(A)゛と、 ピロ
メリット酸二無水物と 4.4°−ジアミノジフェニル
エーテルを反応させて得られたポリアミック酸溶液(B
)とを、A/B = 55/45〜75/25の割合で
混合して得られたポリアミック酸混合物のワニスを流延
塗布し、加熱硬化させることを特徴とするフレキシブル
プリント回路板の製造方法である。(Means for Solving the Problems) The present invention has a surface roughness Ra of 0. A polyamic acid solution (A) obtained by reacting 3.3',4.4'-biphenyltetracarboxylic dianhydride and paraphenylene diamine on a metal foil without a roughened surface of 3μ or less. , a polyamic acid solution obtained by reacting pyromellitic dianhydride and 4.4°-diaminodiphenyl ether (B
) in a ratio of A/B = 55/45 to 75/25, a polyamic acid mixture varnish is cast and cured by heating. It is.
(作用)
本発明はポリアミック酸溶液を直接流延塗布し、80℃
〜350℃まで連続的に、または段階的に0.5時間以
上かけて昇温または保持加熱を行い、加熱イミド化する
ことにより、フレキシブルプリント回路板を得るが、ポ
リアミック酸溶液を金属箔に流延塗布してフレキシブル
プリント回路用基板を得る方法は、 ロータリーコーク
−、ナイフコーター、 ドクターブレード、フローコー
ター等の公知の塗布手段で50〜1000μの均一な厚
さに流延塗布する方法がとられる。(Function) In the present invention, a polyamic acid solution is directly cast and coated at 80°C.
A flexible printed circuit board is obtained by heating or holding heating continuously or stepwise to ~350°C over a period of 0.5 hours or more, and by heating and imidizing the board. A method of obtaining a flexible printed circuit board by spreading is a method of casting to a uniform thickness of 50 to 1000 μm using a known coating method such as a rotary coke, knife coater, doctor blade, or flow coater. .
また加熱によるポリアミック酸溶液の溶媒除去は、ポリ
イミド皮膜が形成される以前に、始めから強い加熱を行
うと、粗面となったりひきつったりするので、加熱は低
温から徐々に高くする様にした方が好ましい3例えば、
100℃から350℃まで0. 5時間以上かけて連
続的に加熱する。In addition, when removing the solvent from a polyamic acid solution by heating, if you apply strong heating from the beginning before the polyimide film is formed, the surface will become rough or twitchy, so it is best to start from a low temperature and gradually increase the heating temperature. For example, 3 is preferable.
0.0 from 100℃ to 350℃. Heat continuously for 5 hours or more.
0、 5時間未満であると膜厚にもよるが、脱溶媒が不
十分であったり、イミドの閉環が不十分で特性が発揮さ
れないことがある。また例えば、 100℃で30分、
ついで150℃で30分、200℃で30分、 250
℃で30分、 300℃で30分、350℃で30分と
いう具合いに段階的に昇温してもよい。加熱雰囲気も空
気中でさしつかえない場合もあるが金RWIとして銅箔
なと酸化され易い金属箔を用いる場合は減圧下ないしは
不活性ガスを流しながら非酸化性状態下に行う方が好ま
しい。この様にして形成されたポリイミド皮膜層は一般
的に10〜200μである。If the time is less than 0.5 hours, depending on the film thickness, the solvent may be removed insufficiently or the ring closure of the imide may be insufficient and the properties may not be exhibited. For example, at 100℃ for 30 minutes,
Then, 30 minutes at 150℃, 30 minutes at 200℃, 250
The temperature may be increased stepwise such as 30 minutes at 300°C, 30 minutes at 350°C. Although the heating atmosphere may be in air in some cases, when a metal foil that is easily oxidized such as copper foil is used as the gold RWI, it is preferable to conduct the heating under reduced pressure or under non-oxidizing conditions while flowing an inert gas. The polyimide coating layer thus formed typically has a thickness of 10 to 200 microns.
本発明で用いる耐熱性樹脂は、フィルム形成能があり、
金属箔との密着性があればよいが、つぎに示すようなポ
リイミドが最も目的にかなっている。The heat-resistant resin used in the present invention has film-forming ability,
It only needs to have good adhesion to the metal foil, but the polyimide shown below is most suitable for the purpose.
