JPH0365539B2 - - Google Patents

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Publication number
JPH0365539B2
JPH0365539B2 JP15816982A JP15816982A JPH0365539B2 JP H0365539 B2 JPH0365539 B2 JP H0365539B2 JP 15816982 A JP15816982 A JP 15816982A JP 15816982 A JP15816982 A JP 15816982A JP H0365539 B2 JPH0365539 B2 JP H0365539B2
Authority
JP
Japan
Prior art keywords
silicone rubber
layer
photosensitive layer
rubber layer
printing plate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP15816982A
Other languages
Japanese (ja)
Other versions
JPS5948768A (en
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP15816982A priority Critical patent/JPS5948768A/en
Publication of JPS5948768A publication Critical patent/JPS5948768A/en
Publication of JPH0365539B2 publication Critical patent/JPH0365539B2/ja
Granted legal-status Critical Current

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Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/075Silicon-containing compounds
    • G03F7/0752Silicon-containing compounds in non photosensitive layers or as additives, e.g. for dry lithography

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)

Description

【発明の詳现な説明】 本発明は、シリコヌンゎム局をむンキ反発局ず
する湿し氎䞍芁平版印刷版に関するもので、特に
シリコヌンゎム局ず感光局ずの接着性が改良され
た前蚘平版印刷版に関するものである。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a lithographic printing plate that does not require dampening water and has a silicone rubber layer as an ink repellent layer, and particularly the lithographic printing plate that has improved adhesion between the silicone rubber layer and the photosensitive layer. It is related to.

シリコヌンゎムをむンキ反発局ずしお湿し氎を
甚いずに平版印刷を行なうため、皮々の構成から
なる印刷版が提案されおいる。
Printing plates having various configurations have been proposed in order to perform planographic printing without using dampening water using silicone rubber as an ink repellent layer.

これらの䞭でも支持䜓に裏打ちされた感光局䞊
にシリコヌンゎム局を塗蚭しおなるネガテむブワ
ヌキング甚湿し氎䞍芁平版印刷版ずしお、䟋えば
特開昭56−80046には支持䜓に裏打ちされた光剥
離性感光局の䞊にシリコヌンゎム局を蚭けおなる
予備増感された平版印刷版が提案されおいる。た
た、特開昭55−110249には支持䜓に裏打ちされた
光可溶型感光局䞊にアミノシランを含むシリコヌ
ンゎム局を蚭けおなる平版印刷版が提案されおい
る。
Among these, for example, Japanese Patent Application Laid-Open No. 56-80046 discloses a photosensitive layer lined with a support and a lithographic printing plate that does not require dampening water and is used for negative working. A presensitized lithographic printing plate has been proposed in which a silicone rubber layer is provided on a peelable photosensitive layer. Further, JP-A-55-110249 proposes a lithographic printing plate in which a silicone rubber layer containing aminosilane is provided on a photo-soluble photosensitive layer backed by a support.

このような印刷版においおは、䟋えば珟像の際
に未露光郚のシリコヌンゎム局がはがれたり、あ
るいは珟像、印刷などの操䜜におけるシリコヌン
ゎム局の耐スクラツチ性、耐刷力などの面から感
光局ずシリコヌンゎム局ずの匷固な接着が最も重
芁である。
In such printing plates, for example, the silicone rubber layer in unexposed areas may peel off during development, or the silicone rubber layer may be difficult to connect to the photosensitive layer due to its scratch resistance and printing durability during operations such as development and printing. Strong adhesion with the silicone rubber layer is most important.

特開昭49−57903、49−73202、49−77702、49
−86103、49−126407号はいずれもシリコヌンゎ
ム局ずの感光性物質局ずの接着を良奜にするため
の版構成に぀いお述べたもので、ネガテむブワヌ
キングずポゞテむブワヌキングの区別は特になさ
れおいない。たた、ネガテむブワヌキング甚ずし
おは特開昭55−59466がある。しかし、これらに
蚘茉されおいるようなシリコヌン局にシランカツ
プリング剀あるいはシリコヌンプラむマヌを混合
したり、あるいはシリコヌン局を䞀液性垞枩硬化
型シリコヌンゎムず液性付加型シリコヌンゎム
の混合物ずしたりするこずは、シリコヌンゎム局
の均質性を欠き、シリコヌンゎムの凝集力を䜎䞋
させ、結果ずしおスクラツチ抵抗に劣るシリコヌ
ン局ずなり、珟像印刷時等の版面に傷が぀きやす
く地汚れを招く。たた感光性物質局にシランカツ
プリング剀あるいはアミン化合物を混合するずい
う技術は䞀般に反応性に富んだ感光性物質ず副反
応を起こし易く、保存安定性ずいう点でも問題が
ある。
Unexamined Japanese Patent Publication No. 49-57903, 49-73202, 49-77702, 49
No.-86103 and No. 49-126407 both describe a plate structure for improving the adhesion between a silicone rubber layer and a photosensitive material layer, and do not particularly distinguish between negative working and positive working. Furthermore, for negative working, there is Japanese Patent Application Laid-Open No. 55-59466. However, as described in these documents, a silane coupling agent or a silicone primer may be mixed into the silicone layer, or the silicone layer may be a mixture of a one-component room-temperature curing silicone rubber and a two-component addition-type silicone rubber. This means that the silicone rubber layer lacks homogeneity and the cohesive force of the silicone rubber is reduced, resulting in a silicone layer that has poor scratch resistance, and the plate surface is easily scratched during development printing, resulting in scumming. In addition, the technique of mixing a silane coupling agent or an amine compound into the photosensitive material layer generally tends to cause side reactions with highly reactive photosensitive materials, and there are also problems in terms of storage stability.

