JPH0336021A - High hard stamper and manufacture thereof - Google Patents

High hard stamper and manufacture thereof

Info

Publication number
JPH0336021A
JPH0336021A JP16981289A JP16981289A JPH0336021A JP H0336021 A JPH0336021 A JP H0336021A JP 16981289 A JP16981289 A JP 16981289A JP 16981289 A JP16981289 A JP 16981289A JP H0336021 A JPH0336021 A JP H0336021A
Authority
JP
Japan
Prior art keywords
stamper
thin film
hard thin
hardness
film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP16981289A
Other languages
Japanese (ja)
Inventor
Isao Oshima
大島 勲
Masayuki Muranaka
昌幸 村中
Hideo Tanide
谷出 秀雄
Toshiji Sakuma
利治 佐久間
Kazunori Sone
曽根 一紀
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP16981289A priority Critical patent/JPH0336021A/en
Publication of JPH0336021A publication Critical patent/JPH0336021A/en
Pending legal-status Critical Current

Links

Landscapes

  • Moulds For Moulding Plastics Or The Like (AREA)
  • Manufacturing Optical Record Carriers (AREA)

Abstract

PURPOSE:To make it possible to form a stamper having no warpage without adhering dusts to and impairing a signal face by a method wherein high hard thin film made of oxide ceramics, nitride ceramics and carbide ceramics or their complex compound of metal, the thermal expansion coefficient of which is nearly equal to that of the base of the stamper and the thermal conductivity of which is high, is formed on the signal face of the stamper and on its opposite face. CONSTITUTION:Since the requirements of high hard thin film 2 is to have thermal expansion coefficient, which is nearly equal to that of Ni constituting of the base 1 of a stamper, and high thermal conductivity, oxide ceramics, nitride ceramics and carbide ceramics or their complex compound of Al, Cr, Zr, Ta, W, Mg, Ti, Mn or Ni is used. The high hard thin film 2 having the thickness of several 100 - several 1,000Angstrom is foamed by spatter spraying or the like. In the following process, electrically conductive film is formed and, after that, Ni plating having the thickness of 0.2 - 0.5mm is formed. The formations of the high hard thin film and of the electrically conductive film are performed by vacuum film making method. Next, high hard thin film 3 having the same thickness is formed out of the same material by the same means as mentioned above. The base 1 of the stamper is so constructed as to be sandwiched in between high hard thin films 2 and 3.

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明は光ディスクの複製用の高硬度スタンパ及びその
製造方法に関する。
DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a high hardness stamper for duplicating optical discs and a method for manufacturing the same.

〔従来の技術〕[Conventional technology]

極めて多量の光ディスクを複製する場合は、その複製用
の型としてスタンパが用いられる。このスタンパは原盤
によって作られる。
When duplicating an extremely large amount of optical discs, a stamper is used as a mold for duplication. This stamper is made from a master disc.

原盤およびスタンパは、次に述べるような方法によって
作られるのが一般的である。
Master discs and stampers are generally made by the following method.

情報信号は、光信号方式璽たは機械方式により原盤に記
録される。情報信号に対応した小孔(ピット)が原盤に
多数作られる0次に原盤の表面上に数百二から数千kO
銀の被膜を形成する。これは次に行なわれる電気鍍金の
ために表面を導体化させるためのものである。この銀I
−t−陰極としてNiを電着させる。このNi層を剥離
して第1の型が完成する。
The information signal is recorded on the master disc using an optical signal method or a mechanical method. A large number of small holes (pits) corresponding to information signals are created on the master disc.The surface of the zero-order master disc has several hundred to several thousand kO.
Forms a silver coating. This is to make the surface conductive for the next electroplating. This silver I
- Electrodeposit Ni as a t-cathode. This Ni layer is peeled off to complete the first mold.

次に、重クロム故カリ溶液に浸漬する等VCよ、り剥離
処理(バッジベージ冒ン)がほどこされ、その表面側に
Ni電着が行なわれる。そして第1の型から剥離したも
のが第2の型である。この時第1の型の表面は銀であり
、第2の型の表面はNiでおる。
Next, a peeling process (badge-bazing process) is performed using VC, such as dipping in a dichromium late potash solution, and Ni electrodeposition is performed on the surface side. The second mold is then peeled off from the first mold. At this time, the surface of the first mold is coated with silver, and the surface of the second mold is coated with Ni.

