JPH0364052B2 - - Google Patents
Info
- Publication number
- JPH0364052B2 JPH0364052B2 JP59229108A JP22910884A JPH0364052B2 JP H0364052 B2 JPH0364052 B2 JP H0364052B2 JP 59229108 A JP59229108 A JP 59229108A JP 22910884 A JP22910884 A JP 22910884A JP H0364052 B2 JPH0364052 B2 JP H0364052B2
- Authority
- JP
- Japan
- Prior art keywords
- vinyl
- layer
- gelatin
- acid
- composition
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000007788 liquid Substances 0.000 claims description 17
- 239000000463 material Substances 0.000 claims description 12
- 239000000126 substance Substances 0.000 claims description 11
- 230000002209 hydrophobic effect Effects 0.000 claims description 8
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 2
- 239000010410 layer Substances 0.000 description 49
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 37
- 239000000203 mixture Substances 0.000 description 32
- -1 polyethylene terephthalate Polymers 0.000 description 32
- 108010010803 Gelatin Proteins 0.000 description 28
- 229920000159 gelatin Polymers 0.000 description 28
- 239000008273 gelatin Substances 0.000 description 28
- 235000019322 gelatine Nutrition 0.000 description 28
- 235000011852 gelatine desserts Nutrition 0.000 description 28
- 239000000839 emulsion Substances 0.000 description 27
- 229920001577 copolymer Polymers 0.000 description 21
- 239000000243 solution Substances 0.000 description 21
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 16
- 239000011248 coating agent Substances 0.000 description 11
- 238000000576 coating method Methods 0.000 description 11
- 239000012153 distilled water Substances 0.000 description 11
- 238000000034 method Methods 0.000 description 11
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 10
- 229910052709 silver Inorganic materials 0.000 description 10
- 239000004332 silver Substances 0.000 description 10
- 239000000178 monomer Substances 0.000 description 8
- 238000011282 treatment Methods 0.000 description 8
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 8
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 7
- LDHQCZJRKDOVOX-NSCUHMNNSA-N crotonic acid Chemical compound C\C=C\C(O)=O LDHQCZJRKDOVOX-NSCUHMNNSA-N 0.000 description 7
- KAKZBPTYRLMSJV-UHFFFAOYSA-N Butadiene Chemical compound C=CC=C KAKZBPTYRLMSJV-UHFFFAOYSA-N 0.000 description 6
- 238000009472 formulation Methods 0.000 description 6
- LVHBHZANLOWSRM-UHFFFAOYSA-N methylenebutanedioic acid Natural products OC(=O)CC(=C)C(O)=O LVHBHZANLOWSRM-UHFFFAOYSA-N 0.000 description 6
- 239000005020 polyethylene terephthalate Substances 0.000 description 6
- 229920000139 polyethylene terephthalate Polymers 0.000 description 6
- 238000012545 processing Methods 0.000 description 6
- 229920002554 vinyl polymer Polymers 0.000 description 6
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 5
- 150000001875 compounds Chemical class 0.000 description 5
- 150000001993 dienes Chemical class 0.000 description 5
- FQPSGWSUVKBHSU-UHFFFAOYSA-N methacrylamide Chemical compound CC(=C)C(N)=O FQPSGWSUVKBHSU-UHFFFAOYSA-N 0.000 description 5
- JAHNSTQSQJOJLO-UHFFFAOYSA-N 2-(3-fluorophenyl)-1h-imidazole Chemical compound FC1=CC=CC(C=2NC=CN=2)=C1 JAHNSTQSQJOJLO-UHFFFAOYSA-N 0.000 description 4
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 4
- RRHGJUQNOFWUDK-UHFFFAOYSA-N Isoprene Chemical compound CC(=C)C=C RRHGJUQNOFWUDK-UHFFFAOYSA-N 0.000 description 4
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 4
- 150000001336 alkenes Chemical class 0.000 description 4
- 239000006185 dispersion Substances 0.000 description 4
- 239000000975 dye Substances 0.000 description 4
- 239000004816 latex Substances 0.000 description 4
- 229920000126 latex Polymers 0.000 description 4
- 239000011241 protective layer Substances 0.000 description 4
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 4
- OFOBLEOULBTSOW-UHFFFAOYSA-N Propanedioic acid Natural products OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 3
- QYKIQEUNHZKYBP-UHFFFAOYSA-N Vinyl ether Chemical class C=COC=C QYKIQEUNHZKYBP-UHFFFAOYSA-N 0.000 description 3
- 239000000654 additive Substances 0.000 description 3
- 239000000853 adhesive Substances 0.000 description 3
- 230000001070 adhesive effect Effects 0.000 description 3
- CQEYYJKEWSMYFG-UHFFFAOYSA-N butyl acrylate Chemical compound CCCCOC(=O)C=C CQEYYJKEWSMYFG-UHFFFAOYSA-N 0.000 description 3
- 239000003795 chemical substances by application Substances 0.000 description 3
- 238000003851 corona treatment Methods 0.000 description 3
- 239000003431 cross linking reagent Substances 0.000 description 3
- 229920001519 homopolymer Polymers 0.000 description 3
- 230000005661 hydrophobic surface Effects 0.000 description 3
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 3
- 239000011976 maleic acid Substances 0.000 description 3
- FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical compound O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 description 3
- 239000006224 matting agent Substances 0.000 description 3
- 125000005395 methacrylic acid group Chemical group 0.000 description 3
- 244000005700 microbiome Species 0.000 description 3
- 229920005989 resin Polymers 0.000 description 3
- 239000011347 resin Substances 0.000 description 3
- 239000002904 solvent Substances 0.000 description 3
- 239000004094 surface-active agent Substances 0.000 description 3
- 238000012360 testing method Methods 0.000 description 3
- LDHQCZJRKDOVOX-UHFFFAOYSA-N trans-crotonic acid Natural products CC=CC(O)=O LDHQCZJRKDOVOX-UHFFFAOYSA-N 0.000 description 3
- 229920001567 vinyl ester resin Polymers 0.000 description 3
- ZGEGCLOFRBLKSE-UHFFFAOYSA-N 1-Heptene Chemical compound CCCCCC=C ZGEGCLOFRBLKSE-UHFFFAOYSA-N 0.000 description 2
- UZKWTJUDCOPSNM-UHFFFAOYSA-N 1-ethenoxybutane Chemical compound CCCCOC=C UZKWTJUDCOPSNM-UHFFFAOYSA-N 0.000 description 2
- LIKMAJRDDDTEIG-UHFFFAOYSA-N 1-hexene Chemical compound CCCCC=C LIKMAJRDDDTEIG-UHFFFAOYSA-N 0.000 description 2
- KWKAKUADMBZCLK-UHFFFAOYSA-N 1-octene Chemical compound CCCCCCC=C KWKAKUADMBZCLK-UHFFFAOYSA-N 0.000 description 2
- AXCGIKGRPLMUDF-UHFFFAOYSA-N 2,6-dichloro-1h-1,3,5-triazin-4-one;sodium Chemical compound [Na].OC1=NC(Cl)=NC(Cl)=N1 AXCGIKGRPLMUDF-UHFFFAOYSA-N 0.000 description 2
- STMDPCBYJCIZOD-UHFFFAOYSA-N 2-(2,4-dinitroanilino)-4-methylpentanoic acid Chemical compound CC(C)CC(C(O)=O)NC1=CC=C([N+]([O-])=O)C=C1[N+]([O-])=O STMDPCBYJCIZOD-UHFFFAOYSA-N 0.000 description 2
- OEPOKWHJYJXUGD-UHFFFAOYSA-N 2-(3-phenylmethoxyphenyl)-1,3-thiazole-4-carbaldehyde Chemical compound O=CC1=CSC(C=2C=C(OCC=3C=CC=CC=3)C=CC=2)=N1 OEPOKWHJYJXUGD-UHFFFAOYSA-N 0.000 description 2
- OMIGHNLMNHATMP-UHFFFAOYSA-N 2-hydroxyethyl prop-2-enoate Chemical compound OCCOC(=O)C=C OMIGHNLMNHATMP-UHFFFAOYSA-N 0.000 description 2
- KGIGUEBEKRSTEW-UHFFFAOYSA-N 2-vinylpyridine Chemical compound C=CC1=CC=CC=N1 KGIGUEBEKRSTEW-UHFFFAOYSA-N 0.000 description 2
- OFNISBHGPNMTMS-UHFFFAOYSA-N 3-methylideneoxolane-2,5-dione Chemical compound C=C1CC(=O)OC1=O OFNISBHGPNMTMS-UHFFFAOYSA-N 0.000 description 2
- HRPVXLWXLXDGHG-UHFFFAOYSA-N Acrylamide Chemical compound NC(=O)C=C HRPVXLWXLXDGHG-UHFFFAOYSA-N 0.000 description 2
- NLHHRLWOUZZQLW-UHFFFAOYSA-N Acrylonitrile Chemical compound C=CC#N NLHHRLWOUZZQLW-UHFFFAOYSA-N 0.000 description 2
- 229920002284 Cellulose triacetate Polymers 0.000 description 2
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 2
- VZCYOOQTPOCHFL-OWOJBTEDSA-N Fumaric acid Chemical compound OC(=O)\C=C\C(O)=O VZCYOOQTPOCHFL-OWOJBTEDSA-N 0.000 description 2
- WOBHKFSMXKNTIM-UHFFFAOYSA-N Hydroxyethyl methacrylate Chemical compound CC(=C)C(=O)OCCO WOBHKFSMXKNTIM-UHFFFAOYSA-N 0.000 description 2
- 229920002873 Polyethylenimine Polymers 0.000 description 2
- 239000004793 Polystyrene Substances 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 229920002472 Starch Polymers 0.000 description 2
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 2
- XTXRWKRVRITETP-UHFFFAOYSA-N Vinyl acetate Chemical compound CC(=O)OC=C XTXRWKRVRITETP-UHFFFAOYSA-N 0.000 description 2
- BZHJMEDXRYGGRV-UHFFFAOYSA-N Vinyl chloride Chemical compound ClC=C BZHJMEDXRYGGRV-UHFFFAOYSA-N 0.000 description 2
- 235000010724 Wisteria floribunda Nutrition 0.000 description 2
