JPH036996B2 - - Google Patents

Info

Publication number
JPH036996B2
JPH036996B2 JP60231028A JP23102885A JPH036996B2 JP H036996 B2 JPH036996 B2 JP H036996B2 JP 60231028 A JP60231028 A JP 60231028A JP 23102885 A JP23102885 A JP 23102885A JP H036996 B2 JPH036996 B2 JP H036996B2
Authority
JP
Japan
Prior art keywords
nickel
sulfur
cathode
metal layer
weight
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP60231028A
Other languages
Japanese (ja)
Other versions
JPS6293389A (en
Inventor
Koji Yamakawa
Masao Fukuoka
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tokuyama Corp
Original Assignee
Tokuyama Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokuyama Corp filed Critical Tokuyama Corp
Priority to JP60231028A priority Critical patent/JPS6293389A/en
Publication of JPS6293389A publication Critical patent/JPS6293389A/en
Publication of JPH036996B2 publication Critical patent/JPH036996B2/ja
Granted legal-status Critical Current

Links

Classifications

    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02EREDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E60/00Enabling technologies; Technologies with a potential or indirect contribution to GHG emissions mitigation
    • Y02E60/30Hydrogen technology
    • Y02E60/36Hydrogen production from non-carbon containing sources, e.g. by water electrolysis

Landscapes

  • Electrodes For Compound Or Non-Metal Manufacture (AREA)
  • Electrolytic Production Of Non-Metals, Compounds, Apparatuses Therefor (AREA)

Description

【発明の詳細な説明】[Detailed description of the invention]

