JPH0350122A - Insulating composition - Google Patents

Insulating composition

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Publication number
JPH0350122A
JPH0350122A JP1088503A JP8850389A JPH0350122A JP H0350122 A JPH0350122 A JP H0350122A JP 1088503 A JP1088503 A JP 1088503A JP 8850389 A JP8850389 A JP 8850389A JP H0350122 A JPH0350122 A JP H0350122A
Authority
JP
Japan
Prior art keywords
insulating composition
insulating
oxide
superconductor
oxide superconductor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP1088503A
Other languages
Japanese (ja)
Other versions
JP2975608B2 (en
Inventor
Shin Fukushima
福島 伸
Shiyunji Nomura
俊自 野村
Hisashi Yoshino
芳野 久士
Takeshi Ando
健 安藤
Hiromi Nibu
丹生 ひろみ
Tomohisa Yamashita
知久 山下
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Toshiba Corp
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Toshiba Corp
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Publication of JPH0350122A publication Critical patent/JPH0350122A/en
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Expired - Lifetime legal-status Critical Current

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  • Inorganic Compounds Of Heavy Metals (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Superconductor Devices And Manufacturing Methods Thereof (AREA)

Abstract

PURPOSE:To improve the matchability of an insulating compsn. with a crystal face of an oxide superconductor compsn. by substituting a rare earth element such as Nd or Sm for Ca in the superconductor compsn. contg. Bi, Br, Ca and Cu so that the resulting insulating compsn. is made similar to the superconductor compsn. in crystal structure. CONSTITUTION:A rare earth element (RE) selected among Nd, Sm, Eu, Gd, Tb, Dy, Ho, Er, Tm, Yb, Lu and Y is substd. for Ca in an oxide superconductor compsn. consisting of Bi, Sr, Ca, Cu and O or Tl, Ba, Ca, Cu and O to form an insulating compsn. contg. Bi, Sr, RE and Cu or Tl, Ba, RE and Cu in 2:(1.5-2.5):(0.5-1.5):(1.8-2.5) ratio. This insulating compsn. is similar to the superconductor compsn. in crystal structure and has satisfactory matchability with a crystal face of the superconductor compsn.

Description

【発明の詳細な説明】 [発明の目的] (産業上の利用分野) 本発明は、超電導素子に用いられる絶縁性組成物に関す
る。
DETAILED DESCRIPTION OF THE INVENTION [Object of the Invention] (Field of Industrial Application) The present invention relates to an insulating composition used in a superconducting element.

(従来の技術) 近年、Ba−La−Cu−0系の層状ペロブスカイト型
の酸化物が高い臨界温度を有する可能性のあることが発
表されて以来、各所で酸化物超電導体の研究が行われて
いる(Z、Phys、B Condensed Mat
ter64.189−193(1986)) 、その中
でもY−Ba−Cu−0系で代表される過剰酸素を有す
る欠陥ペロブスカイト型の酸化物超電導体は、臨界温度
が90に以上と液体窒素以上の高い温度を有することが
確認されている( Phys、Rev、Lett、Vo
l、58、No、9.908−910)。
(Prior Art) In recent years, it has been announced that layered perovskite-type oxides based on Ba-La-Cu-0 may have a high critical temperature, and since then, research on oxide superconductors has been carried out in various places. (Z, Phys, B Condensed Mat
ter64.189-193 (1986)), among which defective perovskite-type oxide superconductors with excess oxygen, represented by the Y-Ba-Cu-0 system, have a critical temperature of 90 or higher, which is higher than that of liquid nitrogen. It has been confirmed that it has a temperature (Phys, Rev, Lett, Vo
1, 58, No. 9.908-910).

さらに、1988年には、臨界温度が105にの13j
−Sr−Ca−Cu−0系の超電導酸化物が発見される
に至った(日本経済新聞昭和63年1月22日等)。
Furthermore, in 1988, the critical temperature increased to 105 13j
-Sr-Ca-Cu-0 system superconducting oxide has been discovered (Nihon Keizai Shimbun January 22, 1988, etc.).

このBi−3r−Ca−Cu−0系の超電導酸化物は、
Ba−La−Cu−0系やY−Ba−Cu−0系の超電
導酸化物に比べて、臨界温度が高いばかりでなく、高価
な希土類元素が不要であること、水分等に対する化学的
安定性が高いことなどの利点があり、より優れた酸化物
超電導体料である。
This Bi-3r-Ca-Cu-0 based superconducting oxide is
Compared to Ba-La-Cu-0 and Y-Ba-Cu-0 type superconducting oxides, not only do they have a higher critical temperature, they do not require expensive rare earth elements, and they are chemically stable against moisture, etc. It is a superior oxide superconductor material because of its advantages such as high

ところで、トンネル効果を利用した超電導素子は、超高
速動作が可能で消費電力も僅かであるため、コンピュー
タの論理素子やメモリ素子等のデジタルデバイスへの応
用が進められている。そして、Nb/^Ioxidc 
/ Nb接合やNbN /MgO/NbN接合等を用い
た4ビット乗算器、3にゲートアレイ等が試作されてい
る。また、超電導体−半導体素子として超電導3端子素
子が試作されているが、これらの素子はいずれも臨界温
度が低い超電導体からなり、液体ヘリウムを冷媒として
用いるため、周辺技術の開発や経済性の問題等から実用
化には至っていない。
By the way, since superconducting elements that utilize the tunnel effect are capable of ultra-high-speed operation and consume little power, their application to digital devices such as computer logic elements and memory elements is progressing. And Nb/^Ioxidc
4-bit multipliers and gate arrays using Nb/Nb junctions, NbN/MgO/NbN junctions, etc. have been prototyped. In addition, superconducting three-terminal devices have been prototyped as superconductor-semiconductor devices, but these devices are all made of superconductors with low critical temperatures and use liquid helium as a coolant, so it is difficult to develop peripheral technology and improve economic efficiency. Due to problems, it has not been put into practical use.

このため、高い臨界温度を有する酸化物超電導体を前述
の超電導水Tに応用することが検討されている。
For this reason, it is being considered to apply an oxide superconductor having a high critical temperature to the superconducting water T mentioned above.

しかしながら、酸化物超電導体および絶縁性組成物を用
いて上記の超電導素子を得る場合、酸化物超電導体層と
絶縁性組成物の結晶面の整合性が悪いためここに新しい
電子の学位が生じ電荷がトラップされてジョセフソン素
子としての機能が損われるため、所望の特性を得ること
が困難であるという問題があった。
However, when obtaining the above-mentioned superconducting element using an oxide superconductor and an insulating composition, the mismatch between the crystal planes of the oxide superconductor layer and the insulating composition causes new electron degrees to be generated and charges are generated. There is a problem in that it is difficult to obtain desired characteristics because the Josephson element is trapped and its function as a Josephson element is impaired.

