JPH0363944A - Resist coating equipment for optical disc masters - Google Patents

Resist coating equipment for optical disc masters

Info

Publication number
JPH0363944A
JPH0363944A JP1198948A JP19894889A JPH0363944A JP H0363944 A JPH0363944 A JP H0363944A JP 1198948 A JP1198948 A JP 1198948A JP 19894889 A JP19894889 A JP 19894889A JP H0363944 A JPH0363944 A JP H0363944A
Authority
JP
Japan
Prior art keywords
resist
liquid
film
optical disc
diluting
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1198948A
Other languages
Japanese (ja)
Inventor
Shoichi Nanba
難波 祥一
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP1198948A priority Critical patent/JPH0363944A/en
Publication of JPH0363944A publication Critical patent/JPH0363944A/en
Pending legal-status Critical Current

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  • Thermal Transfer Or Thermal Recording In General (AREA)
  • Manufacturing Optical Record Carriers (AREA)

Abstract

PURPOSE:To allow the free change of a resist diluting concn. and the arbitrary and easy change of the thickness of the film to be formed by constituting the device in such a manner that a resist liquid can be mixed and diluted in the device and the pressure to be applied on the resist liquid and resist diluting liquid is changed. CONSTITUTION:The stock resist soln. is put into a resist liquid supplying tank 14 and the resist diluting liquid into a resist diluting liquid supplying tank 16. The respective pressures thereof are set by regulators 15, 17 for pressure regulation. An optical master disk 11 is then placed on a turn table 12c and while the disk is rotated at a specified low speed by a motor 12d for revolution, a solenoid valve 13 for liquid discharge is opened and closed to discharge the diluted resist liquid onto the optical master disk 11; thereafter the disk is rotated at the specified angular speed corresponding to the thickness of the film to be formed, by which the formation of the resist film is executed. The resist films of any thicknesses are easily formed in this way.

Description

【発明の詳細な説明】 産業上の利用分野 本発明は、ビデオディスク、ディジタルオーディオディ
スク、静止画1文書フッイルなどの光ディスクを作製す
るための光ディスク原盤用レジスト塗布装置に関するも
のである。
DETAILED DESCRIPTION OF THE INVENTION Field of the Invention The present invention relates to a resist coating apparatus for optical disc masters for producing optical discs such as video discs, digital audio discs, and still image one-document films.

従来の技術 一般に光ディスクはその情報密度が極めて大きいことや
、S/N比が太きく、ノイズが少ないことなどから情報
媒体として有望視され、ビデオディスクやディジタフレ
オーディオディスクとして商品化され、ディジタル信号
を記録、再生する光ディスクとしても近年研究開発が行
なわれている。
Conventional technology In general, optical discs are seen as promising information media because of their extremely high information density, high S/N ratio, and low noise, and have been commercialized as video discs and digital audio discs, and are used to transmit digital signals. In recent years, research and development has been conducted on optical discs for recording and reproducing information.

以下、図面を参照しながら上述した従来の光ディスク原
盤用レジヌト塗布装置の一例について説明する。第3図
は、従来の光ディスク原盤用レジスト塗布装置のブロッ
ク図であシ、第4図はレジスト(ここでは、−数的に使
用されているポジ型しジスト液AZ1300シリーズを
回転数500rpm で塗布した場合を例に上げである
。)の濃度に対して形成される膜厚の関係を示すグラフ
であシ、第6図はレジスト液濃度が一定の場合の回転数
とレジスト膜厚の関係を示すグラフである。
Hereinafter, an example of the above-described conventional resin coater for optical disc master will be explained with reference to the drawings. Figure 3 is a block diagram of a conventional resist coating device for optical disk masters, and Figure 4 is a block diagram of a resist coating device for a conventional optical disc master. Figure 6 shows the relationship between the number of revolutions and the resist film thickness when the resist solution concentration is constant. This is a graph showing.

第3図にかいて、1は光ディスク原盤、2はターンテー
プ/L/aとモータbから成る回転部、3はレジヌト液
吐出用の電磁弁、4は一定に稀釈されたレジスト液供給
用タンクである。レジスト液を塗布するには、あらかじ
め第4図のグラフで示すように形成する膜厚に応じて稀
釈したレジスト液をレジスト液用タンク4に入れエアー
で加圧してかき、光ディスク原盤1をターンテープlv
aに載せ、回転用モータbで一定の低速度で回転しなか
ら液吐出用の電磁弁3を開閉し、レジスト液を光ディス
ク原盤1の上に吐出後、第5図に示すような膜厚に応じ
た速度で一定の角速度で回転することにより、レジスト
膜の形成を行なうものである。
In Fig. 3, 1 is an optical disk master, 2 is a rotating part consisting of a turn tape/L/a and a motor b, 3 is a solenoid valve for discharging a resist solution, and 4 is a tank for supplying a resist solution diluted to a constant level. It is. To apply the resist solution, the resist solution is diluted in advance according to the thickness of the film to be formed as shown in the graph of FIG. lv
A, the resist liquid is placed on the optical disc master 1, rotated at a constant low speed by the rotation motor b, and opened and closed by the electromagnetic valve 3 for discharging the liquid. The resist film is formed by rotating at a constant angular velocity according to the rotation speed.

