JPH0364532B2 - - Google Patents
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- Publication number
- JPH0364532B2 JPH0364532B2 JP61166312A JP16631286A JPH0364532B2 JP H0364532 B2 JPH0364532 B2 JP H0364532B2 JP 61166312 A JP61166312 A JP 61166312A JP 16631286 A JP16631286 A JP 16631286A JP H0364532 B2 JPH0364532 B2 JP H0364532B2
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- Prior art keywords
- epoxy resin
- group
- formula
- silicone
- integer
- Prior art date
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- Expired - Lifetime
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- Epoxy Resins (AREA)
Description
産業上の利用分野
本発明は半導体装置封止用エポキシ樹脂組成物
の製造等に好適に使用し得る新規なシリコーン変
性エポキシ樹脂組成物の製造方法に関する。
従来の技術及び発明が解決しようとする問題点
従来より、エポキシ樹脂は、これに硬化剤及び
無機充填剤等を加えた組成物として各種成形材
料、粉体塗料用材料、電気絶縁材料等に広く利用
され、特に最近においては半導体装置封止用材料
として多量に使用されている。これは、エポキシ
樹脂が一般に他の熱硬化性樹脂に比べて成形性、
接着性、電気特性、機械的特性、耐湿性等に優れ
ているという特性を利用したものである。
しかしながら、エポキシ樹脂は一般的に低弾性
率で可撓性に乏しいため、例えば半導体素子への
成形、加工を行なう時やヒートサイクル試験時に
おいてクラツクが発生し易く、また、過大なスト
レスがかかつて素子が変形することにより素子の
機能低下や破損が生じ易いなどといつた欠陥があ
る。
これらの問題に対し、本出願人は先に硬化性エ
ポキシ樹脂にオルガノポリシロキサンを配合した
エポキシ樹脂組成物(特開昭56−129246号)、更
には芳香族重合体とオルガノポリシロキサンとか
らなるブロツク共重合体を添加したエポキシ樹脂
組成物(特開昭58−21417号)を提案し、エポキ
シ樹脂組成物の耐クラツク性を改善した。
しかしながら、近年、益々半導体装置封止用材
料等への要求特性が厳しくなり、このため更に耐
クラツク性の向上したエポキシ樹脂組成物が望ま
れる。
本発明は上記事情に鑑みなされたもので、半導
体装置封止用エポキシ樹脂組成物等に好適に使用
し得る新規なシリコーン変性エポキシ樹脂の製造
方法を提供することを目的とする。
問題点を解決するための手段及び作用
本発明者らは、上記目的を達成するため鋭意検
討を行なつた結果、アルケニル基を含有するエポ
キシ樹脂に対し、≡SiH基を有する特定の有機け
い素化合物、即ち下記式(1)
(但し、式中R1は置換もしくは非置換の一価
炭化水素基、水酸基、アルコキシ基又はアルケニ
ルオキシ基を示し、a、bは0.01≦a≦1,1≦
b≦3,1≦a+b≦4を満足する正数である。
また、1分子中のけい素原子の数は1〜400の整
数であり、1分子中のけい素原子に直結した水素
原子の数は1以上の整数である。)
で表わされる有機けい素化合物を付加することに
より、新規なシリコーン変性エポキシ樹脂が得ら
れることを知見した。このシリコーン変性エポキ
シ樹脂は、アルケニル基含有エポキシ樹脂成分の
アルケニル基に上記有機けい素化合物の≡SiH基
が付加することによつて得られるもので、このよ
うな付加反応を用いることにより、エポキシ樹脂
に結合していない遊離の有機けい素化合物を殆ど
含まないシリコーン変性エポキシ樹脂を容易に得
ることができると共に、このようにして得られた
シリコーン変性エポキシ樹脂は、従来公知のエポ
キシ硬化剤、触媒や有機錫化合物の如きシリコー
ン用硬化触媒の存在下に硬化させた場合、低応力
でしかも強靭な硬化物を得ることができ、また硬
化性エポキシ樹脂と併用した場合には、優れた耐
クラツク性を有し、かつガラス転移点も10℃程度
向上したエポキシ樹脂組成物の成形物を得ること
ができ、従つて本発明で得られたシリコーン変性
エポキシ樹脂が半導体装置封止用エポキシ樹脂組
成物の成分として非常に有用であることを知見
し、本発明をなすに至つたものである。
以下、本発明につき更に詳しく説明する。
本発明のシリコーン変性エポキシ樹脂の製造方
法は、アルケニル基含有エポキシ樹脂と、下記式
(1)
(但し、式中R1は置換もしくは非置換の一価
炭化水素基、水酸基、アルコキシ基又はアルケニ
ルオキシ基を示し、a、bは0.01≦a≦1,1≦
b≦3,1≦a+b≦4を満足する正数である。
また、1分子中のけい素原子の数は1〜400の整
数であり、1分子中のけい素原子に直結した水素
原子の数は1以上の整数である。)
で表わされる有機けい素化合物とを付加重合させ
るものであり、この場合この有機けい素化合物は
その≡SiH基が上記エポキシ樹脂のアルケニル基
に付加するものである。
ここで、本発明に用いられるアルケニル基含有
エポキシ樹脂成分としては、アルケニル基含有フ
エノール樹脂をエピクロルヒドリンによりエポキ
シ化したり、従来公知のエポキシ樹脂へ2−アリ
ルフエノールなどを部分的に反応させたりして得
られる。
具体的には、下記式(2)
(但し、式中Rは同種もしくは異種の水素原
子、塩素や臭素等のハロゲン原子、炭素数1〜8
の一価炭化水素基又は