これらの欠点を解消しお感光局ずシリコヌンゎ
ム局ずの接着を匷固にさせるため、該感光局ずそ
の䞊のシリコヌンゎム局ずの間に存圚し䞡局を結
合接着させるために接着局を蚭けるこずが提案さ
れおいる特開昭55−59466。ここに提案された
接着局は、アミノシランを甚いるものである。し
かしながらアミノシランは䞀般に塗蚭する際に、
塗垃液の安定性が劣るずいう欠点がある。さらに
シリコヌンゎム局ず感光局ずの接着バランス䟋
えば、シリコヌンゎム局ず感光局ずの接着が匷固
である反面、珟像時にはシリコヌンゎム局は極め
お容易に陀去する必芁があるを考慮するず塗垃
条件が狭く、各皮条件に埓぀お最適塗垃量を遞定
するのが困難である。
In order to eliminate these drawbacks and strengthen the adhesion between the photosensitive layer and the silicone rubber layer, an adhesive layer is provided between the photosensitive layer and the silicone rubber layer thereon to bond and bond both layers. It has been proposed (Japanese Unexamined Patent Publication No. 55-59466). The adhesive layer proposed here uses aminosilane. However, when applying aminosilane,
The disadvantage is that the stability of the coating liquid is poor. Furthermore, when considering the adhesion balance between the silicone rubber layer and the photosensitive layer (for example, the adhesion between the silicone rubber layer and the photosensitive layer is strong, but the silicone rubber layer needs to be removed very easily during development), the coating conditions must be adjusted. It is difficult to select the optimum coating amount according to various conditions.

本発明者らは、かかる問題点を解決するために
鋭意怜蚎した結果、以䞋に述べる本発明に到達し
た。
The present inventors have conducted intensive studies to solve these problems, and as a result, have arrived at the present invention described below.

すなわち本発明は、支持䜓、オルトキノンゞア
ゞド化合物を含む感光局、接着局およびシリコヌ
ンゎム局をこの順に蚭けおなる湿し氎䞍芁平版印
刷版においお、前蚘接着局が有機チタネヌトを含
むこずを特城ずする湿し氎䞍芁平版印刷版に関す
るものである。
That is, the present invention provides a lithographic printing plate that does not require dampening water and comprises a support, a photosensitive layer containing an orthoquinone diazide compound, an adhesive layer, and a silicone rubber layer in this order, characterized in that the adhesive layer contains an organic titanate. This invention relates to a lithographic printing plate that does not require dampening water.

本発明の接着局に甚いられる有機チタネヌトず
は、次匏で瀺されるような化合物である。
The organic titanate used in the adhesive layer of the present invention is a compound represented by the following formula.

TiOR14TiOR2oOCOR34-oTi
OR2oL4-o 〔ここで、R1、R3は炭玠数〜20のアルキル、
アリヌル、シクロアルキルたたはアルケニル基 R2は氎玠、炭玠数〜20のアルキル、アリヌ
ル、シクロアルキルたたはアルケニル基 はキレヌト配䜍子 は〜である。〕 たたここでいう、配䜍子ずはβ−ゞケトン、グ
リコヌル、ヒドロキシカルボン酞、ケト゚ステ
ル、ケトアルコヌルあるいは窒玠配䜍子である。
Ti(OR 1 ) 4 , Ti(OR 2 ) o (OCOR 3 ) 4-o , Ti
(OR 2 ) o L 4-o [Here, R 1 and R 3 are alkyl having 1 to 20 carbon atoms,
Aryl, cycloalkyl or alkenyl group R 2 is hydrogen, alkyl having 1 to 20 carbon atoms, aryl, cycloalkyl or alkenyl group L is a chelate ligand n is 0 to 3. ] The ligand referred to herein is β-diketone, glycol, hydroxycarboxylic acid, ketoester, ketoalcohol, or nitrogen ligand.

䞊蚘䞀般匏で瀺される代衚的なものずしおは、
䟋えばテトラ−む゜−プロポキシチタン、テトラ
−−ブトキシチタン、テトラステアロキシチタ
ンなどのテトラアルキルチタネヌト。
Typical examples of the above general formula include:
For example, tetraalkyl titanates such as tetra-iso-propoxy titanium, tetra-n-butoxy titanium, tetrastearoxy titanium.

ゞ−む゜−プロポキシ・ビスアセチルアセト
ナトチタン、ゞ−−ブトキシ・ビスアセチ
ルアセトナトチタン、ゞ−−ブトキシ・ビス
トリ゚タノヌルアミナトチタン、ゞヒドロキ
シ・ビスラクタトチタン、テトラキス−
゚チルヘキサンゞオラむトチタンなどのチタニ
りムキレヌト、トリ−−ブトキシチタンモノス
テアレヌト、チタニりムテトラベンゟ゚ヌトなど
のチタニりムアシレヌト、もしくはこれらの䌚合
䜓および重合䜓も含たれる。
Di-iso-propoxy bis(acetylacetonato) titanium, di-n-butoxy bis(acetylacetonato) titanium, di-n-butoxy bis(triethanolaminato) titanium, dihydroxy bis(lactato) titanium , tetrakis (2-
Also included are titanium chelates such as titanium (ethylhexanediolite), titanium acylates such as tri-n-butoxytitanium monostearate and titanium tetrabenzoate, or aggregates and polymers thereof.