- NNLVGZFZQQXQNW-ADJNRHBOSA-N [(2r,3r,4s,5r,6s)-4,5-diacetyloxy-3-[(2s,3r,4s,5r,6r)-3,4,5-triacetyloxy-6-(acetyloxymethyl)oxan-2-yl]oxy-6-[(2r,3r,4s,5r,6s)-4,5,6-triacetyloxy-2-(acetyloxymethyl)oxan-3-yl]oxyoxan-2-yl]methyl acetate Chemical compound O([C@@H]1O[C@@H]([C@H]([C@H](OC(C)=O)[C@H]1OC(C)=O)O[C@H]1[C@@H]([C@@H](OC(C)=O)[C@H](OC(C)=O)[C@@H](COC(C)=O)O1)OC(C)=O)COC(=O)C)[C@@H]1[C@@H](COC(C)=O)O[C@@H](OC(C)=O)[C@H](OC(C)=O)[C@H]1OC(C)=O NNLVGZFZQQXQNW-ADJNRHBOSA-N 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- 150000003926 acrylamides Chemical class 0.000 description 2
- XXROGKLTLUQVRX-UHFFFAOYSA-N allyl alcohol Chemical compound OCC=C XXROGKLTLUQVRX-UHFFFAOYSA-N 0.000 description 2
- 150000001408 amides Chemical class 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- FUSUHKVFWTUUBE-UHFFFAOYSA-N buten-2-one Chemical compound CC(=O)C=C FUSUHKVFWTUUBE-UHFFFAOYSA-N 0.000 description 2
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- 229920002678 cellulose Polymers 0.000 description 2
- 239000000084 colloidal system Substances 0.000 description 2
- 238000011161 development Methods 0.000 description 2
- 208000028659 discharge Diseases 0.000 description 2
- 150000002148 esters Chemical class 0.000 description 2
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 2
- 238000011156 evaluation Methods 0.000 description 2
- VOZRXNHHFUQHIL-UHFFFAOYSA-N glycidyl methacrylate Chemical compound CC(=C)C(=O)OCC1CO1 VOZRXNHHFUQHIL-UHFFFAOYSA-N 0.000 description 2
- 229920001477 hydrophilic polymer Polymers 0.000 description 2
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 2
- RPQRDASANLAFCM-UHFFFAOYSA-N oxiran-2-ylmethyl prop-2-enoate Chemical compound C=CC(=O)OCC1CO1 RPQRDASANLAFCM-UHFFFAOYSA-N 0.000 description 2
- YWAKXRMUMFPDSH-UHFFFAOYSA-N pentene Chemical compound CCCC=C YWAKXRMUMFPDSH-UHFFFAOYSA-N 0.000 description 2
- 229920000515 polycarbonate Polymers 0.000 description 2
- 239000004417 polycarbonate Substances 0.000 description 2
- 229920000642 polymer Polymers 0.000 description 2
- 229920002223 polystyrene Polymers 0.000 description 2
- 239000008107 starch Substances 0.000 description 2
- 235000019698 starch Nutrition 0.000 description 2
- 150000003440 styrenes Chemical class 0.000 description 2
- 238000004381 surface treatment Methods 0.000 description 2
- 238000003786 synthesis reaction Methods 0.000 description 2
- 229920001059 synthetic polymer Polymers 0.000 description 2
- 229920003169 water-soluble polymer Polymers 0.000 description 2
- ONMLAAZEQUPQSE-UHFFFAOYSA-N (3-hydroxy-2,2-dimethylpropyl) 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCC(C)(C)CO ONMLAAZEQUPQSE-UHFFFAOYSA-N 0.000 description 1
- NQQRXZOPZBKCNF-NSCUHMNNSA-N (e)-but-2-enamide Chemical class C\C=C\C(N)=O NQQRXZOPZBKCNF-NSCUHMNNSA-N 0.000 description 1
- ODIGIKRIUKFKHP-UHFFFAOYSA-N (n-propan-2-yloxycarbonylanilino) acetate Chemical compound CC(C)OC(=O)N(OC(C)=O)C1=CC=CC=C1 ODIGIKRIUKFKHP-UHFFFAOYSA-N 0.000 description 1
- BSSNZUFKXJJCBG-UPHRSURJSA-N (z)-but-2-enediamide Chemical compound NC(=O)\C=C/C(N)=O BSSNZUFKXJJCBG-UPHRSURJSA-N 0.000 description 1
- WBYWAXJHAXSJNI-VOTSOKGWSA-M .beta-Phenylacrylic acid Natural products [O-]C(=O)\C=C\C1=CC=CC=C1 WBYWAXJHAXSJNI-VOTSOKGWSA-M 0.000 description 1
- DNJRKFKAFWSXSE-UHFFFAOYSA-N 1-chloro-2-ethenoxyethane Chemical compound ClCCOC=C DNJRKFKAFWSXSE-UHFFFAOYSA-N 0.000 description 1
- GXZPMXGRNUXGHN-UHFFFAOYSA-N 1-ethenoxy-2-methoxyethane Chemical compound COCCOC=C GXZPMXGRNUXGHN-UHFFFAOYSA-N 0.000 description 1
- YAOJJEJGPZRYJF-UHFFFAOYSA-N 1-ethenoxyhexane Chemical compound CCCCCCOC=C YAOJJEJGPZRYJF-UHFFFAOYSA-N 0.000 description 1
- XXCVIFJHBFNFBO-UHFFFAOYSA-N 1-ethenoxyoctane Chemical compound CCCCCCCCOC=C XXCVIFJHBFNFBO-UHFFFAOYSA-N 0.000 description 1
- OSSNTDFYBPYIEC-UHFFFAOYSA-N 1-ethenylimidazole Chemical compound C=CN1C=CN=C1 OSSNTDFYBPYIEC-UHFFFAOYSA-N 0.000 description 1
- IXPNQXFRVYWDDI-UHFFFAOYSA-N 1-methyl-2,4-dioxo-1,3-diazinane-5-carboximidamide Chemical compound CN1CC(C(N)=N)C(=O)NC1=O IXPNQXFRVYWDDI-UHFFFAOYSA-N 0.000 description 1
- KUIZKZHDMPERHR-UHFFFAOYSA-N 1-phenylprop-2-en-1-one Chemical compound C=CC(=O)C1=CC=CC=C1 KUIZKZHDMPERHR-UHFFFAOYSA-N 0.000 description 1
- IBTLFDCPAJLATQ-UHFFFAOYSA-N 1-prop-2-enoxybutane Chemical compound CCCCOCC=C IBTLFDCPAJLATQ-UHFFFAOYSA-N 0.000 description 1
- HECLRDQVFMWTQS-RGOKHQFPSA-N 1755-01-7 Chemical compound C1[C@H]2[C@@H]3CC=C[C@@H]3[C@@H]1C=C2 HECLRDQVFMWTQS-RGOKHQFPSA-N 0.000 description 1
- SYENVBKSVVOOPS-UHFFFAOYSA-N 2,2-bis(hydroxymethyl)butyl prop-2-enoate Chemical compound CCC(CO)(CO)COC(=O)C=C SYENVBKSVVOOPS-UHFFFAOYSA-N 0.000 description 1
- CISIJYCKDJSTMX-UHFFFAOYSA-N 2,2-dichloroethenylbenzene Chemical compound ClC(Cl)=CC1=CC=CC=C1 CISIJYCKDJSTMX-UHFFFAOYSA-N 0.000 description 1
- QJUCCGSXGKTYBT-UHFFFAOYSA-N 2,4,4-trimethylpent-2-enamide Chemical compound NC(=O)C(C)=CC(C)(C)C QJUCCGSXGKTYBT-UHFFFAOYSA-N 0.000 description 1
- YKUDHBLDJYZZQS-UHFFFAOYSA-N 2,6-dichloro-1h-1,3,5-triazin-4-one Chemical compound OC1=NC(Cl)=NC(Cl)=N1 YKUDHBLDJYZZQS-UHFFFAOYSA-N 0.000 description 1
- BCQHHYHGZQLDLH-UHFFFAOYSA-N 2-(2-cyanoacetyl)oxyethyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCCOC(=O)CC#N BCQHHYHGZQLDLH-UHFFFAOYSA-N 0.000 description 1
- WULAHPYSGCVQHM-UHFFFAOYSA-N 2-(2-ethenoxyethoxy)ethanol Chemical compound OCCOCCOC=C WULAHPYSGCVQHM-UHFFFAOYSA-N 0.000 description 1
- OLQFXOWPTQTLDP-UHFFFAOYSA-N 2-(2-hydroxyethoxy)ethyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCCOCCO OLQFXOWPTQTLDP-UHFFFAOYSA-N 0.000 description 1
- RWXMAAYKJDQVTF-UHFFFAOYSA-N 2-(2-hydroxyethoxy)ethyl prop-2-enoate Chemical compound OCCOCCOC(=O)C=C RWXMAAYKJDQVTF-UHFFFAOYSA-N 0.000 description 1
- JKNCOURZONDCGV-UHFFFAOYSA-N 2-(dimethylamino)ethyl 2-methylprop-2-enoate Chemical compound CN(C)CCOC(=O)C(C)=C JKNCOURZONDCGV-UHFFFAOYSA-N 0.000 description 1
- DPBJAVGHACCNRL-UHFFFAOYSA-N 2-(dimethylamino)ethyl prop-2-enoate Chemical compound CN(C)CCOC(=O)C=C DPBJAVGHACCNRL-UHFFFAOYSA-N 0.000 description 1
- BEWCNXNIQCLWHP-UHFFFAOYSA-N 2-(tert-butylamino)ethyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCCNC(C)(C)C BEWCNXNIQCLWHP-UHFFFAOYSA-N 0.000 description 1
- RCSBILYQLVXLJG-UHFFFAOYSA-N 2-Propenyl hexanoate Chemical compound CCCCCC(=O)OCC=C RCSBILYQLVXLJG-UHFFFAOYSA-N 0.000 description 1
- PZGMUSDNQDCNAG-UHFFFAOYSA-N 2-Propenyl octanoate Chemical compound CCCCCCCC(=O)OCC=C PZGMUSDNQDCNAG-UHFFFAOYSA-N 0.000 description 1
- ICGLGDINCXDWJB-UHFFFAOYSA-N 2-benzylprop-2-enamide Chemical compound NC(=O)C(=C)CC1=CC=CC=C1 ICGLGDINCXDWJB-UHFFFAOYSA-N 0.000 description 1
- SZTBMYHIYNGYIA-UHFFFAOYSA-N 2-chloroacrylic acid Chemical compound OC(=O)C(Cl)=C SZTBMYHIYNGYIA-UHFFFAOYSA-N 0.000 description 1
- SBYMUDUGTIKLCR-UHFFFAOYSA-N 2-chloroethenylbenzene Chemical compound ClC=CC1=CC=CC=C1 SBYMUDUGTIKLCR-UHFFFAOYSA-N 0.000 description 1
- WHBAYNMEIXUTJV-UHFFFAOYSA-N 2-chloroethyl prop-2-enoate Chemical compound ClCCOC(=O)C=C WHBAYNMEIXUTJV-UHFFFAOYSA-N 0.000 description 1
- AEPWOCLBLLCOGZ-UHFFFAOYSA-N 2-cyanoethyl prop-2-enoate Chemical compound C=CC(=O)OCCC#N AEPWOCLBLLCOGZ-UHFFFAOYSA-N 0.000 description 1
- MENUHMSZHZBYMK-UHFFFAOYSA-N 2-cyclohexylethenylbenzene Chemical compound C1CCCCC1C=CC1=CC=CC=C1 MENUHMSZHZBYMK-UHFFFAOYSA-N 0.000 description 1
- VUIWJRYTWUGOOF-UHFFFAOYSA-N 2-ethenoxyethanol Chemical compound OCCOC=C VUIWJRYTWUGOOF-UHFFFAOYSA-N 0.000 description 1
- XUDBVJCTLZTSDC-UHFFFAOYSA-N 2-ethenylbenzoic acid Chemical compound OC(=O)C1=CC=CC=C1C=C XUDBVJCTLZTSDC-UHFFFAOYSA-N 0.000 description 1
- WROUWQQRXUBECT-UHFFFAOYSA-N 2-ethylacrylic acid Chemical compound CCC(=C)C(O)=O WROUWQQRXUBECT-UHFFFAOYSA-N 0.000 description 1
- VHSHLMUCYSAUQU-UHFFFAOYSA-N 2-hydroxypropyl methacrylate Chemical compound CC(O)COC(=O)C(C)=C VHSHLMUCYSAUQU-UHFFFAOYSA-N 0.000 description 1
- GWZMWHWAWHPNHN-UHFFFAOYSA-N 2-hydroxypropyl prop-2-enoate Chemical compound CC(O)COC(=O)C=C GWZMWHWAWHPNHN-UHFFFAOYSA-N 0.000 description 1
- CTHJQRHPNQEPAB-UHFFFAOYSA-N 2-methoxyethenylbenzene Chemical compound COC=CC1=CC=CC=C1 CTHJQRHPNQEPAB-UHFFFAOYSA-N 0.000 description 1
- AEBNPEXFDZBTIB-UHFFFAOYSA-N 2-methyl-4-phenylbut-2-enamide Chemical compound NC(=O)C(C)=CCC1=CC=CC=C1 AEBNPEXFDZBTIB-UHFFFAOYSA-N 0.000 description 1
- WPFTVIVHDBZTSZ-UHFFFAOYSA-N 2-methyl-n-(2,4,4-trimethylpentan-2-yl)prop-2-enamide Chemical compound CC(=C)C(=O)NC(C)(C)CC(C)(C)C WPFTVIVHDBZTSZ-UHFFFAOYSA-N 0.000 description 1