INDUSTRIAL APPLICATION FIELD The present invention relates to a method for producing a novel silicone-modified epoxy resin composition that can be suitably used for producing an epoxy resin composition for encapsulating semiconductor devices. Conventional techniques and problems to be solved by the invention Epoxy resins have been widely used in various molding materials, powder coating materials, electrical insulation materials, etc. as compositions containing hardening agents, inorganic fillers, etc. Especially recently, it has been used in large quantities as a material for encapsulating semiconductor devices. This is because epoxy resins generally have better moldability and better moldability than other thermosetting resins.
It takes advantage of its excellent adhesive properties, electrical properties, mechanical properties, moisture resistance, etc. However, since epoxy resins generally have a low elastic modulus and poor flexibility, they tend to crack when molded or processed into semiconductor devices or during heat cycle tests, and are susceptible to excessive stress. There are defects such as deformation of the element, which tends to reduce the function of the element and cause damage. In order to solve these problems, the applicant has developed an epoxy resin composition (Japanese Unexamined Patent Publication No. 129246/1989) in which organopolysiloxane is blended with a curable epoxy resin, and furthermore, an epoxy resin composition composed of an aromatic polymer and an organopolysiloxane. We proposed an epoxy resin composition containing a block copolymer (Japanese Patent Laid-Open No. 21417/1983), and improved the crack resistance of the epoxy resin composition. However, in recent years, the characteristics required for materials for encapsulating semiconductor devices have become increasingly strict, and therefore, epoxy resin compositions with further improved crack resistance are desired. The present invention was made in view of the above circumstances, and an object of the present invention is to provide a method for producing a novel silicone-modified epoxy resin that can be suitably used for epoxy resin compositions for encapsulating semiconductor devices. Means and Effects for Solving the Problems In order to achieve the above object, the present inventors conducted intensive studies and found that a specific organosilicon material having a ≡SiH group is used for epoxy resins containing an alkenyl group. Compound, i.e. the following formula (1) (However, in the formula, R 1 represents a substituted or unsubstituted monovalent hydrocarbon group, hydroxyl group, alkoxy group, or alkenyloxy group, and a and b are 0.01≦a≦1, 1≦
It is a positive number satisfying b≦3, 1≦a+b≦4.