すなわち、テトラカルボン酸二無水物成分とジアミン成
分とを反応させるに当たり、3,3’,4.4’−ビフ
ェニルテトラカルボン酸二無水物とパラフェニレンジア
ミンとを反応させて得られたポリアミック酸溶液(A)
と、 ピロメリット酸二無水物と4.4°−ジアミノジ
フェニルエーテルを反応させて得られたポリアミック酸
溶液(B)とを、 A/B= 55/45〜75/25
の割合で混合攪拌して得られるポリアミック酸混合溶液
を加熱硬化させて得られるポリイミドである。That is, in reacting the tetracarboxylic dianhydride component and the diamine component, a polyamic acid solution obtained by reacting 3,3',4,4'-biphenyltetracarboxylic dianhydride and paraphenylene diamine. (A)
and a polyamic acid solution (B) obtained by reacting pyromellitic dianhydride and 4.4°-diaminodiphenyl ether, A/B = 55/45 to 75/25.
It is a polyimide obtained by heating and curing a polyamic acid mixed solution obtained by mixing and stirring at a ratio of .
本発明に言うテトラカルボン酸二無水物とは、3.3’
、4,4°−ビフェニルテトラカルボン酸二無水物と、
ピロメリット酸二無水物であるが、この他の酸、例えば
2.3.3’,4°−ビフェニルテトラカルボン酸二無
水物、3.3’、4.4°−ベンゾフェノンテトラカル
ボン酸二無水物、3.3’、4,4°−p−テルフェニ
ルテトラカルボン酸二無水物、2,3,6.7−ナフタ
レンテトラカルボン酸二無水物、3.3’、4.4’−
ジフェニルスルホンテトラカルボン酸二無水物、3.3
’,4.4’−P−テルフェニルテトラカルボン酸二無
水物、4.4’−へキサフルオロイソプロピリデンビス
(フタル酸無水物)等も併用することが出来る。The tetracarboxylic dianhydride referred to in the present invention is 3.3'
, 4,4°-biphenyltetracarboxylic dianhydride;
Pyromellitic dianhydride, but other acids such as 2.3.3',4°-biphenyltetracarboxylic dianhydride, 3.3',4.4°-benzophenonetetracarboxylic dianhydride 3.3', 4,4°-p-terphenyltetracarboxylic dianhydride, 2,3,6.7-naphthalenetetracarboxylic dianhydride, 3.3', 4.4'-
Diphenylsulfone tetracarboxylic dianhydride, 3.3
',4,4'-P-terphenyltetracarboxylic dianhydride, 4,4'-hexafluoroisopropylidene bis (phthalic anhydride), etc. can also be used in combination.
本発明に言うジアミンとは、パラフェニレンジアミンと
4.4°−ジアミノジフェニルエーテルであるがこの他
のアミン例えば4,4°−ジアミノジフェニルメタン、
3.3゛−ジメチルベンジジン、4.4°−ジアミノ−
P−テルフェニル、4.4°−ジアミノ−P−クォータ
ーフェニル、2.8−ジアミノジフェニレンオキサイド
なども併用することができる。The diamines referred to in the present invention include paraphenylene diamine and 4,4°-diaminodiphenyl ether, but other amines such as 4,4°-diaminodiphenylmethane,
3.3゛-dimethylbenzidine, 4.4゛-diamino-
P-terphenyl, 4.4°-diamino-P-quarterphenyl, 2.8-diaminodiphenylene oxide, etc. can also be used in combination.
テトラカルボン酸二無水物成分とジアミン成分との反応
は酸成分/アミン成分(モル比)0.90〜1.00で
行うのが好ましく、0.90より低いと重合度が上がら
ず硬化後の皮膜特性が悪い。The reaction between the tetracarboxylic dianhydride component and the diamine component is preferably carried out at an acid component/amine component (molar ratio) of 0.90 to 1.00; if it is lower than 0.90, the degree of polymerization will not increase and the Poor film properties.
