JPH0848795A - Novel polyimide film and manufacturing method thereof - Google Patents

Novel polyimide film and manufacturing method thereof

Info

Publication number
JPH0848795A
JPH0848795A JP20461194A JP20461194A JPH0848795A JP H0848795 A JPH0848795 A JP H0848795A JP 20461194 A JP20461194 A JP 20461194A JP 20461194 A JP20461194 A JP 20461194A JP H0848795 A JPH0848795 A JP H0848795A
Authority
JP
Japan
Prior art keywords
polyimide film
film
thickness
polyamic acid
acid polymer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP20461194A
Other languages
Japanese (ja)
Inventor
Kosuke Kataoka
孝介 片岡
Eiichiro Kuribayashi
栄一郎 栗林
Yoshihide Onari
義秀 大成
Kosaku Nagano
広作 永野
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kanegafuchi Chemical Industry Co Ltd
Original Assignee
Kanegafuchi Chemical Industry Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kanegafuchi Chemical Industry Co Ltd filed Critical Kanegafuchi Chemical Industry Co Ltd
Priority to JP20461194A priority Critical patent/JPH0848795A/en
Publication of JPH0848795A publication Critical patent/JPH0848795A/en
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00—Printed circuits
    • H05K1/02—Details
    • H05K1/03—Use of materials for the substrate
    • H05K1/0313—Organic insulating material
    • H05K1/032—Organic insulating material consisting of one material
    • H05K1/0346—Organic insulating material consisting of one material containing N
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/02—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding
    • H05K3/022—Processes for manufacturing precursors of printed circuits, i.e. copper-clad substrates

Landscapes

  • Manufacture Of Macromolecular Shaped Articles (AREA)
  • Treatments Of Macromolecular Shaped Articles (AREA)
  • Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)

Abstract

(57)【要約】 【目的】 125μmを越えるポリイミドフィルムで、
機械強度が保持され、かつ打ち抜き性にも優れており、
スティフナーとして用いるのに張り合わせ工程が不必要
な新規なポリイミドフィルムを提供することを目的とす
る。 【構成】 ポリアミド酸重合体溶液をフィルム状に形成
し、該ポリアミド酸重合体のフィルムを支持枠に固定し
て徐々に温度を上げ、最高焼成温度が200〜450℃
で5分間以上加熱することにより、厚みが125μm以
上であり、かつ引裂伝播抵抗が0.3g/μm以上であ
る新規なポリイミドフィルムを作製した。かかるポリイ
ミドフィルムは、機械強度、打ち抜き性に優れており、
1枚のポリイミドフィルムをスティフナーとして好適に
用いることができ、張り合わせ工程を省略することがで
きる。
(57) [Summary] [Purpose] A polyimide film with a thickness of more than 125 μm.
It retains mechanical strength and has excellent punchability,
It is an object of the present invention to provide a novel polyimide film which does not require a laminating step for use as a stiffener. [Structure] A polyamic acid polymer solution is formed into a film, the film of the polyamic acid polymer is fixed to a support frame, and the temperature is gradually raised, and the maximum firing temperature is 200 to 450 ° C.
By heating for 5 minutes or more, a novel polyimide film having a thickness of 125 μm or more and a tear propagation resistance of 0.3 g / μm or more was produced. Such a polyimide film has excellent mechanical strength and punchability,
One piece of polyimide film can be suitably used as a stiffener, and the laminating step can be omitted.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は新規なポリイミドフィル
ム及びその製造方法に関し、より詳しくは、フレキシブ
ルプリント配線板(以下、FPCという。)のコネクタ
ー部及び部品実装部の補強板(スティフナー)として好
適に用いることのできる新規なポリイミドフィルム及び
その製造方法に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a novel polyimide film and a method for producing the same, and more particularly, it is suitable as a reinforcing plate (stiffener) for a connector portion and a component mounting portion of a flexible printed wiring board (hereinafter referred to as FPC). The present invention relates to a novel polyimide film that can be used for and a manufacturing method thereof.

【0002】[0002]

【従来の技術と発明が解決しようとする課題】FPCは
柔軟で薄いベースフィルム上に回路パターンを形成し、
その表面にカバーレイを施したものを基本的な構造とし
ており、近年、FPCは、その可撓性などの優秀な機能
により、電子技術分野において広く利用されるようにな
ってきている。また、近年の実装技術の進歩により、高
密度実装化の要求は急激に高まり、FPCに直接に部品
搭載をする部品実装用FPCが多用されてきている。か
かる部品実装用FPCにおいては、補強材を裏打ちした
り、絶縁フィルムを厚くして用いられている。
2. Description of the Related Art FPC is a flexible and thin base film on which a circuit pattern is formed.
The surface of the FPC has a basic structure, and in recent years, the FPC has been widely used in the field of electronic technology due to its excellent functions such as flexibility. Further, due to recent progress in mounting technology, the demand for high-density mounting has rapidly increased, and component mounting FPCs for directly mounting components on FPCs have been widely used. In such a component mounting FPC, a reinforcing material is lined or an insulating film is thickened.