Further, the number of silicon atoms in one molecule is an integer of 1 to 400, and the number of hydrogen atoms directly bonded to silicon atoms in one molecule is an integer of 1 or more. ) It was discovered that a novel silicone-modified epoxy resin can be obtained by adding an organosilicon compound represented by the following. This silicone-modified epoxy resin is obtained by adding the ≡SiH group of the above organosilicon compound to the alkenyl group of the alkenyl group-containing epoxy resin component. By using such an addition reaction, the epoxy resin It is possible to easily obtain a silicone-modified epoxy resin that contains almost no free organosilicon compounds that are not bonded to the silicone, and the silicone-modified epoxy resin thus obtained can be used with conventionally known epoxy curing agents, catalysts, etc. When cured in the presence of a silicone curing catalyst such as an organotin compound, a low stress and strong cured product can be obtained, and when used in combination with a curable epoxy resin, excellent crack resistance can be obtained. It is possible to obtain a molded article of an epoxy resin composition which has a high glass transition temperature and also has a glass transition temperature improved by about 10°C. Therefore, the silicone-modified epoxy resin obtained by the present invention can be used as a component of an epoxy resin composition for encapsulating semiconductor devices. The inventors have discovered that the method is very useful as a method, and have come up with the present invention. The present invention will be explained in more detail below. The method for producing a silicone-modified epoxy resin of the present invention comprises using an alkenyl group-containing epoxy resin and the following formula (1). (However, in the formula, R 1 represents a substituted or unsubstituted monovalent hydrocarbon group, hydroxyl group, alkoxy group, or alkenyloxy group, and a and b are 0.01≦a≦1, 1≦
It is a positive number satisfying b≦3, 1≦a+b≦4.
Further, the number of silicon atoms in one molecule is an integer of 1 to 400, and the number of hydrogen atoms directly bonded to silicon atoms in one molecule is an integer of 1 or more. ), and in this case, the ≡SiH group of the organosilicon compound is added to the alkenyl group of the epoxy resin. Here, the alkenyl group-containing epoxy resin component used in the present invention can be obtained by epoxidizing an alkenyl group-containing phenolic resin with epichlorohydrin, or by partially reacting a conventionally known epoxy resin with 2-allylphenol. It will be done. Specifically, the following formula (2) (However, in the formula, R is the same or different hydrogen atom, a halogen atom such as chlorine or bromine, or a carbon number of 1 to 8.
monovalent hydrocarbon group or
【式】で示
されるグリシジルエーテル基を示し、Gは
[Formula] represents a glycidyl ether group, and G is
リフラツクスコンデンサー、温度計、撹拌機及
び滴下ロートを具備した内容積1の四口フラス
コを反応装置として使用し、四口フラスコ内に下
記式(i)
(但し、Gは
A four-necked flask with an internal volume of 1, equipped with a reflux condenser, a thermometer, a stirrer, and a dropping funnel, was used as a reaction device, and the following formula (i) was used in the four-necked flask. (However, G is
有機けい素化合物として下記式(v)
で示されるものを用いた以外は実施例1と同様に
して下記性状のシリコーン変性エポキシ樹脂を製
造した。
外 観:白黄色不透明固体
溶融粘度:760cp(150℃)
加熱減量:0.56%(150℃,1h)
なお、得られたシリコーン変性エポキシ樹脂
は、前記式(iv)において、