1、OOより大きいと、硬化時にガスを発生し、平滑な
皮膜を得ることが出来ない。If it is larger than 1.OO, gas will be generated during curing, making it impossible to obtain a smooth film.
反応は通常、テトラカルボン酸二無水物またはジアミン
類と反応しない有機極性溶媒中で行われる。この有機極
性溶媒は、反応系に対して不活性であり、かつ生成物に
対して溶・媒であること以外に、反応成分の少なくとも
一方、好ましくは両者に対して良溶媒でなければならな
い。この種の溶媒として代表的なものは、N、N−ジメ
チルホルムアミド、N、N−ジメチルアセトアミド、
ジメチルスルホン、ジメチルスルホキシド、N−メチル
−2−ピロリドン等があり、これらの溶媒は単独または
組み合わせて使用される。この他にも溶媒として組み合
わせて用いられるものとしてベンゼン、ジオキサン、キ
シレン、 トルエン、シクロヘキサン等の非極性溶媒が
、原料の分散媒、反応調節剤あるいは生成物からの揮散
調節剤、皮膜平滑剤等として使用される。The reaction is usually carried out in an organic polar solvent that does not react with the tetracarboxylic dianhydride or diamines. In addition to being inert to the reaction system and being a solvent/medium for the product, this organic polar solvent must also be a good solvent for at least one, preferably both, of the reaction components. Typical solvents of this type include N,N-dimethylformamide, N,N-dimethylacetamide,
Examples include dimethylsulfone, dimethylsulfoxide, N-methyl-2-pyrrolidone, and these solvents may be used alone or in combination. In addition, non-polar solvents such as benzene, dioxane, xylene, toluene, and cyclohexane are also used in combination as solvents, as dispersion media for raw materials, reaction regulators, volatilization regulators from products, film smoothing agents, etc. used.
反応は一般的に無水の条件下で行うことが好ましい。こ
れはテトラカルボン酸二無水物が水により開環し、不活
性化し、反応を停止させる恐れがあるためである。この
ため仕込原料中の水分ち溶媒中の水分も除去する必要が
ある。しかし一方、反応の進行を調節し、樹脂重合度を
コントロールするためにあえて水を添加することも行わ
れる。It is generally preferred that the reaction be carried out under anhydrous conditions. This is because the tetracarboxylic dianhydride may be ring-opened by water, inactivated, and the reaction may be stopped. For this reason, it is necessary to remove water in the raw materials and also water in the solvent. However, on the other hand, water is intentionally added in order to adjust the progress of the reaction and control the degree of resin polymerization.
また反応は不活性ガス雰囲気中で行われることが好まし
い。これはジアミン類の酸化を防止するためである。不
活性ガスとしては一般的に乾燥窒素ガスが使用される。Moreover, it is preferable that the reaction is carried out in an inert gas atmosphere. This is to prevent oxidation of diamines. Dry nitrogen gas is generally used as the inert gas.
本発明で用いるポリイミド樹脂の合成反応は以下の様な
方法で行われる。即ち、3.3’、4.4’−ビフェニ
ルテトラカルボン酸二無水物とパラフェニレンジアミン
とを反応させて得られたポリアミック酸(Aとする)と
ピロメリット酸二無水物と4,4゛−ジアミノジフ美ニ
ルエーテルとを反応させて得られ′たポリアミック酸(
Bとする)とをA/B=55745〜75/25の割合
で混合攪拌することによってポリアミック酸(Cとする
)を得る方法である。The synthesis reaction of the polyimide resin used in the present invention is carried out in the following manner. That is, a polyamic acid (referred to as A) obtained by reacting 3.3',4.4'-biphenyltetracarboxylic dianhydride and paraphenylenediamine, pyromellitic dianhydride, and 4,4' -Polyamic acid obtained by reacting with diaminodiphinyl ether (
This is a method for obtaining a polyamic acid (referred to as C) by mixing and stirring the polyamic acid (referred to as B) and A/B at a ratio of 55,745 to 75/25.