次に、前記と同様に第2の型に剥離処理をほどこし、そ
の表面にNiを電着させて、第2の型より剥離すること
によって最終の複製金型であるスタンバが完成する。こ
のようにして作られたスタンバを耐傷性の優れた長寿命
なものにするために従来から色々と工夫がされている。
Next, the second mold is subjected to a peeling treatment in the same manner as described above, Ni is electrodeposited on its surface, and the mold is peeled off from the second mold to complete a stand bar, which is the final replica mold. Various efforts have been made in the past to make standbars made in this way have excellent scratch resistance and a long life.

例えば、特開昭58−158057号公報にはスタンバ
の表面がkt或はOrの窒化EAを用いて強化されたも
のが開示され、特開昭57−64308号公報には、N
iスタンバの表面に、イオンブレーティング法により1
第四篇または第五属の元素の窒化物、炭化物資たは酸化
物もしくは、その複合物を被着腹として形成するものが
開示されている。
For example, Japanese Patent Laid-Open No. 58-158057 discloses a standby whose surface is reinforced using kt or Or nitrided EA, and Japanese Patent Laid-Open No. 57-64308 discloses
1 on the surface of the i-stander using the ion blating method.
Part 4 or 5 discloses a material in which a nitride, carbide, or oxide of an element in Group 5, or a composite thereof is formed as an adhesion material.

〔発明が解決しようとする課題〕[Problem to be solved by the invention]

しかし、特開昭58−158057号公報に開示されて
いる技術については、工程が長い欠点があう、特開昭5
7−64508号公報に開示されている技術にかいては
、工程数はあまシ増えないが、Niスタ/バの形状がで
きてから、硬度の硬い膜を真空成膜するので、信号面に
ごみを付けたう、傷を付けたシする機会が多くなるので
問題であった。又% Ni母材に対し異質の膜を付ける
為、熱膨張係数に起因する熱応力や、成膜時の応力で、
スタンバが反る等の問題があった。
However, the technique disclosed in Japanese Patent Application Laid-Open No. 58-158057 has the drawback that the process is long.
The technology disclosed in Japanese Patent No. 7-64508 does not significantly increase the number of steps, but after the shape of the Ni star/bar is formed, a hard film is vacuum-deposited on the signal surface. This was a problem because it increased the chances of getting dirt or scratches on it. Also, since a different type of film is applied to the Ni base material, thermal stress caused by the coefficient of thermal expansion and stress during film formation may cause
There were problems such as the stand bar warping.

本発明の目的は、工程を長くせずに、信号面にごみや傷
を付けることなく、シかも反シのないスタンバを得るこ
とにある。さらにこのスタンバの製造方法を提供するこ
とにある。
An object of the present invention is to obtain a standby without prolonging the process, without causing dust or scratches on the signal surface, and without causing scratches or scratches. A further object of the present invention is to provide a method for manufacturing this stanbar.

〔課題を解決するための手段〕[Means to solve the problem]

本発明の高硬度スタンバは、スタンバの信号面及びその
反対の面にスタンバ基体と熱膨張係数が近い熱伝導率が
高い金属の酸化物、窒化物、炭化物のセラミックまたは
これらの複化合物よυなる高硬度薄膜を形成したもので
ある。
The high-hardness stubber of the present invention is made of a metal oxide, nitride, or carbide ceramic, or a composite compound thereof, which has a high thermal conductivity and has a coefficient of thermal expansion close to that of the stanbar base on the signal surface and the opposite surface of the stanbar. A highly hard thin film is formed.

そして、金属はAt、 Cr、  Zr、  ’l’a
、WlMg、Ti、Mn% Niである場合に効果的で
ある。
And the metals are At, Cr, Zr, 'l'a
, WlMg, Ti, Mn% Ni.

また、高d度薄膜の纒さを数百へから数千人とすること
が効果的である。
Further, it is effective to increase the degree of twisting of the high-d degree thin film from several hundred to several thousand.