As an organosilicon compound, the following formula (v) A silicone-modified epoxy resin having the following properties was produced in the same manner as in Example 1, except that the resin shown below was used. Appearance: White-yellow opaque solid Melt viscosity: 760 cp (150°C) Loss on heating: 0.56% (150°C, 1 h) The obtained silicone-modified epoxy resin has the following formula in formula (iv):
【式】が[Formula] is
有機けい素化合物として下記式(vi)
で示されるものを用いた以外は実施例1と同様に
して下記性状のシリコーン変性エポキシ樹脂を製
造した。
外 観:白黄色不透明固体
溶融粘度:890cp(150℃)
加熱減量:0.45%(150℃,1h)
なお、得られたシリコーン変性エポキシ樹脂
は、前記式(iv)において、
As an organosilicon compound, the following formula (vi) A silicone-modified epoxy resin having the following properties was produced in the same manner as in Example 1, except that the resin shown below was used. Appearance: White-yellow opaque solid Melt viscosity: 890 cp (150°C) Loss on heating: 0.45% (150°C, 1 h) The obtained silicone-modified epoxy resin has the following formula (iv):
【式】が[Formula] is
【式】に変わつた以
外は同様の構造式を有する。
〔実施例 4,5〕
実施例1と同様の反応装置を用い、その四口フ
ラスコ内に軟化点100℃のフエノールノボラツク
樹脂(アリル当量1100,OH当量125)200g、ク
ロロメチルオキシラン800g、セチルトリメチル
アンモニウムブロマイド0.6gを入れて110℃で3
時間加熱撹拌した。しかる後、四口フラスコを冷
却して内容物の温度を70℃とし、160mmHgの減圧
下にて水酸化ナトリウムの50%水溶液128gを共
沸脱水しながら3時間かけて滴下した。こうして
得られた生成物につき減圧下で溶剤を留去し、次
いでメチルイソブチルケトン300g、アセトン300
gの混合溶媒に溶解させた後、水洗した。これを
減圧下で溶剤留去して下記式(vii)で示されるアリル
基含有エポキシ樹脂(アリル当量1590,エポキシ
当量190)を得た。
次いで、前記と同様の反応装置の四口フラスコ
内に、上で得られたアリル基含有エポキシ樹脂
150g、メチルイソブチルケトン100g、トルエン
200g、白金濃度2%の2−エチルヘキサノール
変性塩化白金酸溶液0.04gを入れ、加熱撹拌下で
完全に上記アリル基含有エポキシ樹脂を溶解さ
せ、1時間共沸脱水をした後、還流温度にて第1
表に示す有機けい素化合物50gを滴下ロートを用
いて30分間で滴下した。滴下後、更に還流温度を
保持して撹拌を4時間続行し、第1表に示す性状
のシリコーン変性エポキシ樹脂(構造式)を得
た。They have the same structural formula except that the formula is changed to [Formula]. [Example 4, 5] Using the same reaction apparatus as in Example 1, 200 g of phenol novolac resin (allyl equivalent: 1100, OH equivalent: 125) with a softening point of 100°C, 800 g of chloromethyl oxirane, and cetyl were placed in a four-necked flask. Add 0.6g of trimethylammonium bromide and heat at 110°C.
The mixture was heated and stirred for hours. Thereafter, the four-necked flask was cooled to bring the temperature of the contents to 70°C, and 128 g of a 50% aqueous solution of sodium hydroxide was added dropwise over 3 hours under reduced pressure of 160 mmHg while performing azeotropic dehydration. The solvent was distilled off under reduced pressure from the product thus obtained, and then 300 g of methyl isobutyl ketone and 300 g of acetone were added.
After dissolving it in a mixed solvent of g, it was washed with water. The solvent was distilled off under reduced pressure to obtain an allyl group-containing epoxy resin represented by the following formula (vii) (allyl equivalent: 1590, epoxy equivalent: 190). Next, the allyl group-containing epoxy resin obtained above was placed in a four-necked flask of the same reactor as above.
150g, methyl isobutyl ketone 100g, toluene
Add 200g of platinum and 0.04g of a 2-ethylhexanol-modified chloroplatinic acid solution with a platinum concentration of 2%, completely dissolve the allyl group-containing epoxy resin under heating and stirring, perform azeotropic dehydration for 1 hour, and then heat at reflux temperature. 1st
50 g of the organosilicon compound shown in the table was added dropwise over 30 minutes using a dropping funnel. After the dropwise addition, stirring was continued for 4 hours while maintaining the reflux temperature to obtain a silicone-modified epoxy resin (structural formula) having the properties shown in Table 1.