Aの比率が上述の割合よりも少ないときにはカールが発
生し、逆に多いときには剛直になりすぎ、柔軟性がなく
なる。When the ratio of A is less than the above-mentioned ratio, curling occurs, and on the other hand, when it is larger than the above ratio, the material becomes too rigid and loses flexibility.
A、 Bを合成し、また、これらを混合してCを得る
反応温度は0〜100℃であることが望ましい。The reaction temperature for synthesizing A and B and mixing them to obtain C is preferably 0 to 100°C.
0℃以下だと反応の速度が遅く、 100″C以上であ
ると生成したポリアミック酸の閉環反応および解重合反
応が開始するためである。通常、反応は20℃前後で行
われる。This is because if the temperature is below 0°C, the reaction rate is slow, and if it is above 100''C, the ring-closing reaction and depolymerization reaction of the produced polyamic acid will start. Usually, the reaction is carried out at around 20°C.
本発明により製造されたポリアミック酸生成物は、使用
するに当たって各種のシランカップリング剤、 ボラン
カップリング剤、 チタネート系カップリング剤1、ア
ルミニウム系カップリング剤その他キレート系の接着性
・密着性向上剤や各種溶剤、フローエージェントを加え
てもよく、またゴムや低分子エポキシ等の可どう性状与
剤や粘度調整剤、あるいはポリアミドイミド、ポリエー
テルイミド、ポリエステルイミド等をブレンドしてもよ
くタルク、マイカ、石英粉末等の充填剤、カーボンブラ
ック、フタロシアニンブルー等の着色剤、テトラブロモ
フェニルメタン等の難燃剤、三酸化アンチモン等の難燃
助剤の少量を加えてもよい。When using the polyamic acid product produced according to the present invention, various silane coupling agents, borane coupling agents, titanate coupling agents 1, aluminum coupling agents and other chelate-based adhesion/adhesion improvers can be used. , various solvents, and flow agents may be added, and ductility agents and viscosity modifiers such as rubber and low-molecular-weight epoxy, or polyamideimide, polyetherimide, polyesterimide, etc. may be blended with talc, mica, etc. , fillers such as quartz powder, colorants such as carbon black and phthalocyanine blue, flame retardants such as tetrabromophenylmethane, and flame retardant aids such as antimony trioxide may also be added.
本発明で使用される金属箔は、表面粗さRaが0.3μ
以下である粗化面のない金属箔、一般には粗化面を持た
ない無粗化圧延銅箔が用いられるが、粗化面を持たない
金属箔ならば他の金属箔を用いることもできる例えば、
アルミ箔、ニッケル箔、ステンレス箔、タングステン箔
なども用いることが出来る。金属箔が粗化されている、
即ち表面粗さRaが0. 3μを超えると、溶剤の蒸発
や応力緩和が不十分なところが残り、樹脂の硬化や応力
の緩和の程度に厚さ方向での不均一な分布が発生するた
め、加工工程および銅箔エツチング後のフィルムにカー
ルやシワが生じてしまう、一方このように表面粗さRa
が0.3μ以下の粗化面を持たない金属箔を用いること
により、ポリアミック酸加熱硬化時の収縮に伴い発生す
る残留応力の不均一性を著しく緩和することが出来るた
め加工工程および金属箔エツチング後のでのカールやシ
ワおよび寸法変化を著しく軽減することが出来る。The metal foil used in the present invention has a surface roughness Ra of 0.3μ
The following metal foil without a roughened surface, generally unroughened rolled copper foil without a roughened surface, is used, but other metal foils can also be used as long as they do not have a roughened surface. ,
Aluminum foil, nickel foil, stainless steel foil, tungsten foil, etc. can also be used. The metal foil is roughened,
That is, the surface roughness Ra is 0. If it exceeds 3μ, there will remain areas where solvent evaporation and stress relaxation are insufficient, resulting in uneven distribution of resin hardening and stress relaxation in the thickness direction. Curls and wrinkles occur on the film, while the surface roughness Ra
By using a metal foil that does not have a roughened surface of 0.3μ or less, it is possible to significantly alleviate the unevenness of residual stress that occurs due to shrinkage during heat curing of polyamic acid. Later curls, wrinkles, and dimensional changes can be significantly reduced.