本発明の高硬度スタンバの製造方法は、ガラスのlIA
盤の上にレーザビームで感光し現像されたフォトレジス
トを形成する第1工程と、前記フォトレジストの上に金
属の酸化物、窒化物または炭化物の高硬度薄膜を形成す
る第2工程と、この第2工程の次に導電膜及びNi#1
金を形成する第5工檜と、この第5工程の次にスタンバ
の裏面に金属の酸化物、値化物または炭化物の高硬度薄
膜を形成する第4工程と、この第4工程の次に前記ガラ
スの原盤からスタンバを剥がす第5工程から構成されて
いる。
The method for producing a high hardness standber of the present invention is to
A first step of forming a photoresist exposed and developed with a laser beam on a disk, a second step of forming a highly hard thin film of metal oxide, nitride or carbide on the photoresist; After the second step, conductive film and Ni#1
A fifth step of forming gold, a fourth step of forming a highly hard thin film of a metal oxide, value compound, or carbide on the back side of the standber after this fifth step, and a fourth step of forming a highly hard thin film of metal oxide, value compound, or carbide on the back side of the standber; It consists of a fifth step of peeling off the stand bar from the glass master.

そして、高硬度薄膜および導電膜は、真!2戒膜法で行
うことが効果的である。
And high hardness thin films and conductive films are true! It is effective to use the 2 precepts membrane method.

〔作用〕[Effect]

凹凸記録された原盤に、最終的にスタンバの4’f1号
面を形成する高硬度材料を形成してから、導電膜及びN
i鍍金を施こすので、Niスメンパ剥離後に高硬度薄膜
を形成するのに比べて、信号面が汚れたう、傷付いたシ
する機会が少ない。
After forming a high-hardness material that will ultimately form the 4'f1 surface of the standby on the master disc on which the unevenness has been recorded, a conductive film and N
Since i-plating is applied, there is less chance of the signal surface becoming dirty or scratched compared to forming a highly hard thin film after removing the Ni smen.

また、Niスタンバの裏面に信号面と同じ材料が形成さ
れるので、Niスメンバの反り量を小さくできる。更に
レプリカ成形の金型に取付ける場合、裏面に挾み込まれ
る多少の異物が、スタンバ1に変形し、信号面に与える
影響をこの高硬度膜がやわらげる役目をする。
Furthermore, since the same material as the signal surface is formed on the back surface of the Ni standber, the amount of warpage of the Ni space member can be reduced. Furthermore, when attaching to a mold for replica molding, this high hardness film serves to soften the effect that some foreign matter that gets caught on the back side deforms into the stand bar 1 and has on the signal surface.

〔実施例〕〔Example〕

以下、本発明の実施例1に図面を用いて説明する。 Embodiment 1 of the present invention will be described below with reference to the drawings.

第1図は本発明の一実施例を示すモデル化した断面図で
、第25!3はそof1m造方法の工程を示す断面図で
ある。
FIG. 1 is a modeled sectional view showing one embodiment of the present invention, and 25th to 3rd are sectional views showing the steps of the 1-m manufacturing method.

1はN上等のスタンパ基体、2は信号面側に形成した高
硬度薄膜、3は裏面に形成した高硬度薄膜を示す、4は
スタンパの信号ビットを示す。
1 is a stamper base such as N, 2 is a high hardness thin film formed on the signal side, 3 is a high hardness thin film formed on the back side, and 4 is a signal bit of the stamper.

高硬度薄膜2としてはAz+Crt Zr+Ta+W等
の金属酸化物、窒化物、炭化物等のセラミック材料がよ
い。
As the highly hard thin film 2, ceramic materials such as metal oxides such as Az+Crt Zr+Ta+W, nitrides, and carbides are preferable.

なお、高硬度薄膜2は、スタンパ基体1を構成するNi
と熱膨張係数が近いこと及び熱伝導率が高いことが要求
されるので、AtI Cr I Zr ITa*Wの他
にMglTilMn+ Niの酸化物、窒化物、炭化物
そのセラミック材又はこれらの複化合物も用いることが
できる。
Note that the high hardness thin film 2 is made of Ni that constitutes the stamper base 1.
In addition to AtI Cr I Zr ITa*W, MglTilMn+Ni oxides, nitrides, carbides, ceramic materials, or composite compounds thereof are also used. be able to.