しかしながら、酸化物超電導体および絶縁性組成物を用
いて上記の超電導素子を得る場合、酸化物超電導体層と
絶縁性組成物の結晶面の整合性が悪いためここに新しい
電子の準位が生じ電荷がトラップされてジョセフソン素
子としての機能が損われるため、新型の特性を得ること
が困難であるという問題があった。
However, when obtaining the above-mentioned superconducting element using an oxide superconductor and an insulating composition, a new electron level is generated here due to poor alignment between the crystal planes of the oxide superconductor layer and the insulating composition. There was a problem in that it was difficult to obtain new characteristics because charges were trapped and the function as a Josephson element was impaired.

さらに、Bi系超超電導体は転移温度がll0K付近の
Bi25r2Ca2Cu301oおよび転移温度が80
に付近のBi25r2CaCu208が知られている。
Furthermore, the Bi-based superconductors are Bi25r2Ca2Cu301o, whose transition temperature is around 110K, and Bi25r2Ca2Cu301o, whose transition temperature is around 80K.
Bi25r2CaCu208 is known to be nearby.

しかしながら、より高いTcのBi25r2Ca2Cu
a O、oを合成することは容易ではないという問題が
あった。
However, Bi25r2Ca2Cu with higher Tc
There was a problem that it was not easy to synthesize a O and o.

これは、旧糸超電導体の結晶のb軸方向に存在する変調
構造またはその原因である内部応力に基因しているため
と考えられる。
This is considered to be due to the modulation structure existing in the b-axis direction of the crystal of the old thread superconductor or the internal stress that is the cause thereof.

(発明が解決しようとする課題) このように、従来の絶縁性組成物を用いて超電導素子を
iする場合、酸化物超電導体層と絶縁性組成物の結晶面
の整合性が悪いという問題−があった。さらに、転移温
度がより高い旧2S「2Ca2Cu3010を合成する
ことが容易ではないという問題があった。
(Problems to be Solved by the Invention) As described above, when fabricating a superconducting element using a conventional insulating composition, there is a problem that the crystal planes of the oxide superconductor layer and the insulating composition have poor alignment. was there. Furthermore, there was a problem in that it was not easy to synthesize old 2S "2Ca2Cu3010" which had a higher transition temperature.

本発明はこのような課題に鑑みてなされたもので、その
目的とするところは、酸化物超電導体の結晶面との整合
性の良好な絶縁性組成物を提供することである。さらに
、本発明の他の目的は、変調構造の緩和または消失した
絶縁性組成物を提供することである。
The present invention has been made in view of these problems, and its purpose is to provide an insulating composition that has good consistency with the crystal plane of an oxide superconductor. Furthermore, another object of the present invention is to provide an insulating composition in which the modulation structure is relaxed or eliminated.

[発明の構成] (課題を解決するための手段) 前記目的を達成するために本発明は、Bi、Sr。[Structure of the invention] (Means for solving problems) In order to achieve the above object, the present invention provides Bi, Sr.

Ca、 Cu、 Oまたは、Ti、Bas Ca、 C
u10からなる酸化物超電導体組成物のCaがRE(但
し、REは、Nd。
Ca, Cu, O or Ti, Bas Ca, C
Ca of the oxide superconductor composition consisting of u10 is RE (however, RE is Nd.

5II1% Eu5Gds Tbs Dys Jio、
Er、、Ta+、Yb、 LuおよびYから選ばれた元
素。)で置換されていることを特徴とする絶縁性組成物
である。
5II1% Eu5Gds Tbs Dys Jio,
Element selected from Er, Ta+, Yb, Lu and Y. ) is an insulating composition characterized by being substituted with

なお、Caは多少残っていてもさしつかえない。Note that there is no problem even if some amount of Ca remains.

ここで、Bi5Sr、I?E、 Cuまたは、T1.1
3 a 、 RIE 。
Here, Bi5Sr, I? E, Cu or T1.1
3a, RIE.

Cuの原子比は、基本的には、2:2:1:2であるが
、2:X:Y:Z程度のズレはかまわない。
The atomic ratio of Cu is basically 2:2:1:2, but a deviation of about 2:X:Y:Z is acceptable.

但し、   1.5≦X≦ 2.5 0.5≦Y≦ 1.5 1.8≦Z≦ 2.5 また、本発明の絶縁性組成物は、Biの一部がPbで置
換されていてもよい。
However, 1.5≦X≦2.5 0.5≦Y≦1.5 1.8≦Z≦2.5 Moreover, in the insulating composition of the present invention, a part of Bi is replaced with Pb. You can.

ここで、PbのBiの置換量は 1.5を超えると結晶
構造が異なるため、1.5以下が好ましい。さらに、0
.2〜1.0が特に好ましい。
Here, the substitution amount of Bi for Pb is preferably 1.5 or less, since the crystal structure will be different if it exceeds 1.5. Furthermore, 0
.. 2 to 1.0 is particularly preferred.

本発明の絶縁性組成物は、超電導体素子において、絶縁
層、基板等の絶縁材料として用いることができる。
The insulating composition of the present invention can be used as an insulating material for an insulating layer, a substrate, etc. in a superconductor element.

本発明の絶縁性組成物を超電導体素子の絶縁層として用
いる場合について説明する。
A case where the insulating composition of the present invention is used as an insulating layer of a superconductor element will be explained.

絶縁性組成物は、旧、Srs RESCu等の炭酸塩、
酸化物、有機酸塩等を化学量論比で混合し、800〜9
00℃の温度で焼成することにより得ることができる。
Insulating compositions include old carbonates such as Srs RESCu,
Mix oxides, organic acid salts, etc. in a stoichiometric ratio,
It can be obtained by firing at a temperature of 00°C.

なお、原料の配合比率は厳密に化学量論比である必要は
なく、IO%程度の相違があっても差支えない。また、
微量のアルカリ金属化合物を感謝して反応温度を低下さ
せることも可能である。
Note that the blending ratio of the raw materials does not need to be strictly stoichiometric, and there may be a difference of about IO%. Also,
It is also possible to lower the reaction temperature by using trace amounts of alkali metal compounds.

たとえばトンネル接合型のジョセフソン素子は、真空蒸
着法、マグネトロンスパッタ法、イオンビームスパッタ
法、クラスタイオンビーム法、分子線エピタキシ法等の
物理蒸着法や、CVD 、プラズマCVD等の化学気相
蒸着法により、基板上に酸化物超電導体層、絶縁層およ
び酸化物超電動体層を順次積層して得ることができる。
For example, tunnel junction type Josephson devices can be manufactured using physical vapor deposition methods such as vacuum evaporation, magnetron sputtering, ion beam sputtering, cluster ion beam, and molecular beam epitaxy, and chemical vapor deposition methods such as CVD and plasma CVD. This can be obtained by sequentially stacking an oxide superconductor layer, an insulating layer, and an oxide superelectric layer on a substrate.

