JPH0368724B2 - - Google Patents
Info
- Publication number
- JPH0368724B2 JPH0368724B2 JP60105427A JP10542785A JPH0368724B2 JP H0368724 B2 JPH0368724 B2 JP H0368724B2 JP 60105427 A JP60105427 A JP 60105427A JP 10542785 A JP10542785 A JP 10542785A JP H0368724 B2 JPH0368724 B2 JP H0368724B2
- Authority
- JP
- Japan
- Prior art keywords
- damper
- temperature
- main
- opened
- gas concentration
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000000034 method Methods 0.000 claims description 21
- 230000001877 deodorizing effect Effects 0.000 claims description 18
- 238000001816 cooling Methods 0.000 claims description 12
- 230000007246 mechanism Effects 0.000 claims description 12
- 238000010438 heat treatment Methods 0.000 claims description 11
- 238000010790 dilution Methods 0.000 claims description 9
- 239000012895 dilution Substances 0.000 claims description 9
- 230000003647 oxidation Effects 0.000 claims description 7
- 238000007254 oxidation reaction Methods 0.000 claims description 7
- 230000003197 catalytic effect Effects 0.000 claims description 6
- 238000002485 combustion reaction Methods 0.000 claims description 4
- 239000007789 gas Substances 0.000 description 30
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 6
- 239000002360 explosive Substances 0.000 description 5
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 229910052697 platinum Inorganic materials 0.000 description 3
- 230000002265 prevention Effects 0.000 description 3
- 238000010586 diagram Methods 0.000 description 2
- 238000007865 diluting Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 230000001590 oxidative effect Effects 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 238000004332 deodorization Methods 0.000 description 1
- 230000004941 influx Effects 0.000 description 1
- 230000001105 regulatory effect Effects 0.000 description 1
- 230000000630 rising effect Effects 0.000 description 1
Landscapes
- Treating Waste Gases (AREA)
- Exhaust Gas Treatment By Means Of Catalyst (AREA)
Description
【発明の詳細な説明】
＜産業上の利用分野＞
本発明はガス濃度の調節方法に係り、さらに詳
しくは例えば爆発下限界濃度を有する可燃性の排
ガスを、加熱処理するための脱臭装置等を安全に
保つためのガス濃度の調節方法に関するものであ
る。DETAILED DESCRIPTION OF THE INVENTION <Industrial Application Field> The present invention relates to a method for adjusting gas concentration, and more specifically, for example, to a deodorizing device for heat-treating flammable exhaust gas having a lower explosive limit concentration. This relates to a method of adjusting gas concentration to maintain safety.
＜従来の技術＞
触媒酸化式や直接燃焼式脱臭装置の如く、排ガ
スを一定温度以上に昇温して処理するものは、可
燃性ガスに対する安全対策が従来からもなされて
いた。<Prior Art> Conventionally, safety measures against flammable gases have been taken in devices such as catalytic oxidation type and direct combustion type deodorizing devices that heat exhaust gas to a certain temperature or higher for treatment.
しかし、これが大型の化学プラントと連結する
場合などは、特にバツクフアイヤーに対する対策
や、一段目の安全装置が作動しない場合等の緊急
時において働らく二段式の安全対策が所望され、
この点従来の安全対策では不完全との指摘があ
る。 However, when this is connected to a large chemical plant, it is especially desirable to have a two-stage safety measure that can be used to deal with backup fires or in emergencies such as when the first-stage safety device does not operate.
It has been pointed out that conventional safety measures are inadequate in this regard.
＜発明が解決しようとする問題点＞
上の事情に鑑み、本発明は緊急時に昇温処理工
程を閉鎖させ、メインダクトのガスを放出させる
二段式安全対策を施してなるガス濃度の調節方法
の提供を目的とするとともに、ガス濃度希釈用の
補助ダンパー等が自動的に調節しうる方法の提供
をもう一つの目的とするものである。<Problems to be Solved by the Invention> In view of the above circumstances, the present invention provides a method for regulating gas concentration by implementing a two-stage safety measure in which the temperature raising treatment process is closed in an emergency and the gas in the main duct is released. Another object of the present invention is to provide a method in which an auxiliary damper for diluting gas concentration can be automatically adjusted.
