JPH0359640A - Silver halide photographic sensitive material subjected to antistatic treatment - Google Patents
Silver halide photographic sensitive material subjected to antistatic treatmentInfo
- Publication number
- JPH0359640A JPH0359640A JP19718389A JP19718389A JPH0359640A JP H0359640 A JPH0359640 A JP H0359640A JP 19718389 A JP19718389 A JP 19718389A JP 19718389 A JP19718389 A JP 19718389A JP H0359640 A JPH0359640 A JP H0359640A
- Authority
- JP
- Japan
- Prior art keywords
- group
- silver halide
- groups
- antistatic layer
- halide photographic
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- -1 Silver halide Chemical class 0.000 title claims abstract description 74
- 229910052709 silver Inorganic materials 0.000 title claims abstract description 40
- 239000004332 silver Substances 0.000 title claims abstract description 40
- 239000000463 material Substances 0.000 title claims abstract description 24
- 238000011282 treatment Methods 0.000 title description 5
- 239000002245 particle Substances 0.000 claims abstract description 19
- 229920001600 hydrophobic polymer Polymers 0.000 claims abstract description 15
- 239000004816 latex Substances 0.000 claims abstract description 12
- 229920000126 latex Polymers 0.000 claims abstract description 12
- OAKJQQAXSVQMHS-UHFFFAOYSA-N Hydrazine Chemical compound NN OAKJQQAXSVQMHS-UHFFFAOYSA-N 0.000 claims abstract description 11
- 229920001940 conductive polymer Polymers 0.000 claims abstract description 11
- 239000002985 plastic film Substances 0.000 claims abstract description 6
- 229920006255 plastic film Polymers 0.000 claims abstract description 6
- 239000007795 chemical reaction product Substances 0.000 claims abstract description 3
- 239000000839 emulsion Substances 0.000 claims description 20
- 239000003795 chemical substances by application Substances 0.000 claims description 7
- 125000004069 aziridinyl group Chemical group 0.000 claims description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 abstract description 14
- NOWKCMXCCJGMRR-UHFFFAOYSA-N Aziridine Chemical group C1CN1 NOWKCMXCCJGMRR-UHFFFAOYSA-N 0.000 abstract description 4
- 239000004848 polyfunctional curative Substances 0.000 abstract description 3
- 239000002872 contrast media Substances 0.000 abstract description 2
- 230000000087 stabilizing effect Effects 0.000 abstract description 2
- 125000003831 tetrazolyl group Chemical group 0.000 abstract description 2
- 239000010410 layer Substances 0.000 description 40
- 150000001875 compounds Chemical class 0.000 description 19
- 238000000034 method Methods 0.000 description 16
- 239000000203 mixture Substances 0.000 description 16
- 229920000642 polymer Polymers 0.000 description 16
- 108010010803 Gelatin Proteins 0.000 description 13
- 238000011161 development Methods 0.000 description 13
- 230000018109 developmental process Effects 0.000 description 13
- 229920000159 gelatin Polymers 0.000 description 13
- 239000008273 gelatin Substances 0.000 description 13
- 235000019322 gelatine Nutrition 0.000 description 13
- 235000011852 gelatine desserts Nutrition 0.000 description 13
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 12
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 9
- 125000001424 substituent group Chemical group 0.000 description 9
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 description 8
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 8
- 239000003513 alkali Substances 0.000 description 8
- 239000011248 coating agent Substances 0.000 description 8
- 238000000576 coating method Methods 0.000 description 8
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 7
- 238000012545 processing Methods 0.000 description 7
- 230000035945 sensitivity Effects 0.000 description 7
- 239000000243 solution Substances 0.000 description 7
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 6
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 6
- 125000000217 alkyl group Chemical group 0.000 description 6
- 239000007864 aqueous solution Substances 0.000 description 6
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 6
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 description 6
- KAMCBFNNGGVPPW-UHFFFAOYSA-N 1-(ethenylsulfonylmethoxymethylsulfonyl)ethene Chemical compound C=CS(=O)(=O)COCS(=O)(=O)C=C KAMCBFNNGGVPPW-UHFFFAOYSA-N 0.000 description 5
- 239000000654 additive Substances 0.000 description 5
- 229920001577 copolymer Polymers 0.000 description 5
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 5
- 239000005020 polyethylene terephthalate Substances 0.000 description 5
- 229920000139 polyethylene terephthalate Polymers 0.000 description 5
- 238000003860 storage Methods 0.000 description 5
- 229910052717 sulfur Inorganic materials 0.000 description 5
- 239000004094 surface-active agent Substances 0.000 description 5
- CIWBSHSKHKDKBQ-JLAZNSOCSA-N Ascorbic acid Chemical compound OC[C@H](O)[C@H]1OC(=O)C(O)=C1O CIWBSHSKHKDKBQ-JLAZNSOCSA-N 0.000 description 4
- ZTHYODDOHIVTJV-UHFFFAOYSA-N Propyl gallate Chemical compound CCCOC(=O)C1=CC(O)=C(O)C(O)=C1 ZTHYODDOHIVTJV-UHFFFAOYSA-N 0.000 description 4
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 4
- 125000003118 aryl group Chemical group 0.000 description 4
- 125000004432 carbon atom Chemical group C* 0.000 description 4
- YCIMNLLNPGFGHC-UHFFFAOYSA-N catechol Chemical compound OC1=CC=CC=C1O YCIMNLLNPGFGHC-UHFFFAOYSA-N 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 125000000623 heterocyclic group Chemical group 0.000 description 4
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 4
- 230000001681 protective effect Effects 0.000 description 4
- 239000011734 sodium Substances 0.000 description 4
- 239000011593 sulfur Substances 0.000 description 4
- QAOWNCQODCNURD-UHFFFAOYSA-N sulfuric acid Substances OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 4
- 238000005406 washing Methods 0.000 description 4
- LRUDIIUSNGCQKF-UHFFFAOYSA-N 5-methyl-1H-benzotriazole Chemical compound C1=C(C)C=CC2=NNN=C21 LRUDIIUSNGCQKF-UHFFFAOYSA-N 0.000 description 3
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical compound [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 description 3
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 3
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 3
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 3
- SJOOOZPMQAWAOP-UHFFFAOYSA-N [Ag].BrCl Chemical compound [Ag].BrCl SJOOOZPMQAWAOP-UHFFFAOYSA-N 0.000 description 3
- 125000003545 alkoxy group Chemical group 0.000 description 3
- 125000004453 alkoxycarbonyl group Chemical group 0.000 description 3
- 125000000304 alkynyl group Chemical group 0.000 description 3
- 125000003277 amino group Chemical group 0.000 description 3
- LNTHITQWFMADLM-UHFFFAOYSA-N anhydrous gallic acid Natural products OC(=O)C1=CC(O)=C(O)C(O)=C1 LNTHITQWFMADLM-UHFFFAOYSA-N 0.000 description 3
- 239000011575 calcium Substances 0.000 description 3
- 229910052791 calcium Inorganic materials 0.000 description 3
- 238000003851 corona treatment Methods 0.000 description 3
- 125000004093 cyano group Chemical group *C#N 0.000 description 3
- 125000000753 cycloalkyl group Chemical group 0.000 description 3
- 230000006866 deterioration Effects 0.000 description 3
- 208000028659 discharge Diseases 0.000 description 3
- 238000007720 emulsion polymerization reaction Methods 0.000 description 3
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 3
- 150000002334 glycols Chemical class 0.000 description 3
- 125000005843 halogen group Chemical group 0.000 description 3
- 239000003112 inhibitor Substances 0.000 description 3
- 238000005342 ion exchange Methods 0.000 description 3
- 229910052742 iron Inorganic materials 0.000 description 3
- IIPYXGDZVMZOAP-UHFFFAOYSA-N lithium nitrate Chemical compound [Li+].[O-][N+]([O-])=O IIPYXGDZVMZOAP-UHFFFAOYSA-N 0.000 description 3
- 239000006224 matting agent Substances 0.000 description 3
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 3
- 239000001397 quillaja saponaria molina bark Substances 0.000 description 3
- 150000003283 rhodium Chemical class 0.000 description 3
- 229930182490 saponin Natural products 0.000 description 3
- 150000007949 saponins Chemical class 0.000 description 3
- ADZWSOLPGZMUMY-UHFFFAOYSA-M silver bromide Chemical compound [Ag]Br ADZWSOLPGZMUMY-UHFFFAOYSA-M 0.000 description 3
- 229910052708 sodium Inorganic materials 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- YXIWHUQXZSMYRE-UHFFFAOYSA-N 1,3-benzothiazole-2-thiol Chemical compound C1=CC=C2SC(S)=NC2=C1 YXIWHUQXZSMYRE-UHFFFAOYSA-N 0.000 description 2
- LPYUENQFPVNPHY-UHFFFAOYSA-N 3-methoxycatechol Chemical compound COC1=CC=CC(O)=C1O LPYUENQFPVNPHY-UHFFFAOYSA-N 0.000 description 2
- PLIKAWJENQZMHA-UHFFFAOYSA-N 4-aminophenol Chemical compound NC1=CC=C(O)C=C1 PLIKAWJENQZMHA-UHFFFAOYSA-N 0.000 description 2
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 2
- ZGTMUACCHSMWAC-UHFFFAOYSA-L EDTA disodium salt (anhydrous) Chemical compound [Na+].[Na+].OC(=O)CN(CC([O-])=O)CCN(CC(O)=O)CC([O-])=O ZGTMUACCHSMWAC-UHFFFAOYSA-L 0.000 description 2
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 2
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 2
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 2
- 229920003171 Poly (ethylene oxide) Polymers 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 2
- 230000002378 acidificating effect Effects 0.000 description 2
- 125000003172 aldehyde group Chemical group 0.000 description 2
- 125000001931 aliphatic group Chemical group 0.000 description 2
- 125000003342 alkenyl group Chemical group 0.000 description 2
- 125000004414 alkyl thio group Chemical group 0.000 description 2
- 235000010323 ascorbic acid Nutrition 0.000 description 2
- 229960005070 ascorbic acid Drugs 0.000 description 2
- 239000011668 ascorbic acid Substances 0.000 description 2
- 150000001541 aziridines Chemical group 0.000 description 2
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 description 2
- 229910052794 bromium Inorganic materials 0.000 description 2
- DNSISZSEWVHGLH-UHFFFAOYSA-N butanamide Chemical compound CCCC(N)=O DNSISZSEWVHGLH-UHFFFAOYSA-N 0.000 description 2
- WERYXYBDKMZEQL-UHFFFAOYSA-N butane-1,4-diol Chemical compound OCCCCO WERYXYBDKMZEQL-UHFFFAOYSA-N 0.000 description 2
- IYCOKCJDXXJIIM-UHFFFAOYSA-N butyl prop-2-enoate;prop-2-enoic acid;styrene Chemical compound OC(=O)C=C.C=CC1=CC=CC=C1.CCCCOC(=O)C=C IYCOKCJDXXJIIM-UHFFFAOYSA-N 0.000 description 2
- 125000003917 carbamoyl group Chemical group [H]N([H])C(*)=O 0.000 description 2
- ZUIVNYGZFPOXFW-UHFFFAOYSA-N chembl1717603 Chemical compound N1=C(C)C=C(O)N2N=CN=C21 ZUIVNYGZFPOXFW-UHFFFAOYSA-N 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 2