【0003】製造上、使用上の観点から、FPCのベー
スフィルムやカバーレイフィルムには、機械特性、電気
特性、耐化学薬品性、耐熱性、耐環境性などの要求特性
があり、これらに充分耐える材料として、現在ではポリ
イミドフィルムが最も広く用いられている。また、部品
実装用FPCのスティフナーとしてもポリイミドフィル
ムは幅広く使用されており、この場合は、通常、約20
0μm程度の厚さに形成して用いられる。
From the viewpoints of production and use, FPC base films and cover lay films have required properties such as mechanical properties, electrical properties, chemical resistance, heat resistance, and environment resistance, and these are sufficient. At present, polyimide film is most widely used as a durable material. Polyimide films are also widely used as stiffeners for component mounting FPCs.
It is formed to a thickness of about 0 μm and used.

【0004】ところで、ポリイミドフィルムは、4,
4’−ジアミノジフェニルエーテルに代表される芳香族
ジアミンと、ピロメリット酸二無水物に代表される芳香
族テトラカルボン酸二無水物とを有機溶媒中で重合反応
させてポリアミド酸重合体溶液を得た後、該ポリアミド
酸重合体溶液をフィルム状に形成し、これを熱的及び/
又は化学的に脱水閉環、すなわちイミド化させることに
より得られる。具体的には、ポリアミド酸重合体溶液、
又はその溶液に化学量論以上の脱水剤と触媒量の第3級
アミンを加えた溶液をドラム或いはエンドレスベルト上
に流延又は塗布して膜状とし、その塗膜を150℃以下
の温度で約5〜90分間乾燥し、自己支持性を有するポ
リアミド酸重合体の塗膜を得る。次いで、これを支持体
より引き剥がして端部を固定し、約100〜500℃ま
で徐々に加熱し、最高焼成温度が450〜550℃で1
〜5分間加熱することによりポリアミド酸からポリイミ
ドに転換され、ポリイミドフィルムが得られるのであ
る。
By the way, the polyimide film is 4,
An aromatic diamine typified by 4'-diaminodiphenyl ether and an aromatic tetracarboxylic dianhydride typified by pyromellitic dianhydride were polymerized in an organic solvent to obtain a polyamic acid polymer solution. After that, the polyamic acid polymer solution is formed into a film, which is thermally and / or
Alternatively, it can be obtained by chemically performing dehydration ring closure, that is, by imidization. Specifically, a polyamic acid polymer solution,
Alternatively, a solution obtained by adding a stoichiometric or higher amount of dehydrating agent and a catalytic amount of a tertiary amine is cast or applied onto a drum or an endless belt to form a film, and the film is formed at a temperature of 150 ° C or lower. After drying for about 5 to 90 minutes, a coating film of a polyamic acid polymer having self-supporting property is obtained. Then, this is peeled off from the support to fix the end portion, and gradually heated to about 100 to 500 ° C, and the maximum firing temperature is 450 to 550 ° C.
By heating for about 5 minutes, the polyamic acid is converted to polyimide, and a polyimide film is obtained.

【0005】しかしながら、かかる方法で厚みが125
μm以上のポリイミドフィルムを作製すると機械強度が
乏しくなり、また、打ち抜き後の端面に層状破壊が見ら
れるなど、打ち抜き性にも問題があった。そこで、ステ
ィフナーとして使用する場合のように、200μm程度
の厚物ポリイミドフィルムが必要な場合は、通常、機械
強度を保持するために2枚(例えば50μmと125μ
m)のポリイミドフィルムを接着剤で張り合わせて使用
されている。ところが、このように2枚のポリイミドフ
ィルムを張り合わせる工程は手間がかかり、コスト高に
なる要因となり、また接着剤との剥がれが生じやすく打
ち抜き後の端面に接着剤層の割れ欠けが見られるという
打ち抜き性の問題を有していた。
However, with such a method, the thickness is 125
When a polyimide film having a thickness of μm or more is produced, mechanical strength becomes poor, and there is a problem in punchability such as layer breakage on the end face after punching. Therefore, when a thick polyimide film of about 200 μm is required as in the case of using as a stiffener, usually two sheets (for example, 50 μm and 125 μm) are used to maintain mechanical strength.
It is used by adhering the polyimide film of m) with an adhesive. However, the process of laminating two polyimide films in this way is time-consuming and costly, and easily peels off from the adhesive and cracks in the adhesive layer are observed on the end face after punching. It had a problem of punchability.