[発明の技術分野] 本発明は、電導性基体の表面に電極活性物質と
して30重量%の硫黄を含むニツケル金属層を有す
る電極に関し、特にアルカリ金属ハロゲン化物水
溶液の電解や水の電解などに有用な、低い水素過
電圧を示す新規な電解用陰極に関する。 [従来の技術およびその問題点] 従来から、アルカリ金属ハロゲン化物、特に塩
化ナトリウム、塩化カリウム水溶液の電解や水の
電解により水素を発生させ、苛性アルカリを得る
方法は、工業的に良く知られており、多く用いら
れている。しかしながら、近年、エネルギーコス
トの急騰により、各種の電解においても電解電圧
を低減して電力原単位を下げるため、種々の努力
がなされている。例えばイオン交換膜を用いる食
塩電解法においては、電解電圧を低減するため
に、陰極水素過電圧の低減、イオン交換膜抵抗の
低減、電槽構造の改良による溶液抵抗、気泡抵抗
損失の低減などが行われている。 このうち、上記電解における陰極としては、コ
ストの面から軟鋼が用いられて来たが、通常の電
解条件で400mVの水素過電圧を有することから、
水素発生用活性陰極として軟鋼やニツケルからな
る電導性基体上にメツキ、焼結、溶射等の方法に
より、陰極活性物質を被覆した陰極またはその製
造方法が提案されている。 例えば、特開昭54−62933号公報には、()ニ
ツケルイオン()錯化剤()アンモニウム又
はホウ酸及び()含硫黄及び(又は)窒素化合
物を含むメツキ浴を用いるニツケルメツキによつ
て得られるものを陰極として用いる方法;特開昭
57−19388号公報には、金属からなる基体表面に
ニツケル塩、チオシアン基及びアンモニアイオン
を含むニツケルメツキ浴によりニツケルメツキを
施してなる電解用陰極;特開昭54−38277号公報
には、マンガンもしくはマンガンとイオウとを含
有するニツケル薄膜をコーテイングせしめた陰
極;特開昭57−113836号公報には、コバルト、ニ
ツケル、鉄およびマンガンから選択される少なく
とも2種以上の金属を含有する溶液を調整し、
H2Sまたは適当な硫化物を用いて該溶液を処理す
ることによつて、少なくとも2種の該金属および
硫黄を含有する混合金属硫化物の電解触媒を電気
化学的プロセスに用いる方法、特開昭56−5994号
公報には、電導性基体上に粉末ニツケルまたニツ
ケル含有粉末合金の層をプラズマ溶射、電気メツ
キなどの方法により形成し、この層に硫黄が表面
に固着できる条件下に硫化を施した電気分解用電
極などが開示されている。 しかしながら、上記の如き陰極または製造方法
では、水素過電圧の低減効果が充分でない、また
は経時的に水素過電圧が上昇するなどの問題があ
つた。 [問題を解決するための手段] 本発明者らは、水素過電圧を低下させた活性陰
極について鋭意研究の結果、電導性金属基体の表
面に電極触媒として30重量%以上の硫黄を含むニ
ツケル金属層を有する電極が、特に電解用陰極と
して初期の水素過電圧が低く且つ長期にわたり低
水素過電圧を持続し得ることを見出して、本発明
に至つたものである。即ち、本発明は電導性基体
表面に30重量%以上の硫黄を含むニツケル金属層
を有する電極である。 本発明に用いられる電導性基体としては、一般
に電極として使用される環境下において耐久性を
有する金属であれば特に制限はないが、一般に軟
鋼、ニツケルなどの金属またはそれらを主成分と
する合金が好ましい。また、電導性基体の形状も
特に制限されるものでなく、一般に電解槽におけ
る電極として使用される形状で、例えば平板状、
網状、パンチドメタル、エキスパンドメタル、ス
ダレ状などである。 本発明のニツケル金属層は30重量%以上の硫黄
を含むものであれば特に制限されず、該硫黄の含
有率が多くなるほど好ましい効果を発揮するが、
電気抵抗の上昇を勘案して一般に30〜80重量%で
充分であり、好ましくは30〜60重量%である。製
法は、例えば含硫黄ニツケルメツキ浴から電気メ
ツキ法により電導性基体表面にニツケル金属層を
設ける方法、ニツケルと硫黄またはニツケルの硫
化物との混合物を真空蒸着法により基体表面にニ
ツケル金属層を設ける方法、あるいはニツケルと
硫黄またはニツケルの硫化物との混合物を化学気
相析出法(CVD法)により電導性基体表面にニ
ツケル金属層を設ける方法などが好ましく採用さ
れる。これらのニツケル金属層を得る方法のう
ち、特に電気メツキを行う際、一定周期で短時間
電流を中断するパルスメツキ法を用いることによ
り、容易にニツケル金属層中の硫黄の含有率が高
く得られるのでさらに好適である。因みに、前記
した特開昭54−62933号、57−19388号公報に記載
のように、直流メツキ法によつてニツケルメツキ
を施した場合には、該ニツケルメツキ層に硫黄を
30重量%以上に含有させることが難かしく、ひい
ては得られる陰極における水素過電圧(初期)の
低減効果および該水素過電圧の経時的な上昇の抑
制効果が充分でない。 なお、上記のメツキ浴としては、例えばロダン
ニツケルあるいは硫酸ニツケル、塩化ニツケルな
どを主成分としてチオ硫酸ニツケル、チオ尿素な
どで調整した含硫黄ニツケルメツキ浴などが好ま
しく用いられる。これらメツキ浴の組成およびメ
ツキ条件は、得られるニツケルメツキ層における
硫黄の含有率が30重量%以上となるように、公知
の浴組成および条件と同一、ないしはそれに準じ
て決定すればよい。また、パルスメツキ法は、電
流を流している時間Ton(msec)、電流を止めて
いる時間Toff(msec)とし、下記式の様にデユ
ーテイーサイクル(Duty Cycle)を定義する。 Duty Cycle(%)=Ton/Ton+Toff×100 本発明において採用される上記のパルス電流、
Tonおよびデユーテイーサイクルは、メツキ浴の
組成などにより異なるため一概に決定されない
が、パルス電流は通常の電気メツキ電流値の0.1
〜50倍、Tonは1μsec〜1sec、デユーテイーサイ
クルは1〜80%が好適である。また、上記したニ
ツケル金属層を得る際、ニツケルと共にコバル
ト、モリブデン、鉄、クロム、タングステン等を
数%程度含んだ合金層であつてもよく、さらに可
溶性の金属あるいは化合物を混合した合金層を作
り、続いてこれら可溶性物質を溶出させた電極
も、水素過電圧を一層低下させることができて好
ましい。 [作用および効果] 前記したように、本発明の電極は低い水素過電
圧を長期間にわたつて持続し、硫黄の含有量の少
ないニツケル金属層を有する電極に比べて、活性
および耐久性に著しく優れている。この理由は、
十分に明確ではないが、ニツケル金属層における
水素発生反応に対して含有された硫黄が大きな役
割を果たしていると思われる。たとえば、電気メ
ツキ法により作成したニツケル金属層の結晶構造
と硫黄の含有量の関係をX線回折法により調べて
みると、硫黄の含有量の少ない(S含有量が10重
量%程度)ニツケル金属層では、ニツケルの微細
結晶構造を示す回折図形が得られ、電解試験後も
変化が見られなかつた。これに対し、30重量%以
上の硫黄を含むニツケル金属層では、電解前にア
モルフアス構造を示すX線回折図形が得られる
が、電解試験後ではアモルフアス状の回折図形か
らニツケルの微細結晶構造を示す回折図形に変化
していた。そして、この両者のアルカリ水溶液中
での水素過電圧を測定すると、30重量%以上の硫
黄を含むニツケル金属層の方が著しく低い水素過
電圧を長期にわたつて示した。この傾向は30重量
%を越えると急に顕著になる。このことから、ニ
ツケル金属層の水素発生反応における電極特性
は、結晶構造には関係なく、ニツケル金属層中に
含まれる硫黄の量によつて決まるものと推測され
る。なお、ニツケル金属層を得る際、微量の炭
素、窒素、リンなどが混入しても効果には影響な
い。 また、本発明の電導性基体の表面に形成される
ニツケル金属層の厚さは、あまり厚く被覆すると
脱落し易くなるので、一般に5〜150μ、好まし
くは10〜100μ程度である。 本発明の電極は、特にアルカリ金属ハロゲン化
物水溶液の電解や水の電解などにおいて、長期に
わたり低い水素過電圧を示す陰極として極めて有
用である。また、本発明は高価な白金族金属など
を使用することなく、良好で安価な電解用陰極で
あり、工業的に極めて有利である。さらに、本発
明の電極は、燃料電池等の水素極として、水素を
活性化する効果からも使用可能と考えられる。 [実施例] 以下、本発明の実施例を示すが本発明はこれら