また、酸化物超電導体および絶縁性組成物を構成する各
金属元素を蒸気源またはターゲットとして、多元蒸着ま
たは多元スパッタリングにより形成することも可能であ
る。酸化物超電導体がBi1Sr、 Ca、 Cu、 
0からなり、絶縁層がBi.Sr、I?E。
Moreover, it is also possible to form by multi-component vapor deposition or multi-component sputtering using each metal element constituting the oxide superconductor and the insulating composition as a vapor source or a target. Oxide superconductors include Bi1Sr, Ca, Cu,
0, and the insulating layer is Bi. Sr, I? E.

Cu、 Oからなる場合は、酸化物超電導体層の形成と
絶縁層の形成を切替えるのに、1つの元素だけ取り替え
ればよいので作業性が良好である。
In the case of Cu and O, workability is good because only one element needs to be replaced to switch between forming the oxide superconductor layer and forming the insulating layer.

酸化物超電導体層の厚さは、超電導特性を示す厚さ、す
なわち概ね 100Å以上、絶縁層の厚さはトンネル効
果を阻害しない厚さ、すなわち50〜200人であるこ
とが好ましい。
The thickness of the oxide superconductor layer is preferably a thickness that exhibits superconducting properties, that is, approximately 100 Å or more, and the thickness of the insulating layer is preferably a thickness that does not inhibit the tunneling effect, that is, 50 to 200 Å.

さらに、各物質層を形成した後、必要に応じて酸素含有
雰囲気中400〜900℃で熱処理し、酸化物超電導体
の酸素空席に酸素を導入して超電導特性を向上させる。
Further, after forming each material layer, heat treatment is performed at 400 to 900° C. in an oxygen-containing atmosphere as necessary to introduce oxygen into the oxygen vacancies of the oxide superconductor to improve superconducting properties.

なお、同様にして超フヒ導3端子素子や高感度磁気セン
サ等を得ることもできる。
Note that it is also possible to obtain a super-Fuhi conductive three-terminal element, a highly sensitive magnetic sensor, etc. in the same manner.

本発明の絶縁性組成物を超電導体素子の基板として用い
る場合は、単結晶基板は、通常のフラックス法、F Z
 (F!oatlng Zone )法、またはキロブ
ロス法により育成される。
When the insulating composition of the present invention is used as a substrate for a superconductor element, the single crystal substrate can be prepared by a conventional flux method, FZ
(F!oatlng Zone) method or the Kilobros method.

旧、Srs R1ZSCU% Oからなる絶縁性組成物
を、フラックス法で育成するときは、フラックスとして
、Bi2O3とCuOとを同時に含むフラックスを用い
てもよい。
When growing an insulating composition made of old Srs R1ZSCU% O by a flux method, a flux containing both Bi2O3 and CuO may be used as the flux.

さらに、Bi、Sr、 RIE、 Cu、 0からなる
絶縁性組酸物を、フラックス法で育成するときは、各原
料陽イオンの組成が、モル比%(β、γ、ε)で、βB
i2O3+7  t (Sr、RE ) Ol  +ε
CuO但し、    5≦β≦25 20≦γ≦60 10≦ε≦60 2β+γ+ε=100 の関係を満足してもよい。
Furthermore, when growing an insulating composite acid consisting of Bi, Sr, RIE, Cu, 0 by the flux method, the composition of each raw material cation is in molar percentage (β, γ, ε), βB
i2O3+7 t (Sr, RE) Ol +ε
CuOHowever, the following relationships may be satisfied: 5≦β≦25 20≦γ≦60 10≦ε≦60 2β+γ+ε=100.

(作用) 本発明の絶縁性組成物は、酸化物超電導体と同一または
類似の結晶構造を有し、格子定数も極めて近い値である
ため、結晶構造が同一または類似のため界面における整
合性が良く、電荷のトラップによる特性の低下が抑止さ
れる。
(Function) The insulating composition of the present invention has the same or similar crystal structure as the oxide superconductor, and the lattice constant is also very close to that of the oxide superconductor. As a result, deterioration of characteristics due to charge trapping is suppressed.

特に、本発明の絶縁性組成物を基板として用いた場合は
、結晶構造が同一または類似であるため、基板上にエピ
タキシャル成長させた酸化物超電導薄膜単結晶が形成で
きる。
In particular, when the insulating composition of the present invention is used as a substrate, since the crystal structures are the same or similar, an oxide superconducting thin film single crystal can be epitaxially grown on the substrate.

また、本発明の絶縁性組成物は、高温熱処理時において
も安定でしかも酸化物超電導体の結晶面と反応しない。
Furthermore, the insulating composition of the present invention is stable even during high-temperature heat treatment and does not react with the crystal planes of the oxide superconductor.

したがって、絶縁材料として本発明の絶縁性組成物を用
いた超電導素子を用いることにより、超高速動作で低消
費電力のIC,hランジスタ、高感度磁気センサ等を製
造することが可能となる。
Therefore, by using a superconducting element using the insulating composition of the present invention as an insulating material, it becomes possible to manufacture ICs, h-transistors, high-sensitivity magnetic sensors, etc. that operate at ultra-high speed and consume low power.

さらに、本発明の絶縁性組成物の旧の一部をPbで置き
換えることにより、格子定数がさらに、81系超電導体
に近ずく。また、本発明の絶縁性組成物の変調構造が緩
和または消失する。
Furthermore, by replacing a part of the old insulating composition of the present invention with Pb, the lattice constant becomes closer to that of the 81-series superconductor. Moreover, the modulated structure of the insulating composition of the present invention is relaxed or disappears.

本発明の絶縁性組成物の単結晶上に、旧糸超電導体薄膜
を成長させると、容易に高いTcをもつ旧2 Srz 
Ca2Cu30 to層が得られる。これは、本発明の
絶縁性組成物においては、変調構造が緩和または消失さ
れており、その上にエピタキシャル成長した超電導体薄
膜においても、変調構造が緩和または消失されているた
めと考えられる。
When an old thread superconductor thin film is grown on the single crystal of the insulating composition of the present invention, it is easy to grow old 2 Srz with a high Tc.
A Ca2Cu30 to layer is obtained. This is thought to be because the modulation structure is relaxed or eliminated in the insulating composition of the present invention, and the modulation structure is also relaxed or eliminated in the superconductor thin film epitaxially grown thereon.