【0006】そこで、本発明者らは、上記問題点を解決
し、125μmを越えるポリイミドフィルムで、機械強
度が保持され、かつ打ち抜き性にも優れており、スティ
フナーとして用いるのに張り合わせ工程が不必要な新規
なポリイミドフィルムを提供することを目的に、鋭意研
究を重ねた結果、本発明に至ったのである。
Therefore, the present inventors have solved the above-mentioned problems and made a polyimide film having a thickness of more than 125 μm, which retains mechanical strength and is excellent in punching property, so that a laminating step is unnecessary for use as a stiffener. As a result of intensive studies, the present invention has been accomplished with the aim of providing a novel polyimide film.

【0007】[0007]

【課題を解決するための手段】本発明に係る新規なポリ
イミドフィルムの要旨とするところは、厚みが125μ
m以上であり、かつ引裂伝播抵抗が0.3g/μm以上
であることにある。
The gist of the novel polyimide film according to the present invention is that the thickness is 125 μm.
m or more and the tear propagation resistance is 0.3 g / μm or more.

【0008】本発明に係る新規なポリイミドフィルムの
製造方法の要旨とするところは、ポリアミド酸重合体溶
液をフィルム状に形成し、その後熱的及び/又は化学的
にイミド化させて得る厚みが125μm以上のポリイミ
ドフィルムの製造方法において、焼成条件が、最高焼成
温度が200〜450℃で加熱時間が5分以上であるこ
とにある。
The gist of the novel method for producing a polyimide film according to the present invention is that a polyamic acid polymer solution is formed into a film and then thermally and / or chemically imidized to obtain a thickness of 125 μm. In the above method for producing a polyimide film, the firing conditions are that the maximum firing temperature is 200 to 450 ° C. and the heating time is 5 minutes or more.

【0009】[0009]

【作用】本発明に係る新規なポリイミドフィルムは厚み
が125μm以上であり、かつ引裂伝播抵抗が0.3g/
μm以上であることを特徴とするものであり、機械強度
の保持されたポリイミドフィルムである。また、打ち抜
き性にも優れており、従来のように、2枚のポリイミド
フィルムを接着剤で張り合わせることなく、1枚のポリ
イミドフィルムをスティフナーとして好適に用いること
ができる。従って、スティフナーとして用いるのに張り
合わせ工程を省略することができ、また接着剤との剥が
れが生じることもない。
The novel polyimide film according to the present invention has a thickness of 125 μm or more and a tear propagation resistance of 0.3 g /
It is characterized by having a thickness of at least μm, and is a polyimide film that retains mechanical strength. Further, it has excellent punching property, and one polyimide film can be suitably used as a stiffener without sticking two polyimide films with an adhesive as in the conventional case. Therefore, the bonding step can be omitted for use as a stiffener, and peeling from the adhesive does not occur.

【0010】また、かかる新規なポリイミドフィルムを
製造するには、焼成条件を従来よりも低温・長時間に
し、最高焼成温度を200〜450℃とし加熱時間を5
分以上とすることが必要であり、最高焼成温度が高くな
ると、125μm以上のポリイミドフィルムは機械強度
を保持することができず、打ち抜き性も不良となる。す
なわち、公知の方法でポリアミド酸重合体の塗膜を得
て、該塗膜を支持枠に固定し、その後徐々に温度を上げ
て最高焼成温度が200〜450℃で5分以上加熱する
ことにより、厚みが125μmを越えるポリイミドフィ
ルムであっても引裂伝播抵抗が0.3g/μm以上の優れ
た機械強度を保持し、打ち抜き性にも優れた本発明に係
る新規なポリイミドフィルムを得ることができるのであ
る。
Further, in order to produce such a novel polyimide film, the firing conditions are set to be lower and longer than those of the conventional one, the maximum firing temperature is set to 200 to 450 ° C., and the heating time is set to 5
When the maximum firing temperature is high, the polyimide film having a thickness of 125 μm or more cannot maintain the mechanical strength and the punchability becomes poor. That is, by obtaining a polyamic acid polymer coating film by a known method, fixing the coating film on a supporting frame, and then gradually raising the temperature and heating at a maximum firing temperature of 200 to 450 ° C. for 5 minutes or more. It is possible to obtain a novel polyimide film according to the present invention, which has excellent mechanical strength with a tear propagation resistance of 0.3 g / μm or more and is excellent in punchability even when the thickness of the polyimide film is more than 125 μm. Of.

【0011】[0011]

【実施例】以下、本発明に係る新規なポリイミドフィル
ム及びその製造方法の実施例について説明する。
EXAMPLES Examples of the novel polyimide film and the method for producing the same according to the present invention will be described below.

