JPH0337334Y2 - - Google Patents
Info
- Publication number
- JPH0337334Y2 JPH0337334Y2 JP14469485U JP14469485U JPH0337334Y2 JP H0337334 Y2 JPH0337334 Y2 JP H0337334Y2 JP 14469485 U JP14469485 U JP 14469485U JP 14469485 U JP14469485 U JP 14469485U JP H0337334 Y2 JPH0337334 Y2 JP H0337334Y2
- Authority
- JP
- Japan
- Prior art keywords
- free access
- clean room
- access panel
- floor
- processing liquid
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000001514 detection method Methods 0.000 claims description 20
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 11
- 239000007788 liquid Substances 0.000 description 16
- 239000004065 semiconductor Substances 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 2
- 230000002411 adverse Effects 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 230000003749 cleanliness Effects 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 230000002542 deteriorative effect Effects 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 238000012544 monitoring process Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
Landscapes
- Floor Finish (AREA)
- Investigating Or Analyzing Materials By The Use Of Electric Means (AREA)
- Examining Or Testing Airtightness (AREA)
Description
【考案の詳細な説明】
産業上の利用分野
本考案は高清浄度を要求される作業環境、例え
ばLSIや超LSIの半導体製造のために利用されて
いるダウンフロー式クリーンルームにおいてその
揚床を構成するフリーアクセスパネルの改良に関
する。[Detailed description of the invention] Industrial application field This invention constitutes a raised floor in a work environment that requires high cleanliness, such as a downflow clean room used for manufacturing LSI and VLSI semiconductors. Regarding improvements to the free access panel.
従来の技術
上記クリーンルームは天井にHEPAフイルタ
を設ける一方、床を揚床で、かつエヤー流を通過
するグレーテイング等で構成し、フアンでクリー
ンルームからクリーンルーム外の通路を通つて空
気を強制的に循環させることによりクリーンルー
ム内に垂直方向に層流状態のエヤー流を流す、い
わゆるダウンフロー構造にしてある。Conventional technology The above clean room is equipped with a HEPA filter on the ceiling, has a raised floor, and has a grating that allows air to pass through, and uses fans to forcefully circulate air from the clean room through a passage outside the clean room. This allows a laminar air flow to flow vertically within the clean room, creating a so-called downflow structure.
前記床面は現在、縦横寸法が40〜60cm程度の格
子状をしたフリーアクセスパネルを多数個隙間な
く敷きつめることによつて構成されている。この
ように多数のフリーアクセスパネルを用いて床を
構成するのは、クリーンルーム内の半導体製造用
各設備のレイアウトの変更があつたとき、床面の
大きさ、形状等もレイアウトの変更に対応して速
やかに変更できるようにするためである。 Currently, the floor surface is constructed by laying a large number of grid-shaped free access panels with length and width dimensions of approximately 40 to 60 cm without gaps. The reason why the floor is constructed using a large number of free access panels in this way is that when the layout of semiconductor manufacturing equipment in the clean room is changed, the size and shape of the floor surface can also be adjusted to accommodate changes in the layout. This is so that changes can be made quickly.
考案が解決しようとする問題点
ところで、クリーンルーム内で製造する半導体
の集積度が高まるのに比例してクリーンルーム内
の空気の清浄化がより一層要求され、その一環と
して作業者の出入りによつて汚染物質が外部から
持込まれることのないよう、クリーンルーム内を
無人化することが行われつつある。然して、クリ
ーンルーム内を無人化した場合、次のような問題
がある。即ち、クリーンルーム内に配置される処
理装置によつて所定の処理(清浄、エツチング
等)を行つている場合に処理液が洩れることがあ
るが、クリーンルーム内にオペレータがいないと
処理液の洩れがわからず、そのため洩れた処理液
が蒸発したり床等の構成材料と反応してクリーン
ルーム内の雰囲気を悪化したり、床を腐蝕したり
するといつた問題がある。Problems that the invention aims to solve By the way, as the degree of integration of semiconductors manufactured in clean rooms increases, the air in clean rooms is required to be purified even more, and as part of this, it is necessary to eliminate contamination due to the coming and going of workers. Clean rooms are increasingly being unmanned to prevent substances from being brought in from outside. However, when a clean room is left unmanned, the following problems arise. In other words, when processing equipment installed in a clean room performs a specified process (cleaning, etching, etc.), the processing liquid may leak, but if there is no operator in the clean room, the leakage of the processing liquid cannot be detected. First, there are problems in that the leaked processing liquid evaporates or reacts with constituent materials such as the floor, deteriorating the atmosphere within the clean room and corroding the floor.