- 125000001559 cyclopropyl group Chemical group [H]C1([H])C([H])([H])C1([H])* 0.000 description 2
- 238000000586 desensitisation Methods 0.000 description 2
- 229960000878 docusate sodium Drugs 0.000 description 2
- GVGUFUZHNYFZLC-UHFFFAOYSA-N dodecyl benzenesulfonate;sodium Chemical compound [Na].CCCCCCCCCCCCOS(=O)(=O)C1=CC=CC=C1 GVGUFUZHNYFZLC-UHFFFAOYSA-N 0.000 description 2
- 239000000428 dust Substances 0.000 description 2
- 125000003700 epoxy group Chemical group 0.000 description 2
- 150000002148 esters Chemical class 0.000 description 2
- 125000001301 ethoxy group Chemical group [H]C([H])([H])C([H])([H])O* 0.000 description 2
- 229910052731 fluorine Inorganic materials 0.000 description 2
- 239000011737 fluorine Substances 0.000 description 2
- 238000009472 formulation Methods 0.000 description 2
- 229940074391 gallic acid Drugs 0.000 description 2
- 235000004515 gallic acid Nutrition 0.000 description 2
- 150000004820 halides Chemical class 0.000 description 2
- 229920001519 homopolymer Polymers 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 description 2
- 239000003960 organic solvent Substances 0.000 description 2
- 125000004430 oxygen atom Chemical group O* 0.000 description 2
- CMCWWLVWPDLCRM-UHFFFAOYSA-N phenidone Chemical compound N1C(=O)CCN1C1=CC=CC=C1 CMCWWLVWPDLCRM-UHFFFAOYSA-N 0.000 description 2
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 2
- 230000000379 polymerizing effect Effects 0.000 description 2
- 239000004926 polymethyl methacrylate Substances 0.000 description 2
- IOLCXVTUBQKXJR-UHFFFAOYSA-M potassium bromide Chemical compound [K+].[Br-] IOLCXVTUBQKXJR-UHFFFAOYSA-M 0.000 description 2
- BWHMMNNQKKPAPP-UHFFFAOYSA-L potassium carbonate Chemical compound [K+].[K+].[O-]C([O-])=O BWHMMNNQKKPAPP-UHFFFAOYSA-L 0.000 description 2
- BHZRJJOHZFYXTO-UHFFFAOYSA-L potassium sulfite Chemical compound [K+].[K+].[O-]S([O-])=O BHZRJJOHZFYXTO-UHFFFAOYSA-L 0.000 description 2
- 235000019252 potassium sulphite Nutrition 0.000 description 2
- 239000003755 preservative agent Substances 0.000 description 2
- 230000002335 preservative effect Effects 0.000 description 2
- 235000010388 propyl gallate Nutrition 0.000 description 2
- WQGWDDDVZFFDIG-UHFFFAOYSA-N pyrogallol Chemical compound OC1=CC=CC(O)=C1O WQGWDDDVZFFDIG-UHFFFAOYSA-N 0.000 description 2
- JHJLBTNAGRQEKS-UHFFFAOYSA-M sodium bromide Chemical compound [Na+].[Br-] JHJLBTNAGRQEKS-UHFFFAOYSA-M 0.000 description 2
- 229940080264 sodium dodecylbenzenesulfonate Drugs 0.000 description 2
- 235000011121 sodium hydroxide Nutrition 0.000 description 2
- GEHJYWRUCIMESM-UHFFFAOYSA-L sodium sulfite Chemical compound [Na+].[Na+].[O-]S([O-])=O GEHJYWRUCIMESM-UHFFFAOYSA-L 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- 238000006467 substitution reaction Methods 0.000 description 2
- 125000000542 sulfonic acid group Chemical group 0.000 description 2
- 125000000472 sulfonyl group Chemical group *S(*)(=O)=O 0.000 description 2
- 238000012360 testing method Methods 0.000 description 2
- CNHDIAIOKMXOLK-UHFFFAOYSA-N toluquinol Chemical compound CC1=CC(O)=CC=C1O CNHDIAIOKMXOLK-UHFFFAOYSA-N 0.000 description 2
- DTCCVIYSGXONHU-CJHDCQNGSA-N (z)-2-(2-phenylethenyl)but-2-enedioic acid Chemical compound OC(=O)\C=C(C(O)=O)\C=CC1=CC=CC=C1 DTCCVIYSGXONHU-CJHDCQNGSA-N 0.000 description 1
- QDNPCYCBQFHNJC-UHFFFAOYSA-N 1,1'-biphenyl-3,4-diol Chemical compound C1=C(O)C(O)=CC=C1C1=CC=CC=C1 QDNPCYCBQFHNJC-UHFFFAOYSA-N 0.000 description 1
- AIGNCQCMONAWOL-UHFFFAOYSA-N 1,3-benzoselenazole Chemical group C1=CC=C2[se]C=NC2=C1 AIGNCQCMONAWOL-UHFFFAOYSA-N 0.000 description 1
- 125000000355 1,3-benzoxazolyl group Chemical group O1C(=NC2=C1C=CC=C2)* 0.000 description 1
- ODIRBFFBCSTPTO-UHFFFAOYSA-N 1,3-selenazole Chemical group C1=C[se]C=N1 ODIRBFFBCSTPTO-UHFFFAOYSA-N 0.000 description 1
- NXVHEHXRZVQDCR-UHFFFAOYSA-N 1-n,1-n-diethyl-2-methylbenzene-1,4-diamine Chemical compound CCN(CC)C1=CC=C(N)C=C1C NXVHEHXRZVQDCR-UHFFFAOYSA-N 0.000 description 1
- AHABMLPWPUZVOI-UHFFFAOYSA-N 1-n,1-n-diethylbenzene-1,2,4-triamine Chemical compound CCN(CC)C1=CC=C(N)C=C1N AHABMLPWPUZVOI-UHFFFAOYSA-N 0.000 description 1
- XIROXSOOOAZHLL-UHFFFAOYSA-N 2',3',4'-Trihydroxyacetophenone Chemical compound CC(=O)C1=CC=C(O)C(O)=C1O XIROXSOOOAZHLL-UHFFFAOYSA-N 0.000 description 1
- WCVOGSZTONGSQY-UHFFFAOYSA-N 2,4,6-trichloroanisole Chemical compound COC1=C(Cl)C=C(Cl)C=C1Cl WCVOGSZTONGSQY-UHFFFAOYSA-N 0.000 description 1
- YZDIUKPBJDYTOM-UHFFFAOYSA-N 2,5-diethylbenzene-1,4-diol Chemical compound CCC1=CC(O)=C(CC)C=C1O YZDIUKPBJDYTOM-UHFFFAOYSA-N 0.000 description 1
- XQHGAEQBYRZJIX-UHFFFAOYSA-N 2-amino-4-chloro-6-phenylphenol Chemical compound NC1=CC(Cl)=CC(C=2C=CC=CC=2)=C1O XQHGAEQBYRZJIX-UHFFFAOYSA-N 0.000 description 1
- UDVRKKAWBVVSAM-UHFFFAOYSA-N 2-amino-6-phenylphenol Chemical compound NC1=CC=CC(C=2C=CC=CC=2)=C1O UDVRKKAWBVVSAM-UHFFFAOYSA-N 0.000 description 1
- CDAWCLOXVUBKRW-UHFFFAOYSA-N 2-aminophenol Chemical class NC1=CC=CC=C1O CDAWCLOXVUBKRW-UHFFFAOYSA-N 0.000 description 1
- REFDOIWRJDGBHY-UHFFFAOYSA-N 2-bromobenzene-1,4-diol Chemical compound OC1=CC=C(O)C(Br)=C1 REFDOIWRJDGBHY-UHFFFAOYSA-N 0.000 description 1
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 1
- 125000001494 2-propynyl group Chemical group [H]C#CC([H])([H])* 0.000 description 1
- YBMTWYWCLVMFFD-UHFFFAOYSA-N 3-methylbutyl 3,4,5-trihydroxybenzoate Chemical compound CC(C)CCOC(=O)C1=CC(O)=C(O)C(O)=C1 YBMTWYWCLVMFFD-UHFFFAOYSA-N 0.000 description 1
- 125000006283 4-chlorobenzyl group Chemical group [H]C1=C([H])C(=C([H])C([H])=C1Cl)C([H])([H])* 0.000 description 1
- WWOBYPKUYODHDG-UHFFFAOYSA-N 4-chlorocatechol Chemical compound OC1=CC=C(Cl)C=C1O WWOBYPKUYODHDG-UHFFFAOYSA-N 0.000 description 1
- 125000004860 4-ethylphenyl group Chemical group [H]C1=C([H])C(=C([H])C([H])=C1*)C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000000590 4-methylphenyl group Chemical group [H]C1=C([H])C(=C([H])C([H])=C1*)C([H])([H])[H] 0.000 description 1
- BQCIJWPKDPZNHD-UHFFFAOYSA-N 5-bromo-2h-benzotriazole Chemical compound C1=C(Br)C=CC2=NNN=C21 BQCIJWPKDPZNHD-UHFFFAOYSA-N 0.000 description 1
- NLHHRLWOUZZQLW-UHFFFAOYSA-N Acrylonitrile Chemical compound C=CC#N NLHHRLWOUZZQLW-UHFFFAOYSA-N 0.000 description 1
- LSNNMFCWUKXFEE-UHFFFAOYSA-M Bisulfite Chemical compound OS([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-M 0.000 description 1
- 229920002284 Cellulose triacetate Polymers 0.000 description 1
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- RWSOTUBLDIXVET-UHFFFAOYSA-N Dihydrogen sulfide Chemical class S RWSOTUBLDIXVET-UHFFFAOYSA-N 0.000 description 1
- RPWFJAMTCNSJKK-UHFFFAOYSA-N Dodecyl gallate Chemical compound CCCCCCCCCCCCOC(=O)C1=CC(O)=C(O)C(O)=C1 RPWFJAMTCNSJKK-UHFFFAOYSA-N 0.000 description 1
- KCXVZYZYPLLWCC-UHFFFAOYSA-N EDTA Chemical compound OC(=O)CN(CC(O)=O)CCN(CC(O)=O)CC(O)=O KCXVZYZYPLLWCC-UHFFFAOYSA-N 0.000 description 1
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical class C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 description 1
- AVXURJPOCDRRFD-UHFFFAOYSA-N Hydroxylamine Chemical compound ON AVXURJPOCDRRFD-UHFFFAOYSA-N 0.000 description 1
- NWBJYWHLCVSVIJ-UHFFFAOYSA-N N-benzyladenine Chemical compound N=1C=NC=2NC=NC=2C=1NCC1=CC=CC=C1 NWBJYWHLCVSVIJ-UHFFFAOYSA-N 0.000 description 1
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical group OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 1
- 239000002202 Polyethylene glycol Substances 0.000 description 1
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 1
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical group C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 1
- CZPWVGJYEJSRLH-UHFFFAOYSA-N Pyrimidine Chemical compound C1=CN=CN=C1 CZPWVGJYEJSRLH-UHFFFAOYSA-N 0.000 description 1
- 241000220317 Rosa Species 0.000 description 1
- 206010070834 Sensitisation Diseases 0.000 description 1
- 229910021607 Silver chloride Inorganic materials 0.000 description 1
- ULUAUXLGCMPNKK-UHFFFAOYSA-N Sulfobutanedioic acid Chemical compound OC(=O)CC(C(O)=O)S(O)(=O)=O ULUAUXLGCMPNKK-UHFFFAOYSA-N 0.000 description 1
- LSNNMFCWUKXFEE-UHFFFAOYSA-N Sulfurous acid Chemical class OS(O)=O LSNNMFCWUKXFEE-UHFFFAOYSA-N 0.000 description 1
- FZWLAAWBMGSTSO-UHFFFAOYSA-N Thiazole Chemical group C1=CSC=N1 FZWLAAWBMGSTSO-UHFFFAOYSA-N 0.000 description 1
- NNLVGZFZQQXQNW-ADJNRHBOSA-N [(2r,3r,4s,5r,6s)-4,5-diacetyloxy-3-[(2s,3r,4s,5r,6r)-3,4,5-triacetyloxy-6-(acetyloxymethyl)oxan-2-yl]oxy-6-[(2r,3r,4s,5r,6s)-4,5,6-triacetyloxy-2-(acetyloxymethyl)oxan-3-yl]oxyoxan-2-yl]methyl acetate Chemical compound O([C@@H]1O[C@@H]([C@H]([C@H](OC(C)=O)[C@H]1OC(C)=O)O[C@H]1[C@@H]([C@@H](OC(C)=O)[C@H](OC(C)=O)[C@@H](COC(C)=O)O1)OC(C)=O)COC(=O)C)[C@@H]1[C@@H](COC(C)=O)O[C@@H](OC(C)=O)[C@H](OC(C)=O)[C@H]1OC(C)=O NNLVGZFZQQXQNW-ADJNRHBOSA-N 0.000 description 1
- XCFIVNQHHFZRNR-UHFFFAOYSA-N [Ag].Cl[IH]Br Chemical compound [Ag].Cl[IH]Br XCFIVNQHHFZRNR-UHFFFAOYSA-N 0.000 description 1
- 125000000738 acetamido group Chemical group [H]C([H])([H])C(=O)N([H])[*] 0.000 description 1
- NLTSCOZQKALPGZ-UHFFFAOYSA-N acetic acid;dihydrate Chemical compound O.O.CC(O)=O NLTSCOZQKALPGZ-UHFFFAOYSA-N 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 238000010306 acid treatment Methods 0.000 description 1
- 150000003926 acrylamides Chemical class 0.000 description 1
- 125000004442 acylamino group Chemical group 0.000 description 1
- 125000004423 acyloxy group Chemical group 0.000 description 1
- 125000005073 adamantyl group Chemical group C12(CC3CC(CC(C1)C3)C2)* 0.000 description 1
- 230000032683 aging Effects 0.000 description 1
- 150000001336 alkenes Chemical class 0.000 description 1
- 125000005250 alkyl acrylate group Chemical group 0.000 description 1
- 125000004390 alkyl sulfonyl group Chemical group 0.000 description 1
- DIZPMCHEQGEION-UHFFFAOYSA-H aluminium sulfate (anhydrous) Chemical compound [Al+3].[Al+3].[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O DIZPMCHEQGEION-UHFFFAOYSA-H 0.000 description 1
- 125000003368 amide group Chemical group 0.000 description 1
- 229910021529 ammonia Inorganic materials 0.000 description 1
- XYXNTHIYBIDHGM-UHFFFAOYSA-N ammonium thiosulfate Chemical compound [NH4+].[NH4+].[O-]S([O-])(=O)=S XYXNTHIYBIDHGM-UHFFFAOYSA-N 0.000 description 1
- 239000002280 amphoteric surfactant Substances 0.000 description 1
- 125000000129 anionic group Chemical group 0.000 description 1
- 239000003945 anionic surfactant Substances 0.000 description 1
- 239000002216 antistatic agent Substances 0.000 description 1
- 125000004391 aryl sulfonyl group Chemical group 0.000 description 1
- 239000012298 atmosphere Substances 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 239000002585 base Substances 0.000 description 1