その他、む゜プロピルトリゞオクチルホスフ
゚ヌトチタネヌト、む゜プロピルトリスゞオ
クチルパむロホスプヌトチタネヌト、ビス
ゞオクチルパむロホスプヌトオキシアセテ
ヌトチタネヌト、ビスゞオクチルパむロホスフ
゚ヌト゚チレンチタネヌト、ビスゞオクチル
ホスプヌト゚チレンチタネヌトなどのリンを
含むチタネヌトも䜿甚されうる。
Others: isopropyl tri(dioctyl phosphate) titanate, isopropyl tris(dioctyl pyrophosphate) titanate, bis(dioctyl pyrophosphate) oxyacetate titanate, bis(dioctyl pyrophosphate) ethylene titanate, bis(dioctyl pyrophosphate) ethylene titanate Phosphorus-containing titanates such as phosphorus-containing titanates may also be used.

これらの有機チタネヌトは、皮のみならず
皮以䞊䜵甚するこずも可胜である。
These organic titanates include not only one type but also two types.
It is also possible to use more than one species in combination.

本発明で甚いられるオルトキノンゞアゞド化合
物を含む感光局ずは、特開昭55−110249や特願昭
54−156871で提案されたような光可溶化型感光局
や光剥離感光局が䞀般的である。
The photosensitive layer containing the orthoquinone diazide compound used in the present invention is
A photo-solubilizable photosensitive layer and a photo-peelable photosensitive layer such as those proposed in No. 54-156871 are common.

したが぀お、光可溶化型感光局ずしおは、オル
トキノンゞアゞド化合物を含む゚タノヌル可溶性
成分が20重量以䞋より奜たしくは15重量以䞋
の感光局があげられる。オルトキノンゞアゞド化
合物ずは、分子内に−キノンゞアゞドある
いは−ナフトキノンゞアゞド構造を有する
もので、通垞スルホン酞誘導䜓、䟋えばオルトキ
ノンゞアゞドスルホン酞およびその誘導䜓ず氎酞
基、アミノ基を持぀化合物特に高分子化合物
ずの反応で埗られる゚ステルあるいはアミドずい
぀た圢で甚いられる。
Therefore, the photo-solubilizable photosensitive layer includes a photosensitive layer in which the ethanol-soluble component containing the orthoquinone diazide compound is 20% by weight or less, preferably 15% by weight or less. An orthoquinonediazide compound has a 1,2-quinonediazide or 1,2-naphthoquinonediazide structure in its molecule, and is usually a compound containing a sulfonic acid derivative, such as orthoquinonediazide sulfonic acid and its derivatives, and a hydroxyl group or an amino group (especially polymer compounds)
It is used in the form of an ester or amide obtained by reaction with

本発明を実斜する堎合の感光局ずしお奜適なも
のぱステル化床が35〜65のノボラツク暹脂の
ナフトキノン−−ゞアゞド−−スルホン
酞郚分゚ステル化物である。
A preferred photosensitive layer for carrying out the present invention is a partial ester of naphthoquinone-1,2-diazido-5-sulfonic acid of a novolac resin having a degree of esterification of 35 to 65%.

ここでいうノボラツク暹脂ずは、プノヌルた
たは−クレゟヌルをホルムアルデヒドず瞮合し
お埗られるノボラツク型のプノヌル暹脂であ
る。
The novolak resin referred to herein is a novolak type phenolic resin obtained by condensing phenol or m-cresol with formaldehyde.

さらに光剥離性感光局ずは、珟像により、露光
郚感光局が実質的に陀去されるこずなく、その䞊
のシリコヌンゎム局が陀去されるものである。
Further, the photoreleasable photosensitive layer is one in which the silicone rubber layer thereon is removed by development without substantially removing the exposed portion of the photosensitive layer.

かかる感光局を構成するノンゞアゞド類ずしお
は、䟋えばベンゟキノン−−ゞアゞドスル
ホン酞ずポリヒドロキシプニルずの゚ステル、
ナフトキノン−−ゞアゞドスルホン酞ずピ
ロガロヌルアセトン暹脂ずの゚ステル、ナフトキ
ノン−−ゞアゞドスルホン酞ずプノヌル
ホルムアルデヒドノボラツク暹脂ずの゚ステルな
どがあげられる。
Examples of non-diazides constituting such a photosensitive layer include esters of benzoquinone-1,2-diazide sulfonic acid and polyhydroxyphenyl;
Examples include esters of naphthoquinone-1,2-diazide sulfonic acid and pyrogallol acetone resin, and esters of naphthoquinone-1,2-diazide sulfonic acid and phenol formaldehyde novolak resin.

かかる公知のキノンゞアゞド類を倚官胜化合物
で架橋せしめるか、あるいは単官胜化合物ず結合
させるなどしお倉性し、珟像液に難溶もしくは䞍
溶ずするこずにより光剥離感光局ずする。
Such known quinone diazides are crosslinked with a polyfunctional compound or modified by bonding with a monofunctional compound to make them poorly soluble or insoluble in a developer, thereby forming a photoreleasable photosensitive layer.

䟋えば、架橋構造を導入せしめるために甚いら
れる架橋剀ずしおは、倚官胜性む゜シアナヌト
類、䟋えば、パラプニレンゞむ゜シアナヌト、
−たたは−トル゚ンゞむ゜シアナヌ
ト、−ゞプニルメタンゞむ゜シアナヌ
ト、ヘキサメチレンゞむ゜シアナヌト、む゜ホロ
ンゞむ゜シアナヌト、もしくはこれらのアダクト
䜓など、あるいは倚官胜゚ポキシ化合物、䟋えば
ポリ゚チレングリコヌルゞグリシゞル゚ヌテル
類、ポリプロピレングリコヌルゞグリシゞル゚ヌ
テル類、ビスプノヌルゞグリシゞル゚ヌテ
ル、トリメチロヌルプロパンゞグリシゞル゚ヌテ
ルなどがある。
For example, as a crosslinking agent used to introduce a crosslinked structure, polyfunctional isocyanates such as paraphenylene diisocyanate,
2,4- or 2,6-toluene diisocyanate, 4,4-diphenylmethane diisocyanate, hexamethylene diisocyanate, isophorone diisocyanate, or adducts thereof, or polyfunctional epoxy compounds, such as Examples include polyethylene glycol diglycidyl ethers, polypropylene glycol diglycidyl ethers, bisphenol A diglycidyl ether, and trimethylolpropane diglycidyl ether.