【0012】本発明に適用されるポリイミドフィルムは
4,4’−ジアミノジフェニルエーテルに代表される芳
香族ジアミンと、ピロメリット酸二無水物に代表される
芳香族テトラカルボン酸二無水物とを有機溶媒中で重合
させてポリアミド酸重合体溶液を得た後、必要に応じて
脱水剤(硬化剤)を混合してキャスト法等でフィルム状
に加工し、加熱により溶剤の乾燥とポリイミドへの転換
を行って得られる。
The polyimide film applied to the present invention comprises an aromatic diamine typified by 4,4'-diaminodiphenyl ether and an aromatic tetracarboxylic dianhydride typified by pyromellitic dianhydride as an organic solvent. After polymerization in the solution to obtain a polyamic acid polymer solution, if necessary, a dehydrating agent (curing agent) is mixed and processed into a film by a casting method or the like, and the solvent is dried by heating and conversion to a polyimide. Go and get.

【0013】より具体的には、ポリアミド酸重合体溶液
は従来公知の方法で得られるものであり、芳香族ジアミ
ンとしては、ジアミノジフェニルエーテル、パラフェニ
レンジアミン、ビス(3−アミノフェノキシフェニル)
プロパン等を挙げることができ、その他種々のジアミン
成分を使用することができる。また、芳香族テトラカル
ボン酸二無水物としては、ピロメリット酸二無水物、ビ
フェニルテトラカルボン酸二無水物等をを挙げることが
でき、その他種々の酸無水物成分を使用することができ
る。これらジアミン成分と酸無水物成分を、有機溶媒中
で実質的に全酸無水物成分と全ジアミン成分が等モルに
なるまで徐々に加えつつ、充分に攪拌することにより重
合させてポリアミド酸重合体溶液を得るのであるが、か
かるジアミン成分と酸無水物成分は単独で用いてもよ
く、また2種以上を混合して用いて共重合させてもよ
い。
More specifically, the polyamic acid polymer solution is obtained by a conventionally known method, and as the aromatic diamine, diaminodiphenyl ether, paraphenylenediamine, bis (3-aminophenoxyphenyl) is used.
Propane etc. can be mentioned, and other various diamine components can be used. Examples of aromatic tetracarboxylic dianhydrides include pyromellitic dianhydride and biphenyltetracarboxylic dianhydride, and various other acid anhydride components can be used. These diamine component and acid anhydride component are gradually added in an organic solvent until substantially all of the acid anhydride component and all of the diamine component are equimolar, and polymerized by sufficient stirring to produce a polyamic acid polymer. Although a solution is obtained, the diamine component and the acid anhydride component may be used alone, or two or more kinds may be mixed and used for copolymerization.

【0014】上記方法で得られたポリアミド酸重合体溶
液をフィルム状に形成し、ポリアミド酸を脱水閉環(イ
ミド化)させてポリイミドに転換させることによりポリ
イミドフィルムを得ることができるのであるが、一般的
には、その方法として、熱的に脱水する熱的方法と脱水
剤を用いる化学的方法の2種類があり、いずれの方法を
用いてもよく、化学的方法と熱的方法とを併用してもよ
い。
A polyimide film can be obtained by forming the polyamic acid polymer solution obtained by the above method into a film and converting the polyamic acid into a polyimide by dehydration ring closure (imidization). Specifically, there are two types of methods, a thermal method of thermally dehydrating and a chemical method using a dehydrating agent. Either method may be used, and the chemical method and the thermal method are used in combination. May be.