このようにして得られた回路板は粗化面を持たないにも
関わらず金属箔とフィルムは充分な接着強度を持ち、し
かも金属箔上に周波数特性や誘電特性などの電気特性を
悪化させる粗化面を持たないため極めて電気的にも安定
したフレキシブルプリント回路板となる。また、粗化面
がないので回路加工性にも優れており、回路の細線化も
容易となる。Although the circuit board obtained in this way does not have a roughened surface, the metal foil and film have sufficient adhesive strength. Since it has no surface, it becomes an extremely electrically stable flexible printed circuit board. In addition, since there is no roughened surface, it has excellent circuit workability, and it is easy to make the circuit thinner.
(実施例)
実施例1
温度計、攪拌装置、環流コンデンサーおよび乾燥窒素ガ
ス吹き込み口を備えた4つロセバラブルフラスコに精製
した無水のパラフェニレンジアミン108gをとり、こ
れに無水のN−メチル−2−ピロリドン90重量%とト
ルエン10重量%の混合溶剤を、全仕込原料中の固形分
割合が20重量%になるだけの量を加えて溶解した。乾
燥窒素ガスは反応の準備段階より生成物取り出しまでの
全行程にわたり流しておいた。ついで精製した無水の3
゜3’,4.4’−ビフェニルテトラカルボン酸二無水
物294gを攪拌しながら少量ずつ添加するが発熱反応
であるため、外部水槽に約15°Cの冷水を循環させて
これを冷却した。添加後、内部温度を20℃に設定し、
5時間攪拌し反応を終了してポリアミック酸溶液(A
とする)を得た。次に上記と同様の装置及び方法で無水
の4,4“−ジアミノジフェニルエーテル200gと精
製した無水のピロメリット酸二無水物218gを反応さ
せてポリアミック酸(Bとする)を得た1次にAおよび
Bを、モル比がA/B = 60/40になるように混
合攪拌した。得られた生成物は、黄色透明の極めて粘稠
なポリアミック酸溶液であり、N−メチル−2−ピロリ
ドン中0. 5重量%溶液の固有粘度は0.81(30
℃)であった。(Example) Example 1 108 g of purified anhydrous para-phenylenediamine was placed in a four-piece variable flask equipped with a thermometer, a stirrer, a reflux condenser, and a dry nitrogen gas inlet, and anhydrous N-methyl- A mixed solvent of 90% by weight of 2-pyrrolidone and 10% by weight of toluene was added and dissolved in an amount sufficient to make the solid content ratio in the total raw materials 20% by weight. Dry nitrogen gas was allowed to flow throughout the reaction from the preparatory stage to the product removal. Then purified anhydrous 3
294 g of 3',4.4'-biphenyltetracarboxylic dianhydride was added little by little with stirring, but since the reaction was exothermic, cold water at about 15°C was circulated in an external water tank to cool it. After addition, set the internal temperature to 20 °C,
After stirring for 5 hours to complete the reaction, the polyamic acid solution (A
) was obtained. Next, 200 g of anhydrous 4,4"-diaminodiphenyl ether and 218 g of purified anhydrous pyromellitic dianhydride were reacted using the same apparatus and method as above to obtain a polyamic acid (referred to as B). and B were mixed and stirred so that the molar ratio was A/B = 60/40.The obtained product was a transparent yellow and extremely viscous polyamic acid solution, which was dissolved in N-methyl-2-pyrrolidone. The intrinsic viscosity of a 0.5% by weight solution is 0.81 (30
℃).
35μ、 Ra=0.02uの無粗化圧延銅箔上にこ
のポリアミック酸溶液を乾燥後のフィルム厚みが25μ
になるように流延塗布した後、乾燥器にいれ100℃か
ら200℃まで連続的に1時間かけて昇温した後、乾燥
器にいれ200″Cから380℃まで連続的に1時間か
けて昇温したにの様にして製造されたフレキシブルプリ
ント回路板は接着強度(JIS C6481)が1.1
Kg/cmで寸法変化率(JIS C64811が0.