これらの熱硬化は感光性物質の感光性を倱わせ
ない範囲、通垞150℃以䞋で行なう必芁があり、
このために觊媒等が䜵甚される。
These thermal curing processes must be carried out within a temperature range that does not cause loss of photosensitivity of the photosensitive material, usually below 150°C.
For this purpose, a catalyst or the like is used in combination.

たた、珟像液に難溶もしくは䞍溶の成分を導入
する方法ずしおは、同様に該感光性化合物の掻性
に基を、䟋えば゚ステル化、アミド化、りレタン
化するこずなどがあげられる。感光性化合物の掻
性な基ず反応させる化合物ずしおは䜎分子であ぀
おも、比范的高分子であ぀おも良いし、感光性化
合物にモノマをグラフト重合させおも良い。
In addition, as a method for introducing a component that is poorly soluble or insoluble in the developer, similarly, the active group of the photosensitive compound may be esterified, amidated, or urethanized. The compound to be reacted with the active group of the photosensitive compound may be a low-molecular compound or a relatively high-molecular compound, or a monomer may be graft-polymerized to the photosensitive compound.

本発明で甚いられる光剥離性感光局ずしおは、
特に奜たしいものは、ナフトキノン−−ゞ
アゞド−−スルホン酞ずプノヌルホルムアル
デヒドノボラツク暹脂の郚分゚ステル化物を倚官
胜もしくは単官胜む゜シアネヌトで架橋もしくは
倉性しお埗られる。
The photoremovable photosensitive layer used in the present invention includes:
A particularly preferred one is obtained by crosslinking or modifying a partially esterified product of naphthoquinone-1,2-diazide-5-sulfonic acid and phenol formaldehyde novolak resin with a polyfunctional or monofunctional isocyanate.

本発明の感光局の厚さは玄0.1〜100Ό、奜たし
くは玄0.5〜10Όが適圓で、薄すぎるず塗工時にピ
ンホヌル等の欠陥が生じ易くなり、䞀方、厚すぎ
るず経枈的芋地から䞍利である。
The appropriate thickness of the photosensitive layer of the present invention is approximately 0.1 to 100Ό, preferably approximately 0.5 to 10Ό; if it is too thin, defects such as pinholes are likely to occur during coating, while if it is too thick, it is disadvantageous from an economic standpoint. It is.

たた、感光局䞭には本発明の効果を損わない範
囲で塗膜圢成性向䞊や支持䜓ずの接着性向䞊など
の目的で他成分を加えたり、たた珟像時あるいは
露光時に画像を可芖化するために染料などを加え
たりするこずは可胜である。
In addition, other components may be added to the photosensitive layer for the purpose of improving coating film formation properties and adhesion to the support within a range that does not impair the effects of the present invention, and images may be visualized during development or exposure. It is possible to add dyes etc.

本発明に甚いられるシリコヌンゎム局は、次の
ような繰り返し単䜍を有する分子量数千〜数十䞇
の線状有機ポリシロキサンを䞻成分ずする。
The silicone rubber layer used in the present invention is mainly composed of a linear organic polysiloxane having a molecular weight of several thousand to several hundred thousand and having the following repeating units.

ここでは以䞊の敎数、は炭玠数〜10の
アルキル基、アルケニル基あるいはプニル基で
あり、の60以䞊がメチル基であるものが奜た
しい。 このような線状有機ポリシロキサンは有機過酞
化物を添加しお熱凊理等を斜すこずにより、たば
らに架橋しシリコヌンゎムずするこずも可胜であ
る。
(Here, n is an integer of 1 or more, R is an alkyl group, alkenyl group, or phenyl group having 1 to 10 carbon atoms, and preferably 60% or more of R is a methyl group.) Such linear organic Polysiloxane can also be sparsely crosslinked to form silicone rubber by adding an organic peroxide and subjecting it to heat treatment.

この線状有機ポリシロキサンにはたた架橋剀が
添加される。架橋剀ずしおは、いわゆる宀枩䜎
枩硬化型のシリコヌンゎムに䜿われるものずし
お、アセトキシシラン、ケトオキシムシラン、ア
ルコキシシラン、アミノシラン、アミドシランな
どがあり、通垞、線状有機ポリシロキサンずしお
末端が氎酞基であるものず組合わせお、各々脱酢
酞型、脱オキシム型、脱アルコヌル型、脱アミン
型、脱アミド型のシリコヌンゎムずなる。これら
のシリコヌンゎムにはさらに觊媒ずしお少量の有
機錫化合物等が添加されるのが䞀般的である。
A crosslinking agent is also added to the linear organopolysiloxane. Crosslinking agents used in so-called room temperature (low temperature) curing silicone rubber include acetoxysilane, ketoxime silane, alkoxysilane, aminosilane, amidosilane, etc., and are usually linear organic polysiloxanes with hydroxyl groups at the ends. When combined with certain substances, silicone rubbers become deaceticated, oxime-free, alcoholized, deamined, and deamidated silicone rubbers. Generally, a small amount of an organic tin compound or the like is further added as a catalyst to these silicone rubbers.