- KFTHUBZIEMOORC-UHFFFAOYSA-N 2-methylbut-2-enamide Chemical compound CC=C(C)C(N)=O KFTHUBZIEMOORC-UHFFFAOYSA-N 0.000 description 1
- IZFHMLDRUVYBGK-UHFFFAOYSA-N 2-methylene-3-methylsuccinic acid Chemical compound OC(=O)C(C)C(=C)C(O)=O IZFHMLDRUVYBGK-UHFFFAOYSA-N 0.000 description 1
- LPNSCOVIJFIXTJ-UHFFFAOYSA-N 2-methylidenebutanamide Chemical compound CCC(=C)C(N)=O LPNSCOVIJFIXTJ-UHFFFAOYSA-N 0.000 description 1
- GASMGDMKGYYAHY-UHFFFAOYSA-N 2-methylidenehexanamide Chemical compound CCCCC(=C)C(N)=O GASMGDMKGYYAHY-UHFFFAOYSA-N 0.000 description 1
- BTOVVHWKPVSLBI-UHFFFAOYSA-N 2-methylprop-1-enylbenzene Chemical compound CC(C)=CC1=CC=CC=C1 BTOVVHWKPVSLBI-UHFFFAOYSA-N 0.000 description 1
- YPEMKASELPCGPB-UHFFFAOYSA-N 2-methylprop-2-enoic acid;prop-2-enamide Chemical compound NC(=O)C=C.CC(=C)C(O)=O YPEMKASELPCGPB-UHFFFAOYSA-N 0.000 description 1
- IMOLAGKJZFODRK-UHFFFAOYSA-N 2-phenylprop-2-enamide Chemical compound NC(=O)C(=C)C1=CC=CC=C1 IMOLAGKJZFODRK-UHFFFAOYSA-N 0.000 description 1
- XKWFZGCWEYYGSK-UHFFFAOYSA-N 3,3,5,5-tetramethyl-2-methylidenehexanamide Chemical compound CC(C)(C)CC(C)(C)C(=C)C(N)=O XKWFZGCWEYYGSK-UHFFFAOYSA-N 0.000 description 1
- MMINFSMURORWKH-UHFFFAOYSA-N 3,6-dioxabicyclo[6.2.2]dodeca-1(10),8,11-triene-2,7-dione Chemical compound O=C1OCCOC(=O)C2=CC=C1C=C2 MMINFSMURORWKH-UHFFFAOYSA-N 0.000 description 1
- YJBYJBXZLXFOCG-UHFFFAOYSA-N 3-(2-ethylbutoxymethyl)pentane Chemical compound CCC(CC)COCC(CC)CC YJBYJBXZLXFOCG-UHFFFAOYSA-N 0.000 description 1
- IWTYTFSSTWXZFU-UHFFFAOYSA-N 3-chloroprop-1-enylbenzene Chemical compound ClCC=CC1=CC=CC=C1 IWTYTFSSTWXZFU-UHFFFAOYSA-N 0.000 description 1
- BJOWTLCTYPKRRU-UHFFFAOYSA-N 3-ethenoxyoctane Chemical compound CCCCCC(CC)OC=C BJOWTLCTYPKRRU-UHFFFAOYSA-N 0.000 description 1
- XHULUQRDNLRXPF-UHFFFAOYSA-N 3-ethenyl-1,3-oxazolidin-2-id-4-one Chemical compound C(=C)N1[CH-]OCC1=O XHULUQRDNLRXPF-UHFFFAOYSA-N 0.000 description 1
- SWBPHQKGPHEFLH-UHFFFAOYSA-N 3-hydroxy-2-phenylprop-2-enamide Chemical compound NC(=O)C(=CO)C1=CC=CC=C1 SWBPHQKGPHEFLH-UHFFFAOYSA-N 0.000 description 1
- GNSFRPWPOGYVLO-UHFFFAOYSA-N 3-hydroxypropyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCCCO GNSFRPWPOGYVLO-UHFFFAOYSA-N 0.000 description 1
- CEBRPXLXYCFYGU-UHFFFAOYSA-N 3-methylbut-1-enylbenzene Chemical compound CC(C)C=CC1=CC=CC=C1 CEBRPXLXYCFYGU-UHFFFAOYSA-N 0.000 description 1
- ZTHJQCDAHYOPIK-UHFFFAOYSA-N 3-methylbut-2-en-2-ylbenzene Chemical compound CC(C)=C(C)C1=CC=CC=C1 ZTHJQCDAHYOPIK-UHFFFAOYSA-N 0.000 description 1
- WHNPOQXWAMXPTA-UHFFFAOYSA-N 3-methylbut-2-enamide Chemical compound CC(C)=CC(N)=O WHNPOQXWAMXPTA-UHFFFAOYSA-N 0.000 description 1
- AIMDYNJRXHEXEL-UHFFFAOYSA-N 3-phenylprop-1-enylbenzene Chemical compound C=1C=CC=CC=1CC=CC1=CC=CC=C1 AIMDYNJRXHEXEL-UHFFFAOYSA-N 0.000 description 1
- ATVJXMYDOSMEPO-UHFFFAOYSA-N 3-prop-2-enoxyprop-1-ene Chemical compound C=CCOCC=C ATVJXMYDOSMEPO-UHFFFAOYSA-N 0.000 description 1
- IHDBZCJYSHDCKF-UHFFFAOYSA-N 4,6-dichlorotriazine Chemical class ClC1=CC(Cl)=NN=N1 IHDBZCJYSHDCKF-UHFFFAOYSA-N 0.000 description 1
- JLBJTVDPSNHSKJ-UHFFFAOYSA-N 4-Methylstyrene Chemical compound CC1=CC=C(C=C)C=C1 JLBJTVDPSNHSKJ-UHFFFAOYSA-N 0.000 description 1
- OTJDDUKPDMSZHT-UHFFFAOYSA-N 4-dodecylbenzenesulfonic acid;sodium Chemical compound [Na].CCCCCCCCCCCCC1=CC=C(S(O)(=O)=O)C=C1 OTJDDUKPDMSZHT-UHFFFAOYSA-N 0.000 description 1
- QYYMDNHUJFIDDQ-UHFFFAOYSA-N 5-chloro-2-methyl-1,2-thiazol-3-one;2-methyl-1,2-thiazol-3-one Chemical compound CN1SC=CC1=O.CN1SC(Cl)=CC1=O QYYMDNHUJFIDDQ-UHFFFAOYSA-N 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 1
- 229920002126 Acrylic acid copolymer Polymers 0.000 description 1
- 229920001817 Agar Polymers 0.000 description 1
- 229920000936 Agarose Polymers 0.000 description 1
- 102000009027 Albumins Human genes 0.000 description 1
- 108010088751 Albumins Proteins 0.000 description 1
- NOWKCMXCCJGMRR-UHFFFAOYSA-N Aziridine Chemical class C1CN1 NOWKCMXCCJGMRR-UHFFFAOYSA-N 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 229920002134 Carboxymethyl cellulose Polymers 0.000 description 1
- 229920001747 Cellulose diacetate Polymers 0.000 description 1
- DQEFEBPAPFSJLV-UHFFFAOYSA-N Cellulose propionate Chemical compound CCC(=O)OCC1OC(OC(=O)CC)C(OC(=O)CC)C(OC(=O)CC)C1OC1C(OC(=O)CC)C(OC(=O)CC)C(OC(=O)CC)C(COC(=O)CC)O1 DQEFEBPAPFSJLV-UHFFFAOYSA-N 0.000 description 1
- WBYWAXJHAXSJNI-SREVYHEPSA-N Cinnamic acid Chemical compound OC(=O)\C=C/C1=CC=CC=C1 WBYWAXJHAXSJNI-SREVYHEPSA-N 0.000 description 1
- ZNZYKNKBJPZETN-WELNAUFTSA-N Dialdehyde 11678 Chemical class N1C2=CC=CC=C2C2=C1[C@H](C[C@H](/C(=C/O)C(=O)OC)[C@@H](C=C)C=O)NCC2 ZNZYKNKBJPZETN-WELNAUFTSA-N 0.000 description 1
- 239000004593 Epoxy Substances 0.000 description 1
- JIGUQPWFLRLWPJ-UHFFFAOYSA-N Ethyl acrylate Chemical compound CCOC(=O)C=C JIGUQPWFLRLWPJ-UHFFFAOYSA-N 0.000 description 1
- PIICEJLVQHRZGT-UHFFFAOYSA-N Ethylenediamine Chemical compound NCCN PIICEJLVQHRZGT-UHFFFAOYSA-N 0.000 description 1
- 239000004354 Hydroxyethyl cellulose Substances 0.000 description 1
- VVQNEPGJFQJSBK-UHFFFAOYSA-N Methyl methacrylate Chemical compound COC(=O)C(C)=C VVQNEPGJFQJSBK-UHFFFAOYSA-N 0.000 description 1
- KWKVAGQCDSHWFK-VNKDHWASSA-N Methyl sorbate Chemical compound COC(=O)\C=C\C=C\C KWKVAGQCDSHWFK-VNKDHWASSA-N 0.000 description 1
- GYCMBHHDWRMZGG-UHFFFAOYSA-N Methylacrylonitrile Chemical compound CC(=C)C#N GYCMBHHDWRMZGG-UHFFFAOYSA-N 0.000 description 1
- CNCOEDDPFOAUMB-UHFFFAOYSA-N N-Methylolacrylamide Chemical compound OCNC(=O)C=C CNCOEDDPFOAUMB-UHFFFAOYSA-N 0.000 description 1
- WHNWPMSKXPGLAX-UHFFFAOYSA-N N-Vinyl-2-pyrrolidone Chemical compound C=CN1CCCC1=O WHNWPMSKXPGLAX-UHFFFAOYSA-N 0.000 description 1
- 239000000020 Nitrocellulose Substances 0.000 description 1
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 description 1
- 229920003171 Poly (ethylene oxide) Polymers 0.000 description 1
- 239000004952 Polyamide Substances 0.000 description 1
- 239000004698 Polyethylene Substances 0.000 description 1
- 239000004743 Polypropylene Substances 0.000 description 1
- 239000004372 Polyvinyl alcohol Substances 0.000 description 1
- XBDQKXXYIPTUBI-UHFFFAOYSA-M Propionate Chemical compound CCC([O-])=O XBDQKXXYIPTUBI-UHFFFAOYSA-M 0.000 description 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- LKOIPYBSUJWJSM-UHFFFAOYSA-N [2-(dimethylamino)-2-phenoxyethyl] 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCC(N(C)C)OC1=CC=CC=C1 LKOIPYBSUJWJSM-UHFFFAOYSA-N 0.000 description 1
- XCFIVNQHHFZRNR-UHFFFAOYSA-N [Ag].Cl[IH]Br Chemical compound [Ag].Cl[IH]Br XCFIVNQHHFZRNR-UHFFFAOYSA-N 0.000 description 1
- DQVUUGHMHQPVSI-UHFFFAOYSA-N [chloro(phenyl)methyl] 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OC(Cl)C1=CC=CC=C1 DQVUUGHMHQPVSI-UHFFFAOYSA-N 0.000 description 1
- CXSXCWXUCMJUGI-UHFFFAOYSA-N [methoxy(phenyl)methyl] prop-2-enoate Chemical compound C=CC(=O)OC(OC)C1=CC=CC=C1 CXSXCWXUCMJUGI-UHFFFAOYSA-N 0.000 description 1
- 238000010306 acid treatment Methods 0.000 description 1
- 150000001252 acrylic acid derivatives Chemical class 0.000 description 1
- 150000001253 acrylic acids Chemical class 0.000 description 1
- 230000004913 activation Effects 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 239000008272 agar Substances 0.000 description 1
- HXBPYFMVGFDZFT-UHFFFAOYSA-N allyl isocyanate Chemical compound C=CCN=C=O HXBPYFMVGFDZFT-UHFFFAOYSA-N 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 239000002216 antistatic agent Substances 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- DMSMPAJRVJJAGA-UHFFFAOYSA-N benzo[d]isothiazol-3-one Chemical compound C1=CC=C2C(=O)NSC2=C1 DMSMPAJRVJJAGA-UHFFFAOYSA-N 0.000 description 1
- AOJOEFVRHOZDFN-UHFFFAOYSA-N benzyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCC1=CC=CC=C1 AOJOEFVRHOZDFN-UHFFFAOYSA-N 0.000 description 1
- GCTPMLUUWLLESL-UHFFFAOYSA-N benzyl prop-2-enoate Chemical compound C=CC(=O)OCC1=CC=CC=C1 GCTPMLUUWLLESL-UHFFFAOYSA-N 0.000 description 1
- 239000011230 binding agent Substances 0.000 description 1
- MPMBRWOOISTHJV-UHFFFAOYSA-N but-1-enylbenzene Chemical compound CCC=CC1=CC=CC=C1 MPMBRWOOISTHJV-UHFFFAOYSA-N 0.000 description 1
- OBNCKNCVKJNDBV-UHFFFAOYSA-N butanoic acid ethyl ester Natural products CCCC(=O)OCC OBNCKNCVKJNDBV-UHFFFAOYSA-N 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 125000004432 carbon atom Chemical group C* 0.000 description 1