＜問題点を解決するための手段＞
本発明は、昇温処理工程中に３種の温度調節機
構を設け、第１〜第２設定温度間の正常域ではメ
インダクトからの主ダンパー開らき、第２〜第３
設定温度間の高温域では希釈用ダンパーを開らい
てガス濃度を自動的に希釈させ、第３設定温度以
上の危険域では開閉ダクトを閉鎖して昇温処理工
程へのガスの流入を遮断するとともに、バイパス
状に設けられた緊急ダンパーを開放してバイパス
フアンでガスを緊急排出するようにし、これらを
全て自動的に行うようにして、上記の問題点を解
決さした。<Means for solving the problem> The present invention provides three types of temperature control mechanisms during the temperature raising process, and in the normal range between the first and second set temperatures, the main damper from the main duct opens; 2nd to 3rd
In the high temperature range between the set temperatures, the dilution damper is opened to automatically dilute the gas concentration, and in the dangerous range above the third set temperature, the opening/closing duct is closed to cut off the flow of gas into the temperature raising process. At the same time, the above-mentioned problems were solved by opening an emergency damper provided in a bypass shape and allowing a bypass fan to urgently discharge the gas, all of which was done automatically.
＜作用＞
例えばトルエンの排ガスを脱臭する場合には、
この爆発下限界濃度は1.27％であり、1000PPM
の温度上昇は123℃である。<Function> For example, when deodorizing toluene exhaust gas,
This lower explosive limit concentration is 1.27% and 1000PPM
The temperature rise is 123℃.
この場合に、本発明の第１設定温度を185℃に
設定すれば（185／123）×1000＝1500PPMから現
実に処理が開始され、これは爆発下限界濃度の
1500／（1.27×1000）＝１／8.5にすぎない。 In this case, if the first set temperature of the present invention is set to 185℃, the treatment will actually start from (185/123) x 1000 = 1500 PPM, which is the lower explosive limit concentration.
1500/(1.27×1000) = only 1/8.5.
また、第２設定温度を320℃に設定すれば
（320／123）×1000＝2600PPM以下で処理される
ことになり、これは爆発下限界濃度の2600／
（1.27×1000）＝１／4.2以下であるから安全であ
る。 In addition, if the second set temperature is set to 320℃, processing will be performed at less than (320/123) x 1000 = 2600PPM, which is the lower explosive limit concentration of 2600/
(1.27×1000)=1/4.2 or less, so it is safe.
さらに、第３設定温度を550℃に設定すれば
（550／123）×1000＝4471PPMとなり、それは爆
発下限界濃度の4471／（1.27×1000）＝１／2.8に
達すると、脱臭装置への排ガスの流入を遮断し、
排ガスは緊急ダンパーを開放して放出するという
二段目の安全対策が働くことになる。 Furthermore, if the third set temperature is set to 550℃, the result will be (550/123) x 1000 = 4471 PPM, which means that when it reaches the lower explosive limit concentration of 4471/(1.27 x 1000) = 1/2.8, the exhaust gas will be sent to the deodorizing device. block the influx of
A second safety measure is implemented in which exhaust gas is released by opening an emergency damper.
通常、本発明の昇温処理工程が触媒酸化式脱臭
装置の場合は、第１設定温度が300℃程度、第２
設定温度は400℃程度、第３設定温度は550℃以内
程度に設定して作用させる。 Normally, when the temperature raising treatment process of the present invention is performed using a catalytic oxidation type deodorizing device, the first set temperature is about 300°C, and the second set temperature is about 300°C.
The set temperature is set to about 400°C, and the third set temperature is set to within about 550°C.
＜実施例＞
添付の第１図は、本発明の方法による一実施例
を示すフローチヤートである。<Example> The attached FIG. 1 is a flowchart showing an example of the method of the present invention.