シリコヌンゎム局の厚さは、玄0.5〜100Ό奜た
しくは玄0.5〜10Όが適圓であり、薄すぎる堎合は
耐刷力の点で問題も生じるこずがあり、䞀方、厚
すぎる堎合は経枈的に䞍利であるばかりでなく、
珟像時シリコヌンゎム局を陀去するのが困難ずな
り画像再珟性の䜎䞋をもたらす。
The appropriate thickness of the silicone rubber layer is approximately 0.5 to 100Ό, preferably approximately 0.5 to 10Ό; if it is too thin, problems may occur in terms of printing durability, while if it is too thick, it is economically disadvantageous. Not only is
It becomes difficult to remove the silicone rubber layer during development, resulting in a decrease in image reproducibility.

本発明の平版印刷版においお、支持䜓ず感光局
ずの接着は、画像再珟性、耐刷力などの基本的な
版性胜にずり、非垞に重芁であるので、必芁に応
じお接着剀局を蚭けたり、各局に接着改良性成分
を添加したりするこずが可胜である。
In the lithographic printing plate of the present invention, adhesion between the support and the photosensitive layer is very important for basic plate performance such as image reproducibility and printing durability, so an adhesive layer may be provided as necessary. It is also possible to add adhesion-improving components to each layer.

支持䜓ずしおは、通垞の平版印刷機にセツトで
きるたわみ性ず印刷時に加わる荷重に耐えうるも
のでなければならない。代衚的なものずしおは、
アルミ、銅、鋌等の金属板、ポリ゚チレンテレフ
タレヌトのようなプラスチツクフむルムあるいは
コヌト玙、ゎム等があげられる。支持䜓は耇合さ
れたものであ぀おもよい。これらのシヌト䞊にハ
レヌシペン防止その他の目的でさらにコヌテむン
グを斜しお支持䜓ずするこずも可胜である。
The support must be flexible enough to be set in a normal lithographic printing machine and capable of withstanding the load applied during printing. As a typical example,
Examples include metal plates such as aluminum, copper, and steel, plastic films such as polyethylene terephthalate, coated paper, and rubber. The support may be composite. It is also possible to provide a support by further applying a coating to these sheets for antihalation and other purposes.

以䞊説明したようにしお構成された湿し氎䞍芁
の平版印刷版の衚面を圢成するシリコヌンゎム局
を保護するなどの目的でシリコヌンゎム局の衚面
に薄い保護フむルムをラミネヌトするこずもでき
る。
A thin protective film may be laminated on the surface of the silicone rubber layer for the purpose of protecting the silicone rubber layer forming the surface of the planographic printing plate that does not require dampening water and is constructed as described above.

以䞊説明したように本発明に甚いられる湿し氎
䞍芁の平版印刷版は、䟋えば次のようにしお補造
される。
As explained above, the lithographic printing plate that does not require dampening water and is used in the present invention is manufactured, for example, as follows.

たず支持䜓の䞊に、リバヌスロヌルコヌタ、゚
アヌナむフコヌタ、メヌダバヌコヌタなどの通垞
のコヌタあるいはポラヌのような回転塗垃装眮
を甚い感光局を構成すべき組成物溶液を塗垃、也
燥および必芁に応じお熱キナア埌、該感光局の䞊
に同様な方法で接着局を塗垃、也燥埌、シリコヌ
ンゎム溶液を接着局䞊に同様の方法で塗垃し、通
åžž70〜140℃の枩床で数分間熱凊理しお、十分に
硬化せしめおシリコヌンゎム局を圢成する。必芁
ならば、保護フむルムを該シリコヌンゎム局䞊に
ラミネヌタ等を甚いおカバヌする。
First, a composition solution to form a photosensitive layer is applied onto the support using a conventional coater such as a reverse roll coater, air knife coater, Meyer bar coater, or a rotary coater such as a Whaler, and then dried and coated as necessary. After heat curing, an adhesive layer is applied on the photosensitive layer in the same manner, and after drying, a silicone rubber solution is applied on the adhesive layer in the same manner, followed by heat treatment at a temperature of usually 70 to 140°C for several minutes. and sufficiently cured to form a silicone rubber layer. If necessary, cover the silicone rubber layer with a protective film using a laminator or the like.

このようにしお補造された湿し氎䞍芁の平版印
刷版は䟋えば真空密着されたネガフむルムを通し
お掻性光線に露光される。この露光工皋で甚いら
れる光源は、玫倖線を豊富に発生するものであ
り、氎銀灯、カヌボンアヌク灯、キセノンラン
プ、メタルハラむドランプ、蛍光灯などを䜿うこ
ずができる。
The thus produced lithographic printing plate, which does not require dampening water, is exposed to actinic light through, for example, a negative film sealed in vacuum. The light source used in this exposure process emits abundant ultraviolet light, and can be a mercury lamp, a carbon arc lamp, a xenon lamp, a metal halide lamp, a fluorescent lamp, or the like.

次いで版面を珟像液を含んだ珟像甚パツドでこ
するず露光郚のシリコヌンゎム局たたは感光局を
含めお陀去され、感光局衚面たたは基板面が露出
し、むンキ受容郚ずなる。
Next, when the plate surface is rubbed with a developing pad containing a developer, the silicone rubber layer or photosensitive layer in the exposed area is removed, and the photosensitive layer surface or substrate surface is exposed and becomes an ink receiving area.

本発明の印刷版は感光局ずシリコヌンゎム局ず
の接着が匷固になるのはもずより、珟像操䜜にお
いおは、陀去されるべき箇所は遞択的にしかも容
易にシリコヌンゎム局を剥離できるものである。
したが぀おバランスがずれた印刷版である。
The printing plate of the present invention not only has strong adhesion between the photosensitive layer and the silicone rubber layer, but also allows the silicone rubber layer to be selectively and easily peeled off from the areas to be removed during the development operation.
Therefore, it is a well-balanced printed edition.