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 1
- 239000001768 carboxy methyl cellulose Substances 0.000 description 1
- 235000010948 carboxy methyl cellulose Nutrition 0.000 description 1
- 229920003090 carboxymethyl hydroxyethyl cellulose Polymers 0.000 description 1
- 239000008112 carboxymethyl-cellulose Substances 0.000 description 1
- 239000005018 casein Substances 0.000 description 1
- BECPQYXYKAMYBN-UHFFFAOYSA-N casein, tech. Chemical compound NCCCCC(C(O)=O)N=C(O)C(CC(O)=O)N=C(O)C(CCC(O)=N)N=C(O)C(CC(C)C)N=C(O)C(CCC(O)=O)N=C(O)C(CC(O)=O)N=C(O)C(CCC(O)=O)N=C(O)C(C(C)O)N=C(O)C(CCC(O)=N)N=C(O)C(CCC(O)=N)N=C(O)C(CCC(O)=N)N=C(O)C(CCC(O)=O)N=C(O)C(CCC(O)=O)N=C(O)C(COP(O)(O)=O)N=C(O)C(CCC(O)=N)N=C(O)C(N)CC1=CC=CC=C1 BECPQYXYKAMYBN-UHFFFAOYSA-N 0.000 description 1
- 235000021240 caseins Nutrition 0.000 description 1
- 239000001913 cellulose Substances 0.000 description 1
- 229920006218 cellulose propionate Polymers 0.000 description 1
- 125000002603 chloroethyl group Chemical group [H]C([*])([H])C([H])([H])Cl 0.000 description 1
- 150000001844 chromium Chemical class 0.000 description 1
- 229930016911 cinnamic acid Natural products 0.000 description 1
- 235000013985 cinnamic acid Nutrition 0.000 description 1
- WJSDHUCWMSHDCR-UHFFFAOYSA-N cinnamyl acetate Chemical compound CC(=O)OCC=CC1=CC=CC=C1 WJSDHUCWMSHDCR-UHFFFAOYSA-N 0.000 description 1
- HNEGQIOMVPPMNR-IHWYPQMZSA-N citraconic acid Chemical compound OC(=O)C(/C)=C\C(O)=O HNEGQIOMVPPMNR-IHWYPQMZSA-N 0.000 description 1
- 229940018557 citraconic acid Drugs 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000007334 copolymerization reaction Methods 0.000 description 1
- 238000004132 cross linking Methods 0.000 description 1
- XSBSXJAYEPDGSF-UHFFFAOYSA-N diethyl 3,5-dimethyl-1h-pyrrole-2,4-dicarboxylate Chemical compound CCOC(=O)C=1NC(C)=C(C(=O)OCC)C=1C XSBSXJAYEPDGSF-UHFFFAOYSA-N 0.000 description 1
- 125000000118 dimethyl group Chemical group [H]C([H])([H])* 0.000 description 1
- SDIXRDNYIMOKSG-UHFFFAOYSA-L disodium methyl arsenate Chemical compound [Na+].[Na+].C[As]([O-])([O-])=O SDIXRDNYIMOKSG-UHFFFAOYSA-L 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000003792 electrolyte Substances 0.000 description 1
- 238000010556 emulsion polymerization method Methods 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- XJELOQYISYPGDX-UHFFFAOYSA-N ethenyl 2-chloroacetate Chemical compound ClCC(=O)OC=C XJELOQYISYPGDX-UHFFFAOYSA-N 0.000 description 1
- WNMORWGTPVWAIB-UHFFFAOYSA-N ethenyl 2-methylpropanoate Chemical compound CC(C)C(=O)OC=C WNMORWGTPVWAIB-UHFFFAOYSA-N 0.000 description 1
- MEGHWIAOTJPCHQ-UHFFFAOYSA-N ethenyl butanoate Chemical compound CCCC(=O)OC=C MEGHWIAOTJPCHQ-UHFFFAOYSA-N 0.000 description 1
- LZWYWAIOTBEZFN-UHFFFAOYSA-N ethenyl hexanoate Chemical compound CCCCCC(=O)OC=C LZWYWAIOTBEZFN-UHFFFAOYSA-N 0.000 description 1
- BLZSRIYYOIZLJL-UHFFFAOYSA-N ethenyl pentanoate Chemical compound CCCCC(=O)OC=C BLZSRIYYOIZLJL-UHFFFAOYSA-N 0.000 description 1
- UIWXSTHGICQLQT-UHFFFAOYSA-N ethenyl propanoate Chemical compound CCC(=O)OC=C UIWXSTHGICQLQT-UHFFFAOYSA-N 0.000 description 1
- BEFDCLMNVWHSGT-UHFFFAOYSA-N ethenylcyclopentane Chemical compound C=CC1CCCC1 BEFDCLMNVWHSGT-UHFFFAOYSA-N 0.000 description 1
- 125000002573 ethenylidene group Chemical group [*]=C=C([H])[H] 0.000 description 1
- SUPCQIBBMFXVTL-UHFFFAOYSA-N ethyl 2-methylprop-2-enoate Chemical compound CCOC(=O)C(C)=C SUPCQIBBMFXVTL-UHFFFAOYSA-N 0.000 description 1
- XWNVSPGTJSGNPU-UHFFFAOYSA-N ethyl 4-chloro-1h-indole-2-carboxylate Chemical compound C1=CC=C2NC(C(=O)OCC)=CC2=C1Cl XWNVSPGTJSGNPU-UHFFFAOYSA-N 0.000 description 1
- 239000001530 fumaric acid Substances 0.000 description 1
- 230000009477 glass transition Effects 0.000 description 1
- 150000004676 glycans Chemical class 0.000 description 1
- KETWBQOXTBGBBN-UHFFFAOYSA-N hex-1-enylbenzene Chemical compound CCCCC=CC1=CC=CC=C1 KETWBQOXTBGBBN-UHFFFAOYSA-N 0.000 description 1
- 125000001165 hydrophobic group Chemical group 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- 235000019447 hydroxyethyl cellulose Nutrition 0.000 description 1
- WARQUFORVQESFF-UHFFFAOYSA-N isocyanatoethene Chemical compound C=CN=C=O WARQUFORVQESFF-UHFFFAOYSA-N 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- 238000013532 laser treatment Methods 0.000 description 1
- HNEGQIOMVPPMNR-NSCUHMNNSA-N mesaconic acid Chemical compound OC(=O)C(/C)=C/C(O)=O HNEGQIOMVPPMNR-NSCUHMNNSA-N 0.000 description 1
- 150000002734 metacrylic acid derivatives Chemical class 0.000 description 1
- 239000001375 methyl (2E,4E)-hexa-2,4-dienoate Substances 0.000 description 1
- MCVVUJPXSBQTRZ-ONEGZZNKSA-N methyl (e)-but-2-enoate Chemical compound COC(=O)\C=C\C MCVVUJPXSBQTRZ-ONEGZZNKSA-N 0.000 description 1
- MPHUYCIKFIKENX-UHFFFAOYSA-N methyl 2-ethenylbenzoate Chemical compound COC(=O)C1=CC=CC=C1C=C MPHUYCIKFIKENX-UHFFFAOYSA-N 0.000 description 1
- WBYWAXJHAXSJNI-UHFFFAOYSA-N methyl p-hydroxycinnamate Natural products OC(=O)C=CC1=CC=CC=C1 WBYWAXJHAXSJNI-UHFFFAOYSA-N 0.000 description 1
- XJRBAMWJDBPFIM-UHFFFAOYSA-N methyl vinyl ether Chemical compound COC=C XJRBAMWJDBPFIM-UHFFFAOYSA-N 0.000 description 1
- HNEGQIOMVPPMNR-UHFFFAOYSA-N methylfumaric acid Natural products OC(=O)C(C)=CC(O)=O HNEGQIOMVPPMNR-UHFFFAOYSA-N 0.000 description 1
- 230000000813 microbial effect Effects 0.000 description 1
- DNTMQTKDNSEIFO-UHFFFAOYSA-N n-(hydroxymethyl)-2-methylprop-2-enamide Chemical compound CC(=C)C(=O)NCO DNTMQTKDNSEIFO-UHFFFAOYSA-N 0.000 description 1
- TVMXDCGIABBOFY-UHFFFAOYSA-N n-Octanol Natural products CCCCCCCC TVMXDCGIABBOFY-UHFFFAOYSA-N 0.000 description 1
- DSGQWDHZUIZVCR-UHFFFAOYSA-N n-but-3-enylacetamide Chemical compound CC(=O)NCCC=C DSGQWDHZUIZVCR-UHFFFAOYSA-N 0.000 description 1
- JBLADNFGVOKFSU-UHFFFAOYSA-N n-cyclohexyl-2-methylprop-2-enamide Chemical compound CC(=C)C(=O)NC1CCCCC1 JBLADNFGVOKFSU-UHFFFAOYSA-N 0.000 description 1
- RCLLINSDAJVOHP-UHFFFAOYSA-N n-ethyl-n',n'-dimethylprop-2-enehydrazide Chemical compound CCN(N(C)C)C(=O)C=C RCLLINSDAJVOHP-UHFFFAOYSA-N 0.000 description 1
- KKFHAJHLJHVUDM-UHFFFAOYSA-N n-vinylcarbazole Chemical compound C1=CC=C2N(C=C)C3=CC=CC=C3C2=C1 KKFHAJHLJHVUDM-UHFFFAOYSA-N 0.000 description 1
- 150000002825 nitriles Chemical class 0.000 description 1
- 229920001220 nitrocellulos Polymers 0.000 description 1
- RCALDWJXTVCBAZ-UHFFFAOYSA-N oct-1-enylbenzene Chemical compound CCCCCCC=CC1=CC=CC=C1 RCALDWJXTVCBAZ-UHFFFAOYSA-N 0.000 description 1
- 229940065472 octyl acrylate Drugs 0.000 description 1
- ANISOHQJBAQUQP-UHFFFAOYSA-N octyl prop-2-enoate Chemical compound CCCCCCCCOC(=O)C=C ANISOHQJBAQUQP-UHFFFAOYSA-N 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- AVNANMSIFNUHNY-MQQKCMAXSA-N oxiran-2-ylmethyl (2e,4e)-hexa-2,4-dienoate Chemical compound C\C=C\C=C\C(=O)OCC1CO1 AVNANMSIFNUHNY-MQQKCMAXSA-N 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- HVAMZGADVCBITI-UHFFFAOYSA-M pent-4-enoate Chemical compound [O-]C(=O)CCC=C HVAMZGADVCBITI-UHFFFAOYSA-M 0.000 description 1
- ULDDEWDFUNBUCM-UHFFFAOYSA-N pentyl prop-2-enoate Chemical compound CCCCCOC(=O)C=C ULDDEWDFUNBUCM-UHFFFAOYSA-N 0.000 description 1
- PNJWIWWMYCMZRO-UHFFFAOYSA-N pent‐4‐en‐2‐one Natural products CC(=O)CC=C PNJWIWWMYCMZRO-UHFFFAOYSA-N 0.000 description 1
- QIWKUEJZZCOPFV-UHFFFAOYSA-N phenyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OC1=CC=CC=C1 QIWKUEJZZCOPFV-UHFFFAOYSA-N 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 238000009832 plasma treatment Methods 0.000 description 1
- 239000002985 plastic film Substances 0.000 description 1
- 229920006255 plastic film Polymers 0.000 description 1
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 1
- 229920002401 polyacrylamide Polymers 0.000 description 1
- 229920002647 polyamide Polymers 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 229920000120 polyethyl acrylate Polymers 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 239000004848 polyfunctional curative Substances 0.000 description 1
- 239000002861 polymer material Substances 0.000 description 1
- 239000004926 polymethyl methacrylate Substances 0.000 description 1
- 229920000098 polyolefin Polymers 0.000 description 1
- 229920001155 polypropylene Polymers 0.000 description 1