これらの高硬度薄膜2i2はイオンブレーティングやス
パッタリング等の方法で数100〜数100OAの厚さ
に緻密に形成される。
These highly hard thin films 2i2 are densely formed to a thickness of several 100 to several 100 OA by a method such as ion blasting or sputtering.

スタンパはプラスチックモールドの原盤として使われ、
数千回、数万回使われるうちビット4に相当する部分が
摩耗したシ傷付いたうする。スタンパの耐傷性はその硬
度に依存するので本実施例の様に表面に硬度の硬い層を
設けることは有効である。特にスパッタリングではビッ
トの凹凸に対してもjRb込みのよい膜形成ができるの
で適した方法である。
Stampers are used as masters for plastic molds.
After being used thousands or tens of thousands of times, the part corresponding to bit 4 has become worn and scratched. Since the scratch resistance of the stamper depends on its hardness, it is effective to provide a hard layer on the surface as in this embodiment. In particular, sputtering is a suitable method because it can form a film with good jRb content even on the unevenness of the bit.

次に$2図に沿って本発明の一実施例である製造方法に
ついて述べる。第2図(1)は、ガラス等の原盤5の上
にレーザビーム等で感光し、現像されたフォトレジスト
6が形成された状態を示す。
Next, a manufacturing method which is an embodiment of the present invention will be described along with the $2 diagram. FIG. 2(1) shows a state in which a photoresist 6 is formed on a master disk 5 made of glass or the like, which is exposed to a laser beam or the like and developed.

7は信号のビットを示す、従来方法ではこの後導電膜を
形成し、Ni鍍金する工程に移るが、本実施例では(2
)工程で先に述べた材料の高硬度薄膜2を数100〜数
100OAの厚さにスパッタリング等の方法で形成する
0次の(3)工程では導電膜を形成(図中では省略)し
引続いてNi鍍金を、(12〜(L5ma+形成する。
Reference numeral 7 indicates a signal bit. In the conventional method, a conductive film is then formed and the process moves to Ni plating, but in this embodiment, (2
) step, the highly hard thin film 2 of the above-mentioned material is formed to a thickness of several 100 to several 100 OA by a method such as sputtering.In the 0th step (3) step, a conductive film is formed (not shown in the figure) and pulled. Subsequently, Ni plating is formed (12 to (L5ma+).

高硬度薄膜の形成と導電膜の形成は真空成膜法で行なわ
れる。スタンパの厚さを均一にする為に必要に応じて裏
面研摩が施こされる0次K(4)工程では(2)工程と
同じ材料、同じ手段で高硬度薄膜5がほぼ同じ厚さに形
成される。(5)工程では(ガラス)原盤5から剥され
た本実施例のスタンパを示す、スタンパ基体1は高硬度
薄膜2と5で、サンドイッチ状に挾1れた構造になる。
The formation of the highly hard thin film and the conductive film are performed by a vacuum film forming method. In the zero-order K (4) process, in which backside polishing is performed as necessary to make the thickness of the stamper uniform, the high hardness thin film 5 is made to almost the same thickness using the same material and the same method as in the (2) process. It is formed. In the step (5), the stamper of this example is peeled off from the (glass) master 5, and the stamper base 1 has a structure in which the highly hard thin films 2 and 5 are sandwiched together.

本実施例によれば、高硬度薄膜の熱膨張係数がスタンパ
基体1のそれと多少異なっても反ったbする事がなく、
又同じ形成法でつけた膜であるため膜にため込む応力も
ほぼ同程度とみなせるので反りの少ない多層構造のスタ
ンパができる。
According to this embodiment, even if the coefficient of thermal expansion of the high hardness thin film is slightly different from that of the stamper base 1, the film will not warp.
Furthermore, since the films are formed using the same method, the stress accumulated in the films can be considered to be approximately the same, resulting in a multilayered stamper with less warpage.