05%(でまったくカールがなく、銅箔をエツチングし
た後のフィルムもまったくカールがなく、引っ張り強度
(JIS K6760)は3 L Kg/mm’、伸び
(JIS K676(1)は41%と優れた物であった
。After drying this polyamic acid solution on a non-roughened rolled copper foil of 35μ and Ra=0.02u, the film thickness was 25μ.
After applying the coating to the desired temperature, the temperature was continuously raised from 100°C to 200°C over 1 hour in a dryer, and then the temperature was continuously raised from 200°C to 380°C over 1 hour in a dryer. The adhesive strength (JIS C6481) of the flexible printed circuit board manufactured by raising the temperature is 1.1.
Dimensional change rate in Kg/cm (JIS C64811 is 0.
05% (there is no curling at all, and the film after etching the copper foil has no curling at all, the tensile strength (JIS K6760) is 3 L Kg/mm', and the elongation (JIS K676 (1) is excellent at 41%). It was a thing.
実施例2
実施例1と同様な装置及び方法で、パラフェニレンジア
ミンと3.3.4.4°−ビフェニルテトラカルボン酸
二無水物からなるポリアミック酸溶液(Aとする)と、
4.4°−ジアミノジフェニルエーテルとピロメリット
酸二無水物からなるポリアミック酸溶液(Bとする)を
合成した。つぎに、AとBをモル比が70/30になる
ように混合攪拌した。Example 2 Using the same apparatus and method as in Example 1, a polyamic acid solution (referred to as A) consisting of paraphenylenediamine and 3.3.4.4°-biphenyltetracarboxylic dianhydride,
4. A polyamic acid solution (referred to as B) consisting of 4°-diaminodiphenyl ether and pyromellitic dianhydride was synthesized. Next, A and B were mixed and stirred so that the molar ratio was 70/30.
生成物の固有粘度は0.90であった。The product had an intrinsic viscosity of 0.90.
実施例1と同様な金属箔上にこのポリアミック酸溶液を
乾燥後のフィルム厚みが25μになるように流延塗布し
た後、乾燥器に入れ、 100℃で30分間、 150
℃で30分間、 200℃で30分間、それぞれ加熱し
た後、乾燥器にいれ200℃で30分間、250℃で3
0分間、300℃で30分間、380℃で20分間加熱
した。この様にして製造されたフレキシブルプリント回
路板は接着強度が1.2Kg/cmで寸法変化率が0゜
07%でまったくカールがなく、銅箔をエツチングした
後のフィルムもまったくカールがなく耐熱性は500℃
、引っ張り強度は30 Kg/mm’、伸びは40%と
優れた物であった。This polyamic acid solution was cast onto the same metal foil as in Example 1 so that the film thickness after drying was 25μ, then placed in a dryer and heated at 100°C for 30 minutes at 150°C.
After heating at ℃ for 30 minutes and 200℃ for 30 minutes, put in a dryer and heat at 200℃ for 30 minutes and 250℃ for 30 minutes.
0 minutes, 30 minutes at 300°C, and 20 minutes at 380°C. The flexible printed circuit board manufactured in this way has an adhesive strength of 1.2 kg/cm, a dimensional change rate of 0°07%, and has no curls at all, and the film after etching the copper foil has no curls at all and is heat resistant. is 500℃
The tensile strength was excellent, 30 Kg/mm', and the elongation was 40%.
比較例1
実施例1と同様な装置及び方法で、実施例1と同様なポ
リアミック酸溶液を作製し、 35μ、 Ra=1.0
μの粗化面のある一般の圧延銅箔上にこのポリアミック
酸溶液を乾燥後のフィルム厚みが25μになるように流
延塗布した後、乾燥器にいれ100℃から380℃まで
連続的に2時間かけて昇温した。Comparative Example 1 A polyamic acid solution similar to that of Example 1 was prepared using the same apparatus and method as that of Example 1. 35μ, Ra=1.0
This polyamic acid solution was cast onto a general rolled copper foil with a roughened surface of μ so that the film thickness after drying was 25μ, and then placed in a dryer and continuously heated from 100℃ to 380℃ for 2 hours. The temperature was raised over time.