- 229920001282 polysaccharide Polymers 0.000 description 1
- 239000005017 polysaccharide Substances 0.000 description 1
- 229920002451 polyvinyl alcohol Polymers 0.000 description 1
- 229920000036 polyvinylpyrrolidone Polymers 0.000 description 1
- 239000001267 polyvinylpyrrolidone Substances 0.000 description 1
- 235000013855 polyvinylpyrrolidone Nutrition 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- POSICDHOUBKJKP-UHFFFAOYSA-N prop-2-enoxybenzene Chemical compound C=CCOC1=CC=CC=C1 POSICDHOUBKJKP-UHFFFAOYSA-N 0.000 description 1
- ZQMAPKVSTSACQB-UHFFFAOYSA-N prop-2-enyl dodecanoate Chemical compound CCCCCCCCCCCC(=O)OCC=C ZQMAPKVSTSACQB-UHFFFAOYSA-N 0.000 description 1
- BOQSSGDQNWEFSX-UHFFFAOYSA-N propan-2-yl 2-methylprop-2-enoate Chemical compound CC(C)OC(=O)C(C)=C BOQSSGDQNWEFSX-UHFFFAOYSA-N 0.000 description 1
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 238000000746 purification Methods 0.000 description 1
- 230000001846 repelling effect Effects 0.000 description 1
- KIWUVOGUEXMXSV-UHFFFAOYSA-N rhodanine Chemical compound O=C1CSC(=S)N1 KIWUVOGUEXMXSV-UHFFFAOYSA-N 0.000 description 1
- 230000001235 sensitizing effect Effects 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 239000000661 sodium alginate Substances 0.000 description 1
- 235000010413 sodium alginate Nutrition 0.000 description 1
- 229940005550 sodium alginate Drugs 0.000 description 1
- 159000000000 sodium salts Chemical class 0.000 description 1
- HFQQZARZPUDIFP-UHFFFAOYSA-M sodium;2-dodecylbenzenesulfonate Chemical compound [Na+].CCCCCCCCCCCCC1=CC=CC=C1S([O-])(=O)=O HFQQZARZPUDIFP-UHFFFAOYSA-M 0.000 description 1
- SYWDUFAVIVYDMX-UHFFFAOYSA-M sodium;4,6-dichloro-1,3,5-triazin-2-olate Chemical compound [Na+].[O-]C1=NC(Cl)=NC(Cl)=N1 SYWDUFAVIVYDMX-UHFFFAOYSA-M 0.000 description 1
- JHJUUEHSAZXEEO-UHFFFAOYSA-M sodium;4-dodecylbenzenesulfonate Chemical compound [Na+].CCCCCCCCCCCCC1=CC=C(S([O-])(=O)=O)C=C1 JHJUUEHSAZXEEO-UHFFFAOYSA-M 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 229940075582 sorbic acid Drugs 0.000 description 1
- 239000004334 sorbic acid Substances 0.000 description 1
- 235000010199 sorbic acid Nutrition 0.000 description 1
- 230000003068 static effect Effects 0.000 description 1
- 150000005846 sugar alcohols Polymers 0.000 description 1
- 230000008961 swelling Effects 0.000 description 1
- 238000010998 test method Methods 0.000 description 1
- 239000004408 titanium dioxide Substances 0.000 description 1
- 150000003918 triazines Chemical class 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- 150000003754 zirconium Chemical class 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
- G03C1/00—Photosensitive materials
- G03C1/76—Photosensitive materials characterised by the base or auxiliary layers
- G03C1/91—Photosensitive materials characterised by the base or auxiliary layers characterised by subbing layers or subbing means
- G03C1/93—Macromolecular substances therefor
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- General Physics & Mathematics (AREA)
- Coating Of Shaped Articles Made Of Macromolecular Substances (AREA)
Description
(産業上の利用分野)
本発明は写真材料に関するもので、特に疎水性
表面を有する支持体上に親水性コロイドかな成る
写真層をもうけた写真材料に関するものである。
(従来の技術)
従来より写真用支持体として、その透明性、可
撓性等の秀れている点でポリエチレンテレフタレ
ート、トリ酢酸セルロース、ポリスチレン、ポリ
カーボネート、ポリオレフインラミネート紙等が
多く用いられている。
これら高分子物質を支持体に使用する場合、支
持体がいずれも疎水性の表面を有するため、これ
ら支持体上にゼラチンが主である親水性コロイド
からなる写真層を強固に接着させる事が必要であ
る。このために試みられた従来技術における、疎
水性支持体の表面処理としては、
(1) 薬品処理、機械的処理、コロナ放電処理、火
焔処理、紫外線処理、高周波処理、グロー放電
処理、活性プラズマ処理、レーザー処理、混酸
処理、オゾン酸化処理、などの表面活性化処理
したのち、直接写真乳剤を塗布して接着力を得
る方法と、
(2) 一旦これらの表面処理をした後、下塗層を設
けこの上に写真乳剤層を塗布する方法との二法
がある。
(例えば、米国特許第2698241号、2764520号、
2864755号、3143421号、3462335号、3475193号、
3615556号、英国特許第788365号、804005号、
891469号等)。これらのうち(2)の方法がより有効
であり広く行なわれている。これらの表面処理は
いずれも、本来は疎水性であつた支持体表面に、
多少共、極性基を作らせる事、極表面の接着に対
してマイナスの要因になる薄層を除去する事、表
面の架橋密度を増加させ接着強度をあげる事など
により表面の接着力を増加させるものと思われ、
その結果として下塗液中に含有される成分の極性
基との親和力が増加することによるものないし、
接着表面の堅牢度が増加することによるもの等が
考えられる。
又、下塗層の塗布の方法としても種々の工夫が
行なわれており、第一層として支持体によく接着
する層を設け、その上に第二層として親水性の樹
脂層を塗布する所謂、重量法と疎水性基と親水性
基との両方を含有する樹脂層を一層のみ、塗布す
る単層法とがある。
これらの方法はいずれもよく研究されており、
例えば、塩化ビニル、塩化ビニリデン、ブタジエ
ン、メタクリル酸、アクリル酸、イタコン酸、無
水マレイン酸などの中から選ばれた単量体を出発
原料とする共重合体を始めとして、ポリエチレン
イミン、エポキシ樹脂グラフト化ゼラチン、ニト
ロセルロースなど数多くの樹脂についてその適性
が検討されてきた。
特に、疎水性支持体と親水性ハロゲン化銀乳剤
との間に実用に耐え得る充分な接着力を得る下塗
方法を完全に水系で行なう為に、特に塩化ビニリ
デン系共重合体、ジエン系共重合体の検討が行な
われている。
我々はベースと乳剤層とを接着させる方法とし
て、ジエン系単量体を、その一成分とする共重合
体を単独、又は適当な架橋剤と併用して下塗組成
分として有効である事が見い出して来た。
(例えば特開昭51−114120号、同54−94025号、
同55−65949号)
下塗されたベース面に、写真乳剤層との接着力
を得る為にゼラチン又はゼラチン誘導体などの親
水性物質を塗布する事が良く知られている。
ところで、下塗液として主溶媒として水を用い
て塗布する場合、塗布液が長時間放置されると、
微生物が繁殖し、腐敗によつて、下塗液中に浮遊
物を生じて、ハジキ、異物付着等の塗布面故障を
発生する事があつた。
一方下塗された支持体は、帯電防止性を有する
事が必要である。その理由は、下塗された支持体
に、ハロゲン化銀写真乳剤層を塗布する前に、ハ
ンドリングにより、ローラーとの剥離で帯電を生
じると乳剤層の塗布ムラを生じたりする事がある
からである。あるいは、乳剤層を塗布した後で
も、裏面あるいは端部に下塗ベース面が残つてい
る場合には、そこからの放電によりいわゆるスタ
チツク故障を生じる事があるからである。
我々は、上記2点の問題点を同時に解決する為
に鋭意検討した結果、本発明に到達したものであ
る。
(発明の目的)
本発明の目的は、第一に下塗液の腐敗を防止す
る事である。第二に下塗された支持体面に帯電防
止性を付与させる事である。第三に写真乳剤層に
なんらの悪影響を与える事の無い下塗層を提供す
る事にある。第四にハジキ、異物等の塗布面故障
を生じる事の無い下塗層を提供する事にある。
(問題点を解決する為の手段)
本発明のこれらの目的は疎水性支持体上に水溶
性下塗液あるいは、水分散性下塗液にて、塗設す
る下塗層を有する写真感光材料において、その下
塗液中に下記物質のうち少くとも1種類が添加さ
れている事を特徴とする写真感光材料により達成
された。
但し、上記一般式におけるRは水素原子又は
Co+H2o+1(n=1〜20)を表わす。
以下、本発明に用いられる構成要件について詳
述する。
本発明に於て、疎水性支持体とは、例えば、セ
ルロースエステル(特にセルローストリアセテー
ト、セルロースジアセテート、セルロースプロピ
オネート)、ポリアミド、ポリカーボネート、ポ
リエステル(特にポリエチレンテレフタレート、
ポリ−1,4−シクロヘキサンジメチレンテレフ
タレート、ポリエチレン−1,2−ジフエノキシ
エタン−4,4′−ジカルボキシレート)、ポリス
チレン、ポリプロピレン、ポリエチレン等から成
るフイルム及びこれらのフイルムを紙等他の支持
体上に塗布又はラミネートして成る複合フイルム
をいう。
中でも、ポリエチレンテレフタレートフイルム
が最も好ましく用いられ、特に2軸延伸、熱固定
されたポリエチレンテレフタレートフイルムが、
安定性、強じん性等の点からも有利に用いられ
る。
プラスチツクフイルム支持体の厚さに特に制限
はないが、15〜500μ、特に40〜200μ程度のもの
が取扱い易さ、汎用性などの点から有利である。
又、支持体は、透明でもよいし、染料を含んで
いてもよいし、二酸化チタンの如き顔料を含有す
るもの、さらに、二酸化ケイ素、アルミナゾル、
クロム塩、ジルコニウム塩等を含有していてもよ
い。
本発明において、疎水性支持体上に設けられる
下塗液中には、必らずしも必要ではないが合成あ
るいは、天然の高分子物質が通常含まれる。疎水
性支持体に設けられる下塗層は、一層以上何層あ
つても良く、本発明で使用される添加(1)〜(3)はそ
れらの、どの層に添加されても良く、添加剤(1)〜
(3)は高分子物質が合成・精製される段階で添加さ
れても、下塗液として調製される段階で添加され
てもかまわない。
合成高分子物質としては、ジエン系単量体の共
重合体、塩化ビニリデン系共重合体、アクリル酸
エステル系共重合体、無水マレイン酸の共重合体
などが好ましく用いられる。合成高分子物質は、
水系ラテツクスエマルジヨン又は水溶性ポリマー
として用いられ、溶剤が水であるならば、高分子
物質の構造は特に限定されない。通常この様な合
成高分子物質は、疎水性支持体に最も近い層に用
いられ、この層の上に直接ハロゲン化銀乳剤層が
塗設されるかあるいは、この層に上にゼラチンな
どの様な親水性バインダー層を設けたのち、ハロ
ゲン化銀乳剤層が設けられる。
ジエン系単量体の共重合体とは、ブタジエン、
イソプレンなど炭素数4ないし約8のジエン系単
量体を重合体の一成分とする共重合体をいう。
共重合の相手としては、例えば、スチレン、ア
クリロニトリル、アクリルエステル、メタアクリ
ルエステル(メチル、エチル、ブチル、プロピル
など)、ビニルエーテル(メチル、エチル、クロ
ロエチル、ブチルなど)、ビニルエステル(たと
えば酢酸ビニル、プロピオン酸ビニルなど)、グ
リシジルアクリレート、グリシジルメタクリレー
ト、アリルグリシジルエーテル、ジメチルアミノ
エチルメタクリレート、ビニルピリジン、tert−
ブチルアミノエチルメタクリレート、アクリル
酸、メタクリル酸、クロトン酸、イタコン酸、イ
タコン酸半エステル、マレイン酸、マレイン酸半
エステル、無水イタコン酸、無水マレイン酸、ア
リルアルコール、2−ヒドロキシエチルメタクリ
レート、2−ヒドロキシエチルアクリレート、2
−ヒドロキシプロピルメタアクリレート、2−ヒ
ドロキシプロピルアクリレート、多価アルコール
のモノアリルエーテル、
アクリルアミド、メタクリルアミド、マレイン
アミド、N−メチロールアクリルアミド、N−メ
チロールメタクリルアミドとそのエーテル、ビニ
ルイソシアネート、アリルイソシアネートなど炭
素数2ないし約8のビニル又はビニリデン化合物
から選ばれる。これらは乳化重合法により、好都
合に製造され、市販品も入手できる。又、この共
重合体中のジエン成分の量は約30〜60重量%、好
ましくは32〜40重量%がよい。
又、共重合体中には、アマイド、ヒドロキシ、
カルボキシなどの親水性部位をもつ単量体を0.1
ないし20重量%程度含ませることができる。
その他に、本発明で用いられる高分子物質とし
ては、ガラス転移温度が−20℃から40℃の範囲に
ある様な共重合体又はホモポリマーがあげられ
る。この様な共重合体又はホモポリマーの合成に
用いられる単量体の例としては、例えばアクリル
酸エステル類、アクリルアミド類、メタクリル酸
エステル類、メタクリルアミド類、アリル化合
物、ビニルエーテル類、ビニルエステル類、ビニ
ル異節環化合物、N−ビニル化合物、スチレン
類、クロトン酸類、イタコン酸類、オレフイン
類、オレフイン類、無水マレイン酸類などがあ
る。これらの具体例としては、アクリル酸類、例
えば、アクリル酸、アクリレート(例えばアクリ
ル酸エチル、アクリル酸ブチル、アクリル酸アミ
ル、アクリル酸オクチル、2−ブトキシエチルア
クリレート、クロルエチルアクリレート、ヒドロ
キシエチルアクリレート、シアノエチルアクリレ
ート、ジメチルアミノエチルアクリレート、ジエ
チレングリコールモノアクリレート、トリメチロ
ールプロパンモノアクリレート、グリシジルアク
リレート、ベンジルアクリレート、メトキシベン
ジルアクリレート、など):
メタクリル酸類、例えば、メタクリル酸、メタ
アクリレート(例えばメチルメタクリレート、エ
チルメタクリレート、イソプロピルメタクリレー
ト、ベンジルメタクリレート、シアノアセトキシ
エチルメタクリレート、クロルベンジルメタクリ
レート、エチレングリコールモノメタクリレー
ト、3−ヒドロキシプロピルメタクリレート、
2,2−ジメチル−3−ヒドロキシプロピルメタ
クリレート、ジエチレングリコールモノメタクリ
レート、グリシジルメタクリレート、ジメチルア
ミノフエノキシエチルメタクリレート、フエニル
メタクリレートなど):
アクリルアミド類、例えばアクリルアミド、N
−置換アクリルアミド(例えば、メチルアクリル
アミド、エチルアクリルアミド、ブチルアクリル
アミド、t−オクチルアクリルアミド、ベンジル
アクリルアミド、ジメチルアミノエチルアクリル
アミド、フエニルアクリルアミド、ヒドロキシフ
エニルアクリルアミド、ジメチルアクリルアミ
ド、ジブチルアクリルアミド、など):
メタクリルアミド類、例えばメタクリルアミ
ド、N−置換メタクリルアミド(例えば、メチル
メタクリルアミド、t−ブチルメタクリルアミ
ド、t−オクチルメタクリルアミド、ベンジルメ
タクリルアミド、シクロヘキシルメタクリルアミ
ド、など):
アリル化合物、例えばアリルエステル類(例え
ば酢酸アリル、カプロン酸アリル、カプリル酸ア
リル、ラウリン酸アリル、など)、アリルエキシ
エタノール、アリルブチルエーテル、アリルグリ
シジルエーテル、アリルフエニルエーテルなど:
ビニルエーテル類、(例えばメチルビニルエー
テル、ブチルビニルエーテル、ヘキシルビニルエ
ーテル、オクチルビニルエーテル、エチルヘキシ
ルビニルエーテル、メトキシエチルビニルエーテ
ル、クロルエチルビニルエーテル、2−エチルブ
チルエーテル、ヒドロキシエチルビニルエーテ
ル、ジエチレングリコールビニルエーテルな
ど):
ビニルエステル類、例えばビニルアセテート、
ビニルプロピオネート、ビニルブチレート、ビニ