さらに、このようにして得られた超電導体薄膜において
は、同様の理由によりシャープな超電導転移が得られ、
これにより、たとえば、77にでの臨界電流の向上もみ
られることがわかった。
Furthermore, in the superconductor thin film obtained in this way, a sharp superconducting transition is obtained for the same reason.
As a result, it was found that, for example, an improvement in the critical current at 77 was also observed.

すなわち、本発明の絶縁性組成物を超電導体素子におけ
る絶縁材料として用いることにより容易にll0Kでシ
ャープな転移を示す良好な超電導素子が得られる。
That is, by using the insulating composition of the present invention as an insulating material in a superconductor element, a good superconductor element that exhibits a sharp transition at 10K can be easily obtained.

以上Bi系について説明したが、TI系もBl系と同様
の結晶11M造を有し同様のことが言えることは言うま
でもない。
Although the Bi system has been described above, it goes without saying that the TI system has a crystal 11M structure similar to the Bl system and the same can be said.

(実施例) 以下、図面に基づいて本発明の実施例について説明する
(Example) Hereinafter, an example of the present invention will be described based on the drawings.

実施例1 第1図は、本発明の絶縁性組成物を絶縁層として用いた
トンネル接合型の酸化物超電導素子の横断面を示すもの
で、同図において酸化物超電導素子1は、基板2の上に
、Bi0 Sr2 Ca1Cu20  層α 3、Bi0 Sr2 Y 1Cu20  層4、[li
2 Sr2 Ca+ Cuα 20 層5が順次積層されて構成されている。
Example 1 FIG. 1 shows a cross section of a tunnel junction type oxide superconducting device using the insulating composition of the present invention as an insulating layer. On top, Bi0 Sr2 Ca1Cu20 layer α 3, Bi0 Sr2 Y 1Cu20 layer 4, [li
2 Sr2 Ca+ Cuα 20 layers 5 are sequentially stacked.

α [Bi0 Sr2 Ca+ Cu20  ターゲットの
製造コα まず、+31203粉末33.5o+o1%、5rC(
h粉末33.5IIo1%、CaC03粉末33.5m
o1%、CuO粉末I G、 7mo 1%を用い、ジ
ルコニアボールとともにモノポットに入れて湿式粉砕を
行った後、脱水乾燥を施し、加熱処理して仮焼しく85
0℃〜900℃、24h ) 、さらに再度モノポット
に入れて湿式粉砕を行い、脱水乾燥を施し粒径5μm以
下の粉末(超電導体)を得た。
α [Bi0 Sr2 Ca+ Cu20 Target production α First, +31203 powder 33.5o+o1%, 5rC (
h powder 33.5IIo1%, CaC03 powder 33.5m
01%, CuO powder IG, 7mo 1% were placed in a monopot together with zirconia balls and wet-pulverized, then dehydrated and dried, heated and calcined.85
0° C. to 900° C., 24 h), and then placed in a monopot again for wet pulverization, followed by dehydration and drying to obtain a powder (superconductor) with a particle size of 5 μm or less.

次いで、前記原料粉末にポリビニルアルコールを加えて
造粒して造粒物を調整し、この各造粒物金型に充填し、
1000kg/c−の圧力下で成形し、直径154mm
、厚さ6.5鰭の円盤を作製した。
Next, polyvinyl alcohol is added to the raw material powder and granulated to prepare a granule, which is then filled into each granule mold,
Molded under pressure of 1000kg/c-, diameter 154mm
A disk with a thickness of 6.5 fins was prepared.

さらに、これらを酸素含有雰囲気中840℃X24時焼
成して、Bi2 Sr2 Ca1Cu20  で表され
る酸α 化物超電導体からなる焼結密度が98%のターゲット材
料を得た。
Further, these were fired at 840° C. for 24 hours in an oxygen-containing atmosphere to obtain a target material having a sintered density of 98% and consisting of an acid alpha oxide superconductor represented by Bi2 Sr2 Ca1Cu20.

[Bi2 Sr2 Y I Cu20  ターゲットの
製造〕α 前述のCaC03粉末をY2O3に代えた以外は、上記
と同じ方法で直径154m+*、厚さ6.5mmの円盤
状の8128r2 Y + Cu20  で表される非
導電性酸α 化物からなる焼結密度が98%のターゲットを製造した
[Manufacture of Bi2 Sr2 Y I Cu20 target] α A non-metallic target represented by 8128r2 Y + Cu20 in the form of a disc with a diameter of 154 m + * and a thickness of 6.5 mm was prepared using the same method as above except that the CaC03 powder described above was replaced with Y2O3. A target with a sintered density of 98% made of conductive acid alpha oxide was manufactured.

[酸化物超電導素子(ジョセフソン素子)の製造コBi
2 Sr2 CalCu20  ターゲットを使用し、
95α mo1%のアルゴンと5mo1%の酸素からなる7Pa
の混合気体中で、高周波マグネトロンスパッタにより、
基板温度700℃のIOX IOX l mmの5rT
103基板上に、厚さ1.0μn+のBi2 Sr2 
Ca1Cu20  層を形α 成した。
[Manufacture of oxide superconducting elements (Josephson elements) Bi
2 Sr2 CalCu20 target,
95α 7Pa consisting of mo1% argon and 5mo1% oxygen
by high frequency magnetron sputtering in a mixed gas of
IOX with substrate temperature of 700℃ IOX l mm 5rT
103 substrate with a thickness of 1.0 μn+ Bi2 Sr2
A Ca1Cu20 layer was formed.

次に、Bi2 Sr2 Y + Cu20  ターゲッ
トを用いα て、上記旧2 Sr2 Ca1Cu20  層上に、厚
さIO人α のBI2 Sr2 Y + Cu20  層を形成した
Next, a BI2 Sr2 Y + Cu20 layer having a thickness of IO was formed on the old 2 Sr2 Ca1 Cu20 layer using a Bi2 Sr2 Y + Cu20 target.

α 最後に、この旧2 Sr2 Y + Cu20 a層上
に、前述した条件と同じ条件で、厚さ1.0μIのBi
25r2 Ca1Cu20  層を形成して、トンネル
接合型α の酸化物超電導素子を得た。
α Finally, on this old 2 Sr2 Y + Cu20 a layer, a 1.0 μI thick layer of Bi was added under the same conditions as described above.
A 25r2 Ca1Cu20 layer was formed to obtain a tunnel junction type α oxide superconducting element.

このようにして得られた酸化物超電導素子の臨界温度は
77にで、この温度でトンネル効果により各層を通じて
電流が流れることが確認された。
The critical temperature of the oxide superconducting element thus obtained was 77, and it was confirmed that current flows through each layer due to the tunnel effect at this temperature.