１のメインダクトから矢印Ａ１の方向に吸引さ
れる排ガスは、ガス量の増減を主ダンパー２で自
動的に調節し、送風機からなるフアン３によつて
吸引され、本実施例の場合は触媒酸化式脱臭装置
からなる昇温処理工程４を経て矢印Ａ２より脱臭
され、清浄な空気となつて排気されるが、この間
には熱交換器５が設置され、これを往復して昇
温・降下の温度調整が行われる。なお、本発明で
いう昇温処理工程とは、本実施例のほか直接燃焼
式脱臭装置も好ましいが、脱臭装置に限らず乾燥
機やその他の化学プラント等において、可燃性ガ
スを昇温する工程のあるものに、広く利用でき
る。なお、６はフイルターボツクス兼チヤンバー
であり、７はドレンコツクである。 The exhaust gas sucked in the direction of the arrow A1 from the main duct No. 1 is automatically adjusted to increase or decrease the amount of gas by the main damper 2, and is suctioned by the fan 3 consisting of a blower. The air is deodorized in the direction of arrow A2 through a temperature raising treatment step 4 consisting of a type deodorizing device, and is exhausted as clean air.A heat exchanger 5 is installed in the meantime, and the heat exchanger 5 is reciprocated to raise and lower the temperature. Temperature adjustment is performed. Note that the temperature raising treatment step in the present invention is not limited to a deodorizing device, but is also a step of raising the temperature of combustible gas in a dryer or other chemical plant, etc., although a direct combustion deodorizing device is also preferable in addition to this embodiment. It can be widely used in some things. Note that 6 is a filter box and chamber, and 7 is a drain tank.
主ダンパー２の手前のフイルターボツクスに
は、新鮮な空気Ａ３を吸引するための昇温・冷却
用の自動ダンパー８と、同じく新鮮な空気Ａ４を
吸引するためのガス濃度希釈用の自動ダンパー９
と、メインダクト１からの排ガスＡ１を吸引する
ためのモーター付き自動開閉ダンパー１０を設け
ている。また、メインダクト１には、別にバイパ
スを設け、バイパスフアン１１と一体の緊急ダン
パー１２を設けている。 In the filter box in front of the main damper 2, there is an automatic damper 8 for heating and cooling to suck fresh air A3, and an automatic damper 9 for diluting gas concentration to suck fresh air A4.
An automatic opening/closing damper 10 with a motor for sucking exhaust gas A1 from the main duct 1 is provided. Further, the main duct 1 is provided with a separate bypass, and an emergency damper 12 integrated with the bypass fan 11 is provided.
一方、脱臭装置からなる昇温処理工程４には、
加熱防止センサー１３付きのベースヒーター１４
と、加熱防止センサー１５付きのメインヒーター
１６が設置されており、熱交換器５を経由して予
熱された排ガスＡ５は、両ヒーター１４，１６に
よつて所定の酸化脱臭等の温度迄昇温する。ここ
で所定の温度とは、触媒酸化式脱臭装置なら150
℃〜350℃程度であり、直接燃焼式脱臭装置なら
600℃〜800℃程度である。また、両加熱防止セン
サー１３，１５は、例えば触媒酸化式脱臭装置の
場合は、550℃以下の400〜500℃程度に設定され
る。 On the other hand, in the temperature raising treatment step 4 consisting of a deodorizing device,
Base heater 14 with heating prevention sensor 13
A main heater 16 with a heating prevention sensor 15 is installed, and the exhaust gas A5 preheated via the heat exchanger 5 is heated by both heaters 14 and 16 to a predetermined temperature for oxidation deodorization, etc. do. The predetermined temperature here means 150°C for a catalytic oxidation deodorizer.
℃ to 350℃, and if it is a direct combustion deodorizing device.
The temperature is about 600℃~800℃. Further, both heating prevention sensors 13 and 15 are set to about 400 to 500°C, which is below 550°C, for example in the case of a catalytic oxidation type deodorizing device.
１７は、酸化アルミナ担体に白金をコーテイン
グした白金触媒であり、１８，１９，２０は熱電
対からなる第１・第２・第３の３つの温度調節機
構で、何れも昇温処理工程４内に設けられてい
る。 17 is a platinum catalyst made by coating platinum on an oxidized alumina carrier, and 18, 19, and 20 are three temperature control mechanisms, first, second, and third, consisting of thermocouples, all of which are used in the temperature raising treatment step 4. It is set in.