ルイソブチレート、ビニルジメチルプロピオネー
ト、ビニルエチルブチレート、ビニルバレレー
ト、ビニルカプロエート、ビニルクロルアセテー
ト、など:
ビニル異節環化合物、例えばN−ビニルオキサ
ゾリドン、ビニルピリジン、N−ビニルイミダゾ
ール、N−ビニルピロリドン、N−ビニルカルバ
ゾール、N−ビニルエチルアセトアミドなど:
スチレン類(例えばスチレン、メチルスチレ
ン、ジメチルスチレン、トリメチルスチレン、エ
チルスチレン、イソプロピルスチレン、ブチルス
チレン、ヘキシルスチレン、シクロヘキシルスチ
レン、ベンジルスチレン、クロルメチルスチレ
ン、アセトキシメチルスチレン、メトキシスチレ
ン、クロルスチレン、ジクロルスチレン、ビニル
安息香酸、ビニル安息香酸メチルエステルな
ど):クロトン酸類、例えば、クロトン酸、クロ
トン酸アミド、クロトン酸エステル(例えばクロ
トン酸ブチル、など)
ビニルケトル類(例えば、メチルビニルケト
ン、フエニルビニルケトン、など)
オレフイン類(例えば、ジシクロペンタジエ
ン、エチレン、プロピレン、1−ブテン、1−ペ
ンテン、1−ヘキセン、1−ヘプテン、1−オク
テン、など)、イタコン酸類(例えばイタコン酸、
無水イタコン酸、イタコン酸メチル)、クロトン
酸類(例えばクロトン酸、クロトン酸メチル)、
ソルビン酸、桂皮酸、ソルビン酸メチル、ソルビ
ン酸グリシジル、シトラコン酸、クロルアクリル
酸、メサコン酸、マレイン酸、フマール酸、エタ
クリル酸、ハロゲン化オレフイン類(たとえば塩
化ビニル、塩化ビニリデン、イソプレンなど)、
不飽和ニトリル類(たとえばアクリロニトリル、
メタクリロニトリルなど)などがある。共重合体
は、2種以上の単量体よりなる共重合体であつて
も良い。この様な共重合体の例としては、スチレ
ン/n−ブチルアクリレート/アクリル酸共重合
体、スチレン/n−ブチルアクリレート/グリシ
ジルアクリレート共重合体などがある。
水溶性ポリマーとしては、ゼラチン、フタル化
ゼラチン、マレイン化ゼラチンなどのアシル化ゼ
ラチン、カルボキシメチルセルロース、ヒドロキ
シエチルセルロース等のセルロース誘導体、アク
リル酸、メタクリル酸もしくはアミドなどをゼラ
チンにグラフトさせたグラフト化ゼラチン、ポリ
ビニルアルコール、ポリヒドロキシアルキルアク
リレート、ポリビニルピロリドン、コポリ−ビニ
ルピロリドン−酢酸ビニル、カゼイン、アガロー
ス、アルブミン、アルギン酸ソーダ、ポリサツカ
ライド、寒天、でんぷん、グラフトでんぷん、ポ
リアクリルアミド、ポリエチレンイミンアシル化
物、あるいはアクリル酸、メタクリル酸アクリル
アミド、N−置換アクリルアミド、N−置換メタ
クリルアミドなどの単独もしくは共重合体、ある
いはそれらの部分加水分解物など合成もしくは天
然の親水性高分子化合物が用いられる。これらの
ものは、単独もしくは混合して使用できる。
好ましい親水性ポリマーとしては、ゼラチンあ
るいはゼラチン誘導体である。
本発明で使用される添加剤(1)〜(3)は、市販品と
してI.C.I社のプロキセルCRL(1)に相当、ソマー
ル工業社のソマサイドRS(2)+(3)に相当、武田薬
品社のスラオフ72N(2)に相当、パーマケムアジア
社のトツプサイド800(2)に相当などを利用する事
も出来る。
これらの添加量については特に制限は無いが下
塗液中0.0001%から10%、好ましくは0.001%か
ら1%の範囲で使用される。
これらは、水、メタノール、エチレンジアミン
などを溶媒として添加する事が出来る。
共重合体あるいはホモポリマーの水分散液ある
いは水溶液を、下塗液として塗布する為には該水
分散液を更に水で稀釈し、必要により、架橋剤、
界面活性剤、膨潤剤、マツト剤、他の帯電防止
剤、電解質等を添加する事が出来る。
架橋剤としては例えば、米国特許第3325287号、
同3288775号、同3549377号、ベルギー特許第
6602226号等に記載のトリアジン系化合物;米国
特許第3291624号、同3232764号、フランス特許第
1543694号、英国特許第1270578号に記載のジアル
デヒド系化合物;米国特許第3091537号、特公昭
49−26580号等に記載のエポキシ系化合物;米国
特許第3642486号等に記載のビニル系化合物;米
国特許第3392024号に記載のアジリン系化合物;
米国特許第3549378号等に記載のエチレンイミン
系化合物;及びメチロール系化合物がある。
これらの化合物のうち、ジクロロトリアジン誘
導体としては例えば次式
(Industrial Field of Application) The present invention relates to a photographic material, and more particularly to a photographic material having a photographic layer comprising a hydrophilic colloid on a support having a hydrophobic surface. (Prior Art) Conventionally, polyethylene terephthalate, cellulose triacetate, polystyrene, polycarbonate, polyolefin laminated paper, and the like have been widely used as photographic supports due to their excellent transparency and flexibility. When these polymeric substances are used as supports, it is necessary to firmly adhere a photographic layer made of hydrophilic colloid, mainly gelatin, onto these supports, as they all have hydrophobic surfaces. It is. Surface treatments of hydrophobic supports in conventional techniques attempted for this purpose include (1) chemical treatment, mechanical treatment, corona discharge treatment, flame treatment, ultraviolet treatment, high frequency treatment, glow discharge treatment, and activated plasma treatment. (2) After surface activation treatments such as laser treatment, mixed acid treatment, and ozone oxidation treatment, adhesive strength is obtained by directly applying photographic emulsion. There are two methods: first, and then coating a photographic emulsion layer thereon. (For example, U.S. Patent Nos. 2,698,241, 2,764,520,
No. 2864755, No. 3143421, No. 3462335, No. 3475193,
No. 3615556, British Patent No. 788365, No. 804005,
No. 891469, etc.). Among these methods, method (2) is more effective and widely used. All of these surface treatments treat the originally hydrophobic surface of the support.
To some extent, surface adhesion is increased by creating polar groups, removing thin layers that are a negative factor for adhesion on the extreme surface, and increasing the crosslinking density on the surface to increase adhesion strength. It seems like something,
This is due to an increase in affinity with the polar groups of the components contained in the undercoat liquid, or
This may be due to an increase in the fastness of the adhesive surface. Various methods have also been used to apply the undercoat layer, such as providing a layer that adheres well to the support as the first layer, and coating a hydrophilic resin layer on top of it as the second layer. There is a gravimetric method and a single layer method in which only one resin layer containing both a hydrophobic group and a hydrophilic group is applied. All of these methods are well researched;
Examples include copolymers starting from monomers selected from vinyl chloride, vinylidene chloride, butadiene, methacrylic acid, acrylic acid, itaconic acid, maleic anhydride, etc., as well as polyethyleneimine and epoxy resin grafts. The suitability of many resins such as gelatin and nitrocellulose has been investigated. In particular, in order to perform the undercoating method entirely in an aqueous system to obtain sufficient adhesion between a hydrophobic support and a hydrophilic silver halide emulsion for practical use, vinylidene chloride copolymers, diene copolymers, etc. A merger is currently being considered. We have found that a copolymer containing a diene monomer as one component is effective as an undercoat component, either alone or in combination with an appropriate crosslinking agent, as a method for adhering the base and the emulsion layer. I came. (For example, JP-A-51-114120, JP-A No. 54-94025,
No. 55-65949) It is well known to apply a hydrophilic substance such as gelatin or a gelatin derivative to the primed base surface in order to obtain adhesive strength with the photographic emulsion layer. By the way, when applying water as the main solvent for the undercoating liquid, if the coating liquid is left for a long time,
Microorganisms propagate and putrefy, resulting in floating matter in the undercoating solution, which can lead to failures on the coated surface such as repelling and foreign matter adhesion. On the other hand, the subbed support must have antistatic properties. The reason for this is that before a silver halide photographic emulsion layer is applied to a subbed support, handling may cause charging due to peeling from a roller, which may cause uneven coating of the emulsion layer. . Alternatively, if the undercoat base surface remains on the back side or end portion even after the emulsion layer is coated, a so-called static failure may occur due to discharge from there. We have arrived at the present invention as a result of intensive studies aimed at simultaneously solving the above two problems. (Object of the Invention) The first object of the present invention is to prevent spoilage of the undercoating liquid. The second purpose is to impart antistatic properties to the surface of the subbed support. The third objective is to provide an undercoat layer that does not have any adverse effect on the photographic emulsion layer. Fourthly, it is necessary to provide an undercoat layer that does not cause failure of the coated surface due to cissing, foreign matter, etc. (Means for Solving the Problems) These objects of the present invention are to provide a photographic material having an undercoat layer coated on a hydrophobic support with a water-soluble undercoat liquid or a water-dispersible undercoat liquid; This has been achieved by a photographic material characterized in that at least one of the following substances is added to the undercoating liquid. However, R in the above general formula is a hydrogen atom or
Represents C o +H 2o+1 (n=1 to 20). Hereinafter, the constituent elements used in the present invention will be explained in detail. In the present invention, hydrophobic supports include, for example, cellulose esters (especially cellulose triacetate, cellulose diacetate, cellulose propionate), polyamides, polycarbonates, polyesters (especially polyethylene terephthalate,
Films made of poly(1,4-cyclohexane dimethylene terephthalate, polyethylene-1,2-diphenoxyethane-4,4'-dicarboxylate), polystyrene, polypropylene, polyethylene, etc., and these films can be used in other materials such as paper. A composite film formed by coating or laminating on a support. Among them, polyethylene terephthalate film is most preferably used, especially biaxially stretched and heat-set polyethylene terephthalate film.