この様にして製造されたフレキシブルプリント回路板は
粗化面が有るために残留応力が充分緩和されなかったた
めか銅箔エツチング後のフィルムのカールおよびシワが
ひどく、回路板としては不適当であった。The flexible printed circuit board manufactured in this way had a roughened surface, so the residual stress was not sufficiently alleviated, and the film after copper foil etching had severe curls and wrinkles, making it unsuitable for use as a circuit board. .
比較例2
実施例1と同様な装置及び方法で、パラフェニレンジア
ミンと3.3’、4.4’−ビフェニルテトラカルボン
酸二無水物からなるポリアミック酸溶液(Aとする)と
、4.4゛−ジアミノジフェニルエーテルとピロメリッ
ト酸二無水物からなるポリアミック酸溶液(Bとする)
を合成した。つぎに、AとBをモル比が80/20にな
るように混合攪拌した。Comparative Example 2 Using the same apparatus and method as in Example 1, a polyamic acid solution (referred to as A) consisting of paraphenylene diamine and 3.3', 4.4'-biphenyltetracarboxylic dianhydride (referred to as A), and 4.4゛-Polyamic acid solution consisting of diaminodiphenyl ether and pyromellitic dianhydride (referred to as B)
was synthesized. Next, A and B were mixed and stirred so that the molar ratio was 80/20.
実施例1と同様な35μの無粗化圧延銅箔を用いてフレ
キシブル回路板を作成したが、この様にして製造された
フレキシブルプリント回路板は接着強度が0. 5Kg
/cmであり、剛直で柔軟性がなく、耐折性も悪く、回
路板としては不適当であった。A flexible circuit board was created using the same 35μ non-roughened rolled copper foil as in Example 1, but the flexible printed circuit board manufactured in this way had an adhesive strength of 0. 5Kg
/cm, was rigid, inflexible, and had poor folding durability, making it unsuitable for use as a circuit board.
比較例3
実施例1と同様な装置及び方法で、パラフェニレンジア
ミンと3.3’、4.4°−ビフェニルテトラカルボン
酸二無水物からなるポリアミック酸溶液(Aとする)と
、4.4−ジアミノジフェニルエーテルとピロメリット
酸二無水物からなるポリアミック酸溶液(Bとする)を
合成した。つぎに、AとBをモル比が40/60になる
ように混合攪拌した。Comparative Example 3 Using the same apparatus and method as in Example 1, a polyamic acid solution (referred to as A) consisting of paraphenylene diamine and 3.3', 4.4°-biphenyltetracarboxylic dianhydride (referred to as A), and 4.4 - A polyamic acid solution (referred to as B) consisting of diaminodiphenyl ether and pyromellitic dianhydride was synthesized. Next, A and B were mixed and stirred so that the molar ratio was 40/60.
実施例1と同様な35μの無粗化圧延銅箔を用いてフレ
キシブル回路板を作成したが、著しくカールしてしまい
回路板としては不適当であった。A flexible circuit board was made using the same 35μ non-roughened rolled copper foil as in Example 1, but it curled significantly and was unsuitable for use as a circuit board.