実施例1と同様の反応装置を用い、その四口フ
ラスコ内に軟化点70℃のエポキシ化クレゾールノ
ボラツク樹脂(エポキシ当量204)300gを入れ、
撹拌機で撹拌しながら110℃の温度で滴下ロート
を使用して2−アリルフエノール67g、トリブチ
ルアミン1gの混合物を10分間で滴下した後、更
に同温度に保ち、2時間撹拌を継続した。得られ
た生成物から未反応の2−アリルフエノール、ト
リブチルアミン及び溶剤を減圧下で留去し、下記
式(ix)で示されるアリル基含有エポキシ樹脂(アリ
ル当量651,エポキシ当量332)を得た。
次いで、前記と同様の反応装置の四口フラスコ
内に、得られたアリル基含有エポキシ樹脂200g、
メチルイソブチルケトン200g、白金濃度2%の
2−エチルヘキサノール変性塩化白金酸溶液0.04
gを入れ、加熱撹拌下で完全に上記アリル基含有
エポキシ樹脂を溶解させ、1時間共沸脱水した
後、還流温度にて下記式(x)
で示されるメチルジプロペニルオキシシラン31.2
gを滴下ロートを用いて30分間で滴下した。滴下
後、更に還流温度を保持して撹拌を4時間続行
し、溶剤を減圧下に留去して、下記性状のシリコ
ーン変性エポキシ樹脂(アリル当量3100)を
221.4g得た(構造式())。
外 観:淡褐色透明固体
溶融粘度:530cp(150℃)
加熱減量:1.25%(150℃,1h)
以上の実施例1〜6のシリコーン変性エポキシ
樹脂の元素分析、NMR分析、IR分析の結果を第
2表に示す。
Using the same reaction apparatus as in Example 1, 300 g of epoxidized cresol novolac resin (epoxy equivalent: 204) with a softening point of 70°C was placed in the four-necked flask.
While stirring with a stirrer, a mixture of 67 g of 2-allylphenol and 1 g of tributylamine was added dropwise using a dropping funnel at a temperature of 110° C. over 10 minutes, and the temperature was further maintained and stirring was continued for 2 hours. Unreacted 2-allylphenol, tributylamine and the solvent were distilled off from the obtained product under reduced pressure to obtain an allyl group-containing epoxy resin represented by the following formula (ix) (allyl equivalent: 651, epoxy equivalent: 332). Ta. Next, 200 g of the obtained allyl group-containing epoxy resin was placed in a four-necked flask of the same reaction apparatus as above.
Methyl isobutyl ketone 200g, 2-ethylhexanol modified chloroplatinic acid solution with platinum concentration 2% 0.04
g to completely dissolve the allyl group-containing epoxy resin under heating and stirring, and after azeotropic dehydration for 1 hour, the following formula (x) was added at reflux temperature. Methyldipropenyloxysilane 31.2
g was added dropwise over 30 minutes using a dropping funnel. After the dropwise addition, stirring was continued for 4 hours while maintaining the reflux temperature, and the solvent was distilled off under reduced pressure to obtain a silicone-modified epoxy resin (allyl equivalent: 3100) with the following properties.
221.4g was obtained (structural formula ()). Appearance: Light brown transparent solid Melt viscosity: 530cp (150℃) Loss on heating: 1.25% (150℃, 1h) Table 2 shows the results of elemental analysis, NMR analysis, and IR analysis of the silicone-modified epoxy resins of Examples 1 to 6 above.