の実施例に限定されるものではない。 実施例 1 20mm×40mm、厚み3mmの軟鋼板にテフロンチユ
ーブを被覆した3mmφのNiを溶接した基材を、
常法により脱脂・酸洗等の前処理を行つた。この
基材に表−1に示す組成の含硫黄ニツケルメツキ
浴を用いて、表−1に示す条件でメツキした。こ
のうち、(A)および(B)は本発明の陰極で、(C)および
(D)は比較例である。
[Technical Field of the Invention] The present invention relates to an electrode having a nickel metal layer containing 30% by weight of sulfur as an electrode active substance on the surface of a conductive substrate, and is particularly useful for electrolysis of aqueous alkali metal halide solutions and water electrolysis. The present invention relates to a novel electrolytic cathode exhibiting low hydrogen overvoltage. [Prior art and its problems] Conventionally, the method of producing caustic alkali by generating hydrogen through electrolysis of alkali metal halides, especially sodium chloride and potassium chloride aqueous solutions, and electrolysis of water, is well known industrially. It is widely used. However, in recent years, due to the sharp rise in energy costs, various efforts have been made to reduce the electrolytic voltage in various types of electrolysis to lower the power consumption rate. For example, in the salt electrolysis method using an ion exchange membrane, in order to reduce the electrolysis voltage, the cathode hydrogen overvoltage is reduced, the ion exchange membrane resistance is reduced, and the solution resistance and bubble resistance loss are reduced by improving the cell structure. It is being said. Among these, mild steel has been used as the cathode in the above electrolysis due to cost considerations, but since it has a hydrogen overvoltage of 400 mV under normal electrolysis conditions,
As an active cathode for hydrogen generation, a cathode in which a cathode active material is coated on a conductive substrate made of mild steel or nickel by a method such as plating, sintering, or thermal spraying, or a method for manufacturing the cathode, has been proposed. For example, Japanese Patent Application Laid-Open No. 54-62933 discloses that nickel ions can be obtained by nickel plating using a plating bath containing () a complexing agent, () ammonium or boric acid, and () a sulfur-containing and/or nitrogen compound. Method of using as a cathode; JP-A-Sho
No. 57-19388 discloses an electrolytic cathode formed by applying nickel plating to the surface of a metal substrate using a nickel plating bath containing nickel salt, thiocyanate groups, and ammonia ions; JP-A-57-113836 discloses a cathode coated with a nickel thin film containing sulfur and sulfur;
A method of using mixed metal sulfide electrocatalysts containing at least two said metals and sulfur in an electrochemical process by treating said solution with H 2 S or a suitable sulfide, JP Publication No. 56-5994 discloses that a layer of powdered nickel or nickel-containing powder alloy is formed on a conductive substrate by a method such as plasma spraying or electroplating, and sulfurization is applied to this layer under conditions that allow sulfur to adhere to the surface. Electrolytes for electrolysis and the like are disclosed. However, the above-described cathode or manufacturing method has problems such as insufficient hydrogen overvoltage reduction effect or hydrogen overvoltage increasing over time. [Means for Solving the Problem] As a result of intensive research on active cathodes with reduced hydrogen overvoltage, the present inventors discovered that a nickel metal layer containing 30% by weight or more of sulfur as an electrode catalyst was formed on the surface of a conductive metal substrate. The present invention was achieved by discovering that an electrode having a hydrogen overvoltage has a