本実施例の場合は、第１温度調節機構を250℃
に設定している。この第１設定温度250℃以下で
は、昇温・冷却ダンパー８と主ダンパー２のみを
開らいて、フアン３にて新鮮な冷却空気Ａ３のみ
を少量吸引する。これは、脱臭装置からなる昇温
処理工程４に、最初スイツチを入れた運転開始時
には、未だ所定の温度まで達してないので、排ガ
スＡ１を吸引できないため、250℃迄の昇温に使
用する。そのため、第１温度調節機構１８は、第
１設定温度250℃以下では昇温・冷却ダンパー８
と主ダンパー２を開らくよう、少なくとも両自動
ダンパー８，２と結線されている。また、昇温・
冷却ダンパー８は、運転終了時等に昇温処理工程
４内を、常温近く迄冷却したい場合にも使用す
る。なお、このダンパー８からの吸引空気は少量
であるため、省エネ効果に寄与するものであり、
角度は任意に調整可能である。 In this example, the first temperature control mechanism is set at 250°C.
It is set to . When the first set temperature is below 250° C., only the heating/cooling damper 8 and the main damper 2 are opened, and only a small amount of fresh cooling air A3 is sucked in by the fan 3. This is used to raise the temperature to 250°C because the exhaust gas A1 cannot be sucked in because the temperature has not yet reached the predetermined temperature when the temperature raising treatment step 4 consisting of the deodorizing device is first turned on. Therefore, the first temperature adjustment mechanism 18 uses the temperature rising/cooling damper 8 when the first set temperature is 250°C or lower.
It is connected to at least both automatic dampers 8 and 2 so as to open the main damper 2. In addition, temperature increase
The cooling damper 8 is also used when it is desired to cool the inside of the temperature raising treatment process 4 to near normal temperature at the end of operation. In addition, since the amount of air sucked from this damper 8 is small, it contributes to the energy saving effect.
The angle can be adjusted arbitrarily.
次に本実施例の第２温度調節機構は、350℃に
設定している。先の第１設定温度250℃をこえ、
この第２設定温度350℃以下の間では、昇温・冷
却ダンパー８が閉じ、モーター付きの開閉ダンパ
ー１０が主ダンパー２とともに開らいて排ガスＡ
１を吸引し、脱臭・酸化を開始する。 Next, the second temperature control mechanism of this embodiment is set at 350°C. Exceeding the first set temperature of 250℃,
When the second set temperature is below 350°C, the heating/cooling damper 8 closes, and the motorized opening/closing damper 10 opens together with the main damper 2, causing the exhaust gas to
Aspirate 1 and start deodorizing and oxidizing.
そして本実施例の第３温度調節機構は、550℃
に設定している。先の第２設定温度350℃をこえ、
この第３設定温度550℃以下の間では、開閉ダン
パー１０と主ダンパー２のほかに、希釈ダンパー
９等も開らいて、排ガスＡ１の脱臭・酸化を続行
する。ただし、開閉ダンパー１０からの排ガスＡ
１と、希釈ダンパー９からの空気Ａ４とが合流す
るため、主ダンパー２は、このとき自動的に増量
するよう、より大きく開らくようになつており、
そのため第２温度調節機構１９は、少なくともダ
ンパー２，８，１０と結線されている。ここで希
釈ダンパー９等としたのは、高温時に昇温・冷却
ダンパー８をも開らいてもよいからである。 The third temperature control mechanism of this embodiment is 550°C.
It is set to . Exceeding the second set temperature of 350℃,
When the third set temperature is below 550° C., in addition to the opening/closing damper 10 and the main damper 2, the dilution damper 9 and the like are also opened to continue deodorizing and oxidizing the exhaust gas A1. However, exhaust gas A from the opening/closing damper 10
1 and the air A4 from the dilution damper 9 merge, the main damper 2 is opened wider to automatically increase the amount at this time.