- 150000001556 benzimidazoles Chemical class 0.000 description 1
- 125000003785 benzimidazolyl group Chemical group N1=C(NC2=C1C=CC=C2)* 0.000 description 1
- AMTXUWGBSGZXCJ-UHFFFAOYSA-N benzo[e][1,3]benzoselenazole Chemical group C1=CC=C2C(N=C[se]3)=C3C=CC2=C1 AMTXUWGBSGZXCJ-UHFFFAOYSA-N 0.000 description 1
- KXNQKOAQSGJCQU-UHFFFAOYSA-N benzo[e][1,3]benzothiazole Chemical group C1=CC=C2C(N=CS3)=C3C=CC2=C1 KXNQKOAQSGJCQU-UHFFFAOYSA-N 0.000 description 1
- WMUIZUWOEIQJEH-UHFFFAOYSA-N benzo[e][1,3]benzoxazole Chemical group C1=CC=C2C(N=CO3)=C3C=CC2=C1 WMUIZUWOEIQJEH-UHFFFAOYSA-N 0.000 description 1
- IOJUPLGTWVMSFF-UHFFFAOYSA-N benzothiazole Chemical group C1=CC=C2SC=NC2=C1 IOJUPLGTWVMSFF-UHFFFAOYSA-N 0.000 description 1
- QRUDEWIWKLJBPS-UHFFFAOYSA-N benzotriazole Chemical compound C1=CC=C2N[N][N]C2=C1 QRUDEWIWKLJBPS-UHFFFAOYSA-N 0.000 description 1
- 239000012964 benzotriazole Substances 0.000 description 1
- 150000001565 benzotriazoles Chemical class 0.000 description 1
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 1
- 230000001588 bifunctional effect Effects 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- 125000004106 butoxy group Chemical group [*]OC([H])([H])C([H])([H])C(C([H])([H])[H])([H])[H] 0.000 description 1
- YCWXXRAWRPTQQL-UHFFFAOYSA-N butyl prop-2-enoate;oxiran-2-ylmethyl 2-methylprop-2-enoate;styrene Chemical compound C=CC1=CC=CC=C1.CCCCOC(=O)C=C.CC(=C)C(=O)OCC1CO1 YCWXXRAWRPTQQL-UHFFFAOYSA-N 0.000 description 1
- 239000003093 cationic surfactant Substances 0.000 description 1
- 150000001768 cations Chemical class 0.000 description 1
- 239000000460 chlorine Substances 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 125000001309 chloro group Chemical group Cl* 0.000 description 1
- AJPXTSMULZANCB-UHFFFAOYSA-N chlorohydroquinone Chemical compound OC1=CC=C(O)C(Cl)=C1 AJPXTSMULZANCB-UHFFFAOYSA-N 0.000 description 1
- 239000008119 colloidal silica Substances 0.000 description 1
- 239000000084 colloidal system Substances 0.000 description 1
- 230000001143 conditioned effect Effects 0.000 description 1
- 238000005336 cracking Methods 0.000 description 1
- 125000001995 cyclobutyl group Chemical group [H]C1([H])C([H])([H])C([H])(*)C1([H])[H] 0.000 description 1
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 1
- 238000011033 desalting Methods 0.000 description 1
- 125000004663 dialkyl amino group Chemical group 0.000 description 1
- 150000004985 diamines Chemical class 0.000 description 1
- KHAIRHLKBKSNHK-UHFFFAOYSA-L disodium hydrogen sulfite acetate Chemical compound C(C)(=O)O.S(=O)([O-])[O-].[Na+].[Na+] KHAIRHLKBKSNHK-UHFFFAOYSA-L 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- AFOSIXZFDONLBT-UHFFFAOYSA-N divinyl sulfone Chemical group C=CS(=O)(=O)C=C AFOSIXZFDONLBT-UHFFFAOYSA-N 0.000 description 1
- 239000000555 dodecyl gallate Substances 0.000 description 1
- 235000010386 dodecyl gallate Nutrition 0.000 description 1
- 229940080643 dodecyl gallate Drugs 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 239000003292 glue Substances 0.000 description 1
- 239000001307 helium Substances 0.000 description 1
- 229910052734 helium Inorganic materials 0.000 description 1
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 1
- NWVVVBRKAWDGAB-UHFFFAOYSA-N hydroquinone methyl ether Natural products COC1=CC=C(O)C=C1 NWVVVBRKAWDGAB-UHFFFAOYSA-N 0.000 description 1
- 125000002883 imidazolyl group Chemical group 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 125000001041 indolyl group Chemical group 0.000 description 1
- PNDPGZBMCMUPRI-UHFFFAOYSA-N iodine Chemical compound II PNDPGZBMCMUPRI-UHFFFAOYSA-N 0.000 description 1
- 229920000831 ionic polymer Polymers 0.000 description 1
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 1
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- FQPSGWSUVKBHSU-UHFFFAOYSA-N methacrylamide Chemical class CC(=C)C(N)=O FQPSGWSUVKBHSU-UHFFFAOYSA-N 0.000 description 1
- 125000001570 methylene group Chemical group [H]C([H])([*:1])[*:2] 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 125000002950 monocyclic group Chemical group 0.000 description 1
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000000740 n-pentyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000004123 n-propyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000001624 naphthyl group Chemical group 0.000 description 1
- 230000007935 neutral effect Effects 0.000 description 1
- 238000006386 neutralization reaction Methods 0.000 description 1
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 239000002736 nonionic surfactant Substances 0.000 description 1
- JRZJOMJEPLMPRA-UHFFFAOYSA-N olefin Natural products CCCCCCCC=C JRZJOMJEPLMPRA-UHFFFAOYSA-N 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 125000002971 oxazolyl group Chemical group 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 238000004806 packaging method and process Methods 0.000 description 1
- 125000004115 pentoxy group Chemical group [*]OC([H])([H])C([H])([H])C([H])([H])C(C([H])([H])[H])([H])[H] 0.000 description 1
- 229920002401 polyacrylamide Polymers 0.000 description 1
- 229920001223 polyethylene glycol Polymers 0.000 description 1
- 239000011591 potassium Substances 0.000 description 1
- 229910052700 potassium Inorganic materials 0.000 description 1
- 229910000027 potassium carbonate Inorganic materials 0.000 description 1
- 229910001414 potassium ion Inorganic materials 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- 125000002572 propoxy group Chemical group [*]OC([H])([H])C(C([H])([H])[H])([H])[H] 0.000 description 1
- 239000000473 propyl gallate Substances 0.000 description 1
- 229940075579 propyl gallate Drugs 0.000 description 1
- NDGRWYRVNANFNB-UHFFFAOYSA-N pyrazolidin-3-one Chemical compound O=C1CCNN1 NDGRWYRVNANFNB-UHFFFAOYSA-N 0.000 description 1
- 229940079877 pyrogallol Drugs 0.000 description 1
- 125000001453 quaternary ammonium group Chemical group 0.000 description 1
- 150000003242 quaternary ammonium salts Chemical class 0.000 description 1
- 125000002943 quinolinyl group Chemical group N1=C(C=CC2=CC=CC=C12)* 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 125000003748 selenium group Chemical group *[Se]* 0.000 description 1
- 230000008313 sensitization Effects 0.000 description 1
- ZUNKMNLKJXRCDM-UHFFFAOYSA-N silver bromoiodide Chemical compound [Ag].IBr ZUNKMNLKJXRCDM-UHFFFAOYSA-N 0.000 description 1
- HKZLPVFGJNLROG-UHFFFAOYSA-M silver monochloride Chemical compound [Cl-].[Ag+] HKZLPVFGJNLROG-UHFFFAOYSA-M 0.000 description 1
- APSBXTVYXVQYAB-UHFFFAOYSA-M sodium docusate Chemical compound [Na+].CCCCC(CC)COC(=O)CC(S([O-])(=O)=O)C(=O)OCC(CC)CCCC APSBXTVYXVQYAB-UHFFFAOYSA-M 0.000 description 1
- FZHLWVUAICIIPW-UHFFFAOYSA-M sodium gallate Chemical compound [Na+].OC1=CC(C([O-])=O)=CC(O)=C1O FZHLWVUAICIIPW-UHFFFAOYSA-M 0.000 description 1
- 235000010265 sodium sulphite Nutrition 0.000 description 1
- AKHNMLFCWUSKQB-UHFFFAOYSA-L sodium thiosulfate Chemical compound [Na+].[Na+].[O-]S([O-])(=O)=S AKHNMLFCWUSKQB-UHFFFAOYSA-L 0.000 description 1
- 235000019345 sodium thiosulphate Nutrition 0.000 description 1
- AMZPPWFHMNMIEI-UHFFFAOYSA-M sodium;2-sulfanylidene-1,3-dihydrobenzimidazole-5-sulfonate Chemical compound [Na+].[O-]S(=O)(=O)C1=CC=C2NC(=S)NC2=C1 AMZPPWFHMNMIEI-UHFFFAOYSA-M 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000003381 stabilizer Substances 0.000 description 1
- 230000003068 static effect Effects 0.000 description 1
- 150000003440 styrenes Chemical class 0.000 description 1
- 125000000626 sulfinic acid group Chemical group 0.000 description 1
- 125000000565 sulfonamide group Chemical group 0.000 description 1
- 125000004434 sulfur atom Chemical group 0.000 description 1
- 239000002344 surface layer Substances 0.000 description 1
- 229920006027 ternary co-polymer Polymers 0.000 description 1
- 150000003866 tertiary ammonium salts Chemical class 0.000 description 1
- WAGFXJQAIZNSEQ-UHFFFAOYSA-M tetraphenylphosphonium chloride Chemical compound [Cl-].C1=CC=CC=C1[P+](C=1C=CC=CC=1)(C=1C=CC=CC=1)C1=CC=CC=C1 WAGFXJQAIZNSEQ-UHFFFAOYSA-M 0.000 description 1
- 125000002769 thiazolinyl group Chemical group 0.000 description 1
- UMGDCJDMYOKAJW-UHFFFAOYSA-N thiourea group Chemical group NC(=S)N UMGDCJDMYOKAJW-UHFFFAOYSA-N 0.000 description 1
- ZIBGPFATKBEMQZ-UHFFFAOYSA-N triethylene glycol Chemical compound OCCOCCOCCO ZIBGPFATKBEMQZ-UHFFFAOYSA-N 0.000 description 1
- VSRBKQFNFZQRBM-UHFFFAOYSA-N tuaminoheptane Chemical compound CCCCCC(C)N VSRBKQFNFZQRBM-UHFFFAOYSA-N 0.000 description 1
- 229960003986 tuaminoheptane Drugs 0.000 description 1
- XSQUKJJJFZCRTK-UHFFFAOYSA-N urea group Chemical group NC(=O)N XSQUKJJJFZCRTK-UHFFFAOYSA-N 0.000 description 1
- 239000002966 varnish Substances 0.000 description 1
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は、プラスチックフィルム支持体用の帯電防止層
に関し、特に帯電防止能の優れたノ10ゲン化銀写真感
光材料に関する。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to an antistatic layer for a plastic film support, and more particularly to a silver 10 degenide photographic light-sensitive material having excellent antistatic ability.
一般にプラスチイックフィルム支持体は、帯電性が強く
、これが使用上多くの制約を与えている例は多い。例え
ばハロゲン化銀写真感光材料においてはポリエチレンテ
レフタレートのような支持体が一般に使用されるが1、
特に冬季の如き低湿度において帯電し易い。最近のよう
に高感度写真乳剤を高速度で塗布したり、高感度の感光
材料を自動プリンターを通して露光処理をする場合、特
に帯電防止対策が重要である。Generally, plastic film supports have strong electrostatic properties, and this often imposes many restrictions on their use. For example, supports such as polyethylene terephthalate are generally used in silver halide photographic materials.
It is easy to be charged especially in low humidity such as winter. Antistatic measures are especially important when high-speed photographic emulsions are coated at high speeds or when high-sensitivity photosensitive materials are exposed to light using automatic printers, as has been the case recently.
感光材料が帯電すると、その放電によりスタチックマー
クがでたり、またはゴミ等の異物を付着し、これにより
ピンホールを発生させたりして著しく品質を劣化し、そ
の修正のため非常に作業性をおとしてしまう。このため
、一般に感光材料では帯電防止剤が使用され、最近では
、含フツ素界面活性剤、カチオン界面活性剤、両性界面
活性剤、ポリエチレンオキサイド基を含有する界面活性
剤ないし高分子化合物、スルホン酸又はリン酸基を分子
内に有するポリマー等が用いられている。When a photosensitive material is charged, static marks appear due to the discharge, or foreign matter such as dust adheres to it, which causes pinholes and significantly degrades the quality, making it extremely difficult to repair. I'll put it down. For this reason, antistatic agents are generally used in photosensitive materials, and recently, fluorine-containing surfactants, cationic surfactants, amphoteric surfactants, surfactants or polymer compounds containing polyethylene oxide groups, and sulfonic acid Alternatively, a polymer having a phosphoric acid group in the molecule is used.