絶縁層として、TI2 Ba2 Y + Cu20  
ターゲラα トを用いてT12 Baz Y + Cu20  層を
形成し、超α 電導体としてTI2 Ba2 Ca1Cu20 aター
ゲットを用いてTI2 Ba2 Ca1Cu20  層
を形成した以外は、α 上記の方法と同様にして酸化物超伝導素子を形成したと
ころ、臨界温度は100にで動作が確認された。
As an insulating layer, TI2 Ba2 Y + Cu20
The α When a conductive element was formed, operation was confirmed at a critical temperature of 100°C.

実施例2 812 Sr2 CaI Cu20  ターゲットに代
えて、α Bi2 Sr2 Ca2 Cu30  ターゲットを用
いて旧2α Sr2 Ca1Cu20  層3.5の代りに、BI2
 Sr2α Ca2 Cu30  層を形成した以外は、実施例1と
同α 様にして酸化物超電導素子を製造した。
Example 2 Instead of the 812 Sr2 CaI Cu20 target, α Bi2 Sr2 Ca2 Cu30 target was used, and instead of the old 2α Sr2 Ca1 Cu20 layer 3.5, BI2
An oxide superconducting element was manufactured in the same manner as in Example 1 except that the Sr2α Ca2 Cu30 layer was formed.

この酸化物超電導素子の臨界温度は70にで、この温度
でトンネル効果により各層を通じて電流が流れることが
確認された。
The critical temperature of this oxide superconducting element is 70°C, and it was confirmed that current flows through each layer due to the tunnel effect at this temperature.

比較例1 実施例1におけるBI2 Srz Y I Cuz O
a層4に代えて、同じ厚さのAl103層を形成した以
外は、実施例1と同じ構造の酸化物超電導素子を形成し
たが、この素子は、77にの臨界温度においても動作し
なかった。
Comparative Example 1 BI2 Srz Y I Cuz O in Example 1
An oxide superconducting element having the same structure as in Example 1 was formed except that an Al103 layer of the same thickness was formed in place of the a-layer 4, but this element did not operate even at a critical temperature of 77°C. .

なお、以上の実施例では、絶縁層として、Bi25r2
 Y + Cu20  からなる非導電性酸化物を用い
α た例について説明したが、上記式においてYをNd。
In addition, in the above embodiment, Bi25r2 is used as the insulating layer.
An example using a non-conductive oxide consisting of Y + Cu20 has been described, but in the above formula, Y is replaced by Nd.

Sin、 Eu5GdSTbSDy、 1loSEr、
Tm、 YbまたはLuに代えた酸化物でも同様の結晶
構造を有するので同様の効果を得ることが可能である。
Sin, Eu5GdSTbSDy, 1loSEr,
Oxides substituted for Tm, Yb, or Lu have similar crystal structures, so similar effects can be obtained.

実施例3 Bis Sr、 Y 、 Cuを原子比で3:2:1:
3となるように原料のBl 20 ] 、SrCO3、
Y 20 ] 、CuOを総R100g秤量・混合し、
アルミナルツボに入れ、1150℃大気中で24H保持
した後、800℃まで100 Hかけて徐冷し、室温ま
で炉冷して201QII×20IIIl×211HのB
i2 Sr2 YCu 20  It結品を得た。X線
回折のα 結果、単結晶であり、また(001)ファセットを有す
ることを確認した。
Example 3 BisSr, Y, Cu in atomic ratio of 3:2:1:
The raw material Bl 20 ], SrCO3,
Y 20 ], a total of 100 g of CuO was weighed and mixed,
It was placed in an aluminum crucible and kept at 1150°C in the atmosphere for 24 hours, then gradually cooled to 800°C over 100 hours, and then cooled in the furnace to room temperature to form a B of 201QII x 20III1 x 211H.
An i2 Sr2 YCu 20 It product was obtained. The α result of X-ray diffraction confirmed that it was a single crystal and had (001) facets.

この基板上にRFスパッタ法により、13i25r2C
aCu20  膜を基板温度550℃で成膜したところ
、α 基板と方位の揃った酸化物超電導単結晶膜が得られた。
13i25r2C was deposited on this substrate by RF sputtering.
When an aCu20 film was formed at a substrate temperature of 550°C, an oxide superconducting single crystal film with the same orientation as the α substrate was obtained.

また、この膜の断面をEPMAで分析したところ、基板
と膜との反応は1llJ定限界内であった。
Further, when a cross section of this film was analyzed by EPMA, the reaction between the substrate and the film was within the fixed limit of 111J.

第2図にこの膜の電気抵抗率の温度特性を示す。Figure 2 shows the temperature characteristics of the electrical resistivity of this film.

T c −84K、ΔTc〜IKと優れた超電導特性が
得られた。
Excellent superconducting properties with Tc -84K and ΔTc~IK were obtained.

比較例2 基板としてMgO単結晶を用いた以外は実施例3と同一
条件下で成膜を行ったところ、C面配向した膜が得られ
たものの配向度70%程度の多結晶膜で膜表面の凹凸が
大きく、膜断面のEPLiA分析により、膜内にMgO
イオンが検出された。
Comparative Example 2 A film was formed under the same conditions as in Example 3 except that an MgO single crystal was used as the substrate. Although a C-plane oriented film was obtained, the film surface was a polycrystalline film with an orientation degree of about 70%. The unevenness of the film is large, and EPLiA analysis of the cross section of the film reveals that there is MgO in the film.
ion detected.

実施例4 BISSr、Nd5Cuを原子比で4:2:2:5とな
るように秤量し、実施例3と同様に単結晶を育成し、I
OXmX 1OavX 1msのBi2 Sr2 Nd
2 Cul O単結晶をα 得、X線回折の結果、単結晶であり、(001)ファセ
ットを有することを確認した。この基板上にクラスター
イオンビーム法によりBI2 Sr2 Ca2Cu30
  膜を基板温度450℃で成膜したところ、α 基板と方位の揃った酸化物超電導単結晶膜が得られた。
Example 4 BISSr and Nd5Cu were weighed in an atomic ratio of 4:2:2:5, a single crystal was grown in the same manner as in Example 3, and I
OXmX 1OavX 1ms Bi2 Sr2 Nd
A 2CulO single crystal was obtained, and as a result of X-ray diffraction, it was confirmed that it was a single crystal and had a (001) facet. BI2 Sr2 Ca2Cu30 was deposited on this substrate by cluster ion beam method.
When the film was formed at a substrate temperature of 450°C, an oxide superconducting single crystal film with the same orientation as the α substrate was obtained.