実施例1と同様の反応装置の四口フラスコ内
に、実施例6で得られたアリル基含有エポキシ樹
脂200g、メチルイソブチルケトン400g、白金濃
度2%の2−エチルヘキサノール変性塩化白金酸
溶液0.1gを入れ、加熱撹拌下で完全に上記アリ
ル基含有エポキシ樹脂を溶解させ、1時間共沸脱
水をした後、温度110℃にて下記式(iii)
で示されるオルガノポリシロキサン50gを滴下ロ
ートを用いて30分間で滴下し、その後更に60℃の
温度下でトリメトキシシラン(HSi(OMe)3)
12.2gを滴下ロートを用いて30分間で滴下した。
滴下後、110℃の温度にて撹拌を4時間続行して
熟成し、溶剤を減圧下に留去することにより、下
記性状のシリコーン変性エポキシ樹脂(アリル当
量1800)256.7gを得た(構造式(d))。
外 観:淡黄色透明固体
溶融粘度:920cp(150℃)
加熱減量:1.48%(150℃,1h)
〔実施例 8〕
実施例1と同様の反応装置の四口フラスコ内
に、実施例1で得られた式(ii)のアリル基含有エポ
キシ樹脂150g、メチルイソブチルケトン250g、
白金濃度2%の2−エチルヘキサノール変性塩化
白金酸溶液0.04gを入れ、加熱撹拌下で完全に上
記アリル基含有エポキシ樹脂を溶解させ、1時間
共沸脱水をした後、還流温度にて下記平均組成式
()
(Me2SiO)0.3(MeHSiO)0.2
(PhSiO3/2)0.5 ……()
で示される数平均分子量980,≡SiH当量492の有
機けい素化合物45gを滴下ロートを用いて30分間
で滴下した。その後、更に還流温度にて撹拌を4
時間続行し、溶剤を減圧下に留去して、下記性状
のシリコーン変性エポキシ樹脂191.3gを得た。
外 観:淡褐色透明固体
溶融粘度:2140cp(150℃)
加熱減量:0.87%(150℃,1h)
〔実施例 9〕
実施例1と同様の反応装置を用い、その四口フ
ラスコ内にエポキシ当量945のエピビスタイプエ
ポキシ樹脂(Shell Chemical社製のエピコート
1004)140g、トルエン500gを入れ、温度60℃に
て撹拌を行なつて均一に溶解した後、更に加熱撹
拌下でソジウムメチラートの2.0モル/lメタノ
ール溶液4mlを混合した。しかる後、滴下ロート
を使用してアクリル酸アリル70gを20分間で滴下
し、更に温度60℃に保つて4時間撹拌を継続し
た。次いで炭酸ガスによる通気を行なつた後、
過し、得られたケーキから減圧下で溶剤を留去し
て、アリル当量514、エポキシ当量1120のアリル
基含有エポキシ樹脂を得た(構造式())。
次いで、前記と同様の反応装置の四口フラスコ
内に、こうして得られたアリル基含有エポキシ樹
脂102.8gと、更にトルエン300g、白金濃度2%
の2−エチルヘキサノール変性塩化白金酸溶液
0.04gを入れ、加熱撹拌下で完全に上記アリル基
含有エポキシ樹脂を溶解させ、1時間共沸脱水し
た後、80℃にてトリメトキシシラン(HSi
(OMe)3)12.2gを滴下ロートを用いて30分間で
滴下した。滴下後、更に温度110℃にて4時間の
撹拌を行ない、減圧下に溶剤を留去して、下記性
状のシリコーン変性エポキシ樹脂(アリル当量
995)113.2gを得た(構造式())。
外 観:淡黄色透明固体
溶融粘度:1470cp(150℃)
加熱減量:1.45%(150℃,1h)
In a four-necked flask of the same reaction apparatus as in Example 1, 200 g of the allyl group-containing epoxy resin obtained in Example 6, 400 g of methyl isobutyl ketone, and 0.1 g of a 2-ethylhexanol-modified chloroplatinic acid solution with a platinum concentration of 2% were placed. was added, the allyl group-containing epoxy resin was completely dissolved under heating and stirring, and after azeotropic dehydration for 1 hour, the following formula (iii) was added at a temperature of 110°C. 50g of the organopolysiloxane shown is added dropwise over 30 minutes using a dropping funnel, and then trimethoxysilane (HSi(OMe) 3 ) is further added at a temperature of 60°C.