特に7ツ素系界面活性剤による帯電列調整、あるいは導
電性ポリマーによる導電性向上が多゛く使用されてきて
おり、例えば特開昭49−91165号および同49−
121523号にはポリマー主鎖中に解離基を有するイ
オン型ポリマーを適用する例が開示されている。In particular, adjustment of the charge series using a heptadium-based surfactant or improvement of conductivity using a conductive polymer has been widely used, for example, in JP-A-49-91165 and JP-A-49-91165.
No. 121523 discloses an example in which an ionic polymer having a dissociative group in the polymer main chain is applied.
しかしながら、これらの従来技術では、現像処理により
、帯電防止能が大幅に劣化してしまう。However, in these conventional techniques, the antistatic ability is significantly deteriorated by the development process.
これはアルカリを用いる現像工程、酸性の定着工程、水
洗等の工程を経ることにより帯電防止能が失われるもの
と思われる。したがって印刷感光材料等のように、処理
済みフィルムをさらに用いてプリントするような場合に
、ゴミの付着によるピンホール発生等の問題を生ずる。This is thought to be because the antistatic ability is lost through processes such as a developing process using an alkali, an acidic fixing process, and washing with water. Therefore, when a processed film is further used for printing, such as with printing photosensitive materials, problems such as pinholes occur due to adhesion of dust.
このため例えば特開昭55−84658号、同61−1
74542号ではカルボキシル基を有する水溶性導電性
ポリマー カルボキシル基を有する疎水性ポリマー及び
多官能アジリジンからなる帯電防止層が提案されている
。この方法によれば処理後にも帯電防止能を残すことが
できるが、尚透明性の面では不充分である。For this reason, for example, JP-A Nos. 55-84658 and 61-1
No. 74542 proposes an antistatic layer comprising a water-soluble conductive polymer having a carboxyl group, a hydrophobic polymer having a carboxyl group, and a polyfunctional aziridine. Although this method allows antistatic properties to remain after treatment, it is still insufficient in terms of transparency.
さらに、この帯電防止層を有するプラスチックフィルム
支持体に、テトラゾリウム化合物またはヒドラジン化合
物を使った超硬調化乳剤を適用した場合、経時保存で減
感する欠点を有することが分かった。Furthermore, it has been found that when an ultra-high contrast emulsion using a tetrazolium compound or a hydrazine compound is applied to a plastic film support having this antistatic layer, it has the disadvantage of desensitization during storage over time.
上記のような問題に対し、本発明の目的は透明性に優れ
たヘーズの無い帯電防止層を有するハロゲン化銀写真感
光材料を提供することであり、さらに別の目的はテトラ
ゾリウム化合物またはヒドラジン化合物を使用した場合
でも帯電防止能に優れ、経時で減感せず安定性の高いハ
ロゲン化銀写真感光材料を提供することである。In order to solve the above problems, an object of the present invention is to provide a silver halide photographic material having an antistatic layer with excellent transparency and no haze.A further object of the present invention is to provide a silver halide photographic material having an antistatic layer with excellent transparency and no haze. It is an object of the present invention to provide a silver halide photographic light-sensitive material which has excellent antistatic ability even when used and is highly stable without desensitization over time.
本発明の上記目的は、■水溶性導電性ポリマー■疎水性
ポリマー粒子、■硬化剤の反応生成物からなる帯電防止
層を有してなるプラスチックフィルム支持体において、
該疎水性ポリマー粒子が置換アジリジン基含有のラテッ
クスとして帯電防止層中に分散安定化されていることを
特徴とする帯電防止層を有するハロゲン化銀写真感光材
料により達成される。The above object of the present invention is to provide a plastic film support having an antistatic layer consisting of a reaction product of (1) a water-soluble conductive polymer, (2) hydrophobic polymer particles, and (2) a curing agent.
This is achieved by a silver halide photographic material having an antistatic layer characterized in that the hydrophobic polymer particles are dispersed and stabilized in the antistatic layer as a latex containing a substituted aziridine group.
尚、本発明の感光性乳剤層中に、テトラゾリウム化合物
またはヒドラジン化合物を含有することが望ましい。Incidentally, it is desirable that the photosensitive emulsion layer of the present invention contains a tetrazolium compound or a hydrazine compound.
以下、本発明の詳細について説明する。The details of the present invention will be explained below.
本発明の水溶性導電性ポリマーは、単独で使用すること
によっても透明な層を形成し得るが、少しの乾燥条件の
ブレによって層のひび割れを引き起こしてしまう。本発
明の構成ではそのひび割れを防ぐために疎水性ポリマー
粒子を含有しているが、その効果は大きい。Although the water-soluble conductive polymer of the present invention can form a transparent layer when used alone, a slight fluctuation in drying conditions may cause cracks in the layer. The structure of the present invention contains hydrophobic polymer particles to prevent cracking, and the effect is significant.
本発明の請求項1記載の水溶性導電性ポリマーについて
は、スルホン酸基、硫酸エステル基、4級アンモニウム
塩、3級アンモニウム塩、カルボキシル基、ポリエチレ
ンオキシド基から選ばれる少なくとも1つの導電性基を
有するポリマーが挙げられる。これらの基のうちスルホ
ン酸基、硫酸エステル基、4級アンモニウム塩基が好ま
しい。The water-soluble conductive polymer according to claim 1 of the present invention has at least one conductive group selected from a sulfonic acid group, a sulfuric acid ester group, a quaternary ammonium salt, a tertiary ammonium salt, a carboxyl group, and a polyethylene oxide group. Examples include polymers with Among these groups, sulfonic acid groups, sulfuric acid ester groups, and quaternary ammonium bases are preferred.
導電性基はポリマー1分子当たり5重量%以上を必要と
する。水溶性の導電性ポリマー中に含まれるカルボキシ
基、ヒドロキシ基、アミノ基、エポキシ基、アジリジン
基、活性メチレン基、スルフィン酸基、アルデヒド基、
ビニルスルホン基のうち、カルボキシ基、ヒドロキシ基
、アミノ基、エポキシ基、アジリジン基、アルデヒド基
が好ましい。The amount of conductive groups required is 5% by weight or more per polymer molecule. Carboxy groups, hydroxy groups, amino groups, epoxy groups, aziridine groups, active methylene groups, sulfinic acid groups, aldehyde groups contained in water-soluble conductive polymers,
Among vinyl sulfone groups, carboxy groups, hydroxy groups, amino groups, epoxy groups, aziridine groups, and aldehyde groups are preferred.
これらの基はポリマー1分子当たり5重量%以上必要と
する。ポリマーの分子量は、3000〜100000で
あり、好ましくは3500〜50000である。These groups are required in an amount of 5% by weight or more per polymer molecule. The molecular weight of the polymer is 3,000 to 100,000, preferably 3,500 to 50,000.
以下、本発明に用いられる水溶性導電性ポリマーの化合
物例を挙げるがこれに限定されるものではない。Examples of water-soluble conductive polymer compounds used in the present invention are listed below, but the present invention is not limited thereto.
A−1ホモポリマー −2 ホモポリマ− 3 −5 SO,Na 5O8Na −7 −9 −10 1 ff 2 A −13 CH。A-1 homopolymer -2 homopolymer 3 -5 SO, Na 5O8Na -7 -9 -10 1 ff 2 A-13 CH.
So、K 4 CHzO503Na −15 CH。So, K 4 CHzO503Na -15 CH.
−17 A −19 A−20 −21 2 M#1万 M辱1.5万 3 デキストランサル7エイ ト 置換度 2.0 M −10万 4 5 −26 So 3Na −27 8 o3Na 9 −30 −31 2 −33 03Na −34 So 、 Na A −35 A−36 −37 8 9 −40 −41 −42 SO,Na M″41万 M#3万 3 −44 −45 6 CH。−17 A-19 A-20 -21 2 M#10,000 M humiliation 15,000 3 Dextranthal 7ei to Degree of substitution 2.0 M - 100,000 4 5 -26 So3Na -27 8 o3Na 9 -30 -31 2 -33 03Na −34 So, Na A-35 A-36 -37 8 9 -40 -41 -42 SO, Na M″410,000 M#30,000 3 -44 -45 6 CH.
x:y:z:w−40:30:20:10M″q5万
−47
−48
−49
−50
M#5万
尚、上記(1)〜(50)において、x、y、zはそれ
ぞれ単量体成分のモル%を、又Mは平均分子量(本明細
書中、平均分子量とは数平均分子量を示す。)を表す。x:y:z:w-40:30:20:10M″q50,000-47-48-49-50 M#50,000In addition, in (1) to (50) above, x, y, and z are each a single unit. M represents the mol% of the mer components, and M represents the average molecular weight (in this specification, the average molecular weight refers to the number average molecular weight).
これらのポリマーは市販又は常法によって得られる七ツ
マ−を重合することにより脅威することが出来る。これ
らの化合物の添加量はO,O1g= lQg/m2が好
ましく、特に好ましくは0.1g〜5g/m’である。These polymers can be prepared by polymerizing heptamers which are commercially available or obtained by conventional methods. The amount of these compounds added is preferably O, O1g=1Qg/m2, particularly preferably 0.1g to 5g/m'.
次に本発明の水溶性導電性ポリマー層中に含有させる疎
水性ポリマー粒子は、実質的に水に溶解しない所謂ラテ
ックス状で含有されている。この疎水性ポリマーは、ス
チレン、スチレン誘導体、アルキルアクリレート、アル
キルメタクリレート、オレフィン誘導体、ハロゲン化エ
チレン誘導体、アクリルアミド誘導体、メタクリルアミ
ド誘導体、ヒニルエステル誘導体、アクリロニトリル等
の中から任意の組み合わせで選ばれた七ツマ−を重合し
て得られる。特に置換されたアジリジン基を有する七ツ
マ−が少なくとも0.1モル%含有されているのが好ま
しい。特に0.5モル%以上が好ましい。Next, the hydrophobic polymer particles contained in the water-soluble conductive polymer layer of the present invention are contained in a so-called latex form that is substantially insoluble in water. This hydrophobic polymer is made of seven polymers selected from styrene, styrene derivatives, alkyl acrylates, alkyl methacrylates, olefin derivatives, halogenated ethylene derivatives, acrylamide derivatives, methacrylamide derivatives, hinyl ester derivatives, acrylonitrile, etc. in any combination. Obtained by polymerizing. In particular, it is preferable that at least 0.1 mol % of a heptamine having a substituted aziridine group is contained. Particularly preferred is 0.5 mol% or more.
疎水性ポリマーをラテックス状にするには乳化重合をす
る、固体状のポリマーを低沸点溶媒に溶かして微分散後
、溶媒を留去するという2つの方法があるが粒径が細か
く、しかもそろったものができるという点で乳化重合す
ることが好ましい。There are two methods to make a hydrophobic polymer into a latex form: emulsion polymerization, or dissolving a solid polymer in a low boiling point solvent, finely dispersing it, and then distilling off the solvent. Emulsion polymerization is preferable because it can produce a product.
乳化重合の際に用いる界面活性剤としては、アニオン性
、ノニオン性を用いるのが好ましく、モノマーに対し1
0重量%以下が好ましい。多量の界面活性剤は導電性層
をくもらせる原因となる。As the surfactant used during emulsion polymerization, it is preferable to use an anionic or nonionic surfactant.
It is preferably 0% by weight or less. A large amount of surfactant causes clouding of the conductive layer.
疎水性ポリマーの分子量は3000以上であれば良く、
分子量による透明性の差はほとんどない。The molecular weight of the hydrophobic polymer may be 3000 or more,
There is almost no difference in transparency depending on molecular weight.
本発明の疎水性ポリマーの具体例を挙げる。Specific examples of the hydrophobic polymer of the present invention will be given below.
−5 −6 −8 −9 H 2 −13 CH。-5 -6 -8 -9 H 2 -13 CH.
4 CH。4 CH.
5
本発明では導電性層が透明支持体上に塗設される。透明
支持体は写真用のものを全て使えるが好ましくは、可視
光を90%以上透過するように作られたポリエチレンテ
レフタレート又はセルローストリアセテートである。5 In the present invention, a conductive layer is coated on a transparent support. Although any photographic transparent support can be used, polyethylene terephthalate or cellulose triacetate, which is made to transmit 90% or more of visible light, is preferable.
これらの透明支持体は、当業者に良く知られた方法で作
成されるものであるが、場合によっては光透過を実質的
に阻害しないように染料を若干添加して青味付けしたり
しても良い。These transparent supports are prepared by methods well known to those skilled in the art, but in some cases, a slight amount of dye may be added to give them a blue tint so as not to substantially inhibit light transmission. good.