実施例5 出発原料としてBI  O1,−PbO,5rCOa、
3 Y  O、CuOの各粉末を用意し、これらを陽イ3 オンの原子比が旧: Pb: Sr: Y : Cu=
 1:l:2:1:2となるように所定量秤量し、さら
にこれにフラックス分としてのBi2O3とCuOとを
BiとCuの原子比がそれぞれ1づつとなるように加え
、これを充分に混合した。
Example 5 BI O1,-PbO,5rCOa as starting materials,
3 Y O and CuO powders are prepared, and the atomic ratio of cations is old: Pb: Sr: Y: Cu=
Weigh out a predetermined amount so that the ratio is 1:l:2:1:2, and then add Bi2O3 and CuO as a flux so that the atomic ratio of Bi and Cu is 1 each. Mixed.

次に、この混合粉をアルミナルツボに投入し、空気中で
1.150℃まで加熱し、この温度を24時間保持して
均一に溶融させた後、800℃まで100時間かけて除
冷し、次で室温まで炉冷した。
Next, this mixed powder was put into an aluminum crucible, heated in air to 1.150°C, held at this temperature for 24 hours to uniformly melt, and then slowly cooled to 800°C over 100 hours. Then, the mixture was cooled in the oven to room temperature.

得られた冷却固化物中にはlOmmX 20nvX 2
mn+と大型の単結晶がU′r出しており、この単結晶
体のX線解析を行ったところ、BIPbSr2YCu2
08+δ(δは過剰酸素)の組成を有し、単結晶板面に
対してC軸配向した単結晶であることを確認した。
In the obtained cooled and solidified product, 1OmmX 20nvX 2
mn+ and a large single crystal emitted U'r, and X-ray analysis of this single crystal revealed that BIPbSr2YCu2
It was confirmed that the single crystal had a composition of 08+δ (δ is excess oxygen) and was C-axis oriented with respect to the single crystal plate surface.

また、比抵抗は一100℃で104Ω・cmであり、電
気絶縁物として機能することを確認した。
Further, the specific resistance was 104 Ω·cm at -100°C, and it was confirmed that it functions as an electrical insulator.

次に、上記BIPbSr  Y Cu  O単結晶基板
上2 28+δ に旧 0、PbO1SrCO1CaCO3およびCuO
を23     3 スパッタターゲットとして用い、95mo1%のアルゴ
ンと51101%の酸素からなる7Paの混合気体中で
、高周波マグネトロンスパッタによる多元スパッタによ
って、Bi系酸化物超電導体薄膜を膜厚200人で着膜
させた。なお、各ターゲットに対する投入電力比は、形
成される薄膜の組成が旧: S r : Ca : C
u−2:2:2:3となるように調整した。
Next, old 0, PbO1SrCO1CaCO3 and CuO
Using 233 as a sputtering target, a Bi-based oxide superconductor thin film was deposited to a thickness of 200 mm by multi-source sputtering using high-frequency magnetron sputtering in a 7 Pa gas mixture consisting of 95 mo1% argon and 51101% oxygen. Ta. The input power ratio for each target is based on the composition of the formed thin film: S r : Ca : C
The ratio was adjusted to u-2:2:2:3.

得られたBi系酸化物超電導体薄膜に対してX線回折を
行ったところ、絶縁性単結晶基板と方位のそろった高臨
界温度相のエピタキシャル成長膜であることを確認した
When the obtained Bi-based oxide superconductor thin film was subjected to X-ray diffraction, it was confirmed that it was an epitaxially grown film in a high critical temperature phase with the same orientation as the insulating single crystal substrate.

これは、この実施例の絶縁性単結晶基板はBi系酸化物
超電導体と格子定数が近似しており、界面における格子
不整合が極力低減されるため、Bi系酸化物超電導体薄
膜を良好に形成することが可能になるためである。
This is because the insulating single crystal substrate of this example has a lattice constant similar to that of the Bi-based oxide superconductor, and the lattice mismatch at the interface is reduced as much as possible, so that the Bi-based oxide superconductor thin film can be formed well. This is because it becomes possible to form.

また、Bi系酸化物超電導体の高臨界温度相が形成しず
らい理由は、結晶内部の変調11,7造やその原因であ
る結晶の内部応力に起因するものと考えられる。ところ
で、この実施例の絶縁性単結晶基板は、Bi系酸化物超
電導体と格子定数が近似しているとともに、Pbの置換
によって変調構造もほぼ消失したものである。このため
に、この実施例の地縁性単結晶基板上に形成されたBi
系酸化物超電導体薄膜も消失あるいは緩和され、高臨界
温度相の単一相か得られるものと推定される。
Furthermore, the reason why it is difficult to form a high critical temperature phase in a Bi-based oxide superconductor is considered to be due to the modulation 11,7 structure inside the crystal and the internal stress of the crystal that causes it. Incidentally, the insulating single crystal substrate of this example has a lattice constant similar to that of the Bi-based oxide superconductor, and the modulation structure has almost disappeared due to the substitution of Pb. For this purpose, the Bi
It is presumed that the oxide superconductor thin film also disappears or relaxes, resulting in a single high-critical-temperature phase.

さらに、この実施例の絶縁性単結晶基板上に形成された
13i系酸化物超電導体薄膜上に、Bi2O3、PbO
1SrC03、Y2O3およびCuOをスパッタターゲ
ットとして用い、高周波マグネトロンスパッタによる多
元スパッタによって、BIPbS「2Ycu208+、
薄膜を膜厚50人で形成し、さらに上に上記酸化物超電
導体薄膜と同一条件でBi系酸化物超電導体薄膜を膜厚
200人で形成し、ジョセフソン素子を作製した。
Furthermore, Bi2O3, PbO
BIPbS “2Ycu208+,
A thin film was formed to a thickness of 50 mm, and a Bi-based oxide superconductor thin film was further formed thereon to a thickness of 200 mm under the same conditions as the oxide superconductor thin film, to produce a Josephson device.

上層のBi系酸化物超電導体薄膜も、下相のBi系酸化
物超電導体薄膜と同様に、高臨界温度相によって構成さ
れた良好な酸化物超電導体薄膜であり、Bi系酸化物超
電導体相と絶縁相の界面における反応も二忍められなか
った。まtこ、このジョセフソン素子はll0Kで超電
導特性を示し、この温度で良好なジョセフソン効果が得
られることを確認した。
The upper layer Bi-based oxide superconductor thin film is also a good oxide superconductor thin film composed of a high critical temperature phase, like the lower-phase Bi-based oxide superconductor thin film. The reaction at the interface between the insulating phase and the insulating phase was also intolerable. It was confirmed that this Josephson element exhibits superconducting characteristics at 110K, and that a good Josephson effect can be obtained at this temperature.