問題点を解決するための手段
本考案は、クリーンルームの床面を構成するフ
リーアクセスパネルを改良することによつて、ク
リーンルーム内の無人化を図つた場合の処理液の
洩れを検出できるようにして、上記問題点の解決
を図ろうとするものである。Means for Solving the Problems The present invention improves the free access panel that makes up the floor of the clean room so that leaks of processing liquid can be detected when the clean room is unmanned. , which attempts to solve the above problems.
即ち、本考案のフリーアクセスパネルは洩れ検
知線を具備していることを特徴としている。 That is, the free access panel of the present invention is characterized by being equipped with a leakage detection line.
作 用
半導体製造のための各処理装置は、通常クリー
ンルームの床上に設置される。従つて処理装置か
ら洩れた処理液は必ずフリーアクセスパネル上に
落ちる。而して、該パネルには漏水検知線が設け
てあるので、処理液によつてクリーンルーム内の
雰囲気が悪化したり、床が腐蝕したりする前に処
理液の漏れを検出でき、速やかな対応が可能とな
る。Function Processing equipment for semiconductor manufacturing is usually installed on the floor of a clean room. Therefore, the processing liquid leaking from the processing device always falls onto the free access panel. Since the panel is equipped with a water leakage detection line, it is possible to detect a leakage of the processing solution before the processing solution worsens the atmosphere in the clean room or corrodes the floor, allowing prompt response. becomes possible.
実施例
第2図に本考案のフリーアクセスパネルが適用
されるクリーンルームの全体図を示す。クリーン
ルームの天井にはHEPA(High Efficiency
Particurate Airの略)フイルタ1が設けられ、
床2は揚床でエヤー流を通すように構成さてい
る。この床2の下方空間とHEPAフイルタ1の
上方空間とはフアン3,3を有する通路4によつ
て連通されていて、フアン3,3によつて空気が
クリーンルーム内をと通路4とを循環するように
してある。クリーンルーム内はHEPAフイルタ
1によつて清浄度の高い空気が矢印で示すように
垂直下方に層流状態で流れる。図中、5はクリー
ンルーム内に設置された処理装置である。Embodiment FIG. 2 shows an overall view of a clean room to which the free access panel of the present invention is applied. The ceiling of the clean room is equipped with HEPA (High Efficiency
Abbreviation for Particulate Air) filter 1 is provided,
The bed 2 is a raised bed and is configured to pass an air flow. The space below the floor 2 and the space above the HEPA filter 1 are communicated by a passage 4 having fans 3, 3, which circulate air within the clean room and through the passage 4. It's like this. Inside the clean room, highly clean air flows vertically downward in a laminar flow state as shown by the arrow by the HEPA filter 1. In the figure, 5 is a processing device installed in a clean room.
前記床2は第3図に示すように多数のフリーア
クセスパネル21…を隙間なく敷きつめることに
よつて構成されている。各フリーアクセスパネル
は梁22…の上にセツトすることにより揚床構造
とされている。 As shown in FIG. 3, the floor 2 is constructed by laying a large number of free access panels 21 without gaps. Each free access panel is set on beams 22 to form a raised floor structure.
フリーアクセスパネル21には縦横40〜60cm程
度の方形状をし、上下方向にエヤーを流通できる
よう多数の孔があいたパンチングメタル又はグレ
ーテイングで構成されている。そして、本考案に
あつてはこのパンチングメタル又はグレーテイン
グの裏面に第1図に示すように漏水検知線23,
24を蛇行状態で配線している。漏水検知線2
3,24としては抵抗線を用い、それを2本近接
して設けている。フリーアクセスパネル21の対
抗する2辺の略々中央には接続端子25…が下方
に向けて設けてあり、その接続端子25…に漏水
検知線23,24の両端が接続されている。従つ
て、フリーアクセスパネル21…を敷きつめて床
2を構成する際に、隣合うフリーアクセスパネル
21…の接続端子25同士を第4図に示すように
わたり線26によつて接続すれば、各フリーアク
セスパネルの漏水検知線23,24を夫々直列に
接続することができる。 The free access panel 21 has a rectangular shape of about 40 to 60 cm in length and width, and is made of punched metal or grating with a large number of holes to allow air to flow in the vertical direction. In the case of the present invention, a water leakage detection line 23, as shown in FIG.
24 is wired in a meandering manner. Water leak detection line 2
Resistance wires are used as 3 and 24, and two of them are provided close to each other. Connection terminals 25 are provided facing downward approximately in the center of two opposing sides of the free access panel 21, and both ends of water leakage detection lines 23 and 24 are connected to the connection terminals 25. Therefore, when constructing the floor 2 by laying the free access panels 21..., if the connecting terminals 25 of the adjacent free access panels 21... are connected by the wires 26 as shown in FIG. The water leak detection lines 23 and 24 of the access panel can be connected in series, respectively.