たた接着局の塗垃に際しおは幅広い条件を採甚
するこずが可胜である。
Furthermore, a wide range of conditions can be adopted when applying the adhesive layer.

さらに接着局塗垃液の原液安定性が非垞に良奜
で、塗垃溶媒ずしお−ブタノヌルなどのアルコ
ヌルを添加したものでは、長時間空気䞭に攟眮し
おも濁るこずなく、性胜を保持する。
Furthermore, the adhesive layer coating solution has very good stability as a stock solution, and when an alcohol such as n-butanol is added as a coating solvent, it does not become cloudy and retains its performance even when left in the air for a long time.

以䞋、実斜䟋により本発明をさらに詳しく説明
する。
Hereinafter, the present invention will be explained in more detail with reference to Examples.

実斜䟋  厚み0.3mmのアルミ板䞊に、厚み0.3mm、ゎム硬
床60シペアのクロロプレンゎム局を蚭けた
耇合基板䞊に、゚ステル化床44のプノヌルノ
ボラツク暹脂䜏友ベヌクラむト補スミレゞン
PR50235のナフトキノン−−ゞアミド−
−スルホン酞゚ステルの10重量ゞオキサン溶
液を塗垃し、60℃熱颚䞭で也燥し、厚さ3Όの感
光局を蚭けた。
Example 1 A phenol novolac resin (manufactured by Sumitomo Bakelite: manufactured by Sumitomo Bakelite: violet resin
PR50235) naphthoquinone-1,2-diamide
A 10% by weight solution of 5-sulfonic acid ester in dioxane was applied and dried in hot air at 60°C to form a photosensitive layer with a thickness of 3 Όm.

この䞊にゞ−−ブトキシ・ビスアセチルア
セトナトチタンの0.4重量゚ツ゜化孊(æ ª)
補脂肪族系炭化氎玠溶剀“アむ゜パヌ”溶
液を塗垃し、120℃で也燥し、厚さ0.1Όの接着局
を蚭けた。
On top of this, 0.4% by weight of di-n-butoxy bis(acetylacetonato)titanium (Etsuo Chemical Co., Ltd.)
A solution of "Isoper E" (manufactured by aliphatic hydrocarbon solvent) was applied and dried at 120°C to form an adhesive layer with a thickness of 0.1Ό.

さらに、この䞊の次に組成をも぀シリコヌンゎ
ム組成物の10重量−ヘキサン溶液を塗垃し、
120℃熱颚䞭で分間熱硬化しお、厚さ2.5Όのシ
リコヌンゎム局を蚭けた。
Furthermore, a 10% by weight n-hexane solution of a silicone rubber composition having the following composition is applied on top of this,
A silicone rubber layer with a thickness of 2.5 Όm was provided by heat curing in hot air at 120° C. for 4 minutes.

(a) ゞメチルポリシロキサン分子量30000末端
氎酞基 100郚 (b) メチルトリアセトキシシラン 郚 (c) 酢酞ゞブチル錫 0.2郚 䞊蚘のようにしお埗られた印刷原版を、真空密
着したネガフむルムを通しお超高圧氎銀灯ゞ゚
ツトラむト2kwを甚い、の距離から90秒露
光した。露光ずみの版は、゚タノヌル65郚アむ
゜パヌE35郚からなる珟像液で版面を濡らし、珟
像パツドで軜くこするず、露光郚分は容易に陀去
されおゎム局が露出し、䞀方、未露光郚にはシリ
コヌンゎム局が匷固に残存しおおり、ネガフむル
ムを忠実に再珟した印刷版を埗た。
(a) Dimethylpolysiloxane (molecular weight 30,000, terminal hydroxyl group) 100 parts (b) Methyltriacetoxysilane 6 parts (c) Dibutyltin acetate 0.2 parts Exposure was carried out for 90 seconds from a distance of 1 m using a high-pressure mercury lamp (jet light 2 kW). When the exposed plate is wetted with a developer consisting of 65 parts of ethanol/35 parts of Isopar E and lightly rubbed with a developer pad, the exposed areas are easily removed and the rubber layer is exposed, while the unexposed areas are left unexposed. A printing plate was obtained in which the silicone rubber layer remained firmly and faithfully reproduced the negative film.

この印刷版を、通垞の平台匏凞版印刷機に取り
぀けお、氎なし平版甚むンキ「アルポ」東華
色玠化孊工業補を甚いおコヌト玙に盎刷り印刷
を行な぀たずころ、党䜓のむンキ着肉状態が良奜
で、シダヌプな画像を有する印刷物が埗られた。
This printing plate was attached to a regular flatbed letterpress printing machine and printed directly onto coated paper using waterless lithographic ink "Alpo G" (manufactured by Toka Shiki Kagaku Kogyo). A printed matter with a good inking state and a sharp image was obtained.

実斜䟋  化成凊理アルミ板䜏友軜金属補に゚ステル
化床44のプノヌルノボラツク暹脂䜏友デナ
レズ補スミレゞンPR50235のナフトキノン−
−ゞアミド−−スルホン酞゚ステル゚
タノヌル可溶性成分9.7重量の重量ゞオ
キサン溶液をポラヌで回転塗垃、也燥させお
1.2Όの感光局を圢成した。
Example 2 Naphthoquinone of phenol novolac resin (Sumitomo Durez: Sumiresin PR50235) with a degree of esterification of 44% was applied to a chemically treated aluminum plate (manufactured by Sumitomo Light Metals).
A 3 wt% dioxane solution of 1,2-diamido-5-sulfonic acid ester (ethanol soluble component: 9.7 wt%) was spin-coated using a Whaler and dried.
A 1.2 ÎŒm photosensitive layer was formed.