比較例3 SrT10 a Oを基板として用いて、この上にBi
25r2Ca2Cu30□。。δ超電導体を200人、
絶縁層してMgOを50人、さらにBi25r2Ca2
Cu30  to+、超電導体を200人積層してジョ
セフソン素子を作製した。
Comparative Example 3 Using SrT10aO as a substrate, Bi was deposited on it.
25r2Ca2Cu30□. . 200 δ superconductors,
50 layers of MgO as an insulating layer, and then Bi25r2Ca2
A Josephson device was fabricated by stacking 200 Cu30 to+ superconductors.

しかしながら、このままの状態では超電導特性を示さな
かった。そこで、結晶性を向上させるため600℃で熱
処理を行い、超電導特性を評価したところ、転移温度6
0にで超電導状態を示したものの、良好なジョセフソン
特性は得られなかった。
However, in this state, it did not exhibit superconducting properties. Therefore, in order to improve the crystallinity, we performed heat treatment at 600℃ and evaluated the superconducting properties, and found that the transition temperature was 6.
Although a superconducting state was exhibited at 0, good Josephson characteristics were not obtained.

実施例6 実施例5の記載された同様の方法により、Pbによる旧
の置換量を変化させてBi2. Pb1.Sr 2Y 
Cu20g+(5の単結晶を作成した。
Example 6 By a similar method as described in Example 5, Bi2. Pb1. Sr 2Y
A single crystal of Cu20g+(5) was created.

本発明のBi   Pb  Sr  Y Cu 208
+、結晶と超2−V   W    2 電導体のBi  Sr  CaCu  Oの格子定数、
およ2  2   2 8+δ びBI   Pb  Sr  YCu  O結晶の変調
+11S造を2−w 522g+6 第3図に示す。
Bi Pb Sr Y Cu 208 of the present invention
+, lattice constant of crystal and super 2-V W 2 conductor Bi Sr CaCu O;
The modulated +11S structure of the 2 2 2 8 + δ and BI Pb Sr YCu O crystals is shown in 2-w 522g+6 in FIG.

図中で、横軸はWを示する。すなわち、Wが大きくなる
ほど、B目′iPbに置換される割合が大きくなる。左
の上の縦軸はC軸の格子定数を示し、右の下の縦軸はa
、b軸の格子定数を示す。右の上の縦軸は変調構造を示
す。
In the figure, the horizontal axis indicates W. In other words, as W becomes larger, the ratio of substitution with B-th 'iPb increases. The upper vertical axis on the left shows the lattice constant of the C axis, and the lower vertical axis on the right shows a
, denotes the b-axis lattice constant. The vertical axis on the right shows the modulation structure.

OはBi   Pb  Sr  YCu  O結晶のa
軸の2−WW228+δ 格子定数を、・はb軸の格子定数を、回はC軸の格子定
数を示す。
O is Bi Pb Sr YCu O crystal a
2-WW228+δ lattice constant of the axis, * indicates the lattice constant of the b-axis, and times indicate the lattice constant of the C-axis.

◎はBI  Sr  CaCu  Oのa軸およびb軸
の22 28+δ 格子定数を、口はC軸の格子定数を示す。
◎ indicates the 22 28 + δ lattice constant of the a-axis and b-axis of BI Sr CaCu O, and the opening indicates the lattice constant of the C-axis.

△は旧  Pb  Sr  YCu  O結晶の変調溝
2−VW22g+δ 造を示す。
△ indicates the modulation groove 2-VW22g+δ structure of the old Pb Sr YCu O crystal.

Bi   Pb  Sr  YCu  O結晶において
、b2−W  ν  2 28+δ 軸の格子定数は、Biの約GO%をPbで置換すると、
旧 Sr  CaCu  Oに最も近ずき、C軸の格子
22 28+δ 定数は、BlがPbに置換される割合が大きくなると、
旧2Sr2CaCu208+δに近ずくことかわかる。
In the Bi Pb Sr YCu O crystal, the lattice constant of the b2-W ν 2 28+δ axis is as follows when about GO% of Bi is replaced with Pb.
The lattice 22 28 + δ constant of the C axis, which is closest to old Sr CaCu O, becomes as the ratio of Bl being replaced by Pb increases,
It can be seen that it is close to the old 2Sr2CaCu208+δ.

さらに、変調構造は、BlがPbに置換される割合が大
きくなると、消失することがわかる。
Furthermore, it can be seen that the modulation structure disappears as the ratio of Bl being replaced by Pb increases.

実施例7〜16 第1表および第2表に示す組成でフラックス法により絶
縁性単結晶を作製した。
Examples 7 to 16 Insulating single crystals were produced using the flux method using the compositions shown in Tables 1 and 2.

第1表 第2表 [発明の効果] 以上説明したように本発明の絶縁性組成物は酸化物超電
導体と結晶構造が同一または類似のため、酸化物超電導
体の結晶面との整合性の良好な絶縁性組成物を提供する
ことができる。さらに、本発明の絶縁性組成物のBiの
一部をPbで置き換えることにより、変調構造の緩和ま
たは消失した絶縁性組成物を提供することができる。
Table 1 Table 2 [Effects of the Invention] As explained above, the insulating composition of the present invention has the same or similar crystal structure as that of the oxide superconductor, so it has poor consistency with the crystal plane of the oxide superconductor. A good insulating composition can be provided. Furthermore, by replacing a portion of Bi in the insulating composition of the present invention with Pb, it is possible to provide an insulating composition in which the modulation structure is relaxed or eliminated.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は本発明の絶縁性組成物が絶縁層である酸化物超
電導素子の横断面図、第2図は本発明による単結晶基板
上に成膜した酸化物超電導薄膜単結晶の電気抵抗率の温
度特性を示す図、第3図は、本発明の81の一部がPb
で置換された絶縁組成物の特性を示す図である。 1・・・酸化物超電導素子、2・・・基板、3.5・・
・Bi25r2 CalCu20 a層、4−1312
 Sr2 Y ) Cu2 Oa層
FIG. 1 is a cross-sectional view of an oxide superconducting element whose insulating layer is the insulating composition of the present invention, and FIG. 2 is the electrical resistivity of a single crystal oxide superconducting thin film formed on a single crystal substrate according to the present invention. FIG. 3 is a diagram showing the temperature characteristics of 81 of the present invention.
It is a figure which shows the characteristic of the insulation composition substituted with. 1... Oxide superconducting element, 2... Substrate, 3.5...
・Bi25r2 CalCu20 a layer, 4-1312
Sr2Y) Cu2Oa layer

Claims (1)