本発明の支持体は、コロナ放電処理をした後ラテックス
ポリマーを含有する下引層が塗設されていてもよい。コ
ロナ放電処理は、エネルギー値として1 mW −1k
W/m2m1nが特に好ましく適用される。The support of the present invention may be coated with a subbing layer containing a latex polymer after being subjected to a corona discharge treatment. Corona discharge treatment has an energy value of 1 mW −1k
W/m2m1n is particularly preferably applied.
又特に好ましくは、ラテックス下引層塗布後導電性層を
塗設する前にコロナ放電処理を再度行うと良い。Particularly preferably, corona discharge treatment is performed again after applying the latex undercoat layer and before applying the conductive layer.
本発明の導電性層を硬化する化合物としては、多官能の
アジリジンが好ましい。特に2官能、3官能で分子量が
600以下のものが好ましい。As the compound for curing the conductive layer of the present invention, polyfunctional aziridine is preferred. Particularly preferred are those having bifunctional or trifunctional properties and a molecular weight of 600 or less.
本発明の導電性層は感光性層より支持体側にあってもよ
いし、
感光層に対し支持体の反対側、
いわ
本発明に用いられるヒドラジン化合物は、好ましくは下
記一般式(H)で表される化合物である。The conductive layer of the present invention may be located closer to the support than the photosensitive layer, or the hydrazine compound used in the present invention may be located on the opposite side of the support from the photosensitive layer. It is a compound that is
一般式(H)
QI Ql Xl
1
R,−N −N −C−R2
式中、R1は1価の有機残基を表し、R2は水素原子ま
たは1価の有機残基を表し、Ql及びQ2は水素原子、
アルキルスルホニル基(置換基を有するものも含む)、
アリールスルホニル基(置換基を有するものも含む)を
表し、xlは酸素原子またはイオウ原子を表す。一般式
〔I]〕で表される化合物のうち、Xlが酸素原子であ
り、かつR2が水素原子である化合物が更に好ましい。General formula (H) QI Ql Xl 1 R, -N -N -C-R2 In the formula, R1 represents a monovalent organic residue, R2 represents a hydrogen atom or a monovalent organic residue, and Ql and Q2 is a hydrogen atom,
Alkylsulfonyl group (including those with substituents),
It represents an arylsulfonyl group (including one having a substituent), and xl represents an oxygen atom or a sulfur atom. Among the compounds represented by the general formula [I], compounds in which Xl is an oxygen atom and R2 is a hydrogen atom are more preferred.
上記R1及びR2の1価の有機残基としては、芳香族残
基、複素環残基及び脂肪族残基が包含される。The monovalent organic residues for R1 and R2 include aromatic residues, heterocyclic residues, and aliphatic residues.
芳香族残基としては、フェニル基、ナフチル基及びこれ
らに置換基(例えばアルキル基、アルコキシ基、アシル
ヒドラジノ基、ジアルキルアミノ基、アルコキシカルボ
ニル基、シアノ基、カルボキシ基、ニトロ基、アルキル
チオ基、ヒドロキシ基、スルホニル基、カルバモイル基
、ハロゲン原子、アシルアミノ基、スルホンアミド基、
ウレア基、チオウレア基など)のついたものを含む。置
換基のついたものの具体例として、例えば、4−メチル
フェニル基、4−エチルフェニルM、4−オキシエチル
フェニル基、4−)’デシルフェニル基、4−カルボキ
シフェニル基、4−ジエチルアミノフェニル!、4−オ
クチルアミノフェニル基、4−ベンジルアミノフェニル
基、4−アセトアミド−2−メチルフェニル基、4−(
3−エチルチオウレイド)フェニル基、4−[2−(2
,4−ジーtert−ブチルフェノキシ)ブチルアミド
]フェニル基、4−[2−(2,4ジーtert−ブチ
ルフェノキシ)ブチルアミド】フェニル基などを挙げる
ことができる。Aromatic residues include phenyl groups, naphthyl groups, and substituents thereof (for example, alkyl groups, alkoxy groups, acylhydrazino groups, dialkylamino groups, alkoxycarbonyl groups, cyano groups, carboxy groups, nitro groups, alkylthio groups, and hydroxy groups). , sulfonyl group, carbamoyl group, halogen atom, acylamino group, sulfonamide group,
urea group, thiourea group, etc.). Specific examples of those with substituents include 4-methylphenyl group, 4-ethylphenyl M, 4-oxyethylphenyl group, 4-)'decylphenyl group, 4-carboxyphenyl group, 4-diethylaminophenyl! , 4-octylaminophenyl group, 4-benzylaminophenyl group, 4-acetamido-2-methylphenyl group, 4-(
3-ethylthioureido) phenyl group, 4-[2-(2
, 4-di-tert-butylphenoxy)butyramide] phenyl group, and 4-[2-(2,4-di-tert-butylphenoxy)butyramide] phenyl group.
複素環残基としては、酸素、窒素、硫黄、またはセレン
原子のうち少なくとも一つを有する五員もしくは六員の
単環または縮合環で、これらに置換基がついてもよい。The heterocyclic residue is a five- or six-membered monocyclic ring or fused ring having at least one of oxygen, nitrogen, sulfur, or selenium atoms, and a substituent may be attached thereto.
具体的には例えば、ビロリン環、ピリジン環、キノリン
環、インドール環、オキサゾール環、ベンゾオキサゾー
ル環、ナフトオキサゾール環、イミダゾール環、ベンゾ
イミダゾール環、チアゾリン環、チアゾール環、ベンゾ
チアゾール環、ナフトチアゾール環、セレナゾール環、
ベンゾセレナゾール環、ナフトセレナゾール環などの残
基を挙げることが出来る。Specifically, for example, biroline ring, pyridine ring, quinoline ring, indole ring, oxazole ring, benzoxazole ring, naphthoxazole ring, imidazole ring, benzimidazole ring, thiazoline ring, thiazole ring, benzothiazole ring, naphthothiazole ring, selenazole ring,
Examples include residues such as a benzoselenazole ring and a naphthoselenazole ring.
これらの複素環は、メチル基、エチル基等炭素数1〜4
のアルキル基、メトキシ基、エトキシ基等jl[l[1
〜4のアルコキシ基、フェニル基等の炭素数6〜18の
アリール基や、クロル、ブロム等のハロゲン原子、アル
コキシカルボニル基、゛シアノ基、アミノ基等で置換さ
れていてもよい。These heterocycles have 1 to 4 carbon atoms, such as a methyl group or an ethyl group.
Alkyl group, methoxy group, ethoxy group etc.jl[l[1
-4 alkoxy groups, aryl groups having 6 to 18 carbon atoms such as phenyl groups, halogen atoms such as chloro and bromine, alkoxycarbonyl groups, cyano groups, amino groups, etc. may be substituted.
脂肪族残基としては、直鎖及び分岐のアルキル基、シク
ロアルキル基及びこれらに置換基のついたもの、並びに
アルケニル基及びアルキニル基を含む。Aliphatic residues include linear and branched alkyl groups, cycloalkyl groups, and those with substituents, as well as alkenyl groups and alkynyl groups.
直鎖及び分岐のアルキル基としては、例えば炭素数1−
18、好ましくは1〜8のアルキル基であって、具体的
には例えばメチル基、エチル基、イソブチル基、l−オ
クチル基等である。Straight-chain and branched alkyl groups include, for example, carbon atoms with 1-
18, preferably an alkyl group of 1 to 8, and specific examples include a methyl group, ethyl group, isobutyl group, l-octyl group, and the like.
シクロアルキル基としては、例えば炭素数3〜IOのも
ので、具体的には例えばシクロプロピル基、ンクロヘキ
シル基、アダマンチル基等である。アルキル基やシクロ
アルキル基に対する置換基としてはアルコキシ基(例え
ばメトキシ基、エトキシ基、プロポキシ基、ブトキシ基
等)、アルコキシカルボニル基、カルバモイル基、ヒド
ロキシ基、アルキルチオ基、アミド基、アシロキシ基、
シアノ基、スルホニル基、ハロゲン原子(例えば塩素、
臭素、弗素、沃素など)、アリール基(例えばフェニル
基、ハロゲン置換フェニル基、アルキル置換フェニル基
)等であり、置換されたものの具体例としては例えば3
−メトキシグロビル基、エトキシカルボニルメチル基、
4−クロロシクロヘキシル基、ベンジル基、p−メチル
ベンジル基、p−クロロベンジル基などを挙げることが
できる。また、アルケニル基としては例えばアリル(a
llyl)基、アルキニル基としては例えばプロパルギ
ル基を挙げることができる。Examples of the cycloalkyl group include those having 3 to 10 carbon atoms, such as a cyclopropyl group, a nclohexyl group, and an adamantyl group. Substituents for alkyl groups and cycloalkyl groups include alkoxy groups (e.g. methoxy, ethoxy, propoxy, butoxy, etc.), alkoxycarbonyl groups, carbamoyl groups, hydroxy groups, alkylthio groups, amide groups, acyloxy groups,
Cyano group, sulfonyl group, halogen atom (e.g. chlorine,
bromine, fluorine, iodine, etc.), aryl groups (e.g., phenyl group, halogen-substituted phenyl group, alkyl-substituted phenyl group), etc. Specific examples of substituted groups include 3
-methoxyglobil group, ethoxycarbonylmethyl group,
Examples include 4-chlorocyclohexyl group, benzyl group, p-methylbenzyl group, and p-chlorobenzyl group. In addition, examples of alkenyl groups include allyl (a
Examples of the alkynyl group and the alkynyl group include a propargyl group.
本発明のヒ ドラジン化合物の好ましい具体例を 以下に示すが、 本発明は何等これによって限定さ れるものでは′ない。The present invention Preferred specific examples of dorazine compounds As shown below, The invention is in no way limited thereby. It's not something you can do.
− −2 − −4 − 6 − −10 −13 −14 H−16 −18 −19 1■ 20 −21 −22 −23 −24 −25 CH。− -2 − -4 − 6 − -10 -13 -14 H-16 -18 -19 1■ 20 -21 -22 -23 -24 -25 CH.
H3
I]
26
0
1
4
しI′I3
5
7
+(−38
−39
Csl(++(L)
−40
−41
−42
−43
しn3
44
I]
5
−46
一般式(H)で表わされるヒドラジン化合物の添加位置
はハロゲン化銀乳剤層及び/まl;は支持体上のハロゲ
ン化銀乳剤層側にある非感光層であるが、好ましくは、
ハロゲン化銀乳剤層及び/またはその下層である。添加
量は、10−’−10−’モル/銀1モルが好ましく、
更に好ましくはio−’〜102モル/銀1モルである
。H3 I] 26 0 1 4 I'I3 5 7 +(-38 -39 Csl(++(L) -40 -41 -42 -43 n3 44 I] 5 -46 Hydrazine represented by general formula (H) The compound is added to the silver halide emulsion layer and/or the non-photosensitive layer on the side of the silver halide emulsion layer on the support, but preferably,
The silver halide emulsion layer and/or its lower layer. The amount added is preferably 10-'-10-' mole/1 mole of silver,
More preferably, it is io-' to 102 moles/1 mole of silver.
次に本発明に用いられるテトラゾリウム化合物について
説明する。Next, the tetrazolium compound used in the present invention will be explained.
テトラゾリウム化合物は下記一般式で示すことができる
。The tetrazolium compound can be represented by the following general formula.
一般式(T)
本発明において、上記一般式(T)で示されるトリフェ
ニルテトラゾリウム化合物のフェニル基の置換基R1、
R3、R1は水素原子もしくは電子吸引仕度を示すハメ
ットのシグマ値(yP)が負又は正のものが好ましい。General formula (T) In the present invention, substituent R1 of the phenyl group of the triphenyltetrazolium compound represented by the above general formula (T),
R3 and R1 are preferably hydrogen atoms or those having a negative or positive Hammett's sigma value (yP) indicating the ability to attract electrons.
特に負のものが好ましい。In particular, negative ones are preferred.
フェニル置換におけるハメットのシグマ値は多くの文献
、例えばジャーナル・オプ・メディカルケ ミ ス
ト リ − (Journal of
Medical Chemistry)第20
巻、304頁、1977年、記載のC,ノ\ンシュ(C
。Hammett's sigma values for phenyl substitution have been reported in many publications, such as the Journal of Medical Chemistry.
Medical Chemistry) No. 20
Volume, 304 pages, 1977, C.
.