【0015】具体的には、上記ポリアミド酸重合体溶液
をドラム或いはエンドレスベルト上に流延又は塗布して
膜状とし、その膜を150℃以下の温度で約5〜90分
間乾燥し、自己支持性を有するポリアミド酸重合体の塗
膜を得る。ついで、これを支持体より引き剥がして端部
を固定し、徐々に加熱することによりイミド化させ、冷
却後これより取り外して、ポリイミドフィルムが得られ
るのであるが、このときの焼成条件を、最高焼成温度を
200〜450℃とし、5分以上加熱することにより、
本発明に係る新規なポリイミドフィルムを得ることがで
きるのである。厚さが125μmを越えるポリイミドフ
ィルムを作製する場合、最高焼成温度が200℃に満た
ない温度では、焼成時間(加熱時間)の長短に係わら
ず、充分な引張強さ、伸び等の機械強度を得ることがで
きない。また、最高焼成温度が450℃では、焼成時間
が5分未満であると引裂伝播抵抗が0.3g/μm以上の
フィルムを得ることができないが、焼成時間を5分以上
とすることにより引裂伝播抵抗が0.3g/μm以上のフ
ィルムを得ることができる。更に、最高焼成温度が45
0℃を越えると、焼成時間の長短に係わらず、引裂伝播
抵抗が0.3g/μm以上のフィルムを得ることができな
い。なお、焼成時間は得られるフィルムの厚さや焼成温
度により設定されるが、通常5〜10分間加熱すること
が好ましい。
Specifically, the polyamic acid polymer solution is cast or coated on a drum or an endless belt to form a film, and the film is dried at a temperature of 150 ° C. or lower for about 5 to 90 minutes and self-supported. A coating film of polyamic acid polymer having properties is obtained. Then, peel off this from the support to fix the end, gradually heat to imidize, and after cooling, remove from this, a polyimide film can be obtained. By setting the firing temperature to 200 to 450 ° C. and heating for 5 minutes or more,
Therefore, the novel polyimide film according to the present invention can be obtained. When a polyimide film having a thickness of more than 125 μm is produced, sufficient mechanical strength such as tensile strength and elongation is obtained at a maximum firing temperature of less than 200 ° C., regardless of the length of firing time (heating time). I can't. When the maximum firing temperature is 450 ° C, a film having a tear propagation resistance of 0.3 g / μm or more cannot be obtained if the firing time is less than 5 minutes, but if the firing time is 5 minutes or more, the tear propagation resistance is increased. A film having a resistance of 0.3 g / μm or more can be obtained. Furthermore, the maximum firing temperature is 45
If the temperature exceeds 0 ° C, a film having a tear propagation resistance of 0.3 g / μm or more cannot be obtained regardless of the length of baking time. The firing time is set depending on the thickness of the film to be obtained and the firing temperature, but it is usually preferable to heat for 5 to 10 minutes.

【0016】かかる方法で得られた本発明に係る新規な
ポリイミドフィルムは、厚さが125μm以上であり、
かつ引裂伝播抵抗が0.3g/μm以上の優れた機械強度
を示し、かつ打ち抜き性にも優れたものである。従っ
て、かかるポリイミドフィルムは、1枚のポリイミドフ
ィルムをスティフナーとして好適に用いることができ、
張り合わせ工程を省略することができる。なお、厚さが
125μm以下のポリイミドフィルムを作製してもよい
が、この場合は従来の加熱条件でも充分な機械強度のポ
リイミドフィルムを得ることができる。特には、厚さが
150μm〜250μmのポリイミドフィルムは、ステ
ィフナーとしての利用性が高く、好ましく用いることが
できる。
The novel polyimide film according to the present invention obtained by such a method has a thickness of 125 μm or more,
In addition, it exhibits excellent mechanical strength with a tear propagation resistance of 0.3 g / μm or more, and has excellent punchability. Therefore, such a polyimide film can be preferably used as a stiffener with one piece of polyimide film,
The laminating step can be omitted. Although a polyimide film having a thickness of 125 μm or less may be produced, in this case, a polyimide film having sufficient mechanical strength can be obtained even under conventional heating conditions. In particular, a polyimide film having a thickness of 150 μm to 250 μm has high availability as a stiffener and can be preferably used.

【0017】以上、本発明の一実施例を説明したが、本
発明はその他の態様でも実施し得るものである。例え
ば、上記実施例においては、熱的方法によりポリアミド
酸をイミド化しているが、ポリアミド酸重合体溶液に、
化学量論以上の脱水剤と触媒量の第3級アミンを加えて
ポリアミド酸重合体の塗膜を形成し、その後、上記条件
で加熱するというように、化学的方法と熱的方法を併用
してもよい。工業的には化学的方法と熱的方法とを併用
する方法が、取扱性に優れ、又生成するポリイミドフィ
ルムの伸びや引張強度等の機械特性も優れたものになる
ので好ましい。
Although one embodiment of the present invention has been described above, the present invention can be implemented in other modes. For example, in the above examples, the polyamic acid is imidized by a thermal method, but in the polyamic acid polymer solution,
A chemical method and a thermal method are used in combination, such as adding a dehydrating agent in a stoichiometric amount or more and a catalytic amount of a tertiary amine to form a polyamic acid polymer coating film, and then heating under the above conditions. May be. Industrially, a method of using a chemical method and a thermal method in combination is preferable because it is excellent in handleability and mechanical properties such as elongation and tensile strength of a polyimide film to be formed are excellent.

【0018】また、本発明における新規なポリイミドフ
ィルムの製造方法は、上記ポリアミリアミド酸重合体を
イミド化させて得られるポリイミドフィルム以外に、ポ
リアミドイミド、ポリエーテルイミド等の準イミド材料
を成形して得られるフィルムに適用することもでき、本
発明における新規なポリイミドフィルムはこれらを含む
概念である。更に、本発明に用いられるポリイミドフィ
ルムは各種充填剤や補強剤等を添加して形成されたもの
であってもよく、なんら限定されるものではない。その
他、本発明はその趣旨を逸脱しない範囲内で当業者の知
識に基づき、種々なる改良、変更、修正を加えた態様で
実施しうるものである。
Further, the novel method for producing a polyimide film in the present invention comprises molding a quasi-imide material such as polyamide-imide or polyether-imide, in addition to the polyimide film obtained by imidizing the above polyamylamidic acid polymer. The novel polyimide film in the present invention is a concept including these. Further, the polyimide film used in the present invention may be formed by adding various fillers, reinforcing agents, etc., and is not limited at all. In addition, the present invention can be carried out in a mode in which various improvements, changes and modifications are made based on the knowledge of those skilled in the art without departing from the spirit of the present invention.