Therefore, the second temperature adjustment mechanism 19 is connected to at least the dampers 2, 8, and 10. The reason why the dilution damper 9 or the like is used here is that the heating/cooling damper 8 may also be opened when the temperature is high.
最後に本実施例の第３設定温度550℃に達する
ということは、実際には事故の緊急時以外には考
えられないことであるが、仮にこれ以上の温度に
達した場合には、バイパスフアン１１と一体の緊
急ダンパー１２を開放して排ガスＡ１をＡ６の如
く放出させるという緊急の処置がなされ、このと
き、開閉ダンパー１０を閉鎖して、発生するかも
しれないバツクフアイヤーが、メインダクト１内
へ入らないように遮断する。そして昇温処理工程
４内を早く冷却するよう主ダンパー２に対して希
釈ダンパー９とともに昇温・冷却ダンパー８の両
方が開らくようになつている。そのため、第３温
度調節機構２０は、少なくともダンパー８，９，
１０，１２と結線され、このようにして昇温処理
工程４内のガス濃度は、本実施例の場合、白金触
媒酸化式の脱臭装置であるために、温度の制限に
よつて、完全な調節が行われている。なお、２１
は風量検出用の安全装置であり、フアン３と主ダ
ンパー２間のパイプ２２は、一定の圧力以上が加
わつた場合に破裂するよう安全対策が講じられて
いる。 Finally, reaching the third set temperature of 550°C in this example is actually unthinkable except in an emergency situation, but if the temperature reaches higher than this, the bypass fan An emergency measure is taken to open the emergency damper 12 integrated with 11 and release the exhaust gas A1 as shown in A6. Block it to prevent it from entering. Both the dilution damper 9 and the heating/cooling damper 8 are opened relative to the main damper 2 so that the inside of the heating process 4 can be cooled quickly. Therefore, the third temperature adjustment mechanism 20 includes at least the dampers 8, 9,
10 and 12, and in this way, the gas concentration in the temperature raising treatment step 4 can be completely controlled by limiting the temperature, because in the case of this example, the deodorizing device is a platinum catalytic oxidation type. is being carried out. In addition, 21
is a safety device for detecting air volume, and safety measures have been taken so that the pipe 22 between the fan 3 and the main damper 2 will burst if a certain pressure or more is applied.
＜発明の効果＞
本発明のガス濃度の調節方法は、緊急時にバツ
クフアイヤーがメインダクト内へ引火しないよ
う、自動的な遮断が行われ、冷却とともに、緊急
放出もなされるよう万全の安全対策が講じられて
いる。<Effects of the Invention> In the gas concentration adjustment method of the present invention, thorough safety measures are taken to ensure that the backup fire does not ignite into the main duct in an emergency, is automatically shut off, and is not only cooled but also released in an emergency. It is being
所定温度及び高温時における温度調節を、各ダ
ンパーの自動調節によつて、システムを連続的に
安全運転させる有用かつ新規なガス濃度の調節方
法を提供するものである。 The present invention provides a useful and novel gas concentration adjustment method that allows the system to operate continuously and safely by automatically adjusting each damper to adjust the temperature at a predetermined temperature and at high temperatures.
第１図は本発明の方法の一実施例を示す工程図
である。
図中：１……メインダクト、２……主ダンパ
ー、３……フアン、４……脱臭装置からなる昇温
処理工程、８……昇温・冷却ダンパー、９……ガ
ス濃度希釈ダンパー、１０……開閉ダンパー、１
１……バイパスフアン、１２……緊急ダンパー、
１８……第１温度調節機構、１９……第２温度調
節機構、２０……第３温度調節機構、Ａ１……ガ
ス。
FIG. 1 is a process diagram showing an embodiment of the method of the present invention. In the diagram: 1...Main duct, 2...Main damper, 3...Fan, 4...Temperature raising treatment process consisting of deodorizing device, 8...Temperature raising/cooling damper, 9...Gas concentration dilution damper, 10 ...Opening/closing damper, 1
1...Bypass fan, 12...Emergency damper,
18...First temperature adjustment mechanism, 19...Second temperature adjustment mechanism, 20...Third temperature adjustment mechanism, A1...Gas.