Hansch)等の轍叉等に見ることが出来、とくに好
ましい負のシグマ値を有する基としては、例えばメチル
基(σP−−0.17以下いずれもσP値)エチル基(
−0,15)、シクロプロピル基(−0,21)、n−
プロピル基(−0,13)、isoプロピル基(−0,
15)、シクロブチル基(−0,15)、n−ブチル基
(−0,16)、1sO−ブチル基(−0,20)、n
−ペンチル基(−0,15)、シクロヘキシル基(−0
,22)、アミ7基(、−0,66)、アセチルアミノ
基(−0,15)、ヒドロキシル基(−0,37)、メ
トキシ基(−0,27)、エトキシ基(−0,24)、
プロポキシ基(−0,25)、ブトキシ基(−0,32
)、ペントキシ基(−0,34)等が挙げられ、これら
はいずれも本発明の一般式(T)の化合物の置換基とし
て有用である。Particularly preferable groups having negative sigma values include, for example, methyl groups (σP--0.17 or less, all σP values), ethyl groups (
-0,15), cyclopropyl group (-0,21), n-
Propyl group (-0,13), isopropyl group (-0,
15), cyclobutyl group (-0,15), n-butyl group (-0,16), 1sO-butyl group (-0,20), n
-pentyl group (-0,15), cyclohexyl group (-0
,22), ami7 group (,-0,66), acetylamino group (-0,15), hydroxyl group (-0,37), methoxy group (-0,27), ethoxy group (-0,24) ),
Propoxy group (-0,25), butoxy group (-0,32
), pentoxy group (-0,34), and the like, all of which are useful as substituents for the compound of general formula (T) of the present invention.
以下本発明に用いられる一般式〔T〕の化合物の具体例
を挙げるが、本発明の化合物はこれに限定されるもので
は無い。Specific examples of the compound of the general formula [T] used in the present invention are listed below, but the compounds of the present invention are not limited thereto.
(例示化合物)
本発明に用いられるテトラゾリウム化合物は、例えばケ
ミカル・レビュー (Chamical Raviaw
s)第55巻、第335頁〜483頁に記載の方法に従
って容易に合成することができる。(Exemplary Compounds) The tetrazolium compounds used in the present invention are described, for example, in Chemical Raviaw.
s) It can be easily synthesized according to the method described in Vol. 55, pp. 335-483.
本発明のテトラゾリウム化合物は、本発明のハロゲン化
銀写真感光材料中に含有されるハロゲン化la1モル当
り約1mg以上10gまで、好ましくは約1mg以上約
2gまでの範囲で用いられるのが好ましい。The tetrazolium compound of the present invention is preferably used in an amount of about 1 mg to about 10 g, preferably about 1 mg to about 2 g, per mole of la halide contained in the silver halide photographic light-sensitive material of the present invention.
本発明の感光材料に用いるハロゲン化銀乳剤には、ハロ
ゲン化銀として、臭化銀、塩化銀、沃臭化銀、塩臭化銀
、塩沃臭化銀等の通常のハロゲン化銀乳剤に使用される
任意のものを用いる事ができ、ハロゲン化銀粒子は、酸
性法、中性法及びアンモニア法のいずれで得られたもの
でもよい。The silver halide emulsion used in the light-sensitive material of the present invention includes conventional silver halide emulsions such as silver bromide, silver chloride, silver iodobromide, silver chlorobromide, and silver chloroiodobromide. Any commonly used silver halide grains can be used, and the silver halide grains may be those obtained by any of the acid method, neutral method, and ammonia method.
ハロゲン化銀粒子は、粒子内において均一なハロゲン化
銀組成分布を有するものでも、粒子の内部と表面層とで
ハロゲン化銀組成が異なるコア/シェル粒子であっても
よく、潜像が主として表面に形成されるような粒子であ
っても、又主として粒子内部に形成されるような粒子で
もよい。Silver halide grains may have a uniform silver halide composition distribution within the grain, or may be core/shell grains in which the silver halide composition differs between the inside and surface layer of the grain, and the latent image is mainly on the surface. It may be a particle that is formed inside the particle, or it may be a particle that is formed mainly inside the particle.
本発明に用いられるハロゲン化銀乳剤は、例えば米国特
許第2.444,607号、同第2.716.062号
、同第3.5121,982号、西独国出願公告第1.
189.380号、同第2.058.626号、同第2
.118.411号、特公昭43−4133号、米国特
許第3.342.596号、特公昭47−4417号、
西独国出願公告第2,149.789号、特公昭39−
2825号、特公昭49−13566号等の各明細書又
は公報に記載されている化合物、好ましくは、例えば5
゜6−ドリメチレンー7−ヒドロキシンーs−トリアゾ
ロ (1,5−a)ピリミジン、5.6−チトラメチレ
ンー7−ヒドロキシーs−トリアゾロ (1,5−a)
ピリミジン、5−メチル−7−ヒドロキシ−5−トリア
ゾロ(1,5−a)ピリミジン、5−メチル−7−ヒド
ロキシS−トリアゾロ (1,5−a)ピリミジン、7
−ヒドロキシン−5−トリアシロン(1,5−a)ピリ
ミジン、5−メチル−6−プロモーフ−ヒドロキシ−S
−トリアゾロ(1,5−a)ピリミジン、没食子酸エス
テル(例えば没食子酸イソアミル、没食子酸ドデシル、
没食子酸プロピル、没食子酸ナトリウム)、メルカプタ
ン類(l−フェニル−5−メルカプトテトラゾール、2
−メルカプトベンツチアゾール)、ベンゾトリアゾール
類(5−ブロムベンツトリアゾール、5−メチルベンツ
トリアゾール)、ベンツイミダゾール類(6−ニドロベ
ンツイミタソール)等t−用t、’て安定化することが
できる。The silver halide emulsion used in the present invention can be used, for example, in U.S. Pat. No. 2,444,607, U.S. Pat.
No. 189.380, No. 2.058.626, No. 2
.. 118.411, Japanese Patent Publication No. 43-4133, U.S. Patent No. 3.342.596, Japanese Patent Publication No. 47-4417,
West German Application Publication No. 2,149.789, Special Publication No. 1973-
Compounds described in specifications or publications such as No. 2825 and Japanese Patent Publication No. 49-13566, preferably, e.g.
゜6-drimethylene-7-hydroxyne-s-triazolo (1,5-a) pyrimidine, 5,6-titramethylene-7-hydroxy-s-triazolo (1,5-a)
Pyrimidine, 5-methyl-7-hydroxy-5-triazolo(1,5-a)pyrimidine, 5-methyl-7-hydroxyS-triazolo(1,5-a)pyrimidine, 7
-Hydroxyne-5-triacylon(1,5-a)pyrimidine, 5-methyl-6-promorph-hydroxy-S
- triazolo(1,5-a)pyrimidine, gallic acid ester (e.g. isoamyl gallate, dodecyl gallate,
propyl gallate, sodium gallate), mercaptans (l-phenyl-5-mercaptotetrazole, 2
-Mercaptobenzthiazole), benzotriazoles (5-bromobenztriazole, 5-methylbenztriazole), benzimidazoles (6-nidrobenzimitazole), etc. can be stabilized.
本発明に係るハロゲン化銀写真感光材料及び/又は現像
液中には、アミノ化合物を含有することができる。The silver halide photographic material and/or developer according to the present invention may contain an amino compound.
又現像性を高めるために、フェニドンやノ\イドロキノ
ンのような現像主薬、ベンゾトリアゾールのような抑制
剤を乳剤側に含有せしめることができる。或いは処理液
の処理能力を上げるために、バッキング層に現像主薬や
抑制剤を含有せしめることができる。Further, in order to improve the developability, a developing agent such as phenidone or nohydroquinone, or an inhibitor such as benzotriazole can be contained in the emulsion. Alternatively, in order to increase the processing ability of the processing solution, the backing layer may contain a developing agent or an inhibitor.
本発明に特に有利に用いられる親水性コロイドはゼラチ
ンである。A hydrophilic colloid used with particular advantage in the present invention is gelatin.
本発明に用いられるゼラチンは、アルカリ処理、酸処理
いずれも用いることが出来るが、オセインゼラチンを用
いる場合にはカルシウム或いは鉄分を取り除くことが好
ましい。好ましい含有量としてカルシウム分は1〜99
9ppmであるが、更に好ましくはl”500ppmで
あり、鉄分は0.001−50ppが好ましく、更に好
ましくは0.1〜lOppmである。このようにカルシ
ウム分や鉄分の量を調節する方法は、ゼラチン水溶液を
イオン交換装置に通すことにより達成することができる
。The gelatin used in the present invention can be treated with either alkali treatment or acid treatment, but when using ossein gelatin, it is preferable to remove calcium or iron. The preferred calcium content is 1-99
9ppm, more preferably 500ppm, and iron content is preferably 0.001-50ppm, more preferably 0.1-1Oppm.The method for adjusting the amount of calcium and iron in this way is as follows: This can be achieved by passing an aqueous gelatin solution through an ion exchange device.
本発明に係るハロゲン化銀写真感光材料の現像に用いら
れる現像主薬としてはカテコール、ピロガロール及びそ
の誘導体ならびにアスコルビン酸、クロロハイドロキノ
ン、ブロモハイドロキノン、メチルハイドロキノン、2
.3−ジブロモ/翫イドロキノン、2.5−ジエチルハ
イドロキノン、カテコール、4−クロロカテコール、4
−フェニル−カテコール、3−メトキシ−カテコール、
4−アセチル−ピロガロール、アスコルビン酸ソーダ等
がある。Developing agents used in developing the silver halide photographic material according to the present invention include catechol, pyrogallol and its derivatives, ascorbic acid, chlorohydroquinone, bromohydroquinone, methylhydroquinone, 2
.. 3-dibromo/hydroquinone, 2,5-diethylhydroquinone, catechol, 4-chlorocatechol, 4
-phenyl-catechol, 3-methoxy-catechol,
Examples include 4-acetyl-pyrogallol and sodium ascorbic acid.
又、HO−(CH−CI)、 −NHz型現像剤として
は、オルト及びバラのアミノフェノールが代表的なもの
で、4−アミノフェノール、2−アミノ−6−フェニル
フェノール、2−アミノ−4−クロロ−6−フェニルフ
ェノール、N−メチル−p−アミノフェニール等がある
。Further, as the HO-(CH-CI), -NHz type developer, ortho and rose aminophenols are typical, and 4-aminophenol, 2-amino-6-phenylphenol, 2-amino-4 -chloro-6-phenylphenol, N-methyl-p-aminophenyl, and the like.
更に、H,N−(CH−CH)、−NH2型現像剤とし
ては例えば4−アミノ−2−メチル−N、N−ジエチル
アニリン、2.4−ジアミノ−N、N−ジエチルアニリ
ン、N−(4−アミノ−3−メチルフェニル)−七ルホ
リン、p−7zニレンジアミン等がある。Furthermore, examples of H,N-(CH-CH), -NH2 type developers include 4-amino-2-methyl-N,N-diethylaniline, 2,4-diamino-N,N-diethylaniline, N- Examples include (4-amino-3-methylphenyl)-7-ruforine and p-7z nylene diamine.
ヘテロ環型現像剤としては、l−フェニル−3−ピラゾ
リドン、l−フェニル−4,4−ジメチル−3−ピラゾ
リドン、l−フェニル−4−メチル−4−ヒドロキシメ
チル−3−ピラゾリドンのような3−ピラゾリドン類、
l−7エニルー4−アミノ−5−ピラゾロン、5−アミ
ノラウシル等を挙げることができる。Examples of heterocyclic developers include -pyrazolidones,
Examples include l-7enyl-4-amino-5-pyrazolone and 5-aminolaucil.
T、H,ジェームス著ザ・セオリイ・オブ・ザ・ホトグ
ラフィック・プロセス第4版
(The Theory of Photograph
ic Process FourthEdition)
第291〜334頁及びジャーナル・オブ・ジ・アメリ
カン・ケミカル・ソサエティ(Journal oft
he American Chamical 5oci
ety)第73巻、第3,100頁(1951)に記載
されているごとき現像剤が本発明に有効に使用し得るも
のである。これらの現像剤は単独で使用しても2種以上
組み合わせてもよいが、2種以上を組み合わせて用いる
方が好ましい。又本発明にかかる感光材料の現像に使用
する現像液には保恒剤として、例えば亜硫酸ソーダ、亜
硫酸カリ、等の亜硫酸塩を用いても、本発明の効果が損
なわれることはない。又保恒剤としてヒドロキシルアミ
ン、ヒドラジド化合物を用いることができ、この場合そ
の使用量は現像液Iff当たり5〜500gが好ましく
、より好ましくは20〜200gである。The Theory of the Photographic Process, 4th Edition, by T. H. James.
ic Process Fourth Edition)
pp. 291-334 and Journal of the American Chemical Society.
he American Chemical 5oci
Ety) Vol. 73, p. 3, 100 (1951) can be effectively used in the present invention. These developers may be used alone or in combination of two or more types, but it is preferable to use two or more types in combination. Further, even if a sulfite salt such as sodium sulfite or potassium sulfite is used as a preservative in the developer used for developing the photosensitive material according to the invention, the effects of the invention will not be impaired. Further, hydroxylamine or a hydrazide compound can be used as a preservative, and in this case, the amount used is preferably 5 to 500 g, more preferably 20 to 200 g, per developer Iff.