発明が解決しようとする課題 しかしながら上記のような構成では、回転数を変えるこ
とによシ形成する膜厚を狭い範囲内(1〜2倍程度)で
設定することが出来るが、大幅に違った膜厚(2倍以上
)を形成する場合には、その度に膜厚に応じてレジスト
濃度を変えたレジスト液を作製し、この稀釈濃度を変え
たレジスト液と交換することで対応しなければならない
。従って必要以上にレジスト液釦よびレジスト稀釈液が
必要となシ、また膜厚に応じて必要な濃度に稀釈したレ
ジスト液と交換しなければならない為、時間がかかシ、
交換時にホコリやゴミが発生し、不良の原因にもなる。
Problems to be Solved by the Invention However, with the above configuration, the thickness of the film formed can be set within a narrow range (about 1 to 2 times) by changing the rotation speed, but it is possible to set the film thickness within a narrow range (about 1 to 2 times); When forming a film that is twice as thick (more than twice as thick), it is necessary to prepare a resist solution with a different resist concentration depending on the film thickness each time, and replace it with a resist solution with a different diluted concentration. It won't happen. Therefore, more resist solution button and resist diluent are required than necessary, and the resist solution must be replaced with one diluted to the required concentration according to the film thickness, which takes time.
Dust and dirt are generated during replacement, which can lead to defects.

本発明は上記の課題に鑑み、さらに簡単でいかなるレジ
スト膜厚をも形成出来る光ディスク原盤用レジスト塗布
装置を提供するものである。
In view of the above-mentioned problems, the present invention provides a resist coating apparatus for optical disc masters that is simpler and can form any resist film thickness.

課題を解決するための手段 上記の課題を解決するために本発明の光ディスク原盤用
レジスト塗布装置は、レジスト液を吐出時に装置内で混
合稀釈出来るようにし、またレジスト液およびレジスト
稀釈液に加える圧力を変えることで、レジスト液を交換
することなく稀釈濃度も自由に変えられるようにしたも
のである。
Means for Solving the Problems In order to solve the above-mentioned problems, the resist coating device for optical disc masters of the present invention is capable of mixing and diluting the resist solution within the device when discharging it, and also reduces the pressure applied to the resist solution and the resist dilution solution. By changing the resist solution, the dilution concentration can be freely changed without replacing the resist solution.

作   用 本発明は上記した構成によシ各種膜厚を、レジスト液お
よびレジスト稀釈液に加える圧力を調整するだけで、簡
単に形成出来るようにしたものである。
Effects The present invention allows films of various thicknesses to be easily formed by simply adjusting the pressure applied to the resist solution and the resist dilution solution using the above-described configuration.

実施例 以下本発明の一実施例の光ディスク原盤用レジヌト塗布
装置について図面を参照しながら説明する。第1図は本
発明の第1の実施例にかける光ディスク原盤用レジスト
塗布装置のブロック図であり、第2図はレジスト原液釦
よびレジスト稀釈液に加える圧力比に対して得られる吐
出時のレジメト稀釈濃度の関係を示すものである。第1
図において、11は光ディスク原盤、12はターンテー
プtvcとモータdから戒る回転部、13は液吐出用の
電磁弁、14はレジスト液供給用タンク、16はレジス
ト液加圧調整用レギュレータ、16はレジスト稀釈液供
給用タンク、17はレジスト稀釈液加圧調整用レギュレ
ータである。
EXAMPLE Hereinafter, a resin coating apparatus for optical disk masters according to an embodiment of the present invention will be described with reference to the drawings. FIG. 1 is a block diagram of a resist coating apparatus for optical disk masters according to the first embodiment of the present invention, and FIG. 2 shows a discharge regime obtained with respect to the pressure ratio applied to the resist stock solution button and the resist diluted solution. This shows the relationship between dilution and concentration. 1st
In the figure, 11 is an optical disk master, 12 is a rotating part controlled by the turn tape tvc and motor d, 13 is a solenoid valve for discharging liquid, 14 is a tank for supplying resist liquid, 16 is a regulator for adjusting pressurization of resist liquid, 16 17 is a resist dilution liquid supply tank, and 17 is a resist dilution liquid pressure regulator.

以下第1図1よび第2図を用いてその動作を説明する。The operation will be explained below using FIGS. 1 and 2.