Claims (1)
節してフアンで吸引し、昇温処理工程を経て排気
するようにしたガス濃度の調節方法において、該
主ダンパーの手前には昇温・冷却ダンパーとガス
濃度希釈ダンパーとメインダクトからの開閉ダン
パーを設け、またメインダクトには別にバイパス
フアンと一体の緊急ダンパーを設け、一方昇温処
理工程には３つの温度調節機構を設けてなり、第
１設定温度以下では昇温・冷却ダンパーと主ダン
パーを開らき、第１〜第２設定温度間では開閉ダ
ンパーと主ダンパーを開らき、第２〜第３設定温
度間では開閉ダンパーと主ダンパーのほかに希釈
ダンパー等を開らき、第３設定温度以上では緊急
ダンパーを開放して開閉ダンパーを閉鎖し主ダン
パーと希釈ダンパー及び昇温・冷却ダンパーの両
方又は何れかを開らき、昇温処理工程内のガス濃
度を自動的に調節しうるようにしたことを特徴と
するガス濃度の調節方法。 ２ 主ダンパーの開らきが、第２〜第３設定温度
領域間では、より大きく開らくように調節したこ
とを特徴とする特許請求の範囲第１項記載のガス
濃度の調節方法。 ３ 昇温処理工程が、触媒酸化式脱臭装置あるい
は直接燃焼式脱臭装置であることを特徴とする特
許請求の範囲第１項記載のガス濃度の調節方法。[Claims] 1. In a method for adjusting gas concentration, in which the amount of gas from a main duct is adjusted by a main damper, the gas is sucked in by a fan, and the gas is exhausted after a temperature raising treatment process, a A temperature raising/cooling damper, a gas concentration dilution damper, and an opening/closing damper from the main duct are installed.The main duct is also equipped with an emergency damper that is integrated with a bypass fan, while three temperature control mechanisms are installed in the temperature raising process. When the temperature is below the first set temperature, the heating/cooling damper and the main damper are opened, between the first and second set temperatures, the opening/closing damper and the main damper are opened, and between the second and third set temperatures, the opening/closing damper is opened. In addition to the main damper, the dilution damper etc. are opened, and when the temperature exceeds the third set temperature, the emergency damper is opened, the opening/closing damper is closed, and the main damper, the dilution damper, and/or the heating/cooling damper are opened. A method for adjusting gas concentration, characterized in that the gas concentration in a temperature raising treatment step can be automatically adjusted. 2. The method for adjusting gas concentration according to claim 1, wherein the opening of the main damper is adjusted to be wider between the second and third set temperature ranges. 3. The method for adjusting gas concentration according to claim 1, wherein the temperature raising treatment step is performed using a catalytic oxidation deodorizing device or a direct combustion deodorizing device.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60105427A JPS61263621A (en) | 1985-05-16 | 1985-05-16 | Adjusting method for gas concentration |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60105427A JPS61263621A (en) | 1985-05-16 | 1985-05-16 | Adjusting method for gas concentration |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS61263621A JPS61263621A (en) | 1986-11-21 |
| JPH0368724B2 true JPH0368724B2 (en) | 1991-10-29 |
Family
ID=14407300
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP60105427A Granted JPS61263621A (en) | 1985-05-16 | 1985-05-16 | Adjusting method for gas concentration |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS61263621A (en) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2004150681A (en) * | 2002-10-30 | 2004-05-27 | Sintokogio Ltd | Operation control method of heat storage combustion type exhaust gas purification device and its device |
| CN104645779A (en) * | 2007-01-30 | 2015-05-27 | 康肯科技股份有限公司 | Gas Processing Apparatus |
| JP5871308B2 (en) * | 2011-11-10 | 2016-03-01 | 五十嵐 豊 | Low boiling point solvent recovery method and apparatus |
| KR101514195B1 (en) * | 2015-02-17 | 2015-04-23 | 주식회사 에코에너젠 | Energy-Saving Type Dielectric Barrier Discharge Plasma NOx Reduction Equipment |
-
1985
- 1985-05-16 JP JP60105427A patent/JPS61263621A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS61263621A (en) | 1986-11-21 |
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