(発明の効果)
本発明の様に粗化面を持たない金属箔を用いることによ
り、ポリアミック酸加熱硬化時の収縮に伴い発生する残
留応力の不均一性を著しく緩和することが出来るため加
工工程および金属箔エツチング後のでのカールやシワお
よび寸法変化を著しく軽減することが出来る。また粗化
面を持たないにち関わらず金属箔とフィルムは充分な接
着強度を持ち、しかも金属箔上に高周波導電特性を悪化
させる粗化面を持たないため極めて電気的にも安定した
フレキシブルプリント回路板を得ることが出来る。例え
ば、フレキシブルプリント回路板の実効的な導電率が周
波数10GHz域で通常直流値の30%程度に低下する
のに対して本金属箔を用いれば80%以上にすることが
可能だということが確かめられている。そのうえ粗化面
がないので回路加工性にも優れており、回路の細線化が
容易となる。従来困難であった全くカールの生じない接
着層のないフレキシブルプリント回路板を製造すること
が可能になり、こうして得られたフレキシブルプリント
回路板は、接着層がないために耐熱性に優れ、カールが
ないために加工性も良く、またフィルムとしての特性も
優れた基板であった。(Effect of the invention) By using a metal foil without a roughened surface as in the present invention, it is possible to significantly alleviate the non-uniformity of residual stress that occurs due to shrinkage during heat curing of polyamic acid. Also, curls, wrinkles, and dimensional changes after metal foil etching can be significantly reduced. In addition, the metal foil and film have sufficient adhesion strength even though they do not have a roughened surface, and since there is no roughened surface on the metal foil that deteriorates high frequency conductive properties, it is an extremely electrically stable flexible print. You can get a circuit board. For example, it has been confirmed that while the effective conductivity of a flexible printed circuit board normally drops to about 30% of the DC value in the 10 GHz frequency range, it is possible to increase it to over 80% by using this metal foil. It is being Furthermore, since there is no roughened surface, it has excellent circuit workability, and it is easy to make the circuit thinner. It is now possible to produce a flexible printed circuit board without an adhesive layer that does not curl at all, which was previously difficult, and the flexible printed circuit board thus obtained has excellent heat resistance and no curling due to the absence of an adhesive layer. The substrate had good processability because it was free of oxidation, and also had excellent properties as a film.
Claims (1)
以下である粗化面のない金属箔上に3.3’,4.4’
−ビフェニルテトラカルボン酸二無水物とパラフェニレ
ンジアミンとを反応させて得られたポリアミック酸溶液
(A)と、ピロメリット酸二無水物と4,4’−ジアミ
ノジフェニルエーテルを反応させて得られたポリアミッ
ク酸溶液(B)とを、A/B=55/45〜75/25
の割合で混合して得られたポリアミック酸混合物のワニ
スを流延塗布し、加熱硬化させることを特徴とするフレ
キシブルプリント回路板の製造方法。(1) Surface roughness Ra (JIS B0601) is 0.3μ
3.3', 4.4' on metal foil without roughened surface which is below.
- A polyamic acid solution (A) obtained by reacting biphenyltetracarboxylic dianhydride and paraphenylene diamine, and a polyamic acid solution obtained by reacting pyromellitic dianhydride and 4,4'-diaminodiphenyl ether. acid solution (B), A/B=55/45 to 75/25
1. A method for producing a flexible printed circuit board, which comprises casting a varnish of a polyamic acid mixture obtained by mixing the mixture in a ratio of 1 to 1, and heating and curing the varnish.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9213190A JP2958045B2 (en) | 1990-04-09 | 1990-04-09 | Manufacturing method of flexible printed circuit board |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9213190A JP2958045B2 (en) | 1990-04-09 | 1990-04-09 | Manufacturing method of flexible printed circuit board |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH03291987A true JPH03291987A (en) | 1991-12-24 |
| JP2958045B2 JP2958045B2 (en) | 1999-10-06 |
Family
ID=14045879
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP9213190A Expired - Fee Related JP2958045B2 (en) | 1990-04-09 | 1990-04-09 | Manufacturing method of flexible printed circuit board |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2958045B2 (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2006137240A1 (en) * | 2005-06-23 | 2006-12-28 | Nippon Mining & Metals Co., Ltd. | Copper foil for printed wiring board |
| WO2012165265A1 (en) * | 2011-05-27 | 2012-12-06 | 日立化成工業株式会社 | Substrate, method for producing same, heat-releasing substrate, and heat-releasing module |
-
1990
- 1990-04-09 JP JP9213190A patent/JP2958045B2/en not_active Expired - Fee Related
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2006137240A1 (en) * | 2005-06-23 | 2006-12-28 | Nippon Mining & Metals Co., Ltd. | Copper foil for printed wiring board |
| WO2012165265A1 (en) * | 2011-05-27 | 2012-12-06 | 日立化成工業株式会社 | Substrate, method for producing same, heat-releasing substrate, and heat-releasing module |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2958045B2 (en) | 1999-10-06 |
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|---|---|---|---|
| LAPS | Cancellation because of no payment of annual fees |