【0019】以下に実施例により本発明をより具体的に
説明するが、本発明はこれら実施例によって限定される
ものではない。
Hereinafter, the present invention will be described in more detail with reference to Examples, but the present invention is not limited to these Examples.

【0020】実施例 1 芳香族ジアミンとして、4,4’−ジアミノジフェニル
エーテルを、芳香族テトラカルボン酸二無水物としてピ
ロメリット酸二無水物を用いて、公知の方法でポリアミ
ド酸重合体溶液を得た。次いで、該ポリアミド酸重合体
溶液をガラス板上に流延塗布し、約100℃で約8分間
乾燥後、ポリアミド酸重合体の塗膜をガラス板より剥が
し、その塗膜を支持枠に固定した。その後、徐々に温度
を上げ、最高焼成温度が200℃で、加熱時間がそれぞ
れ5分間、7分間、10分間の条件で加熱して脱水閉環
(イミド化)させ、厚み150μm、200μm、25
0μmの厚物ポリイミドフィルムを得た。
Example 1 A polyamic acid polymer solution was obtained by a known method using 4,4′-diaminodiphenyl ether as an aromatic diamine and pyromellitic dianhydride as an aromatic tetracarboxylic dianhydride. It was Then, the polyamic acid polymer solution was cast-coated on a glass plate, dried at about 100 ° C. for about 8 minutes, the coating film of the polyamic acid polymer was peeled off from the glass plate, and the coating film was fixed to a supporting frame. . After that, the temperature is gradually raised, and the dehydration ring closure (imidization) is performed by heating under the conditions of a maximum firing temperature of 200 ° C. and a heating time of 5 minutes, 7 minutes, and 10 minutes, respectively, and a thickness of 150 μm, 200 μm, 25
A thick polyimide film of 0 μm was obtained.

【0021】このようにして作製したポリイミドフィル
ムについて、引裂伝播抵抗(ASTM D1938)、
端裂抵抗(ASTM D1004)を測定し、機械強度
を評価した。また、打ち抜き後の端面の状態を観察し、
打ち抜き性の良否を評価した。その評価結果を表1に示
す。
Regarding the polyimide film thus produced, tear propagation resistance (ASTM D1938),
Edge tear resistance (ASTM D1004) was measured to evaluate mechanical strength. Also, observe the state of the end surface after punching,
The quality of punchability was evaluated. Table 1 shows the evaluation results.

【0022】[0022]

【表1】 [Table 1]

【0023】実施例 2 実施例1と同様に同様にして得たポリアミド酸重合体の
塗膜を支持枠に固定した。次いで、最高焼成温度が45
0℃で、加熱時間がそれぞれ5分間、7分間、10分間
の条件で加熱して脱水閉環(イミド化)させ、厚み15
0μm、200μm、250μmの厚物ポリイミドフィ
ルムを得た。このようにして作製したポリイミドフィル
ムの機械強度及び打ち抜き性の良否を実施例1と同様に
して評価した。その評価結果を表2に示す。
Example 2 A coating film of a polyamic acid polymer obtained in the same manner as in Example 1 was fixed on a support frame. Then, the maximum firing temperature is 45
A thickness of 15 °
Thick polyimide films of 0 μm, 200 μm, and 250 μm were obtained. In the same manner as in Example 1, the mechanical strength and punchability of the polyimide film thus produced were evaluated. Table 2 shows the evaluation results.

【0024】[0024]

【表2】 [Table 2]

【0025】比較例 1 比較のため、実施例1と同様にして得たポリアミド酸重
合体の塗膜を支持枠に固定した。次いで、最高焼成温度
が450℃で3分間加熱して脱水閉環(イミド化)さ
せ、厚み150μm、200μm、250μmの厚物ポ
リイミドフィルムを得た。このようにして作製したポリ
イミドフィルムの機械強度及び打ち抜き性の良否を実施
例1と同様にして評価した。その評価結果を表3に示
す。
Comparative Example 1 For comparison, a coating film of the polyamic acid polymer obtained in the same manner as in Example 1 was fixed on a supporting frame. Then, it was heated at a maximum firing temperature of 450 ° C. for 3 minutes for dehydration ring closure (imidization) to obtain thick polyimide films having a thickness of 150 μm, 200 μm, and 250 μm. In the same manner as in Example 1, the mechanical strength and punchability of the polyimide film thus produced were evaluated. The evaluation results are shown in Table 3.