又現像液には有機溶媒としてグリコール類を含有させて
もよく、そのようなグリコール類としてはエチレングリ
コール、ジエチレングリコール、プロピレングリコール
、トリエチレングリコール、l、4−ブタンジオール、
1.5−ベンタンジオール等があるが、ジエチレングリ
コールが好ましく用いられる。そしてこれらグリコール
類の好ましい使用量は現像液lQ当たり5〜500gで
、より好ましくは20〜200gである。これらの有機
溶媒は単独でも併用しても用いることができる。Further, the developer may contain glycols as an organic solvent, and examples of such glycols include ethylene glycol, diethylene glycol, propylene glycol, triethylene glycol, 1,4-butanediol,
Although examples include 1,5-bentanediol, diethylene glycol is preferably used. The amount of these glycols used is preferably 5 to 500 g, more preferably 20 to 200 g per 1Q of developer solution. These organic solvents can be used alone or in combination.
本発明に係るハロゲン化銀写真感光材料は、上記のごと
き現像抑制剤を含んだ現像液を用いて現像処理すること
により極めて保存安定性に優れた感光材料を得ることが
できる。The silver halide photographic light-sensitive material according to the present invention can be developed with a developer containing the above-mentioned development inhibitor to obtain a light-sensitive material with extremely excellent storage stability.
上記の組成になる現像液のpH値は好ましくは9〜13
であるが、保恒性及び写真特性上からpH値はlO〜1
2の範囲が更に好ましい。現像液中の陽イオンについて
は、ナトリウムよりカリウムイオンの比率が高い程現像
液の活性度を高めることができるので好ましい。The pH value of the developer having the above composition is preferably 9 to 13.
However, from the viewpoint of storage stability and photographic properties, the pH value is 1O~1
A range of 2 is more preferred. Regarding cations in the developer, it is preferable that the ratio of potassium ions is higher than that of sodium because the activity of the developer can be increased.
本発明に係るハロゲン化銀写真感光材料は、種々の条件
で処理することができる。処理温度は、例えば現像温度
は50’O以下が好ましく、特に25°0〜40°C前
後が好ましく、又現像時間は2分以内に終了することが
一般的であるが、特に好ましくは10秒〜50秒が好効
果をもたらすことが多い。又現像以外の処理工程、例え
ば水洗、停止、安定、定着、更に必要に応じて前硬膜、
中和等の工程を採用することは任意であり、これらは適
宜省略することもできる。更に又、これらの処理は皿現
像、枠現像などいわゆる手現像処理でも、ローラー現像
、ハンガー現像など機械現像であってもよい。The silver halide photographic material according to the present invention can be processed under various conditions. As for the processing temperature, for example, the development temperature is preferably 50'O or lower, particularly preferably around 25°C to 40°C, and the development time is generally completed within 2 minutes, particularly preferably 10 seconds. ~50 seconds often produces good results. In addition, processing steps other than development, such as washing, stopping, stabilizing, fixing, and if necessary, pre-hardening,
It is optional to employ steps such as neutralization, and these can be omitted as appropriate. Furthermore, these treatments may be so-called manual development such as plate development or frame development, or mechanical development such as roller development or hanger development.
以下実施例によって本発明を具体的に説明する。 EXAMPLES The present invention will be specifically explained below with reference to Examples.
尚、当然のことではあるが、本発明は以下述べる実施例
に限定されるものではない。It should be noted that, as a matter of course, the present invention is not limited to the embodiments described below.
実施例1
下引き処理したポリエチレンテレフタレートに8 v/
m’・minのエネルギーでコロナ放電した後下記構成
の帯電防止液を、下記の付量になる様に30m/min
の速さでロールフィットコーティンクハン及びエアーナ
イフを使用して塗布した。Example 1 Subbing treated polyethylene terephthalate at 8 v/
After corona discharge with energy of m'・min, apply antistatic liquid of the following composition at 30 m/min to the following amount.
It was applied using a roll-fit coating hand and an air knife at a speed of .
水溶性導電性ポリマー (A ) 0.6g/
m”本発明の疎水性ポリマー粒子(B ) 0.4
g/m”硬膜剤(H)
90′C,2分間乾燥し140°C190秒間熱処理し
た。Water-soluble conductive polymer (A) 0.6g/
m” Hydrophobic polymer particles of the present invention (B) 0.4
g/m'' Hardener (H) It was dried at 90'C for 2 minutes and heat treated at 140°C for 190 seconds.
この帯電防止層の上にゼラチンを2.0g/m”になる
様に塗布しヘーズ試験を行った。ゼラチンの硬膜剤とし
ては、ホルマリン、2,4−ジクロロ−6−ヒドロキ/
−3−)リアジンナ1ヘリウムを用いt;。結果を表1
に示す。Gelatin was coated on this antistatic layer at a concentration of 2.0 g/m'' and a haze test was conducted.As a hardening agent for gelatin, formalin, 2,4-dichloro-6-hydroxy/
-3-) using lyazine 1 helium; Table 1 shows the results.
Shown below.
(ヘーズ試験)
東京電色株式会社製濁度計Model T−2600D
Aを用いフィルム支持体を測定してヘーズを百分率で示
表
特開昭
55−84658号記載
表
の結果から本発明の試料はへ−ズに優れていることがわ
かる。(Haze test) Turbidity meter Model T-2600D manufactured by Tokyo Denshoku Co., Ltd.
From the results in the table described in JP-A No. 55-84658, it can be seen that the samples of the present invention are excellent in haze.
実施例2
(乳剤の調製)
pH3,0の酸性雰囲気下でコントロールドダブルジェ
ット法によりロジウム塩を、銀1モル当たり104モル
含有する平均粒径0.1177 m、ハロゲン化銀組成
単分散度15、臭化銀を5モル%含む塩臭化銀粒子を作
成した。粒子の成長は、ベンジルアデニンを1%のゼラ
チン水溶液IQ当たり30mg含有する系で行った。銀
とハライドの混合後、6=メチル−4−ヒドロキシ−1
,3,3a、7テトラザインデンをハロゲン化銀1モル
当たり600mg加え、その後水洗、脱塩した。Example 2 (Preparation of emulsion) A rhodium salt was prepared by a controlled double jet method in an acidic atmosphere at pH 3.0, containing 104 mol of rhodium salt per mol of silver, an average grain size of 0.1177 m, and a silver halide composition monodispersity of 15. , silver chlorobromide grains containing 5 mol % of silver bromide were prepared. Particle growth was carried out in a system containing 30 mg of benzyladenine per 1% aqueous gelatin solution IQ. After mixing silver and halide, 6=methyl-4-hydroxy-1
, 3,3a, 7-tetrazaindene was added in an amount of 600 mg per mole of silver halide, followed by washing with water and desalting.
次いで、ハロゲン化銀1モル当たり60mgの6=メチ
ル−4−ヒドロキシ−1,3,3a、7−テトラザイン
デンを加えた後、ハロゲン化銀1モル当たり15mgの
チオ硫酸ナトリウムを加え、600Cでイオウ増感をし
た。イオウ増感後安定剤として6−メチル4−ヒドロキ
シ−1,3,3a、7−テトラザインデンをハロゲン化
銀1モル当たり600mg加えた。Then, 60 mg of 6=methyl-4-hydroxy-1,3,3a,7-tetrazaindene per mole of silver halide was added, followed by 15 mg of sodium thiosulfate per mole of silver halide, and the mixture was heated at 600C. Sulfur sensitized. After sulfur sensitization, 600 mg of 6-methyl 4-hydroxy-1,3,3a,7-tetrazaindene was added per mole of silver halide as a stabilizer.
得られた乳剤に添加剤を下記の付量になるように調製添
加し、特開昭59−19941号の実施例1によりラテ
ックス下引処理した厚さ100μmのポリエチレンテレ
フタレート支持体上に塗布した。Additives were added to the resulting emulsion in the amounts shown below, and the mixture was coated on a 100 μm thick polyethylene terephthalate support that had been subjected to latex subbing treatment according to Example 1 of JP-A-59-19941.
ラテックスポリマー:スチレン−ブチルアクリレート−
アクリル酸3元共重合
ポリマー l・Og/m”テトラフェ
ニルホスホニウムクロライド30 mg/m2
サポニン200 mg/m”
ポリエチレングリコール 100 mg/m”
ハイドロキノン 200 mg/m”
スチレン−マレイン酸共重合体 20 mg/m”ヒ
ドラジン化合物(表2に示す) 50 mg/m2
5−メチルベンゾトリアゾール 30 mg/m”
減感色素(M) 20 mg/
m”アルカリ処理ゼラチン(等電点4.9)1.5
g/m”
ビス(ビニルスルホニルメチル)エーテル15 mg
/m”
銀量 2.8 g/m”(乳
剤層保護膜)
乳剤層保護膜として、下記の付量になるよう調製し、乳
剤とともに同時重層塗布した。Latex polymer: styrene-butyl acrylate
Acrylic acid tertiary copolymer polymer l・Og/m" Tetraphenylphosphonium chloride 30 mg/m2 Saponin 200 mg/m" Polyethylene glycol 100 mg/m"
Hydroquinone 200 mg/m”
Styrene-maleic acid copolymer 20 mg/m" Hydrazine compound (shown in Table 2) 50 mg/m2
5-methylbenzotriazole 30 mg/m”
Desensitizing dye (M) 20 mg/
m” alkali-treated gelatin (isoelectric point 4.9) 1.5
g/m” bis(vinylsulfonylmethyl)ether 15 mg
/m'' Silver amount: 2.8 g/m'' (emulsion layer protective film) An emulsion layer protective film was prepared in the amount shown below and coated simultaneously with the emulsion in a multilayer manner.
弗素化ジオクチルスルホコハク酸エステル200mg/
m”
ドデシルベンゼンスルボン酸ナトリウム100B/m”
マット剤:ポリメタクリル酸メチル
(平均粒径3.5/J m) 100
mg/m”硝酸リチウム塩 30
mg/m”没食子酸グロビルエステル 300
mg/m”2−メルカプトベンツイミダゾール−5−ス
ルホン酸ナトリウム 30 mg
/m”アルカリ処理ゼラチン(等電点4.9) 1.3
g/m2コロイダルシリカ 30
mg/m”スチレン−マレイン酸共T11 合体100
mg/m”ビス(ビニルスルホニルメチル)エーテ
ル15 mg/m2
つぎに、乳剤層と反対側の支持体上に、あらかじめ30
W/m”minのパワーでコロナ放電した後、ポリ(ス
チレン−ブチルアクリレート−グリシジルメタクリレー
ト
チレンアジリジン硬膜剤の存在下で塗布し、さらに帯電
防止層を実施例1と同様に塗布し、ついで下記組成のバ
ッキング層を添加剤が下記付量になるように調製し、塗
布した。Fluorinated dioctyl sulfosuccinate ester 200mg/
m” Sodium dodecylbenzenesulfonate 100B/m” Matting agent: Polymethyl methacrylate (average particle size 3.5/J m) 100
mg/m” lithium nitrate salt 30
mg/m” gallic acid globyl ester 300
mg/m” Sodium 2-mercaptobenzimidazole-5-sulfonate 30 mg
/m” Alkali-treated gelatin (isoelectric point 4.9) 1.3
g/m2 colloidal silica 30
mg/m” styrene-maleic acid co-T11 combination 100
mg/m" bis(vinylsulfonylmethyl)ether 15 mg/m2 Next, 30 mg/m" bis(vinylsulfonylmethyl)ether
After corona discharge with a power of W/m”min, coating was carried out in the presence of poly(styrene-butyl acrylate-glycidyl methacrylate tyrene aziridine hardener) and an antistatic layer was coated as in Example 1, followed by the following coating. A backing layer having the composition was prepared and applied so that the amount of additives was as shown below.
(バッキング層)
ラテックスポリマー:ブチルアクリレート−スチレン共
重合体 0.5 g/m2スチレン−マレイ
ン酸共重合体 100 mg/m2クエン酸(塗布後
pH5.4に調製) 40 mg/m2サポニン
200 mg/m2硝酸リチウム
塩 30 mg/m2バ/
キング染料
(a)
(b)
(c)
アルカリ処理ゼラチン
2.0g/m”
ビス
(ビニルスルホニルメチル)
エーテル
15n+g/m”
(バッキング層保護膜)
添加剤を下記付量になるよう調製し、
グ層上部に同時重層塗布した。(Backing layer) Latex polymer: Butyl acrylate-styrene copolymer 0.5 g/m2 Styrene-maleic acid copolymer 100 mg/m2 Citric acid (adjusted to pH 5.4 after coating) 40 mg/m2 Saponin
200 mg/m2 Lithium nitrate 30 mg/m2 Backing dye (a) (b) (c) Alkali-treated gelatin 2.0 g/m" Bis(vinylsulfonylmethyl) ether 15n+g/m" (backing layer protective film) Additives were prepared in the amounts shown below and were simultaneously coated on top of the glue layer.
ジオクチルスルホコハク酸エステル
パツキン
200 mg/m”
マット剤:ポリメタクリル酸メチル
(平均粒径4.Op m) 50
mg/m”アルカリ処理ゼラチン(等電点4.9)1.