It is also advantageously used in terms of stability, toughness, etc. There is no particular limit to the thickness of the plastic film support, but a thickness of about 15 to 500 microns, especially about 40 to 200 microns, is advantageous in terms of ease of handling and versatility. Further, the support may be transparent, may contain a dye, may contain a pigment such as titanium dioxide, and may further include silicon dioxide, alumina sol,
It may contain chromium salt, zirconium salt, etc. In the present invention, the undercoating solution provided on the hydrophobic support usually contains a synthetic or natural polymeric substance, although it is not absolutely necessary. The undercoat layer provided on the hydrophobic support may have one or more layers, and the additives (1) to (3) used in the present invention may be added to any of these layers. (1)~
(3) may be added during the synthesis and purification of the polymeric substance, or may be added during the preparation of the undercoating solution. As the synthetic polymer material, copolymers of diene monomers, vinylidene chloride copolymers, acrylic ester copolymers, maleic anhydride copolymers, etc. are preferably used. Synthetic polymer substances are
The structure of the polymeric substance is not particularly limited as long as it is used as a water-based latex emulsion or a water-soluble polymer and the solvent is water. Usually, such synthetic polymeric substances are used as the layer closest to the hydrophobic support, and a silver halide emulsion layer is coated directly on this layer, or a layer such as gelatin is applied on top of this layer. After providing a hydrophilic binder layer, a silver halide emulsion layer is provided. Copolymers of diene monomers include butadiene,
A copolymer containing a diene monomer having 4 to about 8 carbon atoms, such as isoprene, as one component of the polymer. Copolymerization partners include, for example, styrene, acrylonitrile, acrylic esters, methacrylic esters (methyl, ethyl, butyl, propyl, etc.), vinyl ethers (methyl, ethyl, chloroethyl, butyl, etc.), vinyl esters (such as vinyl acetate, propion). vinyl acid, etc.), glycidyl acrylate, glycidyl methacrylate, allyl glycidyl ether, dimethylaminoethyl methacrylate, vinylpyridine, tert-
Butylaminoethyl methacrylate, acrylic acid, methacrylic acid, crotonic acid, itaconic acid, itaconic acid half ester, maleic acid, maleic acid half ester, itaconic anhydride, maleic anhydride, allyl alcohol, 2-hydroxyethyl methacrylate, 2-hydroxy Ethyl acrylate, 2
-Hydroxypropyl methacrylate, 2-hydroxypropyl acrylate, monoallyl ether of polyhydric alcohol, acrylamide, methacrylamide, maleamide, N-methylol acrylamide, N-methylol methacrylamide and its ether, vinyl isocyanate, allyl isocyanate, etc. Carbon number selected from 2 to about 8 vinyl or vinylidene compounds. These are conveniently produced by emulsion polymerization methods and are also available commercially. The amount of diene component in this copolymer is about 30 to 60% by weight, preferably 32 to 40% by weight. In addition, the copolymer contains amide, hydroxy,
0.1 monomer with hydrophilic moiety such as carboxy
It can be contained in an amount of about 20% by weight. In addition, examples of the polymeric substance used in the present invention include copolymers or homopolymers having a glass transition temperature in the range of -20°C to 40°C. Examples of monomers used in the synthesis of such copolymers or homopolymers include acrylic esters, acrylamides, methacrylic esters, methacrylamides, allyl compounds, vinyl ethers, vinyl esters, Examples include vinyl heterocyclic compounds, N-vinyl compounds, styrenes, crotonic acids, itaconic acids, olefins, olefins, maleic anhydride, and the like. Specific examples of these include acrylic acids, such as acrylic acid, acrylates (e.g. ethyl acrylate, butyl acrylate, amyl acrylate, octyl acrylate, 2-butoxyethyl acrylate, chloroethyl acrylate, hydroxyethyl acrylate, cyanoethyl acrylate) , dimethylaminoethyl acrylate, diethylene glycol monoacrylate, trimethylolpropane monoacrylate, glycidyl acrylate, benzyl acrylate, methoxybenzyl acrylate, etc.): Methacrylic acids, such as methacrylic acid, methacrylates (such as methyl methacrylate, ethyl methacrylate, isopropyl methacrylate, Benzyl methacrylate, cyanoacetoxyethyl methacrylate, chlorobenzyl methacrylate, ethylene glycol monomethacrylate, 3-hydroxypropyl methacrylate,
(2,2-dimethyl-3-hydroxypropyl methacrylate, diethylene glycol monomethacrylate, glycidyl methacrylate, dimethylaminophenoxyethyl methacrylate, phenyl methacrylate, etc.): Acrylamides, such as acrylamide, N
-Substituted acrylamide (e.g., methylacrylamide, ethylacrylamide, butylacrylamide, t-octylacrylamide, benzylacrylamide, dimethylaminoethylacrylamide, phenyl acrylamide, hydroxyphenylacrylamide, dimethylacrylamide, dibutylacrylamide, etc.): methacrylamides, For example, methacrylamide, N-substituted methacrylamide (e.g., methyl methacrylamide, t-butyl methacrylamide, t-octyl methacrylamide, benzyl methacrylamide, cyclohexyl methacrylamide, etc.); Allyl compounds, such as allyl esters (e.g., allyl acetate). , allyl caproate, allyl caprylate, allyl laurate, etc.), allyl exciethanol, allyl butyl ether, allyl glycidyl ether, allyl phenyl ether, etc. Vinyl ethers, (for example, methyl vinyl ether, butyl vinyl ether, hexyl vinyl ether, octyl vinyl ether, (ethylhexyl vinyl ether, methoxyethyl vinyl ether, chloroethyl vinyl ether, 2-ethyl butyl ether, hydroxyethyl vinyl ether, diethylene glycol vinyl ether, etc.): Vinyl esters, such as vinyl acetate,
Vinyl propionate, vinyl butyrate, vinyl isobutyrate, vinyl dimethyl propionate, vinyl ethyl butyrate, vinyl valerate, vinyl caproate, vinyl chloroacetate, etc. Vinyl heterocyclic compounds, such as N-vinyl Oxazolidone, vinylpyridine, N-vinylimidazole, N-vinylpyrrolidone, N-vinylcarbazole, N-vinylethylacetamide, etc.: Styrenes (e.g. styrene, methylstyrene, dimethylstyrene, trimethylstyrene, ethylstyrene, isopropylstyrene, butylstyrene) , hexylstyrene, cyclohexylstyrene, benzylstyrene, chloromethylstyrene, acetoxymethylstyrene, methoxystyrene, chlorstyrene, dichlorostyrene, vinylbenzoic acid, vinylbenzoic acid methyl ester, etc.): Crotonic acids, e.g., crotonic acid, crotonic acid Amides, crotonate esters (e.g. butyl crotonate, etc.) Vinyl kettles (e.g. methyl vinyl ketone, phenyl vinyl ketone, etc.) Olefins (e.g. dicyclopentadiene, ethylene, propylene, 1-butene, 1-pentene) , 1-hexene, 1-heptene, 1-octene, etc.), itaconic acids (e.g. itaconic acid,
itaconic anhydride, methyl itaconate), crotonic acids (e.g. crotonic acid, methyl crotonate),
Sorbic acid, cinnamic acid, methyl sorbate, glycidyl sorbate, citraconic acid, chloroacrylic acid, mesaconic acid, maleic acid, fumaric acid, ethacrylic acid, halogenated olefins (such as vinyl chloride, vinylidene chloride, isoprene, etc.),
Unsaturated nitriles (e.g. acrylonitrile,
(methacrylonitrile, etc.). The copolymer may be a copolymer made of two or more types of monomers. Examples of such copolymers include styrene/n-butyl acrylate/acrylic acid copolymers, styrene/n-butyl acrylate/glycidyl acrylate copolymers, and the like. Examples of water-soluble polymers include gelatin, acylated gelatin such as phthalated gelatin and maleated gelatin, cellulose derivatives such as carboxymethyl cellulose and hydroxyethyl cellulose, grafted gelatin in which acrylic acid, methacrylic acid or amide is grafted onto gelatin, and polyvinyl Alcohol, polyhydroxyalkyl acrylate, polyvinylpyrrolidone, copolyvinylpyrrolidone-vinyl acetate, casein, agarose, albumin, sodium alginate, polysaccharide, agar, starch, grafted starch, polyacrylamide, polyethyleneimine acylate, or acrylic acid, Synthetic or natural hydrophilic polymer compounds such as methacrylic acid acrylamide, N-substituted acrylamide, N-substituted methacrylamide, etc. alone or copolymers, or partial hydrolysates thereof are used. These materials can be used alone or in combination. A preferred hydrophilic polymer is gelatin or a gelatin derivative. The additives (1) to (3) used in the present invention are commercially available products equivalent to Proxel CRL (1) from ICI, Somacide RS (2) + (3) from Somar Industries, and Takeda Pharmaceutical Co., Ltd. You can also use one equivalent to Suraoff 72N (2) from Permakem Asia Co., Ltd., or Topside 800 (2) from Permakem Asia. There is no particular restriction on the amount of these additives added, but they are used in the range of 0.0001% to 10%, preferably 0.001% to 1% in the undercoating liquid. To these, water, methanol, ethylenediamine, etc. can be added as a solvent. In order to apply an aqueous dispersion or solution of a copolymer or homopolymer as an undercoat, the aqueous dispersion is further diluted with water, and if necessary, a crosslinking agent,
Surfactants, swelling agents, matting agents, other antistatic agents, electrolytes, etc. can be added. Examples of crosslinking agents include U.S. Pat. No. 3,325,287;
No. 3288775, No. 3549377, Belgian patent no.
Triazine compounds described in US Pat. No. 3,291,624, US Pat. No. 3,232,764, French Patent No.
1543694, dialdehyde compounds described in British Patent No. 1270578; US Patent No. 3091537,
Epoxy compounds described in US Pat. No. 49-26580, etc.; Vinyl compounds described in US Pat. No. 3,642,486; Aziline compounds described in US Pat. No. 3,392,024;
Examples include ethyleneimine compounds described in US Pat. No. 3,549,378 and the like; and methylol compounds. Among these compounds, examples of dichlorotriazine derivatives include the following formula:
乳剤塗布後、および処理(現像、定着、水洗)
後の接着力テストは3〜5mm間隔に縦横6本の切
り目をナイフでいれ、5×5個のます目を作り、
ここにテープを付着させてはがし、剥離した乳剤
層のます目の数をかぞえる。ます目の数が0のも
のをAクラス1〜2のものA′クラス、3〜4の
ものをBクラス、これ以下をCクラスとする。
処理液中での接着力テストは、乳剤塗布ベース
の末端を指で強く15回くり返しこすり、末端より
剥離した長さが0mmをAクラス、1〜2mmを
A′クラス、2〜4mmをBクラス、これ以下をC
クラスとする。
処理液として現像液にはLDS−715(富士写真
フイルム(株)製)を定着液にはLF−308(富士写真
フイルム(株)製)を用いて皿現像処理方法によつて
テストした。
これらの評価法において、写真材料として使用
できるものはA〜A′クラスである。
〔下塗液の腐敗性のテスト方法〕
下塗液を調製後、23℃50%RHの培養セル中に
放置し1週間後の微生物の発生の有無と臭気を確
認した。
〔帯電防止性の評価方法〕
下塗されたベース表面の表面電気抵抗を23℃65
%RHにて21時間放置後、同一条件下で測定す
る。
実施例 1
二軸延伸された厚さ100μのポリエチレンテレ
フタレートフイルム上に、コロナ放電処理を行な
い、下記の組成より成る第1の下塗液を塗布量が
約6c.c./m2となる様にワイヤーバーコーターによ
り塗布し、140℃にて1分間乾燥した。次に反対
面にも、同様にして第1の下塗層を塗布した。
これらの下塗液については、培養セルにて微生
物の発生の有無と臭気を確認した。
次いでこれらの第1下塗層上に1%ゼラチン溶
液を約10c.c./m2となる様にワイヤーバーコーター
により両面塗布し、140℃にて1分間乾燥した。
このフイルムについて帯電防止性を表面電気抵抗
の測定により評価した。
次に8種類の被覆フイルムの一方の側に下記処
方(1)のハロゲン化銀乳剤層を乾燥厚さ6.0μ塗布銀
量5.0g/m2になるように塗布した。さらに該ハ
ロゲン化銀乳剤層上に下記処方(2)の保護層を塗布
し、この反対側には下記処方(3)に従つてゼラチン
パツク層を乾燥厚さ5μになるように塗布し、8
種類の写真感材を作製した。
処方−(1) ハロゲン化銀乳剤層処方
ゼラチン 5g/m2
塩沃臭化銀(Cl:80モル% Br:19.5モル%
I:0.5モル%)
塩化金酸 0.1mg/m2
ポリエチルアクリレートラテツクス(米国特許第
3525620号明細書実施例3で用いているのと同じ)
1.5g/m2
増感色素3−アリル−5−〔2−(1−エチル)−
4メチル−2テトラゾリン−5イリデン−エチリ
デン〕ローダニン 6mg/m2
カブリ防止剤4−ヒドロキシ−6−メチル−1,
3,3a−7−ソトラザインデン 30mg/m2
ポリオキシエチレン化合物
20mg/m2
ゼラチン硬化剤2−ヒドロキシ−4.6−ジクロロ
−S−トリアジン・ナトリウム塩 60mg/m2
界面活性剤p−ドデシルベンゼンスルホン酸ソー
ダ 40mg/m2
処方−(2) 保護層処方
ゼラチン 1g/m2
マツト剤平均粒子径3.0〜4.0μのポリメチルメタ
クリレート 0.05g/m2
界面活性剤p−ドデシルベンゼンスルホン酸ナト
リウム 0.03g/m2
ゼラチン硬化剤2−ヒドロキシ−4.6−ジクロロ
−S−トリアジン・ナトリウム塩 0.01g/m2
処方−(3) バツク層処方
ゼラチン 5g/m2
ゼラチン硬化剤2−ヒドロキシ−4.6−ジクロロ
−S−トリアジン・ナトリウム塩 0.1g/m2
マツト剤* 0.03g/m2
ポリマーラテツクス** 50g/100gゼラチン
染料*** 0.3g/m2
* 保護層と同じもの
** ハロゲン化銀乳剤層と同じもの
*** 下記の染料(1):(2):(3)=1:1:1の
混合物
得られた8種類の写真感材について、フイルム
支持体と写真乳剤層との接着の評価を行つた。
組成 1
〔〕 ブタジエン−スチレン共重合体ラテツク
ス(固型分43%、ブタジエン/スチレン重量
比=32/68) 13c.c.
〔〕 2,4−ジクロロ−6ヒドロキシ−S−
トリアジンナトリウム塩8%溶液 7c.c.
〔〕 ラウリルベンゼンスルホン酸ナトリウム
1%水溶液 1.6c.c.
〔〕 蒸留水 80c.c.
組成 2
〔〕〜〔〕は組成1と同じ
メタノール1%溶液 1c.c.
〔〕 蒸留水 79c.c.
組成 3
〔〕〜〔〕は組成1と同じ
メタノール1%溶液 0.5c.c.
メタノール1%溶液 0.5c.c.
〔〕 蒸留水 79c.c.
組成 4
〔〕〜〔〕は組成1と同じ
メタノール1%溶液 1c.c.
〔〕 79c.c.