【0026】[0026]

【表3】 [Table 3]

【0027】比較例 2 比較のため、実施例1と同様にして得たポリアミド酸重
合体の塗膜を支持枠に固定した。次いで、最高焼成温度
が550℃で、加熱時間がそれぞれ5分間、7分間、1
0分間の条件で加熱して脱水閉環(イミド化)させ、厚
み150μm、200μm、250μmの厚物ポリイミ
ドフィルムを得た。このようにして作製したポリイミド
フィルムの機械強度及び打ち抜き性の良否を実施例1と
同様にして評価した。その評価結果を表4に示す。
Comparative Example 2 For comparison, a coating film of the polyamic acid polymer obtained in the same manner as in Example 1 was fixed on a support frame. Then, the maximum firing temperature is 550 ° C., and the heating time is 5 minutes, 7 minutes, 1
By heating at the conditions of 0 minutes to cyclodehydration (imidization), to give a thickness 150 [mu] m, 200 [mu] m, the thickness thereof polyimide film 250 [mu] m. In the same manner as in Example 1, the mechanical strength and punchability of the polyimide film thus produced were evaluated. The evaluation results are shown in Table 4.

【0028】[0028]

【表4】 [Table 4]

【0029】比較例 3 比較のため、最高焼成温度が500℃で、加熱時間がそ
れぞれ1分間、2分間、3分間の条件で加熱して脱水閉
環(イミド化)させ、厚み50μm、75μm、及び1
25μmのポリイミドフィルムを作製し、市販の接着剤
を用いて50μmと125μm、及び75μmと125
μmのポリイミドフィルムを張り合わせた。このように
して作製した張り合わせポリイミドフィルムの機械強度
及び打ち抜き性の良否を実施例1と同様にして評価し
た。その評価結果を表5に示す。
Comparative Example 3 For comparison, dehydration ring closure (imidization) was carried out by heating at a maximum firing temperature of 500 ° C. for a heating time of 1 minute, 2 minutes, and 3 minutes, and thicknesses of 50 μm, 75 μm, and 1
A 25 μm polyimide film is prepared and 50 μm and 125 μm, and 75 μm and 125 are made by using a commercially available adhesive.
A μm polyimide film was laminated. The mechanical strength and punchability of the laminated polyimide film thus produced were evaluated in the same manner as in Example 1. The evaluation results are shown in Table 5.

【0030】[0030]

【表5】 [Table 5]

【0031】この表1〜表5より明らかなように、厚み
が125μmを越えるポリイミドフィルムを製造する場
合、最高焼成温度が450℃を越えるか、又は450℃
であっても加熱時間が5分未満であると、機械強度及び
打ち抜き性の悪いフィルムしか得られないが、焼成条件
を従来の条件よりも低温、長時間とすることにより、す
なわち、最高焼成温度が200〜450℃で加熱時間が
5〜10分間の条件で加熱することにより機械強度及び
打ち抜き性に優れたポリイミドフィルムが得られること
が分かる。また、従来の張り合わせポリイミドフィルム
は、機械強度には優れているが、打ち抜き後の端面に接
着剤層の割れ欠けが見られ、打ち抜き性に問題があるこ
とが分かる。
As is clear from Tables 1 to 5, when a polyimide film having a thickness of more than 125 μm is produced, the maximum firing temperature exceeds 450 ° C. or 450 ° C.
However, if the heating time is less than 5 minutes, only a film having poor mechanical strength and punchability can be obtained. However, by setting the firing conditions to be lower and longer than the conventional conditions, that is, the maximum firing temperature. It can be seen that a polyimide film excellent in mechanical strength and punching property can be obtained by heating at a temperature of 200 to 450 ° C. for a heating time of 5 to 10 minutes. Further, although the conventional laminated polyimide film is excellent in mechanical strength, cracks and cracks in the adhesive layer are observed on the end surface after punching, which shows that there is a problem in punching property.

【0032】[0032]