又表面の高硬度膜の形成は、膜応力が少なく、薄膜の熱
膨張係数が、スタンパ基板1のそれに近い時にははぶ〈
事もできる。
In addition, the formation of a highly hard film on the surface is facilitated when the film stress is small and the coefficient of thermal expansion of the thin film is close to that of the stamper substrate 1.
I can do things.

又高硬度薄膜の形成と導電膜の形成は真空成膜法で行な
われるので、連続成形できるので、ゴミ付き、又は傷付
きの機会が少なくて済む利点がある。
Furthermore, since the formation of the highly hard thin film and the formation of the conductive film are carried out by a vacuum film forming method, continuous molding can be performed, which has the advantage of reducing the chances of dust or scratches.

〔発明の効果〕〔Effect of the invention〕

本発明の高硬度薄膜が、表・裏にサンドイッチ上に形J
i!された構造によりスタンパの反シの少ない、耐傷性
の着しく向上したものにする事ができた。又、高硬度薄
膜2成を導電膜形成の前に屯りてくる事によυ、ゴミ付
き、傷付きの少ない製造工程とする事ができた。
The high hardness thin film of the present invention is placed on the sandwich on the front and back sides.
i! With this structure, we were able to create a stamper with less scratching and significantly improved scratch resistance. Furthermore, by depositing the second high-hardness thin film before forming the conductive film, a manufacturing process with less dust and scratches can be achieved.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は本発明の一実施例を示すスタンパの断面図、第
2図は本発明のスタンパ製造方法の工程を示す断面図で
ある。 1・・・・・・スタンパ基体、2・・・・・・高硬度薄
膜(表面)5・・・・・・高硬度薄膜2(裏面)、4・
・・・・・スタンパの信号ビット、5・・・・・・ガラ
ス原盤、6・・・・・・フォトレジスト、7・・・・・
・原盤の信号ビット。
FIG. 1 is a cross-sectional view of a stamper showing an embodiment of the present invention, and FIG. 2 is a cross-sectional view showing the steps of the stamper manufacturing method of the present invention. 1... Stamper base, 2... High hardness thin film (front side) 5... High hardness thin film 2 (back side), 4.
... Stamper signal bit, 5 ... Glass master, 6 ... Photoresist, 7 ...
・Master signal bit.

Claims (1)

【特許請求の範囲】 1、スタンパの信号面及びその反対の面にスタンパ基体
と熱膨張係数が近い熱伝導率が高い金属の酸化物、窒化
物、炭化物のセラミックまたはこれらの複化合物よりな
る高硬度薄膜を形成したことを特徴とする高硬度スタン
パ。 2、前記金属Al、Cr、Zr、Ta、W、Mg、Ti
、Mn、Niである請求項1記載の高硬度スタンパ。 3、前記高硬度薄膜の厚さを数百Åから数千Åとした請
求項1記載または請求項2記載の高硬度スタンパ。 4、ガラスの原盤の上にレーザビームで感光し現像され
たフォトレジストを形成する第1工程と、前記フォトレ
ジストの上に金属の酸化物、窒化物または炭化物の高硬
度薄膜を形成する第2工程と、この第2工程の次に導電
膜及びNi鍍金を形成する第3工程と、この第3工程の
次にスタンパの裏面に金属の酸化物、窒化物または炭化
物の高硬度薄膜を形成する第4工程と、この第4工程の
次に前記ガラスの原盤からスタンパを剥がす第5工程か
らなる高硬度スタンパの製造方法。 5、前記高硬度薄膜及び導電膜は真空成膜法で行う請求
項1記載の高硬度スタンパの製造方法。
[Claims] 1. The stamper signal surface and its opposite surface are made of a metal oxide, nitride, or carbide ceramic or a composite compound thereof, which has a high thermal conductivity and has a coefficient of thermal expansion close to that of the stamper base. A high-hardness stamper characterized by forming a hard thin film. 2. The metals Al, Cr, Zr, Ta, W, Mg, Ti
, Mn, and Ni. The high-hardness stamper according to claim 1. 3. The high-hardness stamper according to claim 1 or 2, wherein the high-hardness thin film has a thickness of several hundred Å to several thousand Å. 4. A first step of forming a photoresist exposed and developed by a laser beam on a glass master disk, and a second step of forming a highly hard thin film of metal oxide, nitride, or carbide on the photoresist. After this second step, there is a third step of forming a conductive film and Ni plating, and after this third step, a highly hard thin film of metal oxide, nitride, or carbide is formed on the back surface of the stamper. A method for manufacturing a high-hardness stamper, comprising a fourth step and a fifth step of peeling off the stamper from the glass master after the fourth step. 5. The method for manufacturing a high-hardness stamper according to claim 1, wherein the high-hardness thin film and the conductive film are formed by a vacuum film forming method.
JP16981289A 1989-07-03 1989-07-03 High hard stamper and manufacture thereof Pending JPH0336021A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP16981289A JPH0336021A (en) 1989-07-03 1989-07-03 High hard stamper and manufacture thereof