low initial hydrogen overvoltage and can maintain a low hydrogen overvoltage over a long period of time, especially as a cathode for electrolysis. That is, the present invention is an electrode having a nickel metal layer containing 30% by weight or more of sulfur on the surface of a conductive substrate. The conductive substrate used in the present invention is not particularly limited as long as it is a metal that is durable under the environment in which it is generally used as an electrode, but metals such as mild steel and nickel, or alloys containing these as main components are generally used. preferable. Furthermore, the shape of the conductive substrate is not particularly limited, and may be a shape generally used as an electrode in an electrolytic cell, such as a flat plate,
These include net-like, punched metal, expanded metal, and sag-like shapes. The nickel metal layer of the present invention is not particularly limited as long as it contains 30% by weight or more of sulfur, and the higher the sulfur content, the more favorable the effect will be.
Taking into account the increase in electrical resistance, 30 to 80% by weight is generally sufficient, preferably 30 to 60% by weight. Manufacturing methods include, for example, a method of providing a nickel metal layer on the surface of a conductive substrate by electroplating from a sulfur-containing nickel plating bath, and a method of providing a nickel metal layer on the surface of a substrate by vacuum deposition of a mixture of nickel and sulfur or a sulfide of nickel. Alternatively, a method of forming a nickel metal layer on the surface of the conductive substrate by chemical vapor deposition (CVD) using a mixture of nickel and sulfur or sulfide of nickel is preferably employed. Among the methods for obtaining these nickel metal layers, especially when performing electroplating, a high sulfur content in the nickel metal layer can be easily obtained by using the pulse plating method in which the current is interrupted for a short time at regular intervals. It is even more suitable. Incidentally, as described in the above-mentioned JP-A-54-62933 and JP-A-57-19388, when nickel plating is applied by the DC plating method, sulfur is added to the nickel plating layer.
It is difficult to contain 30% by weight or more, and as a result, the effect of reducing the (initial) hydrogen overvoltage in the resulting cathode and the effect of suppressing the increase in the hydrogen overvoltage over time are insufficient. As the above-mentioned plating bath, for example, a sulfur-containing nickel plating bath containing rhodan nickel, nickel sulfate, nickel chloride, etc. as a main component and adjusted with nickel thiosulfate, thiourea, etc. is preferably used. The composition and plating conditions of these plating baths may be determined to be the same as or in accordance with known bath compositions and conditions so that the sulfur content in the resulting nickel plating layer is 30% by weight or more. In addition, in the pulse plating method, the time period during which the current is flowing is Ton (msec), the time during which the current is stopped is Toff (msec), and the duty cycle is defined as shown in the following formula. Duty Cycle (%) = Ton / Ton + Toff × 100 The above pulse current employed in the present invention,
Ton and duty cycle cannot be determined unconditionally because they vary depending on the composition of the plating bath, etc., but the pulse current is 0.1 of the normal electroplating current value.