12.2 g was added dropwise over 30 minutes using a dropping funnel.
After dropping, stirring was continued for 4 hours at a temperature of 110°C for aging, and the solvent was distilled off under reduced pressure to obtain 256.7 g of a silicone-modified epoxy resin (allyl equivalent: 1800) with the following properties (structural formula (d)). Appearance: Pale yellow transparent solid Melt viscosity: 920cp (150℃) Loss on heating: 1.48% (150℃, 1h) [Example 8] In a four-neck flask of the same reaction apparatus as in Example 1, 150 g of the allyl group-containing epoxy resin of formula (ii) obtained in Example 1, 250 g of methyl isobutyl ketone,
Add 0.04 g of a 2-ethylhexanol-modified chloroplatinic acid solution with a platinum concentration of 2%, heat and stir to completely dissolve the allyl group-containing epoxy resin, perform azeotropic dehydration for 1 hour, and then reduce the following average at reflux temperature. 45 g of an organosilicon compound with a number average molecular weight of 980 and a ≡SiH equivalent of 492 shown by the composition formula () (Me 2 SiO) 0.3 (MeHSiO) 0.2 ( PhSiO 3/2 ) 0.5 ... () It was added dropwise over 30 minutes using a dropping funnel. After that, stirring was continued for 4 more times at reflux temperature.
After a period of time, the solvent was distilled off under reduced pressure to obtain 191.3 g of a silicone-modified epoxy resin having the following properties. Appearance: Light brown transparent solid Melt viscosity: 2140 cp (150°C) Loss on heating: 0.87% (150°C, 1 h) [Example 9] Using the same reaction apparatus as in Example 1, epoxy equivalent was placed in the four-necked flask. 945 Epibis type epoxy resin (Epicoat manufactured by Shell Chemical)
1004) and 500 g of toluene were added and stirred at a temperature of 60°C to uniformly dissolve the mixture.Furthermore, 4 ml of a 2.0 mol/l methanol solution of sodium methylate was mixed with stirring under heating. Thereafter, 70 g of allyl acrylate was added dropwise over 20 minutes using a dropping funnel, and stirring was continued for 4 hours while maintaining the temperature at 60°C. Next, after aeration with carbon dioxide gas,
The solvent was distilled off from the resulting cake under reduced pressure to obtain an allyl group-containing epoxy resin having an allyl equivalent of 514 and an epoxy equivalent of 1120 (structural formula ()). Next, 102.8 g of the allyl group-containing epoxy resin thus obtained, 300 g of toluene, and a platinum concentration of 2% were placed in a four-necked flask of the same reaction apparatus as above.
2-ethylhexanol modified chloroplatinic acid solution of
0.04g of the allyl group-containing epoxy resin was completely dissolved under heating and stirring, and after azeotropic dehydration for 1 hour, trimethoxysilane (HSi) was added at 80°C.
12.2 g of (OMe) 3 ) was added dropwise over 30 minutes using a dropping funnel. After the dropwise addition, stirring was further performed for 4 hours at a temperature of 110°C, and the solvent was distilled off under reduced pressure to obtain a silicone-modified epoxy resin (allyl equivalent
995) 113.2 g was obtained (structural formula ()). Appearance: Pale yellow transparent solid Melt viscosity: 1470cp (150℃) Loss on heating: 1.45% (150℃, 1h)
Claims (1)
(1) (但し、式中R1は置換もしくは非置換の一価
炭素水素基、水酸基、アルコキシ基又はアルケニ
ルオキシ基を示し、a、bは0.01≦a≦1,1≦
b≦3,1≦a+b≦4を満足する正数である。
また、1分子中のけい素原子の数は1〜400の整
数であり、1分子中のけい素原子に直結した水素
原子の数は1以上の整数である。) で表される有機けい素化合物とを付加反応させ
て、上記アルケニル基含有エポキシ樹脂のアルケ
ニル基に上記有機けい素化合物の≡SiH基を付加
したシリコーン変性エポキシ樹脂を製造すること
を特徴とするシリコーン変性エポキシ樹脂の製造
方法。 2 アルケニル基含有エポキシ樹脂成分が下記式
(2) (但し、式中Rは同種もしくは異種の水素原
子、ハロゲン原子、炭素数1〜8の一価炭化水素
基又は【式】で示されるグリシジ ルエーテル基を示し、Gは【式】 で示されるグリシジルエーテル基、pは0〜20の
整数、qは1〜20の整数、tは0又は1である。) で表される化合物である特許請求の範囲第1項記
載のシリコーン変性エポキシ樹脂の製造方法。[Claims] 1. Alkenyl group-containing epoxy resin component and the following formula
(1) (However, in the formula, R 1 represents a substituted or unsubstituted monovalent carbon hydrogen group, hydroxyl group, alkoxy group, or alkenyloxy group, and a and b are 0.01≦a≦1, 1≦
It is a positive number satisfying b≦3, 1≦a+b≦4.