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16981289A JPH0336021A (en) 1989-07-03 1989-07-03 High hard stamper and manufacture thereof

Publications (1)

Publication Number Publication Date
JPH0336021A true JPH0336021A (en) 1991-02-15

Family

ID=15893358

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16981289A Pending JPH0336021A (en) 1989-07-03 1989-07-03 High hard stamper and manufacture thereof

Country Status (1)

Country Link
JP (1) JPH0336021A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5385638A (en) * 1990-11-28 1995-01-31 Sharp Kabushiki Kaisha Method of manufacturing a stamper
JP2002339338A (en) * 2001-05-15 2002-11-27 Landcreate Kenkyusho:Kk Descending material capture structure
JP2003300227A (en) * 2002-04-08 2003-10-21 Seikoh Giken Co Ltd Disk molding die
US20090211912A1 (en) * 2004-12-03 2009-08-27 Sharp Kabushiki Kaisha Antireflective member, optical element, display device, method of making stamper and method of making antireflective member using the stamper

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5385638A (en) * 1990-11-28 1995-01-31 Sharp Kabushiki Kaisha Method of manufacturing a stamper
JP2002339338A (en) * 2001-05-15 2002-11-27 Landcreate Kenkyusho:Kk Descending material capture structure
JP2003300227A (en) * 2002-04-08 2003-10-21 Seikoh Giken Co Ltd Disk molding die
US20090211912A1 (en) * 2004-12-03 2009-08-27 Sharp Kabushiki Kaisha Antireflective member, optical element, display device, method of making stamper and method of making antireflective member using the stamper
US8431004B2 (en) * 2004-12-03 2013-04-30 Sharp Kabushiki Kaisha Antireflective member, optical element, display device, method of making stamper and method of making antireflective member using the stamper
US9429686B2 (en) 2004-12-03 2016-08-30 Sharp Kabushiki Kaisha Antireflective member, optical element, display device, method of making stamper and method of making antireflective member using the stamper

Similar Documents

Publication Publication Date Title
JPS62122714A (en) Duplicate mold for precision molding
US7632628B2 (en) Stamper and method for production thereof
JPS59193560A (en) Stamper for rotary recording medium and its manufacture
JP3421440B2 (en) Reproduction method of stamper for disk molding
JPS6262450A (en) Manufacture of stamper
US3417389A (en) Magnetic record medium
JPS61221392A (en) Stamper
JPS63107518A (en) Manufacturing method of replica mold for precision molding
JP2526980B2 (en) Manufacturing method for optical disk stamper
JP2792186B2 (en) Manufacturing method of optical recording medium
JP2815153B2 (en) Stamper
JPS6028048A (en) Master stamper manufacturing method
JPS6185649A (en) Production of stamper
JPH03291392A (en) Method for electroforming electroformed master disk and electroformed master disk
JPH04139632A (en) Production of stamper for forming information recording medium
JPH0250995A (en) Method for manufacturing a stamper for optical disk duplication
JPH0312840A (en) Production of optical recording medium
JPS61284843A (en) Manufacture of stamper for rorming optical disk
JPS60167143A (en) Production for optical disc forming stamper
JPS63131350A (en) Master disk for information recording medium
JP2770597B2 (en) Method for manufacturing master stamper and optical disk master container
JPH02303820A (en) Duplication of stamper
JPS62214532A (en) Production of stamper
JPS60138088A (en) Manufacture of information recording die
JPH07106539B2 (en) Stamper-polishing method