筐ず、レジスト液供給タンク14にレジスト原液を、レ
ジスト稀釈液供給タンク16にレジスト稀釈液を入れ、
各々の圧力を圧力調整用レギュレータ15.17を設定
する(例えば、第2図に示すように稀釈濃度が50%の
場合は加圧調整用レギュレータ15.17を等しくする
。)。
Then, put the resist stock solution into the resist solution supply tank 14 and the resist dilution solution into the resist dilution solution supply tank 16.
The pressure regulating regulators 15 and 17 are set to each pressure (for example, when the dilution concentration is 50% as shown in FIG. 2, the pressure regulating regulators 15 and 17 are set to be equal).

次に、光ディスク原盤11をターンテーブルCに載せ、
回転用モータdによシ一定の低速度で回転しなから液吐
出用電磁弁13を開閉し、稀釈されたレジスト液を光デ
ィスク原盤11上に吐出後、形成する膜厚に応じた速度
で一定の角速度で回転することにより、レジスト膜の形
成を行なうものである。
Next, place the optical disc master 11 on the turntable C,
The rotation motor d rotates at a constant low speed, and then opens and closes the liquid discharge solenoid valve 13 to discharge the diluted resist liquid onto the optical disk master 11, and then at a constant speed according to the film thickness to be formed. By rotating at an angular velocity of , a resist film is formed.

発明の効果 以上のように本発明は、レジスト液を交換することなく
、自由にレジスト稀釈濃度を変えることが出来、従って
形成する膜厚も任意にかつ簡単に変えることが出来る。
Effects of the Invention As described above, in the present invention, the dilution concentration of the resist can be freely changed without replacing the resist solution, and therefore the thickness of the formed film can also be changed arbitrarily and easily.

また、膜厚を変える度にレジスト液を変える必要が無い
為、交換時のホコリやゴミの発生を防ぐことが出来、高
品質の光ディスクを作製することが出来る。
Furthermore, since there is no need to change the resist solution every time the film thickness is changed, it is possible to prevent dust and dirt from being generated during replacement, and it is possible to produce high-quality optical discs.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は本発明第1の実施例にむける光ディスク原盤用
レジスト塗布装置のブロック図、第2図は各々のタンク
に加える圧力比に対し得られるレジスト液の稀釈濃度の
関係を示すグラフ、第3図は従来の光ディスク原盤用レ
ジスト塗布装置のブロック図、第4図はレジスト濃度と
形成される膜厚の関係を示すグラフ、第5図は回転数と
形成される膜厚の関係を示すグラフである。 11・・・・・・光ディスク原盤、12・−・・−・回
転部、13・・・・・・電磁弁、14・・・・・・レジ
スト液供給用タンク、5・・・・・・圧力調整用レギュ
レータ、6・・・・・・レジ スト稀釈液供給用タンク、 7・・・・・・圧力調整用レ ギュレータ。
FIG. 1 is a block diagram of a resist coating apparatus for optical disk masters according to the first embodiment of the present invention, FIG. 2 is a graph showing the relationship between the dilution concentration of the obtained resist solution and the pressure ratio applied to each tank, and FIG. Figure 3 is a block diagram of a conventional resist coating device for optical disc masters, Figure 4 is a graph showing the relationship between resist concentration and film thickness formed, and Figure 5 is a graph showing the relationship between rotation speed and film thickness formed. It is. DESCRIPTION OF SYMBOLS 11...Optical disc master, 12...Rotating unit, 13...Solenoid valve, 14...Resist liquid supply tank, 5... Pressure adjustment regulator, 6... Resist dilution liquid supply tank, 7... Pressure adjustment regulator.

Claims (1)

【特許請求の範囲】[Claims] レジスト液供給用タンクと、レジスト稀釈液供給用タン
クと、各々のタンクに加える圧力の調整用レギュレータ
と、液の混合吐出用電磁弁と、光ディスク原盤の回転部
とを備えたことを特徴とする光ディスク原盤用レジスト
塗布装置。
It is characterized by comprising a resist solution supply tank, a resist dilution solution supply tank, a regulator for adjusting the pressure applied to each tank, a solenoid valve for mixing and discharging the solutions, and a rotating part for the optical disc master. Resist coating equipment for optical disc masters.
JP1198948A 1989-07-31 1989-07-31 Resist coating equipment for optical disc masters Pending JPH0363944A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1198948A JPH0363944A (en) 1989-07-31 1989-07-31 Resist coating equipment for optical disc masters

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1198948A JPH0363944A (en) 1989-07-31 1989-07-31 Resist coating equipment for optical disc masters

Publications (1)

Publication Number Publication Date
JPH0363944A true JPH0363944A (en) 1991-03-19

Family

ID=16399617

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1198948A Pending JPH0363944A (en) 1989-07-31 1989-07-31 Resist coating equipment for optical disc masters

Country Status (1)

Country Link
JP (1) JPH0363944A (en)

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