JPH0338036A - Cleaning equipment - Google Patents

Abstract

PURPOSE:To prevent the charge on brush material and an object to be washed and simplify washing process, by constituting a brush used at the time of scrubbing and cleaning of conductive material, and grounding the brush. CONSTITUTION:As to a brush 20, conductive material, e.g. acrylic rayon and the like containing carbon is used as brush material 21. The brush 20 is connected to a grounded electrode 3 via the conductive material. When foreign matter is eliminated by directly bringing the brush 20 into contact with the surface of a wafer 1, electric charge generated in the process like this is eliminated through the conductive material used as the brush material 21. Thereby electric charge concentration on the brush material 21 and the wafer 1 are not caused, and the electric charge generated at the time of removal of foreign matter and scrubbing in the cleaning process or in the pretreatment process can be eliminated.

Description

DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a cleaning device whose entire purpose is to remove foreign matter in a wafer manufacturing process.

[Prior art] As a cleaning device in the conventional wafer process, the third
An example is a scrub cleaning device as shown in the figure.

In FIG. 3, numeral 1 is an object to be cleaned, for example, a cleaning agent, and numeral 2 is a brush that is used to clean the wafer 1 during scrubbing. In addition, this brush 2 has both ends.
It is located on the entire central part of the sea urchin shown in Figure 4, and the materials used for it include, for example, rayon, acrylic, or nylon.

Next, the operation will be explained.

In the wafer manufacturing process, foreign matter adhering to the wafer surface induces pattern defects and characteristic deterioration, leading to a decrease in yield. reduce them.

In order to prevent this, it is necessary to perform wet cleaning with acid, etc., and scrub cleaning using a plan.

Traditionally, in scrub cleaning, acrylic, rayon, or nylon was used as the brush material directly.
A brush 2 made of this brush material was brought into contact with the surface of a wafer as shown in FIG. 4 to remove foreign matter. In addition, in order to make the wafer surface hydrophilic to increase the removal effect and to suppress the generation of static electricity, CO2 bubbling to lower the specific resistance of pure water used for cleaning, metal ions, etc.
The wafer 1 and the brush 2 were prevented from being charged using g ions or the like.

[Problem to be solved by the invention]

However, in the conventional cleaning device configured as described above, it is insufficient to prevent the brush material itself from being charged and the object to be cleaned from being charged, and the use of CO2 bubbling and metal ions increases the amount of organic foreign matter. Generates metal residue, etc.
There were problems such as causing a new decrease in yield.

This invention was made to solve the above-mentioned problems, and aims to provide a cleaning device that prevents charging of plan materials and objects to be cleaned, and that simplifies the cleaning process. shall be.

[Means to solve the problem]

In the cleaning device according to the present invention, the brush used during scrub cleaning is made of a conductive material, and the brush is grounded.

[Effect]

In the cleaning device according to the present invention, since the brush material is a conductive material, the charge on the object to be cleaned is removed through the brush material, so that damage caused by charging can be reduced.

〔Example〕

Hereinafter, one embodiment of the present invention will be explained with reference to FIG.

In FIG. 1, numeral 1 is a wafer which is a 7D object to be cleaned, numeral 20 is a plan, and this brush 20 is made of a conductive material such as acrylic or resin containing carbon (a metal brush) as a brush material 2. (soft material)) is used and is grounded to the ground electrode 3 via this conductive material.

Next, the operation will be explained.The method of bringing the 6° brush 20 into direct contact with the surface of the wafer material 1 to remove foreign matter is the same as in the prior art, but the electric charge generated in this process is used for the brush material 2. The conductive material that has been removed is completely removed.

According to the above method, the brush shrine 21. In the cleaning process, when charge concentration occurs on the wafer 1,
In addition to removing foreign matter, during scrubbing, it is possible to remove charges generated in the previous process.

In addition, as another embodiment of the present invention, as schematically shown in Fig. 2, the 7r run material 21 is coated with a film 22 of a low dust-emitting substance to prevent dust generation during scrubbing. I can do it.

In the above embodiments, a wafer was described as an object to be cleaned, but it is also possible to use it for a mask or the like.

〔Effect of the invention〕

As explained above, in this invention, since the brush is made of a conductive material and the brush is grounded, the electric charge generated in the cleaning process is immediately removed. It is possible to reduce the amount and improve the yield.

[Brief explanation of drawings]

FIG. 1 is a configuration diagram of a cleaning device showing an embodiment of the present invention;
FIG. 2 is a configuration diagram of a cleaning device showing another embodiment of the present invention, FIG. 3 is a configuration diagram of a conventional cleaning device, and FIG. 4 is a perspective view of the entire cleaning device in a scrub cleaning state. In the figure, 1 is an object to be cleaned, 2° is a brush, 21 is a brush material, and 22 is a coating. In addition, the same reference numerals in each figure represent the same or corresponding parts.

Claims (1)

[Claims] 1. A scrub cleaning device for removing foreign matter by bringing a plan into contact with a cleaning surface of an object to be cleaned, characterized in that the brush is made of a conductive material and the brush is grounded.