JPH0367265B2 - - Google Patents

Info

Publication number
JPH0367265B2
JPH0367265B2 JP60053276A JP5327685A JPH0367265B2 JP H0367265 B2 JPH0367265 B2 JP H0367265B2 JP 60053276 A JP60053276 A JP 60053276A JP 5327685 A JP5327685 A JP 5327685A JP H0367265 B2 JPH0367265 B2 JP H0367265B2
Authority
JP
Japan
Prior art keywords
pattern
condensate
layer
resist
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP60053276A
Other languages
English (en)
Japanese (ja)
Other versions
JPS60227254A (ja
Inventor
Wataru Ishii
Shozo Myazawa
Shinji Tsucha
Hisashi Nakane
Akira Yokota
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tokyo Ohka Kogyo Co Ltd
Original Assignee
Tokyo Ohka Kogyo Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Ohka Kogyo Co Ltd filed Critical Tokyo Ohka Kogyo Co Ltd
Priority to JP60053276A priority Critical patent/JPS60227254A/ja
Publication of JPS60227254A publication Critical patent/JPS60227254A/ja
Publication of JPH0367265B2 publication Critical patent/JPH0367265B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/094—Multilayer resist systems, e.g. planarising layers

Landscapes

  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP60053276A 1985-03-19 1985-03-19 パタ−ン形成方法 Granted JPS60227254A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP60053276A JPS60227254A (ja) 1985-03-19 1985-03-19 パタ−ン形成方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60053276A JPS60227254A (ja) 1985-03-19 1985-03-19 パタ−ン形成方法

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP59041231A Division JPS60220931A (ja) 1984-03-06 1984-03-06 感光性樹脂用下地材料

Publications (2)

Publication Number Publication Date
JPS60227254A JPS60227254A (ja) 1985-11-12
JPH0367265B2 true JPH0367265B2 (sr) 1991-10-22

Family

ID=12938211

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60053276A Granted JPS60227254A (ja) 1985-03-19 1985-03-19 パタ−ン形成方法

Country Status (1)

Country Link
JP (1) JPS60227254A (sr)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01204045A (ja) * 1988-02-10 1989-08-16 Nec Corp パターン形成方法
JPH022568A (ja) * 1988-06-15 1990-01-08 Nec Corp パターン形成方法

Also Published As

Publication number Publication date
JPS60227254A (ja) 1985-11-12

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