Further, the number of silicon atoms in one molecule is an integer of 1 to 400, and the number of hydrogen atoms directly bonded to silicon atoms in one molecule is an integer of 1 or more. ) to produce a silicone-modified epoxy resin in which a ≡SiH group of the organosilicon compound is added to the alkenyl group of the alkenyl group-containing epoxy resin. A method for producing silicone-modified epoxy resin. 2 The alkenyl group-containing epoxy resin component has the following formula:
(2) (However, in the formula, R represents the same or different hydrogen atom, a halogen atom, a monovalent hydrocarbon group having 1 to 8 carbon atoms, or a glycidyl ether group represented by [formula], and G represents a glycidyl ether group represented by [formula]) ether group, p is an integer of 0 to 20, q is an integer of 1 to 20, and t is 0 or 1). Method.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP16631286A JPS6322822A (en) | 1986-07-15 | 1986-07-15 | Silicone-modified epoxy resin and production thereof |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP16631286A JPS6322822A (en) | 1986-07-15 | 1986-07-15 | Silicone-modified epoxy resin and production thereof |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6322822A JPS6322822A (en) | 1988-01-30 |
| JPH0364532B2 true JPH0364532B2 (en) | 1991-10-07 |
Family
ID=15829011
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP16631286A Granted JPS6322822A (en) | 1986-07-15 | 1986-07-15 | Silicone-modified epoxy resin and production thereof |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6322822A (en) |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6356516A (en) * | 1986-08-28 | 1988-03-11 | Sumitomo Bakelite Co Ltd | Epoxy resin composition for sealing semiconductor |
| JPH01165653A (en) * | 1987-12-23 | 1989-06-29 | Sumitomo Bakelite Co Ltd | Resin composition for semiconductor sealing |
| JPH0618852B2 (en) * | 1988-06-15 | 1994-03-16 | 住友ベークライト株式会社 | Epoxy resin composition |
| JP2680351B2 (en) * | 1988-07-01 | 1997-11-19 | 住友ベークライト株式会社 | Resin composition for sealing |
| JPH02281023A (en) * | 1989-04-21 | 1990-11-16 | Sumitomo Bakelite Co Ltd | Curable epoxy resin composition |
| JPH0681777B2 (en) * | 1989-09-11 | 1994-10-19 | 信越化学工業株式会社 | Method for producing silicone-modified novolac resin containing conjugated double bond |
| JPH082943B2 (en) * | 1990-04-17 | 1996-01-17 | 信越化学工業株式会社 | Epoxy resin composition |
| CN102690418A (en) * | 2012-05-25 | 2012-09-26 | 上海富朗化工科技发展有限公司 | Organosilicon modified epoxy resin and preparation method thereof |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6153778A (en) * | 1984-08-23 | 1986-03-17 | Nec Corp | Field effect transistor |
-
1986
- 1986-07-15 JP JP16631286A patent/JPS6322822A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6322822A (en) | 1988-01-30 |
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