~50 times, Ton is preferably 1 μsec to 1 sec, and duty cycle is preferably 1 to 80%. In addition, when obtaining the above-mentioned nickel metal layer, it may be an alloy layer containing about a few percent of cobalt, molybdenum, iron, chromium, tungsten, etc. together with nickel, or an alloy layer containing a further soluble metal or compound. An electrode in which these soluble substances are subsequently eluted is also preferable because it can further reduce the hydrogen overvoltage. [Function and Effect] As described above, the electrode of the present invention maintains a low hydrogen overvoltage for a long period of time, and has significantly superior activity and durability compared to an electrode having a nickel metal layer with a low sulfur content. ing. The reason for this is
Although it is not fully clear, it is believed that the contained sulfur plays a major role in the hydrogen evolution reaction in the nickel metal layer. For example, when examining the relationship between the crystal structure and sulfur content of a nickel metal layer created by the electroplating method using In the layer, a diffraction pattern showing the microcrystalline structure of nickel was obtained, and no change was observed even after the electrolytic test. On the other hand, in a nickel metal layer containing 30% by weight or more of sulfur, an X-ray diffraction pattern showing an amorphous structure is obtained before electrolysis, but after the electrolytic test, the amorphous diffraction pattern shows a microcrystalline structure of nickel. It had changed into a diffraction pattern. When the hydrogen overvoltage of both layers was measured in an alkaline aqueous solution, the nickel metal layer containing 30% by weight or more of sulfur showed a significantly lower hydrogen overvoltage over a long period of time. This tendency suddenly becomes noticeable when the content exceeds 30% by weight. From this, it is presumed that the electrode characteristics of the nickel metal layer in the hydrogen generation reaction are determined by the amount of sulfur contained in the nickel metal layer, regardless of the crystal structure. Incidentally, when obtaining the nickel metal layer, even if trace amounts of carbon, nitrogen, phosphorus, etc. are mixed in, the effect will not be affected. Further, the thickness of the nickel metal layer formed on the surface of the conductive substrate of the present invention is generally about 5 to 150 .mu.m, preferably about 10 to 100 .mu.m, because if it is coated too thickly, it will easily fall off. The electrode of the present invention is extremely useful as a cathode that exhibits a low hydrogen overvoltage over a long period of time, particularly in the electrolysis of aqueous alkali metal halide solutions and water electrolysis. Further, the present invention provides a good and inexpensive electrolytic cathode without using expensive platinum group metals, and is extremely advantageous industrially. Furthermore, the electrode of the present invention is considered to be usable as a hydrogen electrode for fuel cells and the like due to its effect of activating hydrogen. [Examples] Examples of the present invention will be shown below, but the present invention is not limited to these Examples. Example 1 A base material made by welding a 3mmφ Ni coated Teflon tube onto a 20mm x 40mm, 3mm thick mild steel plate.
Pretreatments such as degreasing and pickling were carried out using conventional methods. This substrate was plated under the conditions shown in Table 1 using a sulfur-containing nickel plating bath having the composition shown in Table 1. Among these, (A) and (B) are the cathodes of the present invention, and (C) and
(D) is a comparative example.