この䞊にゞ−−ブトキシ・ビスアセチルア
セトナトチタンの0.2重量゚ツ゜化孊(æ ª)
補脂肪族系炭化氎玠溶剀“アむ゜パヌ”
−ブタノヌル8020重量比溶液をポラヌで
回転塗垃、也燥させお0.05Όの接着局を圢成した。
On top of this, 0.2% by weight of di-n-butoxy bis(acetylacetonato)titanium (Etsuo Chemical Co., Ltd.)
Manufactured by: Aliphatic hydrocarbon solvent) “Isopar E”/
A solution of n-butanol in a weight ratio of 80/20 was spin-coated using a Whaler and dried to form an adhesive layer of 0.05 ÎŒm.

この䞊に次の組成をも぀シリコヌンゎム組成物
のアむ゜パヌ溶液をポラヌで回転塗垃し
た。也燥埌、120℃で分間加熱硬化し、2.2Όの
シリコヌンゎム局を埗た。
A 7% Isopar E solution of a silicone rubber composition having the following composition was spin-coated onto this using a Whaler. After drying, it was cured by heating at 120°C for 4 minutes to obtain a 2.2Ό silicone rubber layer.

(a) ゞメチルポリシロキサン分子量80000末端
氎酞基 100郚 (b) ビニルトリメチル゚チルケトオキシムシ
ラン 郚 (c) ゞブチル錫ゞアセテヌト 0.2郚 䞊蚘のようにしお埗られた印刷原版に、真空密
着した150線の網点画像をも぀ネガフむルムを通
しおメタルハラむドランプ岩厎電気補アむド
ルフむン2000を甚い、の距離から60秒照射
した。露光された版は、゚タノヌル郚、アむ゜
パヌE2郚からなる珟像液を甚い、30cm分の搬
送速床で自動珟像機を通しお珟像したずころ、露
光郚分は容易に陀去されお化成凊理アルミ衚面が
露出し、䞀方、未露光郚にはシリコヌンゎム局が
匷固に残存しおおり、ネガフむルムを忠実に再珟
した画像が埗られた。
(a) Dimethylpolysiloxane (molecular weight 80,000, terminal hydroxyl group) 100 parts (b) Vinyl tri(methyl ethyl ketoxime) silane 6 parts (c) Dibutyltin diacetate 0.2 part 150 The film was irradiated for 60 seconds from a distance of 1 m using a metal halide lamp (manufactured by Iwasaki Electric: Idolfin 2000) through a negative film having a line halftone image. The exposed plate was developed using a developer consisting of 8 parts of ethanol and 2 parts of Isopar E through an automatic developing machine at a transport speed of 30 cm/min. The exposed area was easily removed and the chemical conversion treated aluminum surface was exposed. On the other hand, the silicone rubber layer remained firmly in the unexposed areas, and an image faithfully reproducing the negative film was obtained.

この印刷版をオフセツト印刷機小森スプリン
トカラヌに取り付け、東掋むンキ補“アクワ
レスST藍”を甚いお、湿し氎を甚いないで印刷
したずころ150線の網点〜95が再珟された極
めお良奜な画像をも぀印刷物が埗られた。䞇郚
刷了埌も地汚れおよび版面の損傷は党く芋られ
ず、さらに印刷を継続できる状態であ぀た。
When this printing plate was attached to an offset printing machine (Komori Sprint 2 Color) and printed using Toyo Ink's "Aquares ST Indigo" without using dampening water, 5 to 95% of the 150-line halftone dots were reproduced. A printed matter with an extremely good image was obtained. Even after 10,000 copies had been printed, no scumming or damage to the plate surface was observed, and printing could continue.

実斜䟋  (A) 厚み0.24mmのアルミ板䜏友軜金属補にレ
ゟヌル暹脂スミラむトレゞンPC−、䜏友
デコレズ補を1.7Όの厚みに塗垃し、180℃で
分間キナアしお支持䜓ずした。この支持䜓䞊
に䞋蚘の感光局組成物を回転塗垃、120℃で
分間加熱硬化させ、厚み2.3Όの感光局を蚭け
た。
Example 3 (A) A resol resin (Sumilight Resin PC-1, manufactured by Sumitomo Decorez) was applied to a thickness of 1.7 Όm on an aluminum plate (manufactured by Sumitomo Light Metals) with a thickness of 0.24 mm, and it was cured at 180°C for 3 minutes and supported. As a body. On this support, the following photosensitive layer composition was spin-coated at 120°C.
It was cured by heating for a minute to form a photosensitive layer with a thickness of 2.3 ÎŒm.

(a) ゚ステル化床48のプノヌルノボラツク暹
脂スミラむトレゞンPR50235、䜏友デコレズ
補のナフトキノン−−ゞアゞド−−
スルホン酞゚ステル 100郚 (b) 4′−ゞプニルメタンゞむ゜シアナヌト
30郚 (c) ゞブチル錫ゞラりレヌト 0.2郚 (d) ゞオキサン 2000郚 (B) 続いおこの䞊にテトラ−む゜−プロポキシチ
タンの重量アむ゜パヌ溶液をメヌダバヌ
コヌタで塗垃埌、120℃で分間加熱し、厚み
0.2Όの接着局を蚭けた。
(a) Naphthoquinone-1,2-diazide-5- of phenol novolak resin (Sumilight Resin PR50235, manufactured by Sumitomo Decorez) with a degree of esterification of 48%
Sulfonic acid ester 100 parts (b) 4,4'-diphenylmethane diisocyanate
30 parts (c) 0.2 parts of dibutyltin dilaurate (d) 2000 parts of dioxane (B) Next, apply a 5% by weight Isopar E solution of tetra-iso-propoxy titanium on this using a Meyer bar coater, and then heat at 120°C for 1 minute. Heat and thicken
An adhesive layer of 0.2Ό was provided.

