JPH0335932U - - Google Patents

Info

Publication number
JPH0335932U
JPH0335932U JP9597589U JP9597589U JPH0335932U JP H0335932 U JPH0335932 U JP H0335932U JP 9597589 U JP9597589 U JP 9597589U JP 9597589 U JP9597589 U JP 9597589U JP H0335932 U JPH0335932 U JP H0335932U
Authority
JP
Japan
Prior art keywords
wafer
transports
floats
large number
injection
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP9597589U
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP9597589U priority Critical patent/JPH0335932U/ja
Publication of JPH0335932U publication Critical patent/JPH0335932U/ja
Pending legal-status Critical Current

Links

Landscapes

  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)

Description

【図面の簡単な説明】[Brief explanation of the drawing]

第1図及び第2図は、この考案の一実施例を示
すウエーハ搬送装置の原理図、第3図は、従来の
ウエーハ搬送装置を説明する一部断面視側面図で
ある。 10……搬送路、11a,11b……噴射ノズ
ル、12a,12b……開閉バルブ、14,…
…14……センサ、A……ウエーハ。
1 and 2 are principle diagrams of a wafer transfer device showing an embodiment of this invention, and FIG. 3 is a partially sectional side view illustrating a conventional wafer transfer device. 10...Conveyance path, 11a, 11b...Injection nozzle, 12a, 12b...Opening/closing valve, 14 1 ,...
...14 4 ...Sensor, A...Wafer.

Claims (1)

【実用新案登録請求の範囲】 ウエーハ搬送路に沿つて多数配置した流体噴射
ノズルより流体を順次噴射させてウエーハを浮上
搬送する装置において、 ウエーハを正方向へ浮上搬送させる噴射ノズル
と、ウエーハを逆方向に浮上搬送させる噴射ノズ
ルとを、各々ウエーハ搬送路に沿つて多数設ける
とともに、 浮上させているウエーハの位置を検知して、正
逆いずれかの方向に沿つて浮上位置から前の噴射
ノズルのバルブを開成して、順次噴射させ、かつ
浮上位置から後の噴射ノズルのバルブを閉成させ
る信号を発生するセンサを複数個設けたことを特
徴とするウエーハ搬送位置。
[Claims for Utility Model Registration] In a device that floats and transports a wafer by sequentially jetting fluid from a large number of fluid jet nozzles arranged along a wafer transport path, there is a jet nozzle that floats and transports the wafer in the forward direction, and a jet nozzle that transports the wafer in the reverse direction. A large number of injection nozzles are installed along the wafer transfer path, and the position of the wafer being levitated is detected, and the injection nozzle from the previous injection nozzle moves from the floating position in either the forward or reverse direction. A wafer transfer position characterized in that a plurality of sensors are provided for generating signals for opening valves and sequentially injecting and closing valves of injection nozzles after the floating position.
JP9597589U 1989-08-16 1989-08-16 Pending JPH0335932U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9597589U JPH0335932U (en) 1989-08-16 1989-08-16

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9597589U JPH0335932U (en) 1989-08-16 1989-08-16

Publications (1)

Publication Number Publication Date
JPH0335932U true JPH0335932U (en) 1991-04-08

Family

ID=31645204

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9597589U Pending JPH0335932U (en) 1989-08-16 1989-08-16

Country Status (1)

Country Link
JP (1) JPH0335932U (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2014010862A (en) * 2012-06-29 2014-01-20 Fujitsu Ltd Library device

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2014010862A (en) * 2012-06-29 2014-01-20 Fujitsu Ltd Library device

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