JPH0341545B2 - - Google Patents
Info
- Publication number
- JPH0341545B2 JPH0341545B2 JP12877986A JP12877986A JPH0341545B2 JP H0341545 B2 JPH0341545 B2 JP H0341545B2 JP 12877986 A JP12877986 A JP 12877986A JP 12877986 A JP12877986 A JP 12877986A JP H0341545 B2 JPH0341545 B2 JP H0341545B2
- Authority
- JP
- Japan
- Prior art keywords
- target
- sputtering
- plane
- crystal
- soft ferrite
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000013078 crystal Substances 0.000 claims description 15
- 229910001035 Soft ferrite Inorganic materials 0.000 claims description 9
- 238000005477 sputtering target Methods 0.000 claims description 5
- 238000004544 sputter deposition Methods 0.000 description 15
- 230000015572 biosynthetic process Effects 0.000 description 6
- 239000010409 thin film Substances 0.000 description 6
- 230000003628 erosive effect Effects 0.000 description 4
- 238000000034 method Methods 0.000 description 4
- 238000005516 engineering process Methods 0.000 description 2
- 239000010408 film Substances 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 239000013077 target material Substances 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- 229910000859 α-Fe Inorganic materials 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
- C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
- Physical Vapour Deposition (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12877986A JPS62284069A (ja) | 1986-06-02 | 1986-06-02 | スパッタリング用タ−ゲット |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12877986A JPS62284069A (ja) | 1986-06-02 | 1986-06-02 | スパッタリング用タ−ゲット |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS62284069A JPS62284069A (ja) | 1987-12-09 |
| JPH0341545B2 true JPH0341545B2 (de) | 1991-06-24 |
Family
ID=14993254
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP12877986A Granted JPS62284069A (ja) | 1986-06-02 | 1986-06-02 | スパッタリング用タ−ゲット |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS62284069A (de) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0480409B1 (de) * | 1990-10-09 | 1994-07-13 | Nec Corporation | Verfahren zur Herstellung eines Ti/TiN/Al Kontaktes unter Benutzung eines reaktiven Zerstäubungsprozesses |
-
1986
- 1986-06-02 JP JP12877986A patent/JPS62284069A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS62284069A (ja) | 1987-12-09 |
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