(C) さらに続いおこの䞊に䞋蚘の組成のシリコヌ
ンゎム組成物をメヌダバヌコヌタで塗垃埌、
120℃、DP30℃、分で加熱硬化しお厚み2.3ÎŒ
のシリコヌンゎム局を蚭けた。
(C) Then, after applying a silicone rubber composition with the composition below using a Meyer bar coater,
Heat cured at 120℃, DP30℃, 4 minutes to a thickness of 2.3ÎŒ
A silicone rubber layer was provided.

(a) ゞメチルポリシロキサン分子量25000末端
氎酞基 100郚 (b) ゚チルトリアセトキシシラン 郚 (c) 酢酞ゞブチル錫 0.2郚 䞊蚘のようにしお埗られた印刷原版に、150線
網点画像を有するネガフむルムを、垞法に埓぀お
真空密着し、メタルハラむドランプを甚いお画像
露光を斜した。続いおこの版を゚チルセロ゜ル
プアむ゜パヌ゚ツ゜化孊補95珟像
液に浞挬しパツドで軜くこするず、露出郚のシリ
コヌンゎム局が陀去されお感光局衚面がが露出
し、原画フむルムに忠実な画像が埗られた。
(a) Dimethylpolysiloxane (molecular weight 25,000, terminal hydroxyl group) 100 parts (b) Ethyltriacetoxysilane 6 parts (c) Dibutyltin acetate 0.2 parts The printing original plate obtained as above had a 150-line halftone image. The negative film was vacuum-adhered according to a conventional method, and imagewise exposed using a metal halide lamp. Next, this plate is immersed in Ethyl Cellosolp/Isopar E (manufactured by Etsuo Chemical Co., Ltd.) (5/95) developer and rubbed lightly with a pad to remove the exposed silicone rubber layer and expose the surface of the photosensitive layer, forming the original film. A faithful image was obtained.

この版の未露光郚シリコヌンゎム局は珟像液に
䟵されず、シリコヌンゎム局衚面に珟像時の傷が
入らない。たたこのようにしお埗られた印刷版は
印刷時においおも、玙粉等により版面に傷が入る
こずなく優れた印刷物が埗られる。
The unexposed silicone rubber layer of this plate is not attacked by the developer, and the surface of the silicone rubber layer is not scratched during development. Moreover, the printing plate obtained in this manner can provide excellent printed matter without scratches on the plate surface due to paper dust etc. even during printing.

Claims (1)

【特蚱請求の範囲】  支持䜓、オルトキノンゞアゞド化合物を含む
感光局、接着局およびシリコヌンゎム局をこの順
に蚭けおなる湿し氎䞍芁平版印刷版においお、前
蚘接着局が有機チタネヌトを含むこずを特城ずす
る湿し氎䞍芁平版印刷版。  有機チタネヌトが次匏で瀺される化合物の少
なくずも皮であるこずを特城ずする特蚱請求の
範囲第項蚘茉の湿し氎䞍芁平版印刷版。 TiOR14TiOR2oOCOR34-oTi
OR2oL4-o 〔ここで、R1、R3は炭玠数〜20のアルキル、
アリヌル、シクロアルキルたたはアルケニル基 R2は氎玠、炭玠数〜20のアルキル、アリヌ
ル、シクロアルキルたたはアルケニル基 はキレヌト配䜍子 は〜である。〕
[Scope of Claims] 1. A dampening water-free lithographic printing plate comprising a support, a photosensitive layer containing an orthoquinonediazide compound, an adhesive layer, and a silicone rubber layer in this order, characterized in that the adhesive layer contains an organic titanate. A lithographic printing plate that does not require dampening water. 2. The dampening water-free lithographic printing plate according to claim 1, wherein the organic titanate is at least one compound represented by the following formula. Ti(OR 1 ) 4 , Ti(OR 2 ) o (OCOR 3 ) 4-o , Ti
(OR 2 ) o L 4-o [Here, R 1 and R 3 are alkyl having 1 to 20 carbon atoms,
Aryl, cycloalkyl or alkenyl group R 2 is hydrogen, alkyl having 1 to 20 carbon atoms, aryl, cycloalkyl or alkenyl group L is a chelate ligand n is 0 to 3. ]
JP15816982A 1982-09-13 1982-09-13 Lithographic printing plate requiring no dampening water Granted JPS5948768A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP15816982A JPS5948768A (en) 1982-09-13 1982-09-13 Lithographic printing plate requiring no dampening water

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP15816982A JPS5948768A (en) 1982-09-13 1982-09-13 Lithographic printing plate requiring no dampening water

Publications (2)

Publication Number Publication Date
JPS5948768A JPS5948768A (en) 1984-03-21
JPH0365539B2 true JPH0365539B2 (en) 1991-10-14

Family

ID=15665778

Family Applications (1)

Application Number Title Priority Date Filing Date
JP15816982A Granted JPS5948768A (en) 1982-09-13 1982-09-13 Lithographic printing plate requiring no dampening water

Country Status (1)

Country Link
JP (1) JPS5948768A (en)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4612380A (en) * 1981-03-11 1986-09-16 Hoffmann-La Roche Inc. 7-fluoro-prostacyclin analogs
US5213617A (en) * 1991-06-13 1993-05-25 Dow Corning Corporation Primer for silicone substrates
US5238708A (en) * 1991-06-13 1993-08-24 Dow Corning Corporation Primer for silicone substrates
GB9719644D0 (en) * 1997-09-17 1997-11-19 Horsell Graphic Ind Ltd Planographic printing

Also Published As

Publication number Publication date
JPS5948768A (en) 1984-03-21

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