0g/+n”
弗素化ドデシルベンゼンスルホン酸
ナトリウム 50 +og/m
”ビス(ビニルスルホニルメチル)
エーテル 20 mg/m”
なお、上記塗布液のp)(はあらかじめ5.4に調製し
てから塗布した。Dioctylsulfosuccinate ester packaging 200 mg/m” Matting agent: Polymethyl methacrylate (average particle size 4.Op m) 50
mg/m” alkali-treated gelatin (isoelectric point 4.9) 1.
0g/+n” Sodium fluorinated dodecylbenzenesulfonate 50 +og/m
"Bis(vinylsulfonylmethyl) ether 20 mg/m"
Note that p) (of the above coating solution) was prepared in advance to 5.4 and then applied.
以上のようにして得られた試料をそれぞれ2つに分け、
一方は23℃相対湿度55%で3日間保存した。残りの
一方は23℃相対湿度55%で3時間調湿後、重ねた状
態で防湿袋に封入し、55℃で3日間保存して強制劣化
させ経時代用試料を作成しtこ。Divide each sample obtained as above into two,
One was stored for 3 days at 23° C. and 55% relative humidity. The remaining one was conditioned for 3 hours at 23°C with relative humidity of 55%, sealed in a moisture-proof bag in a stacked state, and stored at 55°C for 3 days to undergo forced deterioration and create an aging sample.
両方の試料を、ステ・7プウエ・ノジを通して露光後下
記に示す現像液、定着液を使用して現像処理した後、感
度及び表面比抵抗を求めtこ。なお感度(よ光学濃度で
1.0になる露光量とし、相対感度で表した。結果を表
2に示した。Both samples were exposed to light through a step 7 pneumatic nozzle and then developed using the developer and fixer shown below, and the sensitivity and surface resistivity were determined. The sensitivity (the exposure amount was set to give an optical density of 1.0 and expressed as relative sensitivity. The results are shown in Table 2.
現像処理条件
工程 温度 時間
現像 34°0 15秒定着
32°c 10秒水洗 常温
10秒
現像液処方
ハイドロキノン 25 gl−フ
ェニル−4,4ジメチル−3=
ピラゾリドン 0.4g臭化ナト
リウム 3g5−メチルベンゾトリ
アゾール 0.3 g5−ニトロインダゾール
0.05gジエチルアミノプロノくノー1.2
−ジオール10 g
亜1liE酸カリウム
0
5−スルホサリチル酸ナト
リウム
5
エチレンジアミン四酢酸ナトリウム
水でl(lに仕上げた。Development processing conditions Process Temperature Time Development 34°0 15 seconds fixing
32°c, 10 seconds of water washing, room temperature
10 second developer formulation Hydroquinone 25 gl-Phenyl-4,4dimethyl-3= Pyrazolidone 0.4g Sodium Bromide 3g 5-Methylbenzotriazole 0.3 g5-Nitroindazole
0.05g diethylaminoprono 1.2
-Diol 10 g Potassium subite 0 5-Sodium sulfosalicylate 5 Sodium ethylenediaminetetraacetate Finished up to 1 with water.
pHは、苛性ソーダで11.5と 定着液処方 (組成A) チオ硫酸アンモニウム(72,5w% した。The pH is 11.5 with caustic soda. Fixer formulation (Composition A) Ammonium thiosulfate (72.5w% did.
水溶液)
240 mQ
7 g
6.5g
g
g
13.6mQ
亜硫酸ナトリウム
酢酸ナトリウム・3水塩
硼酸
クエン酸ナトリウム・2水塩
酢酸(90w%水溶液)
(組成B)
純水(イオン交換水)
硫酸(50w%の水溶液)
硫酸アルミニウム(AJOs換算含量が8.1v%の水
溶液)
17 mQ
4.7g
26.5g
定着液の使用時に水500mQ中に上記組FRA。Aqueous solution) 240 mQ 7 g 6.5g g g 13.6mQ Sodium sulfite Sodium acetate, trihydrate Borate Sodium citrate, dihydrate Acetic acid (90w% aqueous solution) (Composition B) Pure water (ion exchange water) Sulfuric acid (50w % aqueous solution) Aluminum sulfate (aqueous solution with AJOs equivalent content of 8.1v%) 17 mQ 4.7 g 26.5 g When using the fixer, the above set FRA in 500 mQ of water.
組 戊Bの順に溶かし、 Qに仕上げて用いた。set Melt in the order of B. It was finished into Q and used.
この
表2の結果から本発明の試料は、経時保存による感度低
下が少なく、また処理後の帯電防止能の劣化も少ないこ
とが分かる。From the results in Table 2, it can be seen that the samples of the present invention show little decrease in sensitivity due to storage over time, and little deterioration in antistatic ability after processing.
実施例3
実施例2と同様にして、ロジウム塩を銀1モル当たりt
o−’モルを含有し、平均粒径0,20μm1単分散度
20の臭化銀を2モル%含む塩臭化銀粒子を作成した。Example 3 In the same manner as in Example 2, rhodium salt was added in t per mole of silver.
Silver chlorobromide particles containing 2 mol % of silver bromide with an average particle diameter of 0.20 μm and a monodispersity of 20 were prepared.
これを実施例2と同様に脱塩後イオウ増感を施した。This was desalted and sulfur sensitized in the same manner as in Example 2.
得られた乳剤に添加剤を下記の付量になるように調製添
加し、実施例1で用いた下引加工済ポリエチレンテレフ
タレート支持体上に塗布した。Additives were added to the obtained emulsion in the amounts shown below, and the mixture was coated on the undercoated polyethylene terephthalate support used in Example 1.
ラテックスポリマー:
スチレン−ブチルアクリレートアクリル酸3元共重合ポ
リマー 1−0g/m”フェノール
l mg/m”サポニン
200mg/m’ドデシルベンゼ
ン
スルホン酸ナトリウム 50mg/m”テ
トラゾリウム化合物(表3に示す) 50mg/m”
化合物(N)
化合物(0)
スチレン−マレイン[t=重合体
アルカリ処理ゼラチン(等電点4.9)銀量
ホルマリン
40mg/m”
50mg/m”
20mg/m2
2.0g#o”
3・5g/m2
10mg711’
化合物(0)
尚、塗布液はあらかじめ水酸化ナトリウムpH6,5に
#整したのち塗布した。乳剤朱護膜として、添加剤を下
記の付量になるように調製し、乳剤塗布液とともに同時
重層塗布した。Latex polymer: Styrene-butylacrylate acrylic acid ternary copolymer 1-0g/m”phenol
l mg/m”saponin
200mg/m' Sodium dodecylbenzenesulfonate 50mg/m"Tetrazolium compound (shown in Table 3) 50mg/m"
Compound (N) Compound (0) Styrene-malein [t=polymer alkali-treated gelatin (isoelectric point 4.9) Silver amount Formalin 40 mg/m" 50 mg/m" 20 mg/m2 2.0 g#o" 3.5 g /m2 10mg711' Compound (0) The coating solution was coated after adjusting the pH of sodium hydroxide to 6.5 in advance.As an emulsion protective film, additives were prepared in the amounts shown below, and the emulsion was coated. Multilayer coating was performed simultaneously with the liquid.
弗素化ジオクチル
7、 ルホコハク酸ニスf ルl00mg/m’ジオク
チルスルホコハク酸エステルloomg/m”マット剤
:不定型シリカ 50mg/m”化合物(
○)30mg/1T12
5−メチルベンゾトリアゾール
化合物(P) 500□g
/ m 2没食子酸プロピルエステル 300
mg/m”スチレン−マレイン酸共重合体100mg/
m”アルカリ処理ゼラチン(等電点4.9) 1.
0g/m”ホルマリン lO
mg/m”ポリアクリルアミド 500
mg/m”尚、あらかじめクエン酸でpH 5.4に調
整したのち塗布した。Dioctyl fluoride 7, sulfosuccinic acid varnish f 100 mg/m' Dioctyl sulfosuccinate loomg/m" Matting agent: Amorphous silica 50 mg/m" compound (
○) 30mg/1T12 5-methylbenzotriazole compound (P) 500□g
/ m2 gallic acid propyl ester 300
mg/m” styrene-maleic acid copolymer 100mg/m
m” alkali-treated gelatin (isoelectric point 4.9) 1.
0g/m” formalin lO
mg/m” polyacrylamide 500
The pH was adjusted to 5.4 with citric acid before coating.
化合物(P)
次に乳剤層とは、反対側の支持体上に、実施例2と全く
同様にして帯電防止層、バッキング層を設けた。ただし
この時のバッキング層の硬膜剤はホルマリンを使用した
。Compound (P) Next, an antistatic layer and a backing layer were provided on the support opposite to the emulsion layer in exactly the same manner as in Example 2. However, formalin was used as the hardening agent for the backing layer at this time.
実施例2と同様に処理し、評価した。It was treated and evaluated in the same manner as in Example 2.
ただし、現像液は下記のものを用いた。得られた結果を
表3に示す。However, the following developer was used. The results obtained are shown in Table 3.
(組成A)
純水(イオン交換水) 1 50mQ
エチレンジアミン四酢酸二ナトリウム塩 2gジエチレ
ングリコール 50g亜硫酸カリウム
(55%w/v水溶液) loOmf2炭酸カリ
ウム 50gハイドロキノン
15g1−フェニル−3−ピ
ラゾリドン 0.5gl−7エニルー5−
メルカプトテトラゾール 30mg水酸化カリウム
使用液のpHを10.4にする量臭化カリウム
4.5g(組成B)
純水(イオン交換水) 3+ngジ
エチレングリコール 50gエチレン
ジアミン四酢酸二
す
ト
リ
ラム塩
5mg
酢酸(90%
水溶液)
Q.3m12
現像液の使用時に水500m(2中に上記組成A、組
表3の結果からも実施例2のヒドラジン化合物の場合と
同様に本発明の試料は経時保存による感度低下が少なく
、処理後の帯電防止能の劣化も少ない。(Composition A) Pure water (ion exchange water) 1 50mQ
Ethylenediaminetetraacetic acid disodium salt 2g diethylene glycol 50g potassium sulfite (55% w/v aqueous solution) loOmf2 potassium carbonate 50g hydroquinone 15g 1-phenyl-3-pyrazolidone 0.5gl-7enyl-5-
Mercaptotetrazole 30mg potassium hydroxide
Amount of potassium bromide to bring the pH of the solution to 10.4
4.5g (composition B) Pure water (ion-exchanged water) 3+ng diethylene glycol 50g ethylenediaminetetraacetic acid distrilam salt 5mg Acetic acid (90% aqueous solution) Q. 3m12 When using the developer, 500m of water (2 contains the above composition A, and from the results in Table 3, as in the case of the hydrazine compound of Example 2, the sample of the present invention showed less sensitivity loss due to storage over time, and the sensitivity after processing There is also little deterioration in antistatic ability.
本発明によりヘーズのない透明性に優れた帯電防止層を
有し、テトラゾリウム化合物まt;はヒドラジン化合物
のような超硬調化剤を使用しても経時で表面比抵抗の劣
化が少なく、かつ減感せず、安定性の高いハロゲン化銀
写真感光材料を提供することができた。The present invention has an antistatic layer with excellent transparency without haze, and the surface resistivity does not deteriorate over time even if a super high contrast agent such as a hydrazine compound is used. It was possible to provide a highly stable silver halide photographic material without any sensitivity.
Claims (2)
マー粒子、[3]硬化剤の反応生成物からなる帯電防止
層を有してなるプラスチックフィルム支持体において、
該疎水性ポリマー粒子が置換アジリジン基含有のラテッ
クスとして帯電防止層中に分散安定化されていることを
特徴とする帯電防止層を有するハロゲン化銀写真感光材
料。(1) A plastic film support comprising an antistatic layer comprising a reaction product of [1] a water-soluble conductive polymer, [2] hydrophobic polymer particles, and [3] a curing agent,
1. A silver halide photographic material having an antistatic layer, wherein the hydrophobic polymer particles are dispersed and stabilized in the antistatic layer as latex containing a substituted aziridine group.
ム化合物またはヒドラジン化合物を含有することを特徴
とするハロゲン化銀写真感光材料。(2) A silver halide photographic light-sensitive material, characterized in that the light-sensitive emulsion layer according to claim 1 contains a tetrazolium compound or a hydrazine compound.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP19718389A JPH0359640A (en) | 1989-07-28 | 1989-07-28 | Silver halide photographic sensitive material subjected to antistatic treatment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP19718389A JPH0359640A (en) | 1989-07-28 | 1989-07-28 | Silver halide photographic sensitive material subjected to antistatic treatment |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0359640A true JPH0359640A (en) | 1991-03-14 |
Family
ID=16370186
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP19718389A Pending JPH0359640A (en) | 1989-07-28 | 1989-07-28 | Silver halide photographic sensitive material subjected to antistatic treatment |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0359640A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5691107A (en) * | 1994-12-07 | 1997-11-25 | Mitsubishi Paper Mills Limited | Silver halide photographic photosensitive material |
-
1989
- 1989-07-28 JP JP19718389A patent/JPH0359640A/en active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5691107A (en) * | 1994-12-07 | 1997-11-25 | Mitsubishi Paper Mills Limited | Silver halide photographic photosensitive material |
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