【発明の効果】以上のように本発明に係る新規なポリイ
ミドフィルムは、ポリアミド酸をイミド化させる際の焼
成条件を、最高焼成温度を200〜450℃とし、加熱
時間を5分以上とすることにより得られ、厚みが125
μm以上で、かつ引裂伝播抵抗が0.3g/μm以上の
優れた機械強度を示し、更に打ち抜き性にも優れたポリ
イミドフィルムを実現できる。すなわち、かかる新規な
ポリイミドフィルムは、機械強度、打ち抜き性の優れた
厚み125μm以上のポリイミドフィルムであり、ステ
ィフナーとして好適に使用することのできるポリイミド
フィルムを実現するものである。また、かかる新規なポ
リイミドフィルムを用いると、張り合わせ工程を省略す
ることができるのでFPCの製造工程を簡略化すること
ができ、1枚のポリイミドフィルムを用いているので接
着剤との剥がれによる打ち抜き後の端面の接着剤層の割
れ欠けが見られることもない。
As described above, in the novel polyimide film according to the present invention, the firing conditions for imidizing the polyamic acid are such that the maximum firing temperature is 200 to 450 ° C. and the heating time is 5 minutes or more. Obtained with a thickness of 125
A polyimide film having an excellent mechanical strength of not less than μm and a tear propagation resistance of not less than 0.3 g / μm and excellent punchability can be realized. That is, the novel polyimide film is a polyimide film having a thickness of 125 μm or more, which is excellent in mechanical strength and punchability, and realizes a polyimide film which can be suitably used as a stiffener. Further, when such a new polyimide film is used, the laminating step can be omitted, so that the manufacturing process of the FPC can be simplified, and since one polyimide film is used, it can be peeled off from the adhesive and then punched out. There is no visible cracking of the adhesive layer on the end face of the.

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】 厚みが125μm以上であり、かつ引裂
伝播抵抗が0.3g/μm以上であることを特徴とする
新規なポリイミドフィルム。
1. A novel polyimide film having a thickness of 125 μm or more and a tear propagation resistance of 0.3 g / μm or more.
【請求項2】 ポリアミド酸重合体溶液をフィルム状に
形成し、その後熱的及び/又は化学的にイミド化させて
得る厚みが125μm以上のポリイミドフィルムの製造
方法において、焼成条件が、最高焼成温度が200〜4
50℃で加熱時間が5分以上であることを特徴とする新
規なポリイミドフィルムの製造方法。
2. In a method for producing a polyimide film having a thickness of 125 μm or more obtained by forming a polyamic acid polymer solution into a film and then thermally and / or chemically imidizing the film, the firing conditions are the maximum firing temperature. Is 200-4
A novel method for producing a polyimide film, which comprises heating at 50 ° C. for 5 minutes or more.
JP20461194A 1994-08-05 1994-08-05 Novel polyimide film and manufacturing method thereof Pending JPH0848795A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP20461194A JPH0848795A (en) 1994-08-05 1994-08-05 Novel polyimide film and manufacturing method thereof

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP20461194A JPH0848795A (en) 1994-08-05 1994-08-05 Novel polyimide film and manufacturing method thereof

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2003387197A Division JP2004043831A (en) 2003-11-17 2003-11-17 Novel polyimide film and method for producing the same

Publications (1)

Publication Number Publication Date
JPH0848795A true JPH0848795A (en) 1996-02-20

Family

ID=16493345

Family Applications (1)

Application Number Title Priority Date Filing Date
JP20461194A Pending JPH0848795A (en) 1994-08-05 1994-08-05 Novel polyimide film and manufacturing method thereof

Country Status (1)

Country Link
JP (1) JPH0848795A (en)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002080623A (en) * 2000-09-06 2002-03-19 Du Pont Toray Co Ltd Polyimide film and its use
JP2002240063A (en) * 2001-02-20 2002-08-28 Kanegafuchi Chem Ind Co Ltd Polyimide belt and manufacturing method thereof
JP2002293932A (en) * 2001-03-30 2002-10-09 Kanegafuchi Chem Ind Co Ltd Method for producing polyimide film
JP2002322298A (en) * 2001-04-25 2002-11-08 Kanegafuchi Chem Ind Co Ltd Polyimide film and flexible printed circuit board using the polyimide film
JP2002355833A (en) * 2001-05-31 2002-12-10 Kanegafuchi Chem Ind Co Ltd Method for producing polyimide film
JP2002361663A (en) * 2001-06-07 2002-12-18 Kanegafuchi Chem Ind Co Ltd Polyimide film and method for producing polyimide film

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002080623A (en) * 2000-09-06 2002-03-19 Du Pont Toray Co Ltd Polyimide film and its use
JP2002240063A (en) * 2001-02-20 2002-08-28 Kanegafuchi Chem Ind Co Ltd Polyimide belt and manufacturing method thereof
JP2002293932A (en) * 2001-03-30 2002-10-09 Kanegafuchi Chem Ind Co Ltd Method for producing polyimide film
JP2002322298A (en) * 2001-04-25 2002-11-08 Kanegafuchi Chem Ind Co Ltd Polyimide film and flexible printed circuit board using the polyimide film
JP2002355833A (en) * 2001-05-31 2002-12-10 Kanegafuchi Chem Ind Co Ltd Method for producing polyimide film
JP2002361663A (en) * 2001-06-07 2002-12-18 Kanegafuchi Chem Ind Co Ltd Polyimide film and method for producing polyimide film

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