【特許請求の範囲】 (1)Bi、Sr、Ca、Cu、Oまたは、Ti、Ba
、Ca、Cu、Oからなる酸化物超電導体組成物のCa
がRE(但し、REは、Nd、Sm、Eu、Gd、Tb
、Dy、Ho、Er、Tm、Yb、LuおよびYから選
ばれた元素。)で置換されていることを特徴とする絶縁
性組成物。 (2)Bi、Sr、RE、Cuまたは、Ti、Ba、R
E、Cuの原子比が2:X:Y:Zであることを特徴と
する請求項1記載の絶縁性組成物。 但し、1.5≦X≦2.5 0.5≦Y≦1.5 1.8≦Z≦2.5 (3)Bi、Sr、RE、Cuの原子比が2:X:Y:
Zの酸化物である絶縁性組成物を、 但し、1.5≦X≦2.5 0.5≦Y≦1.5 1.8≦Z≦2.5 フラックス法で育成する際のフラックスとしてBi_2
O_3とCuOを同時に含むフラックスを用いることを
特徴とする絶縁性組成物の育成方法。 (4)Bi、Sr、RE、Cuの原子比が2:X:Y:
Zの酸化物である絶縁性組成物を、 但し、1.5≦X≦2.5 0.5≦Y≦1.5 1.8≦Z≦2.5 フラックス法で育成する際の各原料陽イオンの組成が、
モル比%(β、γ、ε)で、 βBi_2O_3+γ{(Sr、RE)O}+εCuO
但し、5≦β≦25 20≦γ≦60 10≦ε≦60 2β+γ+ε=100 の関係を満足することを特徴とする絶縁性組成物の育成
方法。 (5)Biの一部がPbで置換されていることを特徴と
する請求項1記載の絶縁性組成物。 (6)Bi、Pb、Sr、RE、Cu、Oの原子比が2
−W:W:2:1:2:8+δであることを特徴とする
請求項5記載の絶縁性組成物。 但し、0<W≦1.5 δは過剰酸素 (7)Wが、0.2≦W≦1.0であることを特徴とす
る請求項6記載の絶縁性組成物。 (8)Bi、Pb、Sr、RE、Cu、Oの原子比が2
−WW:2:2:3:10+δであることを特徴とする
請求項5記載の絶縁性組成物。 但し、0<W≦1.5 δは過剰酸素 (9)Wが、0.2≦W≦1.0であることを特徴とす
る請求項8記載の絶縁性組成物。 (10)酸化物超電導体上に請求項1記載の絶縁性組成
物を絶縁層として形成したことを特徴とする超電導素子
。 (11)請求項1記載の絶縁性組成物を基板として用い
て、この基板上に酸化物超電導体を形成したことを特徴
とする超電導素子。
[Claims] (1) Bi, Sr, Ca, Cu, O or Ti, Ba
, Ca of the oxide superconductor composition consisting of Ca, Cu, and O
is RE (however, RE is Nd, Sm, Eu, Gd, Tb
, Dy, Ho, Er, Tm, Yb, Lu and Y. ) An insulating composition characterized by being substituted with (2) Bi, Sr, RE, Cu or Ti, Ba, R
The insulating composition according to claim 1, wherein the atomic ratio of E and Cu is 2:X:Y:Z. However, 1.5≦X≦2.5 0.5≦Y≦1.5 1.8≦Z≦2.5 (3) The atomic ratio of Bi, Sr, RE, and Cu is 2:X:Y:
An insulating composition that is an oxide of Z, however, 1.5≦X≦2.5 0.5≦Y≦1.5 1.8≦Z≦2.5 As a flux when growing by flux method Bi_2
A method for growing an insulating composition, characterized by using a flux containing O_3 and CuO at the same time. (4) The atomic ratio of Bi, Sr, RE, and Cu is 2:X:Y:
The insulating composition, which is an oxide of Z, is prepared using the following conditions: 1.5≦X≦2.5 0.5≦Y≦1.5 1.8≦Z≦2.5 Each raw material when growing by flux method The composition of the cations is
In molar ratio % (β, γ, ε), βBi_2O_3+γ{(Sr,RE)O}+εCuO
However, the method for growing an insulating composition is characterized by satisfying the following relationships: 5≦β≦25 20≦γ≦60 10≦ε≦60 2β+γ+ε=100. (5) The insulating composition according to claim 1, wherein a part of Bi is replaced with Pb. (6) The atomic ratio of Bi, Pb, Sr, RE, Cu, and O is 2
-W:W:2:1:2:8+δ, the insulating composition according to claim 5. The insulating composition according to claim 6, wherein 0<W≦1.5 δ is excess oxygen (7)W, and 0.2≦W≦1.0. (8) The atomic ratio of Bi, Pb, Sr, RE, Cu, and O is 2
The insulating composition according to claim 5, characterized in that -WW:2:2:3:10+δ. The insulating composition according to claim 8, wherein 0<W≦1.5 δ is excess oxygen (9)W, and 0.2≦W≦1.0. (10) A superconducting element characterized in that the insulating composition according to claim 1 is formed as an insulating layer on an oxide superconductor. (11) A superconducting element characterized in that the insulating composition according to claim 1 is used as a substrate, and an oxide superconductor is formed on this substrate.
JP1088503A 1988-04-08 1989-04-07 Insulating composition Expired - Lifetime JP2975608B2 (en)

Applications Claiming Priority (8)

Application Number Priority Date Filing Date Title
JP8673088 1988-04-08
JP10028188 1988-04-25
JP63-100281 1989-03-29
JP63-86730 1989-03-29
JP7495989 1989-03-29
JP1-74959 1989-03-29
JP7760789 1989-03-29
JP1-77607 1989-03-29

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Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03218686A (en) * 1988-05-11 1991-09-26 Canon Inc Motoko Josephson
JPH0465320A (en) * 1990-06-29 1992-03-02 Matsushita Electric Works Ltd Superconducting thin film and its production
JPH04130093A (en) * 1990-09-21 1992-05-01 Nec Corp Production of oxide superconductor single crystal and method for controlling superconductivity transition temperature
JPH0715049A (en) * 1993-06-23 1995-01-17 Nec Corp Superconducting multilayered thin film
US5629267A (en) * 1992-06-16 1997-05-13 Kabushiki Kaisha Toshiba Superconducting element having an intermediate layer with multiple fluorite blocks

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03218686A (en) * 1988-05-11 1991-09-26 Canon Inc Motoko Josephson
JPH0465320A (en) * 1990-06-29 1992-03-02 Matsushita Electric Works Ltd Superconducting thin film and its production
JPH04130093A (en) * 1990-09-21 1992-05-01 Nec Corp Production of oxide superconductor single crystal and method for controlling superconductivity transition temperature
US5629267A (en) * 1992-06-16 1997-05-13 Kabushiki Kaisha Toshiba Superconducting element having an intermediate layer with multiple fluorite blocks
JPH0715049A (en) * 1993-06-23 1995-01-17 Nec Corp Superconducting multilayered thin film

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