このように各パネルの漏水検知線23…,24
…を夫々直列に接続すれば、漏水検知線23,2
4の一端から両検知線23と24の間の抵抗値を
監視することにより、処理液の洩れの発生と処理
液に浸されているフリーアクセスパネルの特定と
を行うことができる。即ち、処理液の洩れが生じ
ると、2本の検知線23,24の間が狭いために
両検知線が処理液によつてシヨートするので、2
本の検知線23,24の間の抵抗値が有限の値に
転じ、処理液の洩れの発生を知ることができる
し、各フリーアクセスパネルの漏水検知線の抵抗
値が既知であるので、処理液の洩れが起こつたと
きの2本の検知線23,24の間の抵抗値の大き
さから測定点から処理液の洩れが生じている点ま
でのフリーアクセスパネルの数が算出でき、これ
によつて処理液の洩れが生じているフリーアクセ
スパネルを特定することができる。尚、フリーア
クセスパネルの漏水検知線を直列に接続するのは
本考案の使用例の一つであり、各フリーアクセス
パネルの洩れ検知線を並列に接続しても処理液の
洩れの発生を知ることができる。また、検知線2
3,24は抵抗線でなくても単なる導線でもかま
わない。 In this way, the water leakage detection lines 23..., 24 of each panel
If connected in series, the water leakage detection wires 23, 2
By monitoring the resistance value between both detection lines 23 and 24 from one end of 4, it is possible to identify the occurrence of a leakage of the processing liquid and the free access panel immersed in the processing liquid. That is, when a leak of the processing liquid occurs, the distance between the two detection lines 23 and 24 is narrow and both detection lines are shot by the processing liquid.
The resistance value between the detection wires 23 and 24 of the book changes to a finite value, and it is possible to know the occurrence of a leakage of the processing liquid, and since the resistance value of the water leakage detection wire of each free access panel is known, the From the magnitude of the resistance value between the two detection lines 23 and 24 when a liquid leak occurs, the number of free access panels from the measurement point to the point where the processing liquid is leaking can be calculated. Therefore, the free access panel from which the processing liquid is leaking can be identified. Note that connecting the leakage detection wires of the free access panels in series is one example of the use of this invention; even if the leakage detection wires of each free access panel are connected in parallel, it is possible to detect the occurrence of a leak of the processing liquid. be able to. In addition, the detection line 2
3 and 24 may not be resistance wires but may be simple conductive wires.
考案の効果
本考案に係るフリーアクセスパネルは以上の如
く構成したので、無人化されたクリーンルーム内
での処理液の洩れを速やかに発見でき、早急にそ
の対策を講じることができ、従つて、処理液の洩
れに起因したクリーンルーム内の雰囲気の悪化や
パネルの腐蝕といつた弊害を効果的に防止するこ
とができる。Effects of the invention Since the free access panel according to the invention is configured as described above, leakage of processing liquid in an unmanned clean room can be quickly discovered and countermeasures can be taken immediately. It is possible to effectively prevent adverse effects such as deterioration of the atmosphere in the clean room and corrosion of panels due to liquid leakage.
第1図は本考案の一実施例を示すフリーアクセ
スパネルの斜視図、第2図はダウンフロー式クリ
ーンルームを示す図、第3図はクリーンルームの
床面を示す斜視図、第4図は各フリーアクセスパ
ネルの漏水検知線の接続状態を示す図である。
21…フリーアクセスパネル、23,24…漏
水検知線。
Fig. 1 is a perspective view of a free access panel showing an embodiment of the present invention, Fig. 2 is a view showing a downflow type clean room, Fig. 3 is a perspective view showing the floor of the clean room, and Fig. 4 is a perspective view of each free access panel. It is a figure showing the connection state of the water leak detection line of an access panel. 21...Free access panel, 23, 24...Water leakage detection line.
Claims (1)
リーアクセスパネル。 A free access panel characterized by being equipped with a water leakage detection line.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14469485U JPH0337334Y2 (en) | 1985-09-21 | 1985-09-21 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14469485U JPH0337334Y2 (en) | 1985-09-21 | 1985-09-21 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6252633U JPS6252633U (en) | 1987-04-01 |
| JPH0337334Y2 true JPH0337334Y2 (en) | 1991-08-07 |
Family
ID=31055535
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP14469485U Expired JPH0337334Y2 (en) | 1985-09-21 | 1985-09-21 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0337334Y2 (en) |
-
1985
- 1985-09-21 JP JP14469485U patent/JPH0337334Y2/ja not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6252633U (en) | 1987-04-01 |
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