組成 5
〔〕〜〔〕は組成1と同じ
メタノール1%溶液 1c.c.
〔〕 蒸留水 79c.c.
組成 6
〔〕〜〔〕は組成1と同じ
メタノール分散液 1c.c.
〔〕 蒸留水 79c.c.
組成 7
〔〕〜〔〕は組成1と同じ
〔〕 蒸留水 79c.c.
組成 8
〔〕〜〔〕は組成1と同じ
〔〕 蒸留水 79c.c.
After emulsion coating and processing (development, fixing, washing)
For the subsequent adhesion test, use a knife to make 6 vertical and horizontal cuts at 3-5 mm intervals, making 5 x 5 squares.
Apply tape to this area, peel it off, and count the number of squares in the peeled emulsion layer. Those with 0 squares are classified as A class, those with 1 to 2 squares are classified as A' class, those with 3 to 4 squares are classified as B class, and those below this are classified as C class. For adhesion test in processing solution, the end of the emulsion coating base was rubbed strongly with fingers 15 times, and the length of peeled from the end was 0 mm was classified as A class, and 1 to 2 mm was classified as A class.
A' class, 2-4mm is B class, below this is C
class. The test was carried out using a plate development method using LDS-715 (manufactured by Fuji Photo Film Co., Ltd.) as a developing solution and LF-308 (manufactured by Fuji Photo Film Co., Ltd.) as a fixing solution. In these evaluation methods, materials that can be used as photographic materials are in classes A to A'. [Test method for spoilability of undercoat liquid] After preparing the undercoat liquid, it was left in a culture cell at 23°C and 50% RH, and the presence or absence of microbial growth and odor were checked after one week. [Evaluation method of antistatic property] The surface electrical resistance of the primed base surface was measured at 23℃65
After standing for 21 hours at %RH, measure under the same conditions. Example 1 A biaxially stretched polyethylene terephthalate film with a thickness of 100 μm was subjected to a corona discharge treatment, and a first undercoating liquid having the composition shown below was applied in an amount of approximately 6 c.c./m 2 It was applied using a wire bar coater and dried at 140°C for 1 minute. Next, the first undercoat layer was applied to the opposite side in the same manner. These undercoating solutions were checked for the presence of microorganisms and odor in a culture cell. Next, a 1% gelatin solution was coated on both sides of the first undercoat layer using a wire bar coater at a density of about 10 c.c./m 2 and dried at 140° C. for 1 minute.
The antistatic properties of this film were evaluated by measuring surface electrical resistance. Next, a silver halide emulsion layer having the following formulation (1) was coated on one side of each of the eight types of coated films so that the dry thickness was 6.0 μm and the coated silver amount was 5.0 g/m 2 . Further, on the silver halide emulsion layer, a protective layer of the following formulation (2) was applied, and on the opposite side, a gelatin pack layer was applied according to the following formulation (3) to a dry thickness of 5 μm.
Various types of photographic materials were produced. Prescription - (1) Silver halide emulsion layer prescription Gelatin 5 g/m 2 Silver chloroiodobromide (Cl: 80 mol% Br: 19.5 mol%
I: 0.5 mol%) Chloroauric acid 0.1 mg/m 2 Polyethyl acrylate latex (U.S. Patent No.
3525620 Specification Example 3)
1.5g/m 2 Sensitizing dye 3-allyl-5-[2-(1-ethyl)-
4-methyl-2-tetrazoline-5-ylidene-ethylidene] rhodanine 6 mg/m 2 Antifoggant 4-hydroxy-6-methyl-1,
3,3a-7-sotrazaindene 30mg/m 2 polyoxyethylene compound 20mg/m 2 Gelatin hardening agent 2-hydroxy-4.6-dichloro-S-triazine sodium salt 60mg/m 2 Surfactant p-dodecylbenzenesulfonic acid sodium 40mg/m 2 Prescription - (2) Protective layer formulation gelatin 1g/m m 2 Matting agent Polymethyl methacrylate with an average particle size of 3.0 to 4.0 μm 0.05 g/m 2 Surfactant Sodium p-dodecylbenzenesulfonate 0.03 g/m 2 Gelatin hardening agent 2-Hydroxy-4.6-dichloro-S-triazine. Sodium salt 0.01g/m 2 Formulation - (3) Back layer formulation gelatin 5g/m 2 Gelatin hardener 2-hydroxy-4.6-dichloro-S-triazine sodium salt 0.1g/m 2 Matting agent * 0.03g/m 2 Polymer latex ** 50g/100g gelatin dye *** 0.3g/m 2 * Same as the protective layer ** Same as the silver halide emulsion layer *** The following dyes (1): (2): (3) )=1:1:1 mixture The eight types of photographic materials obtained were evaluated for adhesion between the film support and the photographic emulsion layer. Composition 1 [] Butadiene-styrene copolymer latex (solid content 43%, butadiene/styrene weight ratio = 32/68) 13c.c. [] 2,4-dichloro-6hydroxy-S-
Triazine sodium salt 8% solution 7 c.c. [] Sodium laurylbenzenesulfonate 1% aqueous solution 1.6 cc [] Distilled water 80 c.c. Composition 2 [] to [] are the same as composition 1 1% methanol solution 1 c.c. [] Distilled water 79 c.c. Composition 3 [] to [] are the same as composition 1 1% methanol solution 0.5cc 1% methanol solution 0.5cc [] Distilled water 79cc. Composition 4 [] to [] are the same as composition 1 1% methanol solution 1 c.c. [] 79 c.c. Composition 5 [] to [] are the same as composition 1 1% methanol solution 1 c.c. [] Distilled water 79 c.c. Composition 6 [] to [] are the same as composition 1 Methanol dispersion 1 c.c. [] Distilled water 79 c.c. Composition 7 [] to [] are the same as composition 1 [] Distilled water 79c.c. Composition 8 [] ~ [] are the same as composition 1 [] Distilled water 79c.c.
【表】
なおフイルム支持体と乳剤層及びバツク層との
接着は乳剤塗布後、処理後、処理液中とも組成1
〜8の場合について、全て、Aクラスであつた。
実施例 2
二軸延伸された厚さ100μのポリエチレンテレ
フタレートフイルム上に、コロナ放電処理を行な
い、実施例1の組成1の下塗液を塗布量が約6
c.c./m2となる様にワイヤーバーコーターにより塗
布し、140℃にて1分間乾燥した。次に反対面に
も同様にして第1の下塗層を塗布した。
次いで、これらの第1下塗層上に下記組成より
成る第2の下塗液を約10c.c./m2となる様にワイヤ
ーバーコーターにより両面塗布し、140℃にて1
分間乾燥した。この第2の下塗液については、培
養セルにて微生物の発生の有無と臭気を確認し
た。更にこれらのフイルムについて帯電防止性を
評価した。
次いで、実施例1と同様に片面にハロゲン化銀
乳剤層と保護層を、反対側にゼラチンバツク層を
塗布して、フイルム支持体と写真乳剤層との接着
を評価した。
組成 1
〔〕 ゼラチン 1g
〔〕 蒸留水 99c.c.
組成 2
〔〕 ゼラチン 1g
メタノール1%溶液 1c.c.
〔〕 蒸留水 98c.c.
組成 3
〔〕 ゼラチン 1g
メタノール1%溶液 0.5c.c.
メタノール1%溶液 0.5c.c.
〔〕 蒸留水 98c.c.
組成 4
〔〕 ゼラチン 1g
メタノール1%分散液 1c.c.
〔〕 98c.c.
組成 5
〔〕 ゼラチン 1g
メタノール1%溶液 1c.c.
〔〕 蒸留水 98c.c.[Table] The adhesion between the film support and the emulsion layer and back layer is determined by composition 1 after coating the emulsion, after processing, and in the processing solution.
All cases of 8 to 8 were A class. Example 2 A biaxially stretched polyethylene terephthalate film with a thickness of 100 μm was subjected to corona discharge treatment, and the undercoating liquid of composition 1 of Example 1 was applied in an amount of about 6
It was coated using a wire bar coater at a coating density of cc/m 2 and dried at 140° C. for 1 minute. Next, the first undercoat layer was applied to the opposite side in the same manner. Next, a second undercoat liquid having the composition shown below was coated on both sides of the first undercoat layer using a wire bar coater at a coating density of approximately 10 c.c./m 2 , and then coated at 140°C for 1 hour.
Dry for a minute. Regarding this second undercoating liquid, the presence or absence of microorganism generation and odor were confirmed in a culture cell. Furthermore, the antistatic properties of these films were evaluated. Next, as in Example 1, a silver halide emulsion layer and a protective layer were coated on one side, and a gelatin back layer was coated on the other side, and the adhesion between the film support and the photographic emulsion layer was evaluated. Composition 1 [] Gelatin 1g [] Distilled water 99c.c. Composition 2 [] Gelatin 1g 1% methanol solution 1c.c. [] Distilled water 98c.c. Composition 3 [] Gelatin 1g 1% methanol solution 0.5cc 1% methanol solution 0.5cc [] Distilled water 98cc. Composition 4 [] Gelatin 1g 1% methanol dispersion 1c.c. [] 98c.c. Composition 5 [] Gelatin 1g 1% methanol solution 1c.c. [] Distilled water 98c.c.
【表】
なお、フイルム支持体と乳剤層及びバツク層と
の接着は乳剤塗布後、処理後、処理液中とも組成
1〜5の場合について、全て、Aクラスであつ
た。[Table] Note that the adhesion between the film support and the emulsion layer and back layer was A class in all cases of compositions 1 to 5 after coating the emulsion, after processing, and in the processing solution.
Claims (1)
分散性下塗液にて塗設する下塗層を有する写真感
光材料においてその下塗液中に下記物質のうち少
なくとも1種類が添加されている事を特徴とする
写真感光材料。 但し、上記一般式におけるRは水素原子又は
Co+H2o+1(n=1〜20)を表わす。[Scope of Claims] 1. In a photographic light-sensitive material having an undercoat layer coated on a hydrophobic support with a water-soluble undercoat liquid or a water-dispersible undercoat liquid, at least one of the following substances is contained in the undercoat liquid. A photographic material characterized by being added with. However, R in the above general formula is a hydrogen atom or
Represents C o +H 2o+1 (n=1 to 20).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP59229108A JPS61107343A (en) | 1984-10-31 | 1984-10-31 | Photosensitive material |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP59229108A JPS61107343A (en) | 1984-10-31 | 1984-10-31 | Photosensitive material |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS61107343A JPS61107343A (en) | 1986-05-26 |
| JPH0364052B2 true JPH0364052B2 (en) | 1991-10-03 |
Family
ID=16886862
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP59229108A Granted JPS61107343A (en) | 1984-10-31 | 1984-10-31 | Photosensitive material |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS61107343A (en) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS63198048A (en) * | 1987-02-13 | 1988-08-16 | Mitsubishi Paper Mills Ltd | Method for manufacturing photographic supports |
| US5008150A (en) * | 1987-10-02 | 1991-04-16 | Mitsubishi Paper Mills Limited | Photographic support with an undercoating layer on a resin coated base sheet |
| JPH03182740A (en) * | 1989-12-13 | 1991-08-08 | Konica Corp | Silver halide photographic sensitive material stable to fluctuation in processing |
-
1984
- 1984-10-31 JP JP59229108A patent/JPS61107343A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS61107343A (en) | 1986-05-26 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JPH04501324A (en) | Photographic support material consisting of antistatic layer and barrier layer | |
| US4891306A (en) | Photographic light-sensitive silver halide material containing an antistatic block copolymer | |
| CA1248255A (en) | Protective overcoat for photographic elements | |
| US4047957A (en) | Process of hardening protein-containing photographic layers with a mixture of a carboxyl group-activating, low molecular weight compound and a carboxyl group-activating polymer | |
| US4128426A (en) | Process for subbing photographic hydrophobic films | |
| US4087574A (en) | Method of subbing plastic films | |
| US4542093A (en) | Photographic silverhalide material containing two subbing layers | |
| JPS6160424B2 (en) | ||
| US4429039A (en) | Photographic element | |
| US4423089A (en) | Subbing process for photographic light-sensitive materials | |
| JPS6015935B2 (en) | photo elements | |
| JPH0364051B2 (en) | ||
| JP2547536B2 (en) | Photographic material | |
| GB2073902A (en) | Photographic light-sensitive material having subbed plastics support | |
| JPS61107343A (en) | Photosensitive material | |
| GB2038207A (en) | Method for adhering hydrophilic colloid layers on plastic film supports | |
| JPH0961967A (en) | Photographic sensitive material | |
| US5326688A (en) | Coating compositions for antistatic layers for photographic elements | |
| JPH0160814B2 (en) | ||
| JPH0363730B2 (en) | ||
| US6224988B1 (en) | Adhesive composition and image forming material | |
| JPS6029742A (en) | Photographic material | |
| JPH0136927B2 (en) | ||
| JPH10115900A (en) | Coating composition for imaging element | |
| JPS6396654A (en) | Photographic base |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| LAPS | Cancellation because of no payment of annual fees |