【表】【table】

【表】 このメツキによつて得られたニツケル金属層中
の硫黄の含有率を調べたところ、(A)32重量%(B)40
重量%(C)28重量%(D)13重量%となつていた。 また、この様にして得たものを陰極として、対
極に白金板を用いて、30重量%の苛性ソーダ水溶
液中で電解した結果を表−2に示した。
[Table] When the sulfur content in the nickel metal layer obtained by this plating was investigated, (A) 32% by weight (B) 40
The weight percent (C) was 28 percent by weight, and the percent (D) was 13 percent by weight. Table 2 shows the results of electrolysis in a 30% by weight aqueous solution of caustic soda using the product thus obtained as a cathode and a platinum plate as a counter electrode.

【表】 この結果から、硫黄を30重量%以上含む(A)およ
び(B)の陰極は、硫黄含有率の低い(C)および(D)の陰
極に比べて、水素過電圧は初期において0.17〜
0.23Vほど低い値となることがわかる。また、3
ケ月後には(A)および(B)の陰極ではほとんど水素過
電圧の増大は見られなかつたが、(C)の陰極では水
素過電圧が50mmV増大し、(D)の陰極とほぼ同じ値
となつた。そして、電解後のニツケル金属層中の
硫黄の含有率を調べたところ、いずれの陰極とも
硫黄の減少は見られなかつた。 実施例 2 実施例1と同じ様に前処理を施した基材に、表
−3に示す組成の含硫黄ニツケルメツキ浴を用い
て、表−3に示す条件でメツキした。このうち(A)
は本発明の陰極で(B)は比較例である。
[Table] From this result, the hydrogen overvoltage of the cathodes (A) and (B) containing 30% by weight or more of sulfur is 0.17 to 0.5% compared to the cathodes (C) and (D) with a low sulfur content.
It can be seen that the value is as low as 0.23V. Also, 3
After several months, almost no increase in the hydrogen overvoltage was observed for the cathodes (A) and (B), but the hydrogen overvoltage for the cathode (C) increased by 50 mmV, reaching almost the same value as the cathode (D). . When the sulfur content in the nickel metal layer after electrolysis was examined, no decrease in sulfur was observed in any of the cathodes. Example 2 A substrate pretreated in the same manner as in Example 1 was plated under the conditions shown in Table 3 using a sulfur-containing nickel plating bath having the composition shown in Table 3. Of these (A)
is the cathode of the present invention, and (B) is a comparative example.

【表】【table】

【表】 このメツキによつて得られたニツケル金属層中
の硫黄の含有率を調べたところ(A)35重量%(B)15重
量%となつていた。 また、この様にして得たものを陰極として、実
施例1と同様に電解した結果を表−4に示した。
[Table] When the sulfur content in the nickel metal layer obtained by this plating was examined, it was found to be (A) 35% by weight (B) 15% by weight. Table 4 shows the results of electrolysis using the product thus obtained as a cathode in the same manner as in Example 1.

【表】 この結果から、硫黄を30重量%以上含む(A)の陰
極は硫黄含有率の低い(B)の陰極に比べて、水素過
電圧は初期において0.15Vほど低い値となつてい
ることがわかる。また、3ケ月後には(A)の陰極で
はほとんど水素過電圧の増大は見られなかつた
が、(B)の陰極では水素過電圧が70〜80mV増大し
た。そして電解後のニツケル金属層中の硫黄を調
べたところ、いずれの陰極とも硫黄の減少はみら
れなかつた。
[Table] From this result, the hydrogen overvoltage of the cathode (A) containing 30% by weight or more of sulfur is approximately 0.15 V lower than that of the cathode (B) with a low sulfur content. Recognize. Further, after three months, almost no increase in hydrogen overvoltage was observed in the cathode of (A), but the hydrogen overvoltage increased by 70 to 80 mV in the cathode of (B). When the sulfur in the nickel metal layer after electrolysis was examined, no decrease in sulfur was observed in any of the cathodes.

Claims (1)

【特許請求の範囲】[Claims] 1 電導性基体の表面に30重量%以上の硫黄を含
むニツケル金属層を有する電極。
1. An electrode having a nickel metal layer containing 30% by weight or more of sulfur on the surface of a conductive substrate.
JP60231028A 1985-10-18 1985-10-18 electrode Granted JPS6293389A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP60231028A JPS6293389A (en) 1985-10-18 1985-10-18 electrode

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60231028A JPS6293389A (en) 1985-10-18 1985-10-18 electrode

Publications (2)

Publication Number Publication Date
JPS6293389A JPS6293389A (en) 1987-04-28
JPH036996B2 true JPH036996B2 (en) 1991-01-31

Family

ID=16917132

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60231028A Granted JPS6293389A (en) 1985-10-18 1985-10-18 electrode

Country Status (1)

Country Link
JP (1) JPS6293389A (en)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5348379B2 (en) * 2008-08-21 2013-11-20 株式会社村田製作所 Porous body and method for producing porous body
JP5701080B2 (en) * 2011-01-27 2015-04-15 株式会社バンテック Electrode for alkaline water electrolysis, method for producing the same, and hydrogen generator
JP5802085B2 (en) * 2011-08-31 2015-10-28 株式会社バンテック Method for producing electrode for alkaline water electrolysis
KR102442683B1 (en) * 2017-04-06 2022-09-08 재단법인대구경북과학기술원 Electrode for water electrolysis and manufacturing methode of the same

Also Published As

Publication number Publication date
JPS6293389A (en) 1987-04-28

Similar Documents

Publication Publication Date Title
EP0181229B1 (en) Cathode
KR20110106303A (en) Electrodes suitable as hydrogen-emitting cathode
SK920685A3 (en) Hydroxide solution
CA1184871A (en) Low overvoltage hydrogen cathodes
US4162204A (en) Plated metallic cathode
US4414064A (en) Method for preparing low voltage hydrogen cathodes
JPH036996B2 (en)
US4274926A (en) Process for the electrolytic deposition of silver and silver alloy coatings and compositions therefore
US4190514A (en) Electrolytic cell
US4421626A (en) Binding layer for low overvoltage hydrogen cathodes
KR940010101B1 (en) Process for the preparation of electrolytic cell cathodes
JP2006118023A (en) Method for producing electrode for hydrogen generation
JPH0341559B2 (en)
US4177129A (en) Plated metallic cathode
Ohsaka et al. Electroplating of iridium–cobalt alloy
JPS6045710B2 (en) electrolytic cell
JPH10212592A (en) Platinum alloy plating bath
JPH0260759B2 (en)
JPH0633484B2 (en) Method for manufacturing cathode for hydrogen generation
Hoor et al. Electroless deposition and characterization of Fe-W-Pt alloys
Sakhnenko et al. Functional cobalt-vanadium coatings deposition via programmed electrolysis mode
JPS6211075B2 (en)
JPS5867883A (en) Manufacture of low hydrogen overvoltage cathode
CA1168185A (en) Raney alloy coated cathode for chlor-alkali cells
JPS5822550B2 (en) Manufacturing method of cathode for electrolysis